CN107315205B - A kind of tunable metamaterial structure and preparation method thereof based on Mechanical Moving - Google Patents
A kind of tunable metamaterial structure and preparation method thereof based on Mechanical Moving Download PDFInfo
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- CN107315205B CN107315205B CN201710476791.9A CN201710476791A CN107315205B CN 107315205 B CN107315205 B CN 107315205B CN 201710476791 A CN201710476791 A CN 201710476791A CN 107315205 B CN107315205 B CN 107315205B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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Abstract
The present invention relates to infrared and terahertz wave band modulators and detector technology field, in particular disclose a kind of tunable metamaterial structure and preparation method thereof based on Mechanical Moving, comprising: fixed graphic structure, metamaterial structure, fixed bin and Micro displacement controller；Fixed bin includes top end opening, in the frame of first side aperture, metamaterial structure is placed in the fixed bin, the top end opening of fixed graphic structure insertion fixed bin is fixed, Micro displacement controller includes the micrometer caliper of U-shaped framework and U-shaped framework one end, the U-shaped framework other end is fixed on the second side on the outside of fixed bin, the rotary shaft of micrometer caliper is in contact with metamaterial structure, micrometer caliper controls metamaterial structure along the first side of fixed bin by rotary shaft, the opposite direction of second side is mobile, so that fixed graphic structure and metamaterial structure generate opposite micro-displacement, it realizes and the resonance peak frequency of Meta Materials is modulated or is absorbed.
Description
Technical field
The present invention relates to infrared and terahertz wave band modulators and detector technology field, more particularly to one kind to be based on machine
The mobile tunable metamaterial structure and preparation method thereof of tool.
Background technique
The material of the atoms, molecule and Nano grade such as Meta Materials and copper, iron, semiconductor study always in the past and application
Material is different, is a kind of completely new material." electromagnetism Meta Materials " (metamaterial) refer to it is some have natural material do not have
The artificial composite structure or composite material of standby extraordinary physical property.By orderly reasonably designing Meta Materials in its structure
Key physical size, its breakthrough to certain apparent natural laws may be implemented, to obtain intrinsic common of nature
Extraordinary function not available for property.Meta Materials be it is a kind of it is novel can be with the artificial material of modulated electromagnetic wave.Meta Materials be by
What the metal resonator of sub-wavelength periodically rearranged on dielectric.Electromagnetic field relative to traditional natural circle material is special
Property be to be determined by the molecule of itself, the electromagnetic properties of Meta Materials is mainly determined by the metal resonating member of periodic arrangement
's." Meta Materials " this noun is proposed by Walser earliest, for naming while having two or more unusual electricity
The synthetic material of the three-dimensional periodic arrangement of magnetic response characteristic.Even to this day, the system of Meta Materials still none science
One definition.But Meta Materials have to have characteristics that
It (1) can be described by the electromagnetic parameter of one group of equivalent uniform；
(2) these parameters are codetermined by the electromagnetic response of all metal resonators；
(3) these resonators are periodic arrangements；
(4) size of periodic unit is about 1/10th of electromagnetic wavelength.
By reasonably designing metal structure, various unusual electromagnet phenomenons may be implemented.In view of this feature, Meta Materials
It can be widely applied to the research fields such as electromagnetism stealth, perfect absorption, negative index.In recent years, quick with Terahertz Technology
Development, the research report based on Meta Materials THz wave device also more come also more, as terahertz filter, Terahertz wave absorbing device and
Terahertz wire-grid polarizer etc., Meta Materials THz wave device have very big in fields such as Terahertz picture, spectrum and bio-sensings
Application potential quality.
The dielectric constant and magnetic conductivity of Meta Materials can be negative simultaneously, and this electromagnetic property is any material in nature
All do not have.In nature, most dielectric dielectric constant is all positive number, and negative magnetic conductivity is also very rare
's.This negative permittivity of Meta Materials and the characteristic of negative magnetoconductivity are some unprecedented designs in light wave field and application
It provides unlimited possibility, for example eliminates the high bio-sensing of Superlens, sensitivity that diffraction limits image resolution ratio
Device, stealthy cape etc..As that studies Meta Materials gos deep into, the basic research of Meta Materials is more and more abundant, it is novel design and
Advanced application is also more and more.Importantly, the promising research of the richness in this field can even change the physics in future
With the basic norm of engineering design.
Meta Materials have many traditional optical materials and device incomparable in terms of the polarization of light, phase and amplitude controlling
Unique advantage, in terms of the exploitation of novel optical element have great potential.Using Meta Materials to the extraordinary control ability of light
Some new elements such as wideband circular polarization device, novel perfect absorber may be implemented, with saturating without the plane for differing imaging capability
Mirror etc..Based on Meta Materials, the especially optical element of plane Meta Materials, can greatly reduce traditional optical elements volume and
Weight, thus be more conducive to miniaturization and it is integrated.Meanwhile the size by changing metamaterial structure unit, it can be made
Work is in different wave bands.This compares optics frequency range (such as mid and far infrared or Terahertz of shortage in some traditional optical elements
Wave band) there is particularly important value.
The development of adjustable Meta Materials has great significance for the application of Meta Materials.Adjustable Meta Materials can pass through application
The electromagnetic property of external signal (such as electric field, magnetic field, laser emission) change Meta Materials.This aspect can change and extend
The working frequency range of Meta Materials；On the other hand, then the exploitation for the various active photonic devices such as modulator provides possibility.Therefore,
People have paid many effort in terms of the research of adjustable Meta Materials, and make great progress.In adjustable Meta Materials
In terms of type, it is super that people devise the adjustable Meta Materials of microwave section based on variable capacitance, the mechanical reconfigurable based on MEMS technology
Material and the mixed structure Meta Materials based on active medium etc..For modulation system, there are hot modulation, electrical modulation, magnetic field modulation
With light modulation etc..For the electromagnetic characteristics modulated, there are amplitude modulation, resonant frequency modulation, phase-modulation etc..
Tunable metamaterial has important application, but existing super material in the fields such as modulator and detector in summary
Resonant frequency point is fixed after material completes, and can only be absorbed in fixed frequency, transmit, reflects；When being needed in actual requirement
When seeking the metamaterial structure of other frequency resonance, it is necessary to carry out design and fabrication again.Due to Meta Materials especially terahertz
Hereby the metamaterial structure of wave band is very fine, and the mask of production ultraviolet photolithographic is usually required in manufacturing process and then is carried out ultraviolet
Photoetching, structure finely cause make Meta Materials success rate be not it is very high, therefore, lead to the super material under different resonance frequencies
The service efficiency of material is not high.
Summary of the invention
The present invention solves the technical problem of the exposure masks due to needing to make ultraviolet photolithographic in Meta Materials manufacturing process
Then version carries out ultraviolet photolithographic, the success rate for finely leading to make Meta Materials of structure is not high, therefore, leads to different resonance frequencies
The not high technical problem of the service efficiency of lower Meta Materials.
And then a kind of tunable metamaterial structure and preparation method thereof based on Mechanical Moving is provided, it realizes to Meta Materials
Resonance peak frequency is modulated or absorbs.
In order to solve the above technical problems, one technical scheme adopted by the invention is that: it provides a kind of based on Mechanical Moving
Tunable metamaterial structure, comprising: fixed graphic structure, metamaterial structure, fixed bin and Micro displacement controller；
The fixed bin includes top end opening, in the frame of first side aperture setting, and the metamaterial structure is placed in
In the fixed bin, the top end opening of the fixed graphic structure insertion fixed bin is fixed, the Micro displacement controller packet
The micrometer caliper of U-shaped framework and U-shaped framework one end is included, the U-shaped framework other end is fixed on second side on the outside of fixed bin
The rotary shaft in face, micrometer caliper is in contact with metamaterial structure, and the micrometer caliper controls the super material by rotary shaft
Material structure is moved along the opposite direction of first side, the second side of fixed bin, so that fixed graphic structure and metamaterial structure
Generate opposite micro-displacement.
Further, the fixed graphic structure includes high transmittance substrate, top-level graphical metal layer from top to bottom
And inorganic polymer film layer.
Further, the metamaterial structure include substrate from the bottom to top, underlying metal film layer, dielectric layer and in
Between patterned metal layer.
Further, the graphical knot of the patterned structures of the top-level graphical metal layer and intermediate pattern metal layer
Structure is adapted, for generating the RESONANCE ABSORPTION of different-waveband after relative displacement.
Further, the top-level graphical metal layer thickness is 100nm-500nm.
Further, the underlying metal film layer is with a thickness of 100nm-500nm.
Further, the thickness of dielectric layers is 1 μm -50 μm.
Further, the intermediate pattern metal layer thickness is 10nm-300nm.
Further, the material of the underlying metal film layer and intermediate pattern metal layer be gold, bismuth, aluminium, titanium,
The alloy of NiCr or two or more metals in above-mentioned metal.
Further, the material of the dielectric layer is silicon nitride, silica, silicon or polyimides.
On the other hand, the production method for the tunable metamaterial structure based on Mechanical Moving that the present invention also provides a kind of,
Including following content:
The making step of fixed graphic structure: inorganic polymer film is fixed or is deposited on glass or silicon base；It adopts
Top-level metallic film is prepared on inorganic polymer film with evaporation, magnetic control detection method；The photoetching on the top-level metallic film
Meta Materials figure is produced, and using etching technics that the top-level metallic is Film patterning, forms top-level graphical metal layer,
By inorganic polymer film and more than top-level graphical metal layer shifted from glass or silicon base and conform to high transmission
On rate substrate, fixed graphic structure is formed；
The making step of metamaterial structure: preparing underlying metal film layer in substrate, in the underlying metal film layer
It is upper to use PECVD, evaporation, spin coating preparation media layer；Using evaporation, magnetron sputtering method production middle layer gold on the dielectric layer
Belong to film, and the metallic intermediate layer film is patterned using photoetching and reactive ion etching process, forms middle graph
Shape metal layer, is integrally formed metamaterial structure；
The making step of fixed bin: according to the size of fixed graphic structure and metamaterial structure, the frame of fixed bin is determined
Top end opening size and first side bore size so that the metamaterial structure is just from the top end opening or the first side
Face aperture is put into fixed bin, and the fixed graphic structure is just fixed at top end opening；
The assembling of Micro displacement controller: Micro displacement controller includes the micrometer caliper of U-shaped framework and U-shaped framework one end,
The U-shaped framework other end is fixed on the second side on the outside of fixed bin, rotary shaft and the metamaterial structure phase of micrometer caliper
Contact, the micrometer caliper control first side, second side phase of the metamaterial structure along fixed bin by rotary shaft
Pair direction it is mobile so that fixed graphic structure and metamaterial structure generate opposite micro-displacement.
The beneficial effects of the present invention are: being in contrast to the prior art:
Since using fixed graphic structure, metamaterial structure, fixed bin and Micro displacement controller, this is solid in the present invention
Determining box includes top end opening, in the frame of first side aperture, and metamaterial structure is placed in fixed bin, and fixed graphic structure is embedding
The top end opening for entering fixed bin is fixed, which includes the spiral micrometer of U-shaped framework and U-shaped framework one end
Device is fixed on the second side on the outside of fixed bin, rotary shaft and the metamaterial structure phase of micrometer caliper in the U-shaped framework other end
Contact, micrometer caliper control the metamaterial structure direction opposite along first side, the second side of fixed bin by rotary shaft
It is mobile, so that fixed graphic structure and metamaterial structure generate opposite micro-displacement, solve existing due to Meta Materials manufacturing process
Then the middle mask plate for needing to make ultraviolet photolithographic carries out ultraviolet photolithographic, the success rate for finely leading to make Meta Materials of structure is not
Height, the technical problem for causing the service efficiency of Meta Materials under different resonance frequencies not high, to realize the resonance peak to Meta Materials
Frequency is modulated or absorbs.
Detailed description of the invention
Fig. 1 is the positive structure diagram of the tunable metamaterial structure in the embodiment of the present invention based on Mechanical Moving；
Fig. 2 is the overlooking structure diagram of the tunable metamaterial structure in the embodiment of the present invention based on Mechanical Moving；
Fig. 3 a is the concrete structure schematic diagram that graphic structure is fixed in the embodiment of the present invention；
Fig. 3 b is the concrete structure schematic diagram of metamaterial structure in the embodiment of the present invention；
Fig. 4 A- Fig. 4 E is the patterned structures schematic diagram of top-level graphical metal layer in the embodiment of the present invention；
Fig. 4 F- Fig. 4 J is the patterned structures schematic diagram of intermediate pattern metal layer in the embodiment of the present invention；
Fig. 5 a- Fig. 5 c is the schematic diagram that graphic structure and metamaterial structure relative movement are fixed in the embodiment of the present invention；
Fig. 6 is that the tuning of the absorption resonance frequency of the tunable type Meta Materials in the embodiment of the present invention based on Mechanical Moving absorbs
The schematic diagram of curve.
Specific embodiment
The present invention solves the technical problem of the exposure masks due to needing to make ultraviolet photolithographic in Meta Materials manufacturing process
Then version carries out ultraviolet photolithographic, the success rate for finely leading to make Meta Materials of structure is not high, therefore, leads to different resonance frequencies
The not high technical problem of the service efficiency of lower Meta Materials.
And then a kind of tunable metamaterial structure and preparation method thereof based on Mechanical Moving is provided, it realizes to Meta Materials
Resonance peak frequency is modulated or absorbs.
For a better understanding of the technical solution of the present invention, in conjunction with appended figures and specific embodiments
Technical solution of the present invention is described in detail.
A kind of tunable metamaterial structure based on Mechanical Moving provided in an embodiment of the present invention, as shown in Figure 1 and Figure 2, figure
1 is main view, and Fig. 2 is top view, including fixed graphic structure 1, metamaterial structure 2, fixed bin 3 and Micro displacement controller 4；
Specifically, which includes top end opening, in the frame of first side aperture, which is placed in the fixed bin 3
Interior, the top end opening of the fixation graphic structure 1 insertion fixed bin 3 is fixed, which includes U-shaped framework 41
With the micrometer caliper 42 of 41 one end of U-shaped framework, which is fixed on the second side on the outside of fixed bin, spiral
The rotary shaft of mircrometer gauge 42 is in contact with metamaterial structure, and micrometer caliper 42 controls 2 edge of metamaterial structure by rotary shaft
The opposite direction of fixed bin first side, second side is mobile, so that fixed graphic structure 1 and metamaterial structure 2 generate relatively
Micro-displacement.
In a particular embodiment, as shown in Figure 3a, which includes high transmittance base from top to bottom
Piece 10, top-level graphical metal layer 11 and inorganic polymer film layer 12.Specifically, the thickness of the top-level graphical metal layer 11
Degree is 100nm-500nm.
As shown in figure Fig. 3 b, which includes substrate 23 from the bottom to top, underlying metal film layer 22, medium
Layer 21 and intermediate pattern metal layer 20,22 layers of the underlying metal film is with a thickness of 100nm-500nm.Dielectric layer 21 with a thickness of
1μm-50μm.Intermediate pattern metal layer 20 is with a thickness of 10nm-300nm.
The material of the underlying metal film layer 22 and intermediate pattern metal layer 20 be gold, bismuth, aluminium, titanium, NiCr or on
State the alloy of two or more metals in metal.
The material of the dielectric layer 21 is silicon nitride, silica, silicon or polyimides.
Based on identical inventive concept, the tunable metamaterial structure based on Mechanical Moving that the present invention also provides a kind of
Production method fixes graphic structure 1 according to first making, then makes metamaterial structure 2, then makes fixed bin 3, will fixed figure
Structure 1 and metamaterial structure 2 are set in fixed bin, the Micro displacement controller 4 of assembling are arranged outside fixed bin 3, so that microbit
U-shaped framework one end of shift controller 4 and fixed bin 3 are fixed, the rotary shaft and Meta Materials of the micrometer caliper of the U-shaped framework other end
Structure 2 contacts, and makes the metamaterial structure and moves along the opposite direction of first side, the second side of fixed bin, so that fixed
Graphic structure and metamaterial structure generate opposite micro-displacement.
Specifically, as shown in Figure 3a, the making step of fixed graphic structure: inorganic polymer film 12 is fixed or deposited
In on glass or silicon base；Top-level metallic film is prepared on inorganic polymer film 12 using evaporation, magnetic control detection method；It is pushing up
Optical graving makes Meta Materials figure on layer metallic film, and using etching technics that top-level metallic is Film patterning, forms top layer
Patterned metal layer 11, by inorganic polymer film 12 and above top-level graphical metal layer 11 from glass or silicon base
It shifts and conforms on high transmittance substrate 10, form fixed graphic structure 1.Wherein, by top-level graphical metal layer 11 and height
Transmitance substrate 10 is bonded.
Specifically, by adjusting technological parameter, control top-level metallic film thickness is 100nm-500nm.Using etching work
Skill is Film patterning by top-level metallic, and etching solution is phosphoric acid solution, and control technological parameter makes it just will be with a thickness of 100nm-
The top-level metallic film of 500nm has just been etched without etching into inorganic polymer film layer 12, forms top-level graphicalization gold
Belong to layer 11.After being bonded top-level graphical metal layer 11 with high transmittance substrate 10, by the top-level graphicalization gold of production number
Belong to the part that layer is formed with homopolar polymer to be cleaned.
Then, as shown in Figure 3b, the making step of metamaterial structure: preparing underlying metal film layer 22 in substrate 23,
PECVD, evaporation, spin coating preparation media layer 21 are used on underlying metal film layer 22；Using evaporation, magnetic control on dielectric layer 21
Sputtering method makes metallic intermediate layer film, and carries out figure to middle layer metallic film using photoetching and reactive ion etching process
Change, forms intermediate pattern metal layer 20, metamaterial structure 2 is integrally formed.
Specifically, underlying metal film layer 22 is prepared using evaporation, magnetron sputtering method in substrate 23, by adjusting technique
Parameter, control the underlying metal film layer 22 with a thickness of 100nm-500nm, on underlying metal film layer 22 using PECVD,
Evaporation, spin coating preparation media layer 21, control dielectric layer film thickness are 1 μm -50 μm.Using in evaporation, magnetron sputtering method preparation
Interbed metallic film controls it with a thickness of 10nm -300nm.Using photoetching and the graphical middle layer gold of reactive ion etching process
Belong to film, active etching agent is BCl in etching gas3And Cl2；Neutral gas N2Or CH4, BCl is set2And Cl2Flow-rate ratio be
10:30~90:10, radio-frequency power are 200~800W, and chamber pressure is 2~10Pa, eventually form metamaterial structure 2.
The graphic structure of above-mentioned top-level graphical metal layer 11 and intermediate pattern metal layer 20 matches, specific as schemed
Shown in 4A- Fig. 4 E, Fig. 4 F- Fig. 4 J, wherein Fig. 4 A- Fig. 4 E is the patterned structures of top-level graphical metal layer 11, Fig. 4 F- figure
4J is the patterned structures of corresponding intermediate pattern metal layer 20, is specifically corresponded, that is to say, that if top-level graphical
Change metal layer 11 using patterned structures shown in Fig. 4 A, then corresponding intermediate pattern metal layer 20 is corresponding using shown in Fig. 4 F
Patterned structures, and so on, be it is one-to-one, for generating the RESONANCE ABSORPTION of different-waveband after relative displacement.
Then, it is the making step of fixed bin 3, is determined and fixed according to the size of fixed graphic structure 1 and metamaterial structure 2
The top end opening size and first side bore size of the frame of box 3, so that metamaterial structure 2 is just from top end opening or first
Lateral opening hole is put into fixed bin 3, and fixed graphic structure 1 is just fixed at top end opening.
Finally, the assembling of Micro displacement controller 4: Micro displacement controller 4 includes 41 one end of U-shaped framework 41 and U-shaped framework
Micrometer caliper 42,41 other end of U-shaped framework are fixed on the second side in 3 outside of fixed bin, the rotation of micrometer caliper 42
Axis is in contact with metamaterial structure 2, which controls metamaterial structure 2 along the first of fixed bin 3 by rotary shaft
The opposite direction of side, second side is mobile, so that fixed graphic structure 1 and metamaterial structure 2 generate opposite micro-displacement, reaches
Tune the purpose of the tunable metamaterial resonance frequency based on Mechanical Moving.
Specifically, as shown in Fig. 5 a- Fig. 5 c, with the patterned structures of top-level graphical metal layer 11 be Fig. 4 C shown in, in
Between patterned metal layer 20 patterned structures be shown in Fig. 4 c for, it can be seen that the mobile side of specific metamaterial structure 2
To, be illustrated as top view, specifically, in Fig. 5 a can through high transmittance substrate 10 see top-level graphical metal layer 11 and
Following inorganic polymer film layer 12, in Fig. 5 b it can be seen that the intermediate pattern metal layer 20 of metamaterial structure 2 and under
The dielectric layer 21 in face.In this way, the moving direction of specific metamaterial structure 2 is as shown in Figure 5 c.
Due under the action of Micro displacement controller 4 pushes metamaterial structure 2, so that metamaterial structure 2 moves horizontally,
The relatively fixed graphic structure 1 of vertical direction realizes the tunable type Meta Materials based on Mechanical Moving without distance change
The tuning of resonance frequency is absorbed, specific tuning absorption curve is as shown in Figure 6.
The foregoing is merely the embodiment of the present invention, are not intended to limit the scope of the invention, all to utilize the present invention
Equivalent structure or equivalent flow shift made by specification and accompanying drawing content is applied directly or indirectly in other relevant technologies
Field is included within the scope of the present invention.
Claims (9)
1. a kind of production method of the tunable metamaterial structure based on Mechanical Moving, which is characterized in that structure includes: fixed figure
Shape structure, metamaterial structure, fixed bin and Micro displacement controller；
The fixed bin includes top end opening, in the frame of first side aperture, and the metamaterial structure is placed in the fixation
In box, the top end opening of the fixed graphic structure insertion fixed bin is fixed, and the Micro displacement controller includes U-shaped framework
With the micrometer caliper of U-shaped framework one end, the U-shaped framework other end is fixed on the second side on the outside of fixed bin, and spiral is surveyed
The rotary shaft of micro- device is in contact with metamaterial structure, and the micrometer caliper controls the metamaterial structure along solid by rotary shaft
The opposite direction movement of first side, the second side of box is determined, so that fixed graphic structure and metamaterial structure generation are relatively micro-
Displacement；
Production method includes following content:
The making step of fixed graphic structure: inorganic polymer film is fixed or is deposited on glass or silicon base；Using steaming
Hair, magnetron sputtering method prepare top-level metallic film on inorganic polymer film；The photoetching making on the top-level metallic film
Meta Materials figure out, and it is using etching technics that the top-level metallic is Film patterning, top-level graphical metal layer is formed, by nothing
Machine thin polymer film and more than top-level graphical metal layer shifted from glass or silicon base and conform to high transmittance base
On piece forms fixed graphic structure；
The making step of metamaterial structure: preparing underlying metal film layer in substrate, adopts on the underlying metal film layer
With PECVD, evaporation, spin coating preparation media layer；It is thin using evaporation, magnetron sputtering method production metallic intermediate layer on the dielectric layer
Film, and the metallic intermediate layer film is patterned using photoetching and reactive ion etching process, form intermediate pattern
Metamaterial structure is integrally formed in metal layer；
The making step of fixed bin: according to the size of fixed graphic structure and metamaterial structure, the top of the frame of fixed bin is determined
End opening size and first side bore size, so that the metamaterial structure is just opened from the top end opening or first side
Hole is put into fixed bin, and the fixed graphic structure is just fixed at top end opening；
The assembling of Micro displacement controller: Micro displacement controller includes the micrometer caliper of U-shaped framework and U-shaped framework one end, the U
The type frame other end is fixed on the second side on the outside of fixed bin, and the rotary shaft of micrometer caliper is in contact with metamaterial structure,
The micrometer caliper controls the metamaterial structure side opposite along first side, the second side of fixed bin by rotary shaft
To movement, so that fixed graphic structure and metamaterial structure generate opposite micro-displacement.
2. the production method of the tunable metamaterial structure according to claim 1 based on Mechanical Moving, which is characterized in that
The fixed graphic structure includes high transmittance substrate, top-level graphical metal layer and inorganic polymer film from top to bottom
Layer.
3. the production method of the tunable metamaterial structure according to claim 2 based on Mechanical Moving, which is characterized in that
The metamaterial structure includes substrate, underlying metal film layer, dielectric layer and intermediate pattern metal layer from the bottom to top.
4. the production method of the tunable metamaterial structure according to claim 3 based on Mechanical Moving, which is characterized in that
The patterned structures of the top-level graphical metal layer are adapted with the patterned structures of intermediate pattern metal layer, for opposite
The RESONANCE ABSORPTION of different-waveband is generated after displacement.
5. the production method of the tunable metamaterial structure according to claim 2 based on Mechanical Moving, which is characterized in that
The top-level graphical metal layer thickness is 100nm-500nm.
6. the production method of the tunable metamaterial structure according to claim 3 based on Mechanical Moving, which is characterized in that
For the underlying metal film layer with a thickness of 100nm-500nm, the thickness of dielectric layers is 1 μm -50 μm.
7. the production method of the tunable metamaterial structure according to claim 3 based on Mechanical Moving, which is characterized in that
The intermediate pattern metal layer thickness is 10nm-300nm.
8. the production method of the tunable metamaterial structure according to claim 3 based on Mechanical Moving, which is characterized in that
The material of the underlying metal film layer and intermediate pattern metal layer is in gold, bismuth, aluminium, titanium, NiCr or above-mentioned metal
The alloy of two or more metals.
9. the production method of the tunable metamaterial structure according to claim 3 based on Mechanical Moving, which is characterized in that
The material of the dielectric layer is silicon nitride, silica, silicon or polyimides.
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| CN108155446B (en) * | 2018-02-09 | 2020-06-30 | 中国计量大学 | Adjustable dual-frequency metamaterial filter |
| CN110690576B (en) * | 2019-09-03 | 2021-08-17 | 北京航空航天大学青岛研究院 | Device and method for realizing electromagnetic wave modulation based on metamaterial three-dimensional structure |
| CN113311598A (en) * | 2021-06-03 | 2021-08-27 | 桂林电子科技大学 | Coherent modulation optical switch based on asymmetric open slot metamaterial |
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| CN103035998A (en) * | 2011-09-30 | 2013-04-10 | 深圳光启高等理工研究院 | Resonant cavity |
| CN103474727A (en) * | 2013-09-14 | 2013-12-25 | 电子科技大学 | Multi-layer metamaterial unit structure and preparation and regulation method thereof |
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| CN103035998A (en) * | 2011-09-30 | 2013-04-10 | 深圳光启高等理工研究院 | Resonant cavity |
| CN103474727A (en) * | 2013-09-14 | 2013-12-25 | 电子科技大学 | Multi-layer metamaterial unit structure and preparation and regulation method thereof |
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