CN107287569A - A kind of optical cable and preparation method thereof - Google Patents
A kind of optical cable and preparation method thereof Download PDFInfo
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- CN107287569A CN107287569A CN201710416895.0A CN201710416895A CN107287569A CN 107287569 A CN107287569 A CN 107287569A CN 201710416895 A CN201710416895 A CN 201710416895A CN 107287569 A CN107287569 A CN 107287569A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0664—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
Abstract
The present invention relates to a kind of optical cable and preparation method thereof; MgO protective films and BCN protective films are sequentially depositing on optical cable from inside to outside; obtain the optical cable with BCN/MgO double shielding films, thickness 100nm~200nm of MgO protective films, thickness 200nm~400nm of BCN protective films；B, C, N molar concentration rate of the BCN protective films are 1~3：2~5：10~20；Its preparation method：After optical cable wiped clean, nitrogen drying；Deposition prepares MgO protective films on optical cable, and BCN protective films are deposited on the basis of MgO protective films；Obtain BCN/MgO double shielding films；The present invention deposits high-quality BCN/MgO protective films, BCN/MgO films have acid and alkali-resistance, anticorrosive using the sputtering technology of the low temperature depositing accurately controlled in cable surface, largely mitigates the weight of optical cable protecting sleeve.
Description
Technical field
The invention belongs to thin-film material deposition preparation field, more particularly to a kind of optical cable and preparation method thereof.
Background technology
Tri- kinds of elements of B, C, N can form a variety of covalent bonded materials, including simple substance and compound.Such as diamond, diamond-like
Stone carbon film (DLC), cubic boron nitride (c-BN), carbon-nitrogen material (CxN) and boron carbide (B4C) etc., these materials have excellent
Physics and chemical characteristic, be always the focus of materialogy research in recent years.Based on to the extensive of BCN systems simple substance and binary material
Research, new BCN ternary materials cause people's extensive concern.In view of the above feature that graphite and boron nitride have, people
Attempt to synthesize a kind of new ternary compound BCN, it is desirable to which this material there can be the adjustable performance between C and BN,
The comprehensive advantage of the two.Wish that its electric conductivity is semiconductor or semimetal, by changing film between graphite and h-BN
Component, the energy gap of the compound has adjustability；Wish that it is mingled with property adjustable between graphite and h-BN；Wish it
Mechanical performance is between diamond and c-BN, high rigidity, high-wearing feature both with diamond, again excellent with c-BN
High-temperature behavior and good chemical inertness, and the internal stress of film can be reduced.As can be seen here, no matter as functional coating also
It is hard coat, BCN materials all have very big attraction to researcher.Then BCN materials have adjustable comprehensive as one kind
Closing the new material of premium properties turns into the study hotspot of materialogy, and is posted hope applied to many fields.
Though traditional PVC sheath has resistance to flame-retarding power, its humidity resistance is poor, should not be used in outdoor.It is reported that external
The leading in cable or lower beam optical cable of indoor and outdoor dual-purpose are developed, they be not only resistant to outdoor low temperature and ultraviolet radiation but also energy
It is fire-retardant and be easy to bending connect up.This optical cable is blocked water and low-smoke non-halogen flame-retardant shield using PVC tight tube fibers, water swelling dried bean noodles formula
Set.Domestic research is still within backward state at present.
The content of the invention
The technical problems to be solved by the invention are to provide a kind of optical cable and preparation method thereof.The present invention is splashed using magnetic control
Jet device low temperature depositing BCN/MgO double shielding films on cable surface, the BCN/MgO double shielding films have acidproof
Alkali, anticorrosive, the weight of conventional cable protective case before largely alleviating makes its convenient in carrying, and protect with optical cable
The effect of sheath.
The present invention is achieved by the following technical solutions：
MgO protective films and BCN protective films are sequentially depositing from inside to outside on a kind of optical cable, the optical cable, are had
The optical cable of BCN/MgO double shielding films, thickness 100nm~200nm of MgO protective films, the thickness of BCN protective films
200nm~400nm.
Further, B, C, N molar concentration rate of the BCN protective films are 1~3：2~5：10~20.
A kind of preparation method of optical cable, this method includes the steps：
1) by after optical cable wiped clean, nitrogen is dried up；
2) BCN/MgO double shielding films are prepared in cable surface deposition：Take step 1) in cable surface deposition prepare
MgO protective films, continue to deposit preparation BCN protective films on the basis of MgO shield thin-film materials, finally give with BCN/
The optical cable of MgO double shielding films.
Further, the preparation MgO protective films, MgO protections are prepared using magnetron sputtering apparatus in cable surface deposition
Film, its reaction condition and experiment parameter are：Using MgO of high purity as sputtering target material, high-purity oxygen is passed through, is evacuated down to
10-3Pa~10-4Between pa, oxygen flow is 80~120sccm, and argon flow amount is 40~60sccm, and oxygen is with argon flow amount
2：1~3：1,55~65min of sputtering time, 50~55 DEG C of temperature；Obtain MgO protective films.
Further, the preparation BCN protective films, are deposited on the basis of MgO protective films using magnetron sputtering apparatus
BCN protective films are prepared, its reaction condition and experiment parameter are：Continue to be evacuated down to 10-3Pa~10-4Between pa, with high-purity B
For sputtering target material, its nitrogen flow is 80sccm~300sccm, and its methane gas flow is 20sccm~100sccm, its methane
Gas and nitrogen flow ratio are CH4:N2=1:3~1:9, spray time 10min~60min, spraying temperature are 30~50 DEG C,
Obtain BCN protective film materials.
Further, the thickness of the MgO protective films is 100nm~200nm, the thickness of BCN protective films for 200nm~
400nm。
Further, B, C, N molar concentration rate of the BCN protective films are 1~3：2~5：10~20.
Compared with prior art, beneficial effect is the present invention：
The present invention uses magnetron sputtering apparatus low temperature depositing BCN/MgO double shielding films on cable surface, using can
The sputtering technology of the low temperature depositing accurately controlled, deposition prepares high-quality BCN/MgO double shieldings film on optical cable；Should
BCN/MgO double shielding films have acid and alkali-resistance, anticorrosive, largely alleviate the weight of conventional cable protective case, make it
Convenient in carrying, and with the effect of cable protection layer；To the optical cable based on excellent fire retarding performance and excellent corrosion resistance
There is very big Research Significance Deng industrialization.
Brief description of the drawings
The surface topography that Fig. 1 analyzes for the BCN/MgO double shielding films atomic force of embodiment 1.
Fig. 2 is the BCN film infrared spectrum for the embodiment 1,2,5 that the inventive method is obtained.
Embodiment
MgO protective films and BCN protective films are sequentially depositing from inside to outside on a kind of optical cable, the optical cable, are had
The optical cable of BCN/MgO double shielding films, thickness 100nm~200nm of MgO protective films, the thickness of BCN protective films
200nm~400nm.B, C, N molar concentration rate of the BCN protective films are 1~3：2~5：10~20.
With reference to specific embodiment, the present invention will be described in further detail.
Embodiment 1
1) by after optical cable wiped clean, nitrogen is dried up；
2) BCN/MgO double shielding films are prepared in cable surface deposition, deposition prepares MgO protective films first；Using
Magnetron sputtering apparatus deposition prepares MgO protective films, and its reaction condition and experiment parameter are：Sputtering target is used as using MgO of high purity
Material, high-purity MgO target purity is 99.99%, is passed through high-purity oxygen, is evacuated down to 10-4Pa, oxygen flow is 120sccm, argon
Throughput is 40sccm, and the purity of oxygen is 99.99%, and the purity of argon gas is 99.99%, and oxygen is 3 with argon flow amount：1, oxygen
Gas is with argon flow amount by mass flowmenter control, sputtering time 60min, temperature 50 C；Obtain MgO protective films；MgO is protected
The thickness of film is 100nm；
On the basis of MgO protective films using magnetron sputtering apparatus deposition prepare BCN protective films, its reaction condition and
Experiment parameter is：Continue to vacuumize 10-4Pa, using high-purity B as sputtering target material, high-purity B sputtering target materials purity is 99.99%, its nitrogen
Throughput is 80sccm, and the purity of nitrogen is 99.99%, and its methane gas flow is 20sccm, and the purity of methane gas is
99.99%, its methane gas and nitrogen flow ratio are CH4:N2=1:4, nitrogen is with methane gas flow by mass flowmenter
Control, spray time 30min, spraying temperature is 40 DEG C, obtains BCN protective films；The thickness of BCN protective films is 200nm；
Obtain the optical cable with BCN/MgO double shielding films.
Experiment uses AFM (AFM) test equipments of model Picoscan 2500 to embodiment 1 after terminating
BCN/MgO double shielding film samples are tested analysis；Shown in its result figure 1, the BCN/MgO double shieldings prepared are reacted
Film surface is very smooth, without obvious defect, and crystal grain and crystal boundary boundary are clear, test its surface Root Mean Square flatness in nanometer
Rank；Experimental result illustrates that the BCN/MgO double shielding film sample surface topographies prepared are very excellent.
Embodiment 2
1) by after optical cable wiped clean, nitrogen is dried up；
2) BCN/MgO double shielding films are prepared in cable surface deposition, deposition prepares MgO protective films first；Using
Magnetron sputtering apparatus deposition prepares MgO protective films, and its reaction condition and experiment parameter are：Sputtering target is used as using MgO of high purity
Material, high-purity MgO target purity is 99.99%, is passed through high-purity oxygen, is evacuated down to 10-3Pa, oxygen flow is 80sccm, argon
Throughput is 40sccm, and the purity of oxygen is 99.99%, and the purity of argon gas is 99.99%, and oxygen is 2 with argon flow amount：1, oxygen
Gas is with argon flow amount by mass flowmenter control, sputtering time 55min, 55 DEG C of temperature；Obtain MgO protective films；MgO is protected
The thickness of film is 120nm；
On the basis of MgO protective films using magnetron sputtering apparatus deposition prepare BCN protective films, its reaction condition and
Experiment parameter is：Continue to vacuumize 10-3Pa, using high-purity B as sputtering target material, high-purity B sputtering target materials purity is 99.99%, its nitrogen
Throughput is 120sccm, and the purity of nitrogen is 99.99%, and its methane gas flow is 40sccm, and the purity of methane gas is
99.99%, its methane gas and nitrogen flow ratio are CH4:N2=1:3, nitrogen is with methane gas flow by mass flowmenter
Control, spray time 10min, spraying temperature is 30 DEG C, obtains BCN protective films；The thickness of BCN protective films is 200nm；
Obtain the optical cable with BCN/MgO double shielding films.
Embodiment 3
1) by after optical cable wiped clean, nitrogen is dried up；
2) BCN/MgO double shielding films are prepared in cable surface deposition, deposition prepares MgO protective films first；Using
Magnetron sputtering apparatus deposition prepares MgO protective films, and its reaction condition and experiment parameter are：Sputtering target is used as using MgO of high purity
Material, high-purity MgO target purity is 99.99%, is passed through high-purity oxygen, is evacuated down to 10-3Pa, oxygen flow is 120sccm, argon
Throughput is 60sccm, and the purity of oxygen is 99.99%, and the purity of argon gas is 99.99%, and oxygen is 2 with argon flow amount：1, oxygen
Gas is with argon flow amount by mass flowmenter control, sputtering time 55min, temperature 50 C；Obtain MgO protective film materials；MgO
The thickness of protective film is 150nm；
On the basis of MgO protective films using magnetron sputtering apparatus deposition prepare BCN protective films, its reaction condition and
Experiment parameter is：Continue to vacuumize 10-3Pa, using high-purity B as sputtering target material, high-purity B sputtering target materials purity is 99.99%, its nitrogen
Throughput is 300sccm, and the purity of nitrogen is 99.99%, and its methane gas flow is 33.3sccm, and the purity of methane gas is
99.99%, its methane gas and nitrogen flow ratio are CH4:N2=1:9, nitrogen is with methane gas flow by mass flowmenter
Control, spray time 60min, spraying temperature is 50 DEG C, obtains BCN protective films；The thickness of BCN protective films is 250nm；
Obtain the optical cable with BCN/MgO double shielding films.
Embodiment 4
1) by after optical cable wiped clean, nitrogen is dried up；
2) BCN/MgO double shielding films are prepared in cable surface deposition, deposition prepares MgO protective films first；Using
Magnetron sputtering apparatus deposition prepares MgO protective films, and its reaction condition and experiment parameter are：Sputtering target is used as using MgO of high purity
Material, high-purity MgO target purity is 99.99%, is passed through high-purity oxygen, is evacuated down to 10-4Pa, oxygen flow is 120sccm, argon
Throughput is 40sccm, and the purity of oxygen is 99.99%, and the purity of argon gas is 99.99%, and oxygen is 3 with argon flow amount：1, oxygen
Gas is with argon flow amount by mass flowmenter control, sputtering time 60min, temperature 50 C；Obtain MgO protective film materials；MgO
The thickness of protective film is 200nm；
On the basis of MgO protective films using magnetron sputtering apparatus deposition prepare BCN protective films, its reaction condition and
Experiment parameter is：Continue to vacuumize 10-4Pa, using high-purity B as sputtering target material, high-purity B sputtering target materials purity is 99.99%, its nitrogen
Throughput is 200sccm, and the purity of nitrogen is 99.99%, and its methane gas flow is 50sccm, and the purity of methane gas is
99.99%, its methane gas and nitrogen flow ratio are CH4:N2=1:4, nitrogen is with methane gas flow by mass flowmenter
Control, spray time 60min, spraying temperature is 45 DEG C, obtains BCN protective films；The thickness of BCN protective films is 300nm；
Obtain the optical cable with BCN/MgO double shielding films.
Embodiment 5
1) by after optical cable wiped clean, nitrogen is dried up；
2) BCN/MgO double shielding films are prepared in cable surface deposition, deposition prepares MgO protective films first；Using
Magnetron sputtering apparatus deposition prepares MgO protective films, and its reaction condition and experiment parameter are：Sputtering target is used as using MgO of high purity
Material, high-purity MgO target purity is 99.99%, is passed through high-purity oxygen, is evacuated down to 1*10-4Pa, oxygen flow is 100sccm,
Argon flow amount is 50sccm, and the purity of oxygen is 99.99%, and the purity of argon gas is 99.99%, and oxygen is 2 with argon flow amount：1,
Oxygen is with argon flow amount by mass flowmenter control, sputtering time 60min, temperature 50 C；Obtain MgO protective films；MgO is protected
The thickness for protecting film is 200nm；
On the basis of MgO protective films using magnetron sputtering apparatus deposition prepare BCN protective films, its reaction condition and
Experiment parameter is：Continue to vacuumize 1*10-4Pa, using high-purity B as sputtering target material, high-purity B sputtering target materials purity is 99.99%, its
Nitrogen flow is 300sccm, and the purity of nitrogen is 99.99%, and its methane gas flow is 100sccm, the purity of methane gas
For 99.99%, its methane gas and nitrogen flow ratio are CH4:N2=1:3, nitrogen is with methane gas flow by mass flow
Meter control, spray time 60min, spraying temperature is 50 DEG C, obtains BCN protective films；The thickness of BCN protective films is 400nm；
Obtain the optical cable with BCN/MgO double shielding films.
Experiment terminate after using NEXUS types it is infrared/gas-chromatography be combined test system to BCN/MgO double shielding film samples
The embodiments 1,2,5 of product is tested analysis；Shown in its result figure 2, by Fig. 2 infrared spectrums with sputtering BCN various concentrations
Ratio change curve map, the corresponding peak occurred following absorption peak, 1100cm-1 at is at B-C keys, 1300cm-1 in figure
C-N keys, the B-N keys at 1400cm-1, the C=C keys at 1600cm-1 and the C ≡ N keys at 2200cm-1.Experimental result table
It is bright, tri- kinds of atoms at suitable temperatures of B, C, N chemical combination of atom level, B, C, N concentration ratio of BCN protective films under three kinds of different preparation conditions
For 1~3：2~5：10~20, that is, prepare the optical cable sample of the BCN/MgO double shielding films with excellent performance.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention
Any modifications, equivalent substitutions and improvements made within refreshing and principle etc., should be included in the scope of the protection.
Claims (7)
1. a kind of optical cable, it is characterised in that be sequentially depositing MgO protective films and BCN protective films on the optical cable from inside to outside,
Obtain the optical cable with BCN/MgO double shielding films, thickness 100nm~200nm of MgO protective films, BCN protective films
Thickness 200nm~400nm.
2. a kind of optical cable according to claim 1, it is characterised in that B, C, N molar concentration rate of the BCN protective films is
1~3：2~5：10~20.
3. a kind of preparation method of optical cable, it is characterised in that this method includes the steps：
1) by after optical cable wiped clean, nitrogen is dried up；
2) BCN/MgO double shielding films are prepared in cable surface deposition：Take step 1) in cable surface deposition prepare MgO protect
Film is protected, continues to deposit preparation BCN protective films on the basis of MgO shield thin-film materials, finally gives double-deck with BCN/MgO
The optical cable of protective film.
4. a kind of preparation method of optical cable according to claim 3, it is characterised in that the preparation MgO protective films, is used
Magnetron sputtering apparatus prepares MgO protective films in cable surface deposition, and its reaction condition and experiment parameter are：With MgO of high purity
As sputtering target material, high-purity oxygen is passed through, 10 are evacuated down to-3Pa~10-4Between pa, oxygen flow is 80~120sccm,
Argon flow amount is 40~60sccm, and oxygen is 2 with argon flow amount：1~3：1,55~65min of sputtering time, 50~55 DEG C of temperature；
Obtain MgO protective films.
5. a kind of preparation method of optical cable according to claim 3, it is characterised in that the preparation BCN protective films,
BCN protective films, its reaction condition and experiment parameter are prepared using magnetron sputtering apparatus deposition on the basis of MgO protective films
For：Continue to be evacuated down to 10-3Pa~10-4Between pa, using high-purity B as sputtering target material, its nitrogen flow be 80sccm~
300sccm, its methane gas flow is 20sccm~100sccm, and its methane gas and nitrogen flow ratio are CH4:N2=1:3
~1:9, spray time 10min~60min, spraying temperature are 30~50 DEG C, obtain BCN protective film materials.
6. a kind of preparation method of optical cable according to claim 3, it is characterised in that the thickness of the MgO protective films is
The thickness of 100nm~200nm, BCN protective film is 200nm~400nm.
7. a kind of preparation method of optical cable according to claim 3, it is characterised in that B, C, N of the BCN protective films rub
Your concentration ratio is 1~3：2~5：10~20.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109921981A (en) * | 2019-01-31 | 2019-06-21 | 沈阳工程学院 | A kind of information transmitting methods and system based on communication interface |
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| CN1317102A (en) * | 1998-07-23 | 2001-10-10 | 塞德拉公司 | Optical fiber cable for use in harsh environments |
| CN202383340U (en) * | 2011-12-29 | 2012-08-15 | 昆山蓝岭科技有限公司 | Multilayer structure of optical cable |
| CN103033894A (en) * | 2011-09-30 | 2013-04-10 | 中国海洋石油总公司 | Cable and manufacture method thereof |
| CN204347322U (en) * | 2015-01-14 | 2015-05-20 | 东营市泰德线缆有限公司 | A kind of optical fiber logging cable |
| CN106556898A (en) * | 2015-09-25 | 2017-04-05 | 国网辽宁省电力有限公司本溪供电公司 | A kind of optical cable insulating fire resistant coating spraying coating process |
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2017
- 2017-06-06 CN CN201710416895.0A patent/CN107287569B/en active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1317102A (en) * | 1998-07-23 | 2001-10-10 | 塞德拉公司 | Optical fiber cable for use in harsh environments |
| CN103033894A (en) * | 2011-09-30 | 2013-04-10 | 中国海洋石油总公司 | Cable and manufacture method thereof |
| CN202383340U (en) * | 2011-12-29 | 2012-08-15 | 昆山蓝岭科技有限公司 | Multilayer structure of optical cable |
| CN204347322U (en) * | 2015-01-14 | 2015-05-20 | 东营市泰德线缆有限公司 | A kind of optical fiber logging cable |
| CN106556898A (en) * | 2015-09-25 | 2017-04-05 | 国网辽宁省电力有限公司本溪供电公司 | A kind of optical cable insulating fire resistant coating spraying coating process |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109921981A (en) * | 2019-01-31 | 2019-06-21 | 沈阳工程学院 | A kind of information transmitting methods and system based on communication interface |
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