CN107189511A - A kind of preparation method of photo resistance polyimide resin coating - Google Patents

A kind of preparation method of photo resistance polyimide resin coating Download PDF

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Publication number
CN107189511A
CN107189511A CN201710426929.4A CN201710426929A CN107189511A CN 107189511 A CN107189511 A CN 107189511A CN 201710426929 A CN201710426929 A CN 201710426929A CN 107189511 A CN107189511 A CN 107189511A
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CN
China
Prior art keywords
polyimide resin
resin coating
stirring
photo resistance
parts
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Pending
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CN201710426929.4A
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Chinese (zh)
Inventor
阴卫华
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Anhui Lattice Seoul Electronics Co Ltd
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Anhui Lattice Seoul Electronics Co Ltd
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Priority to CN201710426929.4A priority Critical patent/CN107189511A/en
Publication of CN107189511A publication Critical patent/CN107189511A/en
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/18Fireproof paints including high temperature resistant paints

Abstract

The invention discloses a kind of preparation method of photo resistance with polyimide resin coating, comprise the following steps:By polyimide resin solution, graphite composite, the pyrrolidones of N methyl 2, N, N dimethylformamides mix and obtain prefabricated material;Tetraethyl orthosilicate is added into prefabricated material to be well mixed, methyl methacrylate, the ethoxy silane of vinyl three is added, and heating stirring adds nanometer aluminium powder, continues to stir, be filtrated to get photo resistance polyimide resin coating.Gained polyimide resin coating of the invention, hardness is high, and intensity is high, and insulation resistance can be excellent, and resistance to elevated temperatures is outstanding, and can effectively prevent make moist deformation, warpage etc., while technique is simply, it is with low cost.

Description

A kind of preparation method of photo resistance polyimide resin coating
Technical field
The present invention relates to photo resistance technical field, more particularly to a kind of photo resistance system of polyimide resin coating Preparation Method.
Background technology
Polyimide resin has insoluble, infusibility, heat resistance, cold resistance, inoxidizability, radiation resistance, chemical resistance, good Good mechanically and electrically characteristic, therefore be widely used, current resistive surface is sprayed frequently with polyimide resin coating, Particularly there are special applications in some fields of temperature sensor, can be widely applied to electric kettle, water heater and electricity and press.But mesh It is poor to there are pressure-resistant insulating properties in preceding polyimide resin coating, the problem of heat resistance does not reach requirement, it would be highly desirable to solve.
The content of the invention
The technical problem existed based on background technology, the present invention proposes a kind of photo resistance polyimide resin coating Preparation method, gained polyimide resin coating, hardness is high, and intensity is high, and insulation resistance can be excellent, and resistance to elevated temperatures is excellent Show, and can effectively prevent make moist deformation, warpage etc., while technique is simple, it is with low cost.
The present invention proposes a kind of photo resistance preparation method of polyimide resin coating, comprises the following steps:
S1, by polyimide resin solution, graphite composite, METHYLPYRROLIDONE, N,N-dimethylformamide mix stir Mix and obtain prefabricated material;
S2, into prefabricated material add tetraethyl orthosilicate be well mixed, add methyl methacrylate, the ethoxy silane of vinyl three, Heating stirring, adds nanometer aluminium powder, continues to stir, is filtrated to get photo resistance polyimide resin coating.
Preferably, in S1, mixing time is 2-8min, and mixing speed is 2400-2800r/min.
Preferably, in S1, polyimide resin solution, graphite composite, METHYLPYRROLIDONE, N, N- dimethyl The weight ratio of formamide is 50-60:20-40:1-2:150-200.
Preferably, in S1, the solid content of polyimide resin solution is 12-18%.
Preferably, in S1, graphite composite is prepared using following technique:By crystalline flake graphite, nano aluminium oxide, aqueous tristearin Sour magnesium mixed grinding, adds urea liquid, and heating stirring, centrifugation is washed with absolute ethyl alcohol, dried, and adds formaldehyde, stirring Under be added dropwise waterglass thereto, regulation system pH value is 7.8-8.2, and heating stirring adds melamine and continues to stir, uses formic acid Regulation system pH value is 6-6.4, adds polymethylacrylic acid, and heating stirring is cooled down, filtered, and washing is dried to obtain graphite and is combined Thing.
Preferably, in S1, graphite composite is prepared using following technique:By crystalline flake graphite, nano aluminium oxide, aqueous tristearin Sour magnesium mixed grinding 5-10min, addition concentration is 5-8mol/L urea liquids, is warming up to 80-88 DEG C of stirring 15-25min, from The heart, is washed with absolute ethyl alcohol, is dried, and adds and waterglass is added dropwise under formaldehyde, stirring thereto, and regulation system pH value is 7.8- 8.2,85-95 DEG C of stirring 10-18min is warming up to, melamine is added and continues to stir 15-25min, with formic acid regulation system pH value For 6-6.4, polymethylacrylic acid is added, 140-180 DEG C of stirring 2-4min is warming up to, mixing speed is 420-480r/min, cold But, filter, washing is dried to obtain graphite composite.
Preferably, in S1, graphite composite is prepared using following technique:By weight by 5-15 parts of crystalline flake graphites, 5-10 Part nano aluminium oxide, 2-4 parts of aqueous magnesium stearate mixed grinding 5-10min, it is 5-8mol/L urea to add 60-100 parts of concentration Solution, is warming up to 80-88 DEG C of stirring 15-25min, and centrifugation is washed with absolute ethyl alcohol, dried, and adds 60-80 parts of formaldehyde, stirring 2-6 parts of waterglass are added dropwise under state thereto, regulation system pH value is 7.8-8.2, are warming up to 85-95 DEG C of stirring 10-18min, Add 0.5-1.2 parts of melamines to continue to stir 15-25min, be 6-6.4 with formic acid regulation system pH value, add 2-4 parts of poly- first Base acrylic acid, is warming up to 140-180 DEG C of stirring 2-4min, mixing speed is 420-480r/min, is cooled down, and is filtered, and is washed, and is dried Obtain graphite composite.
Preferably, in S2, into prefabricated material, addition tetraethyl orthosilicate is well mixed, and adds methyl methacrylate, ethene The ethoxy silane of base three, is warming up to 140-180 DEG C of stirring 40-50min, adds nanometer aluminium powder, continues to stir 10-20min, stirring temperature Spend for 75-84 DEG C, cross 300-500 mesh filter screens and obtain photo resistance polyimide resin coating.
Preferably, polyimide resin solution, tetraethyl orthosilicate, methyl methacrylate, the ethoxy silane of vinyl three, receive The weight ratio of rice aluminium powder is 50-60:1-5:1-2:1-2:5-12.
Polyimide resin coating obtained by the present invention is coated on single end thermistor, its technique is as follows:
1)Screening is good to have completed single end thermistor;
2)Machine lines up 30-50/row, is then attached on tool, each tool fixes 30;
3)It is placed on paint sprayer platform, it is fixed;
4)Spray painting, painting thickness is in 0.015-0.02mm;
5)Spray painting finished goods is placed in an oven, 180-220 DEG C of baking 0.5-2h;
6)Complete.
The present invention is compounded using polyimide resin with graphite composite, not only light weight, and intensity is high, is insulated pressure-resistant Excellent performance, resistance to elevated temperatures is outstanding, with low cost.In graphite composite, crystalline flake graphite, nano aluminium oxide are in aqueous tristearin Ground under the cooperation of sour magnesium, intercalation is carried out through urea, then compounded with waterglass, acted on by formaldehyde, form network-like build knot Structure, coordinates polymethylacrylic acid cladding, not only quality is extremely light, and electric conductivity is extremely low, and pressure-resistant performance is high;Graphite composite with The compatibility of polyimide resin is high, makes hardness height after present invention solidification, resistance to elevated temperatures is outstanding, and can effectively prevent from making moist Deformation, warpage etc., while technique is simple, it is with low cost., can be effectively equal and graphite composite can effectively promote nanometer aluminium powder to disperse Even to be solidificated in the film for the network structure to be formed, after uniform passivation, Volume Changes are minimum, to exposed metallic cover Afterwards, pressure-resistant insulating properties are fabulous, and film is changed very little, and is less prone to crackle, are not in short circuit phenomenon;And polyimides Resin is combined under the cooperation of the ethoxy silane of vinyl three with tetraethyl orthosilicate, improves the hardness and heat-resisting quantity of whole system Can, coordinate graphite composite effect, on the premise of can keeping hardness, toughness is high, and film resistance to tearing can be extremely excellent.
Gained polyimide resin coating of the invention is resistant to 260-320 DEG C of temperature, and two resistance leads are originally exposed Metal, after spray painting its pressure voltage be 2500V AC, two metal lead wires can be avoided to encounter short circuit phenomenon in operation, Eliminating will also manually cover the cumbersome process of heat-shrinkable T bush when being processed into temperature sensor.
Embodiment
Below, technical scheme is described in detail by specific embodiment.
Embodiment 1
A kind of photo resistance preparation method of polyimide resin coating, comprises the following steps:
S1, by polyimide resin solution, graphite composite, METHYLPYRROLIDONE, N,N-dimethylformamide mix stir Mix and obtain prefabricated material;
S2, into prefabricated material add tetraethyl orthosilicate be well mixed, add methyl methacrylate, the ethoxy silane of vinyl three, Heating stirring, adds nanometer aluminium powder, continues to stir, is filtrated to get photo resistance polyimide resin coating.
Embodiment 2
A kind of photo resistance preparation method of polyimide resin coating, comprises the following steps:
S1, by 50 parts of solid contents be by weight 18% polyimide resin solution, 20 parts of graphite composites, 2 parts of N- methyl- 2-Pyrrolidone, 150 parts of DMFs mix 8min, and mixing speed is 2400r/min, obtains prefabricated material;
S2, add 5 parts of tetraethyl orthosilicates into prefabricated material and be well mixed, add 1 part of methyl methacrylate, 2 parts of vinyl three Ethoxy silane, is warming up to 140 DEG C of stirring 50min, adds 5 parts of nanometer aluminium powders, continues to stir 20min, whipping temp is 75 DEG C, mistake 500 mesh filter screens obtain photo resistance polyimide resin coating.
Embodiment 3
A kind of photo resistance preparation method of polyimide resin coating, comprises the following steps:
S1, by 60 parts of solid contents be by weight 12% polyimide resin solution, 40 parts of graphite composites, 1 part of N- methyl- 2-Pyrrolidone, 200 parts of DMFs mix 2min, and mixing speed is 2800r/min, obtains prefabricated material;
Graphite composite is prepared using following technique:By crystalline flake graphite, nano aluminium oxide, aqueous magnesium stearate mixed grinding, plus Enter urea liquid, heating stirring, centrifugation is washed with absolute ethyl alcohol, dried, and adds under formaldehyde, stirring and water is added dropwise thereto Glass, regulation system pH value is 7.8-8.2, and heating stirring adds melamine and continues to stir, is with formic acid regulation system pH value 6-6.4, adds polymethylacrylic acid, and heating stirring is cooled down, filtered, and washing is dried to obtain graphite composite;
S2, add 1 part of tetraethyl orthosilicate into prefabricated material and be well mixed, add 2 parts of methyl methacrylates, 1 part of vinyl three Ethoxy silane, is warming up to 180 DEG C of stirring 40min, adds 12 parts of nanometer aluminium powders, continues to stir 10min, whipping temp is 84 DEG C, Cross 300 mesh filter screens and obtain photo resistance polyimide resin coating.
Embodiment 4
A kind of photo resistance preparation method of polyimide resin coating, comprises the following steps:
S1, the polyimide resin solution by weight by 52 parts of solid contents for 16%, 25 parts of graphite composites, 1.8 parts of N- first Base -2-Pyrrolidone, 160 parts of DMFs mix 6min, and mixing speed is 2500r/min, obtains prefabricated Material;
Graphite composite is prepared using following technique:By crystalline flake graphite, nano aluminium oxide, aqueous magnesium stearate mixed grinding 8min, addition concentration is 7mol/L urea liquids, is warming up to 84 DEG C of stirring 20min, and centrifugation is washed with absolute ethyl alcohol, dried, plus Enter and waterglass be added dropwise under formaldehyde, stirring thereto, regulation system pH value is 7.8-8.2, be warming up to 90 DEG C of stirring 14min, Add melamine to continue to stir 20min, be 6-6.4 with formic acid regulation system pH value, add polymethylacrylic acid, be warming up to 160 DEG C of stirring 3min, mixing speed is 450r/min, is cooled down, and is filtered, and washing is dried to obtain graphite composite;
S2, add 4 parts of tetraethyl orthosilicates into prefabricated material and be well mixed, add 1.2 parts of methyl methacrylates, 1.8 parts of ethene The ethoxy silane of base three, is warming up to 150 DEG C of stirring 48min, adds 7 parts of nanometer aluminium powders, continue to stir 18min, whipping temp is 78 DEG C, cross 450 mesh filter screens and obtain photo resistance polyimide resin coating.
Embodiment 5
A kind of photo resistance preparation method of polyimide resin coating, comprises the following steps:
S1, the polyimide resin solution by weight by 58 parts of solid contents for 14%, 35 parts of graphite composites, 1.2 parts of N- first Base -2-Pyrrolidone, 180 parts of DMFs mix 4min, and mixing speed is 2600r/min, obtains prefabricated Material;
Graphite composite is prepared using following technique:By weight by 5 parts of crystalline flake graphites, 10 parts of nano aluminium oxides, 2 parts it is aqueous hard Fatty acid magnesium mixed grinding 10min, it is 8mol/L urea liquids to add 60 parts of concentration, is warming up to 80 DEG C of stirring 25min, centrifuges, use Absolute ethyl alcohol is washed, and is dried, and adds under 60 parts of formaldehyde, stirring and 6 parts of waterglass are added dropwise thereto, regulation system pH value is 7.8-8.2, is warming up to 85 DEG C of stirring 18min, adds 0.5 part of melamine and continues to stir 25min, with formic acid regulation system pH value For 6-6.4,2 parts of polymethylacrylic acid are added, 180 DEG C of stirring 2min are warming up to, mixing speed is 480r/min, is cooled down, filtering, Washing, is dried to obtain graphite composite;
S2, add 2 parts of tetraethyl orthosilicates into prefabricated material and be well mixed, add 1.8 parts of methyl methacrylates, 1.2 parts of ethene The ethoxy silane of base three, is warming up to 170 DEG C of stirring 42min, adds 10 parts of nanometer aluminium powders, continue to stir 12min, whipping temp is 82 DEG C, cross 350 mesh filter screens and obtain photo resistance polyimide resin coating.
Embodiment 6
A kind of photo resistance preparation method of polyimide resin coating, comprises the following steps:
S1, the polyimide resin solution by weight by 55 parts of solid contents for 15%, 30 parts of graphite composites, 1.5 parts of N- first Base -2-Pyrrolidone, 170 parts of DMFs mix 5min, and mixing speed is 2550r/min, obtains prefabricated Material;
Graphite composite is prepared using following technique:By weight by 15 parts of crystalline flake graphites, 5 parts of nano aluminium oxides, 4 parts it is aqueous hard Fatty acid magnesium mixed grinding 5min, it is 5mol/L urea liquids to add 100 parts of concentration, is warming up to 88 DEG C of stirring 15min, centrifuges, use Absolute ethyl alcohol is washed, and is dried, and adds under 80 parts of formaldehyde, stirring and 2 parts of waterglass are added dropwise thereto, regulation system pH value is 7.8-8.2, is warming up to 95 DEG C of stirring 10min, adds 1.2 parts of melamines and continues to stir 15min, with formic acid regulation system pH value For 6-6.4,4 parts of polymethylacrylic acid are added, 140 DEG C of stirring 4min are warming up to, mixing speed is 420r/min, is cooled down, filtering, Washing, is dried to obtain graphite composite;
S2, add 3 parts of tetraethyl orthosilicates into prefabricated material and be well mixed, add 1.5 parts of methyl methacrylates, 1.5 parts of ethene The ethoxy silane of base three, is warming up to 160 DEG C of stirring 45min, adds 8 parts of nanometer aluminium powders, continue to stir 15min, whipping temp is 80 DEG C, cross 400 mesh filter screens and obtain photo resistance polyimide resin coating.
Polyimide resin coating obtained by the present embodiment is coated on single end thermistor, its technique is as follows:
1)Screening is good to have completed single end thermistor;
2)Machine lines up 30/row, is then attached on tool, each tool fixes 30;
3)It is placed on paint sprayer platform, it is fixed;
4)Spray painting, painting thickness is in 0.015-0.02mm;
5)Spray painting finished goods is placed in an oven, 200 DEG C of baking 1.5h;
6)Complete.
The foregoing is only a preferred embodiment of the present invention, but protection scope of the present invention be not limited thereto, Any one skilled in the art the invention discloses technical scope in, technique according to the invention scheme and its Inventive concept is subject to equivalent substitution or change, should all be included within the scope of the present invention.

Claims (9)

1. a kind of photo resistance preparation method of polyimide resin coating, it is characterised in that comprise the following steps:
S1, by polyimide resin solution, graphite composite, METHYLPYRROLIDONE, N,N-dimethylformamide mix stir Mix and obtain prefabricated material;
S2, into prefabricated material add tetraethyl orthosilicate be well mixed, add methyl methacrylate, the ethoxy silane of vinyl three, Heating stirring, adds nanometer aluminium powder, continues to stir, is filtrated to get photo resistance polyimide resin coating.
2. the preparation method of photo resistance polyimide resin coating according to claim 1, it is characterised in that in S1, Mixing time is 2-8min, and mixing speed is 2400-2800r/min.
3. the preparation method of photo resistance polyimide resin coating according to claim 1, it is characterised in that in S1, Polyimide resin solution, graphite composite, METHYLPYRROLIDONE, the weight ratio of N,N-dimethylformamide are 50- 60:20-40:1-2:150-200.
4. the preparation method of photo resistance polyimide resin coating according to claim 1, it is characterised in that in S1, The solid content of polyimide resin solution is 12-18%.
5. the preparation method of photo resistance polyimide resin coating according to claim 1, it is characterised in that in S1, Graphite composite is prepared using following technique:By crystalline flake graphite, nano aluminium oxide, aqueous magnesium stearate mixed grinding, urine is added Plain solution, heating stirring, centrifugation is washed with absolute ethyl alcohol, is dried, and adds under formaldehyde, stirring and waterglass is added dropwise thereto, Regulation system pH value is 7.8-8.2, and heating stirring adds melamine and continues to stir, is 6- with formic acid regulation system pH value 6.4, polymethylacrylic acid is added, heating stirring is cooled down, filtered, and washing is dried to obtain graphite composite.
6. the preparation method of photo resistance polyimide resin coating according to claim 1, it is characterised in that in S1, Graphite composite is prepared using following technique:By crystalline flake graphite, nano aluminium oxide, aqueous magnesium stearate mixed grinding 5-10min, Addition concentration is 5-8mol/L urea liquids, is warming up to 80-88 DEG C of stirring 15-25min, and centrifugation is washed with absolute ethyl alcohol, done It is dry, add and waterglass is added dropwise under formaldehyde, stirring thereto, regulation system pH value is 7.8-8.2, is warming up to 85-95 DEG C and stirs 10-18min is mixed, melamine is added and continues to stir 15-25min, be 6-6.4 with formic acid regulation system pH value, add poly- methyl Acrylic acid, is warming up to 140-180 DEG C of stirring 2-4min, mixing speed is 420-480r/min, is cooled down, and is filtered, washing, dry To graphite composite.
7. the preparation method of photo resistance polyimide resin coating according to claim 1, it is characterised in that in S1, Graphite composite is prepared using following technique:By weight by 5-15 parts of crystalline flake graphites, 5-10 parts of nano aluminium oxides, 2-4 parts of water Property magnesium stearate mixed grinding 5-10min, it is 5-8mol/L urea liquids to add 60-100 part concentration, is warming up to 80-88 DEG C and stirs 15-25min is mixed, centrifuges, is washed with absolute ethyl alcohol, is dried, adds under 60-80 parts of formaldehyde, stirring and 2-6 parts is added dropwise thereto Waterglass, regulation system pH value is 7.8-8.2, is warming up to 85-95 DEG C of stirring 10-18min, adds 0.5-1.2 parts of melamines Continue to stir 15-25min, be 6-6.4 with formic acid regulation system pH value, add 2-4 parts of polymethylacrylic acid, be warming up to 140- 180 DEG C of stirring 2-4min, mixing speed is 420-480r/min, is cooled down, and is filtered, and washing is dried to obtain graphite composite.
8. the preparation method of photo resistance polyimide resin coating according to claim 1, it is characterised in that in S2, Tetraethyl orthosilicate is added into prefabricated material to be well mixed, and is added methyl methacrylate, the ethoxy silane of vinyl three, is warming up to 140-180 DEG C of stirring 40-50min, adds nanometer aluminium powder, continues to stir 10-20min, whipping temp is 75-84 DEG C, crosses 300- 500 mesh filter screens obtain photo resistance polyimide resin coating.
9. the preparation method of photo resistance polyimide resin coating according to claim 1, it is characterised in that polyamides is sub- Polyimide resin solution, tetraethyl orthosilicate, methyl methacrylate, the ethoxy silane of vinyl three, the weight ratio of nanometer aluminium powder are 50- 60:1-5:1-2:1-2:5-12.
CN201710426929.4A 2017-06-08 2017-06-08 A kind of preparation method of photo resistance polyimide resin coating Pending CN107189511A (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103897582A (en) * 2012-12-31 2014-07-02 中原工学院 Polyimide coating for thin film solar cell and preparation method thereof
CN105622983A (en) * 2016-02-26 2016-06-01 成都新柯力化工科技有限公司 Method for preparing graphene nanoplatelets special for thermal conductive plastic
CN106065212A (en) * 2016-06-07 2016-11-02 平顶山市美伊金属制品有限公司 A kind of non-stick pan spray paint containing acceptable calcium element

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103897582A (en) * 2012-12-31 2014-07-02 中原工学院 Polyimide coating for thin film solar cell and preparation method thereof
CN105622983A (en) * 2016-02-26 2016-06-01 成都新柯力化工科技有限公司 Method for preparing graphene nanoplatelets special for thermal conductive plastic
CN106065212A (en) * 2016-06-07 2016-11-02 平顶山市美伊金属制品有限公司 A kind of non-stick pan spray paint containing acceptable calcium element

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