CN107144298A - High tolerance grating reading head - Google Patents
High tolerance grating reading head Download PDFInfo
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- CN107144298A CN107144298A CN201710499278.1A CN201710499278A CN107144298A CN 107144298 A CN107144298 A CN 107144298A CN 201710499278 A CN201710499278 A CN 201710499278A CN 107144298 A CN107144298 A CN 107144298A
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- grating
- reading head
- reflective
- imaging
- indication
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- 238000003384 imaging method Methods 0.000 claims abstract description 28
- LFEUVBZXUFMACD-UHFFFAOYSA-H lead(2+);trioxido(oxo)-$l^{5}-arsane Chemical compound [Pb+2].[Pb+2].[Pb+2].[O-][As]([O-])([O-])=O.[O-][As]([O-])([O-])=O LFEUVBZXUFMACD-UHFFFAOYSA-H 0.000 claims abstract description 13
- 239000004065 semiconductor Substances 0.000 claims abstract description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052804 chromium Inorganic materials 0.000 claims description 8
- 239000011651 chromium Substances 0.000 claims description 8
- 238000007747 plating Methods 0.000 claims description 8
- 238000005286 illumination Methods 0.000 claims description 2
- 238000009434 installation Methods 0.000 abstract description 13
- 230000003287 optical effect Effects 0.000 description 11
- 238000006073 displacement reaction Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000011900 installation process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 210000003739 neck Anatomy 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Transform (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention discloses a kind of high tolerance grating reading head, including：Indication grating, reflective key light grid and imaging surface, incident light is irradiated on reflective key light grid, occurs diffraction phenomena at the reflective place of every strip-line pattern, diffraction light interferes imaging at the Talbot planes at indication grating rear with incident light and obtains Talbot imaging surfaces, and signal is received by semiconductor photosensitive element.The present invention can significantly improve the installation tolerance of accurate reflective gratings and reading head, reduce the difficulty of installation and debugging, while it is also ensured that the stability of long-travel grating linear movement pick-up reading.
Description
Technical field
The present invention relates to technical field of electro-optical measurement, more particularly to a kind of high tolerance grating reading head.
Background technology
Optical grid line displacement sensor is mainly made up of reading head and grating scale, and general grating scale is main grating, installed in machine
Fixed on bed lathe bed, reading head is arranged on machine tool movement part, by illuminator, indication grating and the photosensitive member of semiconductor
Part etc. is constituted.Traditional optical grid line displacement sensor, incident light is irradiated on reflective key light grid, in the reflective place's hair of every strip-line pattern
Raw diffraction phenomena, diffraction light interferes imaging at the Talbot planes at indication grating rear with incident light and forms More's bar
Line, is received by semiconductor photosensitive element.Talbot planes are optimal imaging faces, the lower deviation ± δ v scopes on optimal imaging face
Interior, semiconductor photosensitive element can receive Moire fringe information.Due to Moire fringe image-forming principle and semiconductor photosensitive element
The limitation of performance, in optical grid line displacement sensor installation process, the reading gap (grating scale and reading head distance) of optical grating pair
Typically within 1mm, while reading tolerance (the upper and lower deviation that reading head is installed) is 0.15 to 0.2mm.Small reading gap and
Reading tolerance brings high requirement for the installation and debugging of reading head.
In addition, in the measuring instrument and numerical control machine tool applications of big stroke, due to the variable quantity in reading gap to be ensured
In reading range of tolerable variance, to ensure image quality, the linearity requirement to grating scale and reading head installation base surface and guide rail
It is very high.
The content of the invention
The present invention solves the technical problem of a kind of high tolerance grating reading head is provided, by changing indication grating
Thickness, it is not necessary to change the mechanical structure of reading head, so as to obtain high reading tolerance, can be solved accurate reflective well
Grating and reading head install small, harsh to the installation and debugging requirement problem of tolerance.
In order to solve the above technical problems, one aspect of the present invention is：A kind of high tolerance grating reading is provided
Head, including：Indication grating, reflective key light grid and imaging surface, incident light is irradiated on reflective key light grid, anti-in every strip-line pattern
Diffraction phenomena occurs at light, diffraction light interferes imaging at the Talbot planes at indication grating rear with incident light and obtained
Talbot imaging surfaces, signal is received by semiconductor photosensitive element.
In a preferred embodiment of the present invention, described indication grating is dimensional structured phase grating.
In a preferred embodiment of the present invention, the front of described indication grating is chromium plating area, with cyclically-varying
Grating structure, the back side is sine surface.
In a preferred embodiment of the present invention, the front of described indication grating is chromium plating area, with cyclically-varying
Grating structure, the back side is step surface, and the thickness of indication grating is 1-5mm.
The beneficial effects of the invention are as follows：
1st, the present invention can significantly improve the installation tolerance of accurate reflective gratings and reading head, reduce the difficulty of installation and debugging
Degree, while it is also ensured that the stability of long-travel grating linear movement pick-up reading.
2nd, indication grating of the invention is dimensional structured phase grating, and the back side replaces traditional with sinusoidal or step surface
Plane, changes the light path of diffraction light so that have multiple imaging surfaces within the specific limits, semiconductor photosensitive element is in certain limit
It is interior to receive clearly picture signal, it is possible thereby to increase the change of reading head installation site, so as to obtain high peace
Dressing is poor, reduce optical grating pair installation and debugging difficulty and applied to big stroke measuring instrument and Digit Control Machine Tool to install base
The requirement in face.
Brief description of the drawings
Technical scheme in order to illustrate the embodiments of the present invention more clearly, makes required in being described below to embodiment
Accompanying drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the present invention, for
For those of ordinary skill in the art, on the premise of not paying creative work, it can also obtain other according to these accompanying drawings
Accompanying drawing, wherein：
Fig. 1 is optical grating pair optimal imaging schematic diagram；
Fig. 2 is the dimensional structured indication grating that the back side is positive chord plane；
Fig. 3 is that indication grating is dimensional structured phase grating, and the back side replaces the image-forming principle of conventional planar with positive chord plane
Figure；
Fig. 4 is the dimensional structured indication grating that the back side is step surface；
Fig. 5 is that indication grating is dimensional structured phase grating, and the back side replaces the image-forming principle of conventional planar with step surface
Figure；
The mark of each part is as follows in accompanying drawing：1st, indication grating, 2, reflective key light grid, 3, imaging surface.
Embodiment
The technical scheme in the embodiment of the present invention will be clearly and completely described below, it is clear that described implementation
Example is only a part of embodiment of the present invention, rather than whole embodiments.Based on the embodiment in the present invention, this area is common
All other embodiment that technical staff is obtained under the premise of creative work is not made, belongs to the model that the present invention is protected
Enclose.
Fig. 1 to Fig. 5 is referred to, the embodiment of the present invention includes：
As shown in figure 1, a kind of high tolerance grating reading head, including：Indication grating 1, reflective key light grid 2, imaging surface 3, it is incident
Illumination is mapped on reflective key light grid 2, occurs diffraction phenomena at the reflective place of every strip-line pattern, diffraction light is with incident light in indication grating
Imaging is interfered at the Talbot planes at 1 rear form Moire fringe and obtain Talbot imaging surfaces 3, by semiconductor photosensitive element
Receive Moire fringe information.
Talbot planes are optimal imaging faces, on optimal imaging face in the range of lower deviation ± δ v.
As shown in Fig. 2 being dimensional structured indication grating, indication grating 1 is the plating chromium glass of interval projection, and front is plating
Chromium area, with periodically variable grating structure, the back side is sine surface.
As shown in figure 3, when incident light is irradiated on reflective key light grid 2, occurring diffraction at the reflective place of every strip-line pattern shows
As diffraction light passes through indication grating 1, because indication grating 1 is in uneven thickness, and the back side is sine surface, therefore light passes through finger
Show that grating 1 can produce optical path difference, Talbot imaging surfaces 3 are changed into curved surface due to there is the presence of optical path difference through indication grating 1, from
And diffraction light and the Moire fringe of incident light interference imaging formation are distributed on sine surface, optimal imaging face is distributed for curved surface,
There are multiple imaging surfaces within the specific limits, semiconductor photosensitive element can receive Moire fringe information within the specific limits,
So as to improve reading tolerance.
As shown in figure 4, being dimensional structured indication grating, indication grating 1 is the plating chromium glass of interval projection, and front is plating
Chromium area, with periodically variable grating structure, the back side is step surface, and the thickness of indication grating 1 is 1-5mm.
As shown in figure 5, when incident light is irradiated on reflective key light grid 2, occurring diffraction at the reflective place of every strip-line pattern shows
As diffraction light passes through indication grating 1, and because the thickness of indication grating 1 has multiple values, therefore light can be produced through indication grating 1
Optical path difference, Talbot imaging surfaces 3 are distributed in multiple planes due to there is the presence of optical path difference through indication grating, so as to spread out
Penetrate light and the Moire fringe of incident light interference imaging formation is distributed in multiple planes, there are multiple imagings within the specific limits
Face, semiconductor photosensitive element can receive Moire fringe information within the specific limits, so as to improve reading tolerance.
The beneficial effect of the high tolerance grating reading head of the present invention is：The present invention can significantly improve accurate reflective gratings and
The installation tolerance of reading head, reduces the difficulty of installation and debugging, while it is also ensured that long-travel grating linear movement pick-up is read
Several stability.The indication grating of the present invention is dimensional structured phase grating, and the back side replaces tradition with sinusoidal or step surface
Plane, change the light path of diffraction light so that have multiple imaging surfaces within the specific limits, semiconductor photosensitive element is in certain model
Clearly picture signal can be received in enclosing, it is possible thereby to increase the change of reading head installation site, so as to obtain high
Install tolerance, reduce optical grating pair installation and debugging difficulty and applied to big stroke measuring instrument and Digit Control Machine Tool to install
The requirement of basal plane.
Embodiments of the invention are the foregoing is only, are not intended to limit the scope of the invention, it is every to utilize this hair
Equivalent structure or equivalent flow conversion that bright description is made, or directly or indirectly it is used in other related technology necks
Domain, is included within the scope of the present invention.
Claims (4)
1. a kind of high tolerance grating reading head, it is characterised in that including：Indication grating, reflective key light grid and imaging surface, it is incident
Illumination is mapped on reflective key light grid, occurs diffraction phenomena at the reflective place of every strip-line pattern, diffraction light is with incident light in indication grating
Imaging is interfered at the Talbot planes at rear and obtains Talbot imaging surfaces, and signal is received by semiconductor photosensitive element.
2. high tolerance grating reading head according to claim 1, it is characterised in that described indication grating is three-dimensional structure
The phase grating of change.
3. high tolerance grating reading head according to claim 2, it is characterised in that the front of described indication grating is plating
Chromium area, with periodically variable grating structure, the back side is sine surface.
4. high tolerance grating reading head according to claim 2, it is characterised in that the front of described indication grating is plating
Chromium area, with periodically variable grating structure, the back side is step surface, and the thickness of indication grating is 1-5mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710499278.1A CN107144298A (en) | 2017-06-27 | 2017-06-27 | High tolerance grating reading head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710499278.1A CN107144298A (en) | 2017-06-27 | 2017-06-27 | High tolerance grating reading head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107144298A true CN107144298A (en) | 2017-09-08 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710499278.1A Pending CN107144298A (en) | 2017-06-27 | 2017-06-27 | High tolerance grating reading head |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113175881A (en) * | 2021-04-10 | 2021-07-27 | 西安交通大学 | Measurement device for improve grating reading gap tolerance |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4636076A (en) * | 1983-07-30 | 1987-01-13 | Dr. Johannes Heidenhain Gmbh | Displacement measuring apparatus and method |
| US20030002039A1 (en) * | 2000-02-23 | 2003-01-02 | Michael Homer | Opto-electronic scale reading apparatus |
| CN200982859Y (en) * | 2006-12-08 | 2007-11-28 | 华中科技大学 | Large range straight line type phase grating contour measuring shift sensor |
| CN101151519A (en) * | 2005-03-30 | 2008-03-26 | 皇家飞利浦电子股份有限公司 | Optical system with diffraction optical element used for mapping signal light onto a detector |
| CN104040296A (en) * | 2011-11-09 | 2014-09-10 | 齐戈股份有限公司 | Double pass interferometric encoder system |
-
2017
- 2017-06-27 CN CN201710499278.1A patent/CN107144298A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4636076A (en) * | 1983-07-30 | 1987-01-13 | Dr. Johannes Heidenhain Gmbh | Displacement measuring apparatus and method |
| US20030002039A1 (en) * | 2000-02-23 | 2003-01-02 | Michael Homer | Opto-electronic scale reading apparatus |
| CN101151519A (en) * | 2005-03-30 | 2008-03-26 | 皇家飞利浦电子股份有限公司 | Optical system with diffraction optical element used for mapping signal light onto a detector |
| CN200982859Y (en) * | 2006-12-08 | 2007-11-28 | 华中科技大学 | Large range straight line type phase grating contour measuring shift sensor |
| CN104040296A (en) * | 2011-11-09 | 2014-09-10 | 齐戈股份有限公司 | Double pass interferometric encoder system |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113175881A (en) * | 2021-04-10 | 2021-07-27 | 西安交通大学 | Measurement device for improve grating reading gap tolerance |
| CN113175881B (en) * | 2021-04-10 | 2022-06-03 | 西安交通大学 | Measurement device for improve grating reading gap tolerance |
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