CN107132611B - 一种介质硅纳米粒子自沉积涂层光纤及其制作方法 - Google Patents
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Abstract
本发明公开了一种介质硅纳米粒子自沉积涂层光纤及其制作方法，包括介质硅纳米粒子、微米光纤、宽谱激光器、光谱分析仪、光学UV胶、石英毛细管、显微镜、紫外光固化器。本发明将介质硅纳米粒子均匀、紧密沉积在石英毛细管内壁，借助宽谱激光器和光谱分析仪实时监测透射光谱变化，利用紫外光固化器固化UV胶来获得固体光纤结构，并通过显微镜实时观测光纤结构的形成过程。介质硅纳米粒子具备局域光场增强和零后向散射特点，本发明公布的制作方法获得的介质硅修饰光纤，有助于新型生化传感及光子器件的研制。
Description
技术领域
本发明属于光纤制作与应用技术领域，基于介质硅纳米粒子的零后向散射和局域光场增强特性，提出了一种介质硅纳米粒子自沉积涂层光纤及其制作方法。
背景技术
从近年来相关研究进展可看出，相对于表面等离子体纳米结构，具有Mie谐振特性的高折射率介质硅纳米粒子可以保证电场和磁场偶极子模式共存，进而利用电、磁场相互作用产生局域光场增强效应，有效增强表面荧光和拉曼散射，并且不会产生自加热现象，适合对热敏感生物样品的高精度检测；当电、磁场强度相当时，可有效减小甚至近乎消除后向散射，可用于减小背景噪声，提高微型传感器件性能；所产生Fano谐振现象的Q值更高，可用于实现痕量分子浓度或单分子探测，并在此基础上开发高分辨率、高集成度的微型生物传感器。
同时，通过在光纤表面自组装纳米粒子，实现传感器件性能改进的相关研究工作中，所使用的基元均为聚合物纳米粒子或金属纳米粒子，尚未出现将介质纳米粒子自组装结构与光纤结构或光纤传感技术相结合，并设计先进传感器件研究的报道。
发明内容
本发明提供了一种介质硅纳米粒子自沉积涂层光纤及其制作方法，解决了目前介质硅纳米结构或纳米粒子与光纤的结合问题。
为达到上述目的，本发明采用的技术方案如下：
一种介质硅纳米粒子自沉积涂层光纤，包含有介质硅纳米粒子1、光学UV胶5、微米光纤2、微米光纤6，介质硅纳米粒子1通过光学UV胶5沉积固化在微米光纤6的内壁，介质硅纳米粒子1紧密排列，形成分层堆栈修饰涂层。
其中，介质硅纳米粒子1的形状为球形，直径为100nm；微米光纤2的材质为石英，折射率为1.46，内径为20微米，外径为150微米，由普通单模光纤经过高温拉伸法制备得到。光学UV胶5的折射率为1.37。
一种介质硅纳米粒子自沉积涂层光纤的制作方法如下：
(1)利用微量生物注射器将含有介质硅纳米粒子1的光学UV胶5注入微米光纤6中，借助介质硅纳米粒子1在重力场作用下自然沉积在微米光纤6的内壁，同时纳米粒子间的相互作用可保证介质硅纳米粒子1沉积后紧密排列，即形成分层堆栈修饰涂层；
(2)使用显微镜7实时监测光纤结构，并通过宽谱激光器3和光谱分析仪4实时监测透射光谱变化，待观测到光纤的特征透射光谱时启动紫外光固化器8将光学UV胶5固化，截取固化后的微米光纤，就可得到自沉积涂层光纤。
宽谱激光器3的波长范围为1520-1560nm，光谱分析仪4的波长探测范围为1200-2000nm，可用于光纤透射光谱的实时观测，以结合显微镜7来确定光子晶体结构的形成。紫外光固化器8的功率为125W，可使光学UV胶5在5s内快速固化，将光纤结构固定。
与现有技术相比，本发明的有益效果是
1)本发明提出的一种介质硅纳米粒子自沉积涂层光纤，可以通过选取不同参数或类型的介质硅纳米粒子、不同折射率的光学UV胶和不同尺寸的微米光纤，构建所需的特种光纤结构；
2)本发明提出的一种介质硅纳米粒子自沉积涂层光纤的制作方法，将介质硅纳米粒子引入光纤结构中，有利于新型光纤传感器件和光子器件的研发。
附图说明
附图1为一种介质硅纳米粒子自沉积涂层光纤的制作方法示意图。
图中：1介质硅纳米粒子；2微米光纤；3宽谱激光器；4光谱分析仪；5光学UV胶；6微米光纤；7显微镜；8紫外光固化器。
具体实施方式
下面通过具体实施方式阐明本发明的实质特点和显著进步。
如图所示，一种介质硅纳米粒子自沉积涂层光纤的制作方法，采用UV胶自身呈液体状、透明并且易掺杂的特点，实现介质硅纳米粒子在其中的均匀分布，形成并制备三维光子晶体结构光纤，介质硅纳米粒子1、微米光纤2、宽谱激光器3、光谱分析仪4、光学UV胶5、微米光纤6、显微镜7、紫外光固化器8。具体实施方式是利用微量生物注射器将含有介质硅纳米粒子1的光学UV胶5注入微米光纤6中，借助重力场作用使介质硅纳米粒子1自然沉积在微米光纤6的内壁，同时纳米粒子间的相互作用可保证介质硅纳米粒子1沉积后紧密排列，即形成分层堆栈修饰涂层，使用显微镜7实时监测涂层结构的形成过程，并结合宽谱激光器3和光谱分析仪4实时监测透射光谱变化，待观测到光纤的特征透射光谱时启动紫外光固化器8将光学UV胶5迅速固化，即可将介质硅涂层结构固定在微米光纤中，截取固化后的微米光纤，就可得到介质硅修饰光纤。其中，介质硅纳米粒子1的形状为球形，直径为100nm，微米光纤2的材质为石英，折射率为1.46，由普通单模光纤经过高温拉伸法制备得到，直径为2微米，宽谱激光器3的波长范围为1520-1560nm，光谱分析仪4的波长探测范围为1200-2000nm，可用于光纤透射光谱的实时观测，以结合显微镜7来确定光纤结构的形成，光学UV胶5的折射率为1.37，微米光纤6的内径为20微米，外径为150微米，折射率为1.46，紫外光固化器8的功率为125W，可使UV胶在5s内快速固化，将光纤结构固定。
本发明利用UV胶作为介质硅纳米粒子的分散基液，因此可借助UV胶的紫外固化特性得到固化的介质硅修饰光纤。该方法成本低、制备速度快、所需设备简单、光纤参数可灵活控制，可以大大节省特种光纤的制作成本。同时，构建的介质硅纳米粒子、UV胶折射率和微米光纤可以根据实际应用需要选择所需几何尺寸和功能修饰材料，来制备多种类型光纤，丰富相关研究内容。
Claims (5)
1.一种介质硅纳米粒子自沉积涂层光纤，包含有介质硅纳米粒子(1)、光学UV胶(5)、第一微米光纤(2)、第二微米光纤(6)，介质硅纳米粒子通过光学UV胶沉积固化在第二微米光纤的内壁，介质硅纳米粒子紧密排列，形成分层堆栈修饰涂层；其中，介质硅纳米粒子(1)的形状为球形，直径为100nm；第一微米光纤(2)的材质为石英，折射率为1.46，直径为2微米；第二微米光纤(6)的材质为石英，折射率为1.46，内径为20微米，外径为150微米；光学UV胶(5)的折射率为1.37。
2.权利要求1所述一种介质硅纳米粒子自沉积涂层光纤的制作方法，其特征在于，包括以下步骤：利用微量生物注射器将含有介质硅纳米粒子(1)的光学UV胶(5)注入第二微米光纤(6)中，借助介质硅纳米粒子(5)在重力场作用下自然沉积在第二微米光纤(6)的内壁，同时纳米粒子间的相互作用可保证介质硅纳米粒子(1)沉积后紧密排列，即形成分层堆栈修饰涂层；使用显微镜实时监测光纤结构，并通过宽谱激光器和光谱分析仪实时监测透射光谱变化，待观测到光纤的特征透射光谱时启动紫外光固化器将光学UV胶(5)固化，截取固化后的微米光纤，即得到自沉积涂层光纤。
3.根据权利要求2所述的制作方法，其特征在于，所述的宽谱激光器的波长范围为1520-1560nm。
4.根据权利要求2或3所述的制作方法，其特征在于，光谱分析仪的波长探测范围为1200-2000nm。
5.根据权利要求4所述的制作方法，其特征在于，紫外光固化器的功率为125W。
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