CN107065445A - A kind of exposure device - Google Patents
A kind of exposure device Download PDFInfo
- Publication number
- CN107065445A CN107065445A CN201710055343.1A CN201710055343A CN107065445A CN 107065445 A CN107065445 A CN 107065445A CN 201710055343 A CN201710055343 A CN 201710055343A CN 107065445 A CN107065445 A CN 107065445A
- Authority
- CN
- China
- Prior art keywords
- lens
- baffle plate
- exposure
- exposure device
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention provides a kind of exposure device, and it includes baffle plate assembly and lens subassembly, and the baffle plate assembly is provided with exposure hole；The lens subassembly is arranged between the baffle plate assembly and substrate to be exposed, and the lens subassembly is used for the region to be exposed that the diffracted ray that the side of the exposure hole is produced is focused to the substrate to be exposed.The exposure device can higher exposure accuracy, the exposure quality of lifting substrate to be exposed.
Description
Technical field
The present invention relates to optical processing technology field, more particularly to a kind of exposure device.
Background technology
When being exposed using exposure machine, generally require and use baffle plate, exposure hole is provided with baffle plate, light source will be in product
Region just corresponding with the exposure hole is exposed, so as to form required figure on product.However, light is in straightline propagation
Baffle plate is run into journey can occur area corresponding with diffraction zone in diffraction phenomena, i.e. the side edge generation diffraction in exposure hole, product
Domain can also have a certain degree of exposure, and this results in the actual fabrication shape of product and required shape difference is larger, significantly
The exposure accuracy of exposure machine is reduced, while influenceing the quality of product.
Therefore, it is necessary to a kind of exposure device is provided, to solve the problems of prior art.
The content of the invention
The present invention provides a kind of exposure device, to solve to cause in product because of exposure hole side generation diffraction light in baffle plate
The place that need not be exposed is exposed, and then reduces the technical problem of exposure accuracy.
The embodiment of the present invention provides a kind of exposure device, is exposed for treating exposure base, it includes：Baffle plate assembly
And lens subassembly, the baffle plate assembly is provided with exposure hole；The lens subassembly be arranged on the baffle plate assembly with it is described to be exposed
Between substrate, the lens subassembly is used to the diffracted ray that the side of the exposure hole is produced being focused at the substrate to be exposed
Region to be exposed.
In exposure device provided in an embodiment of the present invention, the side that the lens subassembly is placed in the exposure hole is corresponding
Diffraction zone；The lens subassembly is included along spaced first lens of axial direction of the exposure hole and the second lens, institute
It is that convex lens cut the pellicle mirror structure to be formed along its primary optical axis to state the first lens and the second lens；The baffle plate assembly is set
On the focal length of first lens, the substrate to be exposed is arranged on the focal length of second lens.
In exposure device provided in an embodiment of the present invention, the cut surfaces of first lens and the second lens with it is described
The side of exposure hole is flush.
In exposure device provided in an embodiment of the present invention, the focal length of the focal length of first lens and second lens
It is equal.
In exposure device provided in an embodiment of the present invention, during the baffle plate assembly is flat board, the baffle plate assembly
Provided with the exposure hole.
In exposure device provided in an embodiment of the present invention, the baffle plate assembly includes at least two moveable baffle plates,
Baffle plate described at least two surrounds the exposure hole.
In exposure device provided in an embodiment of the present invention, the diameter of first lens and the second lens exposes with described
The length of the side of unthreaded hole is identical.
In exposure device provided in an embodiment of the present invention, the diameters of first lens and the second lens with the gear
The length of the side of plate is identical.
In exposure device provided in an embodiment of the present invention, the exposure device also includes fixed support, the fixed branch
Frame is used to fix the baffle plate assembly and the lens subassembly, to cause the baffle plate assembly and the lens subassembly to form entirety
Structure.
In exposure device provided in an embodiment of the present invention, the material of first lens and the second lens includes poly- methyl
Methyl acrylate.
The invention provides a kind of exposure device, it is described by being set between the baffle plate assembly and substrate to be exposed
Lens subassembly so that the diffracted ray that the lens subassembly can produce the side of the exposure hole is focused at described to be exposed
The region to be exposed of substrate, so as to improve the exposure accuracy of exposure device, lifts the exposure quality of substrate to be exposed.
Brief description of the drawings
Fig. 1 is the overlooking the structure diagram of baffle plate assembly in exposure device provided in an embodiment of the present invention；
Fig. 2 is schematic cross-section of the baffle plate assembly along arrow A-A directions shown in Fig. 1；
Fig. 3 is another structural representation of baffle plate assembly in exposure device provided in an embodiment of the present invention；
Fig. 4 is the cross section structure schematic diagram of exposure device provided in an embodiment of the present invention；
Fig. 5 be Fig. 4 shown in exposure device in baffle plate assembly and lens subassembly position relationship schematic top plan view.
Embodiment
The explanation of following embodiment is the particular implementation implemented to illustrate the present invention can be used to reference to additional schema
Example.The direction term that the present invention is previously mentioned, such as " on ", " under ", "front", "rear", "left", "right", " interior ", " outer ", " side "
Deng being only the direction with reference to annexed drawings.Therefore, the direction term used is to illustrate and understand the present invention, and is not used to
The limitation present invention.
In figure, the similar unit of structure is represented with identical label.
It refer to shown in Fig. 1 to Fig. 5.The embodiment of the present invention provides a kind of exposure device, and it includes baffle plate assembly 11 and saturating
Mirror assembly 12.
Shown in Figure 1, Fig. 1 is the plan structure signal of baffle plate assembly in exposure device provided in an embodiment of the present invention
Figure.Baffle plate assembly 11 includes four baffle plates, respectively first baffle 1111, second baffle 1112, second baffle 1113 and second
Baffle plate 1114.
Four baffle plates can be mutually shifted to surround exposure hole 112.Specifically, second baffle 1112 and fourth gear plate 1114
In the same plane, both can move to direction close to each other or remote, i.e., the right and left in the top view shown in Fig. 1
To movement, to control the width of exposure hole 112 in the lateral direction.
First baffle 1111 and third baffle 1113 are in the same plane, and first baffle 1111 and third baffle 1113
Above second baffle 1112 and fourth gear plate 1114.First baffle 1111 and third baffle 1113 can be to close to each other
Or remote direction movement, i.e., above-below direction is moved in the top view shown in Fig. 1, to control exposure hole 112 in above-below direction
On width.
In order to which first baffle 1111 and third baffle 1113 and second baffle 1112 and fourth gear can be illustrated more clearly that
Hierarchical relationship between plate 1114, this gives the interface schematic diagram in Fig. 1 along arrow A-A directions, refers to Fig. 2 institutes
Show.
It will be clear that third baffle 1113 is mounted on second baffle 1112 and fourth gear plate 1114 from Fig. 2.
It is understood that first baffle 1111 is equally mounted on second baffle 1112 and fourth gear plate 1114.
Certainly, in other embodiments, first baffle 1111 and third baffle 1113 can also be placed in second baffle 1112
With the top of fourth gear plate 1114, and do not contacted with second baffle 1112 and fourth gear plate 1114.
By adjusting the distance between first baffle 1111 and third baffle 1113 and second baffle 1112 and fourth gear
The distance between plate 1114 is obtained with various sizes of exposure hole 112 so that the baffle plate assembly 11 can be in multiple exposures
Used under area requirements, improve the flexibility of baffle plate assembly 11.
It is understood that the number of baffle plate is not limited to four included by baffle plate assembly 11, can two, three or more
It is individual.When baffle plate number is two, during such as second baffle 1112 in only Fig. 1 and fourth gear plate 1114, two baffle plates enclose
Into the exposure hole 112 of a slit-shaped.When the number of baffle plate is three, three baffle plates can surround the exposure hole of triangle
112.Here, number and the shape of exposure hole 112 not to baffle plate is limited.
Shown in Figure 3, in one embodiment, baffle plate assembly 11 can also be a flat board, be set in baffle plate assembly 11
There is exposure hole 112.That is, by being hollowed out in the middle of baffle plate assembly 11 to form exposure hole 112, the size and shape of exposure hole 112
Shape is set according to the actual requirements.
Shown in Figure 4, Fig. 4 is the cross section structure schematic diagram of exposure device provided in an embodiment of the present invention.In Fig. 4 institutes
In the exposure device shown, baffle plate assembly 11 is made up of, in order to more clearly from open up using the structure shown in Fig. 1 four baffle plates
The position relationship of all parts in existing exposure device, first baffle 1111 or the 3rd not shown in Fig. 4 cross section structure schematic diagram
Baffle plate 1113 and its corresponding part.
As shown in figure 4, lens subassembly 12 is arranged between baffle plate assembly 11 and substrate to be exposed 13, for by exposure hole
The diffracted ray that 112 side is produced is focused at the region to be exposed of substrate 13 to be exposed.Wherein, in substrate 13 to be exposed with exposure
The just corresponding region of unthreaded hole 112 is region to be exposed, with removing exposure hole 112 in baffle plate assembly 11 with the just corresponding region of outer portion
For non-exposed areas.
Herein, substrate 13 to be exposed can be a substrate objective table, and the substrate objective table is used to hold product to be exposed,
Or can also be directly product to be exposed, it is not particularly limited herein.
In one embodiment, lens subassembly 12 includes spaced first lens 121 of axial direction along exposure hole 112
With the second lens 122.Wherein, the axial direction of exposure hole 112 refers to baffle plate assembly 11 to the direction of substrate 13 to be exposed.
First lens 121 and the second lens 122 are placed in the corresponding diffraction zone of avris of exposure hole 112, the i.e. lens subassembly
12 are placed in the corresponding diffraction zone in side of exposure hole 112.By taking fourth gear plate 1114 in Fig. 4 as an example, the side of exposure hole 112, i.e.,
When diffraction occurs for the side of fourth gear plate 1114, diffracted ray can incide the underface of fourth gear plate 1114, the diffracted ray
The region at place is diffraction zone.
Because exposure hole 112 has four sides, and diffraction can occur for each side, will be to that should have four diffraction zones.
In order to which the diffracted ray for producing each side converges to region to be exposed, in the present embodiment, the number of lens subassembly 12
For four, a side of each lens subassembly 12 with exposure hole 12 is corresponding, i.e., four lens subassemblies 12 are separately positioned on
The relevant position of four diffraction zones.
It illustrate only in Fig. 4 and 1114 corresponding two lens subassemblies 12 of second baffle 1112 and fourth gear plate.According to
Position relationship shown in Fig. 4, can be readily available two other lens subassembly 12 respectively with first baffle 1111 and third gear
The position relationship of plate 1113.
In the present embodiment, the first lens 121 and the second lens 122 are that convex lens cut to be formed half along its primary optical axis
Lens arrangement.
In order to more clearly from show the position relationship between lens subassembly 12 and baffle plate assembly 11, the embodiment of the present invention is given
The position relationship schematic top plan view of baffle plate assembly 11 and lens subassembly 12 is gone out, as shown in Figure 5.
In Figure 5, the underface of each baffle plate is correspondingly arranged a lens subassembly 12, because the top view is from baffle plate
Component 11 is looked to the direction of substrate 13 to be exposed, therefore lens subassembly 12 is sightless.
From Fig. 4 and Fig. 5 as can be seen that the cut surface of the first lens 121 and the second lens 122 with exposure hole 112
Side is flush, here, and cut surface is the face by primary optical axis.Such lens 122 of first lens 121 and second can not influence
The light distribution of the positive corresponding region of exposure hole 112, i.e., do not influence the exposure quality in region to be exposed in substrate 13 to be exposed.
Because four baffle plates are moveable in baffle plate assembly 11, i.e., the size of exposure hole 112 is adjustable, in order that
Various sizes of exposure hole 112 can use four lens subassemblies 12 that diffraction light is focused at into region to be exposed, and first is saturating
The diameter of the lens 122 of mirror 121 and second is identical with the length of the side of corresponding baffle plate.
For example, the size of four baffle plates is 100 centimetres of 200 cm x, and four baffle plates are enclosed using 100 centimetres of side
Into a diameter of 100 centimetres of the exposure hole 112, then the first lens 121 and the second lens 122 that size is 20 centimetres of 20 cm x.
So, in the case where the size of exposure hole 112 is 40 centimetres of 40 cm x, the first lens 121 and the second lens 122 still may be used
Region to be exposed is focused at the diffraction light for causing the side of exposure hole 112 to produce.
In order to which position relationship of the lens subassembly 12 corresponding thereto between baffle plate can be kept, it is easy to practical operation, saves
Operating time, in one embodiment, exposure device also include fixed support 14, as shown in Figure 4 and Figure 5.Fixed support 14 includes
Cradle portion 141, the first semi-ring fixed part 142a and the second semi-ring fixed part 142b.
First semi-ring fixed part 142a and the second semi-ring fixed part 142b are semiannular shape, the first semi-ring fixed part 142a
Edge for encasing the first lens 121, to cause the first lens 121 to be stuck in the first semi-ring fixed part 142a, the second semi-ring
Fixed part 142b is used for the edge for encasing the second lens 122, to cause the second lens 122 to be stuck in the second semi-ring fixed part 142b
It is interior.
First semi-ring fixed part 142a and the second semi-ring fixed part 142b are each attached to one end of cradle portion 141.Cradle portion
141 other end is bending-like, and the part of bending is fixed on the baffle plate corresponding with lens subassembly 12.So baffle plate and its phase
Correspondence lens subassembly 12 just forms overall structure, in actual mechanical process, it is only necessary to adjust position between each baffle plate i.e.
Can, without in the position of adjustment lens subassembly 12.
In addition, in this embodiment, the first semi-ring fixed part 142a and the second semi-ring fixed part 142b are size identical
Structure, in the top view shown in Fig. 5, only illustrates the first semi-ring fixed part 142a, it is to be understood that the second semi-ring
The positions of fixed part 142b in a top view are identical with the first semi-ring fixed part 142a position.
It is understood that fixed support 14 can also use other shapes, the fixed support 14 shown in Fig. 4 and Fig. 5
Only one kind in a variety of fixed supports.In addition, lens subassembly 12 can also be controlled individually, i.e., it is not fixed into corresponding baffle plate
Overall structure, it is necessary to the position of difference regulating fender component 11 and lens subassembly 12 so in actual mechanical process.
In other embodiments, if baffle plate assembly 11 is using the plate structure shown in Fig. 3, now, the first lens 121
Diameter with the second lens 122 can be identical with the length of the side of exposure hole 112.Certainly, in such cases, the first lens
121 and second lens 122 diameter can also be more than exposure hole 112 side length.
It is understood that when baffle plate assembly 11 uses the plate structure shown in Fig. 3, lens subassembly 12 can also
Overall structure is fixed into by the fixed support 14 shown in Fig. 4 and Fig. 5 and baffle plate assembly 11.
In order to which the diffracted ray that can produce the side of exposure hole 112 is focused at region to be exposed again, in this implementation
In example, baffle plate assembly 11 is placed on the focal length of the first lens 121, and substrate 13 to be exposed is arranged on the focal length of the second lens 122.
So, the diffracted ray that the side of exposure hole 112 is produced becomes parallel diffraction light by the first lens 121, the parallel diffraction
Light is focused at region to be exposed by the second lens 122 again.
It can be seen from the action principle of lens on light line, the diffracted ray that the side of exposure hole 112 is produced passes through lens group
Region just corresponding with the side of exposure hole 112 will be focused at after part 12 again, non-region quilt to be exposed can be so avoided
Diffracted ray exposes, and influences the accuracy of exposure device.Meanwhile, diffracted ray is focused at the edge in region to be exposed, no
Light intensity everywhere can be influenceed in region to be exposed so that exposed everywhere in region to be exposed more uniform.
In addition, it can be seen from the action principle of lens on light line, when baffle plate assembly 11 and substrate to be exposed 13 are placed in
When on the focal length of mirror, the distance between the first lens 121 and second lens 122 are not limited.First lens 121 and the second lens 122
The distance between can set according to the actual requirements.
In the present embodiment, the focal length of the focal length of the first lens 121 and the second lens 122 is equal.Certainly, implement at other
In example, the focal length of the focal length of the first lens 121 and the second lens 122 can also be unequal, is not particularly limited herein.In addition,
The material of first lens 121 and the second lens 122 includes polymethyl methacrylate.
In addition, in other embodiments, the number of lens subassembly 12 is not limited to 4, can be less, such as 1 or 2 or
3.When the number of sides of exposure hole 112 is more than four, the quantity of lens subassembly 12 can also be more than 4.
Meanwhile, the combination of the first lens 121 and the second lens 122 shown in Fig. 4 and Fig. 5 is only that lens subassembly 12 is real
One kind in the various structures of its existing function, in other embodiments, lens subassembly 12 can use other structures, as long as lens
Component 12 can be realized is focused at region to be exposed by diffracted ray, is not particularly limited herein.
In addition, in other embodiments, exposure device can further include light source and/or mask plate of exposure etc.
Part.
The embodiment of the present invention provides a kind of exposure device, and it between baffle plate assembly and substrate to be exposed by setting lens
Component so that the diffracted ray that lens subassembly can produce the side of exposure hole is focused at the area to be exposed of substrate to be exposed
Domain, so as to improve the exposure accuracy of exposure device, lifts the exposure quality of substrate to be exposed.
In summary, although the present invention it is disclosed above with preferred embodiment, but above preferred embodiment and be not used to limit
The system present invention, one of ordinary skill in the art without departing from the spirit and scope of the present invention, can make various changes and profit
Adorn, therefore protection scope of the present invention is defined by the scope that claim is defined.
Claims (10)
1. a kind of exposure device, is exposed for treating exposure base, it is characterised in that including：Baffle plate assembly and lens group
Part, the baffle plate assembly is provided with exposure hole；The lens subassembly is arranged between the baffle plate assembly and the substrate to be exposed,
The lens subassembly is used to the diffracted ray that the side of the exposure hole is produced being focused at the to be exposed of the substrate to be exposed
Region.
2. exposure device according to claim 1, it is characterised in that the lens subassembly is placed in the side of the exposure hole
Corresponding diffraction zone；The lens subassembly includes saturating along spaced first lens of axial direction of the exposure hole and second
Mirror, first lens and the second lens are that convex lens cut the pellicle mirror structure to be formed along its primary optical axis；The baffle group
Part is arranged on the focal length of first lens, and the substrate to be exposed is arranged on the focal length of second lens.
3. exposure device according to claim 2, it is characterised in that the cut surface of first lens and the second lens is equal
It is flush with the side of the exposure hole.
4. exposure device according to claim 2, it is characterised in that the focal length of first lens and second lens
Focal length it is equal.
5. exposure device according to claim 2, it is characterised in that the baffle plate assembly is a flat board, the baffle plate
The exposure hole is provided with component.
6. exposure device according to claim 2, it is characterised in that the baffle plate assembly includes at least two moveable gears
Plate, baffle plate described at least two surrounds the exposure hole.
7. exposure device according to claim 5, it is characterised in that the diameter of first lens and the second lens with
The length of the side of the exposure hole is identical.
8. exposure device according to claim 6, it is characterised in that the diameter of first lens and the second lens with
The length of the side of the baffle plate is identical.
9. the exposure device according to claim 7 or 8, it is characterised in that the exposure device also includes fixed support, institute
Stating fixed support is used to fix the baffle plate assembly and the lens subassembly, to cause the baffle plate assembly and the lens subassembly
Form overall structure.
10. exposure device according to claim 2, it is characterised in that the material of first lens and the second lens includes
Polymethyl methacrylate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710055343.1A CN107065445B (en) | 2017-01-22 | 2017-01-22 | A kind of exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710055343.1A CN107065445B (en) | 2017-01-22 | 2017-01-22 | A kind of exposure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107065445A true CN107065445A (en) | 2017-08-18 |
| CN107065445B CN107065445B (en) | 2018-11-27 |
Family
ID=59598430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710055343.1A Active CN107065445B (en) | 2017-01-22 | 2017-01-22 | A kind of exposure device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107065445B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107844034A (en) * | 2017-11-20 | 2018-03-27 | 张家港奇点光电科技有限公司 | A kind of exposure stage of new exposure machine |
| CN114326321A (en) * | 2021-12-13 | 2022-04-12 | 复旦大学附属中山医院 | Auxiliary exposure device for western blot strip |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003282421A (en) * | 2002-03-26 | 2003-10-03 | Seiko Epson Corp | Device and method for exposure |
| JP2010085957A (en) * | 2008-10-03 | 2010-04-15 | Seiko Epson Corp | Exposure method and exposure mask |
| CN101782721A (en) * | 2009-01-19 | 2010-07-21 | 中芯国际集成电路制造(上海)有限公司 | Photoetching device and method |
| CN102466978A (en) * | 2010-11-11 | 2012-05-23 | 无锡华润上华半导体有限公司 | Lithographic exposure machine and lithographic exposure method |
| CN103299243A (en) * | 2010-11-19 | 2013-09-11 | 恩斯克科技有限公司 | Proximity exposure device and proximity exposure method |
| CN104849966A (en) * | 2015-04-13 | 2015-08-19 | 合肥京东方光电科技有限公司 | Mask plate, manufacturing method thereof, and exposure apparatus |
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2017
- 2017-01-22 CN CN201710055343.1A patent/CN107065445B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003282421A (en) * | 2002-03-26 | 2003-10-03 | Seiko Epson Corp | Device and method for exposure |
| JP2010085957A (en) * | 2008-10-03 | 2010-04-15 | Seiko Epson Corp | Exposure method and exposure mask |
| CN101782721A (en) * | 2009-01-19 | 2010-07-21 | 中芯国际集成电路制造(上海)有限公司 | Photoetching device and method |
| CN102466978A (en) * | 2010-11-11 | 2012-05-23 | 无锡华润上华半导体有限公司 | Lithographic exposure machine and lithographic exposure method |
| CN103299243A (en) * | 2010-11-19 | 2013-09-11 | 恩斯克科技有限公司 | Proximity exposure device and proximity exposure method |
| CN104849966A (en) * | 2015-04-13 | 2015-08-19 | 合肥京东方光电科技有限公司 | Mask plate, manufacturing method thereof, and exposure apparatus |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107844034A (en) * | 2017-11-20 | 2018-03-27 | 张家港奇点光电科技有限公司 | A kind of exposure stage of new exposure machine |
| CN107844034B (en) * | 2017-11-20 | 2019-11-12 | 张家港奇点光电科技有限公司 | A kind of exposure stage of novel exposure machine |
| CN114326321A (en) * | 2021-12-13 | 2022-04-12 | 复旦大学附属中山医院 | Auxiliary exposure device for western blot strip |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107065445B (en) | 2018-11-27 |
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