CN107065041A - A kind of preparation method of polaroid, polaroid and display device - Google Patents
A kind of preparation method of polaroid, polaroid and display device Download PDFInfo
- Publication number
- CN107065041A CN107065041A CN201710325268.6A CN201710325268A CN107065041A CN 107065041 A CN107065041 A CN 107065041A CN 201710325268 A CN201710325268 A CN 201710325268A CN 107065041 A CN107065041 A CN 107065041A
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- Prior art keywords
- arc
- substrate
- polaroid
- dizzy
- preparation
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a kind of preparation method of polaroid, polaroid and display device, the preparation method comprises the following steps：Substrate is provided；Anti- dizzy coating is formed in the side of substrate；Side of the dizzy coating away from substrate is being resisted to form ARC, the wherein material of ARC is the polymer with crosslinkable groups；Anti-reflection microstructure is formed on ARC；The crosslinkable groups in anti-reflection microstructure are made to crosslink reaction, and then antagonistic reflex micro-structural carries out crosslinking enhancing.By the above-mentioned means, embodiment provided by the present invention can reduce reflected light and/or the dazzle of polaroid.
Description
Technical field
The present invention relates to field of display devices, more particularly to a kind of preparation method of polaroid, polaroid and display dress
Put.
Background technology
Liquid crystal display is a kind of planar ultra-thin display device, and it is made up of a number of colored or monochrome pixels,
It is positioned in front of light source or reflecting surface.Liquid crystal display is low in energy consumption, and with image quality height, small volume, lightweight feature,
Therefore the main flow of current display is turned into.
Usual liquid crystal display includes upper down polaroid, for forming polarised light and controlling passing through for light.
The present inventor has found in chronic study procedure, when display device is used out of doors or under highlighted environment
When, because existing polaroid is 42% to the transmitance of light, polaroid can produce reflected light in the presence of external environmental light
And/or dazzle, and then cause user's readability decline.
The content of the invention
The present invention solves the technical problem of a kind of preparation method of polaroid of offer, polaroid and display device,
Reflected light and/or the dazzle of polaroid can be reduced.
In order to solve the above technical problems, one aspect of the present invention is：A kind of preparation side of polaroid is provided
Method, the preparation method comprises the following steps：Substrate is provided；Anti- dizzy coating is formed in the side of the substrate；Described anti-dizzy
Side of the coating away from the substrate forms ARC, wherein the material of the ARC is with crosslinkable groups
Polymer；Anti-reflection microstructure is formed on the ARC；Make described cross-linking in the anti-reflection microstructure
Group crosslinks reaction, and then carries out crosslinking enhancing to the anti-reflection microstructure.
In order to solve the above technical problems, another technical solution used in the present invention is：A kind of polaroid is provided, it is described inclined
Mating plate includes：Substrate；Resist dizzy coating, be arranged at the substrate side；ARC, resists dizzy coating away from described positioned at described
The side of substrate, wherein the material of the ARC is the polymer with crosslinkable groups, on the ARC
Form crosslinked enhanced anti-reflection microstructure.
In order to solve the above technical problems, another technical solution used in the present invention is：A kind of display device is provided, it is described
Display device includes backlight module, down polaroid, liquid crystal panel and the upper polaroid being cascading, wherein described inclined
Mating plate is the polaroid described in any of the above-described embodiment.
The beneficial effects of the invention are as follows：It is different from the situation of prior art, the preparation side of polaroid provided by the present invention
Anti- dizzy coating and ARC are sequentially formed on the substrate for being included in polaroid in method, so as to reduce external environment illumination
Reflected light produced by polaroid and dazzle when penetrating polaroid；In addition, the material of ARC includes crosslinkable group,
After it crosslinks curing reaction, the intensity of the anti-reflection microstructure of ARC can be strengthened, so as to improve its antifriction
Wipe performance.
Brief description of the drawings
Fig. 1 is the schematic flow sheet of the embodiment of preparation method one of polaroid of the present invention；
Fig. 2 is the structural representation of the corresponding polaroid of preparation method flow in Fig. 1；
Fig. 3 is the structural representation of the embodiment of polaroid one of the present invention；
Fig. 4 is the structural representation of the embodiment of display device one of the present invention.
Embodiment
Referring to Fig. 1, schematic flow sheets of the Fig. 1 for the embodiment of preparation method one of polaroid of the present invention, the preparation side
Method comprises the following steps：
S101：Substrate is provided；Specifically, as shown in Figure 2 a, it is necessary to which the surface clean of substrate 20 is clean, it is to avoid there is dust
Deng foul；Substrate 20 can be any commercially available penetration, half penetrated or reflecting polarized wafer on the market in the present embodiment.
S102：Anti- dizzy coating is formed in the side of substrate；Specifically, as shown in Figure 2 b, coating is utilized in the side of substrate 20
Mode formed one layer resist dizzy coating 22, resist dizzy coating 22 thickness be 0.5 μm -2 μm, such as 0.5 μm, 1.0 μm, 2 μm；One
As for, resist dizzy coating 22 in light have resist dizzy effect material be resist dizzy particle, such as acrylic resin particle, Ya Ke
Any one in power particle and styrene pellets or combination, when light is irradiated to above-mentioned anti-dizzy particle, due to resisting dizzy particle table
Face it is uneven, the diffusion of light can be made to act on enhancing, reflection light distribution angle scope is become big, so as to reach reduction
Mirror-reflection, reduces the effect of dazzle.Generally when preparing above-mentioned anti-dizzy coating 22, it is necessary first to resist dizzy particle to disperse by above-mentioned
In organic solvent, wherein organic solvent needs to meet requirement that is volatile and can not dissolving anti-dizzy particle, such as alcohols solvent
With any one in ketones solvent or the mixing of the two；Then the organic solvent for being dispersed with anti-dizzy particle is coated on substrate 20
Side；Evaporation of organic solvent is so as to form anti-dizzy coating 22；The mode of wherein above-mentioned evaporation of organic solvent can be heating or
Person's air blast etc., can also form anti-dizzy painting by other modes such as spraying etc., spin coatings on aforesaid substrate 20 in other embodiments
Layer 22.
S103：Side of the dizzy coating away from substrate is being resisted to form ARC, the wherein material of ARC is tool
There is the polymer of crosslinkable groups；Specifically, Fig. 2 c are referred to, the material of ARC 24 is resin, and its thickness is
100nm-500nm, for example, 100nm, 200nm, 300nm, 500nm etc., can be by modes such as deposition, coatings in above-mentioned anti-dizzy painting
The surface of layer 22 is formed.In addition, the resin of above-mentioned ARC 24 is the polymer with crosslinkable group, it is crosslinkable
Group can be any one in carbonyl group, aldehyde groups, amide group and epoxide group or combination, above-mentioned crosslinkable
Group can carry out cross-linking and curing reaction in light-initiated or thermal initiation mode；In other embodiments, above-mentioned resin structure
Also include carbon-carbon double bond, the presence of carbon-carbon double bond can strengthen the toughness and anti scuffing anti-wear performance of ARC.
S104：Anti-reflection microstructure is formed on ARC；Specifically, Fig. 2 d are referred to, are imprinted using pressure roller
Mode one layer of anti-reflection microstructure is formed on above-mentioned ARC 24；In other embodiments, also can by etching, from
The methods such as assembling formation anti-reflection microstructure；In an application scenarios, above-mentioned anti-reflection microstructure is moth ocular structure, such as Fig. 2 d
Shown in, the moth ocular structure is continuously arranged multiple minute protrusions, tapering, its height that each convex portion becomes towards top orientation
For 100nm-500nm, such as 100nm, 250nm, 300nm, 500nm, the depth-width ratio of anti-reflection microstructure is 0.8-1.2, example
Such as 0.8,1.0,1.2, width (characteristic size) is less than or equal to visible wavelength between above-mentioned moth ocular structure includes adjacent summit
Multiple convex portions, when incident light be visible ray when, incident light due to moth eye effect can the overwhelming majority pass through the moth ocular structure；For example
When incident light is visible ray, it is seen that the lower limit of optical wavelength is the distance between 400nm, the adjacent projection summit of above-mentioned moth ocular structure
Can be 400nm, 300nm, 200nm etc..
S105：The crosslinkable groups in anti-reflection microstructure are made to crosslink reaction, and then antagonistic reflex micro-structural is carried out
Crosslinking enhancing；Specifically, the anti-reflection microstructure irradiated using the light of specific wavelength in Fig. 2 d, or add at a certain temperature
Anti-reflection microstructure in thermal map 2d, and then make its further crosslinking curing so that the intensity enhancing of anti-reflection microstructure, and then
Improve its crocking resistance；When extraneous light is irradiated to the ARC 24, due to the feature chi of its anti-reflection microstructure
It is very little to be less than lambda1-wavelength so that incident light can not identify the anti-reflection microstructure, and then most incident ray can
Through the anti-reflection microstructure, reflection light is substantially reduced.
Referring to Fig. 3, Fig. 3 is the structural representation of the embodiment of polaroid one of the present invention, the polaroid includes：In substrate
30th, the lime light of anti-dizzy coating 32 and ARC 34, its preparation method and its structure is identical with above-described embodiment,
This is repeated no more.
Referring to Fig. 4, Fig. 4 be the embodiment of display device one of the present invention structural representation, the display device including according to
The secondary backlight module 40 being stacked, down polaroid 42, liquid crystal panel 44 and upper polaroid 46, wherein upper polaroid 46 have
Polaroid structure in any of the above-described embodiment.When extraneous light is irradiated to the upper polaroid 46 of display device, due to anti-reflective
The presence of the anti-reflection microstructure of coating is penetrated, the transmitance of light can be increased, reflected light is reduced；Resist dizzy coating when light is reached
When, its diffusion effect enhancing, reflection light distribution angle scope becomes big, mirror-reflection reduction, so that when user is in special angle
When observing display device, dazzle and reflected light into human eye are reduced.
Sum it up, being different from the situation of prior art, it is included in the preparation method of polaroid provided by the present invention
Anti- dizzy coating and ARC are sequentially formed on the substrate of polaroid, so as to reduce during external environment light irradiation polaroid
Reflected light and dazzle produced by polaroid；In addition, the material of ARC includes crosslinkable group, when it is handed over
Join after curing reaction, the intensity of the anti-reflection microstructure of ARC can be strengthened, so as to improve its crocking resistance.
Embodiments of the present invention are the foregoing is only, are not intended to limit the scope of the invention, it is every to utilize this
Equivalent structure or equivalent flow conversion that description of the invention and accompanying drawing content are made, or directly or indirectly it is used in other correlations
Technical field, is included within the scope of the present invention.
Claims (10)
1. a kind of preparation method of polaroid, it is characterised in that the preparation method comprises the following steps：
Substrate is provided；
Anti- dizzy coating is formed in the side of the substrate；
Side of the dizzy coating away from the substrate is resisted to form ARC described, wherein the material of the ARC is
Polymer with crosslinkable groups；
Anti-reflection microstructure is formed on the ARC；
The crosslinkable groups in the anti-reflection microstructure is crosslinked reaction, and then the anti-reflection microstructure is entered
Row crosslinking enhancing.
2. preparation method according to claim 1, it is characterised in that described to form anti-dizzy coating in the substrate side
Step includes：
The organic solvent for being dispersed with anti-dizzy particle is coated on to the side of the substrate；
The organic solvent is evaporated to form the anti-dizzy coating, wherein, the thickness of the anti-dizzy coating is 0.5 μm -2 μm.
3. preparation method according to claim 2, it is characterised in that
The organic solvent is any one or the two the mixing in alcohols solvent and ketones solvent, described to resist dizzy particle to be third
Any one in olefin(e) acid resin particle, acrylic particle and styrene pellets or combination.
4. preparation method according to claim 1, it is characterised in that
The anti-reflection microstructure is moth ocular structure, and width is less than or equal to visible ray between the moth ocular structure includes adjacent summit
Multiple convex portions of wavelength, the depth-width ratio of the convex portion is 0.8-1.2, and the height of the convex portion is 100nm-500nm.
5. preparation method according to claim 4, it is characterised in that
It is described to include the step of the anti-side of the dizzy coating away from the substrate forms ARC：Using deposition or
The method of coating resists side of the dizzy coating away from the substrate to form ARC described, wherein the ARC
Thickness is 100nm-500nm；
It is described to include on the ARC the step of formation anti-reflection microstructure：Using pressure roller imprint process described anti-
Side of the reflectance coating away from the substrate forms the anti-reflection microstructure；
The step of crosslinkable groups made in the anti-reflection microstructure crosslink reaction includes：Using thermal initiation
Or light-initiated mode makes the crosslinkable groups crosslink reaction.
6. preparation method according to claim 1, it is characterised in that the crosslinkable groups are carbonyl group, aldehyde radical base
Any one in group, amide group and epoxide group or combination.
7. preparation method according to claim 6, it is characterised in that the polymer further comprises carbon-carbon double bond.
8. a kind of polaroid, it is characterised in that including：
Substrate；
Resist dizzy coating, be arranged at the substrate side；
ARC, positioned at the anti-side of the dizzy coating away from the substrate, wherein the material of the ARC is
Crosslinked enhanced anti-reflection microstructure is formed on polymer with crosslinkable groups, the ARC.
9. polaroid according to claim 8, it is characterised in that 0.5 μm -2 μm of the thickness of the anti-dizzy coating, described anti-
The thickness of reflectance coating is 100nm-500nm, and the anti-reflection microstructure is moth ocular structure, and the moth ocular structure is comprising adjacent
Width is less than or equal to multiple convex portions of visible wavelength between summit, and the depth-width ratio of the convex portion is 0.8-1.2, the height of the convex portion
Spend for 100nm-500nm, the crosslinkable groups are any in carbonyl group, aldehyde groups, amide group and epoxide group
A kind of or combination, the polymer further comprises carbon-carbon double bond.
10. a kind of display device, it is characterised in that the display device includes backlight module, the lower polarisation being cascading
Piece, liquid crystal panel and upper polaroid, wherein the upper polaroid is using the polaroid described in claim any one of 8-9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710325268.6A CN107065041A (en) | 2017-05-10 | 2017-05-10 | A kind of preparation method of polaroid, polaroid and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710325268.6A CN107065041A (en) | 2017-05-10 | 2017-05-10 | A kind of preparation method of polaroid, polaroid and display device |
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| CN107065041A true CN107065041A (en) | 2017-08-18 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710325268.6A Pending CN107065041A (en) | 2017-05-10 | 2017-05-10 | A kind of preparation method of polaroid, polaroid and display device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107976837A (en) * | 2017-12-18 | 2018-05-01 | 华显光电技术（惠州）有限公司 | Polaroid and display device |
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| CN105556347A (en) * | 2013-09-18 | 2016-05-04 | 三菱丽阳株式会社 | Structure, production method therefor, and article provided with said structure |
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| CN101630026A (en) * | 2008-07-14 | 2010-01-20 | 达信科技股份有限公司 | Antireflective and anti-glare optical thin film and manufacturing method thereof |
| CN102066987A (en) * | 2008-09-17 | 2011-05-18 | 夏普株式会社 | Antireflection film and method for manufacturing same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107976837A (en) * | 2017-12-18 | 2018-05-01 | 华显光电技术（惠州）有限公司 | Polaroid and display device |
| CN107976837B (en) * | 2017-12-18 | 2021-12-07 | 华显光电技术（惠州）有限公司 | Polaroid and display device |
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Application publication date: 20170818 |