CN106994291A - A kind of high frequency negative high voltage toothed plate type VOCs processing systems - Google Patents
A kind of high frequency negative high voltage toothed plate type VOCs processing systems Download PDFInfo
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- CN106994291A CN106994291A CN201710344342.9A CN201710344342A CN106994291A CN 106994291 A CN106994291 A CN 106994291A CN 201710344342 A CN201710344342 A CN 201710344342A CN 106994291 A CN106994291 A CN 106994291A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/708—Volatile organic compounds V.O.C.'s
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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Abstract
The invention discloses high frequency negative high voltage toothed plate type VOCs processing systems, including VOCs processing units and high frequency pulse power supply；VOCs processing units include housing；Casing center position is provided with core processing reactor, housing forward end is gas cup, housing rear end is gas rear chamber, gas feed is provided with the housing of gas cup, gas vent is provided with the housing of gas rear chamber, gas cup is provided with air intake pump, and the axis of core processing reactor is provided with circulating fan, and circulating fan, air intake pump and core processing reactor are connected with high frequency pulse power supply.By setting reactor and negative high frequency pulse power supply, the high-voltage pulse electric of high frequency pulse power supply output, which is pressed between dentation negative electrode and positive plate, to be inspired high energy particle and is uniformly distributed therebetween, gas containing VOCs from the passage between dentation negative electrode and positive plate by the way that the material of environmental sound can be resolved into by high energy particle, it is achieved thereby that to VOCs exhaust-gas efficients rate and stable degraded.
Description
Technical field
The present invention relates to a kind of VOCs processing systems, more particularly to a kind of high frequency negative high voltage toothed plate type VOCs processing systems.
Background technology
With developing rapidly for national economy, industrial VOCs has become key cities of China (group) and local atmospheric
The one of the main reasons of combined pollution.Maximum triphen (benzene,toluene,xylene) and halogenated hydrocarbons the controlling in VOCs of industrial discharge amount
Emphasis is needed to be controlled in reason.Therefore, after dedusting, desulphurization and denitration and Motor Vehicle Emission Control, industrial VOCs pollution
Control problem has become one of mostly important direction of current control air pollution in China.
Corona discharge method processing VOCs principle is under the acceleration of electric field, to produce high energy particle, when particle is average
When energy exceedes target improvement thing molecular chemistry bond energy, molecular link is opened, and reaches the purpose for eliminating gaseous contaminant.And power supply
The key parameters such as middle voltage, pulse frequency and electrode spacing can have a direct impact to VOCs degradation rate, existing patent only from
The angle of apparatus structure is described, and fresh Collaborative Control optimization aspect the power supply output parameter of influence VOCs treatment effects
Refer to.Therefore because pole plate spacing parameter adjusts improper, reactor easy electric arc of discharge under peak voltage, in increase electricity
It is consumable simultaneously so that purification efficiency is low, and not exclusively and ozone can be produced to the decomposition of the organic matters such as benzene；Electric field frequency, electricity
Some power parameter such as pressure and high-frequency impulse does not reach requirement, the too high or too low production that all can be to high energy particle of such as voltage and frequency
Life is affected greatly, so as to influence VOCs treatment effect, thus prior art device due to the limitation of structure, to VOCs
Exhaust gas decomposition rate is low and less stable.
The content of the invention
In order to solve the above technical problems, The present invention provides a kind of high frequency negative high voltage toothed plate type efficiently, inexpensive
VOCs processing systems are high to VOCs exhaust gas decompositions rate and stability is preferable.
The present invention is to be achieved through the following technical solutions：
A kind of high frequency negative high voltage toothed plate type VOCs processing systems, including VOCs processing units and high frequency pulse power supply；It is described
VOCs processing units include housing, circulating fan, air intake pump and core processing reactor；Casing center position is provided with core
Treatment reactor, housing forward end is gas cup, and housing rear end is to be provided with gas on gas rear chamber, the housing of gas cup to enter
Mouthful, gas vent is provided with the housing of gas rear chamber, gas cup is provided with air intake pump, the axis of core processing reactor
Circulating fan is provided with, described circulating fan, air intake pump and core processing reactor is connected with high frequency pulse power supply；It is described
Core processing reactor include electrode holder, many rooted tooth shape negative electrodes and multiple positive plates；It is provided with electrode holder many
Many rooted tooth shape negative electrodes are arranged in horizontal homogeneous in the middle of individual positive plate, each pair positive plate, many rooted tooth shape negative electrodes are in same plane, tooth
Shape negative electrode is arranged in parallel with positive plate, gas channel is formed between dentation negative electrode and positive plate, airflow direction is perpendicular to bar-shaped
Negative electrode, dentation negative electrode and positive plate are connected by conductor with the negative electrode and anode of high frequency pulse power supply respectively.
It is provided with the horizontal plane of described electrode holder on multiple rows of positive plate, vertical plane and is provided with multi-layered anode plate.
Described dentation negative electrode is rod-shaped conductor, and rod-shaped conductor surrounding is evenly arranged multiple points vertical with rod-shaped conductor
Thorn.
Described electrode holder includes first anode support frame, the first cathode support framework, second plate carriage
Frame, the second cathode support framework and multiple minus plates, the first cathode support framework and the second cathode support framework are in the horizontal direction
Equidistant be provided with mounting groove, minus plate, second plate support frame and first anode support frame offers mounting groove, same to hang down
The many rooted tooth shape negative electrodes faced directly are arranged on the mounting groove of minus plate by wire, multiple minus plates difference on horizontal plane
It is arranged on by mounting groove between the first cathode support framework and the second cathode support framework, second plate support frame and first
Positive plate on two mounting posts on anode-supported framework frame and vertical plane including surrounding, same vertical plane is arranged on
It is in parallel by connecting wire between minus plate in two mounting posts of second plate support frame and first anode support frame,
It is in parallel by connecting wire between positive plate.
Electrode spacing 4-28mm between described positive plate and dentation negative electrode.
Described high frequency pulse power supply includes main circuit and auxiliary circuit；It is inverse that main circuit includes rectification filtering module, high frequency
Become module and high frequency boost module；It is connected after the rectified filtration module of electric main with high-frequency inversion module, high-frequency inversion module
It is connected with high frequency boost module, high frequency boost module is connected with electrode；Accessory power supply includes control power module, signal acquisition list
Member, main control unit, radio-frequency generator drive control unit and boosting drive control unit；Described rectification filtering module and control
Power module processed is connected, control power module and signal gathering unit, main control unit, radio-frequency generator drive control unit and
The drive control unit that boosts is connected, signal gathering unit and rectification filtering module, high-frequency inversion module, high frequency boost module with
And main control unit is connected, main control unit is connected with radio-frequency generator drive control unit and boosting drive control unit, high
Frequency generator drive control unit is connected with high-frequency inversion module, and boosting drive control unit is connected with high frequency boost module.
The pulse frequency 2.5-25kHz of described high frequency pulse power supply, dutycycle 61%-89%.
Described gas cup is additionally provided with the flexible pipe connected with gas feed.
Circulating fan is arranged on support plate washer, and support plate washer center offers the circle equal with circulating fan circulation area
Hole.
Compared with prior art, the present invention has following beneficial technique effect：
The high frequency negative high voltage toothed plate type VOCs processing systems that the present invention is provided, by setting toothed plate type reactor and negative high frequency
The pulse power, the high-voltage pulse electric of high frequency pulse power supply output is pressed between dentation negative electrode and positive plate that to inspire high energy particle equal
Therebetween, the gas containing VOCs is from the passage between dentation negative electrode and positive plate by that can be divided by high energy particle for even distribution
Solution into the material of environmental sound, realized by high frequency pulse power supply and core processing reactor to VOCs exhaust-gas efficients rate and
Stable degraded.
Brief description of the drawings
The stereochemical structure of VOCs processing units in the high frequency negative high voltage toothed plate type VOCs processing systems that Fig. 1 provides for the present invention
Schematic diagram；
The front view of VOCs processing units in the high frequency negative high voltage toothed plate type VOCs processing systems that Fig. 2 provides for the present invention；
Fig. 3 schemes for Fig. 2 A-A；
Fig. 4 schemes for Fig. 4 B-B；
The high frequency negative high voltage toothed plate type VOCs processing system principle schematics that Fig. 5 provides for the present invention；
High frequency pulse power supply structural representation in the high frequency negative high voltage toothed plate type VOCs processing systems that Fig. 6 provides for the present invention
Figure；
The high frequency negative high voltage toothed plate type VOCs processing system structural representations that Fig. 7 provides for the present invention.
Wherein, 1- gases cup；2- gas feeds；3- air intake pumps；4- first anode support frames；The cathode supports of 5- first
Framework；6- minus plates；7- positive plates；8- second plate support frames；9- the second cathode support frameworks；10- gas rear chambers；11-
Gas vent；12- supports plate washer；13- circulating fans；14- bolts；15- mounting posts；16- dentation negative electrodes；17- mounting grooves；18-
High-frequency electrical pulses source module.
Embodiment
With reference to specific embodiment, the present invention is described in further detail, it is described be explanation of the invention and
It is not to limit.
Referring to Fig. 1 to Fig. 7, a kind of high frequency negative high voltage toothed plate type VOCs processing systems, including VOCs processing units and high frequency
Pulse power source module；Described VOCs processing units include housing, circulating fan 13, air intake pump 3 and core processing reactor；Shell
Body center is provided with core processing reactor, and housing forward end is gas cup 1, and housing rear end is gas rear chamber 10, gas
It is provided with the housing of cup on gas feed 2, the housing of gas rear chamber and is provided with gas vent 11, gas cup 1 is provided with air inlet
It is provided with pump 3, the axis of core processing reactor at circulating fan 13, described circulating fan 13, air intake pump 3 and core
Reason reactor is connected with high-frequency electrical pulses source module.Circulating fan 13 is arranged on support plate washer 12, supports the center of plate washer 12
Offer the circular hole equal with circulating fan circulation area.
Wherein, described core processing reactor includes electrode holder, many rooted tooth shape negative electrodes 16 and multiple positive plates 7；
It is provided with electrode holder in the middle of multiple positive plates 7, each pair positive plate 7 and arranges many rooted tooth shape negative electrodes 16 in horizontal homogeneous, it is many
Rooted tooth shape negative electrode 16 is in same plane, and dentation negative electrode 16 is arranged in parallel with positive plate 7, between dentation negative electrode 16 and positive plate 7
Gas channel is formed with, airflow direction passes through conductor and high frequency arteries and veins respectively perpendicular to bar-shaped negative electrode, dentation negative electrode 16 and positive plate 7
The negative electrode for rushing power module 18 is connected with anode, the electrode spacing 4-28mm between described positive plate 7 and dentation negative electrode 16.
Multilayer is provided with specifically, being provided with the horizontal plane of described electrode holder on multiple rows of positive plate 7, vertical plane
Positive plate 7.Described dentation negative electrode 16 is rod-shaped conductor, and rod-shaped conductor surrounding is evenly arranged multiple points vertical with rod-shaped conductor
Thorn.The shape of dentation negative electrode 16 can be zigzag, herring-bone form, prickle shape etc..
Wherein, described electrode holder includes first anode support frame 4, the first cathode support framework 5, second plate
Support frame 8, the second cathode support framework 9 and multiple minus plates 6, the first cathode support framework 5 and the second cathode support framework 9
Equidistantly it is provided with mounting groove 17, minus plate 6, second plate support frame 8 and first anode support frame 4 and opens up in the horizontal direction
There are many rooted tooth shape negative electrodes 16 on mounting groove, same vertical plane to be arranged on by wire on the mounting groove of minus plate 6, horizontal plane
On multiple minus plates 6 respectively by mounting groove 17 be arranged on the first cathode support framework 5 and the second cathode support framework 9 it
Between, two mounting posts in second plate support frame 8 and first anode support frame 4 frame and vertical plane including surrounding
15, the positive plate 7 on same vertical plane is arranged on two installations of second plate support frame 8 and first anode support frame 4
It is in parallel by connecting wire between minus plate 6 on post, it is in parallel by connecting wire between positive plate.
Described high-frequency electrical pulses source module is that high frequency pulse power supply includes main circuit and auxiliary circuit；Main circuit includes whole
Flow filtration module, high-frequency inversion module and high frequency boost module；With high-frequency inversion module after the rectified filtration module of electric main
It is connected, high-frequency inversion module is connected with high frequency boost module, and high frequency boost module is connected with electrode；Accessory power supply includes control electricity
Source module, signal gathering unit, main control unit, radio-frequency generator drive control unit and boosting drive control unit；It is described
Rectification filtering module with control power module be connected, control power module taken place frequently with signal gathering unit, main control unit, height
Raw device drive control unit is connected with boosting drive control unit, signal gathering unit and rectification filtering module, high-frequency inversion
Module, high frequency boost module and main control unit are connected, main control unit and radio-frequency generator drive control unit and boosting
Drive control unit be connected, radio-frequency generator drive control unit is connected with high-frequency inversion module, boost drive control unit and
High frequency boost module is connected.The pulse frequency 2.5-25kHz of described high frequency pulse power supply, dutycycle 61%-89%.Need
Bright, high frequency pulse power supply is output as direct current hf and hv pulse or composite pulse, and power supply output pulse width, frequency, voltage can
Adjust.
Further, described gas cup is additionally provided with the flexible pipe connected with gas feed 2.
Specifically, referring to Fig. 1 to Fig. 6, the high frequency negative high voltage toothed plate type VOCs processing systems that the present invention is provided are by VOCs
Manage unit and high-frequency electrical pulses source module two parts composition.
VOCs processing units include：Gas cup 1, gas rear chamber 10, circulating fan 13, air intake pump 3 and core processing are anti-
Device is answered, wherein gas cup front end is provided with gas feed 2, and the rear end of gas rear chamber 10 is provided with gas vent 11.
Air intake pump 3 is located in gas cup 1, and air inlet pump power is adjusted according to VOCs concentration in processed gas, it is therefore an objective to
In order to control gas feed gas flow.The relatively low waste gas of pressure enters gas cup 1 by flexible pipe, needs to ensure gas after processing
VOCs concentration is in below limit value in the gas of outlet.
Circulating fan is in same vertical plane with core processing reactor, has both been exactly that circulating fan can be disposed at core
In the upper and lower, left and right either direction for the treatment of reactor.Circulating fan is in vertical direction with vertical direction center line alignment thereof
Arrangement, or in the horizontal direction along axis alignment.Circulating fan is arranged in supporting baffle 12, circulating fan and support block
Plate is directly attached by four bolts 14, and the center of supporting baffle 12 is provided with the circular hole equal with circulating fan flow area,
To ensure that gas can be smoothly passed over, its object is to processed waste gas can be made to be uniformly distributed and anti-at the uniform velocity by core processing
Device is answered, and prevents waste gas flow field non-uniform phenomenon caused by not by circulating fan 13.The described frequency of circulating fan 13 can
It is adjusted by main control unit, and then adjusts the gas circulation flow velocity in VOCs processing units, according to the gas of gas feed
Body flow and VOCs concentration regulation gas circulation multiplying power, in the case where ensureing that gas vent gas VOCs concentration is up to standard at realization
Manage efficiency and handle the active balance of energy consumption.
Core processing reactor is in the middle part of VOCs processing units, is the key point of whole VOCs processing units.Mainly
Composition includes：Dentation negative electrode, positive plate and electrode holder etc..
Dentation negative electrode is rod-shaped conductor, and surrounding is evenly arranged multiple spines vertical with rod-shaped conductor, the spine structure
Corona is more readily formed between dentation negative electrode and positive plate, high energy particle is inspired.Positive plate and dentation cathode parallel arrangement, dentation
It is gas channel between negative electrode and positive plate, airflow direction is perpendicular to dentation negative electrode.Can according to exhaust treatment efficiency and treating capacity
Increase dentation negative electrode quantity along gas flow direction, positive plate quantity increased along uprush direction, form multigroup discharge channel,
Produce high energy particle curtain.It is in parallel by connecting wire between minus plate, in parallel again by connecting wire between positive plate, negative and positive
Pole plate mutually insulated.Core processing reactor anode and cathode is connected with the negative electrode and anode of high-frequency electrical pulses source module respectively, composition
Core processing reactor.
High-frequency electrical pulses source module includes：Main circuit and auxiliary circuit composition.Main circuit is inverse by rectification filtering module, high frequency
Become module and high frequency boost module composition.Electric main is by being output as the direct current of high-frequency inversion module after rectification filtering module
Source, high-frequency inversion module is reverse into direct current Square wave pulses power supply again, is most boosted afterwards through high frequency boost module as height
Frequency high-voltage dc pulse power is exported to electrode.
Accessory power supply is by control power module, signal gathering unit, main control unit, radio-frequency generator drive control unit
With boosting drive control unit composition.Power module is controlled to provide control power supply for each functional unit of auxiliary circuit.Signal acquisition
Unit collection power supply and external status signals are exported to main control unit as feedback signal after being handled.Main control unit root
The feedback signal and external command provided according to signal gathering unit exports high-frequency inversion module master control instruction and high frequency through computing
Boost module master control is instructed, and master control instruction is output as drive signal driving high-frequency inversion module and high frequency liter through drive control unit
Die block.
Power supply function：The power supply is output as negative high frequency pulse power supply, and negative high voltage has discharge inception voltage is low to puncture with respect to positive high voltage
The high advantage of voltage.The parameters such as high frequency pulse power supply output frequency, pulsewidth, the voltage can be according to treated substance composition, concentration etc.
Adjusted, can also be automatically adjusted according to external feedback signal manually.
It is further specific
1. air intake pump collects the gas that VOCs waste gas produces source region by negative-pressure ward, VOCs processing is imported by flexible pipe
The gas cup of unit, by detecting the concentration of VOCs in waste gas, air inlet pump power is adjusted by feedback signal, to control to wait to locate
Manage exhaust gas flow, it is ensured that VOCs concentration is in below limit value in the gas of gas vent；
2. ON cycle blower fan, makes processed waste gas be uniformly distributed and at the uniform velocity by core processing reactor, and prevent from giving up
Gas flow field non-uniform phenomenon caused by not by circulating fan.The circulating fan frequency can be adjusted by main control unit
Section, and then the gas circulation flow velocity in processing unit is adjusted, gas circulation times is adjusted according to inlet gas flow and VOCs concentration
Rate, realizes treatment effeciency in the case where ensureing that gas vent gas VOCs concentration is up to standard and handles the active balance of energy consumption.
3. waste gas uniformly flows through in core processing reactor hole between dentation minus plate and positive plate, negative high voltage high frequency is opened
The pulse power, in the presence of additional negative electric field, has high chemically active high energy particle, largely by being mutated electric field and obtaining
Energy particle bombardment gas pollutant molecule is taken, inelastic collision is carried out with gas molecule and atom, excites, dissociates, ionizes
Etc. a series of chemical processes, transfer energy into molecule or atom, the molecule or the atom change that is excited for obtaining energy are survived
Property group, ion and excited state molecule so that gas be in the state of activation, enable needs very overactivity can chemical reaction
Occur.
(it is less than 10eV) when particle energy is relatively low, produces living radical, the contaminant molecule after activation passes through particle
It is removed after orientation chain chemical reaction.When particle average energy exceedes contaminant molecule chemical bonds energy, contaminant molecule
Key occurs fracture and decomposed, while high energy particle excites the free radicals such as generation O, OH, N.Because O and OH has very strong oxidation
Property, finally VOCs can be converted to SO2, NOx, CO2, H2O etc..
Physics, the chemical reaction of a series of complex triggered in the presence of high energy particle, make complicated macromolecule contaminant
It is changed into simple small molecule safe material, or the material for making poisonous and harmful substance be transformed into the low evil of nontoxic or low toxicity, enters one
Step enables pollutant degraded removal.Suitable control reaction condition can make generally to be difficult to or speed very slow change
Learning reaction becomes very rapid.
4. many component VOCs efficient process under discharge parameter coupling.Different corona discharge parameters include：Adjust output voltage 4
~250kV, pulse frequency and electrode spacing etc., synergic adjustment above-mentioned parameter strengthen the intensity of corona discharge, can be to different components
The raising of VOCs degradation rates produces crucial effect.Specifically, between pulse frequency 2.5-25kHz, dutycycle 61%-89%, electrode
Away from 4-28mm.
With the raising of negative pulse voltage, high energy electron, free radical isoreactivity particle produced by corona discharge are sharply increased,
Corona flow distribution is in high electron density area, and corona is from dark toward bright.Degradation rate can be improved by improving peak pressure.Improve VOCs
The key of degradation rate is a large amount of active groups that high energy particle is produced, the activity produced by during core processing reactor discharges
Particle will not run out of with VOCs reaction moments completely.Accordingly, there exist a period do not discharged, make remaining active particle after
Continuous degraded (such as the benzene in waste gas) and without input power.In addition, discharge voltage is higher, it is fiercer to discharge, and is produced during electric discharge
Active group it is just more, therefore can there is longer not discharge time section to wait the abundant reaction of active particle, i.e., most preferably account for
Sky is than smaller.This is that is, modulation power source is under higher discharge voltage, and advantage is more obvious.
Detailed process is to apply the larger negative voltage of a rising edge by high frequency pulse power supply, about more than ten nanoseconds, obtain
The formation that electric field one stronger discharges without causing electric arc, the formation of electric arc can damage reactor and reduce removal effect.Institute
The magnitude of voltage needed depends on the interval of discharge range cathode-anode plate, the duration of pulse and the composition of gas, and pulse continues
Time, to ensure that electric spark is not produced, and energy dissipation obtained minimum generally between 100-200 nanoseconds.
The influence that the pulse frequency and dutycycle of high frequency pulse power supply are degraded to VOCs, is exactly close by changing energy in fact
Degree, so that change the effect of VOCs degradeds, but this does not represent the mistake that pulse frequency and dutycycle the two parameters are handled in benzene
It is unnecessary in journey.First, dutycycle can reduce the input of energy, cut down energy consumption, also in the presence of an optimal dutycycle so that
VOCs energy efficiency reaches highest, and this is the advantage not available for general power supply；Secondly, high frequency pulse power supply can effectively drop
The temperature of low core processing reactor, is that the presence of pulse frequency and dutycycle so that core processing is anti-the reason for important
Device is answered to have the period of cooling；Last point is exactly the presence for having the two parameters, and control energy density is not only just to control
Discharge voltage processed is obtained, and the regulation of dutycycle and pulse frequency can also be played a part of controlling energy density.
In summary, the Oxidative Degradation Process present system for volatile organic matter is entered by following two processes
Row reaction：(1) high energy particle and the reactant that corona discharge pulse is produced are collided so that the relatively low c h bond of energy excite from
Solve as free radical, destroy the original structure of reactant, carry out a series of radical reaction again afterwards to be degraded to CO2With
H2The innocuous substances such as O.
(2) high energy particle produces a large amount of free radicals with higher-energy and with strong oxidizing property, and they are tied on phenyl ring
Close, destroy the stability of benzene ring structure, be broken phenyl ring, then by the oxidation of strong oxidizing property free radical, ultimately produce CO2And H2O
Deng innocuous substance.For high energy particle and the crash response of reactant, particle energy and each Chemical bond energy of reactant molecule
Can magnitude relationship, be smoothed out playing vital effect to reaction.Corona discharge is produced in this core processing reactor
High energy particle energy range in 0-20eV, and the benzene and the bond energy of each chemical bond of toluene being related in the present invention all compared with
It is low, therefore crash response can be smoothed out so that part chemical bond rupture dissociates into free radical.The crash response of benzene only has one
The approach of kind, and it is more difficult than toluene.Particle encounter reaction is the important reaction during benzene and degradation of toluene, but they are most
Final decline solution still will lean on a series of radical reaction to realize.Here the free radicals such as OH and O and benzene, toluene molecule are included
Direct reaction, and with crash response generate free radical further reaction.Specifically, the reaction of free radical and toluene
First since on methyl, a hydrogen atom wherein on methyl is dissociated, and toluene free radical is formed, so that methyl
Carbon atom on position has more a unpaired electron and is in electron deficient state.Then, the electrons in phenyl ring are swum to the carbon atom
It is dynamic, cause the big key of phenyl ring to destroy, be that the phenyl ring of planar structure is distorted originally, form more unstable free radical, the freedom
Base is further oxidized to carbon monoxide and carbon dioxide.
According to the spectrum analysis to product after reaction, toluene and benzene peak height after processing are significantly reduced, CO and CO2Deng peak value
Increase, it is CO and CO to illustrate benzene and toluene conversion2Deng material, and the transformation efficiency of the present invention is higher.
The high frequency negative high voltage toothed plate type VOCs processing systems that the present invention is provided, by setting toothed plate type reactor and negative high frequency
The pulse power, the high-voltage pulse electric of high frequency pulse power supply output is pressed between dentation negative electrode and positive plate that to inspire high energy particle equal
Therebetween, the gas containing VOCs is from the passage between dentation negative electrode and positive plate by that can be divided by high energy particle for even distribution
Solution into the material of environmental sound, realized by high frequency pulse power supply and core processing reactor to VOCs exhaust-gas efficients rate and
Stable degraded.
The general principle and principal character and advantages of the present invention of the present invention has been shown and described above.The technology of the industry
Personnel are it should be appreciated that the present invention is not limited to the above embodiments, and the simply explanation described in above-described embodiment and specification is originally
The principle of invention, without departing from the spirit and scope of the present invention, various changes and modifications of the present invention are possible, these changes
Change and improvement all fall within the protetion scope of the claimed invention.The claimed scope of the invention by appended claims and its
Equivalent thereof.
Claims (9)
1. a kind of high frequency negative high voltage toothed plate type VOCs processing systems, it is characterised in that including VOCs processing units and high-frequency impulse
Power supply；Described VOCs processing units include housing, circulating fan (13), air intake pump (3) and core processing reactor；In housing
Heart position is provided with core processing reactor, and housing forward end is gas cup (1), and housing rear end is gas rear chamber (10), gas
It is provided with the housing of cup on gas feed (2), the housing of gas rear chamber and is provided with gas vent (11), gas cup (1) is set
Have and circulating fan (13) is provided with air intake pump (3), the axis of core processing reactor, described circulating fan (13), enter
Air pump (3) and core processing reactor are connected with high frequency pulse power supply；Described core processing reactor includes electrode supporting
Frame, many rooted tooth shape negative electrodes (16) and multiple positive plates (7)；Multiple positive plates (7), each pair positive plate are provided with electrode holder
(7) many rooted tooth shape negative electrodes (16) are arranged in horizontal homogeneous in the middle of, many rooted tooth shape negative electrodes (16) are in same plane, dentation negative electrode
(16) it is arranged in parallel with positive plate (7), gas channel is formed between dentation negative electrode (16) and positive plate (7), airflow direction hangs down
It is straight to pass through conductor and the negative electrode and sun of high frequency pulse power supply (18) respectively in bar-shaped negative electrode, dentation negative electrode (16) and positive plate (7)
Extremely it is connected.
2. high frequency negative high voltage toothed plate type VOCs processing systems according to claim 1, it is characterised in that described electrode branch
It is provided with the horizontal plane of support on multiple rows of positive plate (7), vertical plane and is provided with multi-layered anode plate (7).
3. high frequency negative high voltage toothed plate type VOCs processing systems according to claim 1 or 2, it is characterised in that described tooth
Shape negative electrode (16) is rod-shaped conductor, and rod-shaped conductor surrounding is evenly arranged multiple spines vertical with rod-shaped conductor.
4. high frequency negative high voltage toothed plate type VOCs processing systems according to claim 1 or 2, it is characterised in that described electricity
Pole support frame includes first anode support frame (4), the first cathode support framework (5), second plate support frame (8), second
Cathode support framework (9) and multiple minus plates (6), the first cathode support framework (5) and the second cathode support framework (9) are along level
Direction is equidistantly provided with mounting groove (17), minus plate (6), second plate support frame (8) and first anode support frame (4) and opened
Provided with mounting groove, many rooted tooth shape negative electrodes (16) on same vertical plane are arranged on the mounting groove of minus plate (6) by wire,
Multiple minus plates (6) on horizontal plane are arranged on the first cathode support framework (5) and the second negative electrode by mounting groove (17) respectively
Between support frame (9), second plate support frame (8) and first anode support frame (4) include the frame of surrounding and hung down
Positive plate (7) on two mounting posts (15) faced directly, same vertical plane is arranged on second plate support frame (8) and first
It is in parallel by connecting wire between minus plate (6) in two mounting posts of anode-supported framework (4), by even between positive plate
Connect conductor in parallel.
5. the high frequency negative high voltage toothed plate type VOCs processing systems according to claim 1 or 4, it is characterised in that described sun
Electrode spacing 4-28mm between pole plate (7) and dentation negative electrode (16).
6. high frequency negative high voltage toothed plate type VOCs processing systems according to claim 1, it is characterised in that described high frequency arteries and veins
Rushing power supply includes main circuit and auxiliary circuit；Main circuit includes rectification filtering module, high-frequency inversion module and high frequency boost module；
It is connected after the rectified filtration module of electric main with high-frequency inversion module, high-frequency inversion module is connected with high frequency boost module, it is high
Frequency boost module is connected with electrode；Accessory power supply includes control power module, signal gathering unit, main control unit, height and taken place frequently
Raw device drive control unit and boosting drive control unit；Described rectification filtering module is connected with control power module, controls
Power module and signal gathering unit, main control unit, radio-frequency generator drive control unit and boosting drive control unit are equal
It is connected, signal gathering unit is connected with rectification filtering module, high-frequency inversion module, high frequency boost module and main control unit,
Main control unit is connected with radio-frequency generator drive control unit and boosting drive control unit, radio-frequency generator drive control list
Member is connected with high-frequency inversion module, and boosting drive control unit is connected with high frequency boost module.
7. high frequency negative high voltage toothed plate type VOCs processing systems according to claim 6, it is characterised in that described high frequency arteries and veins
Rush the pulse frequency 2.5-25kHz of power supply, dutycycle 61%-89%.
8. high frequency negative high voltage toothed plate type VOCs processing systems according to claim 1, it is characterised in that before described gas
Room is additionally provided with the flexible pipe connected with gas feed (2).
9. high frequency negative high voltage toothed plate type VOCs processing systems according to claim 1, it is characterised in that circulating fan (13)
On support plate washer (12), support plate washer (12) center offers the circular hole equal with circulating fan circulation area.
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| US4133649A (en) * | 1975-09-02 | 1979-01-09 | High Voltage Engineering Corporation | Reduced power input for improved electrostatic precipitation systems |
| CN2813071Y (en) * | 2005-01-06 | 2006-09-06 | 中国工程物理研究院环保工程研究中心 | Pulse corona discharge flue gas desulfurizing, denitrating and dust cleaning integral apparatus |
| CN1833762A (en) * | 2006-03-02 | 2006-09-20 | 上海保蓝环保科技发展有限公司 | Ionization type gas purifier |
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Application publication date: 20170801 |