CN106986413A - UV/H based on Response Surface Method2O2Process parameter optimizing method - Google Patents
UV/H based on Response Surface Method2O2Process parameter optimizing method Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000013461 design Methods 0.000 claims abstract description 36
- 238000002474 experimental method Methods 0.000 claims abstract description 25
- 230000003647 oxidation Effects 0.000 claims abstract description 25
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000005416 organic matter Substances 0.000 claims abstract description 14
- 238000012360 testing method Methods 0.000 claims abstract description 7
- 238000000540 analysis of variance Methods 0.000 claims abstract description 5
- 238000010219 correlation analysis Methods 0.000 claims abstract description 5
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 4
- 238000005457 optimization Methods 0.000 claims description 13
- 238000012545 processing Methods 0.000 claims description 12
- 239000000523 sample Substances 0.000 claims description 10
- 238000004458 analytical method Methods 0.000 claims description 3
- 238000005553 drilling Methods 0.000 claims description 3
- 238000011835 investigation Methods 0.000 claims description 3
- 239000003814 drug Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 description 7
- 238000009303 advanced oxidation process reaction Methods 0.000 description 6
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000002351 wastewater Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- IQUPABOKLQSFBK-UHFFFAOYSA-N 2-nitrophenol Chemical compound OC1=CC=CC=C1[N+]([O-])=O IQUPABOKLQSFBK-UHFFFAOYSA-N 0.000 description 1
- QJZYHAIUNVAGQP-UHFFFAOYSA-N 3-nitrobicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1C(C(=O)O)C2(C(O)=O)[N+]([O-])=O QJZYHAIUNVAGQP-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- GFTGHOJGGLNVMC-UHFFFAOYSA-N N=NC=NN.N=NC=NN.C(C=1C(C(=O)O)=CC=CC1)(=O)O Chemical compound N=NC=NN.N=NC=NN.C(C=1C(C(=O)O)=CC=CC1)(=O)O GFTGHOJGGLNVMC-UHFFFAOYSA-N 0.000 description 1
- 241001465805 Nymphalidae Species 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- MXWJVTOOROXGIU-UHFFFAOYSA-N atrazine Chemical compound CCNC1=NC(Cl)=NC(NC(C)C)=N1 MXWJVTOOROXGIU-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000003115 biocidal effect Effects 0.000 description 1
- 229940106691 bisphenol a Drugs 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229960005215 dichloroacetic acid Drugs 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004021 humic acid Substances 0.000 description 1
- -1 hydroxyl radical free radical Chemical class 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910001410 inorganic ion Inorganic materials 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/722—Oxidation by peroxides
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
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- Organic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Water Supply & Treatment (AREA)
- Environmental & Geological Engineering (AREA)
- Theoretical Computer Science (AREA)
- Hydrology & Water Resources (AREA)
- Geometry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Evolutionary Computation (AREA)
- Computer Hardware Design (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Physical Water Treatments (AREA)
Abstract
The invention discloses a kind of UV/H2O2 process parameter optimizing methods based on Response Surface Method, including：(1) the mixed mark experiments of the RSM of design object organic matter removal；(2) the mixed mark experiments of the RSM that target organic is removed；(3) UV/H2O2 advanced oxidations pilot-plant, provided with multiple adding of agent points, is respectively used to add H2O2 and the target organic mark-on with water test；(4) target organic removes model, carries out multiple regression fitting to experimental data using Design Expert softwares, sets up regression equation；(5) regression equation carries out variance and correlation analysis using the ANOVA of response surface design secondary model；(6) technological parameter is determined.This invention simplifies the frequent adjusting process parameter of practical engineering application process, model can be with UV/H after setting up2O2The linkage of advanced oxidation reactor robot control system(RCS), realizes automatically adjusting for technological parameter, effectively reduces cost.
Description
Technical field
The present invention relates to a kind of water process UV/H2O2Advanced oxidation processes parameter optimization method, it is more particularly to a kind of to utilize
Response Surface Method determines a variety of hardly degraded organic substances of processing and required UV dosage and H2O2The method of dosage.
Background technology
High-level oxidation technology (Advance Oxidation Processes, abbreviation AOPs), also known as advanced oxidation processes,
It is the activity that one kind makes full use of hydroxyl radical free radical (OH), the water technology of quick exhaustive oxidation organic pollution.Wherein,
UV/H2O2Advanced oxidation processes, to the chloroform in water, dichloroacetic acid, Atrazine, o-dichlorohenzene, phthalic acid diformazan
The hardly degraded organic substances such as ester, bisphenol-A have good removal effect.But in practice, UV/H2O2It is optimal to there is UV in technique
Dosage determines difficult, H2O2Throwing amount is big, utilization rate is low and remaining H2O2The problems such as being difficult to processing.Research shows that oxidation operation reacts
Speed is directly proportional to UV dosage or luminous intensity, but UV dosage is higher, and power consumption is higher, and use cost is higher；And H2O2Dosage is present
One critical value, H is increased less than this value2O2Dosage can improve treatment effect, and H is increased higher than this value2O2Dosage can then be reduced
Treatment effect；Humic acid and SO in water4 2-、NO3-Deng inorganic ions, OH can be also produced under uv illumination, so as to strengthen oxidation effect
Rate；But it is also free radical activity component simultaneously, certain OH can be consumed, is unfavorable for the degraded of organic pollution.As can be seen here,
It is badly in need of providing a kind of UV/H2O2When handling gas chromatography, required cost-effective UV dosage and H2O2The determination side of dosage
Method.
Response surface design design method (RSM), the correlation of each factor and experimental result (response) is intended with multinomial
The regression model of conjunction, by the relation function between each factor and experimental result, passes through the sound of analytic function as evaluation function
Answer face, study between each factor and response, the correlation of each factor between any two, be a kind of conventional process parameter optimizing
Method.
RSM has been used for US/UV/Fenton, UV/H2O2, the senior oxidation processes antibiotic such as photochemical catalytic oxidation, nitrophenol,
The optimization of the technological parameters such as dyeing waste water, pharmacy waste water, starch wastewater.But this method sets up multinomial generally directed to single organic matter
Formula regression equation, and the economic factor of each technological parameter is not considered；For handling during gas chromatography, it is more difficult to it is determined that most passing through
Help effective technological parameter.
The content of the invention
The technical problems to be solved by the invention are that the defect existed for prior art determines that processing is a variety of there is provided one kind
UV/H during organic matter2O2Advanced oxidation processes parameter optimization method, to reach the plurality of target organic matter removal effect of setting.
To solve this technical problem, the invention provides a kind of UV/H based on Response Surface Method2O2Process parameter optimizing
Method, comprises the following steps：
(1) the mixed mark experiments of the RSM of design object organic matter removal：Using supporting UV/H2O2Advanced oxidation pilot-plant is carried out
Experiment；Target organic is set up one by one to remove model and examine its conspicuousness, validity, analyzes respective optimal processing parameter；It is excellent
Change design and remove the optimum condition of plurality of target organic matter, and carry out model checking, determine cost-effective technological parameter；
(2) the mixed mark experiments of the RSM that the target organic is removed：To H2O2At the beginning of dosage, UV dosage and target organic
The factors such as beginning concentration and its level are designed；Using Design Expert softwares, using Box-Behnken designs, if
The mixed mark experiments of RSM are counted, and use supporting UV/H2O2Advanced oxidation pilot-plant carries out experiment；
(3) UV/H2O2Advanced oxidation pilot-plant, provided with multiple adding of agent points, is respectively used to add H2O2And match somebody with somebody
The target organic mark-on of water test, using Practical Project accessing pending water as raw water；
(4) target organic removes model, using target organic clearance as response Y1, Y2……Yn, with H2O2
Dosage A, UV dosage B and target organic initial concentration C1, C2……CnFor independent variable, using Design-Expert softwares
Multiple regression fitting is carried out to experimental data, regression equation is set up：
Y1=k1,1+k1,2A+k1,3B+k1,4C1+k1,5AB+k1,6AC1+k1,7BC1+k1,8A2+k1,9B2+k1,10C1 2(formula 1)
Yn=kn,1+kn,2A+kn,3B+kn,4Cn+kn,5AB+kn,6ACn+kn,7BCn+kn,8A2+kn,9B2+kn,10Cn 2(formula 2)
Wherein, k1,1……k1,10, kn,1……kn,10It is constant；
(5) regression equation should carry out variance and correlation analysis, analysis using the ANOVA of response surface design secondary model
The fitting coefficient and amendment fitting coefficient of regression model；If model effectively if can be used for process parameter optimizing, model is invalid, weighs
Multiple experiment；
(6) technological parameter determines method：Using Design Expert softwares, increase UV lamp power consumption cost m1And H2O2
Reagent cost m2For modifying factor, to be most difficult to the clearance Y of organics removalxFor desired value, other target organic clearances are set
It is set to model interval interior, passes through the technological parameter that Optimization optimization designs remove plurality of target organic matter；Corresponding H2O2
Dosage A and UV dosage B totle drilling cost minimum values are optimal parameter, f (A, B)=min (m1A+m2B)；And investigation is satisfied with angle value weighing apparatus
Its relation with target value is measured, the optimal processing parameter obtained according to model carries out experiment and model is verified.
The UV/H2O2Advanced oxidation pilot-plant include be sequentially connected water pump, electromagnetic flowmeter, pipe-line mixer and
UV reactor, is provided with multiple toss areas, is provided with UV reactor between the electromagnetic flowmeter and pipe-line mixer
Multiple sample points.
The UV reactor includes ultraviolet light intensity and popped one's head in and ultraviolet lamp tube, the ultraviolet light intensity probe and ultraviolet lamp tube
It is arranged in sleeve pipe；Described ultraviolet lamp tube is low-pressure lamp.
Beneficial effect：This invention simplifies the frequent adjusting process parameter of practical engineering application process, model can be with after setting up
UV/H2O2The linkage of advanced oxidation reactor robot control system(RCS), realizes automatically adjusting for technological parameter, is gone in guarantee target organic
Cost is effectively reduced while except rate, there is highly important directive significance for the operation of Practical Project.
Brief description of the drawings
Fig. 1 is the structural representation of pilot-plant of the present invention.
In figure：1 water pump, 2 electromagnetic flowmeters, 3 pipe-line mixers, 4 UV reactors, 5 toss areas, 6 sample points, 7 purples
Outer light intensity probe, 8 ultraviolet lamp tubes, 9 sleeve pipes.
Embodiment
Below in conjunction with the accompanying drawings and embodiment is specifically described to the present invention.
UV/H of the present invention based on Response Surface Method2O2Process parameter optimizing method, comprises the following steps：
(1) the mixed mark experiments of the RSM of design object organic matter removal：Using supporting UV/H2O2Advanced oxidation pilot-plant is carried out
Experiment；Target organic is set up one by one to remove model and examine its conspicuousness, validity, analyzes respective optimal processing parameter；It is excellent
Change design and remove the optimum condition of plurality of target organic matter, and carry out model checking, determine cost-effective technological parameter；
(2) the mixed mark experiments of the RSM that the target organic is removed：To H2O2At the beginning of dosage, UV dosage and target organic
The factors such as beginning concentration and its level are designed；Using Design Expert softwares, using Box-Behnken designs, if
The mixed mark experiments of RSM are counted, and use supporting UV/H2O2Advanced oxidation pilot-plant carries out experiment；
(3) UV/H2O2Advanced oxidation pilot-plant, provided with multiple adding of agent points, is respectively used to add H2O2And match somebody with somebody
The target organic mark-on of water test, using Practical Project accessing pending water as raw water；
(4) target organic removes model, using target organic clearance as response Y1, Y2……Yn, with H2O2
Dosage A, UV dosage B and target organic initial concentration C1, C2……CnFor independent variable, using Design-Expert softwares
Multiple regression fitting is carried out to experimental data, regression equation is set up：
Y1=k1,1+k1,2A+k1,3B+k1,4C1+k1,5AB+k1,6AC1+k1,7BC1+k1,8A2+k1,9B2+k1,10C1 2(formula 1)
Yn=kn,1+kn,2A+kn,3B+kn,4Cn+kn,5AB+kn,6ACn+kn,7BCn+kn,8A2+kn,9B2+kn,10Cn 2(formula 2)
Wherein, k1,1……k1,10, kn,1……kn,10It is constant；
(5) regression equation should carry out variance and correlation analysis, analysis using the ANOVA of response surface design secondary model
The fitting coefficient and amendment fitting coefficient of regression model；If model effectively if can be used for process parameter optimizing, model is invalid, weighs
Multiple experiment；
(6) technological parameter determines method：Using Design Expert softwares, increase UV lamp power consumption cost m1And H2O2
Reagent cost m2For modifying factor, to be most difficult to the clearance Y of organics removalxFor desired value, other target organic clearances are set
It is set to model interval interior, passes through the technological parameter that Optimization optimization designs remove plurality of target organic matter；Corresponding H2O2
Dosage A and UV dosage B totle drilling cost minimum values are optimal parameter, f (A, B)=min (m1A+m2B)；And investigation is satisfied with angle value weighing apparatus
Its relation with target value is measured, the optimal processing parameter obtained according to model carries out experiment and model is verified.
Fig. 1 show the structural representation of pilot-plant of the present invention.
The UV/H2O2Advanced oxidation pilot-plant, disposal ability 5m3/ h, using Practical Project accessing pending water as raw water.
The UV/H2O2Advanced oxidation pilot-plant includes water pump 1, electromagnetic flowmeter 2, the pipe-line mixer 3 being sequentially connected
With UV reactor 4, multiple toss areas 5 are provided between the electromagnetic flowmeter 2 and pipe-line mixer 3, in ultraviolet reaction
Device 4 is provided with multiple sample points 6.
The UV reactor 4 includes ultraviolet light intensity probe 7 and ultraviolet lamp tube 8, the ultraviolet light intensity probe 7 and ultraviolet
Fluorescent tube 8 is arranged in sleeve pipe 9；Described ultraviolet lamp tube 8 is low-pressure lamp, is equipped with ultraviolet ray intensity detector, can pass through chain of command
Plate adjusts the operating power of uviol lamp, UV dosage needed for adjustment.
The embodiment of the present invention：
The present invention is bent using response by taking ground depth (GSM) and the different two kinds of target organics of down alcohol (2-MIB) of dimethyl as an example
Face method optimization UV/H2O2The cost-effective technological parameter that advanced oxidation processes are removed to it.
(1) to H2O2Concentration, UV dosage and the factor of GSM and 2-MIB initial concentrations three and its level are designed (table 1).
Using Design Expert softwares, using Box-Behnken designs, the mixed mark experiments of design RSM.
Table 1GSM and 2-MIB response surface analysis factor and level
To H2O2Concentration, UV dosage, GSM or 2-MIB initial concentrations make such as down conversion：
A, B, C=(Xi-Xi0)/S (formula 3)
In formula, A, B, C is each independent variable encoded radio, and Xi is each independent variable actual value, each independent variable at point centered on Xi0
Actual value, S is the change step of independent variable.
(2) UV/H is used2O2Advanced oxidation pilot-plant, treatment scale is 5m3/ h, water outlet is filtered as raw water using certain water factory,
The mixed marks of GSM and 2-MIB are added, mark experiment is mixed according to the RSM of design and carries out 17 groups of experiments, experimental result is as shown in tables 2 and 3.
Table 2GSM Response Surface Method design and experimental result
The 2-MIB of table 3 Response Surface Method design and experimental result
Note：Absolute error=actual value-predicted value；Relative error=absolute error/actual value.
(3) using GSM and 2-MIB clearances as response (Y1, Y2), with H2O2Dosage (A), UV dosage (B) and target
Organic matter initial concentration (C1, C2 ... Cn) is independent variable, experimental data is carried out polynary time using Design-Expert softwares
Return fitting, set up regression equation：
Y1=86.68+19.25A+6.17B-5.78C1-2.75AB+7.25AC1+5.10BC1
-8.69A2-3.24B2-241C2(formula 4)
Y2=95.36+17.00A+9.77B-9.98C2+1.04AB+10.95AC2+5.00BC2
-11.48A2-17.83B2-2.93C2 2(formula 5)
Measured value within ± 2.0%, shows that Regression Model Simulator degree is higher with predicted value error.
(4) using the ANOVA of response surface design secondary model, variance and correlation analysis are carried out to Y1 and Y2 regression equations,
P≤0.0001 of Y1 and Y2 models, shows that model is statistically significant, highly significant；The fitting coefficient of regression model
It is equal with amendment fitting coefficient>0.95, further illustrate that models fitting goodness is preferable.
(5) Design Expert softwares, increase UV lamp power consumption cost and H are used2O2Reagent cost is modifying factor, with most
Difficult organics removal 2-MIB clearance 90% is desired value, and GSM clearances pass through in being set as that model is interval
Optimization optimization designs remove GSM and 2-MIB optimal processing parameter (table 4), f (A, B)=min (0.0109A+
0.00016B), H2O2(27.5%, solution) price is in terms of 3000 yuan/t, and commercial power is in terms of 0.8 yuan/kWh；It is satisfied with angle value
1, the optimal processing parameter obtained according to model test and model is verified, experiment measured value and the relative of model predication value are missed
Difference is within ± 2%；It is suitable effective to illustrate the model.
The optimal processing parameter that the 2-MIB of table 4 is removed
This invention simplifies the frequent adjusting process parameter of practical engineering application process, model can be with UV/H after setting up2O2It is senior
The linkage of oxidation reactor robot control system(RCS), realizes automatically adjusting for technological parameter, while target organic clearance is ensured
Cost is effectively reduced, there is highly important directive significance for the operation of Practical Project.
The embodiment above of the present invention, is merely illustrative, be not it is only, it is all within the scope of the present invention or it is equivalent this
Change in the range of invention is by present invention encirclement.
Claims (3)
1. a kind of UV/H based on Response Surface Method2O2Process parameter optimizing method, it is characterised in that：Comprise the following steps：
(1) the mixed mark experiments of the RSM of design object organic matter removal：Using supporting UV/H2O2Advanced oxidation pilot-plant is carried out real
Test；Target organic is set up one by one to remove model and examine its conspicuousness, validity, analyzes respective optimal processing parameter；Optimization
Design removes the optimum condition of plurality of target organic matter, and carries out model checking, determines cost-effective technological parameter；
(2) the mixed mark experiments of the RSM that the target organic is removed：To H2O2Dosage, UV dosage and target organic are initially dense
The factors such as degree and its level are designed；Using Design Expert softwares, using Box-Behnken designs, design
The mixed mark experiments of RSM, and use supporting UV/H2O2Advanced oxidation pilot-plant carries out experiment；
(3) UV/H2O2Advanced oxidation pilot-plant, provided with multiple adding of agent points, is respectively used to add H2O2And water distribution examination
The target organic mark-on tested, using Practical Project accessing pending water as raw water；
(4) target organic removes model, using target organic clearance as response Y1, Y2……Yn, with H2O2Add
Measure A, UV dosage B and target organic initial concentration C1, C2……CnFor independent variable, using Design-Expert softwares to reality
Test data and carry out multiple regression fitting, set up regression equation：
Y1=k1,1+k1,2A+k1,3B+k1,4C1+k1,5AB+k1,6AC1+k1,7BC1+k1,8A2+k1,9B2+k1,10C12 (formulas 1)
Yn=kn,1+kn,2A+kn,3B+kn,4Cn+kn,5AB+kn,6ACn+kn,7BCn+kn,8A2+kn,9B2+kn,10Cn2 (formulas 2)
Wherein, k1,1……k1,10, kn,1……kn,10It is constant；
(5) regression equation should carry out variance and correlation analysis using the ANOVA of response surface design secondary model, and analysis is returned
The fitting coefficient and amendment fitting coefficient of model；If model effectively if can be used for process parameter optimizing, model is invalid, repeats reality
Test；
(6) technological parameter determines method：Using Design Expert softwares, increase UV lamp power consumption cost m1And H2O2Medicament
Cost m2For modifying factor, to be most difficult to the clearance Y of organics removalxFor desired value, other target organic clearances are set as
In model is interval, the technological parameter of plurality of target organic matter is removed by Optimization optimization designs；Corresponding H2O2Add
It is optimal parameter, f (A, B)=min (m to measure A and UV dosage B totle drilling cost minimum values1A+m2B)；And investigation is satisfied with angle value and weighs it
With the relation of target value, the optimal processing parameter obtained according to model carries out experiment and model is verified.
2. the UV/H according to claim 1 based on Response Surface Method2O2Process parameter optimizing method, it is characterised in that：Institute
State UV/H2O2Advanced oxidation pilot-plant includes water pump (1), electromagnetic flowmeter (2), pipe-line mixer (3) and the purple being sequentially connected
Outside line reactor (4), is provided with multiple toss areas (5), in ultraviolet between the electromagnetic flowmeter (2) and pipe-line mixer (3)
Reactor (4) is provided with multiple sample points (6).
3. the UV/H according to claim 2 based on Response Surface Method2O2Process parameter optimizing method, it is characterised in that：Institute
Belonging to UV reactor (4) includes ultraviolet light intensity probe (7) and ultraviolet lamp tube (8), the ultraviolet light intensity probe (7) and uviol lamp
Pipe (8) is arranged in sleeve pipe (9)；Described ultraviolet lamp tube (8) is low-pressure lamp.
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Cited By (6)
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|---|---|---|---|---|
| CN108628272A (en) * | 2018-06-28 | 2018-10-09 | 上海电力学院 | The process parameter optimizing method that optimum seeking method based on cost is coupled with law of planning |
| CN109002685A (en) * | 2018-06-28 | 2018-12-14 | 南京大学 | The degradation prediction technique of artificial sweetener in ultraviolet/sodium peroxydisulfate removal secondary effluent |
| CN109142647A (en) * | 2018-10-25 | 2019-01-04 | 农业部规划设计研究院 | A kind of scaling method of compost moisture content online monitoring instruments |
| CN109271753A (en) * | 2018-11-29 | 2019-01-25 | 东北大学 | The process parameter optimizing method of vanadium wastewater ammonia nitrogen recycling based on response surface analysis |
| CN110013870A (en) * | 2019-04-13 | 2019-07-16 | 安徽工程大学 | A kind of silver & strontium/titanium dioxide-graphene carbonitride composite photocatalyst material preparation and its application |
| WO2023165001A1 (en) * | 2022-03-03 | 2023-09-07 | 北京工业大学 | Composite sewage denitrification process device and operation parameter optimization method |
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| CN109002685A (en) * | 2018-06-28 | 2018-12-14 | 南京大学 | The degradation prediction technique of artificial sweetener in ultraviolet/sodium peroxydisulfate removal secondary effluent |
| CN109002685B (en) * | 2018-06-28 | 2021-11-16 | 南京大学 | Degradation prediction method for removing artificial sweetener in secondary effluent by ultraviolet/sodium persulfate |
| CN109142647A (en) * | 2018-10-25 | 2019-01-04 | 农业部规划设计研究院 | A kind of scaling method of compost moisture content online monitoring instruments |
| CN109271753A (en) * | 2018-11-29 | 2019-01-25 | 东北大学 | The process parameter optimizing method of vanadium wastewater ammonia nitrogen recycling based on response surface analysis |
| CN110013870A (en) * | 2019-04-13 | 2019-07-16 | 安徽工程大学 | A kind of silver & strontium/titanium dioxide-graphene carbonitride composite photocatalyst material preparation and its application |
| WO2023165001A1 (en) * | 2022-03-03 | 2023-09-07 | 北京工业大学 | Composite sewage denitrification process device and operation parameter optimization method |
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