CN106933040A - Litho machine splices illuminator and its method of adjustment - Google Patents
Litho machine splices illuminator and its method of adjustment Download PDFInfo
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- CN106933040A CN106933040A CN201511022036.0A CN201511022036A CN106933040A CN 106933040 A CN106933040 A CN 106933040A CN 201511022036 A CN201511022036 A CN 201511022036A CN 106933040 A CN106933040 A CN 106933040A
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- visual field
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
Abstract
The invention discloses a kind of litho machine splicing illuminator and its method of adjustment, litho machine splicing illuminator includes：Lighting unit, multiple light intensity transmitance adjusting means, multigroup unit object lens, field stop and the luminous intensity measurement sensor on substrate motion platform set gradually along optical propagation direction, the field stop is adjustable field stop.The present invention is by setting adjustable field stop, it is not necessary to adjust the adjustment that any eyeglass for participating in imaging is capable of achieving the field positions of many camera lens litho machine real estates, easy to operate, regulation is quick.
Description
Technical field
The present invention relates to IC manufacturing field, more particularly to a kind of litho machine splicing illuminator and its tune
Adjusting method.
Background technology
In flat display field, by constantly expanding from generation to generation, litho machine need to provide big exposure field to substrate area
To ensure high yield.Visual field of exposing completely can be formed by multiple less unit objective angular fields are combined and spliced, be passed through
Mask images realize exposure with the synchronous scanning campaign of gluing substrate.Correspondingly, illuminator there is also
Multiple cell illuminations and the scheme demand of illumination splicing, the scheme of splicing often bring the light intensity between cell illumination
Homogeneity question, the uniformity of the final exposure line width of influence, in the splicing regions of two neighboring unit visual field,
This problem is particularly acute.Therefore it is guarantee splicing illumination uniformity, it is also desirable to the method for design measurement and compensation.
On field stitching mode, NIKON proposes in the United States Patent (USP) of Publication No. US5729331
A kind of light structures：Multiple unit object lens splicing, each unit object lens are divided into two-layer, every layer be Dyson or
The optical design of Offner forms.The structure of lighting part is shown in Fig. 1, and it has following features：First, light source
102 is one or more, and light source emergent ray can be sent to each unit illumination by separating conduction light path 103；Respectively
Light respectively through light balancing device 105 after, form the larger illumination field of view 111 of area, real estate in mask plane 8
Field stop is placed between the double-decker of projection lens, is designed as splicing trapezoidal, hexagon or other can
The shape of splicing；Real estate visual field can be adjusted by the optical textures such as offset flat-panel (102-107).
However, how the light-intensity difference that this design is present between not yet explicitly cell illumination is processed, and real estate
The measuring method of field positions is stated, and adjustment does not accomplish that imaging is separated with illumination yet.
Therefore, Nikon proposes the details of illumination intensity control, and main thought is：By energy sensor successively
Measurement real estate each unit visual field light intensity, carries out magnitude of recruitment calculating and sends adjustment order by signal processing unit；
Light intensity is made by power control unit and filtering attenuation device to adjust, energy sensor is in course of adjustment participation
Closed-loop control；Real estate light intensity with certain desired value (for example：On the basis of certain visual field, or use is respectively regarded
Quarry sampling light intensity average value etc.) it is adjustment direction, emphasize that light intensity value is equal at each field stitching.
The content of the invention
The present invention provides a kind of litho machine splicing illuminator and its method of adjustment, to solve to deposit in the prior art
Above-mentioned technical problem.
In order to solve the above technical problems, the present invention provides a kind of litho machine splicing illuminator, including：Along light
Lighting unit that the direction of propagation sets gradually, multiple light intensity transmitance adjusting means, multigroup unit object lens, regard
Field diaphragm and the luminous intensity measurement sensor on substrate motion platform, the field stop are adjustable visual field
Diaphragm.
Preferably, the lighting unit includes light source, optical fiber and even light unit, the light that the light source sends
Beam enters into each light intensity transmitance adjusting means through the even light of even light unit respectively after being divided into multiple light beams by optical fiber
In.
Preferably, being additionally provided with energy of light source monitoring sensor between the light source and optical fiber.
Preferably, the adjustable field stop is driven by motor, for adjusting spelling on substrate motion platform
The visual field for connecing.
Preferably, the adjustable field stop is arranged at the superstructure and understructure of the unit object lens
Between.
Preferably, the six-degree-of-freedom information of the substrate motion platform is given by position measuring system.
Preferably, the position measuring system is interferometer or coded scale.
Preferably, the field stop is rectangle, trapezoidal or hexagon.
The present invention also provides a kind of litho machine splicing illuminator method of adjustment, is spliced using described litho machine
Illuminator, including：
Step 1：Sliceable regarded so as to adjust on substrate motion platform using the position of motor adjustment field stop
；
Step 2：Light intensity transmitance adjusting means is adjusted by the measured value of luminous intensity measurement sensor, so as to adjust
The light intensity of each unit visual field in sliceable visual field.
Preferably, the step 1 includes：
Step 11：Using luminous intensity measurement sensor to the light and shade boundary bit of each unit visual field in sliceable visual field
Put and scan for, obtain the boundary position information of each unit visual field；
Step 12：The target location letter of boundary position information and each unit visual field according to each unit visual field
Breath, calculates and obtains the adjustment amount of each field stop, and each unit visual field is completed according to each adjustment amount
The compensation adjustment of position.
Preferably, in the step 11, using the light and shade boundary position of dichotomizing search each unit visual field.
Preferably, the dichotomy includes：The position of each unit visual field border described in first entirety measurement and positioning
Scope, then restrain to each unit visual field search boundary position and progressively respectively, finally determine the unit
The boundary position information of visual field.
Preferably, in step 11：Light and shade boundary position to each unit visual field in sliceable visual field is carried out
The step of search, includes：Entire scan sampling is carried out to sliceable visual field, and to the light intensity of scanning sample acquisition
Interpolation calculation is carried out with position data, the boundary position information of each unit visual field is obtained.
Preferably, step 12 includes：Boundary position information and target location letter to each unit visual field
Breath carries out least square method calculating, so as to obtain the translation of each unit visual field, rotation parameter；Then, utilize
The translation of each unit visual field, rotation parameter are converted to information process unit the tune of each field stop of correspondence
Whole amount.
Preferably, the step 2 includes：
Step 21：Using the light intensity in luminous intensity measurement sensor measurement each unit visual field；
Step 22：The light intensity desired value of each unit visual field, Yi Jiguang are combined by the light intensity of each unit visual field
The transmitance of strong transmitance adjusting means, calculates the transmitance setting value for obtaining each unit visual field；
Step 23：According to the transmitance setting value, the adjusting means motion of control light intensity transmitance completes every
The transmitance compensation of individual unit visual field.
Compared with prior art, the present invention has advantages below：
1st, the present invention uses the border of light intensity energy sensor scanning field of view, it can be ensured that the splicing of field positions
Accuracy, on the other hand also ensure that light strong consistency between unit visual field；
2nd, by the present invention in that with motor control field stop position without adjusting any mirror for participating in imaging
Piece, and then the adjustment of the field positions of many camera lens litho machine real estates is realized, easy to operate, regulation is quick；
3rd, sensed by the present invention in that doing closed-loop control with the light intensity energy sensor on substrate motion platform
Device, monitors sensor and directly monitors energy of light source state using energy of light source, improves the algorithm of light intensity splicing.
Brief description of the drawings
Fig. 1 is NIKON's light structures schematic diagram in the prior art；
Fig. 2 is the structural representation of litho machine splicing illuminator in the present invention；
Fig. 3 is the shape and distribution schematic diagram of field stop in the present invention；
Fig. 4 is the location diagram of luminous intensity measurement sensor and luminous intensity measurement point in visual field in the present invention；
Fig. 5 is unit field positions boundary scan schematic diagram in the present invention；
Fig. 6 is field positions measurement and the schematic flow sheet for adjusting in the present invention；
Fig. 7 is light intensity uniformity adjustment flow chart in the present invention；
Fig. 8 a~8c is the light intensity Adjustment effect figure in the present invention.
Specific embodiment
It is right below in conjunction with the accompanying drawings to enable the above objects, features and advantages of the present invention more obvious understandable
Specific embodiment of the invention is described in detail.It should be noted that, accompanying drawing of the present invention is using simplification
Form and use non-accurately ratio, be only used to conveniently, lucidly aid in illustrating the embodiment of the present invention mesh
's.
As shown in Fig. 2 litho machine splicing illuminator of the invention, including the monitoring of light source 100, energy of light source
Sensor 200, optical fiber 300, even light unit 400, light intensity transmitance adjusting means 500, unit object lens,
Field stop 800 and the luminous intensity measurement sensor 110 on substrate motion platform, the unit object lens include
Superstructure 700 and understructure 900, wherein, the upper strata of the unit object lens that the field stop 800 is located at
Between structure 700 and understructure 900, the field stop 800 is driven by motor and adjusted, the visual field
The shape of diaphragm 800 constitutes the sliceable visual field on real estate, on each counterpart substrate of field stop 800
A unit visual field.In other words, the present invention directly uses motor control when field positions adjustment is carried out
The position of field stop processed 800 is to be capable of achieving, and need not adjust any eyeglass for participating in imaging, and regulation is quick,
It is easily achieved.
Specifically, the present embodiment describes photoetching of the invention in detail by taking 2 light sources, 6 illumination paths as an example
Machine splices illuminator.With continued reference to Fig. 2, light source 100 is provided with two groups, and two groups of light sources 100 send light beam
Entered into after being detected by energy of light source monitoring sensor 200 in the optical fiber 300 of multiple-input, multiple-output, and be divided into 6 beams
In having respectively entered 6 even light units 400 after light path, per the Shu Guangjing even light of even light unit 400 after again by light
Strong transmitance adjusting means 500 carries out transmitance regulation, projects on mask 600, is loaded with mask 600 and believes
The light beam of breath enters into the superstructure 700 of unit object lens, through that can be entered by motor-driven field stop 800
To the understructure 900 of unit object lens, and project on real estate, the luminous intensity measurement on substrate motion platform
Sensor 110 measures the light intensity of the stitching portion of the unit visual field formed by field stop 800.
The shape of the field stop 800 can be rectangle, trapezoidal or hexagon, and each figure can be spliced into
One is overall.By taking the isosceles trapezoid shown in Fig. 3 as an example, the base angle of the isosceles trapezoid is on 45 °, i.e. substrate
Visual field splice integral by 6 isosceles trapezoids, wherein, the both sides of isosceles trapezoid are triangle splice regions
Domain.Specifically, 6 field stops 800 are arranged and mutually corresponding in two rows.Specifically, first,
Three, the 5th field stops 801,803,805 are arranged in a row, and the first field stop 801 is regarded with the 3rd
Interval region between field diaphragm 803 matches with the second field stop 802, the three, the 5th field stops
803rd, the interval region between 805 matches with the 4th field stop 804, the 6th field stop 806 and
Five field stops 805 are correspondingly arranged.
More specifically, as shown in figure 4, luminous intensity measurement sensor 110 is provided with 7,7 described light
Strong measurement sensor 110 is corresponding with the position of the visual field that field stop 800 is formed.The luminous intensity measurement is passed
Sensor 110 can move to first, the three, the 5th field stops 801,803,805 with substrate motion platform
At the visual field for being formed, while measuring 6 light intensity datas of splicing regions, then step to second, the 4th,
At the visual field that 6th field stop 802,804,806 is formed, then remaining 6 splicing regions are measured simultaneously
Light intensity data.Wherein, the six-degree of freedom position information of substrate motion platform can be by position measuring system as done
Interferometer, coded scale are given.
Fig. 5 to Fig. 8 c is refer to, the present invention also provides a kind of litho machine splicing illuminator method of adjustment, bag
Include：Step 1 is measurement and the set-up procedure of field positions：The position of field stop 800 is adjusted using motor
So as to adjust the sliceable visual field on substrate motion platform；Step 2 is measurement and the set-up procedure of visual field light intensity：
Light intensity transmitance adjusting means 500 is adjusted by the measured value of luminous intensity measurement sensor 110, so as to adjust to spell
Connect the light intensity of each unit visual field in visual field.
Fig. 6 is refer to, the step 1 that is to say that the measurement of field positions and set-up procedure include：
Step 11：Using luminous intensity measurement sensor 110 to the light and shade side of each unit visual field in sliceable visual field
Boundary position scans for, and obtains the boundary position information of each unit visual field；
Step 12：The target location letter of boundary position information and each unit visual field according to each unit visual field
Breath, calculates and obtains the adjustment amount of each field stop, and each unit visual field is completed according to each adjustment amount
The compensation adjustment of position.
There is the boundary position information of two methods acquiring unit visual field in the step 11, one kind is using two points
The light and shade boundary position of method search each unit visual field, the dichotomy includes：It is first each described in entirety measurement and positioning
The position range of unit visual field border, then restrain to each unit visual field search boundary position and progressively respectively,
Finally determine the boundary position information of the unit visual field.
Another method is：The light and shade boundary position of each unit visual field in sliceable visual field is scanned for
Step includes：Entire scan sampling, and the light intensity to scanning sample acquisition and position are carried out to sliceable visual field
Data carry out interpolation calculation, obtain the boundary position information of each unit visual field.
Certainly, because the row of 800 one-tenth of field stop of the present invention two is arranged, therefore, in actual mechanical process,
Can first by the luminous intensity measurement sensor 110 be moved to first, the three, the 5th field stops 801,803,
At 805 visual fields for being formed, while scanning three light and shade borders of unit visual field, the side of each unit visual field is obtained
Boundary's positional information；Again by luminous intensity measurement sensor 110 be moved to second, the four, the 6th field stops 802,
804th, at 806 visual fields for being formed, the boundary position information of the other three unit visual field is obtained.
Then, carrying out the field positions i.e. described step 12 of adjustment includes：It is each according to what is obtained from above-mentioned steps
The boundary position information and target position information of unit visual field, calculate the adjustment amount for obtaining field stop, complete
The compensation adjustment of field positions.Specifically can be to the boundary position information of each unit visual field and target position information
Carry out least square method and calculate translation, the rotation parameter for obtaining each unit visual field；And utilize information process unit
The translation of each unit visual field, rotation parameter are converted to the adjustment amount of field stop 800.
As shown in figure 5, for certain unit visual field, its boundary position information is specially unit visual field border four
Individual measurement point position coordinates in the horizontal plane, four measurement points are embodied as P1~P4, if its target location
It is (x1,y1), (x2,y2), (x3,y3), (x4,y4), the boundary position that measurement is obtained is (x1′,y1'), (x2′,y2'),
(x3′,y3'), (x4′,y4′)。
Accordingly, it would be desirable to calculate unit visual field physical location (x1′,y1'), (x2′,y2'), (x3′,y3'), (x4′,y4') phase
For target location (x1,y1), (x2,y2), (x3,y3), (x4,y4) translation and rotation parameter, be expressed as X
To translation parameters Tx, Y-direction translation parameters Ty and rotation parameter Rz.
Specifically used Least-squares minimization algorithm, its equation is：
With reference to formula (1) to formula (5), you can obtain the X of the unit visual field to translation parameters Tx, Y
To translation parameters Ty and rotation parameter Rz, then, information process unit is recycled by the translation of visual field, rotation
Parameter Switch is the adjustment amount of field stop 800, is moved by motor control field stop 800, just can be with complete
Into the compensation adjustment of field positions.
As shown in Fig. 7 to Fig. 8 c, the step 2 is that visual field luminous intensity measurement includes with set-up procedure：
Step 21：Using the light intensity in the luminous intensity measurement sensor 110 measurement each unit visual field；
Step 22：The light intensity desired value of each unit visual field, Yi Jiguang are combined by the light intensity of each unit visual field
The transmitance of strong transmitance adjusting means 500, calculates the transmitance setting value for obtaining each unit visual field；
Step 23：According to the transmitance setting value, control light intensity transmitance adjusting means 500 is moved, complete
Transmitance into each unit visual field is compensated.
Specifically, if light intensity desired value is Iref, the transmitance currency of light intensity transmitance adjusting means 500 is
T1~T6.
Using the luminous intensity measurement sensor 110 of real estate measure first, the three, the 5th field stops 801,803,
Light intensity in the 805 each unit visual fields for being formed, records 6 light intensity datas of measurement point, I1、I1’、I3、I3’、
I5、I5’。
Similarly, using luminous intensity measurement sensor 110 measure second, the four, the 6th field stops 802,804,
Light intensity in the 806 each unit visual fields for being formed, records 6 measurement point light intensity datas, I2、I2’、I4、I4’、I6、
I6’。
So, the transmitance setting value of each light intensity transmitance adjusting means 500 is obtained using following calculating formula
Ti’：
The motion of control light intensity transmitance adjusting means 500, completes the compensation adjustment of transmitance.
Obviously, those skilled in the art can carry out various changes and modification without deviating from the present invention to invention
Spirit and scope.So, if it is of the invention these modification and modification belong to the claims in the present invention and its
Within the scope of equivalent technologies, then the present invention is also intended to including including these changes and modification.
Claims (13)
1. a kind of litho machine splices illuminator, including：The lighting unit that is set gradually along optical propagation direction,
Multiple light intensity transmitance adjusting means, multigroup unit object lens, field stop and on substrate motion platform
Luminous intensity measurement sensor, it is characterised in that the field stop be adjustable field stop.
2. litho machine as claimed in claim 1 splices illuminator, it is characterised in that the lighting unit bag
Light source, optical fiber and even light unit are included, the light beam that the light source sends is passed through respectively after being divided into multiple light beams by optical fiber
The even even light of light unit is entered into each light intensity transmitance adjusting means.
3. litho machine as claimed in claim 2 splices illuminator, it is characterised in that the light source and institute
State and be additionally provided between optical fiber energy of light source monitoring sensor.
4. litho machine as claimed in claim 1 splices illuminator, it is characterised in that the adjustable visual field light
Door screen is driven by motor.
5. litho machine as claimed in claim 1 splices illuminator, it is characterised in that the adjustable visual field
Diaphragm is arranged between the superstructure of the unit object lens and understructure.
6. litho machine as claimed in claim 1 splices illuminator, it is characterised in that the field stop
It is rectangle, trapezoidal or hexagon.
7. a kind of litho machine splices illuminator method of adjustment, it is characterised in that using such as claim 1 to 6
Litho machine splicing illuminator described in any one, including：
Step 1：Adjustment field stop is so as to adjust the sliceable visual field on substrate motion platform；
Step 2：Light intensity transmitance adjusting means is adjusted by the measured value of luminous intensity measurement sensor, so as to adjust
The light intensity of each unit visual field in sliceable visual field.
8. illuminator method of adjustment is spliced in photoetching as claimed in claim 7, it is characterised in that the step
Rapid 1 includes：
Step 11：Using luminous intensity measurement sensor to the light and shade boundary bit of each unit visual field in sliceable visual field
Put and scan for, obtain the boundary position information of each unit visual field；
Step 12：The target location letter of boundary position information and each unit visual field according to each unit visual field
Breath, calculates and obtains the adjustment amount of each field stop, and each unit visual field is completed according to each adjustment amount
The compensation adjustment of position.
9. illuminator method of adjustment is spliced in photoetching as claimed in claim 8, it is characterised in that the step
In rapid 11, using the light and shade boundary position of dichotomizing search each unit visual field.
10. illuminator method of adjustment is spliced in photoetching as claimed in claim 9, it is characterised in that described
Dichotomy includes：The position range of each unit visual field border described in first entirety measurement and positioning, then respectively to described
Each unit visual field is searched for boundary position and is progressively restrained, and finally determines the boundary position information of the unit visual field.
11. photoetching splicing illuminator methods of adjustment as claimed in claim 8, it is characterised in that step
In 11：The step of light and shade boundary position to each unit visual field in sliceable visual field is scanned for includes：It is right
Sliceable visual field carries out entire scan sampling, and the light intensity and position data that are obtained to scanning sample enter row interpolation
Calculate, obtain the boundary position information of each unit visual field.
12. photoetching splicing illuminator methods of adjustment as claimed in claim 8, it is characterised in that step
12 include：Boundary position information and target position information to each unit visual field carry out least square method meter
Calculate, so as to obtain the translation of each unit visual field, rotation parameter；Then, will be described using information process unit
The translation of each unit visual field, rotation parameter are converted to the adjustment amount of each field stop of correspondence.
The 13. photoetching splicing illuminator method of adjustment as described in any one of claim 7 to 12, it is special
Levy and be, the step 2 includes：
Step 21：Using the light intensity in luminous intensity measurement sensor measurement each unit visual field；
Step 22：The light intensity desired value of each unit visual field, Yi Jiguang are combined by the light intensity of each unit visual field
The transmitance of strong transmitance adjusting means, calculates the transmitance setting value for obtaining each unit visual field；
Step 23：According to the transmitance setting value, the adjusting means motion of control light intensity transmitance completes every
The transmitance compensation of individual unit visual field.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201511022036.0A CN106933040B (en) | 2015-12-30 | 2015-12-30 | Litho machine splices lighting system and its method of adjustment |
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|---|---|---|---|
| CN201511022036.0A CN106933040B (en) | 2015-12-30 | 2015-12-30 | Litho machine splices lighting system and its method of adjustment |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107966882A (en) * | 2017-08-10 | 2018-04-27 | 上海微电子装备（集团）股份有限公司 | Exposure sources and exposure method |
| WO2021169155A1 (en) * | 2020-02-25 | 2021-09-02 | 李德龙 | Beam shaping method and device employing full-image transfer for planar light sources |
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| GB2155650B (en) * | 1984-02-14 | 1988-11-16 | Canon Kk | Method and apparatus for exposure |
| US20030137644A1 (en) * | 1993-06-30 | 2003-07-24 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| US20060001856A1 (en) * | 2004-07-02 | 2006-01-05 | Asml Netherlands B.V. | Calibration apparatus and method of calibrating a radiation sensor in a lithographic apparatus |
| CN102540736A (en) * | 2010-12-10 | 2012-07-04 | 上海微电子装备有限公司 | Uniformity compensation device applied to large field-of-view montage illumination |
| CN104570615A (en) * | 2013-10-29 | 2015-04-29 | 上海微电子装备有限公司 | Scanning exposure device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2155650B (en) * | 1984-02-14 | 1988-11-16 | Canon Kk | Method and apparatus for exposure |
| US20030137644A1 (en) * | 1993-06-30 | 2003-07-24 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| US20060001856A1 (en) * | 2004-07-02 | 2006-01-05 | Asml Netherlands B.V. | Calibration apparatus and method of calibrating a radiation sensor in a lithographic apparatus |
| CN102540736A (en) * | 2010-12-10 | 2012-07-04 | 上海微电子装备有限公司 | Uniformity compensation device applied to large field-of-view montage illumination |
| CN104570615A (en) * | 2013-10-29 | 2015-04-29 | 上海微电子装备有限公司 | Scanning exposure device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107966882A (en) * | 2017-08-10 | 2018-04-27 | 上海微电子装备（集团）股份有限公司 | Exposure sources and exposure method |
| US11119412B2 (en) | 2017-08-10 | 2021-09-14 | Shanghai Micro Electronics Equipment (Group) Co., Ltd. | Exposure equipment and exposure method |
| WO2021169155A1 (en) * | 2020-02-25 | 2021-09-02 | 李德龙 | Beam shaping method and device employing full-image transfer for planar light sources |
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| Publication number | Publication date |
|---|---|
| CN106933040B (en) | 2019-11-26 |
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Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Applicant after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Applicant before: Shanghai Micro Electronics Equipment Co., Ltd. |
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| GR01 | Patent grant | ||
| GR01 | Patent grant |