CN106932882A - A kind of positioning and mounting structure of ellipsoidal reflector - Google Patents
A kind of positioning and mounting structure of ellipsoidal reflector Download PDFInfo
- Publication number
- CN106932882A CN106932882A CN201511031846.2A CN201511031846A CN106932882A CN 106932882 A CN106932882 A CN 106932882A CN 201511031846 A CN201511031846 A CN 201511031846A CN 106932882 A CN106932882 A CN 106932882A
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- CN
- China
- Prior art keywords
- positioning
- mounting structure
- ellipsoidal reflector
- ellipsoidal
- setting circle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
Abstract
The present invention provides a kind of positioning and mounting structure of ellipsoidal reflector, including the positioning seat positioned at ellipsoidal reflector bottom, the positioning seat includes stretching into the annulus post boss in the ellipsoidal reflector bottom circular aperture and the setting circle annulated column being fixedly connected with the annulus post boss from top to bottom.So enable that the axis of ellipsoidal reflector is fixed, though the generation thermal expansion deformation of ellipsoidal reflector, but because axis is fixed, therefore, it is possible to reduce influence of the thermal expansion deformation to positioning precision.
Description
Technical field
The present invention relates to semiconductor lithography machine field, more particularly to a kind of positioning and mounting structure of ellipsoidal reflector.
Background technology
In ic manufacturing process, a complete chip generally needs to have been made by multiple photolithographic exposure
Into.In photoetching operation, carry by work stage and be exposed object (generally wafer), work stage top is often placed optics and surveyed
Amount system, is placed with mask plate therebetween, in photoetching, by observation and the measurement of optical measuring system, is to control
System transmits data, then control system travelling workpiece platform so that mask plate is aligned with the presumptive area of the wafer in work stage, right
Just exposure is proceeded by after standard.
In optical measuring system, ellipsoidal reflector is a part and parcel, and Main Function is to focus on, ellipsoidal reflector
Also ellipsoidal mirror is, its feature is：The light that any one focus sends or passes through the focus, all converges after ellipsoidal reflector
Gather another focus.
In the prior art, for fix ellipsoidal reflector positioning and mounting structure as depicted in figs. 1 and 2, ellipsoidal reflector 5
With bottom surface circular hole 04, ellipsoidal reflector 5 is placed on locating support 01, the contact with ellipsoidal reflector 5 of locating support 01
Position has 02 at dispensing, and ellipsoidal reflector 5 bonds together by dispensing 02 with locating support 01, while locating support 01
It is upper to be fixedly mounted in Optical Coatings for Photolithography by mounting-positioning holes 03 and the screw being placed in mounting-positioning holes 03, due to ellipse
Ball mirror 5 needs illuminated light source to irradiate in the course of the work, therefore own temperature will necessarily be raised, so as to cause thermal deformation,
Because ellipsoidal reflector 5 is connected to locating support merely by the mode of bonding in this positioning and mounting structure and mounting means
On 01, once temperature is raised, glue fusing, ellipsoidal reflector 5 deforms, and the precision of positioning can be greatly affected.
Therefore regarding to the issue above, it is necessary to invent a kind of positioning and mounting structure of ellipsoidal reflector, can solve the problem that work
During ellipsoidal reflector cause the problem that installation accuracy is affected because of thermal expansion deformation.
The content of the invention
To solve the above problems, the present invention proposes a kind of positioning and mounting structure of ellipsoidal reflector, including positioned at ellipsoid
The positioning seat of speculum bottom, the positioning seat includes stretching into the annulus post in the ellipsoidal reflector bottom circular aperture from top to bottom
Boss and the setting circle annulated column being fixedly connected with the annulus post boss, so that the side that ellipsoidal reflector passes through shaft hole matching
Formula is fixed with positioning and mounting structure, though ellipsoidal reflector temperature distortion, but fixed because axis portion is positioned mounting structure,
Therefore the measurement influence for optical system is smaller.
To reach above-mentioned purpose, the present invention provides a kind of positioning and mounting structure of ellipsoidal reflector, including anti-positioned at ellipsoid
The positioning seat of mirror bottom is penetrated, the positioning seat includes that the annulus post stretched into the ellipsoidal reflector bottom circular aperture is convex from top to bottom
Platform and the setting circle annulated column being fixedly connected with the annulus post boss.
Preferably, the thermal coefficient of expansion of the thermal coefficient of expansion of the material of the positioning seat and the ellipsoidal reflector material
Difference number range be [1 × 10-7,1×10-5], the thermal coefficient of expansion of the material of the positioning seat is less than 1 × 10-5m/℃。
Preferably, the material of the ellipsoidal reflector is fused quartz, the material of the positioning seat is fused quartz, ceramics,
At least one in granite, diamond-copper composite material, constant steel and magnesium oxide single crystal.
Preferably, the positioning seat lower section also has support baseboard.
Preferably, the setting circle annulated column is connected with the support baseboard pin, and at least two junctions are in
It is symmetrical.
Preferably, the junction is located on the excircle of the setting circle annulated column.
Preferably, the junction is three, respectively symmetrical in the horizontal two junctions and
A junction being distributed on longitudinal direction.
Preferably, the straight line that two junctions in the horizontal are formed is vertically intersected on the setting circle annulated column
Axis, two junctions in transverse direction are equal with the distance of a junction being distributed on longitudinal direction.
Preferably, having the cylindrical hole overlapped with the setting circle annulated column axis, the cylinder on the support baseboard
Internal diameter of the radius in hole more than the setting circle annulated column.
Preferably, the support baseboard is shaped as square, the support baseboard is centrally located at the positioning seat
Axis on.
Preferably, the material of the support baseboard is metal.
Preferably, also include the pressing plate parallel to the support baseboard and for fixing the ellipsoidal reflector top,
And it is used to fix the compressing tablet of the ellipsoidal reflector on the pressing plate.
Preferably, having the circular hole passed through for the ellipsoidal reflector in the pressing plate, the compressing tablet is located at the circle
On the circumference in hole.
Preferably, the compressing tablet is multiple, set after being uniformly distributed on the circumference of the circular hole.
Preferably, external diameter of the setting circle annulated column external diameter more than the annulus post boss.
Preferably, the setting circle band of column and the annulus post boss are integrated part.
Preferably, the axis of the annulus post boss overlaps with the setting circle annulated column axis.
Preferably, the internal diameter of the setting circle annulated column is equal to the internal diameter of the annulus post boss.
Compared with prior art, the beneficial effects of the invention are as follows：The present invention provides a kind of location and installation of ellipsoidal reflector
Structure, including positioned at the positioning seat of ellipsoidal reflector bottom, the positioning seat includes stretching into the ellipsoidal reflector from top to bottom
Annulus post boss in bottom circular aperture and the setting circle annulated column being fixedly connected with the annulus post boss.So cause ellipsoid reflection
The axis of mirror can be fixed, though the generation thermal expansion deformation of ellipsoidal reflector, but because axis is fixed, therefore, it is possible to reduce heat
Influence of the dilatancy to positioning precision.
It is preferred that the thermal coefficient of expansion of the material of heretofore described positioning seat is hot swollen with the ellipsoidal reflector material
The number range of the difference of swollen coefficient is [1 × 10-7,1×10-5], the thermal coefficient of expansion of the material of the positioning seat is less than 1 × 10- 5m/℃.Because positioning seat is using material with ellipsoidal reflector similar thermal expansion coefficient, and positioning seat itself thermal expansion system
Number is smaller, therefore in temperature distortion, the bottom circular aperture inside ellipsoidal reflector influences smaller to the thermal expansion deformation of positioning seat,
The thermal expansion deformation of positioning seat itself is also smaller, thus reduce stress concentration that ellipsoidal reflector produced due to dilatancy and
Chipping probability.
Brief description of the drawings
Fig. 1 is the schematic diagram of the positioning and mounting structure of ellipsoidal reflector in the prior art；
Fig. 2 is the profile at A-A in Fig. 1；
The top view of the positioning and mounting structure of the ellipsoidal reflector that Fig. 3 is provided for the present invention；
Fig. 4 is the profile at B-B in Fig. 3；
Fig. 5 be in the present invention positioning seat and support baseboard using shaft hole matching structure sectional view；
The top view of the pressing plate of the positioning and mounting structure of the ellipsoidal reflector that Fig. 6 is provided for the present invention；
Fig. 7 is the profile at the C-C in Fig. 6.
Prior art illustration：At 01- locating supports, 02- dispensings, 03- mounting-positioning holes, 04- bottom surfaces circular hole, 5- ellipsoids it is anti-
Penetrate mirror；
In Fig. 3-7：1- support baseboards, 11- cylindrical holes, 2- positioning seats, 21- annulus posts boss, 22- setting circles annulated column, 23-
Pin, 24- pin holes, 3- pressing plates, 31- circular holes, 4- compressing tablets, 5- ellipsoidal reflectors, 6- bottom surfaces circular hole.
Specific embodiment
To enable the above objects, features and advantages of the present invention more obvious understandable, below in conjunction with the accompanying drawings to the present invention
Specific embodiment be described in detail.
To reach above-mentioned purpose, Fig. 3 and Fig. 4 is refer to, the present invention provides a kind of positioning and mounting structure of ellipsoidal reflector,
Positioned at the bottom of ellipsoidal reflector 5, and include support baseboard 1, positioning seat 2 from bottom to up, the positioning seat 2 includes from top to bottom
Stretch into the annulus post boss 21 in the bottom circular aperture of the ellipsoidal reflector 5 and the positioning being fixedly connected with the annulus post boss 21
Annulus post 22, annulus post boss 21 and setting circle annulated column 22 are integrated part, and the external diameter of setting circle annulated column 22 is more than annulus post boss
21 external diameter, the axis of annulus post boss 21 overlaps with the axis of setting circle annulated column 22, and the internal diameter of setting circle annulated column 22 is equal to annulus
The internal diameter of post boss 21.
Usually, the external diameter of annulus post boss 21 is equal to the diameter of the bottom circular aperture 6 of ellipsoidal reflector 5, so when ellipsoid is anti-
The bottom circular aperture 6 for penetrating mirror 5 is closely connected with annulus post boss 21 so that ellipsoidal reflector 5 can be firmly secured at positioning seat 2
On, this location fit mode can be described as shaft hole matching method.
The thermal coefficient of expansion of the material of wherein described positioning seat 2 and the thermal coefficient of expansion of the material of the ellipsoidal reflector 5 it
Poor number range is [1 × 10-7,1×10-5], the thermal coefficient of expansion of the material of the positioning seat 2 is less than 1 × 10-5M/ DEG C, compared with
Goodly, the material of positioning seat 2 can be fused quartz, ceramics, granite, diamond-copper composite material, constant steel and monocrystalline oxygen
Change the composite that any two kinds of materials in any one, or above-mentioned material in magnesium are formed.
After positioning seat 2 are made using above-mentioned material, after the irradiation of the illuminated light source of ellipsoidal reflector 5, own temperature liter
Height, because the material of ellipsoidal reflector 5 is fused quartz, its thermal coefficient of expansion is 0.77 × 10-6M/ DEG C, and the material of positioning seat 2
And the difference scope of the CTE value of the material of ellipsoidal reflector 5 is [1 × 10-7,1×10-5], that is to say, that ellipsoid is anti-
The thermal coefficient of expansion for penetrating the material of mirror 5 and positioning seat 2 is all smaller and phase difference is also smaller, therefore both thermal expansion deformation journeys
Degree it is not only close but also smaller, therefore the thermal expansion deformation of the thermal expansion deformation relative to ellipsoidal reflector 5 of positioning seat 2 influence
It is smaller, the stress of the thermal expansion deformation to ellipsoidal reflector 5 of positioning seat 2 is thus substantially reduced, reduce ellipsoidal reflector 5
The possibility of fragmentation.
Setting circle annulated column 22 is connected with the pin of support baseboard 1, and the pin hole 24 on setting circle annulated column 22 is located at positioning annulus
On the excircle of post 22.
The number of pin hole 24 is three, respectively in two X symmetrical upwards pin holes 24 and the distribution in Y-direction
A pin hole 24, in the X straight-line pass setting circle annulated columns 22 that symmetrical two pin holes 24 connection is formed upwards
Axis, the two pin holes 24 ensure that positional precision of the positioning seat 2 in Y-direction so that the free degree of the positioning seat 2 in Y-direction
It is 0.
A pin hole 24 being distributed in Y-direction, it is ensured that positioning seat 2 is in X upward positional precision so that positioning seat 2
It is 0 in the X upward free degree, but the only one of which pin hole 24 in Y-direction, with the pin hole 24 on positioning annulus in Y-direction
The side of the axisymmetrical of post 22 is not provided with pin hole 24, therefore when 2 thermal expansion deformation of positioning seat, can be by being not provided with pin hole
24 side release thermal expansion deformation and the stress produced by thermal expansion deformation, prevent thermal expansion deformation and thermal expansion deformation
Produced stress all concentrates on the core of positioning seat 2, is broken because of stress concentration so as to avoid the core of positioning seat 2
It is broken.
It is equal with the distance of a pin hole 24 in Y-direction in two upward pin holes 24 of X, in the setting circle band of column 22
On circumference, the angle of circumference of three formation of pin hole 24 is 90 °, and the line between a pin hole 24 and the center of circle in Y-direction is vertical
In the straight line formed in two X upward pin holes 24.
Three above pin hole 24 ensure that the axis of positioning seat 2 by the center of support baseboard 1, the shape of support baseboard 1
Shape is square, and its material is metal, has the cylindrical hole 11 overlapped with the axis of setting circle annulated column 22, cylinder on support baseboard 1
Internal diameter of the radius in hole 11 more than setting circle annulated column 22.
Make support baseboard 1 with the identical material of positioning seat 2 and so that cost increases, therefore metal system can be used due to using
Make support baseboard 1, but because the thermal coefficient of expansion of the material of metal differs greatly with the thermal coefficient of expansion of the material of positioning seat 2,
Therefore both influence larger in thermal expansion deformation.
Fig. 5 is refer to, if positioning seat 2 is using the shaft hole matching method of fixed ellipsoidal reflector 5, then should be in positioning seat
2 bottoms make the boss for stretching into cylindrical hole 11, but thermal expansion metal deformation is much larger than positioning seat 2, and such cylindrical hole 11 is swollen in heat
Can significantly to the intramedullary expansion of cylindrical hole 11, so as to produce stress to the boss in cylindrical hole 11, so that boss is broken during bulging deformation.
Therefore the present invention both ensure that the axis of positioning seat 2 by the center of support baseboard 1, while can by the way of pin connection
The influence of positioning seat 2 to its upper is aligned with the horizontal thermal expansion deformation for avoiding support baseboard 1.
Fig. 6 and Fig. 7 is refer to, the positioning and mounting structure of the ellipsoidal reflector that the present invention is provided also includes parallel to the branch
Support base plate 1 and the pressing plate 3 for fixing the top of the ellipsoidal reflector 5, pressing plate 3 are fixed on the periphery of ellipsoidal reflector 5, are close to
The top of ellipsoidal reflector 5, has the circular hole 31 passed through for ellipsoidal reflector 5 in pressing plate 3, and is used on pressing plate 3 solid
The compressing tablet 4 of the fixed ellipsoidal reflector 5, compressing tablet 4 is located on the circumference of circular hole 31.
The present invention is described to above-described embodiment, but the present invention is not limited only to above-described embodiment.Obvious this area
Technical staff can carry out various changes and modification to invention without departing from the spirit and scope of the present invention.So, if this hair
These bright modifications and modification belong within the scope of the claims in the present invention and its equivalent technologies, then the present invention is also intended to include
Including these changes and modification.
Claims (18)
1. a kind of positioning and mounting structure of ellipsoidal reflector, it is characterised in that including the positioning seat positioned at ellipsoidal reflector bottom,
The positioning seat include stretching into from top to bottom annulus post boss in the ellipsoidal reflector bottom circular aperture and with the annulus post
The setting circle annulated column that boss is fixedly connected.
2. the positioning and mounting structure of ellipsoidal reflector as claimed in claim 1, it is characterised in that the material of the positioning seat
The number range of the difference of the thermal coefficient of expansion of thermal coefficient of expansion and the ellipsoidal reflector material is [1 × 10-7,1×10-5], institute
The thermal coefficient of expansion for stating the material of positioning seat is less than 1 × 10-5m/℃。
3. the positioning and mounting structure of ellipsoidal reflector as claimed in claim 2, it is characterised in that the material of the ellipsoidal reflector
Expect to be fused quartz, the material of the positioning seat is fused quartz, ceramics, granite, diamond-copper composite material, constant steel and
At least one in magnesium oxide single crystal.
4. the positioning and mounting structure of ellipsoidal reflector as claimed in claim 1, it is characterised in that the positioning seat lower section also has
There is support baseboard.
5. the positioning and mounting structure of ellipsoidal reflector as claimed in claim 4, it is characterised in that the setting circle annulated column and institute
The connection of support baseboard pin is stated, and at least two junctions are symmetric.
6. the positioning and mounting structure of ellipsoidal reflector as claimed in claim 5, it is characterised in that the junction is located at described
On the excircle of setting circle annulated column.
7. the positioning and mounting structure of ellipsoidal reflector as claimed in claim 4, it is characterised in that the junction is three,
Two respectively symmetrical in the horizontal junctions and a junction being distributed in the vertical.
8. the positioning and mounting structure of ellipsoidal reflector as claimed in claim 7, it is characterised in that described in two in the horizontal
The straight line that junction is formed is vertically intersected on the axis of the setting circle annulated column, on two junctions and longitudinal direction in transverse direction
The distance of one junction of distribution is equal.
9. the positioning and mounting structure of ellipsoidal reflector as claimed in claim 4, it is characterised in that have on the support baseboard
The cylindrical hole overlapped with the setting circle annulated column axis, the internal diameter of the radius more than the setting circle annulated column of the cylindrical hole.
10. the positioning and mounting structure of ellipsoidal reflector as claimed in claim 9, it is characterised in that the shape of the support baseboard
Shape is square, and the support baseboard is centrally located on the axis of the positioning seat.
The positioning and mounting structure of 11. ellipsoidal reflectors as described in claim 4, it is characterised in that the support baseboard
Material is metal.
The positioning and mounting structure of 12. ellipsoidal reflectors as described in claim 4, it is characterised in that also including parallel to institute
Support baseboard and the pressing plate for fixing the ellipsoidal reflector top are stated, and is used to fix described ellipse on the pressing plate
The compressing tablet of ball mirror.
The positioning and mounting structure of 13. ellipsoidal reflectors as described in claim 12, it is characterised in that have in the pressing plate
For the circular hole that the ellipsoidal reflector passes through, the compressing tablet is located on the circumference of the circular hole.
The positioning and mounting structure of 14. ellipsoidal reflectors as described in claim 13, it is characterised in that the compressing tablet is many
It is individual, set after being uniformly distributed on the circumference of the circular hole.
The positioning and mounting structure of 15. ellipsoidal reflectors as claimed in claim 1, it is characterised in that outside the setting circle annulated column
External diameter of the footpath more than the annulus post boss.
The positioning and mounting structure of 16. ellipsoidal reflectors as claimed in claim 1, it is characterised in that the setting circle band of column and
The annulus post boss is integrated part.
The positioning and mounting structure of 17. ellipsoidal reflectors as claimed in claim 1, it is characterised in that the annulus post boss
Axis overlaps with the setting circle annulated column axis.
The positioning and mounting structure of 18. ellipsoidal reflectors as claimed in claim 1, it is characterised in that the setting circle annulated column
Internal diameter is equal to the internal diameter of the annulus post boss.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201511031846.2A CN106932882B (en) | 2015-12-31 | 2015-12-31 | Positioning and mounting structure of ellipsoidal reflector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201511031846.2A CN106932882B (en) | 2015-12-31 | 2015-12-31 | Positioning and mounting structure of ellipsoidal reflector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106932882A true CN106932882A (en) | 2017-07-07 |
| CN106932882B CN106932882B (en) | 2020-08-04 |
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| CN201511031846.2A Active CN106932882B (en) | 2015-12-31 | 2015-12-31 | Positioning and mounting structure of ellipsoidal reflector |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107884918A (en) * | 2017-11-13 | 2018-04-06 | 中国科学院合肥物质科学研究院 | High energy ultraviolet laser gatherer under a kind of high-intensity magnetic field |
| CN107907990A (en) * | 2017-11-16 | 2018-04-13 | 深圳市太赫兹科技创新研究院 | Optics tilting mirror and its manufacture method |
| CN111856745A (en) * | 2019-04-30 | 2020-10-30 | 上海微电子装备（集团）股份有限公司 | Light irradiation device |
| CN113640938A (en) * | 2020-04-23 | 2021-11-12 | 上海微电子装备（集团）股份有限公司 | Ellipsoid reflecting mirror fixing mechanism, optical measurement system and photoetching equipment |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6865034B1 (en) * | 2003-04-01 | 2005-03-08 | Bae Systems Information And Electronic Systems Integration Inc. | Method and apparatus for eliminating alignment error in an optical system |
| US6914734B1 (en) * | 2003-12-15 | 2005-07-05 | Asia Optical Co., Inc | Color wheel and color filter assembly thereof |
| CN102162900A (en) * | 2011-05-18 | 2011-08-24 | 中国科学院长春光学精密机械与物理研究所 | Device for clamping reflector at high accuracy |
| CN202149964U (en) * | 2011-07-21 | 2012-02-22 | 林云才 | Solar prism seat |
| CN102854604A (en) * | 2012-08-29 | 2013-01-02 | 中国科学院长春光学精密机械与物理研究所 | Telescope primary mirror center radial positioning mechanism and assembly and adjustment method thereof |
| CN103018878A (en) * | 2012-12-21 | 2013-04-03 | 中国科学院长春光学精密机械与物理研究所 | Reflector supporting structure with temperature compensation function |
| CN103399389A (en) * | 2013-07-30 | 2013-11-20 | 中国科学院长春光学精密机械与物理研究所 | Primary mirror floating support mechanism with positioning film |
-
2015
- 2015-12-31 CN CN201511031846.2A patent/CN106932882B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6865034B1 (en) * | 2003-04-01 | 2005-03-08 | Bae Systems Information And Electronic Systems Integration Inc. | Method and apparatus for eliminating alignment error in an optical system |
| US6914734B1 (en) * | 2003-12-15 | 2005-07-05 | Asia Optical Co., Inc | Color wheel and color filter assembly thereof |
| CN102162900A (en) * | 2011-05-18 | 2011-08-24 | 中国科学院长春光学精密机械与物理研究所 | Device for clamping reflector at high accuracy |
| CN202149964U (en) * | 2011-07-21 | 2012-02-22 | 林云才 | Solar prism seat |
| CN102854604A (en) * | 2012-08-29 | 2013-01-02 | 中国科学院长春光学精密机械与物理研究所 | Telescope primary mirror center radial positioning mechanism and assembly and adjustment method thereof |
| CN103018878A (en) * | 2012-12-21 | 2013-04-03 | 中国科学院长春光学精密机械与物理研究所 | Reflector supporting structure with temperature compensation function |
| CN103399389A (en) * | 2013-07-30 | 2013-11-20 | 中国科学院长春光学精密机械与物理研究所 | Primary mirror floating support mechanism with positioning film |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107884918A (en) * | 2017-11-13 | 2018-04-06 | 中国科学院合肥物质科学研究院 | High energy ultraviolet laser gatherer under a kind of high-intensity magnetic field |
| CN107907990A (en) * | 2017-11-16 | 2018-04-13 | 深圳市太赫兹科技创新研究院 | Optics tilting mirror and its manufacture method |
| CN111856745A (en) * | 2019-04-30 | 2020-10-30 | 上海微电子装备（集团）股份有限公司 | Light irradiation device |
| CN111856745B (en) * | 2019-04-30 | 2023-03-17 | 上海微电子装备（集团）股份有限公司 | Light irradiation device |
| CN113640938A (en) * | 2020-04-23 | 2021-11-12 | 上海微电子装备（集团）股份有限公司 | Ellipsoid reflecting mirror fixing mechanism, optical measurement system and photoetching equipment |
| CN113640938B (en) * | 2020-04-23 | 2023-02-10 | 上海微电子装备（集团）股份有限公司 | Ellipsoid reflecting mirror fixing mechanism, optical measurement system and photoetching equipment |
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| Publication number | Publication date |
|---|---|
| CN106932882B (en) | 2020-08-04 |
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