CN106925254A - A kind of spherical titanium oxide/tin ash optoelectronic pole and its preparation method and application - Google Patents

A kind of spherical titanium oxide/tin ash optoelectronic pole and its preparation method and application Download PDF

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CN106925254A
CN106925254A CN201710203263.6A CN201710203263A CN106925254A CN 106925254 A CN106925254 A CN 106925254A CN 201710203263 A CN201710203263 A CN 201710203263A CN 106925254 A CN106925254 A CN 106925254A
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sno
optoelectronic pole
titanium oxide
tin ash
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谈国强
张昕蕾
许驰
任慧君
夏傲
邵丹
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Shenzhen Litong Information Technology Co ltd
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Shaanxi University of Science and Technology
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Abstract

The present invention provides a kind of spherical titanium oxide/tin ash optoelectronic pole and its preparation method and application, first configures TiO2Precursor liquid, then by SnO2/ glass substrate irradiates under ultraviolet light, makes SnO2/ glass baseplate surface forms hydroxyl monolayer, using hydroxyl monolayer and TiO2[Ti (OH) in precursor liquid6]2‑Between reverse polymerization reaction, LBL self-assembly reversely induces small molecule [Ti (OH)6]2‑, prepare amorphous glass/SnO2‑O‑TiO2Laminated film, is most incubated crystallization after 500 DEG C, that is, obtain spherical titanium oxide/tin ash optoelectronic pole.Present invention process process is simple and easy to control, relatively low, the TiO of preparation of experiment condition requirement2/SnO2Optoelectronic pole is high to the utilization rate of light, and current density is big, is suitably applied the organic pollution in photocatalytic degradation water or in air, is had broad application prospects in photocatalysis field.

Description

A kind of spherical titanium oxide/tin ash optoelectronic pole and its preparation method and application
Technical field
The invention belongs to field of functional materials, and in particular to a kind of layer-by-layer of molecular recognition absorption prepares ball Shape titanium oxide/tin ash optoelectronic pole and its preparation method and application.
Background technology
With the further expansion of commercial Application and life requirement, the type and quantity sharp increase of global chemicals.By Use, discharge and leakage in chemicals etc., chemical pollutant is increasing in kind and quantity so that chemical contamination has been accounted for 80%~90% polluted according to total environment.Thus, in efficiently controlling and administer various chemical contaminations and being comprehensive environmental improvement Emphasis, exploitation can be the key of environmental protection the innoxious practical technique of various chemical pollutants.Photocatalysis technology is one Emerging green technology for administering chemical contamination, more traditional method has the advantages such as low cost, efficiency high, non-secondary pollution. Photocatalysis technology is that surface can be by the characteristic of activation under light illumination by semiconductor oxide materials, can be effectively using luminous energy Oxidation Decomposition organic matter, reducing heavy metal ion, killing bacterium and elimination peculiar smell.Because photocatalysis technology can be existed using solar energy React at room temperature, both economical, photochemical catalyst itself is nontoxic, harmless, non-corrosiveness, can Reusability;Can be by organic dirt Contaminate thing permineralization into H2O and inorganic ions, non-secondary pollution, so there is incomparable excellent of traditional environment Treatment process Point, is a kind of green environment Treatment process with broad prospect of application.
TiO2Due to having the advantages that inexpensive, nontoxic, oxidability is strong, good stability, its energy gap is 3.2eV, is Current most study and most widely used metal-oxide semiconductor (MOS) photochemical catalyst.TiO2It is a kind of multifunctional material, is urged in light The aspects such as change, light degradation and novel solar battery have a wide range of applications.Meanwhile, TiO2It is mainly as n-type semiconductor and leans on Photo-generated carrier (mainly light induced electron) is conductive.
SnO2It is a kind of metal semiconductor oxide of rutile (rutile) structure, spatial symmetry is P4/mnm.It is brilliant Lattice constant a is 0.4731nm, and c is 0.31861nm.SnO2It is typical n-type semiconductor, band gap is 3.5-3.6eV.By SnO2With TiO2It is combined, can be not only improved the separating effect in its light induced electron and hole, and recombination probability can be reduced, so that greatly It is big to improve photocatalytic activity.
At present, TiO2/SnO2The preparation of optoelectronic pole mainly has following several method:The sun of sol-gel process, metal titanium sheet Pole oxidizing process, the directly thermal oxidation method of metal titanium sheet, template auxiliary synthetic method etc..These methods are existed in terms of film is prepared It is certain not enough.As membrane structure is unfavorable for photocatalytic degradation, repeatability is not high, and environmental pollution is big, with substrate combination degree loosely Gu the shortcomings of, more or less existing cannot take into account " cleaning, energy-conservation, efficiently prepare photocatalysis film " this theory.
The content of the invention
It is an object of the invention to provide a kind of spherical titanium oxide/tin ash optoelectronic pole and its preparation method and application, The method is obtained titanium oxide/tin ash optoelectronic pole, experiment condition relatively low, the obtained oxidation of requirement using layer-by-layer Titanium/tin ash optoelectronic pole has response characteristics to light, can be used in photocatalysis degradation organic contaminant.
To achieve the above object, the technical solution adopted by the present invention is:
A kind of preparation method of spherical titanium oxide/tin ash optoelectronic pole, comprises the following steps:
1)TiO2The configuration of precursor liquid:
At room temperature, to addition (NH in deionized water4)2TiF6, stir to clarify, boric acid is subsequently adding, stir to clarify, Dust technology is eventually adding, regulation pH value is stirred to clarify to 1~4, obtains TiO2Precursor liquid;(the NH for wherein adding4)2TiF6With The mol ratio of boric acid is (1~3):(1~2);
2)SnO2The functionalization of/glass substrate:
By SnO220~40min of irradiation under the ultraviolet light of 184.9nm is placed in after/glass substrate washes clean, makes SnO2/ glass Glass substrate surface forms hydroxyl monolayer;
3) self assembly of film:
By SnO2The hydroxyl monolayer one side of/glass substrate is suspended in TiO2Precursor liquid surface carries out self assembly absorption, profit With the hydroxyl layer and TiO of substrate surface2Precursor liquid small molecular [Ti (OH)6]2-In OH carry out polymerisation, heterogeneous nucleation from Assembling forms amorphous glass/SnO2-O-[Ti(OH)5]-Precursor thin film, then be dried at room temperature for, obtain glass/SnO2-O- [TiO3H)]-Noncrystal membrane;
4) LBL self-assembly of film:
By glass/SnO2-O-[TiO3H)]-Noncrystal membrane irradiates 20~40min under the ultraviolet light of 184.9nm, makes its table Face forms hydroxyl monolayer, and the hydroxyl monolayer then is suspended in into TiO2Precursor liquid surface, to TiO2In precursor liquid [Ti(OH)6]2-Self assembly polymerization absorption is carried out, glass/SnO is formed2-O-[TiO3H)]--O-[TiO3H)]-Noncrystal membrane, then Dry at room temperature;Such repeated multiple times LBL self-assembly obtains amorphous glass/SnO up to reaching required thickness2-O-TiO2It is multiple Close film;
5) crystallization of film
By amorphous glass/SnO2-O-TiO2Laminated film is put into Muffle furnace, and 250~550 DEG C, insulation are raised to from room temperature 60~180min, then naturally cool to room temperature, that is, obtain spherical titanium oxide/tin ash optoelectronic pole.
The step 1) middle addition (NH4)2TiF6Afterwards stirring 10~20min to clarify, add boric acid after stirring 20~ To clarifying, 10~20min of stirring is extremely clarified 40min after adding dust technology.
The step 1) in TiO2The concentration of Ti elements is 0.010~0.030mol/L in precursor liquid.
The step 3) and step 4) in TiO2The temperature of precursor liquid is 60~65 DEG C, time of self assembly polymerization for 10~ 13h。
The step 3) and step 4) in drying time be 6~8h.
The step 9) in programming rate be 10~30 DEG C/min.
Spherical titanium oxide/tin ash light obtained in the preparation method of described spherical titanium oxide/tin ash optoelectronic pole Electrode, TiO in the spherical titanium oxide/tin ash optoelectronic pole2Crystal formation be zincite type, with I41/amdSpatial symmetry, SnO2Crystal formation be rutile-type, spatial symmetry is P4/mnm;TiO2Pattern be globular nanostructures, its spherical a diameter of 48 ~73nm.
Under simulated solar light irradiation, the spherical titanium oxide/tin ash optoelectronic pole is produced under the conditions of 1.50V 0.11mA/cm2Current density.
Spherical titanium oxide/tin ash the optoelectronic pole after illumination starts density of photocurrent by 0.073mA/cm2Quickly Decay to 0.050mA/cm2, photo-generate electron-hole is in optoelectronic pole/solution in the spherical titanium oxide/tin ash optoelectronic pole Recombination probability during the surface recombination that interface occurs is 31.5%.
Described spherical titanium oxide/tin ash optoelectronic pole under visible light in terms of photocatalysis degradation organic contaminant should With.
Relative to prior art, the invention has the advantages that:
The preparation method of spherical titanium oxide/tin ash optoelectronic pole that the present invention is provided, first configures TiO2Precursor liquid, then By SnO2/ glass substrate irradiates under ultraviolet light, makes SnO2/ glass baseplate surface forms hydroxyl monolayer, using single point of hydroxyl Sublayer and TiO2[Ti (OH) in precursor liquid6]2-Between reverse polymerization reaction, LBL self-assembly reversely induces small molecule [Ti (OH)6]2-, prepare amorphous glass/SnO2-O-TiO2Laminated film, is most incubated crystallization after 500 DEG C, that is, obtain spherical oxygen Change titanium/tin ash optoelectronic pole.Present invention process process is simple and easy to control, and experiment condition requirement is relatively low, by reverse adsorption liquid phase LBL self-assembly method obtains the visible light-responded spherical TiO of tool2/SnO2Optoelectronic pole.Self-assembled monolayer (self-assembled Monolayers, SAMs) technology is one and is referred from bionic new film technique, irradiated in substrate by short wave ultraviolet light The orderly unimolecule hydroxyl adsorption layer spontaneously formed on interface, the hydroxyl adsorption layer of formation is spontaneous by chemical bond in atmosphere Be firmly adsorbed on the ultra-thin hydroxyl film formed on substrate, spontaneously formed with original position, bonding high-sequential arrangement, defect Less, adhesion it is strong, in " crystalline state " the features such as, it is adaptable to heterogeneous nucleation induction prepares inorganic material film, with preparation method Simply, the advantages of film-formation result is good, stability is strong, thicknesses of layers is ultra-thin.
Spherical titanium oxide/tin ash optoelectronic pole prepared by the present invention is in globular nanostructures and is attached to substrate surface, Specific surface area and organic matter adsorption capacity are effectively improved, so as to improve the photocatalysis effect of optoelectronic pole.And prepared by the present invention TiO2/SnO2Optoelectronic pole has current density higher, and its photoelectric respone ability is good, and the utilization rate to light is high, current density Greatly, the organic pollution in photocatalytic degradation water or in air is suitably applied, has wide application preceding in photocatalysis field Scape.
Brief description of the drawings
Fig. 1 is spherical TiO prepared by the present invention2/SnO2The XRD of optoelectronic pole;
Fig. 2 is spherical TiO prepared by the present invention2/SnO2The SEM figures of optoelectronic pole;
Fig. 3 is spherical TiO prepared by the present invention2/SnO2The current -voltage curve of optoelectronic pole;
Fig. 4 is spherical TiO prepared by the present invention2/SnO2The time current curve of optoelectronic pole.
Specific embodiment
The present invention is described further with currently preferred specific embodiment below in conjunction with the accompanying drawings, raw material is analysis It is pure.
Embodiment 1
1) configuration of precursor liquid:
To addition (NH in deionized water4)2TiF6, 10min is stirred to clarifying, boric acid is subsequently adding, stir at room temperature 30min is eventually adding dust technology to clarifying, and regulation pH value stirs 10min to clarifying to 2.9, obtains TiO2Precursor liquid;Wherein (the NH for adding4)2TiF6It is 1 with the mol ratio of boric acid:1;TiO2The concentration of Ti elements is 0.010mol/L in precursor liquid;
2) functionalization of substrate:
By SnO2/ glass substrate is sequentially placed into supersound washing 10min in water, acetone, absolute ethyl alcohol.After washes clean SnO2/ glass substrate irradiates 30min under being placed in the ultraviolet light of 184.9nm, makes SnO2/ glass baseplate surface forms hydroxyl unimolecule Layer, that is, obtain glass/SnO2-OH-Hydroxyl layer;
3) self assembly of film:
By glass/SnO2-OH-Hydroxyl layer is suspended in 65 DEG C of TiO2Precursor liquid surface self-organization adsorb 12h, using glass/ SnO2-OH-Hydroxyl layer and TiO2Precursor liquid small molecular [Ti (OH)6]2-With macromolecular [TiF6-n(OH)n]2-In OH gathered Reaction is closed, wherein under gravity, macromolecular [TiF6-n(OH)n]2-Move down, be difficult and glass/SnO2-OH-Hydroxyl layer Polymerisation, and small molecule [Ti (OH)6]2-Move up, glass/SnO2-OH-Hydroxyl layer and small molecule [Ti (OH)6]2-It is poly- Close reaction heterogeneous nucleation and be self-assembly of amorphous glass/SnO2-O-[Ti(OH)5]-Precursor thin film, the precursor thin film is existed Dry 6 hours at room temperature, glass/SnO is obtained2-O-[TiO3H)]-Noncrystal membrane;
4) prepared by the LBL self-assembly of film:
By glass/SnO2-O-[TiO3H)]-Noncrystal membrane irradiates after being dried at room temperature under the ultraviolet light of 184.9nm 20min, formation makes precursor thin film head end have the FTO-TiO of hydroxyl monolayer2-OH-TiO2-OH-Hydroxyl monolayer, then The hydroxyl monolayer is suspended in 65 DEG C of TiO2Precursor liquid surface, to TiO2Small molecule [Ti (OH) in precursor liquid6]2-Enter The self assembly absorption of row 12h, forms glass/SnO2-O-[TiO3H)]--O-[TiO3H)]-Noncrystal membrane, then does at room temperature Dry 6h, such repeated multiple times LBL self-assembly obtains amorphous glass/SnO up to reaching required thickness2-O-TiO2THIN COMPOSITE Film;
5) crystallization of film
By amorphous glass/SnO2-O-TiO2During laminated film is put into Muffle furnace after drying at room temperature, with 10 DEG C/min's Programming rate is raised to 500 DEG C from room temperature, is incubated 120min, then naturally cools to room temperature, that is, obtain spherical titanium oxide/tin ash Optoelectronic pole.
Embodiment 2
1) configuration of precursor liquid:
To addition (NH in deionized water4)2TiF6, 15min is stirred to clarifying, boric acid is subsequently adding, stir at room temperature 20min is eventually adding dust technology to clarifying, and regulation pH value stirs 15min to clarifying to 1, obtains TiO2Precursor liquid;Wherein plus (the NH for entering4)2TiF6It is 3 with the mol ratio of boric acid:2;TiO2The concentration of Ti elements is 0.020mol/L in precursor liquid;
2) functionalization of substrate:
By SnO2/ glass substrate is sequentially placed into supersound washing 10min in water, acetone, absolute ethyl alcohol.After washes clean SnO2/ glass substrate irradiates 20min under being placed in the ultraviolet light of 184.9nm, makes SnO2/ glass baseplate surface forms hydroxyl unimolecule Layer, that is, obtain glass/SnO2-OH-Hydroxyl layer;
3) self assembly of film:
By glass/SnO2-OH-Hydroxyl layer is suspended in 60 DEG C of TiO2Precursor liquid surface self-organization adsorb 13h, using glass/ SnO2-OH-Hydroxyl layer and TiO2Precursor liquid small molecular [Ti (OH)6]2-With macromolecular [TiF6-n(OH)n]2-In OH gathered Reaction is closed, wherein under gravity, macromolecular [TiF6-n(OH)n]2-Move down, be difficult and glass/SnO2-OH-Hydroxyl layer Polymerisation, and small molecule [Ti (OH)6]2-Move up, glass/SnO2-OH-Hydroxyl layer and small molecule [Ti (OH)6]2-It is poly- Close reaction heterogeneous nucleation and be self-assembly of amorphous glass/SnO2-O-[Ti(OH)5]-Precursor thin film, the precursor thin film is existed Dry 8 hours at room temperature, glass/SnO is obtained2-O-[TiO3H)]-Noncrystal membrane;
4) prepared by the LBL self-assembly of film:
By glass/SnO2-O-[TiO3H)]-Noncrystal membrane irradiates after being dried at room temperature under the ultraviolet light of 184.9nm 30min, formation makes precursor thin film head end have the FTO-TiO of hydroxyl monolayer2-OH-TiO2-OH-Hydroxyl monolayer, then The hydroxyl monolayer is suspended in 60 DEG C of TiO2Precursor liquid surface, to TiO2Small molecule [Ti (OH) in precursor liquid6]2-Enter The self assembly absorption of row 13h, forms glass/SnO2-O-[TiO3H)]--O-[TiO3H)]-Noncrystal membrane, then does at room temperature Dry 8h, such repeated multiple times LBL self-assembly obtains amorphous glass/SnO up to reaching required thickness2-O-TiO2THIN COMPOSITE Film;
5) crystallization of film
By amorphous glass/SnO2-O-TiO2During laminated film is put into Muffle furnace after drying at room temperature, with 20 DEG C/min's Programming rate is raised to 250 DEG C from room temperature, is incubated 180min, then naturally cools to room temperature, that is, obtain spherical titanium oxide/tin ash Optoelectronic pole.
Embodiment 3
1) configuration of precursor liquid:
To addition (NH in deionized water4)2TiF6, 20min is stirred to clarifying, boric acid is subsequently adding, stir at room temperature 40min is eventually adding dust technology to clarifying, and regulation pH value stirs 20min to clarifying to 4, obtains TiO2Precursor liquid;Wherein plus (the NH for entering4)2TiF6It is 1 with the mol ratio of boric acid:1.5;TiO2The concentration of Ti elements is 0.030mol/L in precursor liquid;
2) functionalization of substrate:
By SnO2/ glass substrate is sequentially placed into supersound washing 10min in water, acetone, absolute ethyl alcohol.After washes clean SnO2/ glass substrate irradiates 40min under being placed in the ultraviolet light of 184.9nm, makes SnO2/ glass baseplate surface forms hydroxyl unimolecule Layer, that is, obtain glass/SnO2-OH-Hydroxyl layer;
3) self assembly of film:
By glass/SnO2-OH-Hydroxyl layer is suspended in 62 DEG C of TiO2Precursor liquid surface self-organization adsorb 10h, using glass/ SnO2-OH-Hydroxyl layer and TiO2Precursor liquid small molecular [Ti (OH)6]2-With macromolecular [TiF6-n(OH)n]2-In OH gathered Reaction is closed, wherein under gravity, macromolecular [TiF6-n(OH)n]2-Move down, be difficult and glass/SnO2-OH-Hydroxyl layer Polymerisation, and small molecule [Ti (OH)6]2-Move up, glass/SnO2-OH-Hydroxyl layer and small molecule [Ti (OH)6]2-It is poly- Close reaction heterogeneous nucleation and be self-assembly of amorphous glass/SnO2-O-[Ti(OH)5]-Precursor thin film, the precursor thin film is existed Dry 7 hours at room temperature, glass/SnO is obtained2-O-[TiO3H)]-Noncrystal membrane;
4) prepared by the LBL self-assembly of film:
By glass/SnO2-O-[TiO3H)]-Noncrystal membrane irradiates after being dried at room temperature under the ultraviolet light of 184.9nm 40min, formation makes precursor thin film head end have the FTO-TiO of hydroxyl monolayer2-OH-TiO2-OH-Hydroxyl monolayer, then The hydroxyl monolayer is suspended in 62 DEG C of TiO2Precursor liquid surface, to TiO2Small molecule [Ti (OH) in precursor liquid6]2-Enter The self assembly absorption of row 10h, forms glass/SnO2-O-[TiO3H)]--O-[TiO3H)]-Noncrystal membrane, then does at room temperature Dry 7h, such repeated multiple times LBL self-assembly obtains amorphous glass/SnO up to reaching required thickness2-O-TiO2THIN COMPOSITE Film;
5) crystallization of film
By amorphous glass/SnO2-O-TiO2During laminated film is put into Muffle furnace after drying at room temperature, with 30 DEG C/min's Programming rate is raised to 550 DEG C from room temperature, is incubated 60min, then naturally cools to room temperature, that is, obtain spherical titanium oxide/tin ash Optoelectronic pole.
Embodiment 4
1) configuration of precursor liquid:
To addition (NH in deionized water4)2TiF6, 12min is stirred to clarifying, boric acid is subsequently adding, stir at room temperature 25min is eventually adding dust technology to clarifying, and regulation pH value stirs 12min to clarifying to 2, obtains TiO2Precursor liquid;Wherein plus (the NH for entering4)2TiF6It is 1.8 with the mol ratio of boric acid:1;TiO2The concentration of Ti elements is 0.015mol/L in precursor liquid;
2) functionalization of substrate:
By SnO2/ glass substrate is sequentially placed into supersound washing 10min in water, acetone, absolute ethyl alcohol.After washes clean SnO2/ glass substrate irradiates 25min under being placed in the ultraviolet light of 184.9nm, makes SnO2/ glass baseplate surface forms hydroxyl unimolecule Layer, that is, obtain glass/SnO2-OH-Hydroxyl layer;
3) self assembly of film:
By glass/SnO2-OH-Hydroxyl layer is suspended in 63 DEG C of TiO2Precursor liquid surface self-organization adsorbs 12.5h, using glass Glass/SnO2-OH-Hydroxyl layer and TiO2Precursor liquid small molecular [Ti (OH)6]2-With macromolecular [TiF6-n(OH)n]2-In OH carry out Polymerisation, wherein under gravity, macromolecular [TiF6-n(OH)n]2-Move down, be difficult and glass/SnO2-OH-Hydroxyl Layers of polymer reacts, and small molecule [Ti (OH)6]2-Move up, glass/SnO2-OH-Hydroxyl layer and small molecule [Ti (OH)6]2- Polymerisation heterogeneous nucleation is self-assembly of amorphous glass/SnO2-O-[Ti(OH)5]-Precursor thin film, by the precursor thin film It is dried at room temperature for 6.5 hours, glass/SnO is obtained2-O-[TiO3H)]-Noncrystal membrane;
4) prepared by the LBL self-assembly of film:
By glass/SnO2-O-[TiO3H)]-Noncrystal membrane irradiates after being dried at room temperature under the ultraviolet light of 184.9nm 25min, formation makes precursor thin film head end have the FTO-TiO of hydroxyl monolayer2-OH-TiO2-OH-Hydroxyl monolayer, then The hydroxyl monolayer is suspended in 63 DEG C of TiO2Precursor liquid surface, to TiO2Small molecule [Ti (OH) in precursor liquid6]2-Enter The self assembly absorption of row 12.5h, forms glass/SnO2-O-[TiO3H)]--O-[TiO3H)]-Noncrystal membrane, then at room temperature 6.5h is dried, such repeated multiple times LBL self-assembly obtains amorphous glass/SnO up to reaching required thickness2-O-TiO2It is compound Film;
5) crystallization of film
By amorphous glass/SnO2-O-TiO2During laminated film is put into Muffle furnace after drying at room temperature, with 15 DEG C/min's Programming rate is raised to 450 DEG C from room temperature, is incubated 80min, then naturally cools to room temperature, that is, obtain spherical titanium oxide/tin ash Optoelectronic pole.
Embodiment 5
1) configuration of precursor liquid:
To addition (NH in deionized water4)2TiF6, 18min is stirred to clarifying, boric acid is subsequently adding, stir at room temperature 35min is eventually adding dust technology to clarifying, and regulation pH value stirs 18min to clarifying to 2.5, obtains TiO2Precursor liquid;Wherein (the NH for adding4)2TiF6It is 2 with the mol ratio of boric acid:1.8;TiO2The concentration of Ti elements is 0.025mol/L in precursor liquid;
2) functionalization of substrate:
By SnO2/ glass substrate is sequentially placed into supersound washing 10min in water, acetone, absolute ethyl alcohol.After washes clean SnO2/ glass substrate irradiates 35min under being placed in the ultraviolet light of 184.9nm, makes SnO2/ glass baseplate surface forms hydroxyl unimolecule Layer, that is, obtain glass/SnO2-OH-Hydroxyl layer;
3) self assembly of film:
By glass/SnO2-OH-Hydroxyl layer is suspended in 64 DEG C of TiO2Precursor liquid surface self-organization adsorb 11h, using glass/ SnO2-OH-Hydroxyl layer and TiO2Precursor liquid small molecular [Ti (OH)6]2-With macromolecular [TiF6-n(OH)n]2-In OH gathered Reaction is closed, wherein under gravity, macromolecular [TiF6-n(OH)n]2-Move down, be difficult and glass/SnO2-OH-Hydroxyl layer Polymerisation, and small molecule [Ti (OH)6]2-Move up, glass/SnO2-OH-Hydroxyl layer and small molecule [Ti (OH)6]2-It is poly- Close reaction heterogeneous nucleation and be self-assembly of amorphous glass/SnO2-O-[Ti(OH)5]-Precursor thin film, the precursor thin film is existed Dry 7.5 hours at room temperature, glass/SnO is obtained2-O-[TiO3H)]-Noncrystal membrane;
4) prepared by the LBL self-assembly of film:
By glass/SnO2-O-[TiO3H)]-Noncrystal membrane irradiates after being dried at room temperature under the ultraviolet light of 184.9nm 35min, formation makes precursor thin film head end have the FTO-TiO of hydroxyl monolayer2-OH-TiO2-OH-Hydroxyl monolayer, then The hydroxyl monolayer is suspended in 64 DEG C of TiO2Precursor liquid surface, to TiO2Small molecule [Ti (OH) in precursor liquid6]2-Enter The self assembly absorption of row 11h, forms glass/SnO2-O-[TiO3H)]--O-[TiO3H)]-Noncrystal membrane, then does at room temperature Dry 7.5h, such repeated multiple times LBL self-assembly obtains amorphous glass/SnO up to reaching required thickness2-O-TiO2THIN COMPOSITE Film;
5) crystallization of film
By amorphous glass/SnO2-O-TiO2During laminated film is put into Muffle furnace after drying at room temperature, with 25 DEG C/min's Programming rate is raised to 350 DEG C from room temperature, is incubated 100min, then naturally cools to room temperature, that is, obtain spherical titanium oxide/tin ash Optoelectronic pole.
Fig. 1 is the obtained TiO of the present invention2/SnO2The XRD spectrum of optoelectronic pole, as can be seen from Figure 12 θ be 26.8 °, 38.9 °, 52.0 °, corresponding (101) crystal face of 61.7 ° of diffraction maximums, (200) crystal face, (211) crystal face, (105) crystal face standard spectrogram In Detitanium-ore-type TiO2Film (JCPDS PDF#21-1272, space group I41/amd) diffraction maximum fit like a glove;2 θ are 26.2 °, 37.9 °, 52.2 °, 63.5 ° of diffraction maximum correspondence rutile-type SnO2(JCPDS PDF#46-1088, space group P4/mnm) (110) crystal face, (200) crystal face, (211) crystal face, (301) crystallographic plane diffraction peak fit like a glove, and illustrate that the film for preparing is TiO2/ SnO2Optoelectronic pole.
Fig. 2 is the obtained TiO of the present invention2/SnO2The SEM figures of optoelectronic pole, it can be seen that prepared optoelectronic pole surface TiO2Pattern is globular nanostructures, and its spherical diameter is about 48~73nm, and membrane structure is comparatively dense.
Fig. 3 is TiO prepared by the present invention2/SnO2The current -voltage curve of optoelectronic pole, it can be seen that its voltage is increased by 0V Corresponding electric current increases to 0.11mA by 0mA during being added to 1.5V, i.e., with the increase of institute's biasing, the electric current of sample is close Degree gradually increases.This is that due under the DC Electric Field for gradually increasing, the separation rate of electron-hole pair increases, from And bigger anode photoelectric current is obtained, there is laminated film more sensitive visible light-responded.Illustrate present invention preparation TiO2/SnO2Optoelectronic pole is suitably applied the organic pollution in photocatalytic degradation water or in air.
Fig. 4 is TiO prepared by the present invention2/SnO2The time current curve of optoelectronic pole, as can be seen from Figure 4 TiO2/ SnO2Optoelectronic pole only has very weak anode photoelectric current before illumination, and anode current is significantly increased after illumination, and current-responsive is rapid, Illustrate TiO2/SnO2Optoelectronic pole has sensitive visible light-responded characteristic.The anode spike that illumination moment produces, in a period of time Interior just to reach stable state, this is probably partial photonic caused by the surface state capture of deep energy level.Illumination start rear density of photocurrent by 0.073mA rapidly decays to 0.050mA, and its reason is mainly due to photo-generate electron-hole in " optoelectronic pole/solution " interface hair Caused by raw surface recombination process.Therefore, the recombination probability of influence electrode surface recombination process is 31.5%.
Above said content is to combine specific preferred embodiment further description made for the present invention, is not All or unique implementation method, those of ordinary skill in the art by read description of the invention and to technical solution of the present invention Any equivalent conversion taken, is claim of the invention and is covered.

Claims (10)

1. a kind of preparation method of spherical titanium oxide/tin ash optoelectronic pole, it is characterised in that comprise the following steps:
1)TiO2The configuration of precursor liquid:
At room temperature, to addition (NH in deionized water4)2TiF6, stir to clarify, boric acid is subsequently adding, stir to clarify, finally Dust technology is added, regulation pH value is stirred to clarify to 1~4, obtains TiO2Precursor liquid;(the NH for wherein adding4)2TiF6And boric acid Mol ratio be (1~3):(1~2);
2)SnO2The functionalization of/glass substrate:
By SnO220~40min of irradiation under the ultraviolet light of 184.9nm is placed in after/glass substrate washes clean, makes SnO2/ glass base Plate surface forms hydroxyl monolayer;
3) self assembly of film:
By SnO2The hydroxyl monolayer one side of/glass substrate is suspended in TiO2Precursor liquid surface carries out self assembly absorption, using base The hydroxyl layer and TiO of plate surface2Precursor liquid small molecular [Ti (OH)6]2-In OH carry out polymerisation, heterogeneous nucleation self assembly Form amorphous glass/SnO2-O-[Ti(OH)5]-Precursor thin film, then be dried at room temperature for, obtain glass/SnO2-O- [TiO3H)]-Noncrystal membrane;
4) LBL self-assembly of film:
By glass/SnO2-O-[TiO3H)]-Noncrystal membrane irradiates 20~40min under the ultraviolet light of 184.9nm, makes its surface shape Into hydroxyl monolayer, the hydroxyl monolayer is then suspended in TiO2Precursor liquid surface, to TiO2[Ti in precursor liquid (OH)6]2-Self assembly polymerization absorption is carried out, glass/SnO is formed2-O-[TiO3H)]--O-[TiO3H)]-Noncrystal membrane, then in room The lower drying of temperature;Such repeated multiple times LBL self-assembly obtains amorphous glass/SnO up to reaching required thickness2-O-TiO2It is compound Film;
5) crystallization of film
By amorphous glass/SnO2-O-TiO2Laminated film is put into Muffle furnace, and 250~550 DEG C are raised to from room temperature, and insulation 60~ 180min, then naturally cool to room temperature, that is, obtain spherical titanium oxide/tin ash optoelectronic pole.
2. the preparation method of spherical titanium oxide/tin ash optoelectronic pole according to claim 1, it is characterised in that described Step 1) middle addition (NH4)2TiF610~20min of stirring stirs 20~40min to clarifying to clarifying after adding boric acid afterwards, adds 10~20min to clarification is stirred after dust technology.
3. the preparation method of spherical titanium oxide/tin ash optoelectronic pole according to claim 1, it is characterised in that described Step 1) in TiO2The concentration of Ti elements is 0.010~0.030mol/L in precursor liquid.
4. the preparation method of spherical titanium oxide/tin ash optoelectronic pole according to claim 1, it is characterised in that described Step 3) and step 4) in TiO2The temperature of precursor liquid is 60~65 DEG C, and the time of self assembly polymerization is 10~13h.
5. the preparation method of spherical titanium oxide/tin ash optoelectronic pole according to claim 1, it is characterised in that described Step 3) and step 4) in drying time be 6~8h.
6. the preparation method of spherical titanium oxide/tin ash optoelectronic pole according to claim 1, it is characterised in that described Step 9) in programming rate be 10~30 DEG C/min.
7. ball obtained in the preparation method of the spherical titanium oxide/tin ash optoelectronic pole in claim 1-6 described in any one Shape titanium oxide/tin ash optoelectronic pole, it is characterised in that TiO in the spherical titanium oxide/tin ash optoelectronic pole2Crystal formation It is zincite type, with I41/amdSpatial symmetry, SnO2Crystal formation be rutile-type, spatial symmetry is P4/mnm;TiO2Shape Looks are globular nanostructures, its spherical a diameter of 48~73nm.
8. spherical titanium oxide/tin ash optoelectronic pole according to claim 7, it is characterised in that in simulated solar illumination Penetrate down, the spherical titanium oxide/tin ash optoelectronic pole produces 0.11mA/cm under the conditions of 1.50V2Current density.
9. spherical titanium oxide/tin ash optoelectronic pole according to claim 7, it is characterised in that the spherical titanium oxide/ Tin ash optoelectronic pole after illumination starts density of photocurrent by 0.073mA/cm2Rapidly decay to 0.050mA/cm2, the ball Photo-generate electron-hole is to during the surface recombination that optoelectronic pole/solution interface occurs in shape titanium oxide/tin ash optoelectronic pole Recombination probability be 31.5%.
10. the spherical titanium oxide/tin ash optoelectronic pole in claim 7-9 described in any one under visible light drop by photocatalysis Application in terms of solution organic pollution.
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JPH03285821A (en) * 1990-03-30 1991-12-17 Nippon Sheet Glass Co Ltd Production of titanium oxide coating film
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JPH03285821A (en) * 1990-03-30 1991-12-17 Nippon Sheet Glass Co Ltd Production of titanium oxide coating film
CN102354606A (en) * 2011-09-24 2012-02-15 东莞电子科技大学电子信息工程研究院 Preparation method of photoanode of dye-sensitized solar cell
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