CN106893997A - Nano-diamond film is prepared and uses substrate pre-treatment method - Google Patents
Nano-diamond film is prepared and uses substrate pre-treatment method Download PDFInfo
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- CN106893997A CN106893997A CN201710080946.7A CN201710080946A CN106893997A CN 106893997 A CN106893997 A CN 106893997A CN 201710080946 A CN201710080946 A CN 201710080946A CN 106893997 A CN106893997 A CN 106893997A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/274—Diamond only using microwave discharges
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
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Abstract
The invention discloses a kind of nano-diamond film preparation substrate pre-treatment method, using the open loop multiple-limb polymerization of glycidol, functional group is formed on Nano diamond powder surface, obtain the Nano diamond powder (ND PG) of dispersed fabulous polyglycerol grafting in the solution, it is dissolved in methanol solution, the seed crystal solution for film nucleation is obtained, so as to provide effective method using microwave plasma chemical vapour deposition high-quality nano-diamond film in foreign substrate.The present invention greatly increases dispersiveness of the powder in water in Nano diamond powder surface graft functional group, reduces and reunites, the peripheral further functionalization of spin-off effects, be conducive to increasing the nucleation density of substrate, improve nucleation quality, made great sense to preparing high-quality nano-diamond film.
Description
Technical field
The present invention relates to a kind of Inorganic Non-metallic Materials manufacturing process, prepared by more particularly to a kind of nano-diamond film
Technique, further relates to a kind of substrate pre-treatment method, is applied to diamond thin preparing technical field.
Background technology
, used as a kind of material with many special performances, such as big energy gap (reaching 5.5eV), low dielectric are normal for diamond
Number, high-breakdown-voltage, electron hole mobility high, high heat conductance and superior radiation resistance, and chemical stability is good, institute
There are these physics, chemically and electrically characteristic so that diamond is likely to become future and is worked under the mal-conditions such as high temperature intense radiation
Electronic equipment material.
People had focused on more notices and had prepared diamond thin using CVD in recent years, and achieved very big
Progress, but the requirement in the preparation process of diamond thin to substrate is very harsh, on many substrates be difficult growth Buddha's warrior attendant
Stone film, and the speed of growth is slower, and the diamond thin crystal boundary and defect of growth are more, it is difficult to meet diamond thin each
The application of individual aspect.Therefore the step of depositing diamond film needs some to strengthen nucleation in foreign substrate, directly untreated
The nucleation density of the grown above silicon crossed is about 104-105cm-2.The method of pretreatment non-diamond substrate has mechanical grinding at present
Mill method, ultrasonic cleaning method, biased nucleation method, diadust nucleation process etc., by pre-processed substrate, nucleation density can exceed
1011cm-2.This is for average grain size for the nano-diamond film of nanometer scale is more meaningful.
But diadust density is big, nano-scale particle is easy to reunite, and the seed crystal solution dispersion for directly preparing is poor, shadow
Ring nucleation.In order to improve Nano diamond powder dispersiveness in organic solvent, the method being modified using surface functional group is changed
The research for becoming molecular structure to improve, multiplex linear polyethers class compound, and it is directed to super-branched polyhydroxy as polyglycerol
The research of compound is fewer, and polyglycerol is applied to improve Nano diamond powder is modified to yet there are no related report.
The content of the invention
In order to solve prior art problem, it is an object of the invention to overcome the shortcomings of that prior art is present, there is provided a kind of
Nano-diamond film is prepared and uses substrate pre-treatment method, using the open loop multiple-limb polymerization of glycidol, in nm of gold
Hard rock powder surface forms functional group, obtains the Nano diamond powder of dispersed fabulous polyglycerol grafting in the solution
(ND-PG), be dissolved in methanol solution, obtain the seed crystal solution for film nucleation, thus in foreign substrate using microwave etc. from
Sub- chemical vapor deposition high-quality nano-diamond film provides effective method.
Purpose is created to reach foregoing invention, the present invention uses following technical proposals：
A kind of nano-diamond film is prepared and uses substrate pre-treatment method, is comprised the following steps：
A. the pretreatment of Nano diamond powder:
Be not less than 98% concentrated sulfuric acid with mass percent concentration and mass percent concentration be not less than 60% concentrated nitric acid
Mixed solution, is 1 according to the volume ratio of the concentrated sulfuric acid and concentrated nitric acid：1~5：1 proportions strong acid mixed liquor, then by granularity
It is sufficiently mixed for the Nano diamond powder of 1~30nm is added in strong acid mixed liquor, and to diamond at 100~300 DEG C
The mixed liquor of powder and strong acid heats 1-5h, obtains powder, then after powder is evaporated, adds deionized water, then
Filtered, so as to get powder until in neutrality after, re-dry case drying powder, obtain ND pretreatment powder；
B. the preparation of the Nano diamond powder of polyglycerol grafting：
Take during the ND pretreatment powder that 20~90mg prepared in the step a dissolves in 3~10mL epoxy prapanol solvents, will
The suspension for obtaining is being not less than ultrasonically treated 1~3h at room temperature, then 1~10h of magnetic stirring is carried out at 100~200 DEG C, obtains
To modified ND-PG gels, after modified ND-PG gels then are cooled into not higher than room temperature, then with 30~100mL methyl alcohol ultrasound 2
~8h diluting modification ND-PG gels, and the unnecessary precipitation of removal is filtered, obtain modified Nano diamond seed dispersion liquid；
C. substrate pre-treatment：
Substrate is cleaned with acetone, ethanol, then using sol evenning machine, the modified of preparation in the step b is received
Rice diamond seed dispersion liquid spin coating 3~10 times on substrate with the speed of 3000~8000r/min, then make to be coated on substrate
Modified Nano diamond seed dispersion liquid liquid film drying solidification after, that is, obtain with modified Nano diamond seed superficial layer
Compound substrate, prepare nano-diamond film for the continued growth on modified Nano diamond seed superficial layer.It is preferred that serving as a contrast
Bottom is the foreign substrate of diamond；The material of further preferred substrate is silicon, glass or quartz.
The present invention compared with prior art, substantive distinguishing features and remarkable advantage is obviously protruded with following：
1. the present invention is prepared using new nano-diamond film and uses substrate pre-treatment method, using super-branched polyhydroxylated
The ring-opening polymerisation effect of compound changes molecular structure, the good hydrophilic property of hydroxyl, while super-branched structure and linear chain structure phase
Than, the surface of nano particle can be more densely packed covered in, can preferably improve the dispersion in the solution of Nano diamond powder
Property, the present invention is easy to form functional group, the modified Nano diamond of preparation on nano-diamond particles surface using glycidol
Seed crystal good hydrophilic property, biocompatibility is good；
2. the present invention greatly increases dispersiveness of the powder in water in Nano diamond powder surface graft functional group, subtracts
Few to reunite, the peripheral further functionalization of spin-off effects is conducive to increasing the nucleation density of substrate, nucleation quality is improved, to preparing
High-quality nano-diamond film makes great sense；
3. to carry out surface to Nano diamond powder using super-branched polyol modified for the present invention, is successive modified
There is provided a large amount of amendable hydroxyl groups.
Specific embodiment
Details are as follows for the preferred embodiments of the present invention：
Embodiment one：
In the present embodiment, a kind of nano-diamond film is prepared and uses substrate pre-treatment method, is comprised the following steps：
A. the pretreatment of Nano diamond powder:
Mix molten with the concentrated sulfuric acid that mass percent concentration is 98.3% and concentrated nitric acid that mass percent concentration is 60%
Liquid, is 3 according to the volume ratio of the concentrated sulfuric acid and concentrated nitric acid：1 proportions strong acid mixed liquor, is then the nanometer of 10nm by granularity
Diamond (ND) powder is sufficiently mixed in being added to strong acid mixed liquor, and to the mixing of diamond dust and strong acid at 180 DEG C
Liquid heat 3h, obtain powder, then after powder is evaporated, add deionized water, then filtered, so as to get powder
End is until after in neutrality, re-dry case drying powder obtains ND pretreatment powder；
B. the preparation of the Nano diamond powder (ND-PG) of polyglycerol grafting：
Take during the ND pretreatment powder that 60mg prepared in the step a dissolves in 7mL epoxy prapanol solvents, it is outstanding by what is obtained
Turbid liquid ultrasonically treated 2h at 25 DEG C of room temperature, then magnetic stirring 1h is carried out at 140 DEG C, modified ND-PG gels are obtained, then will
After modified ND-PG gels are cooled to room temperature, then with 60mL methyl alcohol ultrasound 5h diluting modification ND-PG gels, and filter remove it is unnecessary
Precipitation, obtains modified Nano diamond seed dispersion liquid；The present embodiment is made using the ring-opening polymerisation of super-branched polyol
With molecular structure is changed, the Nano diamond powder being modified using super-branched polyol surface prepares seed crystal solution,
The good hydrophilic property of hydroxyl, while super-branched structure is compared with linear chain structure, can more densely packed be covered in nano particle
Surface, can preferably improve Nano diamond powder dispersiveness in the solution；
C. substrate pre-treatment：
Silicon chip substrate is cleaned with acetone, ethanol, then using sol evenning machine, by changing for being prepared in the step b
Property Nano diamond seed crystal dispersion liquid spin coating 7 times in silicon chip substrate with the speed of 6000r/min, then make to be coated on substrate
After the liquid film drying solidification of modified Nano diamond seed dispersion liquid, that is, obtain with modified Nano diamond seed superficial layer
Compound substrate, nano-diamond film is prepared for the continued growth on modified Nano diamond seed superficial layer.
The present embodiment forms function using the open loop multiple-limb polymerization of glycidol on Nano diamond powder surface
Group, obtains the Nano diamond powder (ND-PG) of dispersed fabulous polyglycerol grafting in the solution, is dissolved in methanol solution,
Obtain the seed crystal solution for film nucleation, thus in foreign substrate deposition prepare high-quality nano-diamond film and provide
Effective method.
Experimental test and analysis：
Will by embodiment one treat silicon chip, will embodiment one prepare with modified Nano diamond seed table
The compound substrate of surface layer is put into the cavity of MPCVD instruments, is vacuumized, H2And CH4Used as reacting gas, deposition pressure is
50Torr, microwave power is 3kW, and the time is 1h, high-quality using microwave plasma chemical vapour deposition on Heterogeneous Composite substrate
Amount nano-diamond film.
The nano-diamond film for preparing is characterized using AFM, the common seed with prior art
Film contrast prepared by brilliant solution finds, under similarity condition before roughness of film be 50nm, and utilize embodiment one
The compound substrate growth with modified Nano diamond seed superficial layer for preparing prepares the rough surface of nano-diamond film
It is 20nm to spend, and particle diameter also reaches Nano grade.The nm of gold that embodiment one was modified using super-branched polyol surface
Hard rock powder prepares seed crystal solution, prepares pretreatment foreign substrate using embodiment one to deposit nano-diamond film, in height
The lower open loop multiple-limb polymerization by glycidol of temperature, in Nano diamond powder surface graft functional group, greatly increases
Dispersiveness of the powder in water, reduces and reunites, and is conducive to increasing the nucleation density of substrate, improves nucleation quality, high-quality to preparing
Amount nano-diamond film makes great sense.
Embodiment two：
The present embodiment is essentially identical with embodiment one, is particular in that：
In the present embodiment, a kind of nano-diamond film is prepared and uses substrate pre-treatment method, is comprised the following steps：
A. the pretreatment of Nano diamond powder:
Mix molten with the concentrated sulfuric acid that mass percent concentration is 98.3% and concentrated nitric acid that mass percent concentration is 60%
Liquid, is 1 according to the volume ratio of the concentrated sulfuric acid and concentrated nitric acid：1 proportions strong acid mixed liquor, is then the nanometer of 1nm by granularity
Diamond (ND) powder is sufficiently mixed in being added to strong acid mixed liquor, and to the mixing of diamond dust and strong acid at 100 DEG C
Liquid heat 5h, obtain powder, then after powder is evaporated, add deionized water, then filtered, so as to get powder
End is until after in neutrality, re-dry case drying powder obtains ND pretreatment powder；
B. the preparation of the Nano diamond powder (ND-PG) of polyglycerol grafting：
Take during the ND pretreatment powder that 90mg prepared in the step a dissolves in 3mL epoxy prapanol solvents, it is outstanding by what is obtained
Turbid liquid ultrasonically treated 3h at 25 DEG C of room temperature, then magnetic stirring 1h is carried out at 200 DEG C, modified ND-PG gels are obtained, then will
After modified ND-PG gels are cooled to room temperature, then with 100mL methyl alcohol ultrasound 8h diluting modification ND-PG gels, and filter remove it is unnecessary
Precipitation, obtains modified Nano diamond seed dispersion liquid；The present embodiment is made using the ring-opening polymerisation of super-branched polyol
With molecular structure is changed, the Nano diamond powder being modified using super-branched polyol surface prepares seed crystal solution,
The good hydrophilic property of hydroxyl, while super-branched structure is compared with linear chain structure, can more densely packed be covered in nano particle
Surface, can preferably improve Nano diamond powder dispersiveness in the solution；
C. substrate pre-treatment：
Glass substrate is cleaned with acetone, ethanol, then using sol evenning machine, by changing for being prepared in the step b
Property Nano diamond seed crystal dispersion liquid is with spin coating 10 times on a glass substrate of the speed of 8000r/min, then makes to be coated on substrate
Modified Nano diamond seed dispersion liquid liquid film drying solidification after, that is, obtain with modified Nano diamond seed superficial layer
Compound substrate, prepare nano-diamond film for the continued growth on modified Nano diamond seed superficial layer.
The present embodiment forms function using the open loop multiple-limb polymerization of glycidol on Nano diamond powder surface
Group, obtains the Nano diamond powder (ND-PG) of dispersed fabulous polyglycerol grafting in the solution, is dissolved in methanol solution,
Obtain the seed crystal solution for film nucleation, thus in foreign substrate deposition prepare high-quality nano-diamond film and provide
Effective method.
Experimental test and analysis：
Compound substrate with modified Nano diamond seed superficial layer prepared by embodiment two is put into MPCVD instruments
In cavity, vacuumize, H2And CH4Used as reacting gas, deposition pressure is 50Torr, and microwave power is 3kW, and the time is 1h, different
In matter compound substrate, using microwave plasma chemical vapour deposition high-quality nano-diamond film.
The nano-diamond film for preparing is characterized using AFM, the common seed with prior art
Film contrast prepared by brilliant solution finds, under similarity condition before roughness of film be 50nm, and utilize embodiment two
The compound substrate growth with modified Nano diamond seed superficial layer for preparing prepares the rough surface of nano-diamond film
It is 32nm to spend, and particle diameter also reaches Nano grade.
Embodiment three：
The present embodiment is substantially the same as in the previous example, and is particular in that：
In the present embodiment, a kind of nano-diamond film is prepared and uses substrate pre-treatment method, is comprised the following steps：
A. the pretreatment of Nano diamond powder:
Mix molten with the concentrated sulfuric acid that mass percent concentration is 98.3% and concentrated nitric acid that mass percent concentration is 60%
Liquid, is 5 according to the volume ratio of the concentrated sulfuric acid and concentrated nitric acid：1 proportions strong acid mixed liquor, is then the nanometer of 1nm by granularity
Diamond (ND) powder is sufficiently mixed in being added to strong acid mixed liquor, and to the mixing of diamond dust and strong acid at 300 DEG C
Liquid heat 1h, obtain powder, then after powder is evaporated, add deionized water, then filtered, so as to get powder
End is until after in neutrality, re-dry case drying powder obtains ND pretreatment powder；
B. the preparation of the Nano diamond powder (ND-PG) of polyglycerol grafting：
Take during the ND pretreatment powder that 20mg prepared in the step a dissolves in 10mL epoxy prapanol solvents, by what is obtained
Suspension ultrasonically treated 1h at 25 DEG C of room temperature, then magnetic stirring 10h is carried out at 100 DEG C, modified ND-PG gels are obtained, so
After modified ND-PG gels are cooled into room temperature afterwards, then with 30mL methyl alcohol ultrasound 2h diluting modification ND-PG gels, and filter removal
Unnecessary precipitation, obtains modified Nano diamond seed dispersion liquid；The present embodiment is gathered using the open loop of super-branched polyol
Cooperation is with molecular structure is changed, and it is molten that the Nano diamond powder being modified using super-branched polyol surface prepares seed crystal
Liquid, the good hydrophilic property of hydroxyl, while super-branched structure is compared with linear chain structure, can more densely packed be covered in nano particle
Surface, can preferably improve Nano diamond powder dispersiveness in the solution；
C. substrate pre-treatment：
Glass substrate is cleaned with acetone, ethanol, then using sol evenning machine, by changing for being prepared in the step b
Property Nano diamond seed crystal dispersion liquid is with spin coating 3 times on a glass substrate of the speed of 3000r/min, then makes to be coated on substrate
After the liquid film drying solidification of modified Nano diamond seed dispersion liquid, that is, obtain with modified Nano diamond seed superficial layer
Compound substrate, nano-diamond film is prepared for the continued growth on modified Nano diamond seed superficial layer.
The present embodiment forms function using the open loop multiple-limb polymerization of glycidol on Nano diamond powder surface
Group, obtains the Nano diamond powder (ND-PG) of dispersed fabulous polyglycerol grafting in the solution, is dissolved in methanol solution,
Obtain the seed crystal solution for film nucleation, thus in foreign substrate deposition prepare high-quality nano-diamond film and provide
Effective ways.
Experimental test and analysis：
Compound substrate with modified Nano diamond seed superficial layer prepared by embodiment three is put into MPCVD instruments
In cavity, vacuumize, H2And CH4Used as reacting gas, deposition pressure is 50Torr, and microwave power is 3kW, and the time is 1h, different
In matter compound substrate, using microwave plasma chemical vapour deposition high-quality nano-diamond film.
The nano-diamond film for preparing is characterized using AFM, the common seed with prior art
Film contrast prepared by brilliant solution finds, under similarity condition before roughness of film be 50nm, and utilize embodiment three
The compound substrate growth with modified Nano diamond seed superficial layer for preparing prepares the rough surface of nano-diamond film
It is 40nm to spend, and particle diameter also reaches Nano grade.
The embodiment of the present invention is illustrated above, but the invention is not restricted to above-described embodiment, can also be according to this hair
The purpose of bright innovation and creation makes various changes, and that is done under the Spirit Essence and principle of all foundation technical solution of the present invention changes
Become, modify, substitute, combine or simplify, equivalent substitute mode is should be, as long as meeting goal of the invention of the invention, as long as not
Away from nano-diamond film preparation of the present invention, the know-why with substrate pre-treatment method and inventive concept, belong to the present invention
Protection domain.
Claims (3)
1. a kind of nano-diamond film is prepared and uses substrate pre-treatment method, it is characterised in that comprised the following steps：
A. the pretreatment of Nano diamond powder:
98% concentrated sulfuric acid is not less than with mass percent concentration and mass percent concentration is not less than 60% concentrated nitric acid and mixes
Solution, is 1 according to the volume ratio of the concentrated sulfuric acid and concentrated nitric acid：1~5：1 proportions strong acid mixed liquor, then by granularity be 1~
The Nano diamond powder of 30nm is sufficiently mixed in being added to strong acid mixed liquor, and at 100~300 DEG C to diamond dust and
The mixed liquor of strong acid heats 1-5h, obtains powder, then after powder is evaporated, adds deionized water, then carries out
Filter, so as to get powder until in neutrality after, re-dry case drying powder, obtain ND pretreatment powder；
B. the preparation of the Nano diamond powder of polyglycerol grafting：
Take during the ND pretreatment powder that 20~90mg prepared in the step a dissolves in 3~10mL epoxy prapanol solvents, will obtain
Suspension being not less than ultrasonically treated 1~3h at room temperature, then 1~10h of magnetic stirring is carried out at 100~200 DEG C, changed
Property ND-PG gels, after modified ND-PG gels then are cooled into not higher than room temperature, then with 30~100mL methyl alcohol ultrasounds, 2~8h
Diluting modification ND-PG gels, and the unnecessary precipitation of removal is filtered, obtain modified Nano diamond seed dispersion liquid；
C. substrate pre-treatment：
Substrate is cleaned with acetone, ethanol, then using sol evenning machine, the modified Nano gold that will be prepared in the step b
Spin coating 3~10 times on substrate with the speed of 3000~8000r/min of hard rock seed crystal dispersion liquid, then make to be coated on changing on substrate
Property Nano diamond seed crystal dispersion liquid liquid film drying solidification after, that is, obtain answering with modified Nano diamond seed superficial layer
Substrate is closed, nano-diamond film is prepared for the continued growth on modified Nano diamond seed superficial layer.
2. nano-diamond film is prepared and uses substrate pre-treatment method according to claim 1, it is characterised in that：In the step
In rapid c, the substrate is the foreign substrate of diamond.
3. nano-diamond film is prepared and uses substrate pre-treatment method according to claim 1, it is characterised in that：In the step
In rapid c, the material of the substrate is silicon, glass or quartz.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108277489A (en) * | 2018-03-30 | 2018-07-13 | 镇江东艺机械有限公司 | A kind of crosslinking PVD hard coats high speed cutting tool and manufacturing method |
| WO2021046748A1 (en) * | 2019-09-11 | 2021-03-18 | 深圳先进技术研究院 | Ultrathin diamond film, and preparation method therefor and application thereof |
| CN112553590A (en) * | 2020-12-02 | 2021-03-26 | 上海征世科技有限公司 | Diamond film based on plasma vapor deposition and preparation method thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108277489A (en) * | 2018-03-30 | 2018-07-13 | 镇江东艺机械有限公司 | A kind of crosslinking PVD hard coats high speed cutting tool and manufacturing method |
| WO2021046748A1 (en) * | 2019-09-11 | 2021-03-18 | 深圳先进技术研究院 | Ultrathin diamond film, and preparation method therefor and application thereof |
| CN112553590A (en) * | 2020-12-02 | 2021-03-26 | 上海征世科技有限公司 | Diamond film based on plasma vapor deposition and preparation method thereof |
| CN112553590B (en) * | 2020-12-02 | 2021-07-06 | 上海征世科技股份有限公司 | Diamond film based on plasma vapor deposition and preparation method thereof |
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