CN106886129B - Positive thermosensitive photosensitive composition and application thereof in developing-free CTP (computer to plate) - Google Patents
Positive thermosensitive photosensitive composition and application thereof in developing-free CTP (computer to plate) Download PDFInfo
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- CN106886129B CN106886129B CN201710191851.2A CN201710191851A CN106886129B CN 106886129 B CN106886129 B CN 106886129B CN 201710191851 A CN201710191851 A CN 201710191851A CN 106886129 B CN106886129 B CN 106886129B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
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Abstract
The invention discloses a positive thermosensitive photosensitive composition and application thereof in a developing-free CTP plate, wherein the composition comprises 30-45% of a copolymer soluble in a polar organic solvent, 40-60% of phenolic resin, 5-10% of infrared radiation absorbing dye and 2.5-4% of various additives; wherein the copolymer is formed by copolymerizing butenenitrile, (methyl) allyl alcohol and phenylpropenol monomers under the action of an initiator. The CTP plate composed of the positive thermosensitive photosensitive composition can be used without chemical development, can be directly printed on a computer after exposure, greatly saves the preparation cost and time of the CTP plate, avoids environmental damage caused by development, is environment-friendly and energy-saving, and the prepared positive thermosensitive CTP plate has the characteristics of high sensitivity, good dot reduction, high resolution, high printing resistance, low cost, wide application and the like.
Description
Technical Field
The invention relates to the technical field of CTP (computer to plate) plates, in particular to a positive thermosensitive photosensitive composition and application thereof in developing-free CTP plates.
Background
The ctp (computer to plate) technology is a digital direct plate making technology appearing in the nineties of the twentieth century, and the breakthrough of the technology depends on the breakthrough of the photoresist technology. According to the difference of the areas removed in the development, the CTP plate can be divided into a positive CTP plate and a negative CTP plate; in a negative-working system, the exposed areas become insoluble or poorly soluble in the developer solution as a result of the change in polymerization or crosslinking of the coating, so that the coating can be removed from the unexposed areas of the printing plate during the development step. In a positive-working system, on the other hand, the development step is to remove material from the exposed areas of the plate. The development step typically includes rinsing and washing with a developer, typically in a processing unit containing the developer.
In recent years, on-press development CTP plates have been developed in the market due to technological advances, and after a pre-coated lithographic printing plate material is subjected to plate making by a CTP plate making machine by scanning, excess coating on blank portions for printing is removed by dampening water and ink on a printing press, the excess coating is removed and then carried away by a printing paper, and the blank portions are hydrophilic aluminum plate bases. The mode realizes the environmental protection purpose of no pollutant discharge in the plate making process. The CTP plate is mostly a negative thermosensitive CTP plate or a positive UV-CTP plate. At present, the imaging mechanism of the positive thermosensitive CTP plate in the industry is to destroy the hydrogen bond between the thermosensitive imaging compositions through the action of infrared light, liberate the alkali soluble substance in the positive thermosensitive photosensitive glue from the crosslinking state of the hydrogen bond, remove the alkali soluble substance through an alkali developing solution, and form an image because the unexposed part is insoluble in the alkali solution, thereby achieving the purpose of developing.
However, this process generates a large amount of alkaline waste liquid, causing environmental damage, and generates a large amount of water, electricity, and waste lye disposal fees.
Disclosure of Invention
Based on the above, the present invention provides a positive thermosensitive photosensitive composition which maintains a hydrogen bond crosslinked state before infrared exposure and is insoluble in fountain water and ink, and after exposure, hydrogen bonds are broken and soluble in fountain water or ink. The CTP plate prepared based on the positive thermosensitive photosensitive composition does not need to be developed by an alkaline developing solution after exposure, and can be directly printed on a machine through fountain water or ink development.
Another objective of the invention is to provide a development-free positive thermosensitive CTP plate.
The invention also aims to provide a method for manufacturing the development-free positive thermosensitive CTP plate.
The technical scheme is as follows:
a positive thermosensitive photosensitive composition comprising, in weight percent:
the polar organic solvent-soluble copolymer has the following structural unit:
(1) structural unit with good film-forming property
(2) Structural unit containing hydrogen bond binding site
Wherein R represents H or methyl;
(3) building blocks for improving solubility in polar organic solvents
In the copolymer soluble in the polar organic solvent, the structural unit (a) is a monomer unit formed by polymerizing monomer butenenitrile, and the structural unit ensures that the composition has good film-forming property; the structural unit (b) is a monomer unit formed by polymerizing allyl alcohol or methyl allyl alcohol, and can provide a large number of hydrogen bond binding sites, so that the photosensitive composition forms a cross-linking state due to hydrogen bond binding; the structural unit (c) is a monomer unit obtained by polymerizing a phenyl enol as a monomer, and can improve the solubility of the composition in a polar organic solvent. The copolymer which is prepared by copolymerization and can be dissolved in a polar organic solvent has the characteristics of good film-forming property and strong hydrogen bond bonding force with phenolic resin, and can be dissolved in common polar ink solvents such as methyl ethyl ketone, acetone, isopropanol and the like; the positive heat-sensitive photosensitive composition is prepared by copolymer soluble in polar organic solvent and phenolic resin, because the structural unit (b) and the structural unit (c) can form a hydrogen bond crosslinking state with the phenolic resin, and a photosensitive layer is formed on the surface of an aluminum base by coating, the photosensitive layer keeps the hydrogen bond crosslinking state before infrared exposure and is insoluble in fountain solution and ink, after the exposure, the hydrogen bond is destroyed, and the CTP plate prepared by the positive heat-sensitive photosensitive composition can be directly printed by a machine through the development of the fountain solution or the ink without the development of an alkaline developing solution.
In one embodiment, the weight percentage of the structural unit (a) in the polar organic solvent-soluble copolymer is 35-45%.
In one embodiment, the weight percentage of the structural unit (b) in the polar organic solvent-soluble copolymer is 25-35%.
In one embodiment, the weight percentage of the structural unit (c) in the polar organic solvent-soluble copolymer is 25-35%.
In one embodiment, the polar organic solvent-soluble copolymer contains 40 wt% of the structural unit (a), 30 wt% of the structural unit (b), and 30 wt% of the structural unit (c).
In one embodiment, the polar organic solvent-soluble copolymer has a number average molecular weight of 6000 to 10000.
The polar organic solvent-soluble copolymer can be obtained by copolymerizing the corresponding monomers in an organic solvent using a radical initiator. The initiator comprises 2,2' -azobis (2-methylbutyronitrile), benzoyl peroxide, ammonium persulfate and other common free radical initiators in the technical field. The resulting copolymer is then isolated by precipitation in water or a mixture of water and alcohol, filtered and dried until the weight is constant.
The additive can be a stabilizer, a background color dye, a leveling agent and other common additives in the technical field.
The invention also discloses a developing-free positive thermosensitive CTP plate, which comprises: (1) an aluminum plate base support, (2) a thermosensitive photosensitive layer on the aluminum plate base support; the heat sensitive photosensitive layer is formed by coating a coating liquid prepared from a positive heat sensitive composition.
Another object of the present invention is to provide a method for preparing said development-free positive thermosensitive CTP plate, said method comprising the steps of:
(1) aluminum base pretreatment: oil removal, electrolysis, oxidation and hydrophilic treatment;
(2) coating a positive thermosensitive photosensitive coating: and preparing a positive thermosensitive photosensitive coating on the treated aluminum base, wherein the positive thermosensitive photosensitive coating is formed by coating a coating liquid prepared from a positive thermosensitive photosensitive composition.
(3) Drying; and drying the positive thermosensitive photosensitive coating by using hot air.
In one embodiment, the step of configuring the heat-sensitive photosensitive layer coating liquid is: phenolic resin is dissolved in solvent, copolymer soluble in polar organic solvent, infrared radiation absorbing dye and various additives are added, and then filter elements with the aperture of 10 mu m, 5 mu m and 1 mu m are used for three-stage filtration to prepare the imaging coating liquid.
The solvent is used for a CTP plate or a traditional PS plate and comprises one or more of ethylene glycol monoethyl ether, propylene glycol monoethyl ether, methyl ethyl ketone, acetone, butyl acetate, dioxane or tetrahydrofuran and the like.
In one embodiment, the method for preparing the development-free positive thermosensitive CTP plate further comprises plate cutting.
Compared with the prior art, the invention has the beneficial effects that: the positive thermosensitive photosensitive composition keeps a hydrogen bond crosslinking state before infrared exposure and is insoluble in fountain solution and ink, and after exposure, the hydrogen bond is destroyed and can be dissolved in the fountain solution or the ink; the positive thermosensitive CTP plate prepared by the method has the characteristics of high sensitivity, good dot reduction, high resolution, high printing resistance, low cost, wide application and the like.
Detailed Description
In order that the objects, aspects and advantages of the present invention will become more apparent, the present invention will be further described with reference to the following examples, it being understood that the specific embodiments described herein are only for illustrating the present invention and are not to be construed as limiting the scope of the present invention.
Example 1
An infrared sensitive positive photosensitive composition and a method for manufacturing a CTP plate by using the same comprise the following steps:
(1) aluminum base pretreatment: oil removal, electrolysis, oxidation and hydrophilic treatment;
at 60 ℃, cleaning 1050-type pure aluminum for 80 seconds by using a 6% sodium hydroxide solution, neutralizing the aluminum by using sulfuric acid until the pH value is 5, and then washing the aluminum by using deionized water; then the plate surface is electrochemically treated, namely the plate surface is combined with a graphite electrode under the action of alternating currentAn electrolytic circuit obtaining a porous surface with a surface roughness Ra of 0.40; cleaning the roughened layout by 6% sodium hydroxide solution for ash removal, and performing oxidation treatment after deionized water washing to generate an aluminum oxide hydrophilic layer; after washing with water, the mixture was washed with 5% K at 20 deg.C2SrF6Carrying out hole sealing treatment for 16 seconds by using the aqueous solution as a hole sealing agent, washing and drying to obtain a plate base which can be used for producing a positive thermosensitive CTP plate;
(2) coating a positive thermosensitive photosensitive coating: preparing a copolymer, preparing a positive heat-sensitive photoresist coating liquid and coating;
preparation of copolymer A: a mixed solution containing 80ml of acetone and 20ml of isopropanol is taken and 40g of butenenitrile is dissolved in N2Then adding 0.2g of benzoyl peroxide, dropwise adding a mixed solution of 30g of allyl alcohol and 30g of phenyl enol at the reflux temperature, heating and polymerizing for 1 hour after dropwise adding is completed for 2 hours, adding 0.1g of benzoyl peroxide into the reaction mixture, and continuing to polymerize for 2 hours; terminating the polymerization reaction by introducing air and stirring the reaction mixture at 100 ℃ for a further 2 hours; precipitating the copolymer in deionized water, filtering and fully washing with the deionized water; after vacuum drying at 40 ℃ 92.4g of white powder was obtained, measuring the average molecular weight 6300;
preparing a positive thermosensitive photosensitive adhesive coating liquid: adding 40g of phenolic resin into 100g of acetone solvent, stirring for dissolving, then adding 1.5g of stabilizer and 1g of flatting agent, stirring for 0.5 hour, adding 50g of copolymer A and 7.5g of cyanine dye, and stirring for 2 hours to obtain a positive heat-sensitive photoresist coating liquid;
coating: coating the prepared positive heat-sensitive photoresist coating liquid on the aluminum base surface treated in the step (1), and keeping the dry weight of the coating layer at 12g/m3；
(3) Drying: and drying the positive thermosensitive photosensitive coating by using hot air to obtain the development-free positive thermosensitive CTP plate.
Example 2
An infrared sensitive positive photosensitive composition and a method for manufacturing a CTP plate by using the same comprise the following steps:
(1) aluminum base pretreatment, comprising the following steps: oil removal, electrolysis, oxidation and hydrophilic treatment;
the pretreatment method of the aluminum plate is the same as that of the example 1;
(2) coating a positive thermosensitive photosensitive coating: preparing a copolymer, preparing a positive heat-sensitive photoresist coating liquid and coating;
preparation of copolymer B: a mixed solution containing 80ml of acetone and 20ml of isopropanol is taken and 40g of butenenitrile is dissolved in N2Then adding 0.2g of benzoyl peroxide, dropwise adding a mixed solution of 35g of allyl alcohol and 25g of phenyl enol at the reflux temperature, heating and polymerizing for 1 hour after dropwise adding is completed for 2 hours, adding 0.1g of benzoyl peroxide into the reaction mixture, and continuing to polymerize for 2 hours; the polymerization was terminated by introducing air and stirring the reaction mixture at 102 ℃ for 2 hours; precipitating the copolymer in deionized water, filtering and fully washing with the deionized water; after vacuum drying at 40 ℃ 91.5g of white powder was obtained, measuring the average molecular weight 6100;
preparing a positive thermosensitive photosensitive adhesive coating liquid: adding 40g of phenolic resin into 100g of acetone solvent, stirring for dissolving, then adding 1.5g of stabilizer and 1g of flatting agent, stirring for 0.5 hour, adding 50g of copolymer B and 7.5g of cyanine dye, and stirring for 2 hours to obtain a positive heat-sensitive photoresist coating liquid;
coating: the method is the same as in example 1;
(3) drying: and drying the positive thermosensitive photosensitive coating by using hot air to obtain the development-free positive thermosensitive CTP plate.
Example 3
An infrared sensitive positive photosensitive composition and a method for manufacturing a CTP plate by using the same comprise the following steps:
(1) aluminum base pretreatment, comprising the following steps: oil removal, electrolysis, oxidation and hydrophilic treatment;
the pretreatment method of the aluminum plate is the same as that of the example 1;
(2) coating a positive thermosensitive photosensitive coating: preparing a copolymer, preparing a positive heat-sensitive photoresist coating liquid and coating;
preparation of copolymer C: a mixed solution containing 80ml of acetone and 20ml of isopropanol is taken and 45g of butenenitrile is dissolved in N2Adding 0.3 benzoyl peroxideDropwise adding a mixed solution of 25g of allyl alcohol and 30g of phenyl enol at the reflux temperature, heating and polymerizing for 1 hour after dropwise adding is finished for 2 hours, adding 0.1g of benzoyl peroxide into the reaction mixture, and continuing to polymerize for 2 hours; terminating the polymerization reaction by introducing air and stirring the reaction mixture at 100 ℃ for a further 2 hours; precipitating the copolymer in deionized water, filtering and fully washing with the deionized water; after vacuum drying at 40 ℃ 91.8g of white powder was obtained, measuring the average molecular weight 6100;
preparing a positive thermosensitive photosensitive adhesive coating liquid: adding 40g of phenolic resin into 100g of acetone solvent, stirring for dissolving, then adding 1.5g of stabilizer and 1g of flatting agent, stirring for 0.5 hour, adding 50g of copolymer C and 7.5g of cyanine dye, and stirring for 2 hours to obtain a positive heat-sensitive photoresist coating liquid;
coating: the method is the same as in example 1;
(3) drying: and drying the positive thermosensitive photosensitive coating by using hot air to obtain the development-free positive thermosensitive CTP plate.
Example 4
An infrared sensitive positive photosensitive composition and a method for manufacturing a CTP plate by using the same comprise the following steps:
(1) aluminum base pretreatment, comprising the following steps: oil removal, electrolysis, oxidation and hydrophilic treatment;
the pretreatment method of the aluminum plate is the same as that of the example 1;
(2) coating a positive thermosensitive photosensitive coating: preparing a copolymer, preparing a positive heat-sensitive photoresist coating liquid and coating;
preparation of copolymer D: a mixed solution containing 80ml of acetone and 20ml of isopropanol is taken and 35g of butenenitrile is dissolved in N2Then adding 0.2g of benzoyl peroxide, dropwise adding a mixed solution of 30g of allyl alcohol and 35g of phenyl enol at the reflux temperature, heating and polymerizing for 1 hour after dropwise adding is completed for 2 hours, adding 0.1g of benzoyl peroxide into the reaction mixture, and continuing to polymerize for 2 hours; the polymerization was terminated by introducing air and stirring the reaction mixture at 102 ℃ for 2 hours; precipitating the copolymer in deionized water, filtering and fully washing with the deionized water; after vacuum drying at 40 c,92.6g of a white powder was obtained, and the average molecular weight was found to be 6200;
preparing a positive thermosensitive photosensitive adhesive coating liquid: adding 40g of phenolic resin into 100g of acetone solvent, stirring for dissolving, then adding 1.5g of stabilizer and 1g of flatting agent, stirring for 0.5 hour, adding 50g of copolymer D and 7.5g of cyanine dye, and stirring for 2 hours to obtain a positive heat-sensitive photoresist coating liquid;
coating: the method is the same as in example 1;
(3) drying: and drying the positive thermosensitive photosensitive coating by using hot air to obtain the development-free positive thermosensitive CTP plate.
Example 5
An infrared sensitive positive photosensitive composition and a method for manufacturing a CTP plate by using the same comprise the following steps:
(1) aluminum base pretreatment, comprising the following steps: oil removal, electrolysis, oxidation and hydrophilic treatment;
the pretreatment method of the aluminum plate is the same as that of the example 1;
(2) coating a positive thermosensitive photosensitive coating: preparing a copolymer, preparing a positive heat-sensitive photoresist coating liquid and coating;
preparation of copolymer E: a mixed solution containing 80ml of acetone and 20ml of isopropanol is taken and 40g of butenenitrile is dissolved in N2Then adding 0.3 g of benzoyl peroxide, dropwise adding a mixed solution of 30g of allyl alcohol and 30g of phenyl enol at the reflux temperature, heating and polymerizing for 1 hour after dropwise adding is finished for 2 hours, adding 0.2g of benzoyl peroxide into the reaction mixture, and continuing to polymerize for 2 hours; terminating the polymerization reaction by introducing air and stirring the reaction mixture at 100 ℃ for a further 2 hours; precipitating the copolymer in deionized water, filtering and fully washing with the deionized water; after vacuum drying at 40 ℃ 92.6g of white powder are obtained, the average molecular weight being determined to be 9700;
preparing a positive thermosensitive photosensitive adhesive coating liquid: adding 40g of phenolic resin into 100g of acetone solvent, stirring for dissolving, then adding 1.5g of stabilizer and 1g of flatting agent, stirring for 0.5 hour, adding 50g of copolymer E and 7.5g of cyanine dye, and stirring for 2 hours to obtain a positive heat-sensitive photoresist coating liquid;
coating: the method is the same as in example 1;
(3) drying: and drying the positive thermosensitive photosensitive coating by using hot air to obtain the development-free positive thermosensitive CTP plate.
Example 6
An infrared sensitive positive photosensitive composition and a method for manufacturing a CTP plate by using the same comprise the following steps:
(1) aluminum base pretreatment, comprising the following steps: oil removal, electrolysis, oxidation and hydrophilic treatment;
the pretreatment method of the aluminum plate is the same as that of the example 1;
(2) coating a positive thermosensitive photosensitive coating: preparing a copolymer, preparing a positive heat-sensitive photoresist coating liquid and coating;
preparation of copolymer a: same as example 1;
preparing a positive thermosensitive photosensitive adhesive coating liquid: adding 30g of phenolic resin into 100g of acetone solvent, stirring for dissolving, then adding 1.5g of stabilizer and 1g of flatting agent, stirring for 0.5 hour, adding 60g of prepared copolymer A and 7.5g of cyanine dye, and stirring for 2 hours to obtain a positive heat-sensitive photoresist coating liquid;
coating: the method is the same as in example 1;
(3) drying: and drying the positive thermosensitive photosensitive coating by using hot air to obtain the development-free positive thermosensitive CTP plate.
Example 7
An infrared sensitive positive photosensitive composition and a method for manufacturing a CTP plate by using the same comprise the following steps:
(1) aluminum base pretreatment, comprising the following steps: oil removal, electrolysis, oxidation and hydrophilic treatment;
the pretreatment method of the aluminum plate is the same as that of the example 1;
(2) coating a positive thermosensitive photosensitive coating: preparing a copolymer, preparing a positive heat-sensitive photoresist coating liquid and coating;
preparation of copolymer a: same as example 1;
preparing a positive thermosensitive photosensitive adhesive coating liquid: adding 45g of phenolic resin into 100g of acetone solvent, stirring for dissolving, then adding 1.5g of stabilizer and 1g of flatting agent, stirring for 0.5 hour, adding 45g of prepared copolymer A and 7.5g of cyanine dye, and stirring for 2 hours to obtain a positive heat-sensitive photoresist coating liquid;
coating: the method is the same as in example 1;
(3) drying: and drying the positive thermosensitive photosensitive coating by using hot air to obtain the development-free positive thermosensitive CTP plate.
Comparative example 1
A CTP plate was prepared in the same manner as in example 1, except that, in the photosensitive composition used, a copolymer was synthesized from the following monomers in percentage by weight:
40 percent of butenenitrile
Allyl alcohol 30%
30 percent of ethyl methacrylate
The CTP plate manufactured by the method can be directly arranged on a machine for development by dampening water when in use, and the properties are listed in the following table.
The heat-sensitive CTP plates prepared in examples 1-7 and comparative example 1 were tested, and the results of the test methods are shown in Table 1, and the test methods are as follows:
mesh point: testing by an Aiseoli printing plate tester;
the background color condition: the alice densitometer 504 performs the test.
TABLE 1
As can be seen from the table, by adopting the method of the invention, the CTP plate which has lower exposure energy, higher printing resistance, clean ground color and better dot reproducibility can be obtained compared with the comparative example.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not to be understood as the limitation of the patent scope of the invention, which should be controlled by the appended claims.
Claims (4)
1. A positive thermosensitive photosensitive composition, characterized by comprising, in weight percent:
the polar organic solvent-soluble copolymer has the following structural unit:
(1) structural unit with good film-forming property
(2) Structural unit containing hydrogen bond binding site
Wherein R represents H or methyl;
(3) building blocks for improving solubility in polar organic solvents
In the copolymer soluble in the polar organic solvent, the weight percentage of the structural unit (a) is 35-45%;
in the copolymer soluble in the polar organic solvent, the weight percentage content of the structural unit (b) is 25-35%;
in the copolymer soluble in the polar organic solvent, the weight percentage content of the structural unit (c) is 25-35%;
the number average molecular weight of the copolymer is 6000-10000;
the polar organic solvent-soluble copolymer is obtained by copolymerizing the corresponding monomers in a polar organic solvent using a radical initiator; the free radical initiator comprises 2,2' -azobis (2-methylbutyronitrile), benzoyl peroxide and ammonium persulfate; then, the resulting copolymer is isolated by precipitation in water or a mixture of water and alcohol, filtered and dried until the weight is constant; the polar organic solvent comprises one or more of ethylene glycol monoethyl ether, propylene glycol monoethyl ether, methyl ethyl ketone, acetone, butyl acetate, dioxane or tetrahydrofuran;
the additive is one or more of a stabilizer, a background color dye and a leveling agent.
2. The positive thermosensitive photosensitive composition according to claim 1, wherein the polar organic solvent-soluble copolymer contains 40% by weight of the structural unit (a), 30% by weight of the structural unit (b) and 30% by weight of the structural unit (c).
3. A development-free positive thermosensitive CTP plate, comprising: (1) an aluminum plate base support, (2) a positive thermosensitive photosensitive layer on the aluminum plate base support; the positive heat sensitive optical layer is formed by coating a coating solution prepared from the positive heat sensitive photosensitive composition of any one of claims 1 to 2.
4. A method for preparing the development-free positive thermosensitive CTP plate as claimed in claim 3, which comprises the following steps:
(1) aluminum base pretreatment: oil removal, electrolysis, oxidation and hydrophilic treatment;
(2) coating a positive thermosensitive photosensitive coating: preparing a positive thermosensitive photosensitive coating on the treated aluminum base, wherein the positive thermosensitive photosensitive coating is formed by coating a coating solution prepared from the positive thermosensitive photosensitive composition in any one of claims 1 to 2;
(3) drying: and drying the positive thermosensitive photosensitive coating by using hot air.
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101067722A (en) * | 2007-05-28 | 2007-11-07 | 泰州市瑞丰印刷电子器材有限公司 | Method for producing spraying photo sensitive thermosensitive CTP plate material |
| CN103038267A (en) * | 2010-09-14 | 2013-04-10 | 米兰集团 | Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
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- 2017-03-28 CN CN201710191851.2A patent/CN106886129B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101067722A (en) * | 2007-05-28 | 2007-11-07 | 泰州市瑞丰印刷电子器材有限公司 | Method for producing spraying photo sensitive thermosensitive CTP plate material |
| CN103038267A (en) * | 2010-09-14 | 2013-04-10 | 米兰集团 | Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
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Address after: Phase IV of Hongda (International) industrial manufacturing city, BOLUO town, Huizhou City, Guangdong Province Applicant after: GUANGDONG CXK DIGITAL TECHNOLOGY Co.,Ltd. Address before: Phase IV of Hongda (International) industrial manufacturing city, BOLUO town, Huizhou City, Guangdong Province Applicant before: HUIZHOU CHAOXINKE DIGIT EQUIPMENT TECHNOLOGY Co.,Ltd. |
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