CN106883438A - A kind of controllable method for preparing of the chill mark micro-structural of photoresponse type - Google Patents

A kind of controllable method for preparing of the chill mark micro-structural of photoresponse type Download PDF

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CN106883438A
CN106883438A CN201710101654.7A CN201710101654A CN106883438A CN 106883438 A CN106883438 A CN 106883438A CN 201710101654 A CN201710101654 A CN 201710101654A CN 106883438 A CN106883438 A CN 106883438A
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soft
pdms
compound system
hard compound
structural
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CN106883438B (en
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鲁从华
汪娟娟
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Tianjin University
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/0427—Coating with only one layer of a composition containing a polymer binder
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/10—Homopolymers or copolymers of methacrylic acid esters
    • C09D133/12—Homopolymers or copolymers of methyl methacrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D167/04—Polyesters derived from hydroxycarboxylic acids, e.g. lactones
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2433/10—Homopolymers or copolymers of methacrylic acid esters
    • C08J2433/12—Homopolymers or copolymers of methyl methacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2467/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2467/04—Polyesters derived from hydroxy carboxylic acids, e.g. lactones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2475/00—Characterised by the use of polyureas or polyurethanes; Derivatives of such polymers
    • C08J2475/04—Polyurethanes

Abstract

The invention discloses a kind of controllable method for preparing of the chill mark micro-structural of photoresponse type, including：It is substrate from dimethyl silicone polymer (PDMS) elastomer；PDMS elastomers are carried out into oxygen plasma surface activation process, is then spin coated onto constructing soft or hard compound system dissolved with the organic solvent solution of certain mass fraction degradable macromolecule；Applying extraneous stress to the soft or hard compound system makes its surface produce wrinkle pattern；Adding a cover photomask to existing chill mark carries out selective ultraviolet lighting, using the fracture of polymer segment in high-molecular optical degradation reaction, cause the disturbance of stress field in film/base hybrid system, on the one hand regulate and control the amplitude of exposure region wrinkle pattern by controlling illumination dose, on the other hand can regulate and control the orientation of reticulation patterns in the non-exposed area on neighbouring border by adding a cover photomask.The inventive method is clean efficiently, and avoids the use of expensive instrument and the operating procedure of very complicated.

Description

A kind of controllable method for preparing of the chill mark micro-structural of photoresponse type
Technical field
The present invention relates to the preparation research of intelligent surface, and in particular to a kind of chill mark micro-structural of photoresponse type can Control Preparation Method.
Background technology
The research and development of novel intelligent device for automated toing respond to can be produced by environmental stimulus to external world, it has also become current material Expect a big study hotspot of scientific domain.Wherein prepare with specific physicochemical properties and response can be produced to additional stimulation Intelligent surface is the big approach for designing response structure.Intelligent surface refers to a class (such as light, electricity, magnetic, heat under environmental stimuli And various chemical parameters), there is the surface of reversible change or switching in the physics of surface mass, chemical state.Intelligence The research on surface has extremely tempting application prospect in multiple scientific domains.
Surface wrinkling forms the spontaneous process of surface micro-structure as a kind of to adapt to system change of stress field, in recent years Cause the especially dense research interest of researcher.The appearance of buckling phenomena is considered as a kind of performance of stress unstability.Fill The brand-new enlightenment brought using film corrugation mechanism is divided actively to promote the creped of material surface, and seek it in material property The potential application of the aspects such as sign, micro-nano structure construction and flexible device, is one of emphasis of Current surface corrugation research.Its In, try to explore application of the wrinkle micro-structural of environmental stimulus response type in terms of intelligent surface preparation as a new research Focus, was increasingly paid close attention to by people in recent years.Reported at present is generally gel rubber system, temperature-sensitive macromolecular system Deng the reticulation patterns respondent behavior under the environmental stimulis such as humidity, temperature.In all stimulus types, light have it is clean, efficiently, Remote operation (non-physical contact), time and the spatially advantage such as simultaneously controllable.But enter for using light as environmental stimuli The also rare report of intelligent control of row wrinkle micro-structural.
The content of the invention
For above-mentioned prior art, the present invention provides a kind of controllable preparation side of the chill mark micro-structural of photoresponse type Method.The present invention is substrate from PDMS elastomers, and degradable macromolecule constructs soft or hard compound system for thin-film material, using height The fracture of polymer segment, causes the disturbance of stress field in film/base hybrid system in molecule light degradation reaction, on the one hand by control Illumination dose processed can regulate and control the amplitude of wrinkle pattern, on the other hand can in the non-exposed area on neighbouring border by adding a cover photomask With the reticulation patterns for obtaining being orientated along border.Wherein luminous energy have it is clean, efficiently, remote operation (non-physical contact), the time and The reaction of the spatially advantage such as simultaneously controllable, and light degradation is the characteristic that a family macromolecule material generally has, applied widely. Using the use present method avoids expensive instrument and the operating procedure of very complicated, in intelligent surface preparation field Have a wide range of applications.
In order to solve the above-mentioned technical problem, a kind of chill mark micro-structural of photoresponse type proposed by the present invention is controllable Preparation Method, comprises the following steps：
Step one, by PDMS performed polymers and crosslinking agent in mass ratio be 10:After 1 mixing, it is sufficiently stirred for forming uniform pre- Polymer, after-pouring that above-mentioned prepolymer is deaerated in the vavuum pump is consolidated in surface plate, 4h being heated at 70 DEG C and carry out heat cross-linking Change, obtain PDMS elastomers；
Step 2, the PDMS elastomers for obtaining step one carry out oxygen plasma surface activation process, are then spin coated onto molten There is the organic solvent solution of 0.5-5% mass fraction degradable macromolecules, being deaerated in vavuum pump removes remaining organic solvent, obtains To soft or hard compound system；
Step 3, the soft or hard compound system obtained to step 2 apply extraneous stress makes its surface produce wrinkle pattern, from And obtain the soft or hard compound system of surface wrinkling；
Step 4, the soft or hard compound system of the surface wrinkling obtained to step 3 adds a cover photomask carries out selective ultraviolet light According to, illumination dose from 0-30J cm-2, so as to obtain the wrinkle pattern of exposure region adjustable amplitude, while obtaining edge in non-exposed area The wrinkle pattern of photomask border orientation.
In the present invention, degradable macromolecule is the one kind in PMA class, PLA and polyurethane in step 2.
Compared with prior art, the beneficial effects of the invention are as follows：
The present invention is substrate from PDMS, and the macromolecule membrane obtained with spin coating constitutes soft or hard compound system.To complex System applies extraneous stress makes its surface produce wrinkle pattern, and adding a cover photomask to existing chill mark carries out ultraviolet lighting, leads to The experiment parameters such as change illumination dose are crossed, the amplitude of exposure region wrinkle pattern can be regulated and controled, while can be obtained in non-exposed area Orientating type wrinkle.This method is easy to operate, it is clean efficiently, there is provided a kind of new intelligent response type macromolecule surface for preparing Method.
Brief description of the drawings
The chill mark pattern that Fig. 1 is obtained for PDMS/PMMA compound systems in the embodiment of the present invention 1 through 100 DEG C of heating 1h Light microscopic figure；
Fig. 2 is the light microscopic figure of photomask 1 in the embodiment of the present invention 1；
Fig. 3 is that the PDMS/PMMA compound systems of surface wrinkling in the embodiment of the present invention 1 add a cover photomask 1 through 9.2J cm-2 The light microscopic figure obtained after ultraviolet lighting；
The chill mark pattern that Fig. 4 is obtained for PDMS/PLLA compound systems in the embodiment of the present invention 2 through 90 DEG C of heating 1h Light microscopic figure；
Fig. 5 is the light microscopic figure of photomask 2 in the embodiment of the present invention 2；
Fig. 6 is that the PDMS/PLLA compound systems of surface wrinkling in the embodiment of the present invention 2 add a cover photomask 2 through 26.4J cm-2 The light microscopic figure obtained after ultraviolet lighting.
Specific embodiment
Technical solution of the present invention is described in further detail with specific embodiment below in conjunction with the accompanying drawings, described is specific Embodiment is only explained to the present invention, is not intended to limit the invention.
The mentality of designing of the controllable method for preparing of the chill mark micro-structural of photoresponse type of the present invention is：From poly dimethyl Siloxanes (PDMS) elastomer is substrate, and degradable macromolecule constructs soft or hard compound system for thin-film material, and system is applied Extraneous stress make its surface produce wrinkle pattern.Then, selective ultraviolet lighting is carried out to existing chill mark, using high score The fracture of polymer segment in sub-light degradation reaction, causes the disturbance of stress field in film/base hybrid system, on the one hand by control Illumination dose regulates and controls the amplitude (distance of sinusoidal reticulation patterns crest to trough) of exposure region wrinkle pattern, on the other hand logical Cross and add a cover photomask and can regulate and control the orientation of reticulation patterns in the non-exposed area on neighbouring border.This method is easy to operate, clean high Effect, is a kind of new method for preparing intelligent response type macromolecule surface.
Embodiment 1：
A kind of controllable method for preparing of the chill mark micro-structural of photoresponse type, comprises the following steps：
Step one, by PDMS performed polymers and crosslinking aid S ylgard184 (being purchased from Dow corning company) it is in mass ratio 10:1 mixing, is sufficiently stirred for forming uniform prepolymer with glass bar；By above-mentioned prepolymer in the multiplex vacuum of circulating water type Deaerated in pump after 1h, be poured into surface plate；4h is heated at 70 DEG C to be solidified；Obtain PDMS flexible subserates；
Step 2, the PDMS flexible subserates for obtaining step one carry out oxygen plasma surface activation process, are then spin coated onto Chloroformic solution (the spin coating parameters of 1wt% polymethyl methacrylates (PMMA)：4000rpm, 60s), deaerated in vavuum pump and removed Remaining organic solvent, obtains the soft or hard compound systems of PDMS/PMMA.
Step 3, the PDMS/PMMA compound systems for obtaining step 2 heat 1h at 100 DEG C, cool to room temperature with the furnace, The chill mark pattern of labyrinth-like is obtained, as shown in the light microscopic figure of Fig. 1；
Step 4, the PDMS/PMMA compound systems of the surface wrinkling obtained to step 3 add a cover (such as light of Fig. 2 of photomask 1 Shown in mirror figure) selective ultraviolet lighting is carried out, by adjusting the ultraviolet lighting time, (illumination dose is from 0-13.2J cm-2), can be with The amplitude (using AFM measurement) of the wrinkle pattern of regulation and control exposure region A, as shown in table 1；Simultaneously can be in non-exposed Area B obtains the wrinkle being orientated along the border of photomask 1, as shown in the light microscopic figure of Fig. 3.
The relation of PDMS/PMMA compound system reticulation patterns amplitudes and ultraviolet lighting dosage in the embodiment 1 of table 1.
Embodiment 2：
A kind of controllable method for preparing of the chill mark micro-structural of photoresponse type, its preparation process and the basic phase of embodiment 1 Together, the difference is that only：
In step 2, degradable macromolecule is changed to PLLA (PLLA) by PMMA, and spin coating rotating speed is changed to by 4000rpm 5000rpm, obtains the soft or hard compound systems of PDMS/PLLA；
In step 3, heating-up temperature is changed to 90 DEG C by 100 DEG C, in the wrinkle of the soft or hard compound system surface wrinklings of PDMS/PLLA Line pattern is as shown in the light microscopic figure of Fig. 4；
In step 4, the photomask added a cover photomask 1 as shown in Figure 2 is changed to photomask 2 as shown in Figure 5, illumination agent Amount is by 0-13.2J cm-2It is changed to 0-19.2J cm-2, so that the amplitude for regulating and controlling the wrinkle pattern of exposure region A (is shown using atomic force Micro mirror is measured), as shown in table 2；The wrinkle that is orientated along the border of photomask 2, such as light of Fig. 6 can be obtained in non-exposed area B simultaneously Shown in mirror figure.
The relation of PDMS/PLLA compound system reticulation patterns amplitudes and ultraviolet lighting dosage in the embodiment 2 of table 2.
Embodiments above is only part Experiment, is not for limiting practical range of the invention.This area Person skilled according to the present invention or without deviating from the spirit of the invention, the equivalent deformation and relevant modifications for being carried out, These are all within protection of the invention.

Claims (2)

1. a kind of controllable method for preparing of the chill mark micro-structural of photoresponse type, it is characterised in that comprise the following steps：
Step one, by PDMS performed polymers and crosslinking agent in mass ratio be 10:After 1 mixing, it is sufficiently stirred for forming uniform prepolymerization Thing, in surface plate, 4h is heated at 70 DEG C carries out heat cross-linking solidification to after-pouring that above-mentioned prepolymer is deaerated in the vavuum pump, obtains To PDMS elastomers；
Step 2, the PDMS elastomers for obtaining step one carry out oxygen plasma surface activation process, be then spin coated onto dissolved with The organic solvent solution of 0.5-5% mass fraction degradable macromolecules, deaerates in vavuum pump and removes remaining organic solvent, obtains Soft or hard compound system；
Step 3, the soft or hard compound system obtained to step 2 apply extraneous stress makes its surface produce wrinkle pattern, so that To the soft or hard compound system of surface wrinkling；
Step 4, the soft or hard compound system of the surface wrinkling obtained to step 3 adds a cover photomask carries out selective ultraviolet lighting, Illumination dose is from 0-30J cm-2, so as to obtain the wrinkle pattern of exposure region adjustable amplitude, while obtaining being covered along light in non-exposed area The wrinkle pattern of membrane boundary orientation.
2. a kind of controllable method for preparing of the chill mark micro-structural of photoresponse type according to claim 1, wherein, step 2 Middle degradable macromolecule is the one kind in PMA class, PLA and polyurethane.
CN201710101654.7A 2017-02-24 2017-02-24 Controllable preparation method of photoresponse type surface wrinkle microstructure Expired - Fee Related CN106883438B (en)

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CN109940878A (en) * 2019-04-04 2019-06-28 南京航空航天大学 A kind of method that optical drive polymer foil self-deformation generates space three-dimensional structure
CN110734037A (en) * 2019-10-25 2020-01-31 哈尔滨工业大学 Construction method of polymer material surface fold structure
CN110753453A (en) * 2019-11-07 2020-02-04 深圳第三代半导体研究院 Preparation method of stable conductive interconnection path on flexible substrate
CN110818941A (en) * 2019-10-08 2020-02-21 淮阴工学院 Preparation method of near-infrared light response type sterilization-debonding wrinkle surface
CN110903508A (en) * 2019-12-08 2020-03-24 香港中文大学（深圳） Stimulus-responsive polymer grafted wrinkled intelligent surface and preparation method and application thereof
CN111333023A (en) * 2020-03-02 2020-06-26 北京大学 Preparation method and application of solvent-induced photoresponse polymer surface micro-nano structure
CN111497366A (en) * 2020-04-07 2020-08-07 上海交通大学 Interface-controllable non-layered multi-level graphene conformal folds and preparation method thereof
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Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109337105A (en) * 2018-06-12 2019-02-15 中国船舶重工集团公司第七二五研究所 A kind of hydrophobe interaction distribution micro-structure surface preparation method
CN109337105B (en) * 2018-06-12 2021-03-16 中国船舶重工集团公司第七二五研究所 Method for preparing hydrophilic-hydrophobic interaction distribution microstructure surface
CN109940878A (en) * 2019-04-04 2019-06-28 南京航空航天大学 A kind of method that optical drive polymer foil self-deformation generates space three-dimensional structure
CN110818941B (en) * 2019-10-08 2022-03-29 淮阴工学院 Preparation method of near-infrared light response type sterilization-debonding wrinkle surface
CN110818941A (en) * 2019-10-08 2020-02-21 淮阴工学院 Preparation method of near-infrared light response type sterilization-debonding wrinkle surface
CN110734037A (en) * 2019-10-25 2020-01-31 哈尔滨工业大学 Construction method of polymer material surface fold structure
CN110734037B (en) * 2019-10-25 2023-01-24 哈尔滨工业大学 Method for constructing surface fold structure of high polymer material
CN110753453A (en) * 2019-11-07 2020-02-04 深圳第三代半导体研究院 Preparation method of stable conductive interconnection path on flexible substrate
CN110903508A (en) * 2019-12-08 2020-03-24 香港中文大学（深圳） Stimulus-responsive polymer grafted wrinkled intelligent surface and preparation method and application thereof
CN110903508B (en) * 2019-12-08 2022-05-24 香港中文大学（深圳） Stimulus-responsive polymer grafted wrinkled intelligent surface and preparation method and application thereof
CN111333023A (en) * 2020-03-02 2020-06-26 北京大学 Preparation method and application of solvent-induced photoresponse polymer surface micro-nano structure
CN111333023B (en) * 2020-03-02 2023-09-26 北京大学 Preparation method and application of solvent-induced photoresponsive polymer surface micro-nano structure
CN111497366B (en) * 2020-04-07 2021-06-15 上海交通大学 Interface-controllable non-layered multi-level graphene conformal folds and preparation method thereof
CN111497366A (en) * 2020-04-07 2020-08-07 上海交通大学 Interface-controllable non-layered multi-level graphene conformal folds and preparation method thereof
CN113174580A (en) * 2021-04-15 2021-07-27 清华大学 Humidity-based film wrinkle shape regulation and control method

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