CN106861351B - Emission-control equipment pretreatment unit - Google Patents
Emission-control equipment pretreatment unit Download PDFInfo
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- CN106861351B CN106861351B CN201610811658.XA CN201610811658A CN106861351B CN 106861351 B CN106861351 B CN 106861351B CN 201610811658 A CN201610811658 A CN 201610811658A CN 106861351 B CN106861351 B CN 106861351B
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- emission
- main body
- control equipment
- pretreatment unit
- exhaust gas
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Abstract
The invention discloses a kind of emission-control equipment pretreatment units.The emission-control equipment of one embodiment of the present of invention is the front end that emission-control equipment is arranged in pretreatment unit, to handle the pretreatment unit of the monolithic entity for the exhaust gas being discharged in semiconductor processes, include: main body, is formed with the outlet of the inflow entrance that the exhaust gas can be made to flow into and the gas that inflow can be discharged；Partition is arranged in the main body, to divide the inflow entrance and outlet；Anti- adhesive part, setting supplies hot nitrogen and moisture into main body in the inflow entrance to prevent powder from adhering to inflow entrance, and evaporates moisture contained in exhaust gas；Filter house is arranged in the main body, can remove powder, dust included in removing exhaust gas, impurity and water-soluble gas etc.；And second cleaning device, it is arranged in by the first area of the main body of the separator lined, can sprays water and clean to the powder for being adhered to metope.
Description
Technical field
The present invention relates to a kind of emission-control equipment pretreatment units more particularly to one kind can prevent by processing exhaust gas
When the powder that generates caused by line clogging phenomenon emission-control equipment pretreatment unit.
Background technique
In general, semiconductor equipment is manufactured through the various manufacturing process such as peroxidating, etching, deposition and photoetching.At this point,
Toxicity chemical industry medicament and chemical gas can be used in the manufacturing process.For example, can be used in the manufacturing process of semiconductor equipment
Ammonia, nitrogen oxide, arsine, hydrogen phosphideThe poisonous gas such as diborane and boron chloride.
Therefore, if generated exhaust gas is directly discharged in atmosphere in semiconductor fabrication process, above-mentioned poisonous gas
It is possible that bringing fatal influence to human body.Moreover, because exhaust gas is naturally on fire, it may occur that fire incident.
As described above, using the emission-control equipment of various forms in general semiconductor fabrication process.Exhaust-gas treatment
Device is by refining the exhaust gas generated in semiconductor fabrication process and being emitted into atmosphere, to solve the problem above-mentioned.
As shown in Figure 1, in general, emission-control equipment 1 is made of dry type portion 10 and wet type portion 20, the dry type portion 10
By for burning waste gas burner and combustion chamber constitute, the wet type portion 20 is refined is burnt by the dry type portion 10
Exhaust gas.
But there are the powder generated when waste gas burning to be deposited on the problems in combustion chamber for existing emission-control equipment 1.
In addition, powder contained in exhaust gas is deposited on pipeline etc., the phenomenon that leading to line clogging.
Moreover, as described above, being stopped when deposited powder in a combustion chamber or when there is the phenomenon that line clogging
Equipment operation, and manpower is transferred to remove the additional removal operation of powder, therefore operating efficiency declines and leads to heavy losses.
Therefore, present inventors studied be able to solve the emission-control equipment of above-mentioned problems of the prior art in advance
Processing unit.
Summary of the invention
(1) technical problems to be solved
One embodiment of the present of invention is designed to provide a kind of emission-control equipment pretreatment unit, the device energy
The phenomenon that enough improving treatment effeciency, such as the powder that may be generated when handling exhaust gas is made to lead to line clogging minimizes.
(2) technical solution
The present invention discloses a kind of emission-control equipment pretreatment unit.The exhaust-gas treatment of one embodiment of the present of invention fills
Setting with pretreatment unit is the front end that emission-control equipment is arranged in, to handle the exhaust gas being discharged in semiconductor processes
The pretreatment unit of monolithic entity, comprising: main body is formed with the inflow entrance that the exhaust gas can be made to flow into and inflow can be discharged
The outlet of gas；Partition is arranged in the main body, to divide the inflow entrance and outlet；Anti- adhesive part is arranged in institute
Inflow entrance is stated, supplies hot nitrogen and moisture into main body to prevent powder from adhering to inflow entrance, and evaporate water contained in exhaust gas
Point；Filter house is arranged in the main body, can remove powder, dust included in removing exhaust gas, impurity and water-soluble gas
Deng；And second cleaning device, the first area of the main body by the separator lined is set, it can be to being adhered to metope
Powder is sprayed water and is cleaned.
(3) beneficial effect
The emission-control equipment for handling exhaust gas is arranged in pretreatment unit for emission-control equipment according to the present invention
Front end, can disposably remove comprising powder and foreign matter etc. in the offgas, moreover, passing through filter house increase exhaust gas and water
Area and the time etc. of touching are tapped, so as to improve pretreatment efficiency.
In addition, anti-adhesive part is arranged to prevent powder from adhering to inflow waste gas stream is fashionable in the inflow entrance that can be flowed into exhaust gas
Mouthful.
Detailed description of the invention
Fig. 1 is the figure for schematically illustrating existing emission-control equipment.
Fig. 2 is the state for schematically illustrating the emission-control equipment pretreatment unit of setting one embodiment of the present of invention
Figure.
Fig. 3 is the figure for schematically illustrating the emission-control equipment pretreatment unit of one embodiment of the present of invention.
Fig. 4 is to be schematically illustrated in used in the emission-control equipment pretreatment unit of one embodiment of the present of invention to prevent
The figure of adhesive part.
Detailed description of the invention label
1: emission-control equipment 100: pretreatment unit
110: main body 112: inflow entrance
114: outlet 120: partition
130: anti-adhesive part 132: nitrogen jet port
134: moisture jet port 140: filter house
142: filler 144: support member
146: nozzle 150: Drainage Division
160: the first cleaning devices 170: lid
180: the second cleaning devices
Specific embodiment
In the following, being carried out in more detail referring to emission-control equipment of the attached drawing to the embodiment of the present invention with pretreatment unit
It is bright.
As shown in Fig. 2, the emission-control equipment pretreatment unit setting of one embodiment of the present of invention is for handling
The front end of the emission-control equipment 1 of exhaust gas, and can disposably remove comprising powder, dust and impurity etc. in the offgas.
Fig. 3 is the figure for schematically illustrating the emission-control equipment pretreatment unit 100 of one embodiment of the present of invention.
Referring to Fig. 3, pretreatment unit 100 is as the device that can remove powder contained in removing exhaust gas etc., it may include: main body
110, it is formed with inflow entrance 112 and outlet 114；Partition 120 is arranged in the main body 110, to divide the inflow entrance
112 and outlet 114；Anti- adhesive part 130, setting is in the inflow entrance 112, by supplying hot nitrogen and moisture into main body 110
It prevents powder from adhering to inflow entrance 112, and evaporates moisture contained in exhaust gas；And filter house 140, it is arranged in the master
In body 110, powder, dust included in exhaust gas, impurity and water-soluble gas etc. can be filtered out.
There is accommodation space, the exhaust gas generated during side forms semiconductor fabrication process can inside main body 110
The inflow entrance 112 of inflow and the outlet 114 that the exhaust gas flowed by the inflow entrance 112 can be discharged.
The main body 110 can be manufactured by transparent polyvinyl chloride (PVC) material etc., and more to arrive the narrower shape of lower width
Shape is formed.That is, the metope of lower part is to inward side to being formed slopely.
In addition, being provided with the partition that can divide the inflow entrance 112 and the outlet 114 in the main body 110
120。
Accommodation space in main body 110 is divided into first area and row locating for the inflow entrance 112 by the partition 120
Second area locating for outlet 114.Wherein, the partition 120 is the structure of lower open, is when exhaust gas passes through inflow entrance 112
When being flowed into first area, exhaust gas is made to be moved to the structure of second area by the lower part of the opening of the partition 120.
In addition, as shown in figure 3, the inflow entrance 112 that the exhaust gas flows into is provided with anti-adhesive part 130.
Referring to Fig. 4, the anti-adhesive part 130 adheres to inflow entrance 112 in the fashionable powder prevented in exhaust gas of waste gas stream, wraps
The moisture jet port 134 for including the nitrogen jet port 132 that can spray hot nitrogen and moisture capable of being sprayed.
Specifically, the inflow entrance 112 of the main body 110 of exhaust gas inflow is arranged in the anti-adhesive part 130, has cylindrical shape
Shape is circumferentially formed thereon the nitrogen jet port 132 that hot nitrogen can be supplied into main body 110, be circumferentially formed thereon with
The mode that the nitrogen jet port 132 divides sprays the moisture jet port 134 of moisture.
Wherein, the nitrogen jet port 132 and moisture jet port 134 for being formed in the anti-adhesive part 130 spray respectively hot nitrogen or
Water, so as to the hot nitrogen or water and flow into the exhaust gas contact in main body 110, nitrogen jet port 132 is located at the moisture jet port
134 inside keeps temperature in pipeline while so as to remove the moisture in the exhaust gas flowed by the inflow entrance 112
Degree, the moisture jet port 134 is located at the outside of the nitrogen jet port 132, so as to remove the water-soluble gas in removing exhaust gas
While removal the powder of 112 side of inflow entrance is adhered to because of hot nitrogen.
In addition, filter house 140 is arranged in the second area upper lateral part in the main body 110, it is included in so as to remove
Powder, dust, impurity and water-soluble gas in exhaust gas etc..
The filter house 140 may include multiple fillers 142, can support the support member 144 of the filler 142 with
And the nozzle 146 that can be sprayed water to the multiple filler 142 and support member 144.
That is, as shown in figure 3, the top setting of the second area side in main body 110 has the support member of multiple through-holes
144, the upside of the support member 144 is placed with multiple fillers, the upside of the filler 142 and support member 144
Downside is respectively arranged with the nozzle 146 that can be sprayed water.
Therefore, in filter house 140 formed as described above, when exhaust gas by partition 120 flow when, exhaust gas can by by
Gap that the multiple filler 142 is formed and flow, in a period of exhaust gas is flowed by the gap, by support portion
Part 144 and filler 144 are sprayed water, and increase the area contacted with water-soluble gas and time, so as to improve treatment effeciency.
In addition, the lower part of the main body 110 of the exhaust-gas treatment of one embodiment of the present of invention pretreatment unit 100 is also
It may include Drainage Division 150, so as to which powder and water are expelled to outside.
The Drainage Division 150 is the multiple taps for being formed in the lower side of main body 110, can will be in preprocessing process
The impurity such as a large amount of dusts included in the powder and exhaust gas of generation are expelled to outside.
That is, the exhaust gas can be reacted with moisture and generate powder carrying out pretreated period to exhaust gas, moreover,
Containing a large amount of dust and impurities etc. in exhaust gas, outside need to be discharged it to.Therefore, Drainage Division 150 is set in lower part, with discharge
To the water, powder and foreign matter etc. of exhaust blast.
In addition, the lower part of main body 110 is formed slopely inwardly, to prevent the powder generated in preprocessing process from adhering to
Inside main body 110, the inclined surface is provided with the first cleaning device 160, so as to pass through the interior of spraying-rinsing main body 110
Wall.
Wherein, the sloping portion of 110 lower part of main body is arranged in first cleaning device 160, it is thus possible to will lead to
The problem of powder generated in preprocessing process covers first cleaning device 160 and can not spray water.
Therefore, as shown in figure 3, may also include the lid for the influence for protecting first cleaning device 160 from powder
170。
The lid 170 surrounds the first cleaning device 160 to prevent powder from overstocking, so that first cleaning device
160 can successfully spray water.
In addition, including the second cleaning device 180 that can clean first area in the main body 110 of the pretreatment unit.
The upside of the first area of the main body 110 is arranged in second cleaning device 180, can clean and be adhered to
The powder and foreign matter of metope in one region etc..
Wherein, second cleaning device 180 is intermittently sprayed, and is sprayed water with predetermined time interval, thus clearly
Wash the powder and foreign matter in main body 110.
Wherein, in one embodiment of the invention, other than second cleaning device 180, the first cleaning device
160, nozzle 146 and moisture jet port 139 etc. can be carried out intermittently spraying water.
That is, powder and foreign matter while minimizing the consumption of electric power and water in cleaning main body 110.
Therefore, the emission-control equipment of one embodiment of the present of invention is arranged with pretreatment unit 100 and is filled in exhaust-gas treatment
1 front end is set, powder and foreign matter included in removing exhaust gas etc. can be disposably removed, therefore it is useless to prevent powder from adhering to
In Flash Gas Compression Skid System 1, treatment effeciency is improved.
The embodiment of the present invention is illustrated above, general technical staff of the technical field of the invention is not taking off
It can be by further changing, deleting or increasing element etc. from the scope of the inventive concept documented in claims
To carry out a variety of modifications and changes to the present invention, and this modifications and changes content is also included in protection scope of the present invention
It is interior.
Claims (8)
1. a kind of emission-control equipment pretreatment unit is the front end that emission-control equipment is arranged in, partly led with processing
The pretreatment unit of the monolithic entity for the exhaust gas being discharged during body technology, comprising:
Main body is formed with the outlet of the inflow entrance that the exhaust gas can be made to flow into and the gas that inflow can be discharged；
Partition is arranged in the main body, to divide the inflow entrance and outlet；
Anti- adhesive part, setting supply hot nitrogen and moisture into main body in the inflow entrance to prevent powder from adhering to inflow entrance, and
Evaporate moisture contained in exhaust gas；
Filter house is arranged in the main body, can remove powder, dust included in removing exhaust gas, impurity and water-soluble gas；
And
Second cleaning device is arranged in by the first area of the main body of the separator lined, can be to the powder for being adhered to metope
It sprays water and cleans,
Wherein, the anti-adhesive part has cylindrical shape, and hot nitrogen can be supplied into the main body by being circumferentially formed thereon
Nitrogen jet port is circumferentially formed thereon the moisture jet port that moisture is sprayed in a manner of dividing with the nitrogen jet port.
2. emission-control equipment pretreatment unit according to claim 1, which is characterized in that second cleaning device
It is intermittently sprayed water with specific time interval.
3. emission-control equipment pretreatment unit according to claim 1, which is characterized in that the wall of the lower body part
It is formed slopely towards interior direction, is provided with the first cleaning device that can be sprayed water on the inside of the main body being formed slopely.
4. emission-control equipment pretreatment unit according to claim 3, which is characterized in that first cleaning device
It is arranged to prevent the powder generated in preprocessing process from overstocking by lid.
5. emission-control equipment pretreatment unit according to claim 1, which is characterized in that the nitrogen jet port is located at
Hot nitrogen is sprayed in the inside of the moisture jet port.
6. emission-control equipment pretreatment unit according to claim 1, which is characterized in that the filter house includes:
Multiple fillers；
Support member can support the multiple filler；And
Nozzle is separately positioned on the upside of the filler and on the downside of the support member, can be to the multiple filler and branch
Support part part water spray.
7. emission-control equipment pretreatment unit according to claim 6, which is characterized in that the support member is formed
There are multiple through-holes, so as to exhaust gas and water flowing.
8. emission-control equipment pretreatment unit according to claim 1, which is characterized in that the lower part of the main body is set
It is equipped with Drainage Division, by the powder generated in preprocessing process and from the anti-adhesive part, filter house and the second cleaning device
The water of injection is expelled to outside.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2015-0156531 | 2015-11-09 | ||
| KR1020150156531A KR101764815B1 (en) | 2015-11-09 | 2015-11-09 | Pre-treatment apparatus for waste gas treatment apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106861351A CN106861351A (en) | 2017-06-20 |
| CN106861351B true CN106861351B (en) | 2019-03-15 |
Family
ID=59048597
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610811658.XA Active CN106861351B (en) | 2015-11-09 | 2016-09-08 | Emission-control equipment pretreatment unit |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR101764815B1 (en) |
| CN (1) | CN106861351B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101966628B1 (en) | 2017-06-28 | 2019-04-08 | 유니셈(주) | Waste gas treatment appatus |
| CN108499331A (en) * | 2018-05-23 | 2018-09-07 | 北京光宇之勋科技有限公司 | A kind of automobile air drier |
| TWI768600B (en) * | 2020-12-17 | 2022-06-21 | 魏榮宗 | Exhaust gas purification system |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5584959A (en) * | 1993-08-16 | 1996-12-17 | Ebara Corporation | Waste treatment system in a polishing apparatus |
| KR100833549B1 (en) * | 2007-01-12 | 2008-05-29 | 유니셈(주) | Pre-treatment apparatus for waste gas treatment apparatus |
| KR20110064578A (en) * | 2009-12-08 | 2011-06-15 | 주식회사 동부하이텍 | Automatic cleaning apparatus of scrubber chamber for treating waste gas |
| CN102284220A (en) * | 2011-06-14 | 2011-12-21 | 苏州市协力环保设备有限公司 | Method and equipment for treating waste gas of hot press |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100981103B1 (en) * | 2010-06-10 | 2010-09-08 | (주)동세기술 | Flue gas treatment apparatus of sewage sludge drying treatment process |
-
2015
- 2015-11-09 KR KR1020150156531A patent/KR101764815B1/en active IP Right Grant
-
2016
- 2016-09-08 CN CN201610811658.XA patent/CN106861351B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5584959A (en) * | 1993-08-16 | 1996-12-17 | Ebara Corporation | Waste treatment system in a polishing apparatus |
| KR100833549B1 (en) * | 2007-01-12 | 2008-05-29 | 유니셈(주) | Pre-treatment apparatus for waste gas treatment apparatus |
| KR20110064578A (en) * | 2009-12-08 | 2011-06-15 | 주식회사 동부하이텍 | Automatic cleaning apparatus of scrubber chamber for treating waste gas |
| CN102284220A (en) * | 2011-06-14 | 2011-12-21 | 苏州市协力环保设备有限公司 | Method and equipment for treating waste gas of hot press |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20170053955A (en) | 2017-05-17 |
| CN106861351A (en) | 2017-06-20 |
| KR101764815B1 (en) | 2017-08-03 |
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