CN106773560A - Substrate apparatus for baking - Google Patents
Substrate apparatus for baking Download PDFInfo
- Publication number
- CN106773560A CN106773560A CN201611117363.9A CN201611117363A CN106773560A CN 106773560 A CN106773560 A CN 106773560A CN 201611117363 A CN201611117363 A CN 201611117363A CN 106773560 A CN106773560 A CN 106773560A
- Authority
- CN
- China
- Prior art keywords
- heating chamber
- baking
- heater
- substrate apparatus
- inter panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
Abstract
The invention discloses a kind of substrate apparatus for baking, heating chamber including top surface opening, the cover plate being covered at the top of the heating chamber, the heater in the heating chamber and the hot plate above the heater, the cover inner surface have been removably secured and the spaced inter panel of the hot plate.The present invention is provided with inter panel by the cover inner surface of substrate apparatus for baking, the photoresistance coagulation of generation of being volatilized after substrate heating will not condense in cover inner surface, when photoresistance coagulation reaches need to a certain degree cleaning, only need to pull down inter panel and cleaned or changed, it is efficient and convenient.
Description
Technical field
The present invention relates to substrate processing technique field, more particularly to a kind of substrate apparatus for baking.
Background technology
In the processing procedure of chromatic color filter, need to be toasted after the coated machine coating photoresistance of glass substrate in each producing line,
Its main purpose be exactly by by the photoresistance after coating, by way of heating is contacted with hot plate, by photoresistance through VCD (vacuum
Dry) pumping after still remain partial solvent removal, further the film layer of coating is cured to close to wet film state, and increase light
Resistance and the adhesive force of substrate.
Hot plate adds thermogenetic smooth resistance solvent that the cover inner surface of apparatus for baking cavity is attached to after volatilizing, and is removed in producing line
The substrate of fortune is more, and more light resistance solvent volatilizations in lid surface so that form coagulation；Lid surface coagulation is more,
The risk done over again or scrap that substrate is present is bigger.Therefore, the increase of substrate fraction defective is easily caused, production quality is influenceed.
Photoresistance composition in chromatic color filter processing procedure is mainly photoresist and solvent etc., and solvent is difficult to find substitute,
And photoresist technology has been stablized relatively, therefore photoresist improvement space is also smaller.Generally there are two kinds of ameliorative ways：(1) protect
Apparatus for baking is supported, 10% KOH solvents and ultra-fine hundred grades of non-dust cloths need to be used, however, because genuine cover plate is non-dismountable, personnel
Also need work high above the ground than relatively hazardous, after photoresistance coagulation is attached to genuine cover plate, cleans process and take too long, and cleaning effect
It is not good；(2) genuine cover plate is directly changed, cavity is easily damaged, and it is relatively costly, take also more long.
Demand with market increasingly increases, the capacity requirements more and more higher of producing line, therefore maintenance time and cycle are also non-
It is often important.Both the above scheme, otherwise it is difficult to carry out effective cleaning to the photoresistance coagulation on apparatus for baking cover plate, cause to produce
Product defect is excessive, influences product exception；Apparatus for baking cavity is easily damaged, difficulty is changed greatly, taken more long.
The content of the invention
In view of the deficiency that prior art is present, the invention provides a kind of photoresistance coagulation cleaning effect is good, substrate yield
Substrate apparatus for baking high, and photoresistance coagulation cleaning is rapid and thorough.
In order to realize above-mentioned purpose, present invention employs following technical scheme：
A kind of substrate apparatus for baking, including top surface opening heating chamber, be covered at the top of the heating chamber cover plate, be located at
Heater in the heating chamber and the hot plate above the heater, the cover inner surface have been removably secured
With the spaced inter panel of the hot plate.
Used as one of which implementation method, the inter panel is stainless steel.
Used as one of which implementation method, the heater includes the middle part heater of centre and the side heater of both sides.
Used as one of which implementation method, the heating room side wall offers at least one pair of convection holes.
Used as one of which implementation method, convection holes are connected with exhaust fan described at least one.
As one of which implementation method, through hole, the cover plate or the inter panel are offered on the inter panel
Ventilating opening is offered on the heating room side wall between the cover plate.
Used as one of which implementation method, the inter panel edge is inclined obliquely.
Used as one of which implementation method, the hot plate lower section supports the support group of the hot plate with being provided with height adjustable
Part.
Used as one of which implementation method, the support component is the elastic thimble that several arrays are set.
As one of which implementation method, it is provided with along the heating at least two relative side walls of the heating chamber
The slide rail extended in the short transverse of room, the heater end is slidingly disposed in the slide rail.
The present invention is provided with inter panel by the cover inner surface of substrate apparatus for baking, volatilizees what is produced after substrate heating
Photoresistance coagulation will not condense in cover inner surface, when photoresistance coagulation reaches need to a certain degree cleaning, it is only necessary to pull down
Inter panel is cleaned or changed, efficient and convenient.
Brief description of the drawings
Fig. 1 is a kind of internal structure schematic diagram of substrate apparatus for baking of the embodiment of the present invention.
Fig. 2 is a kind of part-structure schematic diagram of substrate apparatus for baking of the embodiment of the present invention.
Specific embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, it is right below in conjunction with drawings and Examples
The present invention is further described.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and without
It is of the invention in limiting.
Refering to Fig. 1, the substrate apparatus for baking of the embodiment of the present invention includes the heating chamber 10 of top surface opening, is covered on heating chamber
Cover plate 20 at the top of 10, the heater 30 in heating chamber 10 and the hot plate 40 located at the top of heater 30, in cover plate 20
Surface has been removably secured and the spaced inter panel 50 of hot plate 40.
Inter panel 50 is completely covered on the inner surface of cover plate 20, causes substrate to toast the light for volatilizing in order to avoid there is gap
Resistance coagulation pollution cover plate 20.During baking processing procedure, substrate 1 lies in the upper surface of hot plate 40, by 30 pairs of heat of top of heater
Plate 40 is heated so that be attached to the surface of inter panel 50 after the volatilization such as the photoresist and solvent on the surface of substrate 1.Work as photoresistance
Coagulation is reached when need to a certain degree cleaning, it is only necessary to is pulled down inter panel and is cleaned or changed, and is cleaned and is changed
It is all very convenient.
As shown in Fig. 2 the heater 30 of the present embodiment includes the middle part heater 31 of centre and the side heater 32 of both sides,
Middle part heater 31 and side heater 32 all arrange to be in strip, the zone line and fringe region of hot plate 40 are corresponded to respectively, to heat
The compartmentalization of plate 40 is heated, for example, when some region of humidity of substrate 1 is higher, can improve respective regions by heater 30
Heating-up temperature.Temperature sensor is also provided with heating chamber 10, by the baking temperature of the respective regions of real-time detection hot plate 40
Degree realizes accurate computer heating control.
In baking process, to accelerate to air-dry, at least one pair of convection holes 100, this implementation are offered in the side wall of heating chamber 10
Side wall of the example preferably per side offers several convection holes 100, and by a convection holes 100 is connected with exhaust fan wherein
101, the cross-ventilation in heating chamber 10 and heat exchange can be accelerated by exhaust fan 101, it is to avoid influence cured effect.
Inter panel 50 preferably uses stainless steel material, and low cost and corrosion-resistant is easy to clean.Inter panel 50 and heating
Room 10 is detachably connected mode and can preferably carry out in the following way：Through hole is offered in each side wall of heating chamber 10, in
Between cover plate 50 be in place after be fitted in through-hole surfaces, after the fixed block 51 (such as Fig. 1) that is separately provided inserts the through hole, Gu
Determine block 51 to be held on wherein inter panel 50 with each side wall of heating chamber 10, inter panel 50 completes to fix.When needs are torn open
When unloading inter panel 50, each fixed block 51 need to be only extracted, inter panel 50 can be removed, and dismounting is rapid.
In addition, through hole is further opened with inter panel 50, and adding between cover plate 20 or inter panel 50 and cover plate 20
Ventilating opening is offered on the side wall of hot cell 10, is solidified with photoresistance coagulation with accelerating inter panel 50 to radiate.
In one embodiment, on the premise of inter panel 50 blocks the inner surface of cover plate 20 completely, inter panel 50
Edge be also designed to inclined construction obliquely, the liquid or the photoresistance coagulation of semisolid produced in baking process can be along
Under the marginal flow of inter panel 50.In addition, the surrounding, the lower section of inter panel 50 in the inside sidewalls of heating chamber 10 are provided with splendid attire
The container of the photoresistance coagulation for flowing down.
The lower section of hot plate 40 supports the support component 60 of hot plate 40 with being provided with height adjustable.Here, if support component 60 is
The elastic thimble that dry array is set.It is provided with along the short transverse of heating chamber 10 at least two relative side walls of heating chamber 10
The slide rail of upper extension, the end of heater 30 is slidingly disposed in slide rail.Substrate apparatus for baking is externally provided with hydraulic pressure in heating chamber 10
Device, can drive heater 30 along slide rail lengthwise movement by hydraulic means, the interval of regulation heater 30 and hot plate 40, with
Connect regulation heating effect.
In sum, the present invention is provided with inter panel by the cover inner surface of substrate apparatus for baking, after substrate heating
The photoresistance coagulation for producing that volatilizees will not condense in cover inner surface, when photoresistance coagulation reaches need to a certain degree cleaning,
Only need to pull down inter panel and cleaned or changed, it is efficient and convenient.
The above is only the specific embodiment of the application, it is noted that for the ordinary skill people of the art
For member, on the premise of the application principle is not departed from, some improvements and modifications can also be made, these improvements and modifications also should
It is considered as the protection domain of the application.
Claims (10)
1. a kind of substrate apparatus for baking, it is characterised in that the heating chamber (10) including top surface opening, be covered on the heating chamber
(10) cover plate (20) at the top of, the heater (30) in the heating chamber (10) and located at the heater (30) top
Hot plate (40), cover plate (20) inner surface has been removably secured and the hot plate (40) spaced inter panel
(50)。
2. substrate apparatus for baking according to claim 1, it is characterised in that the inter panel (50) is stainless steel.
3. substrate apparatus for baking according to claim 1, it is characterised in that the heater (30) includes middle middle part
Heater (31) and the side heater (32) of both sides.
4. substrate apparatus for baking according to claim 1, it is characterised in that heating chamber (10) side wall is offered at least
A pair of convection holes (100).
5. substrate apparatus for baking according to claim 4, it is characterised in that convection holes described at least one (100) are connected
There is exhaust fan (101).
6. substrate apparatus for baking according to claim 1, it is characterised in that offered on the inter panel (50) logical
Hole, opens up on the heating chamber (10) side wall between the cover plate (20) or the inter panel (50) and the cover plate (20)
There is ventilating opening.
7. substrate apparatus for baking according to claim 1, it is characterised in that inter panel (50) edge is oblique to have a down dip
Tiltedly.
8. according to any described substrate apparatus for baking of claim 1-7, it is characterised in that hot plate (40) lower section is provided with
The support component (60) of the height adjustable ground support hot plate (40).
9. substrate apparatus for baking according to claim 8, it is characterised in that the support component (60) is several arrays
The elastic thimble of setting.
10. substrate apparatus for baking according to claim 8, it is characterised in that at least two phases of the heating chamber (10)
To side wall in be provided with the heating chamber (10) short transverse extend slide rail, heater (30) end is slidably
Ground is in the slide rail.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611117363.9A CN106773560A (en) | 2016-12-07 | 2016-12-07 | Substrate apparatus for baking |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611117363.9A CN106773560A (en) | 2016-12-07 | 2016-12-07 | Substrate apparatus for baking |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106773560A true CN106773560A (en) | 2017-05-31 |
Family
ID=58877160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611117363.9A Pending CN106773560A (en) | 2016-12-07 | 2016-12-07 | Substrate apparatus for baking |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106773560A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019071820A1 (en) * | 2017-10-12 | 2019-04-18 | 惠科股份有限公司 | Pre-baking device and pre-baking system for display substrate |
| WO2019134582A1 (en) * | 2018-01-03 | 2019-07-11 | 惠科股份有限公司 | Baking method, device and baking oven |
| CN110079758A (en) * | 2018-04-17 | 2019-08-02 | 广东聚华印刷显示技术有限公司 | The baking method of apparatus for baking and electroluminescent device substrate |
| CN110091626A (en) * | 2019-04-04 | 2019-08-06 | 深圳市华星光电技术有限公司 | A kind of baking structure of display base plate |
| CN110207470A (en) * | 2019-05-27 | 2019-09-06 | 武汉华星光电半导体显示技术有限公司 | Drying device |
| CN110227636A (en) * | 2019-05-16 | 2019-09-13 | 深圳市华星光电半导体显示技术有限公司 | Heating and drying device for Organic Light Emitting Diode |
| WO2019213899A1 (en) * | 2018-05-10 | 2019-11-14 | 深圳市柔宇科技有限公司 | Carrying device and vacuum drying apparatus |
| CN111090181A (en) * | 2018-10-23 | 2020-05-01 | 李东明 | Base plate baking machine table with multi-element heating mechanism |
| CN113150340A (en) * | 2021-04-28 | 2021-07-23 | 京东方科技集团股份有限公司 | Heating assembly and baking equipment |
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| CN201936121U (en) * | 2010-12-23 | 2011-08-17 | 北京京东方光电科技有限公司 | Substrate baking equipment |
| CN104460072A (en) * | 2014-12-31 | 2015-03-25 | 深圳市华星光电技术有限公司 | Substrate baking device |
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| CN105244302A (en) * | 2015-10-28 | 2016-01-13 | 武汉华星光电技术有限公司 | Substrate baking device |
| CN105629666A (en) * | 2014-10-29 | 2016-06-01 | 李东明 | Improved light resistance pre-baking oven heating device |
-
2016
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Patent Citations (5)
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| CN201936121U (en) * | 2010-12-23 | 2011-08-17 | 北京京东方光电科技有限公司 | Substrate baking equipment |
| CN105629666A (en) * | 2014-10-29 | 2016-06-01 | 李东明 | Improved light resistance pre-baking oven heating device |
| CN104460072A (en) * | 2014-12-31 | 2015-03-25 | 深圳市华星光电技术有限公司 | Substrate baking device |
| CN204557049U (en) * | 2015-02-05 | 2015-08-12 | 李东明 | The hot plate structure-improved of the pre-baking oven of photoresistance |
| CN105244302A (en) * | 2015-10-28 | 2016-01-13 | 武汉华星光电技术有限公司 | Substrate baking device |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019071820A1 (en) * | 2017-10-12 | 2019-04-18 | 惠科股份有限公司 | Pre-baking device and pre-baking system for display substrate |
| WO2019134582A1 (en) * | 2018-01-03 | 2019-07-11 | 惠科股份有限公司 | Baking method, device and baking oven |
| CN110079758A (en) * | 2018-04-17 | 2019-08-02 | 广东聚华印刷显示技术有限公司 | The baking method of apparatus for baking and electroluminescent device substrate |
| CN110079758B (en) * | 2018-04-17 | 2021-05-07 | 广东聚华印刷显示技术有限公司 | Baking device and baking method of electroluminescent device substrate |
| WO2019213899A1 (en) * | 2018-05-10 | 2019-11-14 | 深圳市柔宇科技有限公司 | Carrying device and vacuum drying apparatus |
| CN111090181A (en) * | 2018-10-23 | 2020-05-01 | 李东明 | Base plate baking machine table with multi-element heating mechanism |
| CN110091626A (en) * | 2019-04-04 | 2019-08-06 | 深圳市华星光电技术有限公司 | A kind of baking structure of display base plate |
| CN110227636A (en) * | 2019-05-16 | 2019-09-13 | 深圳市华星光电半导体显示技术有限公司 | Heating and drying device for Organic Light Emitting Diode |
| CN110207470A (en) * | 2019-05-27 | 2019-09-06 | 武汉华星光电半导体显示技术有限公司 | Drying device |
| CN113150340A (en) * | 2021-04-28 | 2021-07-23 | 京东方科技集团股份有限公司 | Heating assembly and baking equipment |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20170531 |