CN106773215A - A kind of color membrane substrates, its preparation method, liquid crystal display and display device - Google Patents
A kind of color membrane substrates, its preparation method, liquid crystal display and display device Download PDFInfo
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- CN106773215A CN106773215A CN201710011412.9A CN201710011412A CN106773215A CN 106773215 A CN106773215 A CN 106773215A CN 201710011412 A CN201710011412 A CN 201710011412A CN 106773215 A CN106773215 A CN 106773215A
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- substrate
- barrier wall
- black matrix
- layer
- liquid crystal
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- 239000000758 substrate Substances 0.000 title claims abstract description 131
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 38
- 238000002360 preparation method Methods 0.000 title abstract description 4
- 239000012528 membrane Substances 0.000 title abstract 4
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 56
- 230000004888 barrier function Effects 0.000 claims abstract description 55
- 239000011159 matrix material Substances 0.000 claims abstract description 48
- 239000000463 material Substances 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims description 51
- 238000004519 manufacturing process Methods 0.000 claims description 39
- 239000003086 colorant Substances 0.000 claims description 14
- 230000000903 blocking effect Effects 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 239000010408 film Substances 0.000 description 41
- 238000000059 patterning Methods 0.000 description 6
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133357—Planarisation layers
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The invention discloses a kind of color membrane substrates, its preparation method, liquid crystal display and display device, figure of the upper surface apart from the barrier wall of the distance of the upper surface of underlay substrate that distance of the upper surface apart from the upper surface of underlay substrate is more than photoresist layer is formed by the top of the black matrix positioned at underlay substrate fringe region, and the planarization layer of covering black matrix layer and photoresist layer is formed in the region that barrier wall is limited using drip, the viscosity of material is relatively low during due to forming planarization layer using drip, therefore can ensure that the material fully flows in the region that barrier wall is limited, such that it is able to make the surface distributed of the planarization layer in viewing area uniform, and then the flatness on planarization layer surface in the viewing area of color membrane substrates can be improved.When the color membrane substrates therefore being applied into liquid crystal display, the display homogeneity of liquid crystal display can be improved, and then improve the quality of liquid crystal display.
Description
Technical Field
The invention relates to the technical field of display, in particular to a color film substrate, a manufacturing method thereof, a liquid crystal display and a display device.
Background
The liquid crystal display generally includes a color film substrate and an array substrate disposed opposite to each other, and a liquid crystal layer disposed between the color film substrate and the array substrate. At present, when a color film substrate is manufactured, as shown in fig. 1, a pattern of a black matrix 02 is generally formed on a substrate 01; then, a photoresist layer 03 including blue B, green G, and red R is formed on the substrate 01 on which the pattern of the black matrix 02 is formed; then, a planarization layer 05 is formed on the substrate 01 on which the black matrix 02 and the photoresist layer 03 are formed.
However, since the current planarization layer is formed by a slit coating method, the viscosity of the planarization layer is high during preparation, and thus, an uneven phenomenon occurs at an overlapping portion of the black matrix layer and the photoresist layer, which causes uneven surface of the planarization layer, and is not favorable for subsequent diffusion of PI alignment liquid and liquid crystal alignment, thereby affecting the quality of the liquid crystal display.
Disclosure of Invention
The embodiment of the invention provides a color film substrate, a manufacturing method thereof, a liquid crystal display and a display device, which are used for improving the surface flatness of a planarization layer of a display area.
Therefore, an embodiment of the present invention provides a method for manufacturing a color film substrate, including:
forming a pattern of a black matrix on a substrate;
forming patterns of a light resistance layer with multiple colors on the substrate base plate on which the black matrix patterns are formed, and forming patterns of a barrier wall above the black matrix in the edge area of the substrate base plate; the distance between the upper surface of the barrier wall and the upper surface of the substrate base plate is greater than the distance between the upper surface of the light resistance layer and the upper surface of the substrate base plate;
and forming a planarization layer covering the black matrix layer and the photoresist layer in the region defined by the barrier wall by adopting a dropping method.
Preferably, in the manufacturing method of the color film substrate provided in the embodiment of the present invention, a dropping method is used to form a planarization layer covering the black matrix layer and the photoresist layer in the region defined by the barrier wall, and the method specifically includes:
and dripping the planarization layer material with the viscosity of 1.9-2.9 mPa.s into the area limited by the barrier wall by adopting a dripping method.
Preferably, in the manufacturing method of the color film substrate provided in the embodiment of the present invention, a material of the barrier wall is the same as a material of one of the photoresist layers of multiple colors.
Preferably, in the manufacturing method of the color film substrate provided in the embodiment of the present invention, a material of the barrier wall is the same as a material of the photoresist layer adjacent to the barrier wall.
Preferably, in the manufacturing method of the color film substrate provided in the embodiment of the present invention, the pattern of the barrier wall and the pattern of one of the photoresist layers are formed by a one-step composition process.
Preferably, in the manufacturing method of the color filter substrate provided in the embodiment of the present invention, after forming the planarization layer covering the black matrix layer and the photoresist layer, the method further includes: and carrying out high-frequency low-amplitude vibration treatment on the substrate base plate.
Preferably, in the method for manufacturing a color filter substrate according to an embodiment of the present invention, after performing high-frequency low-amplitude vibration processing on the substrate, the method further includes: and carrying out high-temperature curing treatment on the planarization layer.
Correspondingly, an embodiment of the present invention further provides a color film substrate, including a substrate, a black matrix and a light resistance layer of multiple colors, which are located on the substrate, and further including: the black matrix is arranged on the substrate, the photoresist layer is arranged on the substrate, and the edge area of the substrate is provided with a blocking wall which is arranged above the black matrix; the distance from the upper surface of the barrier wall to the upper surface of the substrate base plate is greater than the distance from the upper surface of the light resistance layer to the upper surface of the substrate base plate.
Preferably, in the color filter substrate provided in the embodiment of the present invention, a material of the barrier wall is the same as a material of one of the photoresist layers of multiple colors.
Preferably, in the color film substrate provided in the embodiment of the present invention, a material of the barrier wall is the same as a material of the photoresist layer adjacent to the barrier wall.
Correspondingly, the embodiment of the invention also provides a liquid crystal display which comprises any one of the color film substrates provided by the embodiment of the invention.
Correspondingly, the embodiment of the invention also provides a display device which comprises the liquid crystal display provided by the embodiment of the invention.
According to the color film substrate, the manufacturing method thereof, the liquid crystal display and the display device provided by the embodiment of the invention, the pattern of the barrier wall with the distance from the upper surface of the substrate to the upper surface of the photoresist layer larger than the distance from the upper surface of the photoresist layer to the upper surface of the substrate is formed above the black matrix in the edge area of the substrate, and the planarization layer covering the black matrix layer and the photoresist layer is formed in the area limited by the barrier wall by adopting the dripping method. Therefore, when the color film substrate is applied to a liquid crystal display, the display uniformity of the liquid crystal display can be improved, and the quality of the liquid crystal display is further improved.
Drawings
Fig. 1 is a schematic structural diagram of a conventional color film substrate;
fig. 2 is a flowchart of a method for manufacturing a color film substrate according to an embodiment of the present invention;
fig. 3a to fig. 3e are schematic cross-sectional structures of a manufacturing method according to an embodiment of the invention after performing steps.
Detailed Description
In order to make the purpose, technical solution and advantages of the present invention clearer, specific embodiments of a color film substrate, a manufacturing method thereof, a liquid crystal display and a display device provided in an embodiment of the present invention are described in detail below with reference to the accompanying drawings.
The thickness and shape of each layer of film in the drawings do not reflect the real proportion of the color film substrate, and the purpose is only to schematically illustrate the content of the invention.
An embodiment of the present invention provides a method for manufacturing a color film substrate, as shown in fig. 2, including:
s201, forming a black matrix pattern on a substrate;
s202, forming patterns of light resistance layers with various colors on a substrate with a black matrix pattern, and forming a pattern of a barrier wall above the black matrix in the edge area of the substrate; the distance between the upper surface of the barrier wall and the upper surface of the substrate base plate is greater than the distance between the upper surface of the photoresist layer and the upper surface of the substrate base plate;
and S203, forming a planarization layer covering the black matrix layer and the photoresist layer in the area limited by the barrier wall by adopting a dropping method.
According to the manufacturing method of the color film substrate provided by the embodiment of the invention, the pattern of the barrier wall with the upper surface being more than the distance from the upper surface of the substrate base plate to the upper surface of the photoresist layer is formed above the black matrix in the edge area of the substrate base plate, and the flat layer covering the black matrix layer and the photoresist layer is formed in the area limited by the barrier wall by adopting the dripping method. Therefore, when the color film substrate is applied to a liquid crystal display, the display uniformity of the liquid crystal display can be improved, and the quality of the liquid crystal display is further improved.
In a specific implementation, in the manufacturing method of the color film substrate provided in the embodiment of the present invention, a dropping method is used to form a planarization layer covering the black matrix layer and the photoresist layer in the region defined by the barrier wall, which specifically includes:
and dripping the planarization layer material with the viscosity of 1.9-2.9 mPa.s into the area limited by the barrier wall by adopting a dripping method.
In a specific implementation, in the manufacturing method of the color film substrate provided in the embodiment of the present invention, the photoresist layers of multiple colors at least include: the blue photoresist layer, the green photoresist layer and the red photoresist layer are not limited herein.
In a specific implementation, in order to reduce the manufacturing cost, in the manufacturing method of the color filter substrate provided in the embodiment of the present invention, the material of the barrier wall is the same as the material of one of the light resistance layers of multiple colors. Therefore, a new material for preparing the barrier wall is not required to be added, the graphs of the barrier wall and the photoresist layer can be formed through a one-time composition process, namely, the original composition graph is changed when the graph of one photoresist layer is formed, the graph of the barrier wall and the graph of one photoresist layer are formed simultaneously through the one-time composition process, the process for independently preparing the graph of the barrier wall is not required to be added, the preparation process flow can be simplified, the production cost is saved, and the production efficiency is improved.
Preferably, in a specific implementation, in order to reduce the manufacturing cost, in the manufacturing method of the color filter substrate provided in the embodiment of the present invention, the material of the barrier wall is the same as the material of the photoresist layer adjacent to the barrier wall.
It should be noted that, in the above manufacturing method provided in the embodiment of the present invention, the patterning process may only include a photolithography process, or may include a photolithography process and an etching step, and at the same time, may also include other processes for forming a predetermined pattern, such as printing, inkjet printing, and the like; the photolithography process is a process of forming a pattern by using a photoresist, a mask plate, an exposure machine, and the like, including processes of film formation, exposure, development, and the like. In particular implementations, the corresponding patterning process may be selected based on the structure formed in the present invention.
In specific implementation, in order to ensure the flatness of the planarization layer, in the manufacturing method of the color filter substrate according to the embodiment of the present invention, after the planarization layer covering the black matrix layer and the photoresist layer is formed, the method further includes: the substrate is subjected to high-frequency low-amplitude vibration treatment. Therefore, the full flowing of the material of the planarization layer can be ensured, and the purpose of improving the surface flatness of the color film substrate after the planarization layer is manufactured is achieved.
In specific implementation, in order to further ensure the flatness of the planarization layer, in the method for manufacturing a color filter substrate according to an embodiment of the present invention, after performing high-frequency low-amplitude vibration processing on the substrate, the method further includes: and carrying out high-temperature curing treatment on the planarization layer. This can accelerate the curing speed of the planarization layer.
Further, when the color filter substrate is used as a part of a liquid crystal display, generally in contact with a liquid crystal layer, in order to ensure uniformity of a thickness of the liquid crystal layer, in a specific implementation, in the manufacturing method provided in an embodiment of the present invention, a pattern of a black matrix layer, a pattern of a photoresist layer of multiple colors, a pattern of a barrier wall, and a pattern of a planarization layer are sequentially formed in a display area, and the method further includes: and arranging a plurality of spacer layers on the surface of the graph of the planarization layer, wherein the orthographic projection of the spacer layers on the substrate base plate is positioned in the orthographic projection of the black matrix in the display area on the substrate base plate.
The following explains the manufacturing method of the color film substrate in detail by using a specific embodiment.
The manufacturing method of the color film substrate comprises the following steps:
(1) a pattern of the black matrix 02 is formed on the base substrate 01 through a one-time patterning process, as shown in fig. 3 a.
(2) A pattern of the blue photoresist layer 03_1 is formed in a display region on the substrate 01 where the black matrix 02 is formed through a one-time patterning process, and at the same time, a pattern of the blocking wall 04 is formed above the black matrix 02 located at an edge region of the substrate 01, as shown in fig. 3 b.
(3) A pattern of the red photoresist layer 03_2 is formed on the display region on the base substrate 01 through a one-time patterning process, as shown in fig. 3 c.
(4) A pattern of the green photoresist layer 03_3 is formed on the display region on the base substrate 01 through a single patterning process, as shown in fig. 3 d.
(5) A planarization layer material having a viscosity of 1.9-2.9 mpa · s is dropped in the region defined by the barrier wall 04 by a dropping method to form a planarization layer 05 covering the black matrix layer 02 and the photoresist layer 03, as shown in fig. 3 e.
In specific implementation, the sequence of step (2) to step (4) may be interchanged according to the actual manufacturing process flow, and is not limited herein.
Based on the same inventive concept, an embodiment of the present invention further provides a color film substrate, as shown in fig. 3e, including a substrate 01, a black matrix 02 located on the substrate 01, and a photoresist layer 03 of multiple colors, and further including: the black matrix substrate comprises a blocking wall 04 positioned in the edge area of the substrate 01 and positioned above the black matrix 02, and a planarization layer 05 positioned in the area limited by the blocking wall 04, covering the black matrix 02 and the photoresist layer 03 and formed by adopting a dropping method; wherein, the distance between the upper surface of the barrier wall 04 and the upper surface of the substrate base plate 01 is larger than the distance between the upper surface of the photoresist layer 03 and the upper surface of the substrate base plate 01.
According to the color film substrate provided by the embodiment of the invention, the pattern of the barrier wall with the upper surface being farther from the upper surface of the substrate base plate than the upper surface of the photoresist layer is formed above the black matrix in the edge area of the substrate base plate, and the dropping method is adopted to form the planarization layer covering the black matrix layer and the photoresist layer in the area limited by the barrier wall. Therefore, when the color film substrate is applied to a liquid crystal display, the display uniformity of the liquid crystal display can be improved, and the quality of the liquid crystal display is further improved.
In a specific implementation, in the color film substrate provided in the embodiment of the present invention, the substrate may be a glass substrate, or may also be an array substrate provided with a thin film transistor, which is not limited herein.
In a specific implementation, in the color film substrate provided in the embodiment of the present invention, a material of the barrier wall is the same as a material of one of the photoresist layers of multiple colors.
Preferably, in a specific implementation, in the color filter substrate provided in the embodiment of the present invention, a material of the barrier wall is the same as a material of the photoresist layer adjacent to the barrier wall.
Based on the same inventive concept, an embodiment of the present invention further provides a liquid crystal display, including any of the color film substrates provided in the embodiments of the present invention. The principle of solving the problems of the liquid crystal display is similar to that of the color film substrate, so the implementation of the liquid crystal display can refer to the implementation of the color film substrate, and repeated parts are not repeated herein.
Based on the same inventive concept, the embodiment of the invention also provides a display device, which comprises the liquid crystal display provided by the embodiment of the invention. The display device may be: any product or component with a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like. Other essential components of the display device are understood by those skilled in the art, and are not described herein or should not be construed as limiting the invention. The implementation of the display device can refer to the embodiment of the color film substrate, and repeated details are not repeated.
In the color film substrate, the manufacturing method thereof, the liquid crystal display and the display device provided by the embodiment of the invention, the pattern of the barrier wall with the distance from the upper surface of the substrate to the upper surface of the photoresist layer larger than the distance from the upper surface of the photoresist layer to the upper surface of the substrate is formed above the black matrix in the edge area of the substrate, and the flat layer covering the black matrix layer and the photoresist layer is formed in the area limited by the barrier wall by adopting the dripping method. Therefore, when the color film substrate is applied to a liquid crystal display, the display uniformity of the liquid crystal display can be improved, and the quality of the liquid crystal display is further improved.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (12)
1. A manufacturing method of a color film substrate is characterized by comprising the following steps:
forming a pattern of a black matrix on a substrate;
forming patterns of a light resistance layer with multiple colors on the substrate base plate on which the black matrix patterns are formed, and forming patterns of a barrier wall above the black matrix in the edge area of the substrate base plate; the distance between the upper surface of the barrier wall and the upper surface of the substrate base plate is greater than the distance between the upper surface of the light resistance layer and the upper surface of the substrate base plate;
and forming a planarization layer covering the black matrix layer and the photoresist layer in the region defined by the barrier wall by adopting a dropping method.
2. The method for manufacturing the color filter substrate according to claim 1, wherein a planarization layer covering the black matrix layer and the photoresist layer is formed in the region defined by the barrier wall by a dropping method, and specifically comprises:
and dripping the planarization layer material with the viscosity of 1.9-2.9 mPa.s into the area limited by the barrier wall by adopting a dripping method.
3. The method for manufacturing a color filter substrate according to claim 1, wherein the material of the barrier wall is the same as the material of one of the photoresist layers of the plurality of colors.
4. The method for manufacturing the color filter substrate according to claim 3, wherein the material of the barrier wall is the same as the material of the photoresist layer adjacent to the barrier wall.
5. The method for manufacturing the color film substrate according to claim 3 or 4, wherein the pattern of the barrier wall and the pattern of one of the photoresist layers are formed by a one-step composition process.
6. The method for manufacturing a color filter substrate according to any one of claims 1 to 4, wherein after forming a planarization layer covering the black matrix layer and the photoresist layer, the method further comprises: and carrying out high-frequency low-amplitude vibration treatment on the substrate base plate.
7. The method for manufacturing a color filter substrate according to claim 6, wherein after the substrate is subjected to the high-frequency low-amplitude vibration treatment, the method further comprises: and carrying out high-temperature curing treatment on the planarization layer.
8. A color film substrate comprises a substrate base plate, a black matrix and a light resistance layer with multiple colors, and is characterized by further comprising:
the black matrix is arranged on the substrate, the photoresist layer is arranged on the substrate, and the edge area of the substrate is provided with a blocking wall which is arranged above the black matrix; wherein,
the distance from the upper surface of the barrier wall to the upper surface of the substrate base plate is greater than the distance from the upper surface of the light resistance layer to the upper surface of the substrate base plate.
9. The color filter substrate of claim 8, wherein the material of the barrier wall is the same as the material of one of the photoresist layers of the plurality of colors.
10. The color filter substrate of claim 9, wherein the material of the barrier wall is the same as the material of the photoresist layer adjacent to the barrier wall.
11. A liquid crystal display comprising the color film substrate according to any one of claims 8 to 10.
12. A display device comprising the liquid crystal display device according to claim 11.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710011412.9A CN106773215A (en) | 2017-01-06 | 2017-01-06 | A kind of color membrane substrates, its preparation method, liquid crystal display and display device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710011412.9A CN106773215A (en) | 2017-01-06 | 2017-01-06 | A kind of color membrane substrates, its preparation method, liquid crystal display and display device |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109390278A (en) * | 2018-11-14 | 2019-02-26 | 京东方科技集团股份有限公司 | A kind of display base plate and preparation method thereof, display device |
| CN109445193A (en) * | 2018-02-13 | 2019-03-08 | 京东方科技集团股份有限公司 | A kind of display panel of horizontal electric field type, its production method and display device |
| WO2019148580A1 (en) * | 2018-01-30 | 2019-08-08 | 深圳市华星光电半导体显示技术有限公司 | Oled display panel and manufacturing method thereof |
| CN111162202A (en) * | 2018-11-08 | 2020-05-15 | 陕西坤同半导体科技有限公司 | Method and device for improving flatness of thin film packaged organic thin film layer |
| CN111652196A (en) * | 2020-07-17 | 2020-09-11 | 厦门天马微电子有限公司 | Display panel and display device |
| US11126042B2 (en) | 2018-02-13 | 2021-09-21 | Beijing Boe Display Technology Co., Ltd. | Horizontal electric field type display panel, method of manufacturing the same, and display device |
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