CN106707679A - Simple epitaxial wafer exposure device provided with energy consumption plate - Google Patents
Simple epitaxial wafer exposure device provided with energy consumption plate Download PDFInfo
- Publication number
- CN106707679A CN106707679A CN201611010292.2A CN201611010292A CN106707679A CN 106707679 A CN106707679 A CN 106707679A CN 201611010292 A CN201611010292 A CN 201611010292A CN 106707679 A CN106707679 A CN 106707679A
- Authority
- CN
- China
- Prior art keywords
- wasted
- steel plate
- operating platform
- epitaxial wafer
- energy steel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/54—Lamp housings; Illuminating means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a simple epitaxial wafer exposure device provided with energy consumption plates. The simple epitaxial wafer exposure device comprises an image collimator, wherein the top part of the image collimator is provided with a digital electronic polarization image capturing structure, an exposure lamp is installed between the digital electronic polarization image capturing structure and the image collimator, the digital electronic polarization image capturing structure and the image collimator are connected by means of an adjustable device, the bottom part of the image collimator is positioned on an operating platform, the image collimator is hinged with the operating platform, the operating platform is provided with holders on the lower surface at positions close to two side surfaces, the holders are fixedly connected with the operating platform, the energy consumption plates are connected between the two holders, the number of the energy consumption plates is more than one, and the energy consumption plates are provided with guide rails. The simple epitaxial wafer exposure device provided with the energy consumption plates improves the automation and intelligence degree of the equipment, the lines are more uniform, the service life of the exposure equipment is prolonged, the regulating property is good, the debugging is easy to perform, and the operation is facilitated.
Description
Technical field
The present invention relates to a kind of imaging device, more particularly to a kind of simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate.
Background technology
In the information development rapid epoch, people have found in its a large amount of social activities being engaged in, only by original money
Material and file is preserved as unique raw file, provide it is various using service can not meet current demand.Society
Organization and individual and each side are required for collecting and obtain some strong original materials, these original materials be in social activities not
The information resources of law voucher, various activities and the study that can lack, and these information resources can be by the side of micromage
Method, then makes the copy of original paper, and the image information on microform is the true record of original paper, and can really reproduce original text
The information content of part, is a kind of FA store method.But general device for image cannot realize this principle, it is necessary to specially
The simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate of door could preferably be exposed shooting, to make real image,
Prevent trouble before it happens.
The content of the invention
The technical problem to be solved in the present invention is：Overcome above mentioned problem, there is provided a kind of braking that improve equipment and intelligence
Degree can be changed so that safety coefficient is increased substantially, improve exposure accuracy, make its lines more uniform, while extending exposure
The simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate of the service life of light device.
To achieve these goals, the technical solution adopted by the present invention is such：The letter for being provided with Wasted-energy steel plate of the invention
Easy epitaxial wafer exposure device, including image center punch, image center punch top are provided with digital and electronic polarization picture catching structure, number
Exposing Lamp is installed between word electronic polarization picture catching structure and image center punch, digital and electronic polarization picture catching structure with
Between image center punch by adjustable apparatus connect, image center punch bottom be located at an operating platform on, image center punch with
It is hinged between operating platform, operating platform is provided with head at the lower surface of two sides, it is fixed between head and operating platform
Connection, is connected with Wasted-energy steel plate, Wasted-energy steel plate more than one between two heads, Wasted-energy steel plate is provided with guide rail, and guide rail is vertically provided at consumption
On energy plate, rail crown is located on operating platform, and guide rail is two, and light source is provided between two guide rails, and light source is fixed on two guide rails
Between, light source is provided with laser.
Further, as a kind of specific structure type, light source of the present invention uses cold ultraviolet light lamp.
Further, as a kind of specific structure type, image center punch of the present invention polarizes picture with digital and electronic
Sealing ring is provided between the capturing structure of face.
Further, as a kind of specific structure type, image center punch of the present invention is provided with protective cover.
Further, as a kind of specific structure type, laser of the present invention is two circular reflectors, and two
Circular reflector vertical array is on light source.
Further, as a kind of specific structure type, operating platform of the present invention is made of lucite.
Further, as a kind of specific structure type, head of the present invention is connected by glass cement with operating platform
Connect.
Further, as a kind of specific structure type, set between operating platform of the present invention and image center punch
There is supporting lug, supporting lug is made up of metal material.
Further, as a kind of specific structure type, guide rail of the present invention is made of stainless steel material.
Further, as a kind of specific structure type, feed belt is provided with guide rail of the present invention.
Compared with prior art, the advantage of the invention is that：Originally the simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate is improved
The braking of equipment and intelligence degree so that safety coefficient is increased substantially, and improves exposure accuracy, make its lines more
Uniformly, while extending the service life of exposure sources, with good modulability, debugging is simple, convenient operation.
Brief description of the drawings
The present invention is further described with reference to the accompanying drawings and examples.
Fig. 1 is structural representation of the invention；
In figure：1. image center punch；2. digital and electronic polarizes picture catching structure；3. Exposing Lamp；4. operating platform；5. head；
6. Wasted-energy steel plate；7. guide rail；8. light source；9. laser.
Specific embodiment
In conjunction with the accompanying drawings, the present invention is further explained in detail.These accompanying drawings are simplified schematic diagram, only with
Illustration illustrates basic structure of the invention, therefore it only shows the composition relevant with the present invention.
The present invention as shown in Figure 1 is provided with the preferred embodiment of the simple epitaxial wafer exposure device of Wasted-energy steel plate, including image
Center punch 1, the top of image center punch 1 is provided with digital and electronic polarization picture catching structure 2, digital and electronic polarization picture catching structure
Exposing Lamp 3 is installed between 2 and image center punch 1, is led between digital and electronic polarization picture catching structure 2 and image center punch 1
Adjustable apparatus connection is crossed, the bottom of image center punch 1 is located on an operating platform 4, between image center punch 1 and operating platform 4
It is hinged, operating platform 4 is provided with head 5 at the lower surface of two sides, is fixedly connected between head 5 and operating platform 4, two clouds
Wasted-energy steel plate 6 is connected between platform 5, the more than one of Wasted-energy steel plate 6, Wasted-energy steel plate 6 is provided with guide rail 7, and guide rail 7 is vertically provided at Wasted-energy steel plate
On 6, the top of guide rail 7 is located on operating platform 4, and guide rail 7 is two, and light source 8 is provided between two guide rails 7, and light source 8 is fixed on two and leads
Between rail 7, light source 8 is provided with laser 9, and the light source 8 uses cold ultraviolet light lamp, the image center punch 1 and numeral electricity
Sealing ring is provided between son polarization picture catching structure 2, the image center punch 1 is provided with protective cover, and the laser 9 is two
Individual circular reflector, and two circular reflector vertical arrays, on light source 8, the operating platform 4 is made of lucite, institute
State head 5 to be connected with operating platform 4 by glass cement, supporting lug be provided between the operating platform 4 and image center punch 1,
Supporting lug is made up of metal material, and the guide rail 7 is made of stainless steel material, and feed belt is provided with the guide rail 7.
The simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate of the invention improves braking and the intelligence degree of equipment,
So that safety coefficient is increased substantially, exposure accuracy is improve, make its lines more uniform, while extending making for exposure sources
With the life-span, with good modulability, debugging is simple, convenient operation.The light source 8 uses cold ultraviolet light lamp, exposure effect
More preferably；Sealing ring is provided between the image center punch 1 and digital and electronic polarization picture catching structure 2, makes its image center punch 1
Can be closely connected with digital and electronic polarization picture catching structure 2；The image center punch 1 is provided with protective cover, can
Image center punch 1 is played a protective role；The laser 9 is two circular reflectors, and two circular reflector vertical arrays
On light source 8, reflecting effect is splendid；The operating platform 4 is made of lucite, is difficult cracking failure；The operation is flat
Supporting lug is provided between platform 4 and image center punch 1, supporting lug is made up of metal material, good supporting role can be played；
The guide rail 7 is made of stainless steel material, extends the service life of guide rail；Feed belt is provided with the guide rail 7, it is convenient
Transmitted.
With above-mentioned according to desirable embodiment of the invention as enlightenment, by above-mentioned description, relevant staff is complete
Various changes and amendments can be carried out without departing from the scope of the technological thought of the present invention' entirely.The technology of this invention
Property scope is not limited to the content on specification, it is necessary to its technical scope is determined according to right.
Claims (7)
1. a kind of simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate, including image center punch, it is characterised in that：Image center punch
Top is provided with digital and electronic polarization picture catching structure, is installed between digital and electronic polarization picture catching structure and image center punch
There is Exposing Lamp, connected by adjustable apparatus between digital and electronic polarization picture catching structure and image center punch, image is fixed
Device bottom is located on an operating platform, is hinged between image center punch and operating platform, and operating platform is near two sides lower surface
Place is provided with head, is fixedly connected between head and operating platform, and Wasted-energy steel plate, Wasted-energy steel plate more than are connected between two heads
Individual, Wasted-energy steel plate is provided with guide rail, and guide rail is vertically provided in Wasted-energy steel plate, and rail crown is located on operating platform, and guide rail is two,
Light source is provided between two guide rails, light source is fixed between two guide rails, and light source is provided with laser；
The image center punch is provided with protective cover；The laser is two circular reflectors, and two circular reflectors are vertical
It is arranged on light source；Supporting lug is provided between the operating platform and image center punch, supporting lug is made up of metal material.
2. the simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate according to claim 1, it is characterised in that：The light source is adopted
Use cold ultraviolet light lamp.
3. the simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate according to claim 1, it is characterised in that：The image is determined
Sealing ring is provided between quasi- device and digital and electronic polarization picture catching structure.
4. the simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate according to claim 1, it is characterised in that：The operation is flat
Platform is made of lucite.
5. the simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate according to claim 1, it is characterised in that：The head leads to
Glass cement is crossed to be connected with operating platform.
6. the simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate according to claim 1, it is characterised in that：The guide rail is adopted
It is made of stainless steel material.
7. the simple epitaxial wafer exposure device for being provided with Wasted-energy steel plate according to claim 1, it is characterised in that：In the guide rail
It is provided with feed belt.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611010292.2A CN106707679A (en) | 2016-11-17 | 2016-11-17 | Simple epitaxial wafer exposure device provided with energy consumption plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611010292.2A CN106707679A (en) | 2016-11-17 | 2016-11-17 | Simple epitaxial wafer exposure device provided with energy consumption plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106707679A true CN106707679A (en) | 2017-05-24 |
Family
ID=58940488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611010292.2A Withdrawn CN106707679A (en) | 2016-11-17 | 2016-11-17 | Simple epitaxial wafer exposure device provided with energy consumption plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106707679A (en) |
-
2016
- 2016-11-17 CN CN201611010292.2A patent/CN106707679A/en not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN204095143U (en) | The 3D printer that a kind of high accuracy light-cured resin is shaping | |
| CN104325642A (en) | High precision light-cured resin molding 3 D (three dimensional) printer | |
| CN102506765A (en) | Device for measuring spray cone angle | |
| CN106707679A (en) | Simple epitaxial wafer exposure device provided with energy consumption plate | |
| CN107065421A (en) | Simple epitaxial wafer exposure device provided with projection | |
| CN204160777U (en) | The imaging system of the 3D printer that a kind of high accuracy light-cured resin is shaping | |
| CN206757986U (en) | A kind of Experiment of College Physics combination mirror assembly | |
| CN106647142A (en) | Epitaxial wafer exposure device equipped with energy consumption plates | |
| CN106647145A (en) | Epitaxial wafer exposure device with protective cover | |
| CN106647143A (en) | Rapid epitaxial wafer exposure device | |
| CN106681097A (en) | Epitaxial wafer exposure apparatus provided with lug boss | |
| CN106647141A (en) | Epitaxial wafer exposure device | |
| CN212254980U (en) | Device for identifying particle distribution in Hull-Shore sheet with assistance of laser | |
| CN106647144A (en) | Simple epitaxial wafer exposure device | |
| WO2018010300A1 (en) | Filling light method and apparatus for scanning book file | |
| CN204160778U (en) | The print platform of the 3D printer that a kind of high accuracy light-cured resin is shaping | |
| CN202304805U (en) | Atomization taper angle measuring device | |
| CN204855351U (en) | Full -automatic AOI complete machine | |
| CN204347404U (en) | Be provided with the Simple exposure device of projection | |
| CN204347407U (en) | Instantaneous exposure device | |
| CN204347405U (en) | Be provided with the exposure device of projection | |
| CN204347403U (en) | Exposure device | |
| CN204347399U (en) | Simple exposure device | |
| CN204347406U (en) | Be provided with the Simple exposure device of light gathering baffle-board | |
| CN204347400U (en) | Be provided with the exposure device of light gathering baffle-board |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20170524 |
|
| WW01 | Invention patent application withdrawn after publication |