CN106691971A - Aloe extract-containing after-sun repair mask - Google Patents
Aloe extract-containing after-sun repair mask Download PDFInfo
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- CN106691971A CN106691971A CN201710075532.5A CN201710075532A CN106691971A CN 106691971 A CN106691971 A CN 106691971A CN 201710075532 A CN201710075532 A CN 201710075532A CN 106691971 A CN106691971 A CN 106691971A
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- facial mask
- sun restorative
- sun
- sodium
- fiber
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/96—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
- A61K8/97—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/02—Cosmetics or similar toiletry preparations characterised by special physical form
- A61K8/0212—Face masks
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
- A61K8/34—Alcohols
- A61K8/345—Alcohols containing more than one hydroxy group
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/64—Proteins; Peptides; Derivatives or degradation products thereof
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/73—Polysaccharides
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/73—Polysaccharides
- A61K8/735—Mucopolysaccharides, e.g. hyaluronic acid; Derivatives thereof
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
- A61Q19/004—Aftersun preparations
Abstract
The invention discloses an aloe extract-containing after-sun repair mask comprising (1) a mask base cloth, and (2) a mask essence liquid; the mask essence liquid comprises the components: (a) a water soluble thickening agent making the mask essence liquid have the viscosity of 1 mPa.s to 5000 mPa.s; (b) 0.1 wt%-20 wt% of a moisturizing agent comprising polyhydric alcohol and sodium hyaluronate; (c) 0.1 wt%-10 wt% of an after-sun repair composition comprising an aloe vera leaf extract, glycosaminoglycans, and an aesculus hippocastanum seed extract; and (d) a water-containing carrier. The after-sun repair mask has the efficacies of protecting collagen and elastin in skin, resisting edema and exudation, protecting blood vessels and the like, and can effectively relieve and repair burning heat sensation, and red and swollen phenomena caused by sunburning.
Description
Technical field
The invention belongs to cosmetic field, a kind of after-sun restorative facial mask containing aloe extract is specifically related to.
Background technology
In recent years, with the improvement of living standards, people possess more conditions and enjoy life, and sunlight seabeach, clear water are blue
Its object chased as everybody.Direct sunlight carrys out the bad phenomenons such as photosensitized reaction, pigment disorder to the skin tape of people, sun-proof
Product turns into the necessity of outdoor activities.But sunscreen product is in the presence of itself photostability is poor, water resistant ability is weak, guard time is short
The deficiency such as need to smear repeatedly, cause sunburn to happen occasionally, after-sun restorative turns into the problem of market urgent need to resolve.
Under this trend, after-sun restorative facial mask turns into market favorite.As Chinese patent ZL201310495655.6 is disclosed
A kind of Post-basking repairing mask, the facial mask includes lemon juice, pearl tomato, Celery Juice, radix polygonati officinalis extract solution, honey ultrafine powder
And flour, declare containing substantial amounts of VA, VC and VE, effectively moisturizing, water lock, suppression melanin can be formed, repair epidermal cell
Post-basking repairing mask.As Chinese patent application CN201610434921.8 discloses a kind of Post-basking repairing mask, contain sophora flower
Extract solution, scutellaria extract solution, dried orange peel extract solution, angelica extract, honey, lemon juice, the red sage root, evodia rutaecarpa, pearl powder, sea-buckthorn
Oil, sodium dehydroacetate, declare with good after-sun effect and have no toxic side effect, moreover it is possible to be that skin and hair provide nutrition
With the skin that compacts, and acted on certain ultra-violet radiation resisting.
But, inventor has found that the research object of the facial mask that prior art is provided is generally facial mask essence, does not account for face
The interaction of film Essence and its carrier mask substrate, in fact, mask substrate to the adsorption capacity of Essence, gas permeability,
There is material impact to the use feeling and effect of facial mask with the factor such as the affinity of skin.Based on this, the invention provides one kind
After-sun restorative facial mask unlike the prior art, the formula of Essence is constituted the after-sun restorative facial mask and mask substrate is carried out
Optimum choice, with more preferably use feeling and after-sun restorative effect, so as to complete the present invention.
The content of the invention
Based on this, present invention aim at a kind of facial mask with after-sun restorative effect of offer.Solve above-mentioned technical problem
Technical scheme it is as follows：
A kind of after-sun restorative facial mask, the facial mask is included：
(1) mask substrate；With
(2) facial mask essence, the facial mask essence includes：
A () water-soluble thickener, the thickener makes the facial mask essence have gluing for 1mPas to 5000mPas
Degree；With
B the NMF of () 0.1wt%-20wt%, the NMF includes polyalcohol, Sodium Hyaluronate；With
C the after-sun restorative composition of () 0.1wt%-10wt%, the after-sun restorative composition includes aloe barbadensis Miller (ALOE
BARBADENSI S) leaf extract, glucose GAG, European horse-chestnut (AESCULUS HIPPOCASTANUM) seed extract
Thing；With
(d) aqueous carrier.
Wherein in some embodiments, after-sun restorative composition of the present invention also includes ambrette (HIBISCUS
ABELMOSCHUS) extract, oligopeptides -1.
Preferably, the filmogen of mask substrate of the present invention can be hydrogel, biological fiber, silk fiber, angle egg
White fiber, cotton fiber, wood fibre, bamboo-carbon fibre, silk, pearl fiber, viscose fiber, CUP, Modal fibre, shell
Glycan fiber, alginate fibre, terylene/viscose fiber, one or more mixing of wood pulp/viscose fiber.Wherein one
In a little embodiments, the filmogen of described mask substrate is biological fiber.
Preferably, water-soluble thickener of the present invention can be reversion emulsifying agent, xanthans, hydroxyethyl cellulose, card
Ripple nurse, Carbomer sodium, acrylic acid (ester) analog copolymer, polyvinylpyrrolidone, Magnesiumaluminumsilicate, mosanom, acrylic acid (ester) class/
C10-30 alkylol acrylamide acid esters cross-linked polymer, sodium metasilicate magnesium lithium, the grafting of polyacrylate cross-linked polymer -6, Sodium Polyacrylate
Starch, hydroxypropyl methyl cellulose, polyethylene glycol -90M, AVC, acrylic acid (ester)
Class/the methacrylate copolymer of docosyl alcohol polyethers -25, Sodium Polyacrylate, gellan gum, pectin, Sodium Hyaluronate, polyglutamic acid
Sodium, carragheen, locust bean gum, dehydroxanthan, hydrolysis pyrenomycetes (SCLEROTIUM ROLFSSII) glue, pyrenomycetes
(SCLEROTIUM ROLFSSII) glue, white fungus (TREMELLA FUCIFORMIS) fruiting body extract, Chondrus crispus
One or more the mixing of (CHONDRUS CRISPUS) powder.Wherein in some embodiments, described water-soluble increasing
Thick dose is Carbomer sodium and the mixture of hydroxyethyl cellulose, and described Carbomer sodium and the mass ratio of hydroxyethyl cellulose are
(1-10)：(1-10).
Preferably, polyalcohol of the present invention can be glycerine, 1,3-PD, 1,2-PD, butanediol, double third sweet
Alcohol, glycerin polyether -26, sorb (sugar) alcohol, diglycerol, 1,2- pentanediols, PEG-8, polyethylene glycol -32, Natrulon H-10,
Polyglycereol -8,1,2- hexylene glycols, isoprene, PPG-24- glycerin polyethers -24, ethanol, pungent glycol one or more
Mixing.Wherein in some embodiments, described polyalcohol is glycerine, the mixing of 1,3-PD, described glycerine, 1,3- third
The mass ratio of glycol is (1-10)：(1-10).
Prior art is compared, the invention has the advantages that：1st, the after-sun restorative facial mask that the present invention is provided contains many
First alcohol, Sodium Hyaluronate, can keep the moisture of skin appropriateness, lift skin reflecting feel, and to after-sun restorative effect
Playing has booster action；The after-sun restorative composition for containing is extracted including aloe barbadensis Miller (ALOE BARBADENSIS) leaf
Thing, glucose GAG, European horse-chestnut (AESCULUS HIPPOCASTANUM) seed extract, with glue in protection skin
Former albumen and elastin laminin, antioedematous, it is impervious go out, protection blood vessel the effects such as, burning heat sensation that the maintenance that can effectively releive sunburn causes,
Red, swollen phenomenon.2nd, the after-sun restorative facial mask that the present invention is provided is to the formula composition of Essence and being optimized for mask substrate
Selection, with more preferably use feeling and skin-care effect；3rd, the facial mask simple production process that the present invention is provided, the equipment letter for being used
Easily, it is easy to accomplish large-scale industrial production.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, embodiment of the present invention will be made into one below
Step ground is described in detail, but embodiments of the present invention not limited to this, for especially not dated technological parameter or condition, be can refer to
Routine techniques is carried out.
Heretofore described " wt% " is the meaning of percentage by weight.
Facial mask of the present invention, is, as matrix, to coordinate corresponding skin care with inert matter (synthesis or natural flake fibre object)
Immersion profit mask product, be overlying on human skin, taken off after a period of time from, clean or retain, play colonization or
The product of cleaning action.
After-sun restorative facial mask of the invention includes mask substrate, and mask substrate adsorbs facial mask essence as medium, can be with
Face's ad-hoc location is fixed on, confining bed is formed, promotes the absorption of Essence.Mask substrate to the adsorption capacity of Essence, thoroughly
The factors such as the affinity of gas and skin have material impact to the use feeling and effect of facial mask.The filmogen of mask substrate
Can be fine for hydrogel, biological fiber, silk fiber, keratin fiber, cotton fiber, wood fibre, bamboo-carbon fibre, silk, pearl
Dimension, viscose fiber, CUP, Modal fibre, chitin fiber, alginate fibre, terylene/viscose fiber, wood pulp/gluing fibre
One or more mixing of dimension.
CUP of the present invention, a kind of regenerated celulose fibre, it is by natural cellulosic feedstocks such as cotton linters
It is dissolved in the liquor ammoniae fortis of Kocide SD or alkaline cupric salt, is made into spinning solution, the CUP element molecular chemistry in coagulating bath
Thing disintegrating and regeneration goes out cellulose, and the hydrate cellulose of generation is to obtain CUP through post-processing.CUP it is dry by force with it is glutinous
Glue fiber is approached, but wet is higher than by force viscose fiber, and wearability is also soft with fiber also superior to viscose rayon, and gloss is suitable, inhales
It is moist good, the characteristics of performance is similar to silk.
Chitin fiber of the present invention, is, with shitosan as primary raw material, to be dissolved in appropriate solvent, is matched somebody with somebody
Certain density colloid spinning solution is made, then through techniques such as spinneret, solidification forming, stretchings, is prepared into strong with certain machinery
The high molecular functional material of degree.Shitosan as lower animal organize in fibre composition, from macromolecular structure, it
Both similar in appearance to the cellulosic structure in plant tissue and similar with collagen structures in higher mammal tissue, therefore shell
Glycan fiber has good biocompatibility.Further, chitin fiber has broad spectrum antibacterial.Proposed from Allan in 1979
Since the antibiotic property of shitosan, its antibiotic property and Antibacterial Mechanism are always the focus of domestic and foreign scholars research, although to its antibacterial
Mechanism is still disputable, but its anti-microbial property has been an admitted facts.
Biological fiber of the present invention is the micro organism cellulose that acetobacter xylinum spontaneous fermentation is produced, with excellent docile
Water holding capacity, bio-compatible is good, non-stimulated.
Bamboo-carbon fibre facial mask of the present invention is to take mao bamboon for raw material, and forging for time delay is intercepted using pure oxygen high temperature and nitrogen
Burn new technology and new technology so that the micropore that bamboo charcoal innately has more refine with honeycomb, then again with cellular micropore
Structure trend polyester modification section melt spinning and be made.
After-sun restorative facial mask of the invention includes water-soluble thickener.Water-soluble thickener of the invention be it is water miscible or
The polymer being dispersed in water can be mixed with water.They can improve the viscosity of composition, and enable facial mask essence preferably quilt
Absorption is on mask substrate.
Water-soluble thickener of the invention includes anionic polymer and non-ionic polymers, can be reversion emulsification
Agent, xanthans, hydroxyethyl cellulose, Carbomer, Carbomer sodium, acrylic acid (ester) analog copolymer, polyvinylpyrrolidone, silicic acid
Magnalium, mosanom, acrylic acid (ester) class/C10-30 alkylol acrylamide acid esters cross-linked polymer, sodium metasilicate magnesium lithium, polyacrylate are handed over
Linked polymer -6, Sodium Polyacrylate graft starch, hydroxypropyl methyl cellulose, polyethylene glycol -90M, acryloyldimethyl ox sulphur
Sour ammonium/VP copolymers, acrylic acid (ester) class/methacrylate copolymer of docosyl alcohol polyethers -25, Sodium Polyacrylate, gellan gum,
Pectin, polyglutamic acid sodium, carragheen, locust bean gum, hydrolysis pyrenomycetes (SCLEROTIUM ROLFSSII) glue, pyrenomycetes
One or more the mixing of (SCLEROTIUM ROLFSSII) glue, Chondrus crispus (CHONDRUS CRISPUS) powder.
Water-soluble thickener is chosen such that the viscosity so that needed for the fluid composition of the present composition, required
Viscosity be for about 1mPas to about 5000mPas, preferably from about 100mPas is more preferably from about for about to about 1000mPas
300mPas to about 700mPas.In terms of the weight of facial mask essence, the amount of water-soluble thickener is preferably from about 0.05wt%
To about 1wt%, or even further preferably it is for about 0.2wt% to about 0.5wt%.
Reversion emulsifying agent of the present invention, is the pre-neutralized good polymer of a class (such as Sodium Polyacrylate, polyacrylamide
Amine, hydroxy-ethyl acrylate/sodium acryloyldimethyl taurate copolymers, acrylamide/ammonium acrylate copolymer), it is present in
In the emulsion of reversion, it is in a liquid state, meets water and invert immediately, derivatized polymers expand rapidly, quickly forms a kind of the solidifying of stabilization
Glue.As LASERSON companies GELINNOV products, consisting of：Sodium Polyacrylate, C18-21 alkane, trideceth -6；
The SIMULGEL EG products of SEPPIC companies, consisting of：PAA/sodium acryloyldimethyl taurate copolymers, different ten
Six alkane, Polyoxyethylene Sorbitan Monooleate；The SIMULGEL NS products of SEPPIC companies, consisting of：Hydroxy-ethyl acrylate/acryloyl two
N-methyltaurine sodium copolymer, saualane, polysorbate -60；The products of SEPIPLUS 265 of SEPPIC companies, its composition
For：Acrylamide/ammonium acrylate copolymer, polyisobutene, polysorbate -20；The SEPIPLUS 400 of SEPPIC companies is produced
Product, consisting of：Polyacrylate -13, polyisobutene, polysorbate -20；The SIMULGEL INS 100 of SEPPIC companies
Product, consisting of：Hydroxy-ethyl acrylate/sodium acryloyldimethyl taurate copolymers, isohexadecane, polysorbate -60.
After-sun restorative facial mask of the invention includes NMF, and described NMF includes polyalcohol, Sodium Hyaluronate.Moisturizing
Agent is chosen such that so that facial mask of the present invention has a good moistening effect, and the amount of the NMF is for about 0.1wt% to about
20wt%, preferably from about 10wt% are to about 15wt%.
Polyalcohol of the present invention can be glycerine, 1,3- propane diols, 1,2- propane diols, butanediol, dipropylene glycol, sweet
It is oily polyethers -26, sorb (sugar) alcohol, diglycerol, 1,2- pentanediols, PEG-8, polyethylene glycol -32, Natrulon H-10, poly- sweet
Oil -8,1,2- hexylene glycols, isoprene, PPG-24- glycerin polyethers -24, ethanol, one or more mixed of pungent glycol
Close.
Sodium Hyaluronate of the present invention, is the acid glutinous sugar of the most wide one kind of distribution in human body, is also human body skin
One of constitute, with good moisture-keeping function.When the molecular weight of Sodium Hyaluronate is less than 10000Da, inhaled with good transdermal
The property received, has facilitation to skin ultrastructure, metabolism.Therefore preferably, Sodium Hyaluronate of the present invention
Molecular weight is less than 10000Da.
After-sun restorative facial mask of the invention includes after-sun restorative composition, and the after-sun restorative composition includes aloe barbadensis Miller
(ALOE BARBADENSIS) leaf extract, glucose GAG, European horse-chestnut (AESCULUS HIPPOCASTANUM)
Seed extract.After-sun restorative composition is chosen such that so that facial mask of the present invention has good after-sun restorative effect, required
The amount of after-sun restorative composition is for about 0.1wt% to about 10wt%, preferably from about 1wt% to about 5wt%.
Aloe barbadensis Miller (ALOE BARBADENSIS) leaf extract of the present invention, water white transparency to brown is slightly
The liquid of stickiness, the anthraquinone analog compound and polysaccharide of aloe have makes the performance of skin contraction, softness, moisturizing, anti-inflammatory.
Glucose GAG of the present invention, is a kind of cosmetic active ingredient, can suppress metalloproteinases MMP
Activity, mitigate metalloproteinases MMP to skin collagen disorganization；Also there is astriction, skin-tightening can be made.
European horse-chestnut (AESCULUS HIPPOCASTANUM) seed extract of the present invention, carries from horse chestnut seed
Take prepared, main active is Aescin, it be play antioedematous, it is impervious go out, protection blood vessel the effects such as main component.
Oligopeptides -1 of the present invention, also known as epithelical cell growth factor EGF, can promote the Proliferation, Differentiation of cell, with new
Raw cell replaces senile cell and dead cell, skin is kept optimal physiological status, is the source for determining skin vigor and health
Spring.
Ambrette (HIBISCUS ABELMOSCHUS) extract of the present invention, can protect FGF-2 fibroblasts to give birth to
The factor long, promotes the synthesis of collagen and Glucosamine.Ambrette (HIBISCUS ABELMOSCHUS) extract is in market
It is upper on sale, such as Linefactor of BASF AGTMC。
After-sun restorative facial mask of the invention includes aqueous carrier, and aqueous carrier is mainly water, can also include whitening agent, resist
Quick dose of grade other conditioners to skin beneficiating, can also containing compositions such as pH value conditioning agent, preservative, essence and flavoring agent, stabilizers,
So that facial mask produces optimal using effect.PH value conditioning agent has triethanolamine, citric acid, NaOH, potassium hydroxide, lemon
Sour sodium, lactic acid, sodium lactate etc.；Stabilizer has EDETATE SODIUM, sodium pyrosulfite, cyclodextrin etc.；Preservative has methyl hydroxybenzoate, oxybenzene
Ethyl ester, Phenoxyethanol, methylisothiazolinone etc..
Embodiment 1-5
A kind of after-sun restorative facial mask, each component containing following weight/mass percentage composition：
The preparation technology of embodiment 1-5：To in agitated kettle add water, hydroxyethyl cellulose, methyl hydroxybenzoate, EDETATE SODIUM,
Dipotassium glycyrrhizinate, stirs；Then Carbomer sodium, Sodium Hyaluronate are dispersed in (glycerine, 1,3-PD) in polyalcohol,
Input agitated kettle；It is heated to 85 DEG C, homogeneous 3 minutes, the lower insulation of stirring 30 minutes；Cool to 48 DEG C, sequentially add Phenoxyethanol,
After-sun restorative composition is (such as：Aloe barbadensis Miller (ALOE BARBADENSIS) leaf extract, glucose GAG, Europe seven
Ye Shu (AESCULUS HIPPOCASTANUM) seed extract, ambrette (HIBISCUS ABELMOSCHUS) extract, oligopeptides-
1), stir, 35 DEG C of dischargings；After the assay was approved, facial mask essence is poured into by bottle placer and is pre-loaded with mask substrate
In facial mask bag.
Comparative example 1-5
A kind of after-sun restorative facial mask, each component containing following weight/mass percentage composition：
The preparation technology of comparative example 1-5：To in agitated kettle add water, hydroxyethyl cellulose, methyl hydroxybenzoate, EDETATE SODIUM,
Dipotassium glycyrrhizinate, stirs；Then Carbomer sodium, Sodium Hyaluronate are dispersed in (glycerine, 1,3-PD) in polyalcohol,
Input agitated kettle；It is heated to 85 DEG C, homogeneous 3 minutes, the lower insulation of stirring 30 minutes；Cool to 48 DEG C, sequentially add Phenoxyethanol,
After-sun restorative composition is (such as：Aloe barbadensis Miller (ALOE BARBADENSIS) leaf extract, glucose GAG, Europe seven
Ye Shu (AESCULUS HIPPOCASTANUM) seed extract, ambrette (HIBISCUS ABELMOSCHUS) extract, oligopeptides-
1), stir, 35 DEG C of dischargings；After the assay was approved, facial mask essence is poured into by bottle placer and is pre-loaded with mask substrate
In facial mask bag.
Embodiment 6
Efficacy assessments are carried out to the after-sun restorative facial mask of embodiment 1-5 and comparative example 1-6, and (comparative example 6 is a commercially available solarization
Face-protecting mask afterwards).Specific method of testing is as follows：Each experimental group chooses 10 volunteers, age 20-50 Sui, there is sunburn,
There is skin burns sense, red, swollen phenomenon；Application method：Apply and thrown off after 15 minutes on the face, clean, in 1 evening 1 time, continuously try out 3
My god, mug.Evaluation method：(1) effect：Contrast the 0th day and the 3rd day photo and inquire the use feeling of volunteer, wherein skin
Skin burning heat sensation, it is red, swollen be eliminated for effective；Skin burns sense, it is red, swollen be eased for effective；Skin problem does not have
Improve for invalid；(2) use feeling：More than 80% people is very soft when feeling face on facial mask, patch skin, breathe freely, have sense of compacting,
Then it is chosen as " +++ ", 60%-80% is then chosen as " ++ ", less than 60% is chosen as "+".Specific test result such as table 1.
The after-sun restorative facial mask test recording table of table 1
Show that the result of table 1 is visible by contrast experiment：
1st, effect aspect：Embodiment 1-5 contrasts visible with comparative example 6, and after-sun restorative facial mask provided by the present invention has
Good after-sun restorative effect；Embodiment 3 contrasts visible with embodiment 1-2, and ambrette (HIBI SCUS ABELMOSCHUS) is extracted
Thing, the addition of oligopeptides -1 have after-sun restorative castering action；Embodiment 4 contrasts visible with embodiment 3, embodiment 5, with being repaiied after solarization
The lifting of the addition of composition is protected, effect is lifted therewith, and best results when using the mask substrate of biological fiber, illustrate life
The mask substrate of fibres has facilitation to the efficacy exertion of after-sun restorative composition；Embodiment 4 can with comparative example 1-3 contrasts
See, each raw material of after-sun restorative composition is better when sharing, illustrate there is collaboration to increase between each composition of after-sun restorative composition
Effect is acted on；Embodiment 4 contrasts visible with comparative example 4, and ambrette (HIBISCUS ABELMOSCHUS) extract, oligopeptides -1 share ratio
It is alone better.
2nd, use feeling aspect：Embodiment 4 contrasts visible with embodiment 1-3, embodiment 5, the materials'use life of mask substrate
Use feeling is optimal during fibres；Embodiment 4 contrasts visible with comparative example 5, water-soluble thickener hydroxyethyl cellulose, Carbomer sodium
Use feeling gets a promotion when sharing.
The above, is only presently preferred embodiments of the present invention, and any formal limitation is not done to the present invention, therefore
All contents without departing from technical solution of the present invention, any simply repair according to technical spirit of the invention to made for any of the above embodiments
Change, equivalent variations and modification, still fall within the range of technical solution of the present invention.
Claims (10)
1. a kind of after-sun restorative facial mask, it is characterised in that described after-sun restorative facial mask is included：
（1）Mask substrate；With
（2）Facial mask essence, the facial mask essence includes：
（a）Water-soluble thickener, the thickener makes the facial mask essence have the viscosity of 1mPas to 5000mPas；With
（b）The NMF of 0.1wt%-20wt%, the NMF includes polyalcohol, Sodium Hyaluronate；With
（c）The after-sun restorative composition of 0.1wt%-10wt%, the after-sun restorative composition includes aloe barbadensis Miller
（ALOEBARBADENSIS）Leaf extract, glucose GAG, European horse-chestnut（AESCULUS HIPPOCASTANUM）Seed
Extract；With
（d）Aqueous carrier.
2. after-sun restorative facial mask according to claim 1, it is characterised in that described after-sun restorative composition also includes Huang
Certain herbaceous plants with big flowers（HIBISCUS ABELMOSCHUS）Extract, oligopeptides -1.
3. after-sun restorative facial mask according to claim 1 and 2, it is characterised in that the filmogen of the mask substrate is
It is hydrogel, biological fiber, silk fiber, keratin fiber, cotton fiber, wood fibre, bamboo-carbon fibre, silk, pearl fiber, gluing
Fiber, CUP, Modal fibre, chitin fiber, alginate fibre, terylene/viscose fiber, the one of wood pulp/viscose fiber
Plant or more than one mixing.
4. after-sun restorative facial mask according to claim 3, it is characterised in that the filmogen of described mask substrate is made a living
Fibres.
5. after-sun restorative facial mask according to claim 1 and 2, it is characterised in that the water-soluble thickener is reversion breast
Agent, xanthans, hydroxyethyl cellulose, Carbomer, Carbomer sodium, acrylic acid（Ester）Analog copolymer, polyvinylpyrrolidone, silicon
Sour magnalium, mosanom, acrylic acid（Ester）Class/C10-30 alkylol acrylamide acid esters cross-linked polymer, sodium metasilicate magnesium lithium, polyacrylic acid
Ester cross-linked polymer -6, Sodium Polyacrylate graft starch, hydroxypropyl methyl cellulose, polyethylene glycol -90M, acryloyldimethyl
Taurine ammonium/VP copolymers, acrylic acid（Ester）Class/the methacrylate copolymer of docosyl alcohol polyethers -25, Sodium Polyacrylate,
Gellan gum, pectin, Sodium Hyaluronate, polyglutamic acid sodium, carragheen, locust bean gum, dehydroxanthan, hydrolysis pyrenomycetes
（SCLEROTIUM ROLFSSII）Glue, pyrenomycetes（SCLEROTIUM ROLFSSII）Glue, white fungus（TREMELLA
FUCIFORMIS）Fruiting body extract, Chondrus crispus（CHONDRUS CRISPUS）One or more mixing of powder.
6. after-sun restorative facial mask according to claim 5, it is characterised in that described water-soluble thickener is Carbomer sodium
With the mixture of hydroxyethyl cellulose, described Carbomer sodium and the mass ratio of hydroxyethyl cellulose are（1-10）：（1-10）.
7. after-sun restorative facial mask according to claim 1 and 2, it is characterised in that the addition of described water-soluble thickener
Measure as 0.05wt% to 1wt%.
8. after-sun restorative facial mask according to claim 1 and 2, it is characterised in that the polyalcohol is glycerine, 1,3- the third two
Alcohol, 1,2- propane diols, butanediol, dipropylene glycol, glycerin polyether -26, sorb（Sugar）Alcohol, diglycerol, 1,2- pentanediols, poly- second two
Alcohol -8, polyethylene glycol -32, Natrulon H-10, polyglycereol -8,1,2- hexylene glycols, isoprene, PPG-24- glycerin polyethers -24, second
One or more mixing of alcohol, pungent glycol.
9. after-sun restorative facial mask according to claim 8, it is characterised in that described polyalcohol is glycerine, 1,3- the third two
The mixing of alcohol, described glycerine, the mass ratio of 1,3-PD are（1-10）：（1-10）.
10. after-sun restorative facial mask according to claim 1 and 2, it is characterised in that described after-sun restorative composition adds
Dosage is 1wt% to 5wt%.
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| CN201710075532.5A CN106691971A (en) | 2017-02-11 | 2017-02-11 | Aloe extract-containing after-sun repair mask |
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| CN201710075532.5A CN106691971A (en) | 2017-02-11 | 2017-02-11 | Aloe extract-containing after-sun repair mask |
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| CN201710075532.5A Pending CN106691971A (en) | 2017-02-11 | 2017-02-11 | Aloe extract-containing after-sun repair mask |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108158829A (en) * | 2018-01-18 | 2018-06-15 | 凌中鑫 | A kind of pectase facial mask cloth and its production method |
| CN108478508A (en) * | 2018-05-29 | 2018-09-04 | 佛山市顺德区香江精细化工实业有限公司 | A kind of after-sun spray and preparation method thereof |
| CN109610164A (en) * | 2018-10-18 | 2019-04-12 | 青岛即发集团股份有限公司 | A kind of chitin fiber facial mask cloth and preparation method thereof |
| CN109984978A (en) * | 2017-12-29 | 2019-07-09 | 广州佳洁化妆品有限公司 | A kind of after-sun recovery essence and preparation method |
| CN110420155A (en) * | 2019-09-06 | 2019-11-08 | 苏州榭睿迦医疗科技发展有限公司 | A kind of after-sun recovery antiallergic mask and preparation method thereof for open air after cross-country |
| CN111593477A (en) * | 2020-05-28 | 2020-08-28 | 广州汇朗无纺制品有限公司 | Mask base cloth, preparation method thereof and mask containing mask base cloth |
| CN111920746A (en) * | 2020-06-23 | 2020-11-13 | 广州绿人生物科技有限公司 | Moisturizing and repairing mask and preparation method thereof |
| CN112089669A (en) * | 2020-09-25 | 2020-12-18 | 广州环亚化妆品科技有限公司 | Aloe facial mask with after-sun repair effect and preparation method thereof |
| CN113089151A (en) * | 2021-04-07 | 2021-07-09 | 罗莱生活科技股份有限公司 | Three-dimensional antibacterial yarn containing cotton fibers, preparation method of three-dimensional antibacterial yarn and towel product |
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| CN115105459A (en) * | 2022-07-05 | 2022-09-27 | 广东先强药业有限公司 | Royal jelly extract and extraction method and application thereof |
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| CN103027867A (en) * | 2011-09-30 | 2013-04-10 | 天津市中科健新材料技术有限公司 | Finishing liquor applied on wet tissue and available for after-sun makeup removal and repair |
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| CN109984978A (en) * | 2017-12-29 | 2019-07-09 | 广州佳洁化妆品有限公司 | A kind of after-sun recovery essence and preparation method |
| CN108158829A (en) * | 2018-01-18 | 2018-06-15 | 凌中鑫 | A kind of pectase facial mask cloth and its production method |
| CN108478508A (en) * | 2018-05-29 | 2018-09-04 | 佛山市顺德区香江精细化工实业有限公司 | A kind of after-sun spray and preparation method thereof |
| CN109610164A (en) * | 2018-10-18 | 2019-04-12 | 青岛即发集团股份有限公司 | A kind of chitin fiber facial mask cloth and preparation method thereof |
| CN110420155B (en) * | 2019-09-06 | 2021-04-13 | 苏州榭睿迦医疗科技发展有限公司 | After-sun repair anti-allergy mask for outdoor off-road and preparation method thereof |
| CN110420155A (en) * | 2019-09-06 | 2019-11-08 | 苏州榭睿迦医疗科技发展有限公司 | A kind of after-sun recovery antiallergic mask and preparation method thereof for open air after cross-country |
| CN111593477A (en) * | 2020-05-28 | 2020-08-28 | 广州汇朗无纺制品有限公司 | Mask base cloth, preparation method thereof and mask containing mask base cloth |
| CN111920746A (en) * | 2020-06-23 | 2020-11-13 | 广州绿人生物科技有限公司 | Moisturizing and repairing mask and preparation method thereof |
| CN111920746B (en) * | 2020-06-23 | 2023-03-31 | 广州绿人生物科技有限公司 | Moisturizing and repairing mask and preparation method thereof |
| CN112089669A (en) * | 2020-09-25 | 2020-12-18 | 广州环亚化妆品科技有限公司 | Aloe facial mask with after-sun repair effect and preparation method thereof |
| CN113089151A (en) * | 2021-04-07 | 2021-07-09 | 罗莱生活科技股份有限公司 | Three-dimensional antibacterial yarn containing cotton fibers, preparation method of three-dimensional antibacterial yarn and towel product |
| CN113089151B (en) * | 2021-04-07 | 2022-06-17 | 罗莱生活科技股份有限公司 | Three-dimensional antibacterial yarn containing cotton fibers, preparation method of three-dimensional antibacterial yarn and towel product |
| CN114159369A (en) * | 2021-12-10 | 2022-03-11 | 江苏普罗诺生物科技有限公司 | Anti-wrinkle repair essence mask containing bluecopper peptides |
| CN115105459A (en) * | 2022-07-05 | 2022-09-27 | 广东先强药业有限公司 | Royal jelly extract and extraction method and application thereof |
| CN115105459B (en) * | 2022-07-05 | 2024-04-12 | 广东先强药业有限公司 | Royal jelly extract and extraction method and application thereof |
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