CN106648273A - Touch screen resistant to scratch and fingerprints and manufacturing method thereof - Google Patents
Touch screen resistant to scratch and fingerprints and manufacturing method thereof Download PDFInfo
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- CN106648273A CN106648273A CN201611268298.XA CN201611268298A CN106648273A CN 106648273 A CN106648273 A CN 106648273A CN 201611268298 A CN201611268298 A CN 201611268298A CN 106648273 A CN106648273 A CN 106648273A
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- Physical Vapour Deposition (AREA)
Abstract
The invention relates to the technical field of semiconductor materials, in particular to a touch screen resistant to scratch and fingerprints and a manufacturing method thereof. The technical problem that fingerprints remain on a touch screen of a mobile phone easily is solved. The touch screen is composed of a top panel, optical cement and bottom SENSOR. The manufacturing method includes the steps of 1 cleaning the top panel; 2 depositing a silicon dioxide film; 3 depositing a quasi-diamond film; 4 depositing a silicon dioxide film through a vacuum evaporation method; 5 depositing a fingerprint-resistant film through a vacuum evaporation method. The top panel is a face cover of the touch screen and is used as a contact face for point contact of a user, the top panel and the bottom SENSOR are glued through the optical cement, and the bottom SENSOR is used for arranging circuits. The manufacturing method of the touch screen resistant to scratch and fingerprints is simple in preparation process, and the touch screen high in scratch resistance can be manufactured.
Description
Technical field
The present invention relates to technical field of semiconductor, and in particular to a kind of anti-scratch anti-fingerprint touch-screen and its preparation side
Method.
Background technology
All it is at present GLASS structures in every projection-type capacitive touch screen panel on the market, projection-type capacitive touch screen is tied
Structure, is made up of top GLASS panels+optical cement+bottom SENSOR (SENSOR materials can be ITO FILM or ITO GLASS).
The plating of last layer anti-fingerprint is plated again because the structure of existing touch panel is generally substrate (such as glass, PMMA)
Layer, makes touch-screen have anti-fingerprint function, and anti-fingerprint coating is easier to slide and be difficult to leave fingerprint by touch-screen is more smooth.But
It is that anti-fingerprint film does not have anti-scratch function, so touch screen is easily scraped in use after anti-fingerprint coating is once scraped
Wound, particularly mobile phone and touch screen computer, many users have voluntarily bought pad pasting to prevent screen to be scraped off, but pad pasting
Easily scratch, constantly to change.
The content of the invention
The present invention easily leaves the technical problem of fingerprint for solution handset touch panel, there is provided a kind of anti-with resistance to scraping structure
Scrape anti-fingerprint touch-screen.
A kind of anti-scratch anti-fingerprint touch-screen, including top panel, optical cement and bottom SENSOR composition, the top surface
Plate is the cover of touch-screen, for the contact surface that user's point is touched, the optical cement gluing face top panel and bottom SENSOR
, the bottom SENSOR is for wiring topology；The silicon dioxide film of vacuum splashing and plating, the vacuum splashing and plating are covered with the top panel
Silicon dioxide film on be covered with the class diamond film of vacuum splashing and plating；The two of vacuum evaporation is covered with the class diamond film of the vacuum splashing and plating
Silicon oxide film；The anti-fingerprint film of vacuum evaporation is covered with the silicon dioxide film of the vacuum evaporation.
The top panel is PET panels.
The bottom SENSOR is the wire line plate of PET or GLASS base materials.
The silica film thickness of the vacuum splashing and plating is 1-5 nm.
The class diamond film thicknesses of layers of the vacuum splashing and plating is 1-15 nm.
The anti-fingerprint film thickness of the vacuum evaporation is little for 1-5 nm.
A kind of preparation method of anti-scratch anti-fingerprint touch-screen, comprises the following steps：
First, top panel is cleaned；
2nd, silicon dioxide film is deposited：Top panel is placed in vacuum sputtering cavity, the cavity is equipped with parallel to top panel
Silicon target, close plated film cavity, be evacuated down to vacuum for 10-3Below Pa, stops vacuumizing；Use ion beam bombardment top surface
Plate material 5～30 minutes, then opens oxygen and argon gas valve, and oxygen and argon gas are passed through into vacuum cavity, and keeps vacuum
Oxygen partial pressure is 0.5Pa～5Pa in cavity, and the partial pressure of argon gas is 0.1Pa～5Pa, after stable gas pressure, temperature be 25 DEG C～
Top panel is heated at 200 DEG C, after treating temperature stabilization, starts plated film, holding film deposition rate is 0.1nm/s～5nm/s；
After having plated silicon dioxide film, transfer top panel enters next plated film cavity；
3rd, class diamond film is deposited：The top panel processed through step 2 is entered into the vacuum cavity equipped with class diamond target, top
Portion's panel is placed in parallel with target, and argon gas is passed through into vacuum cavity, and keeps in vacuum cavity, and the partial pressure of argon gas is 0.1Pa
～5Pa, treats that air pressure rule are shown after stable gas pressure, then heats top panel in the case where temperature is for 25 DEG C～150 DEG C, treats temperature stabilization
Afterwards, plated film is initially powered up, argon gas ion forms plasma, and the positive electron in plasma bombards DLC in the presence of electric field force
Target, departs from carbon atom, and the carbon atom after disengaging can be attached on top panel material, forms DLC film, keeps film to sink
Product speed is 0.1nm/s～5nm/s；After having plated class diamond film, air is passed through, then takes out top panel；
4th, the silicon dioxide film of vacuum vapour deposition deposition：The top panel processed through step 3 is placed into into vacuum evaporation plating machine
Interior, the cavity has 6 crucibles, and respectively two crucibles thereto add silica coating materials and anti-fingerprint coating materials, opening to be equipped with
The crucible of silica, closes remaining crucible；Then oxygen and argon gas valve are opened, oxygen and argon is passed through into vacuum cavity
Gas, and keep in vacuum cavity oxygen partial pressure to be 0Pa～0.01Pa, the partial pressure of argon gas is 0.1Pa～5Pa, treat stable gas pressure it
Afterwards, then in the case where temperature is for 25 DEG C～100 DEG C top panel is heated, after treating temperature stabilization, starts plated film, keep thin film deposition speed
Rate is 0.1nm/s～5nm/s；After having plated silicon dioxide film, the crucible equipped with silica is closed；
5th, vacuum vapour deposition deposition anti-fingerprint film：The crucible equipped with anti-fingerprint coating materials is opened, oxygen and argon gas valve is then opened
Door, is passed through argon gas into vacuum cavity, and keeps the partial pressure of argon gas in vacuum cavity to be 0.1Pa～5Pa, treat stable gas pressure it
Afterwards, then in the case where temperature is for 25 DEG C～100 DEG C top panel is heated, after treating temperature stabilization, starts plated film, keep thin film deposition speed
Rate is 0.1nm/s～5nm/s；After having plated anti-fingerprint film, air is passed through, opens plating membrane cavity, take out top panel；
6th, the top panel for touch-screen cover, for user's point touch contact surface, optical cement gluing top panel and
Bottom SENSOR, the bottom SENSOR are used for wiring topology.
Instant invention overcomes existing touch screen technology does not have the deficiency of resistance to scraping, there is provided a kind of structure with resistance to scraping
And preparation method thereof.The structure has good permeability, does not affect the optical property of handset touch panel and resists with good
Scrape performance.It is of the invention mainly to adopt class diamond target (diamond-likecarbon), this material its carbon when film is deposited into
The SP3 hydridization degree of atom is more than 70%, therefore has anti-scratch performance with very high hardness.In this processing procedure, when DLC is more than
During 5nm, the anti-scratch row performance of touch-screen be 3 times of present touch screen technology and more than, with its resistance to scraping of the increase of DLC thickness
Can increase.
The preparation method preparation process of the anti-scratch anti-fingerprint touch-screen of the present invention is simple, can be made into anti-scratch touch of good performance
Screen, especially, has very high permeability and good resistance to scraping using DLC polycrystal films material obtained in vacuum magnetic-control sputtering method
Can, the film layer is less than 1% to substrate optical change penetrance knots modification, little less than the knots modification of 1%, a* values to L values knots modification
0.1 is less than in the variable of 0.05, b* values.Under the same conditions the hardened glass substrate in this patent plates this patent film layer knot
The later touch-screen of structure can scratch resistance 3000 times and more than, after wear-resisting 3000 times water droplet angle be more than 108 °.Existing product only plates anti-finger
The strengthens glass scratch resistance number of times about 1000 or so of line film, water droplet angle is more than 100 ° after wear-resisting 3000 times, and the method is greatly improved
The anti-scratch performance of touch screen, the cost for comparing mobile phone protection pad pasting this anti-scratch film is lower and need not change.And the anti-scratch anti-fingerprint film
Layer processing procedure is simple, can be used for industrial production.
As a result of above-mentioned technical proposal, a kind of anti-scratch anti-fingerprint touch-screen and preparation method thereof, successively including touch
The substrate of screen, is covered with the silicon dioxide film of vacuum splashing and plating on the baseplate material；The silicon dioxide film overlying of the vacuum splashing and plating
There is the class diamond film of vacuum splashing and plating；The silicon dioxide film of vacuum evaporation is covered with the class diamond film of the vacuum splashing and plating；It is described true
The anti-fingerprint film of vacuum evaporation is covered with the silicon dioxide film of sky evaporation, preparation process is simple, can be made into anti-scratch of good performance
Touch-screen, especially, has very high permeability and good anti-using DLC polycrystal films material obtained in vacuum magnetic-control sputtering method
Scrape performance.
Specific embodiment
Technical solution of the present invention is not limited to act specific embodiment set forth below, also including between each specific embodiment
Any combination.
Specific embodiment one：A kind of anti-scratch anti-fingerprint touch-screen of present embodiment includes top panel, optical cement and bottom
Portion SENSOR is constituted, and the top panel is the cover of touch-screen, for the contact surface that user's point is touched, the optics gluing
Junction top panel and bottom SENSOR, the bottom SENSOR is used for wiring topology；Vacuum splashing and plating is covered with the top panel
Silicon dioxide film, the class diamond film of vacuum splashing and plating is covered with the silicon dioxide film of the vacuum splashing and plating；The vacuum splashing and plating
The silicon dioxide film of vacuum evaporation is covered with class diamond film；The anti-of vacuum evaporation is covered with the silicon dioxide film of the vacuum evaporation
Fingerprint film.
Specific embodiment two：Present embodiment is PET faces from the top panel unlike specific embodiment one
Plate.Other are identical with specific embodiment one.
Specific embodiment three：Present embodiment and the bottom unlike specific embodiment one or one of two
SENSOR is the wire line plate of PET or GLASS base materials.Other are identical with specific embodiment one or one of two.
Specific embodiment four：The vacuum splashing and plating unlike one of present embodiment and specific embodiment one to three
Silica film thickness be 1-5 nm.Other are identical with one of specific embodiment one to three.
Specific embodiment five：The vacuum splashing and plating unlike one of present embodiment and specific embodiment one to four
Class diamond film thicknesses of layers be 1-15 nm.Other are identical with one of specific embodiment one to four.
Specific embodiment six：The vacuum evaporation unlike one of present embodiment and specific embodiment one to five
Anti-fingerprint film thickness it is little for 1-5 nm.Other are identical with one of specific embodiment one to five.
Specific embodiment seven：A kind of preparation method of anti-scratch anti-fingerprint touch-screen described in specific embodiment one, including
Following steps：
First, top panel is cleaned；
2nd, silicon dioxide film is deposited：Top panel is placed in vacuum sputtering cavity, the cavity is equipped with parallel to top panel
Silicon target, close plated film cavity, be evacuated down to vacuum for 10-3Below Pa, stops vacuumizing；Use ion beam bombardment top surface
Plate material 5～30 minutes, then opens oxygen and argon gas valve, and oxygen and argon gas are passed through into vacuum cavity, and keeps vacuum
Oxygen partial pressure is 0.5Pa～5Pa in cavity, and the partial pressure of argon gas is 0.1Pa～5Pa, after stable gas pressure, temperature be 25 DEG C～
Top panel is heated at 200 DEG C, after treating temperature stabilization, starts plated film, holding film deposition rate is 0.1nm/s～5nm/s；
After having plated silicon dioxide film, transfer top panel enters next plated film cavity；
3rd, class diamond film is deposited：The top panel processed through step 2 is entered into the vacuum cavity equipped with class diamond target, top
Portion's panel is placed in parallel with target, and argon gas is passed through into vacuum cavity, and keeps in vacuum cavity, and the partial pressure of argon gas is 0.1Pa
～5Pa, treats that air pressure rule are shown after stable gas pressure, then heats top panel in the case where temperature is for 25 DEG C～150 DEG C, treats temperature stabilization
Afterwards, plated film is initially powered up, argon gas ion forms plasma, and the positive electron in plasma bombards DLC in the presence of electric field force
Target, departs from carbon atom, and the carbon atom after disengaging can be attached on top panel material, forms DLC film, keeps film to sink
Product speed is 0.1nm/s～5nm/s；After having plated class diamond film, air is passed through, then takes out top panel；
4th, the silicon dioxide film of vacuum vapour deposition deposition：The top panel processed through step 3 is placed into into vacuum evaporation plating machine
Interior, the cavity has 6 crucibles, and respectively two crucibles thereto add silica coating materials and anti-fingerprint coating materials, opening to be equipped with
The crucible of silica, closes remaining crucible；Then oxygen and argon gas valve are opened, oxygen and argon is passed through into vacuum cavity
Gas, and keep in vacuum cavity oxygen partial pressure to be 0Pa～0.01Pa, the partial pressure of argon gas is 0.1Pa～5Pa, treat stable gas pressure it
Afterwards, then in the case where temperature is for 25 DEG C～100 DEG C top panel is heated, after treating temperature stabilization, starts plated film, keep thin film deposition speed
Rate is 0.1nm/s～5nm/s；After having plated silicon dioxide film, the crucible equipped with silica is closed；
5th, vacuum vapour deposition deposition anti-fingerprint film：The crucible equipped with anti-fingerprint coating materials is opened, oxygen and argon gas valve is then opened
Door, is passed through argon gas into vacuum cavity, and keeps the partial pressure of argon gas in vacuum cavity to be 0.1Pa～5Pa, treat stable gas pressure it
Afterwards, then in the case where temperature is for 25 DEG C～100 DEG C top panel is heated, after treating temperature stabilization, starts plated film, keep thin film deposition speed
Rate is 0.1nm/s～5nm/s；After having plated anti-fingerprint film, air is passed through, opens plating membrane cavity, take out top panel；
6th, the top panel for touch-screen cover, for user's point touch contact surface, optical cement gluing top panel and
Bottom SENSOR, the bottom SENSOR are used for wiring topology.
Specific embodiment eight：The titanium dioxide of present embodiment and the vacuum evaporation unlike specific embodiment seven
Silicon fiml material purity is 99.9%.Other are identical with specific embodiment seven.
Using following experimental verifications effect of the present invention：
Experiment one：A kind of preparation method of anti-scratch anti-fingerprint touch-screen, comprises the following steps：
First, top panel is cleaned；
2nd, silicon dioxide film is deposited：Top panel is placed in vacuum sputtering cavity, the cavity is equipped with parallel to top panel
Silicon target, close plated film cavity, be evacuated down to vacuum for 10-3Below Pa, stops vacuumizing；Use ion beam bombardment top surface
Plate material 5 minutes, then opens oxygen and argon gas valve, and oxygen and argon gas are passed through into vacuum cavity, and keeps vacuum cavity
Interior oxygen partial pressure is 0.5Pa, and the partial pressure of argon gas is 0.1Pa, after stable gas pressure, in the case where temperature is for 25 DEG C top panel is heated,
After treating temperature stabilization, start plated film, holding film deposition rate is 0.1nm/s；After having plated silicon dioxide film, top surface is shifted
Plate enters next plated film cavity；
3rd, class diamond film is deposited：The top panel processed through step 2 is entered into the vacuum cavity equipped with class diamond target, top
Portion's panel is placed in parallel with target, and argon gas is passed through into vacuum cavity, and keeps in vacuum cavity, and the partial pressure of argon gas is 0.1Pa,
Treat that air pressure rule are shown after stable gas pressure, then top panel is heated in the case where temperature is for 25 DEG C, after treating temperature stabilization, be initially powered up
Plated film, argon gas ion forms plasma, and the positive electron in plasma bombards DLC targets in the presence of electric field force, makes carbon atom
Depart from, the carbon atom after disengaging can be attached on top panel material, form DLC film, holding film deposition rate is
0.1nm/s；After having plated class diamond film, air is passed through, then takes out top panel；
4th, the silicon dioxide film of vacuum vapour deposition deposition：The top panel processed through step 3 is placed into into vacuum evaporation plating machine
Interior, the cavity has 6 crucibles, and respectively two crucibles thereto add silica coating materials and anti-fingerprint coating materials, opening to be equipped with
The crucible of silica, closes remaining crucible；Then oxygen and argon gas valve are opened, oxygen and argon is passed through into vacuum cavity
Gas, and keep oxygen partial pressure in vacuum cavity to be 0Pa, the partial pressure of argon gas is 0.1Pa, after treating stable gas pressure, then is in temperature
Top panel is heated at 25 DEG C, after treating temperature stabilization, starts plated film, holding film deposition rate is 0.1nm/s～5nm/s；
After having plated silicon dioxide film, the crucible equipped with silica is closed；
5th, vacuum vapour deposition deposition anti-fingerprint film：The crucible equipped with anti-fingerprint coating materials is opened, oxygen and argon gas valve is then opened
Door, is passed through argon gas into vacuum cavity, and keeps the partial pressure of argon gas in vacuum cavity to be 0.1Pa, after treating stable gas pressure, then
Temperature after treating temperature stabilization, starts plated film to heat top panel at 25 DEG C, and holding film deposition rate is 0.1nm/s；Plating
After complete anti-fingerprint film, air is passed through, opens plating membrane cavity, take out top panel；
6th, the top panel for touch-screen cover, for user's point touch contact surface, optical cement gluing top panel and
Bottom SENSOR, the bottom SENSOR are used for wiring topology.
Experiment two：A kind of preparation method of anti-scratch anti-fingerprint touch-screen, comprises the following steps：
First, top panel is cleaned；
2nd, silicon dioxide film is deposited：Top panel is placed in vacuum sputtering cavity, the cavity is equipped with parallel to top panel
Silicon target, close plated film cavity, be evacuated down to vacuum for 10-3Below Pa, stops vacuumizing；Use ion beam bombardment top surface
Plate material 30 minutes, then opens oxygen and argon gas valve, and oxygen and argon gas are passed through into vacuum cavity, and keeps vacuum cavity
Interior oxygen partial pressure is 5Pa, and the partial pressure of argon gas is 5Pa, after stable gas pressure, in the case where temperature is for 200 DEG C top panel is heated, and treats temperature
After degree is stable, start plated film, holding film deposition rate is 5nm/s；After having plated silicon dioxide film, transfer top panel is entered
Next plated film cavity；
3rd, class diamond film is deposited：The top panel processed through step 2 is entered into the vacuum cavity equipped with class diamond target, top
Portion's panel is placed in parallel with target, and argon gas is passed through into vacuum cavity, and keeps in vacuum cavity, and the partial pressure of argon gas is 5Pa, is treated
Air pressure rule are shown after stable gas pressure, then heat top panel in the case where temperature is for 150 DEG C, after treating temperature stabilization, are initially powered up
Plated film, argon gas ion forms plasma, and the positive electron in plasma bombards DLC targets in the presence of electric field force, makes carbon atom
Depart from, the carbon atom after disengaging can be attached on top panel material, form DLC film, holding film deposition rate is
0.1nm/s～5nm/s；After having plated class diamond film, air is passed through, then takes out top panel；
4th, the silicon dioxide film of vacuum vapour deposition deposition：The top panel processed through step 3 is placed into into vacuum evaporation plating machine
Interior, the cavity has 6 crucibles, and respectively two crucibles thereto add silica coating materials and anti-fingerprint coating materials, opening to be equipped with
The crucible of silica, closes remaining crucible；Then oxygen and argon gas valve are opened, oxygen and argon is passed through into vacuum cavity
Gas, and keep oxygen partial pressure in vacuum cavity to be 0.01Pa, the partial pressure of argon gas is 5Pa, after treating stable gas pressure, then is in temperature
Top panel is heated at 100 DEG C, after treating temperature stabilization, starts plated film, holding film deposition rate is 5nm/s；Dioxy is plated
After SiClx film, the crucible equipped with silica is closed；
5th, vacuum vapour deposition deposition anti-fingerprint film：The crucible equipped with anti-fingerprint coating materials is opened, oxygen and argon gas valve is then opened
Door, is passed through argon gas into vacuum cavity, and keeps the partial pressure of argon gas in vacuum cavity to be 5Pa, after treating stable gas pressure, then in temperature
Spend to heat top panel at 100 DEG C, after treating temperature stabilization, start plated film, holding film deposition rate is 5nm/s；Plate
After anti-fingerprint film, air is passed through, opens plating membrane cavity, take out top panel；
6th, the top panel for touch-screen cover, for user's point touch contact surface, optical cement gluing top panel and
Bottom SENSOR, the bottom SENSOR are used for wiring topology.
Claims (8)
1. a kind of anti-scratch anti-fingerprint touch-screen, it is characterised in that：Constitute including top panel, optical cement and bottom SENSOR, institute
The cover that top panel is touch-screen is stated, for the contact surface that user's point is touched, the optical cement gluing top panel and bottom
SENSOR, the bottom SENSOR are used for wiring topology；The silicon dioxide film of vacuum splashing and plating is covered with the top panel, it is described
The class diamond film of vacuum splashing and plating is covered with the silicon dioxide film of vacuum splashing and plating；Vacuum is covered with the class diamond film of the vacuum splashing and plating
The silicon dioxide film of evaporation；The anti-fingerprint film of vacuum evaporation is covered with the silicon dioxide film of the vacuum evaporation.
2. a kind of anti-scratch anti-fingerprint touch-screen according to claim 1, it is characterised in that：The top panel is PET panels.
3. a kind of anti-scratch anti-fingerprint touch-screen according to claim 1, it is characterised in that：The bottom SENSOR be PET or
The wire line plate of person's GLASS base materials.
4. a kind of anti-scratch anti-fingerprint touch-screen according to claim 1, it is characterised in that：The silica of the vacuum splashing and plating
Film thickness is 1-5 nm.
5. a kind of anti-scratch anti-fingerprint touch-screen according to claim 1, it is characterised in that：The class diamond film of the vacuum splashing and plating
Thicknesses of layers is 1-15 nm.
6. a kind of anti-scratch anti-fingerprint touch-screen according to claim 1, it is characterised in that：The anti-fingerprint film of the vacuum evaporation
Thickness is little for 1-5 nm.
7. a kind of preparation method of anti-scratch anti-fingerprint touch-screen described in claim 1, it is characterised in that：Comprise the following steps：
Cleaning top panel；
Deposition silicon dioxide film：Top panel is placed in vacuum sputtering cavity, the cavity is equipped with parallel to top panel
Silicon target, closes plated film cavity, is evacuated down to vacuum for 10-3Below Pa, stops vacuumizing；Use ion beam bombardment top panel
Material 5～30 minutes, then opens oxygen and argon gas valve, and oxygen and argon gas are passed through into vacuum cavity, and keeps vacuum chamber
In vivo oxygen partial pressure is 0.5Pa～5Pa, and the partial pressure of argon gas is 0.1Pa～5Pa, after stable gas pressure, temperature be 25 DEG C～
Top panel is heated at 200 DEG C, after treating temperature stabilization, starts plated film, holding film deposition rate is 0.1nm/s～5nm/s；
After having plated silicon dioxide film, transfer top panel enters next plated film cavity；
Deposition class diamond film：The top panel processed through step 2 is entered into the vacuum cavity equipped with class diamond target, top
Panel is placed in parallel with target, and argon gas is passed through into vacuum cavity, and keeps in vacuum cavity, the partial pressure of argon gas be 0.1Pa～
5Pa, treat air pressure rule show stable gas pressure after, then temperature be 25 DEG C～150 DEG C at heat top panel, treat temperature stabilization it
Afterwards, plated film is initially powered up, argon gas ion forms plasma, and the positive electron in plasma bombards DLC targets in the presence of electric field force
Material, departs from carbon atom, and the carbon atom after disengaging can be attached on top panel material, forms DLC film, keeps thin film deposition
Speed is 0.1nm/s～5nm/s；After having plated class diamond film, air is passed through, then takes out top panel；
The silicon dioxide film of vacuum vapour deposition deposition：The top panel processed through step 3 is placed in vacuum evaporation plating machine,
The cavity has 6 crucibles, and respectively two crucibles thereto add silica coating materials and anti-fingerprint coating materials, open and dioxy is housed
The crucible of SiClx, closes remaining crucible；Then oxygen and argon gas valve are opened, oxygen and argon gas is passed through into vacuum cavity, and
Oxygen partial pressure in vacuum cavity is kept to be 0Pa～0.01Pa, the partial pressure of argon gas is 0.1Pa～5Pa, after treating stable gas pressure, then
Top panel is heated in the case where temperature is for 25 DEG C～100 DEG C, after treating temperature stabilization, starts plated film, holding film deposition rate is
0.1nm/s～5nm/s；After having plated silicon dioxide film, the crucible equipped with silica is closed；
Vacuum vapour deposition deposits anti-fingerprint film：The crucible equipped with anti-fingerprint coating materials is opened, oxygen and argon gas valve is then opened, to
It is passed through argon gas in vacuum cavity, and keeps the partial pressure of argon gas in vacuum cavity to be 0.1Pa～5Pa, after treating stable gas pressure, then
Temperature after treating temperature stabilization, starts plated film to heat top panel at 25 DEG C～100 DEG C, and holding film deposition rate is
0.1nm/s～5nm/s；After having plated anti-fingerprint film, air is passed through, opens plating membrane cavity, take out top panel；
The top panel is the cover of touch-screen, for the contact surface that user's point is touched, optical cement gluing top panel and bottom
Portion SENSOR, the bottom SENSOR are used for wiring topology.
8. a kind of preparation method of anti-scratch anti-fingerprint touch-screen according to claim 7, it is characterised in that：The vacuum evaporation
Silica coating materials purity be 99.9%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611268298.XA CN106648273A (en) | 2016-12-31 | 2016-12-31 | Touch screen resistant to scratch and fingerprints and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611268298.XA CN106648273A (en) | 2016-12-31 | 2016-12-31 | Touch screen resistant to scratch and fingerprints and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106648273A true CN106648273A (en) | 2017-05-10 |
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ID=58838543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611268298.XA Pending CN106648273A (en) | 2016-12-31 | 2016-12-31 | Touch screen resistant to scratch and fingerprints and manufacturing method thereof |
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| Country | Link |
|---|---|
| CN (1) | CN106648273A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050007336A1 (en) * | 1997-08-28 | 2005-01-13 | E Ink Corporation | Adhesive backed displays |
| CN203102213U (en) * | 2012-12-21 | 2013-07-31 | 苏州市健邦触摸屏技术有限公司 | Modified capacitive touch screen |
| CN103309524A (en) * | 2012-03-13 | 2013-09-18 | 苏州市健邦触摸屏技术有限公司 | Capacitive multi-touch screen |
| CN105204685A (en) * | 2015-09-22 | 2015-12-30 | 何颜玲 | Scratch-resisfant fingerprint resistance touch screen and preparation method |
-
2016
- 2016-12-31 CN CN201611268298.XA patent/CN106648273A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050007336A1 (en) * | 1997-08-28 | 2005-01-13 | E Ink Corporation | Adhesive backed displays |
| CN103309524A (en) * | 2012-03-13 | 2013-09-18 | 苏州市健邦触摸屏技术有限公司 | Capacitive multi-touch screen |
| CN203102213U (en) * | 2012-12-21 | 2013-07-31 | 苏州市健邦触摸屏技术有限公司 | Modified capacitive touch screen |
| CN105204685A (en) * | 2015-09-22 | 2015-12-30 | 何颜玲 | Scratch-resisfant fingerprint resistance touch screen and preparation method |
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