CN106637094A - Method for lowering oxygen contents of arc ion plated titanium nitride coating and aluminum coating - Google Patents
Method for lowering oxygen contents of arc ion plated titanium nitride coating and aluminum coating Download PDFInfo
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- CN106637094A CN106637094A CN201611072639.6A CN201611072639A CN106637094A CN 106637094 A CN106637094 A CN 106637094A CN 201611072639 A CN201611072639 A CN 201611072639A CN 106637094 A CN106637094 A CN 106637094A
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- CN
- China
- Prior art keywords
- coating
- arc ion
- titanium nitride
- oxygen content
- oxygen contents
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0617—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
Abstract
The invention discloses a method for lowering the oxygen contents of an arc ion plated titanium nitride coating and an aluminum coating. The method comprises the steps that in the arc ion plating processes of the titanium nitride coating and the aluminum coating, hydrogen with the purity being 99.99% is continuously introduced into a vacuum chamber, and the flow of the hydrogen is 0.05-0.5 mL/min. The oxygen contents of the arc ion plated titanium nitride coating and the aluminum coating can be reduced by 30-80 wt.%, so that the oxygen contents of the coatings are remarkably lowered, the toughness of the coatings is improved, the binding performance of the coatings with substrates is improved, and the method is simple and can be widely used.
Description
Technical field
The present invention relates to a kind of method for reducing oxygen content in arc ion plating titanium nitride coating and aluminized coating.
Background technology
Arc ion plating (aip) is a kind of wide variety of surface protection coating technology, fast with sedimentation rate, film layer with
The outstanding advantages such as matrix excellent bonding performance, the compactness height of coating, can prepare various coatings, as with good wear performance
High rigidity titanium nitride coating, titanium aluminum nitride coating, the aluminized coating with good corrosion resistance, chrome coating, with good high temperature resistance
Metal composite coating of oxidation etc., is industrially widely used.
The principle of arc ion plating is that in vacuum environment, target is negative electrode, is caused between the anode formed with vacuum chamber
Arc discharge, arc discharge is evaporated target material and deposits to the technology of matrix surface.During arc ion plating, need logical
Enter working gas, arc discharge can be made more uniform, continuous, the general working gas for adding is argon gas, is preparing titanium nitride
In Deng nitride coatings, in addition it is also necessary to be passed through nitrogen as reacting gas.The pressure in vacuum tank of electric arc ion-plating deposition coating compares
Low, generally between 0.1Pa-2.0Pa, in such vacuum environment, the gas such as oxygen adsorbed in vacuum chamber interior walls can be held
It is continuous constantly to discharge, and participate in the course of reaction of depositing coating so that oxygen content significantly increases in prepared coating
Plus, making the fragility of coating increases, and declines with the binding ability of matrix, affects the quality of coating.
The content of the invention
Object of the present invention is to provide a kind of reduce oxygen content in arc ion plating titanium nitride coating and aluminized coating
Method, it has and significantly reduces oxygen content in coating, the advantages of improve the toughness and binding ability with matrix of coating.
The present invention is achieved like this, a kind of side for reducing oxygen content in arc ion plating titanium nitride coating and aluminized coating
Method, it is characterised in that method and step is as follows:
During arc ion plating titanium nitride coating, using gas mass flow gauge, to vacuum chamber argon gas and nitrogen are passed through
While, the hydrogen that purity is 99.99% is passed through, the flow of hydrogen is 0.05-0.5mL/min;
Other technological parameters of electric arc ion-plating deposition titanium nitride coating are argon flow amount scope:50-200mL/min, nitrogen stream
Amount scope 100-300mL/min, arc current 100A, substrate bias -200V, sedimentation time 120min.
During arc ion plating aluminized coating, using gas mass flow gauge, while being passed through argon gas to vacuum chamber,
The hydrogen that purity is 99.99% is passed through, the flow of hydrogen is 0.05-0.5mL/min;
Other technological parameters of electric arc ion-plating deposition aluminized coating are argon flow amount scope:50-200mL/min, arc current
100A, substrate bias -200V, sedimentation time 120min.
The solution have the advantages that:The present invention during arc ion plating titanium nitride coating and aluminized coating, to vacuum
It is 99.99% hydrogen that interior is continuously passed through purity, and the flow of hydrogen is 0.05-0.5mL/min, can make arc ions titanium-nitride
Oxygen content in coating and aluminized coating reduces 30-80wt.%, significantly reduces the oxygen content in coating, improve coating toughness and with
The binding ability of matrix, the method is simple, can extensively apply.
Description of the drawings
Fig. 1 arc ion platings titanium nitride coating does not lead to energy spectrum diagram during hydrogen.
Power spectrum when Fig. 2 arc ion plating titanium nitride coatings hydrogen flowing quantity is 0.5mL/min.
Specific embodiment
The present invention is elaborated with reference to embodiment and accompanying drawing:
Embodiment 1, on 45# steel tool arc ion plating titanium nitride coating is prepared, specific technological parameter is as follows:Argon flow amount:
200mL/min, nitrogen flow 300mL/min, arc current 100A, substrate bias -200V, sedimentation time 120min.Power spectrum point
Analysis shows that the coating oxygen content is 15.6wt.%, as shown in Figure 1.
Embodiment 2, on 45# steel tool arc ion plating titanium nitride coating is prepared, specific technological parameter is as follows:Argon gas stream
Amount 200mL/min, nitrogen flow 300mL/min, hydrogen flowing quantity 0.5mL/L, arc current 100A, substrate bias -200V, deposition
Time 120min.Energy spectrum analysis shows that the coating oxygen content is 3.1wt.%, and oxygen content reduces 80wt.%, as shown in Figure 2.
Embodiment 3, on 45# steel tool arc ion plating titanium nitride coating is prepared, specific technological parameter is as follows:Argon gas stream
Amount 200mL/min, nitrogen flow 300mL/min, hydrogen flowing quantity 0.05mL/L, arc current 100A, substrate bias -200V, sink
Product time 120min.Energy spectrum analysis shows that the coating oxygen content is 10.9wt.%, and oxygen content reduces 30wt.%.
Embodiment 4, on 45# steel tool arc ion plating titanium nitride coating is prepared, specific technological parameter is as follows:Argon gas stream
Amount 50mL/min, nitrogen flow 100mL/min, hydrogen flowing quantity 0.3mL/L, arc current 100A, substrate bias -200V, deposition
Time 120min.Energy spectrum analysis shows that the coating oxygen content is 7.1wt.%, and oxygen content reduces 55wt.%.
Embodiment 5, on 45# steel tool arc ion plating aluminized coating is prepared, specific technological parameter is as follows:Argon flow amount:
200mL/min, arc current 100A, substrate bias -200V, sedimentation time 120min.Energy spectrum analysis shows, the coating oxygen content
For 12.9wt.%.
Embodiment 6, on 45# steel tool arc ion plating aluminized coating is prepared, specific technological parameter is as follows:Argon flow amount
200mL/min, nitrogen flow 300mL/min, hydrogen flowing quantity 0.5mL/L, arc current 100A, substrate bias -200V, during deposition
Between 120min.Energy spectrum analysis shows that the coating oxygen content is 2.5wt.%, and oxygen content reduces 81wt.%.
Embodiment 7, on 45# steel tool arc ion plating aluminized coating is prepared, specific technological parameter is as follows:Argon flow amount
200mL/min, hydrogen flowing quantity 0.05mL/L, arc current 100A, substrate bias -200V, sedimentation time 120min.Energy spectrum analysis
Show, the coating oxygen content is 9.1wt.%, oxygen content reduces 30wt.%.
Embodiment 8, on 45# steel tool arc ion plating aluminized coating is prepared, specific technological parameter is as follows:Argon flow amount
50mL/min, hydrogen flowing quantity 0.1mL/L, arc current 100A, substrate bias -200V, sedimentation time 120min.Energy spectrum analysis table
Bright, the coating oxygen content is 5.16wt.%, and oxygen content reduces 60wt.%.
Claims (1)
1. a kind of method for reducing oxygen content in arc ion plating titanium nitride coating and aluminized coating, it is characterised in that methods described is
In the middle of arc ion plating titanium nitride coating or aluminized coating process, purity is continuously passed through into vacuum room for 99.99% hydrogen, hydrogen
The flow of gas is 0.05-0.5mL/min, and the oxygen content in coating can be made to reduce 30-80wt.%.
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Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1623008A (en) * | 2002-02-27 | 2005-06-01 | 亨利J·拉莫斯 | Method for formation of titanium nitride film |
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2016
- 2016-11-29 CN CN201611072639.6A patent/CN106637094A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1623008A (en) * | 2002-02-27 | 2005-06-01 | 亨利J·拉莫斯 | Method for formation of titanium nitride film |
Non-Patent Citations (1)
Title |
---|
林行方等: "离子镀氮化钛薄膜刀具的镀膜工艺与镀膜刀具的实际应用", 《固体润滑》 * |
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Application publication date: 20170510 |