CN106619211A - After-sun repair mask - Google Patents
After-sun repair mask Download PDFInfo
- Publication number
- CN106619211A CN106619211A CN201510734879.7A CN201510734879A CN106619211A CN 106619211 A CN106619211 A CN 106619211A CN 201510734879 A CN201510734879 A CN 201510734879A CN 106619211 A CN106619211 A CN 106619211A
- Authority
- CN
- China
- Prior art keywords
- parts
- essential oil
- skin
- hyaluronic acid
- phenoxyethanol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/96—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
- A61K8/97—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
- A61Q19/004—Aftersun preparations
Abstract
The present invention provides an after-sun repair mask, which is prepared from the following raw materials: a chamomilia essential oil, a ginger essential oil, a pelargonium hortorum essential oil, an amino acid moisturizer, hyaluronic acid, hyaluronic acid, xanthan gum, phenoxyethanol, lanolin, and deionized water according to a certain ratio. The after-sun repair mask of the present invention has effect of skin cooling, skin calming, skin relieving, weak skin conditioning, and effective after-sun skin repair.
Description
Technical field
The present invention relates to a kind of facial film, more particularly to a kind of Post-basking repairing mask, belong to article of everyday use technical field.
Background technology
Summer is the moment that many Mies represent beauty, but red-hot sunlight can but be easy to sun-damaged skin.And facial film is a kind of cosmetics and skincare product applied on the face, it integrates cleaning, nursing, three kinds of functions of nutrition skin of face.Facial film is because its nutritional labeling height, skin protection efficiency high, it has also become an of paramount importance part in skin protection, such as facial film can repair the skin after shining, inevitable effect is more preferable.
The content of the invention
The purpose of the present invention is in view of the shortcomings of the prior art, there is provided a kind of Post-basking repairing mask.
For achieving the above object, the technical solution used in the present invention is：
A kind of Post-basking repairing mask, including following mass fraction raw material：Chamomile essential oil 8-9 part, ginger essential oil 2-3 parts, Geranium Essential 1-2 parts, amino acid humectant 3-5 parts, hyaluronic acid 1-2 parts, hyaluronic acid 2-4 parts, HANSHENGJIAO 4-6 part, phenoxyethanol 1-2 parts, lanoline 5-6 parts, deionized water 30-40 parts.
Described Post-basking repairing mask, including following mass fraction raw material：8 parts of chamomile essential oil, 2 parts of ginger essential oil, 1 part of Geranium Essential, 3 parts of amino acid humectant, 1 part of hyaluronic acid, 2 parts of hyaluronic acid, 4 parts of HANSHENGJIAO, 1 part of phenoxyethanol, 5 parts of lanoline, 30 parts of deionized water.
Described Post-basking repairing mask, including following mass fraction raw material：8.5 parts of chamomile essential oil, 2.5 parts of ginger essential oil, 1.5 parts of Geranium Essential, 4 parts of amino acid humectant, 1.5 parts of hyaluronic acid, 3 parts of hyaluronic acid, 5 parts of HANSHENGJIAO, 1.5 parts of phenoxyethanol, 5.5 parts of lanoline, 35 parts of deionized water.
Beneficial effects of the present invention：
Chamomile essential oil contained by the present invention can effectively repair skin after solarization, and the fragile skin of conditioning, skin of releiving stimulates, recover elasticity of skin, contained ginger essential oil can help skin to recover nature, the beautiful colour of skin, help skin preferably to absorb nutrient substance, increase elasticity of skin, make the colour of skin ruddy, smooth.
Specific embodiment
With reference to embodiments of the invention, further elucidate the present invention, it should be understood that these embodiments are only illustrative of the invention and is not intended to limit the scope of the invention, after the present invention has been read, modification of the those skilled in the art to the various equivalent form of values of the present invention falls within the application claims limited range.
A kind of Post-basking repairing mask, including following mass fraction raw material：Chamomile essential oil 8-9 part, ginger essential oil 2-3 parts, Geranium Essential 1-2 parts, amino acid humectant 3-5 parts, hyaluronic acid 1-2 parts, hyaluronic acid 2-4 parts, HANSHENGJIAO 4-6 part, phenoxyethanol 1-2 parts, lanoline 5-6 parts, deionized water 30-40 parts.
Embodiment one：
A kind of Post-basking repairing mask, including following mass fraction raw material：
8 parts of chamomile essential oil, 2 parts of ginger essential oil, 1 part of Geranium Essential, 3 parts of amino acid humectant, 1 part of hyaluronic acid, 2 parts of hyaluronic acid, 4 parts of HANSHENGJIAO, 1 part of phenoxyethanol, 5 parts of lanoline, 30 parts of deionized water.
Embodiment two：
A kind of Post-basking repairing mask, including following mass fraction raw material：
8.5 parts of chamomile essential oil, 2.5 parts of ginger essential oil, 1.5 parts of Geranium Essential, 4 parts of amino acid humectant, 1.5 parts of hyaluronic acid, 3 parts of hyaluronic acid, 5 parts of HANSHENGJIAO, 1.5 parts of phenoxyethanol, 5.5 parts of lanoline, 35 parts of deionized water.
Claims (3)
1. a kind of Post-basking repairing mask, it is characterised in that including following mass fraction raw material：Chamomile essential oil 8-9 part, ginger essential oil 2-3 parts, Geranium Essential 1-2 parts, amino acid humectant 3-5 parts, hyaluronic acid 1-2 parts, hyaluronic acid 2-4 parts, HANSHENGJIAO 4-6 part, phenoxyethanol 1-2 parts, lanoline 5-6 parts, deionized water 30-40 parts.
2. Post-basking repairing mask according to claim 1, it is characterised in that including following mass fraction raw material：8 parts of chamomile essential oil, 2 parts of ginger essential oil, 1 part of Geranium Essential, 3 parts of amino acid humectant, 1 part of hyaluronic acid, 2 parts of hyaluronic acid, 4 parts of HANSHENGJIAO, 1 part of phenoxyethanol, 5 parts of lanoline, 30 parts of deionized water.
3. Post-basking repairing mask according to claim 1, it is characterised in that including following mass fraction raw material：8.5 parts of chamomile essential oil, 2.5 parts of ginger essential oil, 1.5 parts of Geranium Essential, 4 parts of amino acid humectant, 1.5 parts of hyaluronic acid, 3 parts of hyaluronic acid, 5 parts of HANSHENGJIAO, 1.5 parts of phenoxyethanol, 5.5 parts of lanoline, 35 parts of deionized water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510734879.7A CN106619211A (en) | 2015-11-03 | 2015-11-03 | After-sun repair mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510734879.7A CN106619211A (en) | 2015-11-03 | 2015-11-03 | After-sun repair mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106619211A true CN106619211A (en) | 2017-05-10 |
Family
ID=58810944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510734879.7A Pending CN106619211A (en) | 2015-11-03 | 2015-11-03 | After-sun repair mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106619211A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110585038A (en) * | 2019-09-18 | 2019-12-20 | 郑州轻工业学院 | Paeonia lactiflora moisturizing and repairing mask |
| CN110669588A (en) * | 2019-11-06 | 2020-01-10 | 山东花物堂生物科技有限公司 | Distillation method for extracting ginger essential oil and application of distillation method in cosmetics |
-
2015
- 2015-11-03 CN CN201510734879.7A patent/CN106619211A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110585038A (en) * | 2019-09-18 | 2019-12-20 | 郑州轻工业学院 | Paeonia lactiflora moisturizing and repairing mask |
| CN110669588A (en) * | 2019-11-06 | 2020-01-10 | 山东花物堂生物科技有限公司 | Distillation method for extracting ginger essential oil and application of distillation method in cosmetics |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20170510 |
|
| WD01 | Invention patent application deemed withdrawn after publication |