CN106609358B - A kind of chemical vapor deposition unit and its clean method - Google Patents
A kind of chemical vapor deposition unit and its clean method Download PDFInfo
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- CN106609358B CN106609358B CN201510704688.6A CN201510704688A CN106609358B CN 106609358 B CN106609358 B CN 106609358B CN 201510704688 A CN201510704688 A CN 201510704688A CN 106609358 B CN106609358 B CN 106609358B
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Abstract
The invention discloses a kind of chemical vapor deposition unit and its clean methods, by the way that multiple cleaning members are arranged in gas extraction component, so that multiple pumping hole sites of multiple cleaning members and gas extraction component respectively correspond；And each cleaning member is connect with restrictor ring.It is able to drive multiple cleaning members movements when restrictor ring moves up and down, so that the scraping blade in cleaning member be driven to rotate to remove the sediment being deposited on aspirating hole, and brings sediment into gas extraction feature bottom, keeps the cleaning of aspirating hole unobstructed.The present invention improves the working efficiency of chemical vapor deposition unit, extends the disassembly clearance time of each chemical vapor deposition unit, reduces the use cost of chemical vapor deposition unit.
Description
Technical field
The present invention relates to field of semiconductor processing, and in particular to a kind of chemical vapor deposition unit and its clean method.
Background technique
Industrial widely used chemical vapor depsotition equipment at present, silicon wafer carrier and silicon wafer carrier with big rotating arm
The heating element of lower section, participate in reaction gas flow through wafer because lower section heating and reactive deposition, residual gas is by exhaust
The discharge of device autoreaction chamber.Exhaust apparatus has the gas stream of control reaction chamber and gas pressure needed for stable react, it is necessary to the greatest extent
Possible to keep the unobstructed of exhaust outlet, the condition being just able to maintain in reaction chamber is uniform and then maintains the consistency of wafer process.Institute
With can regular maintenance exhaust outlet clean and remove the parasitic reaction object of deposition, and then reduce the time of disassembly cleaning reaction chamber
With number, be chemical vapor deposition (Chemical Vapor Deposition, abbreviation CVD) in the industry everybody have been working hard
Optimization direction.
Summary of the invention
The purpose of the present invention is to provide a kind of chemical vapor deposition unit and its clean methods, by gas extraction portion
The multiple cleaning members of setting in part, so that multiple pumping hole sites of multiple cleaning members and gas extraction component respectively correspond；
And each cleaning member is connect with restrictor ring.It is mobile that multiple cleaning members are able to drive when restrictor ring moves up and down, from
And the scraping blade in cleaning member is driven to rotate to remove the sediment being deposited on aspirating hole, and bring sediment into gas and take out
Feature bottom is taken, keeps the cleaning of aspirating hole unobstructed.The present invention improves the working efficiency of chemical vapor deposition unit, extends
The disassembly clearance time of each chemical vapor deposition unit, reduces the use cost of chemical vapor deposition unit.
In order to achieve the above object, the invention is realized by the following technical scheme:
A kind of chemical vapor deposition unit, which includes:
Reaction chamber；
Air inlet component, be arranged at the top of the reaction chamber, and with communicated inside the reaction chamber；
Bottom is arranged in the reaction chamber in rotary shaft；
Pallet, setting are oppositely arranged at the top of the rotary shaft, and with the air inlet component；
Heating element is circumferentially positioned at the rotary shaft, pallet lower section；
Restrictor ring is arranged on the pallet periphery；
Gas extraction component is arranged in the reaction chamber bottom, and is circumferentially positioned at the heating device periphery；It is described
Gas extraction component is communicated with outside, and the gas extraction ring top cover is equipped with multiple aspirating holes；
Multiple cleaning members, each cleaning member includes: a gear unit and scraping blade；The gear unit also wraps
Containing the first rotary shaft, the second rotary shaft, the scraping blade is arranged in first rotary shaft, second rotary shaft；
The gear unit further includes crankshaft structure, and the crankshaft structure includes a pair of of rotating arm, a first connecting rod；
The cleaning member further includes and the interlocking lever that extends downwardly on the restrictor ring, the first connecting rod and the company
Lever is connected, and the first connecting rod rotates axis connection with first rotary shaft, second respectively by a pair of rotating arm；
The position of the scraping blade is corresponding with the corresponding pumping hole site, when the restrictor ring moves up and down, the gearing
Bar drives the scraping blade on the gear unit to rotate along rotary shaft, the inswept aspirating hole of scraping blade.
The gas extraction component includes:
Bottom is arranged in the reaction chamber in a ring in gas extraction ring, and is circumferentially positioned at the heating device week
Side；
Gas extraction ring top cover is correspondingly arranged at the top of the gas extraction ring in a ring.
Gas extraction ring section is in U-shape；The a pair that the gas extraction is equipped with summarizes hole, and the pair of to summarize hole symmetrical
It is arranged in the gas extraction ring bottom；
The gas extraction component is communicated outside Kong Yu by this to summarizing.
In the transmission bar unit:
One end of first rotary shaft is connect with an inner sidewall of the gas extraction ring, first rotary shaft it is another
End is connect with the crankshaft structure；The scraping blade is arranged in first rotary shaft；
One end of second rotary shaft is connect with another inner sidewall of the gas extraction ring, second rotary shaft it is another
One end is connect with the crankshaft structure；
First rotary shaft is in a straight line with second rotary shaft.
In the crankshaft structure:
One end of first rotary shaft is connect with an inner sidewall of the reaction chamber, the other end of first rotary shaft with
The crankshaft structure connection；The scraping blade is arranged in first rotary shaft；
One end of second rotary shaft is connect with the ipsilateral inner sidewall of the reaction chamber, the other end of second rotary shaft with
The crankshaft structure connection；
First rotary shaft is in a straight line with second rotary shaft.
In the crankshaft structure:
A pair of symmetrically arranged rotating arm, the lateral wall bottom of a rotating arm and the first rotation axis connection；
Second rotation axis connection described in the lateral wall bottom of another rotating arm；
First connecting rod, setting at the top of the pair of rotating arm between.
The interlocking lever includes:
Interlock ring is nested on the first connecting rod；
Second connecting rod, one end of the second connecting rod are connect with the interlock ring, the other end of the second connecting rod with it is described
Restrictor ring connection.
The diameter of the rotating arm is greater than the length of the second connecting rod.
The initial position and vertical guide of the second connecting rod are in an acute angle.
A kind of cleaning member for chemical vapor deposition unit, the chemical vapor deposition unit includes: reaction chamber, if
In the top air inlet component of reaction chamber, rotary shaft, pallet inside reaction chamber, heating element, restrictor ring, and it is set to anti-
Answer the gas extraction component of intracavitary bottom；
The cleaning member is set in the reaction chamber, and connect with restrictor ring；The cleaning member includes:
One gear unit and scraping blade；The gear unit also includes the first rotary shaft, the second rotary shaft, and the scraping blade is set
It sets in first rotary shaft, second rotary shaft；
The gear unit further includes crankshaft structure, and the crankshaft structure includes a pair of of rotating arm, a first connecting rod；
The cleaning member further includes and the interlocking lever that extends downwardly on the restrictor ring, the first connecting rod and the company
Lever is connected, and the first connecting rod rotates axis connection with first rotary shaft, second respectively by a pair of rotating arm；
The position of the scraping blade is corresponding with the corresponding pumping hole site, when the restrictor ring moves up and down, the gearing
Bar drives the scraping blade on the gear unit to rotate along rotary shaft, the inswept aspirating hole of scraping blade.
The gas extraction component includes:
Bottom is arranged in the reaction chamber in a ring in gas extraction ring, and is circumferentially positioned at the heating device week
Side；
Gas extraction ring top cover is correspondingly arranged at the top of the gas extraction ring, the gas extraction ring top cover in a ring
Equipped with aspirating hole.
Gas extraction ring section is in U-shape；The a pair that the gas extraction is equipped with summarizes hole, and the pair of to summarize hole symmetrical
It is arranged in the gas extraction ring bottom；
The gas extraction component is communicated outside Kong Yu by this to summarizing.
In the transmission bar unit:
First rotary shaft, one end of first rotary shaft are connect with an inner sidewall of the gas extraction ring, this first
The other end of rotary shaft is connect with the crankshaft structure；The scraping blade is arranged in first rotary shaft；
Second rotary shaft, one end of second rotary shaft are connect with another inner sidewall of the gas extraction ring, this
The other end of two rotary shafts is connect with the crankshaft structure；
First rotary shaft is in a straight line with second rotary shaft.
In the crankshaft structure:
One end of first rotary shaft is connect with an inner sidewall of the reaction chamber, the other end of first rotary shaft with
The crankshaft structure connection；The scraping blade is arranged in first rotary shaft；
One end of second rotary shaft is connect with the ipsilateral inner sidewall of the reaction chamber, the other end of second rotary shaft with
The crankshaft structure connection；
First rotary shaft is in a straight line with second rotary shaft.
In the crankshaft structure:
The lateral wall bottom of one rotating arm and the first rotation axis connection；The outside of another rotating arm
Second rotation axis connection described in wall bottom；
First connecting rod, setting at the top of the pair of rotating arm between.
The interlocking lever includes:
Interlock ring is arranged on the first connecting rod；
Second connecting rod, one end of the second connecting rod are connect with the interlock ring, the other end of the second connecting rod with it is described
Restrictor ring connection.
The diameter of the rotating arm is greater than the length of the second connecting rod.
The initial position and vertical guide of the second connecting rod are in an acute angle.
A kind of clean method of chemical vapor deposition unit, this method comprise the following steps:
Multiple cleaning members are set in the gas extraction component, or multiple cleanings are set in reaction chamber
Component；
When the restrictor ring is mobile, multiple cleaning member rotations are driven；
Each cleaning member is in contact with the corresponding aspirating hole, to clean the aspirating hole.
According to the quantity of aspirating hole in the gas extraction component, the quantity of the cleaning member is set；
The scraping blade position of each cleaning member is corresponded with the corresponding pumping hole site；
All cleaning members are set in the gas extraction ring or are set in the reaction chamber；Ensure simultaneously just
It is in an acute angle between the initial position and vertical guide of the second connecting rod when beginning state.
When the restrictor ring moves up and down, all interlocking levers is driven to move up and down；
Each interlocking lever drives crankshaft structure rotation connected to it, so that scraping blade be driven to rotate.
When each scraping blade rotates in the gas extraction component, the scraping blade and the corresponding aspirating hole are abundant
The sediment being deposited on the aspirating hole is removed, and brings sediment into the gas extraction ring that section is in U-shape by contact
It is interior, realize the cleaning of all aspirating holes.
Compared with the prior art, the present invention has the following advantages:
A kind of chemical vapor deposition unit and its clean method disclosed by the invention, by being arranged in gas extraction component
Multiple cleaning members, so that multiple pumping hole sites of multiple cleaning members and gas extraction component respectively correspond；And it will be every
A cleaning member is connect with restrictor ring.It is mobile that multiple cleaning members are able to drive when restrictor ring moves up and down, to drive clear
Scraping blade rotation in clean component brings sediment into gas extraction component bottom to remove the sediment being deposited on aspirating hole
Portion keeps the cleaning of aspirating hole unobstructed.The disassembly clearance time for extending each chemical vapor deposition unit, reduces chemical gas
The use cost of phase precipitation equipment.
Detailed description of the invention
Fig. 1 is a kind of overall structure diagram of chemical vapor deposition unit of the present invention.
Fig. 2 is a kind of one of partial structural diagram of chemical vapor deposition unit of the present invention.
Fig. 3 is the two of a kind of partial structural diagram of chemical vapor deposition unit of the present invention.
Fig. 4 is the three of a kind of partial structural diagram of chemical vapor deposition unit of the present invention.
Fig. 5 is a kind of overall flow figure of chemical vapor deposition unit clean method of the present invention.
Specific embodiment
The present invention is further elaborated by the way that a preferable specific embodiment is described in detail below in conjunction with attached drawing.
Embodiment 1
As shown in Figure 1-Figure 3, a kind of chemical vapor deposition unit, which includes: reaction chamber 1, air inlet component 2, rotation
Axis 3, pallet 5, heating element 4, restrictor ring 6, gas extraction component 7 and multiple cleaning members 8.
Wherein, the setting of air inlet component 2 is at the top of reaction chamber 1, and with communicated inside the reaction chamber 1.Rotary shaft 3 is arranged anti-
Answer bottom in chamber 1.The setting of pallet 5 is oppositely arranged at 3 top of rotary shaft with air inlet component 2.Heating element 4 is circumferentially positioned at
Rotary shaft 3,5 periphery of pallet.Restrictor ring 6 is arranged in pallet 5,4 periphery of heating device.Gas extraction component 7 is arranged in reaction chamber 1
Interior bottom, and it is circumferentially positioned at 4 periphery of heating device；Gas extraction component 7 is communicated with outside.Multiple cleaning members 8 respectively with
Restrictor ring 6 connects.
As shown in Figure 1, heating device 4 includes: heater 41, heater insulation screen 42.Wherein, the setting of heater 41 is being held in the palm
5 bottom of disk, heater insulation screen 42 are circumferentially positioned at 3 periphery of pallet 5 and rotary shaft.
In chemical vapor deposition unit in use, process gas is entered in reaction chamber 1 by air inlet component 2, and it is placed in
The wafer that the pallet 5 of 3 rotary-top of rotary shaft carries chemically reacts.At this point, pallet 5 is heated by heater 41.
Process gas is vital in being uniformly distributed to MOCVD technique for 5 surface of pallet.In order to ensure this key
Technique requirement, other than the effect of air inlet component 2, the effect of gas extraction component 7 is also very big.Gas extraction component 7
The gas flowed down by pallet 5 can be uniformly extracted, if the air-flow of gas extraction component 7 extracts unevenly, will have a direct impact on
Air flow method on pallet 5, and then influence process results.
Thereby it is ensured that the uniformity of the extraction air-flow of gas extraction component 7, become the invention solves one important ask
Topic.
As shown in Fig. 2, gas extraction component 7 includes: gas extraction ring 71, gas extraction ring top cover 72.Gas extraction ring
71 in a ring, bottom is arranged in reaction chamber 1, and be circumferentially positioned at 4 periphery of heating device.Gas extraction ring top cover 72 is in ring
Shape is correspondingly arranged at 71 top of gas extraction ring.
In the present invention, gas extraction ring top cover 72 is equipped with multiple aspirating holes 721；The number of multiple aspirating holes 721 with it is multiple
The number of cleaning member 8 is identical.71 section of gas extraction ring is in U-shape；The gas extraction ring 71 is equipped with a pair and summarizes hole 711, and one
71 bottom of gas extraction ring is symmetricly set on to hole 711 is summarized；Gas extraction component 7 is by this to summarizing hole 711 in outside
It communicates.
In the present invention, multiple aspirating holes 721 are for being uniformly distributed the gas flow down by pallet 5；By gas extraction ring top
The a pair that the gas that multiple aspirating holes 721 of lid 72 flow into flows in gas extraction ring 71 summarizes hole 711, and gas is via summarizing
Mouth outflow.
In Metallo-Organic Chemical Vapor deposition (or " MOCVD ") technique, a large amount of graininess or sheet by-product can be generated
Object.These by-products generate in the air-flow on pallet 5, and air-flow is followed to fall in the gas extraction ring top of gas extraction component 7
It on lid 72, and largely deposits, after a period of time, deposit can block all or part of aspirating hole 721, cause process gas
It is unevenly distributed, it is unstable in turn result in MOCVD technique.
Meanwhile in MOCVD technique, the accident that also wafer is flown from pallet 5 frequent occurrence, therefore, wafer fragment also can
It falls on gas extraction ring top cover 72, aspirating hole 721 is blocked, process gas is caused to be unevenly distributed, in turn result in MOCVD work
Skill is unstable.
When above-mentioned accident occurs, needs to stop chemical vapor deposition unit, be safeguarded.Therefore, in the present invention,
Pass through and increase multiple cleaning members 8, it is ensured that whole aspirating holes 721 of gas extraction component 7 will not blockage phenomenon, avoid by
The chemical vapor deposition unit caused by gas extraction component 7 blocks is safeguarded.
As shown in figure 3, each cleaning member 8 includes: gear unit 81, scraping blade 82 and interlocking lever 83.Wherein, gear unit
81 may be provided between 71 two sidewalls of gas extraction ring.Scraping blade 82 be arranged on gear unit 81, and with gas extraction ring top cover
721 position of corresponding aspirating hole is corresponding on 72.83 one end of interlocking lever is connect with transmission bar unit 81,83 other end of interlocking lever and limit
Ring 6 is flowed to connect.
In the present invention, as long as can be realized the deposit removed in corresponding aspirating hole 721, scraping blade 82 can be in arbitrary shape
Shape, while can be solid sheet (block) or hollow frame.Meanwhile 82 axial location of scraping blade can be in corresponding aspirating hole 721
Same plane position, or in upper and lower, the forward and backward position of corresponding aspirating hole 721.
In the present invention, gear unit 81 be can also be provided on the inner wall of 1 side of reaction chamber.
As shown in Figure 3, Figure 4, transmission bar unit 81 includes: crankshaft structure 811, the first rotary shaft 812 and the second rotary shaft
813。
When gear unit 81 is arranged between 71 two sidewalls of gas extraction ring, one end of the first rotary shaft 812 and gas
One inner sidewall of extraction loop 71 connects, and the other end of first rotary shaft 812 is connect with crankshaft structure 811；The setting of scraping blade 82 exists
In first rotary shaft 812.One end of second rotary shaft 813 is connect with another inner sidewall of gas extraction ring 71, second rotation
The other end of shaft 813 is connect with crankshaft structure 811.First rotary shaft 812 is in a straight line with the second rotary shaft 813.
When gear unit 81 is arranged on the inner wall of 1 side of reaction chamber, one end of the first rotary shaft 812 and reaction chamber 1
Inner sidewall connection, the other end of first rotary shaft 812 connect with crankshaft structure 811；The setting of scraping blade 82 is in first rotation
In shaft 812.One end of second rotary shaft 813 is connect with the same inner sidewall of reaction chamber 1, the other end of second rotary shaft 813
It is connect with crankshaft structure 811.First rotary shaft 812 is in a straight line with the second rotary shaft 813.
As shown in Figure 3, Figure 4, crankshaft structure 811 includes: a pair of symmetrically arranged rotating arm 8111, first connecting rod 8112.
The lateral wall bottom of one rotating arm 8111 is connect with the first rotary shaft 812；The lateral wall bottom of another rotating arm 8111
The connection of two rotary shafts 813.The setting of first connecting rod 8112 is between a pair of of 8111 top of rotating arm.
As shown in figure 4, interlocking lever 83 includes: interlock ring 831, second connecting rod 832.Wherein, interlock ring 831 is nested with first
On connecting rod 8112.One end of second connecting rod 832 is connect with interlock ring 831, and the other end and restrictor ring 6 of the second connecting rod 832 connect
It connects.
Wherein, the diameter of rotating arm 8111 is greater than the length of second connecting rod 832.The initial position and lead of second connecting rod 832
Vertical plane is in an acute angle.
Above-mentioned design of the invention can be facilitated, coherent drive second when moving up and down in order to ensure restrictor ring 6
Connecting rod 832 moves, so that scraping blade 82 be driven to rotate, removes the sediment in corresponding aspirating hole 721.
As shown in figure 5, chemical vapor deposition unit clean method concrete operations following steps disclosed by the invention:
S1 sets multiple cleaning members 8 in gas extraction component 7 or in reaction chamber 1.
According to the quantity of aspirating hole 721 in gas extraction component 7, the quantity of cleaning member 8 is set.By all cleaning sections
Part 8 is set in gas extraction ring 71 or in reaction chamber 1；Ensure the scraping blade 82 and gas extraction ring top cover of each cleaning member 8
721 position of corresponding aspirating hole corresponds on 72.
Simultaneously, it is desirable that the diameter of a pair of of rotating arm 8111 of crankshaft structure 811 is all larger than the length of second connecting rod 832.Together
When ensuring original state, the initial position and vertical guide that second connecting rod 832 is arranged are in an acute angle.
S2 drives multiple cleaning members 8 to rotate when restrictor ring 6 is mobile.
When restrictor ring 6 moves up and down, all interlocking levers 83 is driven to move up and down；Each 83 band of interlocking lever
It moves crankshaft structure 811 connected to it to rotate, so that scraping blade 82 be driven to rotate.
S3, each cleaning member 8 are in contact with corresponding aspirating hole 721, to clean the aspirating hole 721.
When each scraping blade 82 rotates in gas extraction component 7 or in reaction chamber 1, the scraping blade 82 and corresponding pumping
Hole 721 comes into full contact with, and the sediment being deposited on the aspirating hole 721 is removed, and bring sediment into gas that section is in U-shape
In extraction loop 71, realize that the cleaning of all aspirating holes 721 is unobstructed.
Embodiment 2
In chemical vapor deposition unit in use, process gas is entered in reaction chamber 1 by air inlet component 2, and it is placed in
The wafer that the pallet 5 of 3 rotary-top of rotary shaft carries chemically reacts.At this point, pallet 5 is heated by heater 41.
Process gas is vital in being uniformly distributed to MOCVD technique for 5 surface of pallet.In order to ensure this key
Technique requirement, other than the effect of air inlet component 2, the effect of gas extraction component 7 is also very big.Gas extraction component 7
The gas flowed down by pallet 5 can be uniformly extracted, if the air-flow of gas extraction component 7 extracts unevenly, will have a direct impact on
Air flow method on pallet 5, and then influence process results.
In Metallo-Organic Chemical Vapor deposition (or " MOCVD ") technique, a large amount of graininess or sheet by-product can be generated
Object.These by-products generate in the air-flow on pallet 5, and follow air-flow to fall on gas extraction component 7, and largely deposit,
After a period of time, deposit can block gas extraction component 7, and process gas is caused to be unevenly distributed, and in turn result in MOCVD work
Skill is unstable.
Meanwhile in MOCVD technique, the accident that also wafer is flown from pallet 5 frequent occurrence, therefore, wafer fragment also can
It falls on gas extraction component 7, gas extraction component 7 is blocked, process gas is caused to be unevenly distributed, in turn results in MOCVD
Technique is unstable.
Thereby it is ensured that the uniformity of the extraction air-flow of gas extraction component 7, become the invention solves one important ask
Topic.To solve the above-mentioned problems, the present invention provides a kind of cleaning member for chemical vapor deposition unit, the cleaning members
Structure, working principle it is specific as follows.
As Figure 1-Figure 4, a kind of cleaning member 8 for chemical vapor deposition unit is arranged in chemical vapor deposition
In device.The chemical vapor deposition unit includes: reaction chamber 1, set on the top air inlet component 2 of reaction chamber 1, is set to reaction chamber 1
Internal rotary shaft 3, pallet 5, heating element 4, restrictor ring 6, and in reaction chamber 1 bottom gas extraction component 7.
As Figure 1-Figure 4, it may be disposed in gas extraction component 7 for the cleaning member of chemical vapor deposition unit 8,
And it is connect with restrictor ring 6；Cleaning member 8 may also set up in reaction chamber 1, and connect with restrictor ring 6.
Cleaning member 8 includes: gear unit 81, scraping blade 82 and interlocking lever 83.Wherein, gear unit 81 may be provided at gas
In extracting said elements 7 or in reaction chamber 1.Scraping blade 82 is arranged on gear unit 81；83 one end of interlocking lever and transmission bar unit 81 connect
It connects, which connect with restrictor ring 6.
In the present invention, as long as can be realized the deposit removed in corresponding aspirating hole 721, scraping blade 82 can be in arbitrary shape
Shape, while can be solid sheet (block) or hollow frame.Meanwhile 82 axial location of scraping blade can be in corresponding aspirating hole 721
Same plane position, or in upper and lower, the forward and backward position of corresponding aspirating hole 721.
As shown in Fig. 2, gas extraction component 7 includes: gas extraction ring 71, gas extraction ring top cover 72.Wherein, gas is taken out
It takes ring 71 in a ring, bottom is set in reaction chamber 1, and is circumferentially positioned at 4 periphery of heating device.Gas extraction ring top cover 72 is in
Annular is correspondingly arranged at 71 top of gas extraction ring.
Wherein, gas extraction ring top cover 72 is equipped with aspirating hole 721.71 section of gas extraction ring is in U-shape；The gas extraction ring
71, which are equipped with a pair, summarizes hole 711, and a pair summarizes hole 711 and is symmetricly set on 71 bottom of gas extraction ring.Gas extraction component 7 is logical
It crosses this and is communicated to hole 711 is summarized in outside.
Gear unit 81 is arranged between 71 two sidewalls of gas extraction ring, and scraping blade 82 is corresponding with 721 position of aspirating hole.
As shown in Figure 3, Figure 4, transmission bar unit 81 includes: crankshaft structure 811, the first rotary shaft 812 and the second rotary shaft
813。
Wherein, when being driven the setting of bar unit 81 in gas extraction component 7, one end of the first rotary shaft 812 and gas
One inner sidewall of extraction loop 71 connects, and the other end of first rotary shaft 812 is connect with crankshaft structure 811；The setting of scraping blade 82 exists
In first rotary shaft 812.One end of second rotary shaft 813 is connect with another inner sidewall of gas extraction ring 71, second rotation
The other end of shaft 813 is connect with crankshaft structure 811.First rotary shaft 812 is in a straight line with the second rotary shaft 813.
Wherein, when being driven the setting of bar unit 81 in reaction chamber 1, one end of the first rotary shaft 812 and the one of reaction chamber 1
Inner sidewall connection, the other end of first rotary shaft 812 are connect with crankshaft structure 811；Scraping blade 82 is arranged in first rotary shaft
On 812.One end of second rotary shaft 813 is connect with the same inner sidewall of reaction chamber 1, the other end of second rotary shaft 813 with
Crankshaft structure 811 connects.First rotary shaft 812 is in a straight line with the second rotary shaft 813.
As shown in Figure 3, Figure 4, crankshaft structure 811 includes: a pair of symmetrically arranged rotating arm 8111, first connecting rod 8112.
Wherein, the lateral wall bottom of a rotating arm 8111 is connect with the first rotary shaft 812；The lateral wall bottom of another rotating arm 8111
The second rotary shaft of portion 813 connects.The setting of first connecting rod 8112 is between a pair of of 8111 top of rotating arm.
As shown in Figure 3, Figure 4, interlocking lever 83 includes: interlock ring 831 and second connecting rod 832.Wherein, interlock ring 831 is arranged
On first connecting rod 8112.One end of second connecting rod 832 is connect with interlock ring 831, the other end and current limliting of the second connecting rod 832
Ring 6 connects.
In the present invention, the diameter of rotating arm 8111 is greater than the length of second connecting rod 832.The initial position of second connecting rod 832
It is in an acute angle with vertical guide.
In the present invention, in order to realize requirement that process gas is evenly distributed, on the gas extraction ring top of gas extraction component 7
One or more aspirating holes 721 are set on lid 72, then need the interior setting in gas extraction ring 71 identical as 721 quantity of aspirating hole
Cleaning member 8, and make multiple cleaning members 8 scraping blade 82 and multiple 721 positions of aspirating hole correspond.
As shown in figure 5, a kind of application method of the cleaning member for chemical vapor deposition unit is specific as follows:
S1 sets multiple cleaning members 8 in gas extraction component 7 or in reaction chamber 1.
According to the quantity of aspirating hole 721 in gas extraction component 7, the quantity of cleaning member 8 is set.By all cleaning sections
Part 8 is set in gas extraction ring 71 or in reaction chamber 1；Ensure the scraping blade 82 and gas extraction ring top cover of each cleaning member 8
721 position of corresponding aspirating hole corresponds on 72.
Simultaneously, it is desirable that the diameter of a pair of of rotating arm 8111 of crankshaft structure 811 is all larger than the length of second connecting rod 832.Together
When ensuring original state, the initial position and vertical guide that second connecting rod 832 is arranged are in an acute angle.
S2 drives multiple cleaning members 8 to rotate when restrictor ring 6 is mobile.
When restrictor ring 6 moves up and down, all interlocking levers 83 is driven to move up and down；Each 83 band of interlocking lever
It moves crankshaft structure 811 connected to it to rotate, so that scraping blade 82 be driven to rotate in gas extraction component 7.
S3, each cleaning member 8 are in contact with corresponding aspirating hole 721, to clean the aspirating hole 721.
When each scraping blade 82 rotates in gas extraction component 7 or in reaction chamber 1, the scraping blade 82 and corresponding aspirating hole
721 come into full contact with, and the sediment being deposited on the aspirating hole 721 is removed, and bring sediment into gas that section is in U-shape and take out
It takes in ring 71, realizes that the cleaning of all aspirating holes 721 is unobstructed.
The present invention can effectively extend the disassembly clearance time of each chemical vapor deposition unit, and improve chemistry
The working efficiency of vapor phase growing apparatus reduces the use cost of chemical vapor deposition unit.
It is discussed in detail although the contents of the present invention have passed through above preferred embodiment, but it should be appreciated that above-mentioned
Description is not considered as limitation of the present invention.After those skilled in the art have read above content, for of the invention
A variety of modifications and substitutions all will be apparent.Therefore, protection scope of the present invention should be limited to the appended claims.
Claims (22)
1. a kind of chemical vapor deposition unit, described comprising reaction chamber (1), air inlet component (2), rotary shaft (3) and pallet (5)
Air inlet component (2) setting communicates at the top of the reaction chamber (1), and with the reaction chamber (1) inside；Rotary shaft (3) setting
In the reaction chamber (1) interior bottom；The pallet (5) setting at the top of the rotary shaft (3), and with the air inlet component (2)
It is oppositely arranged；It is characterized in that, the device also includes:
Heating element (4) is circumferentially positioned at the rotary shaft (3), the pallet (5) lower section；
Restrictor ring (6) is arranged on the pallet (5) periphery；
Gas extraction component (7) is arranged in the reaction chamber (1) interior bottom, and is circumferentially positioned at the heating device (4) week
Side；The gas extraction component (7) communicates with outside, and the gas extraction ring top cover (72) of the gas extraction component (7) is equipped with
Multiple aspirating holes (721)；
Multiple cleaning members (8), each cleaning member (8) includes: a gear unit (81) and scraping blade (82)；The biography
Moving cell (81) also includes the first rotary shaft (812), the second rotary shaft (813), and scraping blade (82) setting is in first rotation
In shaft (812), second rotary shaft (813)；The gear unit (81) further includes crankshaft structure (811), the crankshaft
Structure (811) includes a pair of of rotating arm (8111), a first connecting rod (8112)；
The cleaning member (8) further includes and the interlocking lever (83) that extends downwardly on the restrictor ring (6), the first connecting rod
(8112) be connected with the interlocking lever (83), the first connecting rod (8112) by a pair of rotating arm (8111) respectively with
First rotary shaft (812), the second rotary shaft (813) connection；
The position of the scraping blade (82) is corresponding with corresponding aspirating hole (721) position, described when the restrictor ring moves up and down
Interlocking lever (83) drives the scraping blade (82) on the gear unit (81) to rotate along rotary shaft, the inswept aspirating hole of scraping blade
(721)。
2. chemical vapor deposition unit as described in claim 1, which is characterized in that the gas extraction component (7) includes:
Gas extraction ring (71) is arranged in the reaction chamber (1) interior bottom, and be circumferentially positioned at the heating device in a ring
(4) periphery；
Gas extraction ring top cover (72) is correspondingly arranged at the top of the gas extraction ring (71) in a ring.
3. chemical vapor deposition unit as claimed in claim 2, which is characterized in that gas extraction ring (71) section is in U
Shape；The gas extraction ring (71) is equipped with a pair and summarizes hole (711), and the pair of hole (711) of summarizing is symmetricly set on gas pumping
Take ring (71) bottom；
The gas extraction component (7) is communicated in outside by this to summarizing hole (711).
4. chemical vapor deposition unit as claimed in claim 2, which is characterized in that in the transmission bar unit (81):
One end of first rotary shaft (812) is connect with an inner sidewall of the gas extraction ring (71), first rotary shaft
(812) the other end is connect with the crankshaft structure (811)；The scraping blade (82) is arranged in first rotary shaft (812)；
One end of second rotary shaft (813) is connect with another inner sidewall of the gas extraction ring (71), second rotation
The other end of axis (813) is connect with the crankshaft structure (811)；
First rotary shaft (812) is in a straight line with second rotary shaft (813).
5. chemical vapor deposition unit as claimed in claim 2, which is characterized in that in the crankshaft structure (811):
One end of first rotary shaft (812) is connect with an inner sidewall of the reaction chamber (1), first rotary shaft (812)
The other end connect with the crankshaft structure (811)；The scraping blade (82) is arranged in first rotary shaft (812)；
One end of second rotary shaft (813) is connect with the ipsilateral inner sidewall of the reaction chamber (1), second rotary shaft (813)
The other end connect with the crankshaft structure (811)；
First rotary shaft (812) is in a straight line with second rotary shaft (813).
6. chemical vapor deposition unit described in claim 4 or 5, which is characterized in that in the crankshaft structure (811):
A pair of symmetrically arranged rotating arm (8111), the lateral wall bottom of a rotating arm (8111) and first rotation
Axis (812) connection；The connection of second rotary shaft (813) described in the lateral wall bottom of another rotating arm (8111)；
First connecting rod (8112), setting is between the pair of rotating arm (8111) top.
7. chemical vapor deposition unit as claimed in claim 6, which is characterized in that the interlocking lever (83) includes:
Interlock ring (831) is nested on the first connecting rod (8112)；
One end of second connecting rod (832), the second connecting rod (832) is connect with the interlock ring (831), the second connecting rod
(832) the other end is connect with the restrictor ring (6).
8. chemical vapor deposition unit as claimed in claim 7, which is characterized in that the diameter of the rotating arm (8111) is greater than
The length of the second connecting rod (832).
9. chemical vapor deposition unit as claimed in claim 7, which is characterized in that the initial bit of the second connecting rod (832)
It sets with vertical guide in an acute angle.
10. a kind of cleaning member for chemical vapor deposition unit, the chemical vapor deposition unit includes: reaction chamber (1),
Set on the top air inlet component (2) of reaction chamber (1), it is set to reaction chamber (1) internal rotary shaft (3), pallet (5), heating element
(4), restrictor ring (6), and it is set to the gas extraction component (7) of reaction chamber (1) interior bottom；
It is characterized in that, the cleaning member (8) is set in the reaction chamber (1), and it is connect with restrictor ring (6)；The cleaning
Component (8) includes:
One gear unit (81) and scraping blade (82)；The gear unit (81) is also comprising the first rotary shaft (812), the second rotation
Axis (813), the scraping blade (82) are arranged in first rotary shaft (812), second rotary shaft (813)；
The gear unit (81) further includes crankshaft structure (811), and the crankshaft structure (811) includes a pair of of rotating arm
(8111), a first connecting rod (8112)；
The cleaning member (8) further includes and the interlocking lever (83) that extends downwardly on the restrictor ring (6), the first connecting rod
(8112) be connected with the interlocking lever (83), the first connecting rod (8112) by a pair of rotating arm (8111) respectively with
First rotary shaft (812), the second rotary shaft (813) connection；
The corresponding pumping being arranged on the position of the scraping blade (82) and the gas extraction ring top cover (72) of the gas extraction component (7)
Stomata (721) position is corresponding, and when the restrictor ring moves up and down, the interlocking lever (83) is driven on the gear unit (81)
Scraping blade (82) is rotated along rotary shaft, the inswept aspirating hole (721) of scraping blade.
11. being used for the cleaning member of chemical vapor deposition unit as claimed in claim 10, which is characterized in that the gas is taken out
The component (7) is taken to include:
Gas extraction ring (71) is arranged in the reaction chamber (1) interior bottom, and be circumferentially positioned at the heating device in a ring
(4) periphery；
Gas extraction ring top cover (72) is correspondingly arranged at the top of the gas extraction ring (71), the gas extraction ring in a ring
Top cover (72) is equipped with aspirating hole (721).
12. being used for the cleaning member of chemical vapor deposition unit as claimed in claim 10, which is characterized in that the gas is taken out
Ring (71) section is taken to be in U-shape；The gas extraction ring (71) is equipped with a pair and summarizes hole (711), the pair of to summarize hole (711) symmetrically
It is arranged in gas extraction ring (71) bottom；
The gas extraction component (7) is communicated in outside by this to summarizing hole (711).
13. being used for the cleaning member of chemical vapor deposition unit as claimed in claim 11, which is characterized in that the drive rod
In unit (81):
One inner sidewall of the first rotary shaft (812), one end of first rotary shaft (812) and the gas extraction ring (71) connects
It connects, the other end of first rotary shaft (812) is connect with the crankshaft structure (811)；The scraping blade (82) setting this first
In rotary shaft (812)；
Second rotary shaft (813), another inner sidewall of one end of second rotary shaft (813) and the gas extraction ring (71)
Connection, the other end of second rotary shaft (813) are connect with the crankshaft structure (811)；
First rotary shaft (812) is in a straight line with second rotary shaft (813).
14. being used for the cleaning member of chemical vapor deposition unit as claimed in claim 11, which is characterized in that the crankshaft knot
In structure (811):
One end of first rotary shaft (812) is connect with an inner sidewall of the reaction chamber (1), first rotary shaft (812)
The other end connect with the crankshaft structure (811)；The scraping blade (82) is arranged in first rotary shaft (812)；
One end of second rotary shaft (813) is connect with the ipsilateral inner sidewall of the reaction chamber (1), second rotary shaft (813)
The other end connect with the crankshaft structure (811)；
First rotary shaft (812) is in a straight line with second rotary shaft (813).
15. the cleaning member according to claim 13 or 14 for chemical vapor deposition unit, which is characterized in that the song
In axle construction (811):
The lateral wall bottom of one rotating arm (8111) is connect with first rotary shaft (812)；Another described rotation
The connection of second rotary shaft (813) described in the lateral wall bottom of arm (8111)；
First connecting rod (8112), setting is between the pair of rotating arm (8111) top.
16. being used for the cleaning member of chemical vapor deposition unit as claimed in claim 15, which is characterized in that the interlocking lever
(83) include:
Interlock ring (831) is arranged on the first connecting rod (8112)；
One end of second connecting rod (832), the second connecting rod (832) is connect with the interlock ring (831), the second connecting rod
(832) the other end is connect with the restrictor ring (6).
17. being used for the cleaning member of chemical vapor deposition unit as claimed in claim 16, which is characterized in that the rotating arm
(8111) diameter is greater than the length of the second connecting rod (832).
18. being used for the cleaning member of chemical vapor deposition unit as claimed in claim 16, which is characterized in that described second connects
The initial position and vertical guide of bar (832) are in an acute angle.
19. a kind of clean method of chemical vapor deposition unit, which is characterized in that this method comprises the following steps: in describedization
The multiple cleaning members (8) of setting in the gas extraction component (7) in vapor phase growing apparatus are learned, or setting is more in reaction chamber (1)
A cleaning member (8)；
When the restrictor ring (6) in the chemical vapor deposition unit is mobile, multiple cleaning member (8) rotations are driven；Its
In, the cleaning member (8) includes gear unit (81), scraping blade (82) and interlocking lever (83)；The gear unit (81) can set
It sets in the gas extraction component (7) or in reaction chamber (1), the scraping blade (82) is arranged on gear unit (81), institute
It states interlocking lever (83) one end to connect with the transmission bar unit (81), which connect with restrictor ring (6)；
It is arranged on each cleaning member (8) and the gas extraction ring top cover (72) of the gas extraction component (7) corresponding
Aspirating hole (721) be in contact, to clean the aspirating hole (721).
20. the clean method of chemical vapor deposition unit as claimed in claim 19, which is characterized in that taken out according to the gas
The quantity for taking aspirating hole (721) in component (7), sets the quantity of the cleaning member (8)；
Scraping blade (82) position of each cleaning member (8) is corresponded with corresponding aspirating hole (721) position；
All cleaning members (8) are set in the gas extraction ring (71) or are set in the reaction chamber (1)；Simultaneously
It is in one between the initial position and vertical guide of the second connecting rod (832) being arranged on the interlocking lever (83) when ensuring original state
A acute angle.
21. the clean method of chemical vapor deposition unit as claimed in claim 20, which is characterized in that when the restrictor ring
(6) when moving up and down, all interlocking levers (83) is driven to move up and down；Each interlocking lever (83) drives and it
The crankshaft structure (811) of connection rotates, so that scraping blade (82) be driven to rotate.
22. the clean method of chemical vapor deposition unit as claimed in claim 20, which is characterized in that when each scraping blade
(82) in rotation, which comes into full contact with the corresponding aspirating hole (721), will be deposited on the aspirating hole (721)
On sediment removal, and sediment is brought into the gas extraction ring (71) that section is in U-shape, realizes all aspirating holes
(721) cleaning.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510704688.6A CN106609358B (en) | 2015-10-27 | 2015-10-27 | A kind of chemical vapor deposition unit and its clean method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510704688.6A CN106609358B (en) | 2015-10-27 | 2015-10-27 | A kind of chemical vapor deposition unit and its clean method |
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| CN106609358B true CN106609358B (en) | 2018-12-18 |
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| CN117163955B (en) * | 2023-09-07 | 2024-04-30 | 煜爚(东海)新材料有限公司 | Coal-based porous carbon molecular sieve and processing technology thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102586753A (en) * | 2012-03-21 | 2012-07-18 | 中微半导体设备(上海)有限公司 | Method for cleaning metal organic chemical vapor deposition (MOCVD) device |
| CN102899636A (en) * | 2012-09-26 | 2013-01-30 | 中微半导体设备(上海)有限公司 | Method for cleaning metal-organic chemical vapor deposition (MOCV) reaction chamber in situ |
| CN103805958A (en) * | 2012-11-14 | 2014-05-21 | 理想能源设备(上海)有限公司 | Chemical vapor deposition device and cleaning method thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030001695A (en) * | 2001-06-26 | 2003-01-08 | 삼성전자 주식회사 | cleaning equipment of HDP CVD chamber and method there of |
| TWI426579B (en) * | 2010-02-01 | 2014-02-11 | Hermes Epitek Corp | Semiconductor equipment and method for cleaning semiconductor equipment |
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2015
- 2015-10-27 CN CN201510704688.6A patent/CN106609358B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102586753A (en) * | 2012-03-21 | 2012-07-18 | 中微半导体设备(上海)有限公司 | Method for cleaning metal organic chemical vapor deposition (MOCVD) device |
| CN102899636A (en) * | 2012-09-26 | 2013-01-30 | 中微半导体设备(上海)有限公司 | Method for cleaning metal-organic chemical vapor deposition (MOCV) reaction chamber in situ |
| CN103805958A (en) * | 2012-11-14 | 2014-05-21 | 理想能源设备(上海)有限公司 | Chemical vapor deposition device and cleaning method thereof |
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Address after: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee after: Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd. Address before: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee before: Advanced Micro-Fabrication Equipment (Shanghai) Inc. |
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