CN106546469A - A kind of preparation method of the electron microscopic sample of plate glass - Google Patents
A kind of preparation method of the electron microscopic sample of plate glass Download PDFInfo
- Publication number
- CN106546469A CN106546469A CN201610931681.2A CN201610931681A CN106546469A CN 106546469 A CN106546469 A CN 106546469A CN 201610931681 A CN201610931681 A CN 201610931681A CN 106546469 A CN106546469 A CN 106546469A
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- Prior art keywords
- plate glass
- mark zone
- platinum
- crystallization
- preparation
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- 239000005357 flat glass Substances 0.000 title claims abstract description 73
- 238000002360 preparation method Methods 0.000 title claims abstract description 25
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 173
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 87
- 238000002425 crystallisation Methods 0.000 claims abstract description 78
- 230000008025 crystallization Effects 0.000 claims abstract description 78
- 238000005260 corrosion Methods 0.000 claims abstract description 64
- 230000007797 corrosion Effects 0.000 claims abstract description 55
- 239000002253 acid Substances 0.000 claims abstract description 52
- 239000007788 liquid Substances 0.000 claims abstract description 44
- 238000005498 polishing Methods 0.000 claims abstract description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000002390 adhesive tape Substances 0.000 claims description 5
- 244000137852 Petrea volubilis Species 0.000 claims description 2
- 238000010009 beating Methods 0.000 claims 1
- 230000007547 defect Effects 0.000 abstract description 30
- 238000004031 devitrification Methods 0.000 abstract description 12
- 239000012535 impurity Substances 0.000 abstract description 2
- 239000011521 glass Substances 0.000 description 15
- 239000000758 substrate Substances 0.000 description 12
- 238000001035 drying Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 4
- 239000004576 sand Substances 0.000 description 4
- 238000002389 environmental scanning electron microscopy Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001493 electron microscopy Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 230000000266 injurious effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/32—Polishing; Etching
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Surface Treatment Of Glass (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
The invention discloses a kind of preparation method of the electron microscopic sample of plate glass, contains platinum crystallization in the plate glass, wherein, the preparation method includes：S1, determine position of the platinum crystallization in plate glass, and two surfaces of the position corresponding plate glass are respectively labeled as into the first mark zone and the second mark zone；Determine the distance between surface that first mark zone is located and described platinum crystallization；S2, first mark zone of polishing so that first mark zone forms coarse surface, and on second mark zone covers anti-corrosion film；S3, first mark zone to defining rough surface carry out acid liquid corrosion.The electron microscopic sample of the plate glass containing platinum crystallization impurity is prepared by the preparation method of the present invention, the platinum crystallization in plate glass can be protected well not fall off so that the platinum devitrification defects in plate glass are only partially located within the outside of plate glass just.
Description
Technical field
The present invention relates to glass art, and in particular to a kind of preparation method of the electron microscopic sample of plate glass.
Background technology
With fast-developing and portable type electronic product such as notebook computer, panel computer, the intelligence of flat panel display
The rapidly popularization of energy mobile phone and Intelligent worn device, role is more and more important wherein for liquid crystal display, with frivolous
Change, high-resolution, the lcd products more market of high image quality are received.
The display glass of high-quality becomes the essential condition for making high quality display, but in Improving Glass Manufacturing Processes,
Due to technological fluctuation, or the mismatch of process conditions, some solid phases (calculus, crystallization, non-fusant etc.) or gas phase defect can be caused
The generation of (bubble), these defects are mingled with, and serious will make product abandonment.Such glass
Needle-like platinum defect in glass defect is especially difficult to tackle, and the defect is to melt the platinum material used in operation due to glass
Dissolve at high operating temperatures or volatilize, needle-like crystallization or graininess crystallization are formed in glass metal, due to the size of this kind of defect
Minimum, online reviewer and inspection equipment are difficult to be detected, once stream will be produced in panel production process to client
Raw defective products, affects production cost and efficiency.So eliminate such defect being particularly important, first have to solve problem
Solution problem, the detection to such defect are usually used ESEM, however ESEM can only test sample surface part, it is right
In the defect for being contained in sample interior, can only expose defect and could detect outside by working process.If this platinum defect
Mechanically grinding and polishing, because its size is too little, is easily worn away, and success rate is too low cannot to be implemented, if directly with acid
Liquid is corroded, it is easy to defect etching will be destroyed so as to observe.
The content of the invention
It is an object of the invention to provide a kind of preparation method of the electron microscopic sample of plate glass, using the preparation side of the present invention
Method prepares the electron microscopic sample of plate glass, can make just platinum devitrification defects be partially exposed at the surface of plate glass without
Platinum crystallization is made to drop.
To achieve these goals, the present invention provides a kind of preparation method of the electron microscopic sample of plate glass, the flat board glass
Contain platinum crystallization in glass, wherein, the preparation method includes：
S1, determine position of the platinum crystallization in plate glass, and by two of the position corresponding plate glass
Surface is respectively labeled as the first mark zone and the second mark zone；Determine that the surface that first mark zone is located is analysed with the platinum
The distance between brilliant；The surface that first mark zone is located and the platinum crystallization the distance between be not more than described the
The distance between surface and the platinum crystallization that two mark zones are located；
S2, first mark zone of polishing so that first mark zone forms coarse surface, and described second
Anti-corrosion film is covered on mark zone；
S3, first mark zone to defining rough surface carry out acid liquid corrosion, and corrosion acid used is concentration 4-
The hydrofluoric acid of 25 weight %, between the surface being located relative to first mark zone of 1mm and the platinum crystallization away from
From the time of corrosion is 2h-5h.
The electron microscopic sample of the plate glass containing platinum crystallization impurity is prepared by the preparation method of the present invention, can be fine
Platinum crystallization in ground protection plate glass does not fall off so that the platinum devitrification defects in plate glass are only partially located within flat just
The outside of glass sheet.
Other features and advantages of the present invention will be described in detail in subsequent specific embodiment part.
Description of the drawings
Accompanying drawing is, for providing a further understanding of the present invention, and to constitute the part of specification, with following tool
Body embodiment is used for explaining the present invention together, but is not construed as limiting the invention.In the accompanying drawings：
Fig. 1 is a kind of structural representation of specific embodiment of the plate glass containing platinum devitrification defects of the invention.
Fig. 2 is a kind of structure of specific embodiment of the plate glass containing platinum devitrification defects after present invention polishing
Schematic diagram.
Fig. 3 is a kind of knot of specific embodiment of the plate glass that platinum devitrification defects of the present invention are partially exposed at outside
Structure schematic diagram.
Description of reference numerals
1 platinum crystallization, 2 plate glass, 3 first mark zone
4 second mark zone, 5 anti-corrosion film
Specific embodiment
The specific embodiment of the present invention is described in detail below in conjunction with accompanying drawing.It should be appreciated that this place is retouched
The specific embodiment stated is merely to illustrate and explains the present invention, is not limited to the present invention.
The present invention provides a kind of preparation method of the electron microscopic sample of plate glass, contains platinum crystallization in the plate glass 2
1, wherein, the preparation method includes：
S1, determine position of the platinum crystallization 1 in plate glass 2, and by two tables of the position corresponding plate glass 2
Face is respectively labeled as the first mark zone 3 and the second mark zone 4；Determine between surface and the platinum crystallization 1 at the place of the first mark zone 3
Distance；Surface and the platinum crystallization 1 that first mark zone 3 is located the distance between be not more than the table that the second mark zone 4 is located
The distance between face and platinum crystallization 1；
S2, the first mark zone 3 of polishing so that the first mark zone 3 forms coarse surface, and on the second mark zone 4
Coating anticorrosive film 5；
S3, the first mark zone 3 to defining rough surface carry out acid liquid corrosion, and corrosion acid used is concentration 4-25 weight
The hydrofluoric acid of amount %, surface and the platinum crystallization 1 being located relative to first mark zone 3 of 1mm the distance between, corrosion when
Between be 2h-5h.
TFT-LCD substrates, TFT-LCD cover-plate glass, OLED substrate, OLED cover-plate glass, PDP substrate glass
The glass materials such as glass, glass light guide plate, the detection for occurring platinum devitrification defects in process of production can adopt the present invention's
Method carries out the preparation of electron microscopic sample.
According to the present invention, the acid used by acid liquid corrosion can be the hydrofluoric acid of concentration 10-15 weight %, relative to 1mm's
The distance between surface and the platinum crystallization 1 that first mark zone 3 is located, the time of corrosion can be 2.5h-3h.
According to the present invention, acid liquid corrosion is carried out in step S3 and plate glass 2 can be partially exposed to platinum crystallization 1 just
Till outside.The time for carrying out acid liquid corrosion can not be long, in case platinum crystallization 1 falls into the acid solution for carrying out acid liquid corrosion
In.The first mark zone 3 after being polished is presented coarse surface, according to primary Calculation corrosion the time required to plate glass 2
Carry out acid liquid corrosion, the plate glass 2 of rough surface during acid liquid corrosion, the corresponding platinum crystallization of recess surface location
1 outside that can be first etched to plate glass 2, the platinum crystallization 1 of non-recess position can be still in identical etching time
In the inside of plate glass 2, therefore, part platinum crystallization 1 be able to be obtained and be exposed to the electron microscopic sample outside plate glass 2.
According to the present invention, can be the acid liquid corrosion of discontinuity to the acid liquid corrosion of plate glass 2, plate glass 2 is entered
Clean water plate glass 2 can be used after acid liquid corrosion of row, it is then determined that platinum crystallization 1 and 2 surface of plate glass away from
Carry out acid liquid corrosion next time after again.Platinum crystallization 1 can be examined under a microscope apart from the substantially deep of 2 surface of plate glass
Degree, as platinum crystallization 1 is nearer apart from 2 surface of plate glass, gradually decreases the time of acid liquid corrosion.
According to the present invention, determine that platinum crystallization 1 method of position or first mark zone 3 of determination in plate glass 2 are located
Surface and platinum crystallization 1 the distance between method can include by micro- sem observation and method for measuring.
According to the present invention, the first mark zone 3 of plate glass 2 can be polished using 800#-1200# sand paper.
According to the present invention, anti-corrosion film 5 can include adhesive tape.On the second mark zone 4 pasting adhesive tape can be with
The second mark zone 4 is prevented by acid liquid corrosion, to facilitate the follow-up position to 1 defect of platinum crystallization to make a look up and position.
According to the present invention, the method is additionally may included in being cleaned by ultrasonic plate glass 2 before carrying out step S1
With the operation of drying.After plate glass 2 is cleaned by ultrasonic and is dried, determine platinum crystallization 1 flat by micro- sem observation
General location in glass sheet 2.
According to the present invention, the length of platinum crystallization 1 can be 10-100 microns.Platinum crystallization can be graininess, needle-like
Etc. shape.
The present invention cleverly make use of the phenomenon that 2 injurious surface mark of plate glass gradually amplifies during acid liquid corrosion, make
Plate glass 2 without scar site fixation protection platinum crystallization 1 is unlikely to come off, while 1 defect of platinum crystallization in making pit is sudden and violent
Expose and detect so as to ESEM, so as to avoid minimum 2 defect of platinum crystallization from integrally coming off, thus greatly improve
Sample preparation efficiency and success rate, and be conducive to the follow-up electron microscopic observation to platinum devitrification defects in plate glass.
The present invention is further described by the following examples.
Embodiment 1
S1, the internal TFT-LCD substrates with 1 defect of platinum crystallization are cleaned by ultrasonic and are dried, by microscope
Observation determines position of the platinum crystallization 1 in TFT-LCD substrates, and by two surfaces of the position corresponding TFT-LCD substrates
It is labeled as the first mark zone 3 and the second mark zone 4 respectively by way of permanent pen is drawn a circle；Determined by micro- sem observation
The distance between the surface at the place of the first mark zone 3 and platinum crystallization 1；Analyse with the platinum on the surface that first mark zone 3 is located
Brilliant 1 the distance between be not more than surface that the second mark zone 4 is located and platinum crystallization 1 the distance between；According to relative to
The surface that first mark zone 3 of 1mm is located and the platinum crystallization 1 the distance between time of corrosion be 2h, calculate
The time that the distance of depth of the platinum crystallization 1 in TFT-LCD substrates is corroded is 50min；
S2, using the first mark zone of 800# sand paperings 3 so that the first mark zone 3 forms coarse surface, and
Adhesive tape is pasted on two mark zones 4 as anti-corrosion film 5；
S3, the TFT-LCD substrates obtained in S2 are put in the hydrofluoric acid solution of 25 weight % to defining rough surface
The first mark zone 3 carry out acid liquid corrosion, clean water, drying, micro- sem observation successively, the time of acid liquid corrosion is 48min.
Embodiment 2
S1, the internal OLED cover-plate glass with 1 defect of platinum crystallization is cleaned by ultrasonic and is dried, by aobvious
Micro mirror observation determines position of the platinum crystallization 1 in OLED cover-plate glass, and by the position corresponding OLED cover plate
Two surfaces of glass are labeled as the first mark zone 3 and the second mark zone 4 respectively by way of permanent pen setting-out；Pass through
Micro- sem observation determines the distance between the surface at the place of the first mark zone 3 and platinum crystallization 1；The table that first mark zone 3 is located
Face and the platinum crystallization 1 the distance between be not more than between the surface and platinum crystallization 1 that the second mark zone 4 is located away from
From；The surface being located according to first mark zone 3 relative to 1mm and the platinum crystallization 1 the distance between corrosion
Time is 5h, and it is 2h to calculate platinum crystallization 1 in the time that the distance of the depth of OLED cover-plate glass is corroded；
S2, using the first mark zone of 1000# sand paperings 3 so that the first mark zone 3 forms coarse surface, and
Adhesive waterproof tape is pasted on second mark zone 4 as anti-corrosion film 5；
S3, the OLED cover-plate glass obtained in S2 is put into it is coarse to defining in the hydrofluoric acid solution of 4 weight %
First mark zone 3 on surface carries out acid liquid corrosion, clean water, drying, micro- sem observation and acid liquid corrosion next time successively,
First pass through before carrying out acid liquid corrosion every time carried out after micro- sem observation determines platinum crystallization 1 and the distance of substrate surface again it is next
Secondary acid liquid corrosion, the number of times of acid liquid corrosion is 6 times, the time of each acid liquid corrosion is followed successively by 50min, 35min, 20min,
7min, 1min, 30s, last time acid liquid corrosion will carry out micro- after OLED cover-plate glass clean water, drying after terminating
Sem observation.
Embodiment 3
S1, the internal PDP base plate glass with 1 defect of platinum crystallization is cleaned by ultrasonic and is dried, by microscope
Observation determines position of the platinum crystallization 1 in PDP base plate glass, and by two surfaces of the position corresponding PDP base plate glass
It is labeled as the first mark zone 3 and the second mark zone 4 respectively by way of permanent pen picture frame；Determined by micro- sem observation
The distance between the surface at the place of the first mark zone 3 and platinum crystallization 1；Analyse with the platinum on the surface that first mark zone 3 is located
Brilliant 1 the distance between be not more than surface that the second mark zone 4 is located and platinum crystallization 1 the distance between；According to relative to
The surface that first mark zone 3 of 1mm is located and the platinum crystallization 1 the distance between time of corrosion be 3.5h, meter
The time that the distance of calculation depth of the platinum crystallization 1 in PDP base plate glass is corroded is 90min；
S2, using the first mark zone of 1200# sand paperings 3 so that the first mark zone 3 forms coarse surface, and
Acid-proof adhesive tape is pasted on second mark zone 4 as anti-corrosion film 5；
S3, the PDP base plate glass obtained in S2 is put in the hydrofluoric acid solution of 15 weight % to defining rough surface
The first mark zone 3 carry out acid liquid corrosion, clean water, drying, micro- sem observation and acid liquid corrosion next time successively, every time
First passing through before carrying out acid liquid corrosion after micro- sem observation determines platinum crystallization 1 and the distance of substrate surface is carried out next time again
Acid liquid corrosion, the number of times of acid liquid corrosion is 5 times, the time of each acid liquid corrosion is followed successively by 40min, 25min, 10min, 7min,
2min, last time acid liquid corrosion will carry out microscope observation after PDP base plate glass clean waters, drying after terminating.
Comparative example 1
Method according to embodiment 1 prepares the electron microscopic sample of the TFT-LCD substrates with platinum devitrification defects, changes as follows
Control condition：The operation do not polished, substrate is directly placed in the hydrofluoric acid solution of 25 weight % carries out acid liquid corrosion
48min, then carries out clean water, drying, micro- sem observation successively.
Comparative example 2
Method according to embodiment 2 prepares the electron microscopic sample of the OLED cover-plate glass with platinum devitrification defects, changes
Become following control condition：Sand papering and acid liquid corrosion are not carried out, the first mark zone is carried out by polisher lapper
Electron microscopic observation is carried out after 100s mechanical grindings.
Crystallization depth, acid concentration, acid liquid corrosion time and electron microscopy observation result to embodiment 1-3 and comparative example 1-2 is shown in
Table 1.
Table 1：The crystallization depth of embodiment 1-3 and comparative example 1-2, acid concentration, acid liquid corrosion time and electron microscopy observation result
Table.
Prepare the electron microscopic sample of the plate glass with devitrification defects, energy as can be seen from Table 1 by the method for the present invention
Enough make devitrification defects partly be exposed to just the outside of plate glass, can avoid crystallization come off and mechanical grinding is to crystallization
The breakage for causing.
The preferred embodiment of the present invention is described in detail above in association with accompanying drawing, but, the present invention is not limited to above-mentioned reality
The detail in mode is applied, in the range of the technology design of the present invention, various letters can be carried out to technical scheme
Monotropic type, these simple variants belong to protection scope of the present invention.
It is further to note that each particular technique feature described in above-mentioned specific embodiment, in not lance
In the case of shield, can be combined by any suitable means, in order to avoid unnecessary repetition, the present invention to it is various can
The combination of energy is no longer separately illustrated.
Additionally, can also be combined between a variety of embodiments of the present invention, as long as which is without prejudice to this
The thought of invention, which should equally be considered as the content invented by the present invention.
Claims (9)
1. a kind of preparation method of the electron microscopic sample of plate glass, contains platinum crystallization (1) in the plate glass (2), wherein, should
Preparation method includes：
S1, determine position of the platinum crystallization (1) in the plate glass (2), and by the position corresponding plate glass
(2) two surfaces are respectively labeled as the first mark zone (3) and the second mark zone (4)；Determine that first mark zone (3) is located
The distance between surface and the platinum crystallization (1)；The surface that first mark zone (3) is located and the platinum crystallization
(1) the distance between be not more than between the surface that is located of second mark zone (4) and the platinum crystallization (1) away from
From；
S2, first mark zone (3) polished so that first mark zone (3) forms coarse surface, and described the
Anti-corrosion film (5) is covered on two mark zones (4)；
S3, first mark zone (3) to defining rough surface carry out acid liquid corrosion, and corrosion acid used is concentration 4-25
The hydrofluoric acid of weight %, between the surface being located relative to first mark zone (3) of 1mm and the platinum crystallization (1)
Distance, time of corrosion is 2h-5h.
2. preparation method according to claim 1, wherein, the acid used by the acid liquid corrosion is concentration 10-15 weight %
Hydrofluoric acid, the surface being located relative to first mark zone (3) of 1mm and the platinum crystallization (1) the distance between,
The time of corrosion is 2.5h-3h.
3. preparation method according to claim 1, wherein, the acid liquid corrosion is carried out in step S3 to the platinum
Till crystallization (1) is partially exposed at the plate glass (2) outside.
4. preparation method according to claim 1, wherein, it is interruption to the acid liquid corrosion of the plate glass (2)
Property acid liquid corrosion, carry out once after the acid liquid corrosion with plate glass (2) described in clean water, it is then determined that the platinum
Acid liquid corrosion next time is carried out again after crystallization (1) and the distance on the plate glass (2) surface.
5. the preparation method according to claim 1 or 4, wherein it is determined that the platinum crystallization (1) is in the plate glass
(2) in the method for position or determine surface that first mark zone (3) is located and the platinum crystallization (1) the distance between
Method include by micro- sem observation and determine.
6. preparation method according to claim 1, wherein, the polishing includes carrying out beating using 800#-1200# sand paper
Mill.
7. preparation method according to claim 1, wherein, the anti-corrosion film (5) is including adhesive tape.
8. preparation method according to claim 1, wherein, the method be additionally included in before carrying out step S1 by institute
State the operation that plate glass (2) is cleaned by ultrasonic and is dried.
9. preparation method according to claim 1, wherein, the length of the platinum crystallization (1) is 10-100 microns.
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| CN201610931681.2A CN106546469B (en) | 2016-10-31 | 2016-10-31 | A kind of preparation method of the electron microscopic sample of plate glass |
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| CN201610931681.2A CN106546469B (en) | 2016-10-31 | 2016-10-31 | A kind of preparation method of the electron microscopic sample of plate glass |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108061736A (en) * | 2017-11-14 | 2018-05-22 | 东旭科技集团有限公司 | The method analyzed using reflective electron probe glass defect |
| CN110455814A (en) * | 2019-08-30 | 2019-11-15 | 彩虹显示器件股份有限公司 | The detection method of needle-shaped foreign matter ingredient in a kind of electronic glass |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002122524A (en) * | 2000-10-13 | 2002-04-26 | Sumitomo Metal Mining Co Ltd | Method of making sample for transmission electron microscope |
| CN102023108A (en) * | 2009-09-23 | 2011-04-20 | 中芯国际集成电路制造(上海)有限公司 | Method for preparing transmission electron microscope sample |
| CN105651582A (en) * | 2015-12-30 | 2016-06-08 | 芜湖东旭光电装备技术有限公司 | Preparation method of glass needle-shaped defect reflective electron microscope sample |
| CN105717137A (en) * | 2016-01-27 | 2016-06-29 | 中国建筑材料科学研究总院 | Silica-glass micro-defect detecting method |
-
2016
- 2016-10-31 CN CN201610931681.2A patent/CN106546469B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002122524A (en) * | 2000-10-13 | 2002-04-26 | Sumitomo Metal Mining Co Ltd | Method of making sample for transmission electron microscope |
| CN102023108A (en) * | 2009-09-23 | 2011-04-20 | 中芯国际集成电路制造(上海)有限公司 | Method for preparing transmission electron microscope sample |
| CN105651582A (en) * | 2015-12-30 | 2016-06-08 | 芜湖东旭光电装备技术有限公司 | Preparation method of glass needle-shaped defect reflective electron microscope sample |
| CN105717137A (en) * | 2016-01-27 | 2016-06-29 | 中国建筑材料科学研究总院 | Silica-glass micro-defect detecting method |
Non-Patent Citations (1)
| Title |
|---|
| 张军锋: "TFT玻璃基板中的铂金粒子研究", 《玻璃深加工》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108061736A (en) * | 2017-11-14 | 2018-05-22 | 东旭科技集团有限公司 | The method analyzed using reflective electron probe glass defect |
| CN110455814A (en) * | 2019-08-30 | 2019-11-15 | 彩虹显示器件股份有限公司 | The detection method of needle-shaped foreign matter ingredient in a kind of electronic glass |
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| Publication number | Publication date |
|---|---|
| CN106546469B (en) | 2019-03-12 |
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