CN106527836A - GF structure touch screen and preparation method thereof - Google Patents
GF structure touch screen and preparation method thereof Download PDFInfo
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- CN106527836A CN106527836A CN201611109351.1A CN201611109351A CN106527836A CN 106527836 A CN106527836 A CN 106527836A CN 201611109351 A CN201611109351 A CN 201611109351A CN 106527836 A CN106527836 A CN 106527836A
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- General Physics & Mathematics (AREA)
- Position Input By Displaying (AREA)
Abstract
The invention belongs to the field of capacitive touch screen preparation, and particularly relates to a GF structure touch screen and a preparation method thereof. The problems that an existing GF structure touch screen is high in production cost and large in manufacturing technology difficulty are solved. The GF structure touch screen comprises a tempered glass layer, a transparent optical adhesive layer and a metal mesh conducting layer. The metal mesh conducting layer and the tempered glass layer are attached through the transparent optical adhesive layer. The whole technology is simple, no complex or expensive equipment is needed, and the cost is low.
Description
Technical field
The invention belongs to capacitive touch screen preparation field, and in particular to a kind of GF structures touch screen and preparation method thereof.
Background technology
As mobile terminal is intelligent, universalness, the function that the mobile terminal of public use possesses is more and more rich and varied, moves
Dynamic study, Mobile solution arise at the historic moment.
With a large amount of popularizations of smart mobile phone on market and panel computer, as the capacitance touch screen of alternating interface between man and computer,
Also day by day increasingly it is widely applied.Except providing touch function, capacitance touch screen is even more surface structure part, it is desirable to provide
Certain mechanical strength.In consumer electronics fields such as mobile phones, requirement of the people to touch screen intensity be not very strong.But it is right
For the special field such as industry control, vehicle-mounted, the demand of contact panel mechanical strength becomes very harsh.
Touch screen is a kind of input equipment for significantly improving man machine operation interface, with directly perceived, simple, efficiently advantage.
Touch screen has been obtained for being widely applied in many electronic products, and such as mobile phone, PDA, multimedia, public information are looked into and be
System etc..
Film capacitive touch screen（Hereinafter referred to as touch screen）Occupy the very big market share by cost advantage.It is existing
In technology, Film capacitive touch screen adopts GFF structures, G to represent face glass, and F represents conducting film.The manufacturer of touch screen needs
Through six procedures, upper conductive film is carried out silk-screen, printed conductive pattern and conducting wire by (1)；（2）Lower conductive film is carried out
Silk-screen, printed conductive pattern and conducting wire；（3）The upper Optical transparent adhesive of upper conductive film combination；（4）The lower optics of lower conductive film combination
Transparent adhesive tape；（5）Upper conductive film and lower conductive film that combination has Optical transparent adhesive are carried out after group；（6）It is double after previous step
Layer Film and face glass bonding.The defect that the touch screen of GFF structures is present has：Including upper conductive film and lower conductive film two-layer
Film, and include upper Optical transparent adhesive and lower Optical transparent adhesive two-layer glue so that entirely touch screen is very thick；Upper and lower conducting film point
Silk-screen is opened, consumption manpower, man-hour, processing procedure are long, low production efficiency；And upper and lower conducting film be respectively combined Optical transparent adhesive after carry out again
After group, not only low production efficiency, is also also easy to produce white point, knitting wool etc. dirty in manufacturing process；Upper conductive film is combined with lower conductive film
During there is also the deficiency of combination off normal, and then affect the binding of FPC and touch screen.
The content of the invention
The present invention solves the problems, such as that the production cost height of the touch screen of current existing GF structures, processing technology difficulty are big,
And a kind of GF structures touch screen and preparation method thereof is provided.
A kind of GF structures touch screen of the present invention includes toughened glass layer, transparent optical glue-line and metal grill conductive layer；
The metal grill conductive layer is fitted with toughened glass layer by transparent optical glue-line；
There is metal grill pattern by laser sintered on the metal grill conductive layer, the metal grill pattern is in X axle sides
Several fylfots are equipped with to intersection on Y direction of principal axis；The fylfot is made up of four edges, a line and Article 3
Frontier juncture is in the centrosymmetry of the fylfot；Article 2 side and Article 4 frontier juncture are in the centrosymmetry of the fylfot；Described ten thousand
The distance between beginning and end of every a line of font is 5 ~ 12mm；The a line of the fylfot and Article 2 side
It is to be made up of the sine wave of a cycle；Two adjacent fylfots have a line to overlap.
A kind of preparation method of GF structures touch screen of the present invention is carried out according to the following steps：
First, the formation metal ink coating on base material；
2nd, toast the metal ink coating；
3rd, by baking after the metal ink coated laser sinter to form metal grill pattern；
4th, the unsintered metal ink coating is removed, obtains metal grill conductive layer；
5th, metal grill conductive layer is bound into ACF conducting resinls；
6th, the horizontal cabling area hot pressing FPC of the metal grill conductive layer of ACF conducting resinls to posting；
7th, to pressed FPC metal grill conductive layer fit transparent optical glue-line；
8th, the metal grill conductive layer and safety glass cover plate that post transparent optical glue-line are combined, obtain a kind of GF knots
Structure touch screen.
Beneficial effects of the present invention：
Ten thousand words by the insulation conductive filament of conductive layer to be laid in multiple continuous intersections in X direction of principal axis, Y direction of principal axis of the invention
Shape so that Metal-Mesh patterns all no straight line in all directions, so as in the generation for fundamentally preventing Moire fringe；This
The distance of every a line beginning and end of the fylfot pattern of invention has reached 5 ~ 12mm, is completely suitable for large scale and super large
The touch-control of size.Integrated artistic of the present invention is simple, without the need for the equipment of complex and expensive, with low cost.
Description of the drawings
Fig. 1 is the structural representation of the metal grill conductive layer.
Specific embodiment
Specific embodiment one：A kind of GF structures touch screen of present embodiment includes toughened glass layer, transparent optical cement
Layer and metal grill conductive layer；The metal grill conductive layer is fitted with toughened glass layer by transparent optical glue-line；
There is metal grill pattern by laser sintered on the metal grill conductive layer, the metal grill pattern is in X axle sides
Several fylfots are equipped with to intersection on Y direction of principal axis；The fylfot is made up of four edges, a line and Article 3
Frontier juncture is in the centrosymmetry of the fylfot；Article 2 side and Article 4 frontier juncture are in the centrosymmetry of the fylfot；Described ten thousand
The distance between beginning and end of every a line of font is 5 ~ 12mm；The a line of the fylfot and Article 2 side
It is to be made up of the sine wave of a cycle；Two adjacent fylfots have a line to overlap.
Specific embodiment two：Present embodiment from unlike specific embodiment one：The sine of a line
Ripple is connected by some camber line head and the tail successively with the sine wave on the Article 2 side and is constituted.Other steps and parameter be embodied as
Mode one is identical.
Specific embodiment three：Present embodiment from unlike specific embodiment one or two：The a line
The amplitude of sine wave is different from the amplitude of the sine wave on the Article 2 side.Other steps and parameter and specific embodiment one or
Two is identical.
Specific embodiment four：Unlike one of present embodiment and specific embodiment one to three：Described first
While sine wave cycle from the Article 2 while sine wave cycle it is different.Other steps and parameter and specific embodiment
One of one to three is identical.
Specific embodiment five：Unlike one of present embodiment and specific embodiment one to four：Described first
While sine wave amplitude with the Article 2 while sine wave amplitude it is identical.Other steps and parameter and specific embodiment
One of one to four is identical.
Specific embodiment six：Unlike one of present embodiment and specific embodiment one to five：Described first
While sine wave cycle with the Article 2 while sine wave cycle phase it is same.Other steps and parameter and specific embodiment
One of one to five is identical.
Specific embodiment seven：Unlike one of present embodiment and specific embodiment one to six：Described first
In, the Article 2, the Article 3 side and the Article 4 frontier juncture be in the centrosymmetry of the fylfot.Other steps and
Parameter is identical with one of specific embodiment one to six.
Specific embodiment eight：Unlike one of present embodiment and specific embodiment one to seven：Described is described
The sine wave on a line and the Article 2 side is connected by six articles of camber line head and the tail successively and is constituted.Other steps and parameter with it is concrete
One of embodiment one to seven is identical.
Specific embodiment nine：A kind of preparation method of GF structures touch screen of present embodiment is carried out according to the following steps：
First, the formation metal ink coating on base material；
2nd, toast the metal ink coating；
3rd, by baking after the metal ink coated laser sinter to form metal grill pattern；
4th, the unsintered metal ink coating is removed, obtains metal grill conductive layer；
5th, metal grill conductive layer is bound into ACF conducting resinls；
6th, the horizontal cabling area hot pressing FPC of the metal grill conductive layer of ACF conducting resinls to posting；
7th, to pressed FPC metal grill conductive layer fit transparent optical glue-line；
8th, the metal grill conductive layer and safety glass cover plate that post transparent optical glue-line are combined, obtain a kind of GF knots
Structure touch screen.
Present embodiment after baking removes solvent, by laser sintered, sinter metal ink coating that region formed with
Substrate produces welding effect, obtains the adhesive force for significantly increasing, and the adhesive force of unsintered metal ink coating is very poor, can profit
Removed with simple cleaning method, realize patterning of the metal ink coating in substrate surface.
After the completion of present embodiment sintering, as the metal ink coating in un-sintered region cannot be formed effectively with base material
Bonding, can so that the un-sintered part of metal ink coating is removed by the way of cleaning using cleanout fluid, so as to stay on base material with
What substrate bonding power was strong burns till conducting wire.
Present embodiment can be with using modes such as drip washing, flushing, rinsing, ultrasound wave cleanings.The cleanout fluid is selected from deionization
At least one in water, alcohols, ketone, alcohol ethers, ether-ether class or amide solvent.In the case where metal grill is not damaged,
Cleaning performance can be improved to add surfactant in cleanout fluid.
The step of present embodiment removes unsintered metal ink coating belongs to subtraction work similar to traditional etch process
Skill, but complete by only needing a step, and the metal material removed still is in nano-particle form rather than metal ion
Form, can reclaim conveniently by the method such as centrifugation or ultrafiltration (ultrafitration), and the metal for reclaiming is received
Rice grain is used directly for preparing nano metal ink, low in the pollution of the environment.
After the completion of present embodiment sintering, as the metal ink coating in un-sintered region cannot be formed effectively with base material
Bonding, can so that the un-sintered part of metal ink coating is removed by the way of cleaning using cleanout fluid, so as to stay on base material with
What substrate bonding power was strong burns till conducting wire, i.e. metal grill.The method of cleaning is without particular/special requirement, it is possible to use drip washing, flushing,
The modes such as rinsing, ultrasound wave cleaning.The cleanout fluid is selected from deionized water, alcohols, ketone, alcohol ethers, ether-ether class or amide
At least one in class solvent.In the case where metal grill is not damaged, can be carried with adding surfactant in cleanout fluid
High cleaning effect.
The step of present embodiment removes unsintered metal ink coating belongs to subtraction work similar to traditional etch process
Skill, but complete by only needing a step, and the metal material removed still is in nano-particle form rather than metal ion
Form, can reclaim conveniently by the method such as centrifugation or ultrafiltration (ultrafitration), and the metal for reclaiming is received
Rice grain is used directly for preparing nano metal ink, low in the pollution of the environment.
Specific embodiment ten：Present embodiment from unlike specific embodiment nine：Base material described in step one
Thickness is 50 μm ~ 200 μm.Other steps and parameter are identical with specific embodiment nine.
Specific embodiment 11：Present embodiment from unlike specific embodiment nine or ten：Described in step
Base material is PET film.Other steps and parameter are identical with specific embodiment nine or ten.
Specific embodiment 12：Unlike one of present embodiment and specific embodiment nine to ten one：Step one
Described in metal ink coating include metal nanoparticle, solvent and dispersing aid；Wherein, metal nanoparticle selected from particle diameter is
The copper of 1 ~ 100nm, Kufil or copper-nickel alloy nanoparticle；Solvent selected from deionized water, alcohols, ketone, alcohol ethers, ether-ether class,
It is a kind of in amide-type, hydro carbons or aromatic hydrocarbons；Dispersing aid selects small molecule dispersant, polymeric dispersant, ionic dispersant
Or one kind in non-ionic dispersing agent.Other steps and parameter are identical with one of specific embodiment nine to ten one.
The auxiliary agents such as reducing agent, defoamer, levelling agent can also be added in metal ink coating described in present embodiment.It is above-mentioned
Reducing agent, defoamer, levelling agent etc. select the conventional reagent of ink or paint field.
Specific embodiment 13：Unlike one of present embodiment and specific embodiment nine to ten two：Step one
Described in formed on base material metal ink coating using rotary coating, slit coating, scraper for coating, bar coating, spray
One kind in coating, print roll coating, silk screen printing, intaglio printing, hectographic printing, flexographic printing, bat printing or ink jet printing.Other
Step and parameter are identical with one of specific embodiment nine to ten two.
Specific embodiment 14：Unlike one of present embodiment and specific embodiment nine to ten three：Step one
Described in metal ink coating build be 0.5 μm ~ 5 μm.Other steps and parameter and specific embodiment nine to ten three
One of it is identical.
If the build of metal ink coating is less than 0.5 μm in present embodiment, then the metal grill for making is conductive
The resistance of film is higher；If the build of metal ink coating is more than 5 μm, the bottom of metal ink coating is difficult to sinter,
Fusion welding cannot occur with substrate surface, coming off easily occurs in the metal grill conducting film of making, break and resistance is higher
Problem.
Specific embodiment 15：Unlike one of present embodiment and specific embodiment nine to ten four：Step 2
Described in toast and carry out in vacuum drying oven, hot air drier or infrared baking box；The atmosphere of baking be air, nitrogen,
One kind in argon or carbon dioxide；Baking temperature is 80 DEG C ~ 150 DEG C.Other steps and parameter and specific embodiment nine to
One of 14 is identical.
The baking purpose of present embodiment is to remove the solvent and other volatile components in metal ink coating, in order to avoid this
A little materials are drastically evaporated during light sintering, and metal nanoparticle is sprayed from substrate, cause metal ink coating to form large number of orifices
Hole or white space.
Change to prevent base material from elasticity/plasticity change, contraction or warpage etc. occurring in present embodiment, and prevent metal
There is oxidation in nanoparticle, baking is preferably carried out in the temperature less than 150 DEG C, is more preferably carried out in the temperature less than 120 DEG C.Separately
On the one hand, if baking temperature is less than 80 DEG C, can cause the solvent and other volatile components in metal ink coating cannot
The probability for eliminating increases, therefore temperature of the temperature toasted preferably more than 80 DEG C is carried out, more preferably the temperature more than 90 DEG C
Degree is carried out.
Specific embodiment 16：Unlike one of present embodiment and specific embodiment nine to ten five：Step 3
Described in it is laser sintered be to adopt pulse laser beam that metal ink coating is sintered in the way of scanning.Other steps and ginseng
Number is identical with one of specific embodiment nine to ten five.
The patterning of present embodiment metal grill conducting film is realized by controlling the scanning pattern of pulse laser beam.Transmitting
The lasing light emitter of pulse laser beam can use gas laser, solid state laser, excimer laser.In order to reduce optics
Diffraction affects, the less 780nm titanium-doped sapphires Solid State Laser of optimal wavelength, 355nm Nd:(three times of YAG Solid State Lasers
Frequently), 266nm Nd:YAG Solid State Lasers (quadruple) and excimer laser.Wherein, excimer laser can be selected
With 351nm XeF excimer laser, 308nm XeCl excimer laser and 248nm KrF excimer laser.Wavelength is shorter
222nm KrCl excimer laser, 193nm ArF excimer laser and 157nm F2 excimer laser easily damage plastics base
Material, it is also higher to optical system requirement, do not recommend.The live width of metal grill and the focal spot size of laser beam, laser work(
The factors such as rate, scanning speed and pulse width are relevant.When being sintered using laser, for the focal spot size of laser beam, swash
The focal spot of light beam is less, is more readily available tiny sintering live width.The focused spot diameter of the laser beam that the present invention is used be preferably 1 ~
10μm.Preferably, the upper limit of the focused spot diameter of the laser beam is 3 μm, 10 μm, the lower limit of the focused spot diameter of the laser beam is 1 μm,
3 μm, the upper and lower bound can be in any combination.During laser scanning nano metal ink coating, heat is inevitably
It is diffused into outside scanning area from scanning area, can causes the nano metal ink coating of close region that sintering occurs, so as to cause
Sintering region is widened.Therefore, it is the impact that reduces thermal diffusion, needing to select appropriate laser power, sweeping according to sintering live width
Retouch speed and pulse width.Laser power is preferably 10 ~ 500mW, and the laser of this power bracket can be such that sintering circuit obtains enough
Low resistivity, and excessively high-power laser not only easily make sintering live width increase, it is also possible to cause sinter circuit ablation and
The damage of base material.Preferably, the upper limit of the laser power of the laser beam be 200mW, 500mW, the laser power of the laser beam
Lower limit is 10mW, 200mW, and the upper and lower bound can be in any combination.Under same laser power condition, scanning speed is faster,
Metal ink coating is shorter by laser exposure time, and heat conduction time is shorter, and the heat being diffused into outside scanning area is fewer, more holds
Tiny sintering live width is obtained easily；Therefore, laser scanning speed is preferably 100 ~ 1000 μm/s.Preferably, the laser beam is sharp
The upper limit of photoscanning speed be 300 μm/s, 1000 μm/s, the lower limit of the laser scanning speed of the laser beam is 100 μm/s, 300 μ
M/s, the upper and lower bound can be in any combination.Laser power and scanning speed need reasonably to select fit applications, if swashed
Luminous power is little and scanning speed is fast, then metal ink coating will be unable to sintering；, whereas if laser power scanning speed greatly
Partially slow, then not only sintering live width will increase, it is also possible to damage base material.Under same laser power condition, the pulse width of laser
Less, the heat being diffused into outside scanning area is fewer, is more beneficial for obtaining tiny sintering live width.Specifically, preferably use
The nanosecond laser of ultrashort pulse, picosecond laser and femtosecond laser.Present invention preferably uses femtosecond laser.In femtosecond laser and material
In mechanism, the electronics of material is obtained by the Multi-photon Nonlinear absorption pattern of incident laser is excited energy, scanning area
Interior temperature moment steeply rises, and considerably beyond the values of melting temperature of material.As the irradiation persistent period is only had femtosecond amount
Level, the time released energy by forms such as transfer, conversions much smaller than excited electron in material, (this time was nanometer to skin
Second-time), thus fundamentally avoid the impact of thermal diffusion.As laser intensity is spatially in gaussian shaped profile, laser
In focal spot center maximum intensity after line focus, when being intended to focal spot edge, strength reduction, if adjusting laser power so that burnt
The intensity of speckle center is just met for the multiphoton absorption threshold value of material, then the energy absorption and sphere of action in the course of processing be not
It is the region of whole focal beam spot institute irradiation, but is only limitted in the range of focal spot center position very little.Therefore femtosecond laser
The restriction of the beam diffraction limit can be broken through, realization is smaller in size than the submicron order processing of optical maser wavelength.For example, it is blue using titanium is mixed
Gem femto-second laser sinters Nano silver conductive ink, can produce silver-colored conducting wire of the live width less than 1 μm.
Embodiment：
A kind of preparation method of GF structures touch screen is carried out according to the following steps：
First, metal ink coating is formed using silk screen printing on base material；The thickness of the base material is 100 μm；The base material is
PET film；The metal ink coating includes metal nanoparticle, solvent and dispersing aid；Wherein, metal nanoparticle is grain
Copper nano-particle of the footpath for 1 ~ 100nm；Solvent is selected from deionized water, alcohols, ketone, alcohol ethers, ether-ether class, amide-type, hydro carbons
Or one kind in aromatic hydrocarbons；Dispersing aid is from small molecule dispersant, polymeric dispersant, ionic dispersant or nonionic point
It is a kind of in powder；The build of the metal ink coating is 0.5 μm ~ 5 μm；
2nd, toast the metal ink coating；The baking is carried out in vacuum drying oven, hot air drier or infrared baking box
's；
3rd, by baking after the metal ink coated laser sinter to form metal grill pattern；It is described it is laser sintered be adopt
Pulse laser beam is sintered in the way of scanning to metal ink coating；
4th, the unsintered metal ink coating is removed, obtains metal grill conductive layer；
5th, metal grill conductive layer is bound into ACF conducting resinls；
6th, the horizontal cabling area hot pressing FPC of the metal grill conductive layer of ACF conducting resinls to posting；
7th, to pressed FPC metal grill conductive layer fit transparent optical glue-line；
8th, the metal grill conductive layer and safety glass cover plate that post transparent optical glue-line are combined, obtain a kind of GF knots
Structure touch screen.
There are metal grill pattern, the wire netting trrellis diagram by laser sintered on metal grill conductive layer described in the present embodiment
Case is to intersect to be equipped with several fylfots on X direction of principal axis and Y direction of principal axis；The fylfot is made up of four edges, and first
Bar side and Article 3 frontier juncture are in the centrosymmetry of the fylfot；Article 2 side and Article 4 frontier juncture are in the center of the fylfot
Symmetrically；The distance between beginning and end of every a line of the fylfot is 5 ~ 12mm；The a line of the fylfot
It is to be made up of the sine wave of a cycle with Article 2 side；Two adjacent fylfots have a line to overlap.
The present embodiment is by being laid in multiple continuous intersections in X direction of principal axis, Y direction of principal axis by the insulation conductive filament of conductive layer
Fylfot so that Metal-Mesh patterns all no straight line in all directions, so as to fundamentally prevent Moire fringe
Produce；The distance of every a line beginning and end of the fylfot pattern of the present invention has reached 5 ~ 12mm, is completely suitable for big chi
The touch-control of very little and oversize.Integrated artistic of the present invention is simple, without the need for the equipment of complex and expensive, with low cost.
Claims (10)
1. a kind of GF structures touch screen, it is characterised in that a kind of GF structures touch screen includes toughened glass layer, transparent optical glue-line
With metal grill conductive layer；The metal grill conductive layer is fitted with toughened glass layer by transparent optical glue-line；
There is metal grill pattern by laser sintered on the metal grill conductive layer, the metal grill pattern is in X axle sides
Several fylfots are equipped with to intersection on Y direction of principal axis；The fylfot is made up of four edges, a line and Article 3
Frontier juncture is in the centrosymmetry of the fylfot；Article 2 side and Article 4 frontier juncture are in the centrosymmetry of the fylfot；Described ten thousand
The distance between beginning and end of every a line of font is 5 ~ 12mm；The a line of the fylfot and Article 2 side
It is to be made up of the sine wave of a cycle；Two adjacent fylfots have a line to overlap.
2. a kind of GF structures touch screen according to claim 1, it is characterised in that the sine wave of a line and institute
State the sine wave on Article 2 side and connected by some camber lines head and the tail successively and constitute.
3. a kind of GF structures touch screen according to claim 1, it is characterised in that the sine wave of a line shakes
Width is different from the amplitude of the sine wave on the Article 2 side.
4. a kind of GF structures touch screen according to claim 1, it is characterised in that a line, the Article 2
In, the Article 3 and the Article 4 frontier juncture is in the centrosymmetry of the fylfot.
5. a kind of GF structures touch screen according to claim 1, it is characterised in that the described a line and described
The sine wave on Article 2 side is connected by six camber line head and the tail successively and is constituted.
6. a kind of preparation method of GF structures touch screen as claimed in claim 1, it is characterised in that the system of GF structure touch screens
Preparation Method is carried out according to the following steps：
First, the formation metal ink coating on base material；
2nd, toast the metal ink coating；
3rd, by baking after the metal ink coated laser sinter to form metal grill pattern；
4th, the unsintered metal ink coating is removed, obtains metal grill conductive layer；
5th, metal grill conductive layer is bound into ACF conducting resinls；
6th, the horizontal cabling area hot pressing FPC of the metal grill conductive layer of ACF conducting resinls to posting；
7th, to pressed FPC metal grill conductive layer fit transparent optical glue-line；
8th, the metal grill conductive layer and safety glass cover plate that post transparent optical glue-line are combined, obtain a kind of GF knots
Structure touch screen.
7. a kind of preparation method of GF structures touch screen according to claim 6, it is characterised in that base described in step one
The thickness of material is 50 μm ~ 200 μm.
8. a kind of preparation method of GF structures touch screen according to claim 6, it is characterised in that gold described in step one
The build of category ink coating is 0.5 μm ~ 5 μm.
9. the preparation method of a kind of GF structures touch screen according to claim 6, it is characterised in that dry described in step 2
It is roasting to carry out in vacuum drying oven, hot air drier or infrared baking box；The atmosphere of baking is air, nitrogen, argon or two
One kind in carbonoxide；Baking temperature is 80 DEG C ~ 150 DEG C.
10. the preparation method of a kind of GF structures touch screen according to claim 6, it is characterised in that swash described in step 3
Light sintering is to adopt pulse laser beam that metal ink coating is sintered in the way of scanning.
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Cited By (3)
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|---|---|---|---|---|
| CN108723618A (en) * | 2018-05-31 | 2018-11-02 | 江苏大学 | Improve the laser scanning minimizing technology of metal grill edge quality and its performance |
| CN110673755A (en) * | 2019-08-28 | 2020-01-10 | 晟光科技股份有限公司 | Production process of small touch screen capable of reducing air leakage |
| CN111176498A (en) * | 2020-03-31 | 2020-05-19 | 朱恒 | Single-layer glass metal grid capacitive touch cover plate and preparation method thereof |
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| CN104461183A (en) * | 2013-09-18 | 2015-03-25 | 晨星半导体股份有限公司 | Electrode configuration of self-contained touch induction device |
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