CN106496913A - The preparation method of a kind of silicon chip/graphene oxide/poly-4 vinylpyridine brush/polypyrrole gold nano composites - Google Patents

The preparation method of a kind of silicon chip/graphene oxide/poly-4 vinylpyridine brush/polypyrrole gold nano composites Download PDF

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CN106496913A
CN106496913A CN201610859161.5A CN201610859161A CN106496913A CN 106496913 A CN106496913 A CN 106496913A CN 201610859161 A CN201610859161 A CN 201610859161A CN 106496913 A CN106496913 A CN 106496913A
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CN106496913B (en
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邢国科
王文钦
邹晗芷
商梦盈
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Ningbo University
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    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/10—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F292/00—Macromolecular compounds obtained by polymerising monomers on to inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/0605—Polycondensates containing five-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms
    • C08G73/0611—Polycondensates containing five-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms with only one nitrogen atom in the ring, e.g. polypyrroles
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    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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Abstract

The present invention relates to graphene-based field of compound material, the preparation method of a kind of silicon chip/graphene oxide/poly-4 vinylpyridine brush/polypyrrole gold nano composites is provided. preparation method provided by the invention, can prepare flower-shaped gold nano structure at graphene oxide/polymerization brush composite material surface. the composite of gained as surface reinforced Raman active substrate for detection of organic molecule 4 mercaptopyridines, shown extremely strong Raman active, corresponding detectable limit concentration can reach 10‑8M, has realized the trace detection to organic molecule.

Description

The preparation method of a kind of silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-gold nano composite
Technical field
The present invention relates to graphene-based field of compound material, more specifically, relate to a kind of preparation method who utilizes the polymer brush on graphene oxide surface to regulate and control gold nano structure in pyrroles's solution.
Background technology
Having become the focus of graphene-based field of compound material research with polymer brush grapheme modified (graphene oxide) surface. strand one end of polymer brush is grafted on Graphene (graphene oxide) surface, Graphene (the graphene oxide)/polymer brush composite forming not only has the light of Graphene (graphene oxide), the characteristics such as electricity, and because having of polymer brush is beneficial to the further functionalization of Graphene (graphene oxide). at present, the research of Graphene (graphene oxide)/polymer brush mainly concentrates on the chemical composition that how accurately regulates and controls polymerization brush, the aspects such as the length of polymer molecular chain, and to utilizing the research of functional group regulation and control noble metal nano structure formation Graphenes (graphene oxide)/polymer brush/noble metal composite-material on polymer brush strand less. the main cause that causes this situation is to be difficult at present utilize traditional method effectively to regulate and control yardstick and the pattern of noble metal nano on polymer brush surface. traditional method is to utilize the functional group on polymer brush strand to adsorb noble metal precursor body (as Ag+，AuCl4 -), utilize subsequently reducing agent (NaBH4) the noble metal precursor body ion original position being adsorbed on polymer brush is reduced into corresponding noble metal nano particles. due to NaBH4It is extremely strong reducing agent, reduction reaction speed is very fast, thereby can only form nano-scale noble metal structures on polymer brush surface, thereby limit graphite the range of application of alkene (graphene oxide)/polymer brush/noble metal composite-material, such as having limited gained composite on surface strengthen Raman (surface-enhanced Raman scattering, be called for short SERS) application in field. because optimal work for the noble metal nano structure of SERS substrate should have complicated pattern, (noble metal nano structure is sharp-pointed for these complicated patterns end, space between noble metal nano structure etc.) will provide " focus " for surface-enhanced Raman signal, thereby can be greatly improve Raman signal. and utilize the noble metal nano structure of little spherical structure prepared by polymer brush to increasing by conventional method hale graceful signal capabilities limited.
Summary of the invention
Receive in view of being difficult at present effectively to regulate and control noble metal at Graphene (graphene oxide)/polymerization brush composite material surface rice structure and morphology and size, the invention provides and a kind ofly new prepare flower-shaped at graphene oxide/polymerization brush composite material surface gold nano structural approach. the inventor etc. are through further investigation, final discovery: by " certainly causing photo-grafting polymerization technology " at graphene oxide (graphite oxide, GO) surface forms poly 4 vinyl pyridine (poly (4-vinylpyridene, P4VP)) brush, absorption gold chloride (HAuCl4) after, in pyrroles's solution, be adsorbed on the HAuCl on P4VP brush strand4Can be in the time that oxidizable pyrrole be become to polypyrrole (polypyrrole, PPy), self be reduced into gold (Au) nanostructured. we,, by controlling the reaction time, can obtain flower-shaped gold nano structure.
Main idea of the present invention is as follows,
The present invention is the preparation method of a kind of silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-gold nano composite, comprises step 1, step 2 and step 3,
Step 1: the silicon chip that has silica dioxide coating taking surface is substrate, by substrate aminofunctional, obtains amido modified silicon Sheet, drops in the ethanolic solution of graphene oxide (GO) on silica gel seal, utilizes described in seal stamp transfer method transfers to GO Amido modified silicon chip on, obtain silicon chip/GO;
Step 2: the silicon chip/GO of gained is dipped in the sealed tube that contains 4-vinylpridine (P4VP) monomer, uses ultraviolet light Irradiate 30-180min, reaction finishes rear taking-up silicon chip and with chloroformic solution flushing, obtains silicon chip/graphene oxide/poly-4-ethene Yl pyridines brush (silicon chip/GO/P4VP brush);
Step 3: the silicon chip of gained/GO/P4VP brush is immersed in aqueous solution of chloraurate, and soak time is 6-36h, after taking-up, with deionized water washing, obtaining absorption has AuCl4 -Silicon chip/GO/P4VP brush of ion, again the silicon chip of gained/GO/P4VP brush is immersed in pyrroles, reaction 10-180min, can obtain silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-metal/composite material (silicon chip/GO/P4VP/PPy-Au composite).
The invention has the beneficial effects as follows: using gained silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-gold nano (GO/P4VP/PPy-Au) composite as surface reinforced Raman active substrate for detection of organic molecule 4-mercaptopyridine (4-mercaptopyridine, 4-MP), corresponding detectable limit concentration can reach 10-8M, has realized the trace detection to organic molecule.
Brief description of the drawings
Fig. 1 is the Raman spectrum of silicon chip/GO;
Fig. 2 is the XPS figure of silicon chip/GO/P4VP brush;
Fig. 3 is the SEM figure of silicon chip/GO/P4VP/PPy-Au composite;
Fig. 4 is the XPS figure of silicon chip/GO/P4VP/PPy-Au composite;
Fig. 5 is the Raman spectrum of the 4-MP molecules in silicon chip/GO/P4VP/PPy-Au composite material surfaces of variable concentrations；
Detailed description of the invention
Below, the present invention is described in detail.
The present invention is a kind of silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-Jenner's nano composite material Preparation method, including step 1, step 2 and step 3,
Step 1：There is the silicon chip of silica dioxide coating as substrate with surface, by substrate aminofunctional, obtain amido modified silicon Piece, the ethanol solution of graphene oxide (GO) is dropped on silica gel seal, is transferred to GO using seal stamp transfer method described Amido modified silicon chip on, obtain silicon chip/GO；
Step 2：Silicon chip/the GO of gained is dipped in the seal pipe containing 4-vinylpridine (P4VP) monomer, ultraviolet light is used Irradiation 30-180min, reaction take out silicon chip and are rinsed with chloroformic solution after terminating, obtain silicon chip/graphene oxide/poly- 4- ethene Yl pyridines brush (silicon chip/GO/P4VP brushes)；
Step 3：The silicon chip of gained/GO/P4VP brushes are immersed in aqueous solution of chloraurate, soak time is 6-36h, after taking-up, It is washed with deionized, obtains being adsorbed with AuCl4 -The silicon chip of ion/GO/P4VP brushes, then the silicon chip of gained/GO/P4VP brushes are soaked Bubble reacts 10-180min in pyrroles, you can obtain silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-gold multiple Condensation material (silicon chip/GO/P4VP/PPy-Au composites).
In above-mentioned steps 1, substrate aminofunctional is obtained amido modified silicon chip, the method for functionalization has no especially limit Fixed, generally can be obtained by substrate is dipped in the silane coupler solution containing amino.Silane coupler containing amino is simultaneously It is not particularly limited, 3- aminopropyl triethoxysilanes, 3- aminopropyls-trimethoxy silane, γ-aminopropyltriethoxy two can be selected Any one in Ethoxysilane and γ-aminopropyltriethoxy dimethoxysilane.Solvent in silane coupler solution, has no It is particularly limited to, can such as selects benzene.Silane coupled agent concentration, is not particularly limited, and can be 3-30wt%.
In above-mentioned steps 1, in the ethanol solution of graphene oxide (GO), the concentration of GO is not particularly limited, usually 0.01-0.05mg/mL, within this range, GO can be uniformly dispersed in ethanol solution concentration.Using seal stamp transfer method by GO Be transferred on the silicon chip with amino, as substantial amounts of oxy radical is carried on GO, can interact with the amino on silicon chip, from And GO is firmly adhered on silicon chip.
In above-mentioned steps 2, the wavelength of the ultraviolet light for being used is 350nm.
In above-mentioned steps 3, the concentration of aqueous solution of chloraurate is not particularly limited, generally in 0.05wt%-2wt%.In step In rapid 3, pyrrole monomer is oxidative polymerization into polypyrrole by HAuCl4, and HAuCl4Au nanostructureds are reduced into itself.Additionally, on Step 1-3 is stated, if reaction temperature is not particularly illustrated, for 25-35 DEG C of room temperature condition.
Below, by the following examples present invention more particularly described below.Here, embodiment is merely to illustrate the present invention, no It is construed that limiting the scope of the invention.It is can to carry out in the case of without departing from its spirit and scope to implement the present invention Various changes and modifications.These change and improvement within the scope of the appended claims, it should be understood that into be the present invention one Part.
(embodiment 1)
Step 1：First, surface is had the silicon chip 3- aminopropyl triethoxysilane of the immersion containing 5% of silica dioxide coating In toluene solution, ultrasonic reaction 2 hours, so that obtain amido modified silicon chip.By 0.025mg/mL graphene oxides (GO) Ethanol solution is dropped on silica gel seal, GO is transferred on the silicon chip with amino using seal stamp transfer method, and natural drying is gone Remove ethanol, you can obtain the silicon chip of GO modifications.
Fig. 1 is the Raman spectrum of silicon chip/GO, as we can see from the figure D peaks (1335cm-1) and G peaks (1592cm-1).G peaks are represented Orderly graphite-like structure, and D peaks are the defect sturcture in Graphene, so as to prove that successfully silicon chip table is arrived in modification to GO Face.
Step 2：Silicon chip/GO is dipped in the seal pipe containing 4-vinylpridine monomer, ultraviolet light (wavelength under room temperature, is used 350nm) irradiate 2 hours, after reaction terminates, silicon chip/GO chloroform solvents rinse non-grafted to GO surfaces to remove repeatedly P4VP polymer, obtains silicon chip/graphene oxide/poly 4 vinyl pyridine brush (silicon chip/GO/P4VP brushes).
Fig. 2 is the XPS figures of silicon chip/GO/P4VP brushes, occurs in that obvious N 1s peaks in figure, and which belongs to P4VP, so as to prove P4VP brushes have successfully been grafted to GO surfaces.
Step 3：Silicon chip/GO/P4VP is brushed in gold chloride (HAuCl4) immersion 12 hours in the aqueous solution (1%wt), then take out It is washed with deionized, removes unadsorbed HAuCl4.HAuCl will be subsequently adsorbed with4Silicon chip/GO/P4VP brush be immersed in pyrroles In solution, 15min is reacted, that is, obtains silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-metal/composite material (GO/ P4VP/PPy-Au composites).
SEM figures of the Fig. 3 (A) for the silicon chip/GO/P4VP/PPy-Au composites of gained.As seen from the figure, flower-shaped gold nano is obtained Structure.
Fig. 4 is schemed for the XPS of silicon chip/GO/P4VP/PPy-Au composites, as can be seen from the figure Au4f peaks, so as to prove Jenner Rice structure has been formed.
(embodiment 2)
Step 1 and step 2, same as Example 1.
Step 3：
Silicon chip/GO/P4VP is brushed in gold chloride (HAuCl4) immersion 12 hours in the aqueous solution (1%wt), then take out spend from Sub- water washing, removes unadsorbed HAuCl4.HAuCl will be subsequently adsorbed with4Silicon chip/GO/P4VP brush be immersed in chromium solution In, react 30min, that is, obtain silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-metal/composite material (silicon chip/ GO/P4VP/PPy-Au composites).
Fig. 3 (B) is the SEM figures of the silicon chip/GO/P4VP/PPy-Au composites of gained, as seen from the figure, obtains flower-shaped gold nano Structure.
(embodiment 3)
Step 1 and step 2, same as Example 1.
Step 3：Silicon chip/GO/P4VP is brushed in gold chloride (HAuCl4) immersion 12 hours in the aqueous solution (1%wt), then take out It is washed with deionized, removes unadsorbed HAuCl4.HAuCl will be subsequently adsorbed with4Silicon chip/GO/P4VP brush be immersed in pyrroles In solution, 60min is reacted, that is, obtains silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-metal/composite material (silicon Piece/GO/P4VP/PPy-Au composites).
SEM figures of the Fig. 3 (C) for the GO/P4VP/PPy-Au composites of gained.As seen from the figure, flower-shaped gold nano structure is obtained.
(embodiment 4)
Step 1 and step 2, same as Example 1.
Step 3：Silicon chip/GO/P4VP is brushed in gold chloride (HAuCl4) immersion 12 hours in the aqueous solution (1%wt), then take out It is washed with deionized, removes unadsorbed HAuCl4.HAuCl will be subsequently adsorbed with4Silicon chip/GO/P4VP brush be immersed in pyrroles In solution, 120min is reacted, that is, obtains silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-metal/composite material (silicon Piece/GO/P4VP/PPy-Au composites).
SEM figures of the Fig. 3 (D) for the GO/P4VP/PPy-Au composites of gained.It can be seen that with the reaction time not With, flower-shaped gold nano structure P4VP brush that surface gradually becomes more and more intensive, be finally covered with whole P4VP brushes surface.
(reference example)
Silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-gold (silicon chip/GO/P4VP/PPy-Au) composite is made For Raman substrate detection 4- mercaptopyridines (4-MP)
We select silicon chip/GO/P4VP/PPy-Au composites that embodiment 4 is obtained as Raman substrate material.Prepare first Variable concentrations 4-MP ethanol solutions, are then dipped into silicon chip/GO/P4VP/PPy-Au composites in 4-MP solution, and 6-12 is little When after take out, spend ethanol wash 2-3 time, finally dried up with highly purified nitrogen stream, for Raman test.Fig. 5 is difference Raman spectrum of the 4-MP molecules of concentration in silicon chip/GO/P4VP/PPy-Au composite material surfaces, even if it will thus be seen that 4- MP concentration as little as 10-8The characteristic peak of M, 4-MP molecule can still show, reach the level of small molecule trace detection, so as to demonstrate,prove Silicon chip/GO/P4VP/PPy-Au composites prepared by the bright present invention are a kind of excellent base materials with Raman active.

Claims (2)

1. a kind of preparation method of silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-Jenner's nano composite material, wraps Step 1, step 2 and step 3 is included,
Step 1：There is the silicon chip of silica dioxide coating as substrate with surface, by substrate aminofunctional, obtain amido modified silicon Piece, the ethanol solution of graphene oxide (GO) is dropped on silica gel seal, is transferred to GO using seal stamp transfer method described Amido modified silicon chip on, obtain silicon chip/GO；
Step 2：Silicon chip/the GO of gained is dipped in the seal pipe containing 4-vinylpridine (P4VP) monomer, ultraviolet light is used Irradiation 30-180min, reaction take out silicon chip and are rinsed with chloroformic solution after terminating, obtain silicon chip/graphene oxide/poly- 4- ethene Yl pyridines brush (silicon chip/GO/P4VP brushes)；
Step 3：The silicon chip of gained/GO/P4VP brushes are immersed in aqueous solution of chloraurate, soak time is 6-36h, after taking-up, It is washed with deionized, obtains being adsorbed with AuCl4 -The silicon chip of ion/GO/P4VP brushes, then the silicon chip of gained/GO/P4VP brushes are soaked Bubble reacts 10-180min in pyrroles, you can obtain silicon chip/graphene oxide/poly 4 vinyl pyridine brush/polypyrrole-gold multiple Condensation material (silicon chip/GO/P4VP/PPy-Au composites).
2. silicon chip/graphene oxide according to claim 1/poly 4 vinyl pyridine brush/polypyrrole-gold nano composite wood The preparation method of material, described substrate aminofunctional is by substrate is dipped in the silane coupler solution containing amino Obtain.
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Cited By (6)

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CN107583627A (en) * 2017-08-31 2018-01-16 同济大学 A kind of Au nano particles/graphene oxide composite material and its preparation method and application
CN109594068A (en) * 2018-12-26 2019-04-09 郑州师范学院 A kind of preparation method of noble-metal-supported grapheme material
CN110028689A (en) * 2019-03-06 2019-07-19 宁波大学 A kind of preparation method of graphene oxide membrane/poly 4 vinyl pyridine/three-dimensional flower-shaped micron silver composite material
CN110038127A (en) * 2019-04-18 2019-07-23 合肥师范学院 Polypyrrole/gold composite hollow micro-sphere structure material preparation method and applications
CN110052257A (en) * 2019-03-06 2019-07-26 宁波大学 A kind of preparation method of the flower-shaped micron silver composite material of graphene oxide membrane/poly 4 vinyl pyridine/porous three-dimensional
CN113077919A (en) * 2021-03-25 2021-07-06 徐州医科大学 Metal Pd-loaded graphene/polypyrrole composite material and preparation method and application thereof

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107583627A (en) * 2017-08-31 2018-01-16 同济大学 A kind of Au nano particles/graphene oxide composite material and its preparation method and application
CN109594068A (en) * 2018-12-26 2019-04-09 郑州师范学院 A kind of preparation method of noble-metal-supported grapheme material
CN110028689A (en) * 2019-03-06 2019-07-19 宁波大学 A kind of preparation method of graphene oxide membrane/poly 4 vinyl pyridine/three-dimensional flower-shaped micron silver composite material
CN110052257A (en) * 2019-03-06 2019-07-26 宁波大学 A kind of preparation method of the flower-shaped micron silver composite material of graphene oxide membrane/poly 4 vinyl pyridine/porous three-dimensional
CN110038127A (en) * 2019-04-18 2019-07-23 合肥师范学院 Polypyrrole/gold composite hollow micro-sphere structure material preparation method and applications
CN110038127B (en) * 2019-04-18 2022-03-22 合肥师范学院 Preparation method and application of polypyrrole/gold composite hollow microsphere structure material
CN113077919A (en) * 2021-03-25 2021-07-06 徐州医科大学 Metal Pd-loaded graphene/polypyrrole composite material and preparation method and application thereof

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