CN106492583A - Purification of air mask - Google Patents

Purification of air mask Download PDF

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Publication number
CN106492583A
CN106492583A CN201610925233.1A CN201610925233A CN106492583A CN 106492583 A CN106492583 A CN 106492583A CN 201610925233 A CN201610925233 A CN 201610925233A CN 106492583 A CN106492583 A CN 106492583A
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China
Prior art keywords
purification
air
backboard
mask body
mask
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Granted
Application number
CN201610925233.1A
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Chinese (zh)
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CN106492583B (en
Inventor
吴东海
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Gao Sheng
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Xuzhou Joy Electromechanical Technology Co Ltd
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Priority to CN201610925233.1A priority Critical patent/CN106492583B/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2221/00Applications of separation devices
    • B01D2221/16Separation devices for cleaning ambient air, e.g. air along roads or air in cities
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/70Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
    • B01D2257/708Volatile organic compounds V.O.C.'s
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2258/00Sources of waste gases
    • B01D2258/06Polluted air

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Catalysts (AREA)
  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)

Abstract

A kind of purification of air mask, including mask body, described mask body is used for being enclosed within head, it is front apron and backboard that mask body has eye observation area, mask body facial, space between front apron and backboard forms cavity, front apron and backboard are respectively provided with the breathing through hole of uniform arrangement, and cavity is built with purification of air filtrate bag.

Description

Purification of air mask
Technical field
The present invention relates to a kind of purification of air mask, belongs to daily life field.
Background technology
Haze weather was increasingly severe in recent years, particularly winter, pm2.5 severe overweights, its formaldehyde of the place after finishing Content is also often exceeded, and the health that mist gives people brings greatly threat, and current common mask adsorbent is substantially with work Based on property charcoal, but activated carbon is limited to the absorption of particulate pollutant and filter effect, various Organic Waste Gas Pollution things in air Also gradually increase, acticarbon can not decompose removing these pollutant, even if being adsorbed onto on mask, also health is had Affect.
Content of the invention
For the problem that above-mentioned prior art is present, the present invention provides a kind of purification of air mask, and filtration effect of formaldehyde is good, Thermal property is good.
To achieve these goals, the technical solution used in the present invention is:A kind of purification of air mask, including mask sheet Body, described mask body are used for being enclosed within head, and it is front apron that mask body has eye observation area, mask body facial And backboard, space between front apron and backboard forms cavity, and front apron and backboard are respectively provided with the breathing of uniform arrangement Through hole, cavity is built with purification of air filtrate bag.
Described eye observation area is clear glass.
Front apron and backboard are made of plastics.
Described purification of air filtrate bag surface has micropore, and purification of air filtrate bag is built with modified Nano filtrate.
Described mask body is sealing structure.
The mask body of the present invention has front apron and backboard, and the space between which forms cavity, front apron and rear gear Plate is respectively provided with the breathing through hole of uniform arrangement, and cavity can earn guarantee ventilation intensity, by purifying built with purification of air filtrate bag Filtrate purify air, purifies haze and formaldehyde and there is good effect, and mask is sealed construction, winter cold performance Good.
Description of the drawings
Fig. 1 is the schematic diagram of the present invention.
Fig. 2 is purification of air filtrate inclusion composition.
1st, mask body, 2, eye observation area, 3, cavity, 4, purification of air filtrate bag, 5, backboard, 6, front apron.
Specific embodiment
The invention will be further described for 1-2 and embodiment below in conjunction with the accompanying drawings.
A kind of purification of air mask, including mask body 1, described mask body is used for being enclosed within head, and mask body has It is front apron 6 and backboard 5 to have eye observation area 2, mask body facial, and the space between front apron and backboard is formed Cavity 3, front apron and backboard are respectively provided with the breathing through hole of uniform arrangement, and cavity is built with purification of air filtrate bag 4.
Described eye observation area is clear glass.
Front apron and backboard are made of plastics.
Described purification of air filtrate bag surface has micropore, and purification of air filtrate bag is built with purification filtrate.
Described mask body is sealing structure.
The mask body of the present invention has front apron and backboard, and the space between which forms cavity, front apron and rear gear Plate is respectively provided with the breathing through hole of uniform arrangement, and cavity can earn guarantee ventilation intensity, by purifying built with purification of air filtrate bag Filtrate purify air, purifies haze and formaldehyde and there is good effect, and mask is sealed construction, winter cold performance Good.
Described filtrate is modified Nano filtrate, for formaldehyde adsorption:The concrete preparation method of described modified Nano filtrate As follows:
Embodiment 1
Prepare choline chloride, cetyl trimethylammonium bromide both organic formwork agent mol ratios 1:3 sample.
0.02mol choline chlorides, 0.06mol cetyl trimethylammonium bromide, 5ml Ludox, 0.06mol meta-aluminic acids Sodium, the sodium hydroxide solution of 2mol/L 12ml, 98% sulphuric acid of 24ml, 0.01mol silicon dioxide powders, 0.001mol praseodymium nitrates, 0.001mol cerous nitrates, 300ml deionized waters.
Step 1, first by NaAlO2, NaOH, deionized water ultrasonic wave concussion 3h under neon atmosphere;
Step 2, by 0.06molNaAlO2,90 DEG C of oil bath heatings are completely molten under magnetic stirring for 2mol/L 12ml NaOH solutions Solution forms sodium aluminate transparent liquid in 200ml deionized waters;
Step 3, by Ludox, the first ultrasonic wave concussion 3h under neon atmosphere of sulphuric acid, then by 5ml Ludox with per minute 40 drops Speed be added drop-wise to 90 DEG C of oil bath heatings 2h of magnetic agitation in sodium aluminate transparent liquid, then by 98% sulphuric acid of 10ml with per minute 15 The speed of drop is added drop-wise to magnetic agitation oil bath heating 2h in above-mentioned solution and makes coagulant liquid;
Step 4, by 0.02mol choline chlorides, 0.06mol cetyl trimethylammonium bromide organic formwork agent under argon atmosphere Ultrasonic wave concussion 3h, is then added in above-mentioned solution;Divide 4 additions, add a quarter every time, in magnetic force after adding every time Stirring 90 DEG C of 2h of oil bath heating;
Step 5, by above-mentioned solution by drainage device pour into politef be liner reactor in, then reactor is put into 250kpa is boosted to the speed of 15kap/min in microwave reactor, temperature rises to 180 DEG C with the speed of 25 DEG C/min, Crystallization 48h under helium atmosphere;
Step 6 and then 0.01mol SiO 2 powders are added to 90 DEG C of 6h of magnetic agitation oil bath heating in above-mentioned crystallization liquid;
Step 7 and then above-mentioned solution ph is adjusted into faintly acid with 98% sulphuric acid(Ph values are about 6-7);
Step 8, by 0.001mol praseodymium nitrates, 0.001mol cerous nitrates first pass through under 20%Ar+50% CO2+30%CO atmosphere ultrasound Ripple shakes 3h, is then added drop-wise to 90 DEG C of 2h of Deca side magnetic agitation oil bath heating inside above-mentioned solution respectively;
Step 9, by above-mentioned solution by drainage device pour into politef be liner reactor in, then reactor is put into 550kpa is boosted to the speed of 20kap/min in microwave reactor, temperature rises to 450 DEG C with the speed of 25 DEG C/min, Crystallization 12h under 30%Ar+70% CO2 atmosphere;
Step 10 and then filtration under vacuum pump, removing moisture under vacuum rotary evaporator, 110 DEG C of dryings of air dry oven, Obtain nano crystals Pr, Ce-Y/Beta modified filter materials.
Embodiment 2 prepares choline chloride, cetyl trimethylammonium bromide both organic formwork agent mol ratios 1:1, i.e., 0.02mol choline chlorides, 0.02mol cetyl trimethylammonium bromide, remaining raw material are same as Example 1, preparation method industry Same as Example 1.
Embodiment 3 prepares choline chloride, cetyl trimethylammonium bromide both organic formwork agent mol ratios 1:2, i.e., 0.02mol choline chlorides, 0.04mol cetyl trimethylammonium bromide, remaining raw material are same as Example 1, preparation method industry Same as Example 1.
Embodiment 4 prepares choline chloride, cetyl trimethylammonium bromide both organic formwork agent mol ratios 1:5, i.e., 0.02mol choline chlorides, 0.1mol cetyl trimethylammonium bromide, remaining raw material are same as Example 1, preparation method industry with Embodiment 1 is identical.
Embodiment 5 prepares choline chloride, cetyl trimethylammonium bromide both organic formwork agent mol ratios 2:1, i.e., 0.04mol choline chlorides, 0.02mol cetyl trimethylammonium bromide, remaining raw material are same as Example 1, preparation method industry Same as Example 1.
Embodiment 6 prepares choline chloride, cetyl trimethylammonium bromide both organic formwork agent mol ratios 3:1, i.e., 0.06mol choline chlorides, 0.02mol cetyl trimethylammonium bromide, remaining raw material are same as Example 1, preparation method industry Same as Example 1.
With 1 all same, difference is implemented, comparative example 1, preparation method are that all steps do not contain magnetic stirring.
With 1 all same, difference is implemented, comparative example 2, preparation method are that organic formwork agent comprises only single choline chloride 0.02mol.
With 1 all same, difference is implemented, comparative example 3, preparation method are that organic formwork agent comprises only single cetyl three Methyl bromide ammonium 0.02mol.
Comparative example 4, preparation method with implement 1 all same, difference is, step 8, by 0.001mol praseodymium nitrates, 0.001mol cerous nitrates first pass through ultrasonic wave concussion 3h under helium atmosphere, are then added drop-wise to Deca side magnetic inside above-mentioned solution respectively Power stirs 90 DEG C of 2h of oil bath heating.
Comparative example 5, preparation method with implement 1 all same, difference is, step 9, pours above-mentioned solution by drainage device into During politef is for the reactor of liner, then reactor is put in microwave reactor with the speed liter of 20kap/min 550kpa is pressed onto, temperature rises to 450 DEG C with the speed of 25 DEG C/min, crystallization 12h under oxygen atmosphere.
Absorption methanol effect assessment,
In 2m3The formalin of 0.6ml volumes in seal box, is measured, is put in surface plate, be placed in seal box two at 1 meter Individual pallet makes formaldehyde volatilize naturally on one of them, stands 24 hours, surveys spirit measurement concentration of formaldehyde with formaldehyde speed.Will after 24h The filtrate of the various ratios for preparing is placed in surface plate, is placed on another of middle two pallets of sealing at rice in pallet, filter Material is exposed in the air containing formaldehyde, measures concentration of formaldehyde, then measure 0.4ml formaldehyde and be added to table at 1m after one week In the ware of face.Do altogether 12 this devices to test together.
One different filtrate formaldehyde adsorptions of table compare:
Test result indicate that nanometer filtrate formaldehyde adsorption effect prepared by embodiment 1 is preferably, and other ratio group adsorption effects with The gap of embodiment 1 is larger, it is seen that " organic formwork agent utilizes choline chloride, cetyl trimethylammonium bromide mol ratio 1:3, By 0.001mol praseodymium nitrates, 0.001mol cerous nitrates first pass through ultrasonic wave concussion 3h under 20%Ar+50% CO2+30%CO atmosphere, so It is added drop-wise to 90 DEG C of 2h of Deca side magnetic agitation oil bath heating inside above-mentioned solution afterwards respectively, above-mentioned solution is poured into by drainage device During politef is for the reactor of liner, then reactor is put in microwave reactor with the speed liter of 20kap/min 550kpa being pressed onto, temperature rises to 450 DEG C with the speed of 25 DEG C/min, crystallization 12h under 30%Ar+70% CO2 atmosphere " these change The factor of property has good effect for filtrate formaldehyde adsorption.Its nano crystals Pr, Ce-Y/Beta modified filter materials are very excellent Different absorbing formaldehyde performance, and which filters the effect of haze also very remarkably, and the filtrate in embodiment 1 is micro- 5 for diameter The haze granule of rice can reach 98% stop rate.

Claims (5)

1. a kind of purification of air mask, including mask body, described mask body is used for being enclosed within head, and mask body has eye Portion observation area, mask body facial are front apron and backboard, and the space between front apron and backboard forms cavity, front Baffle plate and backboard are respectively provided with the breathing through hole of uniform arrangement, and cavity is built with purification of air filtrate bag.
2. a kind of purification of air mask according to claim 1, it is characterised in that described eye observation area is transparent glass Glass.
3. a kind of purification of air mask according to claim 2, it is characterised in that front apron and backboard are by plastics system Into.
4. a kind of purification of air mask according to claim 3, it is characterised in that described purification of air filtrate bag surface There is micropore, purification of air filtrate bag is built with modified Nano filtrate.
5. a kind of purification of air mask according to claim 1, it is characterised in that described mask body is sealing knot Structure.
CN201610925233.1A 2016-10-30 2016-10-30 Air purifying mask Active CN106492583B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610925233.1A CN106492583B (en) 2016-10-30 2016-10-30 Air purifying mask

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Application Number Priority Date Filing Date Title
CN201610925233.1A CN106492583B (en) 2016-10-30 2016-10-30 Air purifying mask

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CN106492583B CN106492583B (en) 2020-07-03

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109603023A (en) * 2018-11-08 2019-04-12 泉州台商投资区华林设计有限公司 A kind of portable air cleaning mask being used in industrial environment

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063926A (en) * 1990-04-12 1991-11-12 Donaldson Company, Inc. Respirator cartridge with sealant dispersion member
CN1173138A (en) * 1995-01-20 1998-02-11 美国3M公司 Respirator and filter cartridge
CN2650791Y (en) * 2003-09-19 2004-10-27 宋争放 Sealed protective head mask
CN101415467A (en) * 2006-03-31 2009-04-22 3M创新有限公司 Full face respiratory protection device
CN201256642Y (en) * 2008-08-07 2009-06-17 崔艳明 Multifunctional mask
CN204601417U (en) * 2015-05-12 2015-09-02 李杭 A kind of haze helmet
CN105142734A (en) * 2013-03-15 2015-12-09 斯科特科技公司 Reconfigurable full facemask having a cartridge module for respiratory protection

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063926A (en) * 1990-04-12 1991-11-12 Donaldson Company, Inc. Respirator cartridge with sealant dispersion member
CN1173138A (en) * 1995-01-20 1998-02-11 美国3M公司 Respirator and filter cartridge
CN2650791Y (en) * 2003-09-19 2004-10-27 宋争放 Sealed protective head mask
CN101415467A (en) * 2006-03-31 2009-04-22 3M创新有限公司 Full face respiratory protection device
CN201256642Y (en) * 2008-08-07 2009-06-17 崔艳明 Multifunctional mask
CN105142734A (en) * 2013-03-15 2015-12-09 斯科特科技公司 Reconfigurable full facemask having a cartridge module for respiratory protection
CN204601417U (en) * 2015-05-12 2015-09-02 李杭 A kind of haze helmet

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109603023A (en) * 2018-11-08 2019-04-12 泉州台商投资区华林设计有限公司 A kind of portable air cleaning mask being used in industrial environment

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Effective date of registration: 20200605

Address after: 264400 No. 25 duo Shan Road, Wendeng Economic Development Zone, Shandong, Weihai

Applicant after: WEIHAI HAINA BAICHUAN PHARMACEUTICAL GROUP Co.,Ltd.

Address before: 221000 Jiangsu city of Xuzhou province Xuzhou high tech Industrial Development Zone, Second Industrial Park, Qianjiang Road No. 23

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Effective date of registration: 20220308

Address after: 264400 No. 21-1, Dalian Road, Wendeng Economic Development Zone, Weihai City, Shandong Province

Patentee after: Mingchuan (Weihai) Pharmaceutical Co.,Ltd.

Address before: No.25, Duoshan Road, Wendeng Economic Development Zone, Weihai City, Shandong Province 264400

Patentee before: WEIHAI HAINA BAICHUAN PHARMACEUTICAL GROUP CO.,LTD.

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Effective date of registration: 20220831

Address after: No.25, Duoshan Road, Wendeng Economic Development Zone, Weihai City, Shandong Province 264400

Patentee after: Gao Sheng

Address before: 264400 No. 21-1, Dalian Road, Wendeng Economic Development Zone, Weihai City, Shandong Province

Patentee before: Mingchuan (Weihai) Pharmaceutical Co.,Ltd.

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