For the basis cranii repair apparatus through butterfly Operation of Pituitary Adenomas
Technical field
The present invention relates to technical field of medical instruments, more particularly to a kind of basis cranii repairing being used for through butterfly Operation of Pituitary Adenomas
Device.
Background technology
Pituitary adenoma is current encephalic incidence of disease second tumour, is preferred through the excision of sphenoid sinus Minimally Invasive Surgery.Due to postoperative
Leakage of cerebrospinal caused by basis cranii bony defect is the most common complication of the operation, can cause intracranial infection, threatens patient vitals,
Restrict operative effect.At present, clinically Post operation repairs the cranium as caused by operation usually using meninx sticking patch or schneiderian membrane valve
Bottom defect, prevents postoperative cerebrospinal from leaking.Repair efficiency using meninx sticking patch is bad, lacks effective physical support, often results in and repair
Failure is mended, needs second operation to be repaired, increase infection probability.Patient's art can be then had a strong impact on by the way of schneiderian membrane valve
Smell recovers afterwards, there are about the 40% lifelong anosmia of probability.Therefore, it is badly in need of one kind at present effectively through butterfly Operation of Pituitary Adenomas
Skull base defects repair apparatus afterwards.
The content of the invention
Present invention proposition is a kind of to be used for the basis cranii repair apparatus through butterfly Operation of Pituitary Adenomas, in the prior art can not solve
The problem of Efficient software patching skull defeci.
The a kind of of the present invention is used for the basis cranii repair apparatus through butterfly Operation of Pituitary Adenomas, including:First stifled disk and formation exist
The waist support of the described first stifled side of disk first, the described first stifled disk and waist support are metallic netted structural, and the of the described first stifled disk
Covered with the first flexible barrier layers, the area of first flexible barrier layers is more than the area of the described first stifled disk for two side surfaces,
And stretch out the first stifled plate edge in surrounding.
Wherein, the surface of the described first stifled side of disk first is sphere, and the centre of sphere of the sphere is located at the surface back of the body of the first side
From the side of the waist support.
Wherein, the waist support is circular platform type, and disk is blocked up in one end connection described first of microcephaly.
Wherein, the described first stifled disk and waist support are integrally formed.
Wherein, the second stifled disk of metallic netted structural is included, the waist restitope is in the described first stifled disk and the second stifled disk
Between.
Wherein, the described second stifled card to the surface of the waist support side formed with the second flexible barrier layers, described second
The area of flexible barrier layers is more than the area of the described second stifled disk, and stretches out the second stifled plate edge in surrounding.
Wherein, the described second stifled card be sphere to the surface of the waist support side, and the centre of sphere of the sphere is positioned at second
Card is blocked up to the side of the first stifled disk.
Wherein, the described second stifled disk and waist support are integrally formed, and the first stifled disk, the second stifled disk and the respective axis of waist support are total to
Line.
The basis cranii repair apparatus through butterfly Operation of Pituitary Adenomas that is used for of the present invention obstructs by the way that the first stifled disk and first are flexible
The skull defeci that layer can be blocked effectively after butterfly Operation of Pituitary Adenomas, prevents postoperative cerebrospinal from leaking.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, without having to pay creative labor, may be used also
To obtain other accompanying drawings according to these accompanying drawings.
Fig. 1 is a kind of structural representation for the basis cranii repair apparatus through butterfly Operation of Pituitary Adenomas of the present invention;
Fig. 2 is that the another kind of the present invention is used for the structural representation of the basis cranii repair apparatus through butterfly Operation of Pituitary Adenomas.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other under the premise of creative work is not made
Embodiment, belong to the scope of protection of the invention.
First embodiment of the invention be used for the basis cranii repair apparatus through butterfly Operation of Pituitary Adenomas as shown in figure 1, including:The
One blocks up disk 1 and is formed in the first waist support 2 for blocking up the side of disk 1 first, and the first stifled disk 1 and waist support 2 are metallic netted structural, and first is stifled
Second side surface S2 of disk 1 is covered with the first flexible barrier layers 3.The area of first flexible barrier layers 3 is more than the face of the first stifled disk 1
Product, and stretch out the first stifled edge of disk 1 in surrounding.
First stifled disk 1 and waist support 2 form the skeleton of the basis cranii repair apparatus, and are metallic netted structural, have certain
Toughness, can compress or bend and can stretching, extension and restore, and supportive is good.In skull of the repairing after butterfly Operation of Pituitary Adenomas
During defect, the skeleton of the metallic netted structural is compressed in sleeve pipe (a kind of delivery instrument), determined push rod front end through nasal cavity
After position to skull perforate/wound site, the patcher being enclosed in advance in sleeve pipe is slowly released sleeve pipe by rotation/promotion push rod,
Sleeve pipe is removed together with push rod again after first stifled disk 1 is promoted into wound (now waist support 2 is stuck at wound, with the whole patcher of fixation)
Go out patient's nasal cavity.First stifled disk 1 and waist support 2 stretch at once after being pushed out sleeve pipe, restore Fig. 1 shape.And first is flexible
The area of barrier layer 3 is more than the area of the first stifled disk 1, and stretches out the edge of the first stifled disk 1, the first flexible resistance at edge in surrounding
Interlayer 3 is attached to skull inner surface, effectively prevent cerebrospinal fluid outflow.
In the present embodiment, the surface S1 of the first stifled side of disk 1 first is sphere, and the centre of sphere of the sphere is located at the table of the first side
Face S1 deviates from the side of waist support 2 so that surface S1 preferably can be bonded with skull inner surface, the first flexible barrier layers of edge
3 are also bonded even closer with skull inner surface, even if head has larger rock to there will not be cerebrospinal fluid outflow.
Waist support 2 is circular platform type, and disk 1 is blocked up in one end connection first of microcephaly, and this structure prevents from being given a shock or touching on head
Whole patcher may come off and enter skull when hitting.
In the present embodiment, the first stifled disk 1 and waist support 2 are integrally formed, i.e., form overall skeleton by wire netting, structure is more firm
Gu.
Second embodiment of the invention is used for the basis cranii repair apparatus through butterfly Operation of Pituitary Adenomas as shown in Fig. 2 first
The second stifled disk 4 on the basis of embodiment also including metallic netted structural, waist support 2 positioned at the first stifled disk 1 and second block up disk 2 it
Between.Second stifled disk 4 has the function that to prevent patcher from coming off, therefore waist support 2 is straight barrel type.
In the present embodiment, the second stifled disk 4 is flexible formed with the second flexible barrier layers 5, second towards the surface of the side of waist support 2
The area of barrier layer 5 is more than the area of the second stifled disk 4, and stretches out the second stifled edge of disk 4 in surrounding, and this structure is further strengthened
The function of preventing cerebrospinal fluid from flowing out, and also avoid interpenetrating for liquid inside and outside at skull wound.
Second stifled disk 4 be sphere towards the surface of the side of waist support 2, and the centre of sphere of the sphere blocks up disk 4 towards the positioned at second
The side of one stifled disk 1.This structure causes the second stifled disk 4 preferably to be pasted towards the surface energy of the side of waist support 2 with skull outer surface
Close, the second flexible barrier layers 5 of edge are also bonded even closer with skull outer surface.
Second stifled disk 5 and waist support 2 are integrally formed, and the first stifled disk 1, second blocks up 2 respective axis collinear of disk 4 and waist support,
Patcher overall structure is uniform, and making at skull wound stress, also evenly fixation is more firm.
The foregoing is only presently preferred embodiments of the present invention, be not intended to limit the invention, it is all the present invention spirit and
Within principle, any modification, equivalent substitution and improvements made etc., it should be included in the scope of the protection.