CN106483601B - A kind of polarization beam apparatus - Google Patents
A kind of polarization beam apparatus Download PDFInfo
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- CN106483601B CN106483601B CN201510526708.5A CN201510526708A CN106483601B CN 106483601 B CN106483601 B CN 106483601B CN 201510526708 A CN201510526708 A CN 201510526708A CN 106483601 B CN106483601 B CN 106483601B
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- waveguide
- straight
- crossing
- polarization beam
- beam apparatus
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/126—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind using polarisation effects
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/105—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type having optical polarisation effects
Abstract
The invention discloses a kind of polarization beam apparatus, including straight-through waveguide and crossing waveguide, there is interval and asymmetric between straight-through waveguide and crossing waveguide, the coupled waveguide of straight-through waveguide be the secondarily etched waveguide of fixed shape, and the coupled waveguide of crossing waveguide is progressive slab waveguide.Polarization beam apparatus disclosed by the invention, that there are difficulty of processing for solving the problems, such as the polarization beam apparatus of the prior art is big, needs complicated or even off-gauge processing step, process allowance small.
Description
Technical field
The present invention relates to optical communication field more particularly to a kind of polarization beam apparatus.
Background technique
Currently, Polarization Control plays very crucial effect, such as communication, bio-sensing, quantum in many application fields
Optics.The Polarization Control device of high efficiency and small size has very important application value.Polarization beam apparatus in optic communication
(polarization beam splitter, alternatively, polarization splitter and rotator) is a kind of integrated
Opto-electronic device realizes the separation of transverse electric (TE) mould and horizontal magnetic (TM) mould, in silicon light related communication chip, also needs to realize TM
Mould is converted to TE ' mould.
Currently, the implementation method of polarization beam apparatus is based primarily upon two-dimensional grating and waveguide two major classes, wherein based on waveguide
Method can be divided into Evolution Modes (mode evolution) and Mode Coupling (mode coupling) again.It can based on Mode Coupling
In a manner of using asymmetric waveguides, for example, in the prior art, leading directly to waveguide (waveguide A) and using slab waveguide, crossing waveguide
(waveguide B) uses progressive secondarily etched waveguide.However, in the above scheme, carrying out width adjustment to secondarily etched waveguide
Difficulty of processing is very big, and existing processing technology is difficult to realize the silicon waveguide that width is less than 100nm.As it can be seen that existing polarization beam apparatus
That there are difficulty of processing is big for implementation, needs complicated or even off-gauge processing step, the problems such as process allowance is small.
Summary of the invention
In order to solve the above technical problem, the present invention provides a kind of polarization beam apparatus, in the prior art inclined for solving
Vibration beam splitter has that difficulty of processing is big, needs complicated or even off-gauge processing step, process allowance small.
In order to reach above-mentioned technical purpose, the present invention provides a kind of polarization beam apparatus, comprising: straight-through waveguide and intersection wave
It leads, the coupled waveguide of straight-through waveguide is the secondarily etched waveguide of fixed shape, and the coupled waveguide of crossing waveguide is progressive bar shaped
Waveguide leads directly between waveguide and crossing waveguide and there is interval and asymmetric.
Further, transverse electric (TE) mould signal is inputted from the input waveguide of straight-through waveguide, from the output waveguide of straight-through waveguide
Output；Horizontal magnetic (TM) mould signal is inputted from the input waveguide of straight-through waveguide, and mode is converted to transverse electric (TE ') in coupled waveguide
Mould, and exported from the output waveguide of crossing waveguide.
Further, the coupled waveguide of waveguide is led directly to as by the L-type waveguide of secondarily etched realization.
Further, the width of the coupled waveguide of crossing waveguide becomes larger along optical propagation direction.
Further, the effective refractive index of the TE mould of straight-through waveguide is greater than the effective refractive index of the TE mould of crossing waveguide；Directly
The effective refractive index of the TM mould of logical waveguide is equal to the effective refractive index of the TE mould of crossing waveguide.
Further, above-mentioned polarization beam apparatus further include: the covering being covered on straight-through waveguide and crossing waveguide and position
Buried layer below straight-through waveguide and crossing waveguide, the Refractive Index of Material for leading directly to waveguide and crossing waveguide are greater than covering and buried layer
Refractive Index of Material.
Further, the material of waveguide and crossing waveguide is led directly to as silicon, and the material of covering and buried layer is silica.
Further, the width for leading directly to waveguide is greater than the width of crossing waveguide.
Further, the width for leading directly to waveguide is 550nm, and the non-etched portions width for leading directly to waveguide is 400nm, leads directly to wave
The height for the highest part led is 220nm, and the height of etched portions is 150nm, and the width of crossing waveguide is gradually increased from 250nm
To 300nm, the height of crossing waveguide is 220nm.
Further, 200nm is divided between leading directly between waveguide and crossing waveguide.
Further, the length for leading directly to the coupled waveguide of waveguide and crossing waveguide is more than or equal to 100 μm.
In the present invention, polarization beam apparatus includes straight-through waveguide and crossing waveguide, is deposited between straight-through waveguide and crossing waveguide
At interval and asymmetric, the coupled waveguide of straight-through waveguide be the secondarily etched waveguide of fixation shape, the coupled waveguide of crossing waveguide
For progressive slab waveguide.Compared with prior art, the processing is simple for polarization beam apparatus provided by the invention, solves the prior art
Polarization beam apparatus there is a problem of that difficulty of processing is big, and realize complementary metal oxide semiconductor (CMOS,
Complementary Metal Oxide Semiconductor) silicon light technology compatibility, without complicated or even off-gauge technique
Step, the progressive structure of crossing waveguide allow processing technology tolerance big, reached device size is small, coupling efficiency is high, loss is small,
The small effect of crosstalk.Moreover, in embodiments of the present invention, device minimum dimension parameter is not more than under existing silicon light processing technology
Minimum feature size.
Detailed description of the invention
Fig. 1 is the schematic diagram of polarization beam apparatus provided in an embodiment of the present invention；
Fig. 2 is the top view of the asymmetric coupled waveguide of polarization beam apparatus provided in an embodiment of the present invention；
Fig. 3 is the sectional view of the asymmetric coupled waveguide of polarization beam apparatus provided in an embodiment of the present invention；
Fig. 4 is electric field intensity map when polarization beam apparatus provided in an embodiment of the present invention inputs TE mould；
Fig. 5 is electric field intensity map when polarization beam apparatus provided in an embodiment of the present invention inputs TM mould；
Fig. 6 is the relational graph for inputting the insertion loss and coupling length of TE signal；
Fig. 7 is the relational graph for inputting the polarization conversion loss and coupling length of TM signal；
Fig. 8 is the crosstalk for inputting TE signal and the relational graph of coupling length；
Fig. 9 is the crosstalk for inputting TM signal and the relational graph of coupling length；
Figure 10 be waveguide B effective refractive index with waveguide B width WB variation diagram；
The effective refractive index that Figure 11 is waveguide A is with the variation diagram of width WAe；
Figure 12 is variation diagram of the twin-guide mode mixture situation with the width WB of waveguide B.
Specific embodiment
The embodiment of the present invention is described in detail below in conjunction with attached drawing, it should be understood that embodiments described below
Only for the purpose of illustrating and explaining the present invention and is not intended to limit the present invention.
The embodiment of the present invention provides a kind of polarization beam apparatus, including straight-through waveguide and crossing waveguide, leads directly to waveguide and intersects
There is interval and asymmetric between waveguide, the coupled waveguide of straight-through waveguide be the secondarily etched waveguide of fixation shape, crossing waveguide
Coupled waveguide be progressive slab waveguide.
Wherein, transverse electric (TE) mould signal is inputted from the input waveguide of straight-through waveguide, is exported from the output waveguide of straight-through waveguide；
Horizontal magnetic (TM) mould signal is inputted from the input waveguide of straight-through waveguide, and mode is converted to transverse electric (TE ') mould in coupled waveguide, and from
The output waveguide of crossing waveguide exports.
Wherein, the coupled waveguide of waveguide is led directly to as by the L-type waveguide of secondarily etched realization.The coupled waveguide of crossing waveguide
Width become larger along optical propagation direction, this progressive structure makes device have good technique mismachining tolerance tolerance.
Wherein, the effective refractive index of the TE mould of straight-through waveguide is greater than the effective refractive index of the TE mould of crossing waveguide, thus real
The TE mould for now leading directly to waveguide is not coupled to crossing waveguide；The effective refractive index of the TM mould of straight-through waveguide is equal to the TE of crossing waveguide
The effective refractive index of mould, to realize the TM mode coupling of straight-through waveguide to crossing waveguide.
Wherein, the width for leading directly to waveguide is greater than the width of crossing waveguide.The height of straight-through waveguide and crossing waveguide is using existing
There is the common height of processing technology.The Design of length of straight-through waveguide and crossing waveguide is device loss in expected range.
In addition, polarization beam apparatus further includes the covering being covered on straight-through waveguide and crossing waveguide and is located at straight-through waveguide
With the buried layer below crossing waveguide.Wherein, the Refractive Index of Material of straight-through waveguide and crossing waveguide is greater than the material of covering and buried layer
Refractive index.The material of covering and buried layer can be identical.For example, the material of straight-through waveguide and crossing waveguide is silicon, covering and buried layer
Material be silica.
Fig. 1 is the schematic diagram of polarization beam apparatus provided in an embodiment of the present invention.As shown in Figure 1, the embodiment of the present invention provides
The polarization beam apparatus waveguide that includes be divided into three parts: input waveguide, coupled waveguide and output waveguide.The waveguide is by leading directly to wave
Lead (waveguide A) and crossing waveguide (waveguide B) composition.Wherein, TE mould signal is inputted from the input waveguide of waveguide A, from the defeated of waveguide A
Waveguide exports out；TM mould is inputted from the input waveguide of waveguide A, and mode is converted to TE ' mould in coupled waveguide, from the defeated of waveguide B
Waveguide exports out.Wherein, input waveguide and output waveguide can be reduced using common technique realization, such as curved waveguide structure
Mode Coupling.Therefore it is repeated no more in this.
Fig. 2 is the top view of the asymmetric coupled waveguide of polarization beam apparatus provided in an embodiment of the present invention.Fig. 3 is the present invention
The sectional view of the asymmetric coupled waveguide for the polarization beam apparatus that embodiment provides.
As shown in Fig. 2, waveguide is made of, wave asymmetrical waveguide A (Waveguide A) and waveguide B (Waveguide B)
It leads between covering and buried layer, the Refractive Index of Material of waveguide is greater than the Refractive Index of Material of covering and buried layer, wherein covering and bury
Layer material can be identical.Specifically, waveguide material uses silicon in silicon optical device, covering and buried layer material use titanium dioxide
Silicon.
The effective refractive index of TE mould of the effective refractive index of the TE mould of waveguide A greater than waveguide B, to realize the TE of waveguide A
Mould is not coupled to waveguide B；The effective refractive index of TE mould of the effective refractive index approximation of the TM mould of waveguide A equal to waveguide B, thus
Realize the TM mode coupling of waveguide A to waveguide B.
Referring to Fig. 2 and Fig. 3, parameter and meaning to the coupled waveguide part of waveguide A and waveguide B are carried out specifically
It is bright.
The coupled waveguide of waveguide A is the secondarily etched waveguide of fixed shape (such as L-type), and the width of waveguide A is WA, such as
The dash area of the non-etched portions width WAe=400nm of 550nm, waveguide A, waveguide A are secondarily etched part, etched portions
Height He=150nm, that is, use shallow lithographic technique.The coupled waveguide of waveguide A is identical as the length of the coupled waveguide of waveguide B
(LDC as shown in Figure 2).It is, in general, that the width of waveguide A is greater than the width of waveguide B.The coupled waveguide of waveguide B is gradual change
The width of slab waveguide, waveguide B is slowly increased to WB2 (such as 300nm) from WB1 (such as 250nm), i.e., the width of slab waveguide along
Optical propagation direction (direction D as shown in Figure 2) becomes larger, this progressive structure makes device have good technique mismachining tolerance appearance
Degree of bearing.In this way, compared to the prior art, the processing of waveguide A and waveguide B in the present embodiment are relatively easy, it is able to solve existing
The big problem of the polarization beam apparatus difficulty of processing of technology.
GAP is divided between waveguide A and waveguide B, the minimum interval for generally taking silicon light processing technology to allow, such as representative value is
200nm.The height of the highest part of waveguide A and waveguide B is H, according to existing silicon light technology standard, generally takes 220nm.It needs
It is noted that device parameters provided in this embodiment are only the representative value of principle of specification, when being related to concrete technology realization, can be used
Other reasonable values, but need to meet device working principle, it is matched with the effective refractive index of waveguide A and waveguide B to realize that TE mould is straight
Logical and TM mode coupling.To sum up, the present embodiment realizes CMOS silicon light technology compatibility, without complicated or even off-gauge technique
Step allows processing technology tolerance big by progressive structure, moreover, realizing device minimum dimension parameter no more than existing silicon light
Minimum feature size under processing technology.
Fig. 4 is electric field intensity map when polarization beam apparatus provided in an embodiment of the present invention inputs TE mould；Fig. 5 is the embodiment of the present invention
The polarization beam apparatus of offer inputs electric field intensity map when TM mould.Such as Fig. 4 and Fig. 5 as it can be seen that TE mould signal is directly straight-through from waveguide A
(straight) it exports, TM mould signal is coupled to waveguide B from waveguide A and intersects (cross) output, realizes the expection of polarization beam splitting
Function.
Fig. 6 is the relational graph for inputting the insertion loss (IL) and coupling length (Coupling Length) of TE signal；Fig. 7
To input the relational graph that (PCL) and coupling length is lost in the polarization conversion of TM signal；Fig. 8 be input TE signal crosstalk (XT) with
The relational graph of coupling length；Fig. 9 is the relational graph for inputting crosstalk (XT) and coupling length of TM signal.It can according to Fig. 6 to Fig. 9
See, coupling length at least needs 100 μm, wherein to guarantee design margin, can use 200 μm.As it can be seen that the present embodiment passes through design
Suitable coupling length can achieve the effect that coupling efficiency is high, loss is small, crosstalk is small.
Figure 10 be waveguide B effective refractive index with waveguide B width WB variation diagram, wherein ordinate Neff is indicated
Imitate refractive index；The effective refractive index that Figure 11 is waveguide A is with the variation diagram of width WAe, wherein the width WA=550nm of waveguide A；
Figure 12 be waveguide A and waveguide B mode mixture state with waveguide B width WB variation diagram, wherein ordinate TE PF indicate
The polarization ratios of TE mould.It can be recognized from fig. 12 that mode mixture has reached Ex when the width WB of waveguide B is near 270nm:
Ey=50:50, that is to say, that mode conversion efficiency highest at this time.
In conclusion polarization beam apparatus provided in an embodiment of the present invention is compared with prior art, the processing is simple, realizes
CMOS silicon light technology is compatible, allows processing technology tolerance big by progressive structure, realizes device minimum dimension parameter and be not more than
Minimum feature size under existing silicon light processing technology, has reached that device size is small, coupling efficiency is high, loss is small, crosstalk is small
Effect.
The above shows and describes the basic principles and main features of the present invention and the advantages of the present invention.The present invention is not by upper
The limitation of embodiment is stated, the above embodiments and description only illustrate the principle of the present invention, is not departing from the present invention
Under the premise of spirit and scope, various changes and improvements may be made to the invention, these changes and improvements both fall within claimed
In the scope of the invention.
Claims (11)
1. a kind of polarization beam apparatus characterized by comprising
Straight-through waveguide, the coupled waveguide of the straight-through waveguide are the secondarily etched waveguide of fixed shape；
Crossing waveguide, the coupled waveguide of the crossing waveguide are progressive slab waveguide；
Between the straight-through waveguide and the crossing waveguide exist interval and it is asymmetric；Effective folding of the TM mould of the straight-through waveguide
Penetrate effective refractive index of the rate equal to the TE mould of the crossing waveguide.
2. polarization beam apparatus as described in claim 1, which is characterized in that input of the transverse electric TE mould signal from the straight-through waveguide
Waveguide input, exports from the output waveguide of the straight-through waveguide；The input waveguide of horizontal magnetic TM mould signal from the straight-through waveguide is defeated
Enter, mode is converted to transverse electric TE ' mould in coupled waveguide, and exports from the output waveguide of the crossing waveguide.
3. polarization beam apparatus as described in claim 1, which is characterized in that the coupled waveguide of the straight-through waveguide is by secondary
Etch the L-type waveguide realized.
4. polarization beam apparatus as described in claim 1, which is characterized in that the width of the coupled waveguide of the crossing waveguide along
Optical propagation direction becomes larger.
5. polarization beam apparatus as described in claim 1, which is characterized in that the effective refractive index of the TE mould of the straight-through waveguide is big
In the effective refractive index of the TE mould of the crossing waveguide.
6. polarization beam apparatus as described in claim 1, which is characterized in that further include: it is covered on the straight-through waveguide and intersection
Covering in waveguide and the buried layer below the straight-through waveguide and crossing waveguide, the straight-through waveguide and crossing waveguide
Refractive Index of Material is greater than the Refractive Index of Material of the covering and buried layer.
7. polarization beam apparatus as claimed in claim 6, which is characterized in that the material of the straight-through waveguide and crossing waveguide is
The material of silicon, the covering and buried layer is silica.
8. polarization beam apparatus as described in claim 1, which is characterized in that the width of the straight-through waveguide is greater than the intersection wave
The width led.
9. polarization beam apparatus as described in claim 1, which is characterized in that the width of the straight-through waveguide is 550nm, described straight
The non-etched portions width of logical waveguide is 400nm, and the height of the highest part of the straight-through waveguide is 220nm, etched portions
Height is 150nm, and the width of the crossing waveguide progressively increases to 300nm from 250nm, and the height of the crossing waveguide is
220nm。
10. polarization beam apparatus as described in claim 1, which is characterized in that between the straight-through waveguide and the crossing waveguide
Between be divided into 200nm.
11. polarization beam apparatus as described in claim 1, which is characterized in that the coupled wave of the straight-through waveguide and crossing waveguide
The length led is more than or equal to 100 μm.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510526708.5A CN106483601B (en) | 2015-08-25 | 2015-08-25 | A kind of polarization beam apparatus |
| PCT/CN2016/093610 WO2017032214A1 (en) | 2015-08-25 | 2016-08-05 | Polarization beam splitter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510526708.5A CN106483601B (en) | 2015-08-25 | 2015-08-25 | A kind of polarization beam apparatus |
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| CN106483601A CN106483601A (en) | 2017-03-08 |
| CN106483601B true CN106483601B (en) | 2019-10-01 |
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| WO (1) | WO2017032214A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10684416B2 (en) * | 2017-07-27 | 2020-06-16 | Ii-Vi Delaware Inc. | Fabrication-tolerant and broadband polarization splitter and rotator |
| CN107561646B (en) * | 2017-10-18 | 2020-05-05 | 西安奇芯光电科技有限公司 | Optical waveguide polarization splitter and method of manufacturing the same |
| CN108563030B (en) * | 2018-01-31 | 2023-05-26 | 中国地质大学（武汉） | Polarization beam splitter |
| CN111983753B (en) * | 2020-07-24 | 2022-09-02 | 中国科学院上海微系统与信息技术研究所 | Interlayer polarization beam splitter applied to 3D optical interconnection |
| CN112711093B (en) * | 2021-03-26 | 2021-07-20 | 西安奇芯光电科技有限公司 | Polarization beam splitter structure and polarization beam splitting method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103336330A (en) * | 2013-07-05 | 2013-10-02 | 中国科学院半导体研究所 | Polarization rotator based on asymmetric vertical slot waveguide |
| CN104849803A (en) * | 2014-02-17 | 2015-08-19 | 株式会社藤仓 | Substrate-type waveguide element and optical modulator |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7373042B2 (en) * | 2006-07-28 | 2008-05-13 | Infinera Corporation | Polarization sorter |
| FR2922031B1 (en) * | 2007-10-03 | 2011-07-29 | Commissariat Energie Atomique | OPTICAL DEVICE WITH SUPERPOSED PHOTONIC CIRCUITS FOR COUPLING WITH ONE OR MORE OPTICAL GUIDES. |
| CN103091782B (en) * | 2013-01-23 | 2014-07-23 | 浙江大学 | Array waveguide grating module with polarization control |
| KR101550502B1 (en) * | 2013-11-13 | 2015-09-04 | 인하대학교 산학협력단 | Integratable planar waveguide-type optical isolator and circulator with polarization-mode control |
| JP6194789B2 (en) * | 2013-12-24 | 2017-09-13 | 沖電気工業株式会社 | Optical waveguide device |
| CN104090375B (en) * | 2014-07-30 | 2016-09-14 | 华为技术有限公司 | Optically isolated device and optically isolated method |
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2015
- 2015-08-25 CN CN201510526708.5A patent/CN106483601B/en active Active
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103336330A (en) * | 2013-07-05 | 2013-10-02 | 中国科学院半导体研究所 | Polarization rotator based on asymmetric vertical slot waveguide |
| CN104849803A (en) * | 2014-02-17 | 2015-08-19 | 株式会社藤仓 | Substrate-type waveguide element and optical modulator |
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| WO2017032214A1 (en) | 2017-03-02 |
| CN106483601A (en) | 2017-03-08 |
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