CN106444303B - A kind of sample clamp and application for alignment function in micro-nano device micro-group dress - Google Patents
A kind of sample clamp and application for alignment function in micro-nano device micro-group dress Download PDFInfo
- Publication number
- CN106444303B CN106444303B CN201611066888.4A CN201611066888A CN106444303B CN 106444303 B CN106444303 B CN 106444303B CN 201611066888 A CN201611066888 A CN 201611066888A CN 106444303 B CN106444303 B CN 106444303B
- Authority
- CN
- China
- Prior art keywords
- sample
- micro
- clamp
- sample clamp
- fixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
Abstract
The present invention relates to micro- alignment function technical fields in micro fabrication, refer in particular to it is a kind of for micro-nano device micro-group dress in alignment function sample clamp and application, including sample clamp, sample clamp is using alloy or Teflon as material of main part, the central location on sample clamp surface is equipped with the sample clamp groove to match with sample size to be aligned, and sample clamp groove upper and lower position is respectively equipped with the tapped through hole of fixed function.Sample is embedded into sample clamp groove, upper and lower two samples are aligned using the left and right microscope of litho machine, is then fixed the relative position of upper sample and lower sample using screw, to be used for subsequent technique.The present invention for the sample in micro fabrication accurately micro- alignment function and three-dimensional structure production have extremely strong applicability, there is high flexibility on the alignment function of the selection of line-up jig material, different size and different shape sample, can be convenient the high-precision alignment for realizing three-dimensional microstructures and integrated.
Description
Technical field
The present invention relates to micro- alignment function technical fields in micro fabrication, refer in particular to a kind of for micro-nano device micro-group dress
The sample clamp of middle alignment function and application.
Background technique
With the development of micrometer-nanometer processing technology, the relevant process flow of micro-electromechanical system (MEMS) and means design can use
And process minimum size, micro-nano device of multifunctional unit and system.But using MEMS technology with efficient, quick, Gao Ke
By the production high density of integration and the three-dimensional structure of large area of property, there are still many difficulties.Precisely aligning for up-down structure is to realize
One of the most effective approach of three-dimensional structure micro-group dress, therefore utility during this packaging technology and use are for reality
Existing three-dimensional structure device and system are extremely important.
Since MEMS device fine structure is increasingly complicated, and, institute increasingly close with ultraprecise mechanical manufacturing technology combination
Combining semiconductor micro device technique with precise machine machining to make the three-dimensional structure with special-purpose
It is current device and important one of the developing direction and forward position of system regions with device.
Summary of the invention
In view of the above problems, the present invention provides it is a kind of for micro-nano device micro-group dress in alignment function sample clamp and
Using, have the groove through matching obtained from precision machinery processing technology with sample size to be aligned, can according to different shape,
Various sizes of sample to be aligned is with the corresponding groove fixture of flexible choice.Device example therein (upper sample) is used into exposure mask
Version vacuum is sucked and fixes, and adjustment has been fixed in the fixture height embedded with another device example (lower sample) on sample stage,
Under the optical microscopy of left and right two of litho machine helps, by following fixture sample stage close to upper sample, and sample up and down is completed
Precisely aligning between product.
To achieve the goals above, The technical solution adopted by the invention is as follows:
A kind of sample clamp for alignment function in micro-nano device micro-group dress, including sample clamp, sample clamp use
As material of main part, the central location on sample clamp surface is equipped with the sample to match with sample size to be aligned for alloy or Teflon
Product fixture groove, sample clamp groove upper and lower position are respectively equipped with the tapped through hole of fixed function.
Furthermore, the upper and lower two sides of the sample clamp are symmetrically arranged with the concave hole of fixed function, sample clamp or so
Both ends are symmetrically arranged with the fixture slope of fixed function.
Furthermore, the sample clamp groove is made by precision machinery processing technology, table in sample clamp groove
Face uses rough surface structure setting, and sample clamp groove uses quadrangle or circle structure setting, and four angles of quadrangle are adopted
With rounded corner structure setting.
A kind of application method for the sample clamp of alignment function in micro-nano device micro-group dress, steps are as follows:
Step 1 selects sample clamp, its sample clamp groove and the size of sample to be aligned (lower sample) is made to match,
And lower sample is embedded into sample clamp groove；
Step 2 adjusts the relative altitude between litho machine sample stage and mask plate placement location, will be mounted with lower sample
Sample clamp be placed on the sample stage of litho machine, after sample stage vacuumizes, make sample clamp by fixed function concave hole with
The fixture slope of fixed function is fixed on sample stage；
Standard sample (upper sample) is sucked and is fixed using mask plate vacuum, sample stage height adjusted, under making by step 3
Sample using two samples of optical microphotograph sem observation of left and right two of litho machine, and adjusts sample stage position close to upper sample,
Under the alignment mark guidance for designing and producing in advance, precisely align lower sample with upper sample；
Step 4 adjusts sample stage height, sample is made to be in contact with lower sample, continues the light of left and right two with litho machine
The relative position for learning micro- sem observation sample up and down, make up and down sample precisely align, and passed through by screw and square washer solid
It is set for that upper and lower sample being fixed with tapped through hole；
Step 5 removes the fixture for having fixed sample relative position on the sample stage of litho machine, to carry out following process.
The invention has the advantages that:
1. the present invention has very high process flexibility, can be selected according to actual needs in the selection of jig main body material
The substrate of unlike material is selected, selection should be required to meet corresponding material as defined in laboratory according to the specific environment in laboratory；
2. the design and processing of the micro-recesses in the present invention have flexibility, can be according to by the shape and ruler of folder sample
It is very little, to design and process corresponding groove pattern；
3. it is convenient for fixing the screw installation and removal of sample relative position in the present invention, it can adjust in time as needed
Size and size；
It, can be by a left side for litho machine during micro-group dress 4. the present invention has very high flexibility, simple to operate
Right two microscopes efficiently, easily complete accurate micro- alignment of sample room up and down, largely improve operating efficiency.
Detailed description of the invention
Fig. 1 is sample clamp structure chart of the present invention；
Fig. 2 is Fig. 1 bottom view；
Fig. 3 is Fig. 2 side view.
1. the concave hole of fixed function；2. sample clamp groove；3. the tapped through hole of fixed function；4. the folder of fixed function
Has slope.
Specific embodiment
Technical solution of the present invention is illustrated with embodiment with reference to the accompanying drawing.
As shown in Figure 1 to Figure 3, a kind of sample clamp for alignment function in micro-nano device micro-group dress of the present invention,
Including sample clamp, sample clamp is using alloy or Teflon as material of main part, and structure is firmer, more durable, specimen holder
The central location on tool surface is equipped with the sample clamp groove 2 to match with sample size to be aligned, bottom on sample clamp groove 2
Set the tapped through hole 3 for being respectively equipped with fixed function.Using such structure setting, lower sample is embedded into sample clamp groove 2
In, upper and lower two samples are aligned using the left and right microscope of litho machine, are then passed through using screw and square washer solid
Tailor-made tapped through hole 3 fixes the relative position of upper sample and lower sample, to be used for subsequent technique.The present invention adds for micro-
The production of sample in work technique accurately micro- alignment function and three-dimensional structure has extremely strong applicability, selects in line-up jig material
It selects, there is high flexibility on the alignment function of different size and different shape sample, can be convenient realization three-dimensional microstructures
High-precision alignment and integrated.
More specifically, the upper and lower two sides of the sample clamp are symmetrically arranged with the concave hole 1 of fixed function, sample clamp or so
Both ends are symmetrically arranged with the fixture slope 4 of fixed function.Using such structure setting, by fixed function concave hole 1 and fix
It is convenient for for sample clamp being fixed on sample stage in the fixture slope 4 of effect.
More specifically, the sample clamp groove 2 is made by precision machinery processing technology, in sample clamp groove 2
Surface uses rough surface structure setting, and sample clamp groove 2 uses quadrangle or circle structure setting, and four angles of quadrangle
Using rounded corner structure setting.
A kind of application method for the sample clamp of alignment function in micro-nano device micro-group dress, steps are as follows:
Step 1 selects sample clamp, makes the size phase of its sample clamp groove 2 with sample to be aligned (lower sample)
Match, and lower sample is embedded into sample clamp groove 2；
Step 2 adjusts the relative altitude between litho machine sample stage and mask plate placement location, will be mounted with lower sample
Sample clamp be placed on the sample stage of litho machine, after sample stage vacuumizes, make sample clamp by fixed function concave hole 1 with
The slope 4 of fixed function fixture is fixed on sample stage；
Standard sample (upper sample) is sucked and is fixed using mask plate vacuum, sample stage height adjusted, under making by step 3
Sample using two samples of optical microphotograph sem observation of left and right two of litho machine, and adjusts sample stage position close to upper sample,
Under the alignment mark guidance for designing and producing in advance, precisely align lower sample with upper sample；
Step 4 adjusts sample stage height, sample is made to be in contact with lower sample, continues the light of left and right two with litho machine
The relative position for learning micro- sem observation sample up and down, make up and down sample precisely align, and passed through by screw and square washer solid
It is set for that upper and lower sample being fixed with tapped through hole 3；
Step 5 removes the fixture for having fixed sample relative position on the sample stage of litho machine, to carry out following process.
The embodiment of the present invention is described with above attached drawing, but the invention is not limited to above-mentioned specific
Embodiment, the above mentioned embodiment is only schematical, rather than restrictive, those skilled in the art
Under the inspiration of the present invention, without breaking away from the scope protected by the purposes and claims of the present invention, it can also make very much
Form, all of these belong to the protection of the present invention.
Claims (2)
1. a kind of sample clamp for alignment function in micro-nano device micro-group dress, which is characterized in that described including sample clamp
Using alloy or Teflon as material of main part, the central location on the sample clamp surface is equipped with and sample to be aligned sample clamp
The sample clamp groove (2) that product size matches, sample clamp groove (2) upper and lower position are respectively equipped with the spiral shell of fixed function
Line through-hole (3)；
Two sides are symmetrically arranged with the concave hole (1) of fixed function above and below the sample clamp, and the sample clamp left and right ends are symmetrical
Fixture slope (4) equipped with fixed function；
A kind of application method for the sample clamp of alignment function in micro-nano device micro-group dress, which is characterized in that step
It is rapid as follows:
Step 1 selects sample clamp, its sample clamp groove (2) and the size of sample to be aligned (lower sample) is made to match,
And lower sample is embedded into sample clamp groove (2)；
Step 2 adjusts the relative altitude between litho machine sample stage and mask plate placement location, will be mounted with the sample of lower sample
Product fixture is placed on the sample stage of litho machine, after sample stage vacuumizes, passes through sample clamp fixed function concave hole (1) and solid
Tailor-made fixture slope (4) is fixed on sample stage；
Standard sample (upper sample) is sucked and is fixed using mask plate vacuum, adjusted sample stage height, make lower sample by step 3
Close to upper sample, using two samples of optical microphotograph sem observation of left and right two of litho machine, and sample stage position is adjusted, prior
Design and produce alignment mark guidance under, precisely align lower sample with upper sample；
Step 4 adjusts sample stage height, sample is made to be in contact with lower sample, continues aobvious with the optics of left and right two of litho machine
Micro mirror observes the relative position of sample up and down, make up and down sample precisely align, and made by screw and square washer by fixed
Upper and lower sample is fixed tapped through hole (3)；
Step 5 removes the fixture for having fixed sample relative position on the sample stage of litho machine, to carry out following process.
2. a kind of sample clamp for alignment function in micro-nano device micro-group dress according to claim 1, feature exist
In the sample clamp groove (2) is made by precision machinery processing technology, and sample clamp groove (2) inner surface uses
Rough surface structure setting, the sample clamp groove (2) uses quadrangle or circle structure setting, and four angles of quadrangle are adopted
With rounded corner structure setting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611066888.4A CN106444303B (en) | 2016-11-25 | 2016-11-25 | A kind of sample clamp and application for alignment function in micro-nano device micro-group dress |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611066888.4A CN106444303B (en) | 2016-11-25 | 2016-11-25 | A kind of sample clamp and application for alignment function in micro-nano device micro-group dress |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106444303A CN106444303A (en) | 2017-02-22 |
| CN106444303B true CN106444303B (en) | 2018-12-11 |
Family
ID=58219856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611066888.4A Expired - Fee Related CN106444303B (en) | 2016-11-25 | 2016-11-25 | A kind of sample clamp and application for alignment function in micro-nano device micro-group dress |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106444303B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114924469A (en) * | 2022-05-30 | 2022-08-19 | 中国电子科技集团公司第二十九研究所 | Exposure alignment device and alignment method for solder mask layer of multilayer co-fired ceramic circuit substrate |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2268944Y (en) * | 1995-01-23 | 1997-11-26 | 中国科学院微电子中心 | Strap clamping X ray etching alignment instrument |
| CN101634814A (en) * | 2009-08-19 | 2010-01-27 | 株洲南车时代电气股份有限公司 | Primary aligning device and primary aligning system |
| CN105988305A (en) * | 2015-02-28 | 2016-10-05 | 上海微电子装备有限公司 | Silicon wafer pre-aligning method |
| CN106052915A (en) * | 2016-07-22 | 2016-10-26 | 南京信息工程大学 | MEMS fiber pressure sensor and manufacturing method thereof |
-
2016
- 2016-11-25 CN CN201611066888.4A patent/CN106444303B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2268944Y (en) * | 1995-01-23 | 1997-11-26 | 中国科学院微电子中心 | Strap clamping X ray etching alignment instrument |
| CN101634814A (en) * | 2009-08-19 | 2010-01-27 | 株洲南车时代电气股份有限公司 | Primary aligning device and primary aligning system |
| CN105988305A (en) * | 2015-02-28 | 2016-10-05 | 上海微电子装备有限公司 | Silicon wafer pre-aligning method |
| CN106052915A (en) * | 2016-07-22 | 2016-10-26 | 南京信息工程大学 | MEMS fiber pressure sensor and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106444303A (en) | 2017-02-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8139219B2 (en) | Apparatus and method for semiconductor wafer alignment | |
| JP2022033241A (en) | Sample-preparation device | |
| CN104792583B (en) | A kind of preparation method of TEM sample | |
| CN106444303B (en) | A kind of sample clamp and application for alignment function in micro-nano device micro-group dress | |
| US20130155382A1 (en) | Work stage of exposing apparatus, exposing method and method of manufacturing a structure | |
| US20160379849A1 (en) | Device and method for scribing a bottom-side of a substrate while viewing the top side | |
| JP2011054961A (en) | System for post-processing of electronic components | |
| CN102681363A (en) | Multi-stage exchange system and exchange method for multi-station silicon wafer stage | |
| CN105467747A (en) | Alignment mark and mask | |
| CN105645347B (en) | The localization method of bulk-micromachining | |
| CN103267661B (en) | The localization method of SEM/TEM sample | |
| CN102540746B (en) | Method for achieving three-dimensional photoetching of projection type photoetching machine by utilizing layering exposure | |
| CN110436406B (en) | System and method for preparing solid-state nanopore array by automatic accurate positioning | |
| CN114284243A (en) | Bonding wafer, bonding structure and bonding method | |
| CN211946252U (en) | Lodging-resistant microstructure | |
| CN102540747A (en) | Exposure method for three-dimensional mask of projection type photoetching machine | |
| KR100691749B1 (en) | Manufacturing Method Of Ultra Small Size Nozzle With 3 Dimensional Shape | |
| CN112296524B (en) | Workpiece microstructure processing method and diamond microstructure workpiece | |
| Bartenwerfer et al. | Design of a micro-cartridge system for the robotic assembly of exchangeable afm-probe tips | |
| CN108168932A (en) | Pinpoint slice systems and method | |
| CN102566290B (en) | Projection ramp exposure photoetching machine device and method | |
| Egert et al. | Automated array assembly: a high throughput, low cost assembly process for LIGA-fabricated micro-components | |
| JP7017728B2 (en) | Crystal substrate and crystal substrate processing method | |
| CN107188112B (en) | A kind of variable light distribution device and preparation method thereof based on silica-based nitride | |
| JP7344695B2 (en) | Chip manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20181211 Termination date: 20201125 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |