CN106430947B - The preparation method and quartz glass of quartz glass - Google Patents
The preparation method and quartz glass of quartz glass Download PDFInfo
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- CN106430947B CN106430947B CN201610809509.XA CN201610809509A CN106430947B CN 106430947 B CN106430947 B CN 106430947B CN 201610809509 A CN201610809509 A CN 201610809509A CN 106430947 B CN106430947 B CN 106430947B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/02—Pretreated ingredients
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/34—Doped silica-based glasses containing metals containing rare earth metals
- C03C2201/3405—Scandium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/34—Doped silica-based glasses containing metals containing rare earth metals
- C03C2201/3411—Yttrium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/34—Doped silica-based glasses containing metals containing rare earth metals
- C03C2201/3417—Lanthanum
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/34—Doped silica-based glasses containing metals containing rare earth metals
- C03C2201/36—Doped silica-based glasses containing metals containing rare earth metals containing rare earth metals and aluminium, e.g. Er-Al co-doped
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
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Abstract
The present invention relates to a kind of preparation method of quartz glass and quartz glass, are related to quartz glass manufacturing technology field, and main purpose is to improve quartz glass finished product in hydrofluoric acid and fluorine gas F2Etc. the corrosion resistance under fluorine-containing environment.Method includes: that the first doped compound, the dissolution of the second doped compound are mixed to form doping mixed solution by lytic agent, and the first doped compound is aluminum contained compound；After mixed solution, water mixing will be adulterated, doping silicon dioxide gel is obtained with silicon tetrachloride liquid phase reactor；Doping silicon dioxide gel is fired by burning process as quartz glass finished product, includes the Al that doped mixed solution firing is transformed in quartz glass finished product2O3, doped mixed solution fire the ZrO being transformed2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2At least one of.Al2O3、ZrO2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2SiO is filled in the form of network intermediate or network outer body2In the hole of tetrahedral network structure, the corrosion of quartz glass acid-resisting.
Description
Technical field
The present invention relates to quartz glass manufacturing technology fields, more particularly to the preparation method and quartz of a kind of quartz glass
Glass.
Background technique
Quartz glass is to make amorphous material as main component with silica, and microstructure is one kind by titanium dioxide
The flat network of silicon four sides structural body structural unit composition, since Si-O chemistry bond energy is very big, structure is very close, so quartzy glass
Glass has unique performance, such as high temperature resistant, the coefficient of expansion are low, resistance to heat shocks, chemical stability are high and electrical insulation capability is good excellent
Point.
Due to the special performance of quartz glass, it is that the irreplaceable ideal of semiconductor integrated circuit manufacturing process is mating auxiliary
Material is included in quartz glass tube, quartz glass plate, quartz glass ring, quartz glass plate, quartz glass flange, quartz glass and carves
The devices such as slot boat, quartz glass rinse bath, are widely used.
Currently, the preparation process of quartz glass is broadly divided into direct method preparation process and indirect method preparation process, direct
In method preparation process, quartz glass crystal, silica, silicon-containing compound are raw material, through high temperature melting or chemical vapor deposition
At melting method has electric smelting method (such as vacuum electric fusion process), gas refining fusion process, high-frequency plasma fusion process, continuous melting method
Deng chemical vapour deposition technique has chemical vapor deposition CVD and plasma chemical vapor deposition PCVD etc..In indirect method preparation process
In, with silicon-containing material, the silica loosening body with a large amount of stomatas is made by low temperature chemical vapor deposition synthesis, then by two
Silica loosening body is sintered in normal pressure or direct draught, the gas in silica loosening body in stomata is discharged, to obtain
Obtain the quartz glass finished product of high quality.
In realizing process of the present invention, at least there are the following problems in the prior art for inventor's discovery:
Si-O chemical bond is easy to be corroded by hydrofluoric acid, through calculating, under hydrofluoric acid environment, all with Si-O chemical bond structure
At quartz glass, the rate of corrosion reached 150 μm/h, the corrosion rate under hydrofluoric acid environment of existing quartz glass compared with
Fastly, it is unable to satisfy the application requirement of the semiconductor etching under hydrofluoric acid environment.
Summary of the invention
In view of this, the present invention provides the preparation method and quartz glass of a kind of quartz glass, main purpose is to improve
Quartz glass finished product is in the corrosion resistance under hydrofluoric acid environment.
In order to achieve the above objectives, present invention generally provides following technical solutions:
On the one hand, the embodiment of the present invention provides a kind of preparation method of quartz glass, comprising:
The first doped compound, the dissolution of the second doped compound are mixed to form doping mixed solution, institute by lytic agent
Stating the first doped compound is aluminum contained compound, and second doped compound includes compound containing Zr, compound containing Y, contains La
At least one of compound, compound containing Sc, compound containing Th, compound containing V, compound containing Ti；
By parts by volume L1Doping mixed solution, parts by volume L2Water mixing after, adulterated with silicon tetrachloride liquid phase reactor
Silica dioxide gel；
The doping silicon dioxide gel is fired by burning process as quartz glass finished product, wherein the quartz glass
It include to fire the Al being transformed through the first part in the doping mixed solution in glass finished product2O3, through the doping mix
Second part in solution fires the ZrO being transformed2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2At least one of.
The object of the invention to solve the technical problems also can be used following technical measures and further realize.
Optionally, the preparation method of quartz glass above-mentioned, wherein L1、L2Ratio in 1:5~200.
Optionally, the preparation method of quartz glass above-mentioned, wherein the reaction rate of the silicon tetrachloride 20~
500ml/min。
Optionally, the preparation method of quartz glass above-mentioned, wherein described by parts by volume L1Doping mixed solution, volume
Part L2Water mixing after, with silicon tetrachloride liquid phase reactor obtain doping silicon dioxide gel, specifically include:
During silicon tetrachloride is gradually added doping mixed solution and water mixed mixed liquor, and to the mixing
Liquid is stirred, and obtains doping silicon dioxide gel；Or,
It is described by parts by volume L1Doping mixed solution, parts by volume L2Water mixing after, with silicon tetrachloride liquid phase reactor obtain
Doping silicon dioxide gel, specifically includes:
After silicon tetrachloride, doping mixed solution and the mixed mixed liquor of water are atomized respectively, while being passed through in reaction chamber
It carries out phase reaction and obtains doping silicon dioxide gel.
Optionally, the preparation method of quartz glass above-mentioned, wherein described by parts by volume L1Doping mixed solution, volume
Part L2Water mixing after, with silicon tetrachloride liquid phase reactor obtain doping silicon dioxide gel, specifically include:
It is mixed doping mixed solution, water mixed liquor obtained under 10~100 degrees Celsius with silicon tetrachloride liquid phase reactor
Obtain doping silicon dioxide gel.
Optionally, the preparation method of quartz glass above-mentioned, wherein the lytic agent includes mixing for dissolving described first
First lytic agent of heterocompound, first lytic agent include methanol, ethyl alcohol, acetic acid, hydrochloric acid, nitric acid, distilled water, hydrogen peroxide
At least one of；
First doped compound includes nitric hydrate aluminium Al (NO3)3·H2O, ANN aluminium nitrate nonahydrate Al (NO3)3·
9H2O, six hydration aluminium chlorate Al (ClO3)3·6H2O, aluminium chloride AlCl3At least one of.
Optionally, the preparation method of quartz glass above-mentioned, wherein the lytic agent includes mixing for dissolving described second
Second lytic agent of heterocompound, second lytic agent include methanol, ethyl alcohol, acetic acid, hydrochloric acid, nitric acid, distilled water, hydrogen peroxide
At least one of；
The compound containing Zr includes zirconium nitrate Zr (NO3)4·5H2O, zirconium carbonate ammonium ZrO (CO3)2(NH4)2·nH2O, carbon
Sour zirconium ZrOCO3·nH2O, eight water oxygen zirconium chloride ZrOCl2·8(H2O), zirconium chloride ZrCl4, eight water basic zirconium chloride ZrOCl2·
8H2At least one of O；
The compound containing Y includes yttrium oxalate Y2(C2O4)3·10H2O, yttrium nitrate Y (NO3)3·6H2O, it is hydrated yttrium carbonate Y2
(CO3)3·3H2O, six water YCl of yttrium chloride3·6H2O, chloride hydrate yttrium YCl3H2At least one of O；
The compound containing La includes lanthanum chloride LaCl3, Lanthanum trichloride hexahydrate LaCl3·6H2O, lanthanum nitrate La (NO3)3·
6H2O, lanthanum carbonate La2(CO3)3.8H2At least one of O；
The compound containing Sc includes six water scandium chloride ScCl3·6H2O, scandium chloride ScCl3, scandium nitrate Sc (NO3)3·
3H2O, scandium nitrate Sc (NO3)3·4H2O, scandium nitrate Sc (NO3)3·5H2O, scandium nitrate Sc (NO3)3·6H2O, six water plant acid scandium Sc2
(C2O4)3·6H2At least one of O；
The compound containing Th includes thorium nitrate Th (NO3)4·4H2O, thhorium oxalate Th (C2O4)2, thorium tetrachloride ThCl4, it is high
Chloric acid thorium Th (ClO4)4At least one of；
The compound containing V includes vanadium chloride VCl3, nitric acid vanadium acyl VO2NO3At least one of；
The compound containing Ti includes Titanium Nitrate Ti (NO3)4。
Optionally, the preparation method of quartz glass above-mentioned, wherein the Al2O3With SiO in the quartz glass finished product2
Weight ratio 0.5~10%；
ZrO2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2With SiO in the quartz glass finished product2Weight ratio divide equally
Not 0.5~5%.
Optionally, the preparation method of quartz glass above-mentioned, wherein it is described by the doping silicon dioxide gel through burning
It is quartz glass finished product that technique processed, which is fired, is specifically included:
In T1At a temperature of to the doping silicon dioxide gel drying, obtain amorphous doping silicon dioxide powder, T1?
100~1000 degrees Celsius；
In T2At a temperature of to the doping silicon dioxide powder calcine, so that the doping silicon dioxide powder is changed into crystallization
The doping silicon dioxide powder of state, T2At 1000~1500 degrees Celsius；
The doping silicon dioxide powder of crystallized state prepares the quartz glass finished product.
Optionally, the preparation method of quartz glass above-mentioned, wherein described in T1At a temperature of to the doping silicon dioxide
Gel drying specifically includes:
Dry atmosphere is passed through the hothouse of the drying doping silicon dioxide gel, wherein the dry atmosphere includes sky
Gas, oxygen O2, chlorine Cl2, dichloride oxygen sulphur SOCl2At least one of.
Optionally, the preparation method of quartz glass above-mentioned, wherein the doping silicon dioxide powder system of the crystallized state
The standby quartz glass finished product described out, specifically:
Grinding is carried out to the doping silicon dioxide powder of the crystalline state, and to the doping silicon dioxide Powder screen after grinding
Point, the silicon dioxide powder after screening is used melting technology, taken the photograph 1000~2500 by the silicon dioxide powder after being sieved
Under family name's degree, it is melting into the quartz glass finished product.
Optionally, the preparation method of quartz glass above-mentioned, wherein the doping silicon dioxide powder to the crystalline state
Material carries out grinding, and sieves to the doping silicon dioxide powder after grinding, the silicon dioxide powder after being sieved, after screening
Silicon dioxide powder the quartz glass finished product is melting into, specifically under 1000~2500 degrees Celsius using melting technology
Are as follows:
To after grinding doping silicon dioxide powder screening, obtain particle 20~200 mesh doping silicon dioxide powder,
The doping silicon dioxide powder of 20~200 mesh is melting into the quartz glass finished product using vacuum electric process of smelting；Or,
To after grinding doping silicon dioxide powder screening, obtain particle 40~300 mesh doping silicon dioxide powder,
The doping silicon dioxide powder of 40~300 mesh is melting into the quartz glass finished product using high-frequency plasma melting technology；
Or,
To after grinding doping silicon dioxide powder screening, obtain particle 40~300 mesh doping silicon dioxide powder,
The doping silicon dioxide powder of 40~300 mesh is melting into the quartz glass finished product using gas refining melting technology；Or,
To after grinding doping silicon dioxide powder screening, obtain particle 40~300 mesh doping silicon dioxide powder,
The doping silicon dioxide powder of 40~300 mesh is melting into the quartz glass finished product using continuous melting technique.
On the other hand, the embodiment of the present invention provides a kind of quartz glass, comprising:
Quartz glass finished product, the quartz glass finished product are prepared using the preparation method of above-mentioned quartz glass,
Al2O3And ZrO2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2At least one of in the form of network intermediate or network outer body
It is filled in SiO2In the hole of tetrahedral network structure.
The object of the invention to solve the technical problems also can be used following technical measures and further realize.
Optionally, quartz glass above-mentioned, wherein the quartz glass finished product is quartz glass stone roller, quartz glass bar, stone
English glass tube, quartz glass plate, quartz glass ring, quartz glass plate, quartz glass flange, quartz glass cutting boat or quartzy glass
Glass rinse bath.
By above-mentioned technical proposal, the preparation method and quartz glass of the quartz glass of technical solution of the present invention offer are at least
It has the advantage that
In technical solution provided in an embodiment of the present invention, select aluminum contained compound as the first doped compound, selection contains
Zr compound, compound containing Y, compound containing La, compound containing Sc, compound containing Th, compound containing V, in compound containing Ti
At least one is used as the second doped compound, is mixed the first doped compound, the dissolution of the second doped compound by lytic agent
Doping mixed solution is formed, parts by volume L is selected1Doping mixed solution, parts by volume L2Water mixing after, with silicon tetrachloride liquid phase
Reaction obtains doping silicon dioxide gel；Finally, firing the doping silicon dioxide gel by burning process for quartzy glass
Glass finished product, wherein include in the quartz glass finished product through it is described doping mixed solution in first part fire conversion and
At Al2O3, through the second part in the doping mixed solution fire the ZrO that is transformed2、Y2O3、La2O3、Sc2O3、
ThO2、V2O5、TiO2At least one of.In quartz glass finished product provided by the invention, Al2O3、ZrO2、Y2O3、La2O3、
Sc2O3、ThO2、V2O5、TiO2SiO is filled in the form of network intermediate or network outer body2In the hole of tetrahedral network structure,
Keep quartz glass of the present invention finer and close；Meanwhile Al2O3、ZrO2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2Resolution
Valence ratio SiO2Height, i.e., compared with SiO2Resistant to hydrogen fluoric acid corrosivity it is strong, quartz glass can be reduced in acid solution or sour gas
The corrosion rate of (such as hydrofluoric acid environment), and then improve the acid-resisting corrosive nature of quartz glass.Improve quartz glass at
Product are in hydrofluoric acid and fluorine gas F2Etc. the corrosion resistance under fluorine-containing environment.
Meanwhile in technical solution provided in an embodiment of the present invention, simultaneously as Al2O3It is formed in quartz glass with network
The form of body or network intermediate exists, and can effectively adjust the network structure in quartz glass, avoid being doped with ZrO2、Y2O3、
La2O3、Sc2O3、ThO2、V2O5Or TiO2Powder there is crystallization or cluster in melting process.
The above description is only an overview of the technical scheme of the present invention, in order to better understand the technical means of the present invention,
And can be implemented in accordance with the contents of the specification, the following is a detailed description of the preferred embodiments of the present invention and the accompanying drawings.
Detailed description of the invention
By reading the following detailed description of the preferred embodiment, various other advantages and benefits are common for this field
Technical staff will become clear.The drawings are only for the purpose of illustrating a preferred embodiment, and is not considered as to the present invention
Limitation.And throughout the drawings, the same reference numbers will be used to refer to the same parts.In the accompanying drawings:
Fig. 1 is a kind of flow diagram of the preparation method for quartz glass that the embodiment of the present invention provides；
Fig. 2 is a kind of flow diagram of the preparation method for specific quartz glass that the embodiment of the present invention provides.
Specific embodiment
It is of the invention to reach the technical means and efficacy that predetermined goal of the invention is taken further to illustrate, below in conjunction with
Attached drawing and preferred embodiment, preparation method and quartz glass its specific embodiment party to quartz glass proposed according to the present invention
Formula, structure, feature and its effect, detailed description is as follows.In the following description, different " embodiment " or " embodiment " refers to
It is not necessarily the same embodiment.In addition, the special characteristic, structure or feature in one or more embodiments can be by any suitable shape
Formula combination.
The terms "and/or", only a kind of incidence relation for describing affiliated partner, indicates that there may be three kinds of passes
System, it is specific to understand for example, A and/or B are as follows: it can simultaneously include A and B, can be with individualism A, it can also be with individualism
B can have above-mentioned three kinds of any case.
As shown in Figure 1, a kind of preparation method for quartz glass that one embodiment of the present of invention proposes comprising:
First doped compound, the dissolution of the second doped compound are mixed to form doping mixing by lytic agent by step 10
Solution, first doped compound are aluminum contained compound, and second doped compound includes compound containing Zr, chemical combination containing Y
At least one of object, compound containing La, compound containing Sc, compound containing Th, compound containing V, compound containing Ti；
Wherein, lytic agent can be a kind of lytic agent, can simultaneously to the first doped compound, the second doped compound
It is dissolved；Or lytic agent may include two kinds of lytic agents, and a kind of lytic agent is another for dissolving the first doped compound
For kind lytic agent for dissolving the second doped compound, forming doping mixed solution can be salting liquid；It, can be first right in specific mixing
First doped compound carries out dissolution and obtains the first mixed solution, and it is molten to carry out the second mixing of dissolution acquisition to the second doped compound
Then first mixed solution, the second mixed solution are mixed to form doping mixed solution by liquid；Or by the first doped compound,
Second doped compound first mixes, and is being dissolved simultaneously to the first doped compound, the second doped compound using lytic agent,
Form doping mixed solution；
Step 20, by parts by volume L1Doping mixed solution, parts by volume L2Water mixing after, with silicon tetrachloride liquid phase reactor
Obtain doping silicon dioxide gel；
Specifically, distilled water can be used in water；Gel refers to: the colloidal particle or macromolecule in colloidal sol or solution are in certain item
It is interconnected under part, forms space net structure, the liquid as decentralized medium is filled in structural void, it is such a special
Dispersion claim, it is internal often to contain big quantity of fluid without mobility.Wherein, L1、L2Ratio can 1:5~200.Such as 1:
20,1:50,1:100,1:150,1:160,1:180 etc..Wherein, liquid phase reactor can be reaction gradually, the silicon tetrachloride
Reaction rate is controlled in 20~500ml/min.Such as, 100ml/min, 200ml/min, 300ml/min, 400ml/min.
Step 30 fires the doping silicon dioxide gel for quartz glass finished product by burning process, wherein described
It include to fire the Al being transformed through the first part in the doping mixed solution in quartz glass finished product2O3, mix through described
Second part in miscellaneous mixed solution fires the ZrO being transformed2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2In at least
It is a kind of.
Wherein, first part is that the first doped compound reacts the part generated with lytic agent, and second part is the
Two doped compounds react the part generated with lytic agent, and what such as the second doped compound was selected is compound containing Zr, then passing through
Second part in the doping mixed solution fires the ZrO being transformed2, what such as the second doped compound was selected is containing Yization
Object is closed, then having Y through what the second part firing in the doping mixed solution was transformed2O3, the choosing of such as the second doped compound
It is compound containing Sc and compound containing Th, is transformed then firing through the second part in the doping mixed solution
There is Sc2O3And ThO2, what such as the second doped compound was selected is compound containing Y, then through second in the doping mixed solution
What part firing was transformed has Y2O3, etc..
In the prior art, such as quartz glass reaction chamber in use process due to constantly being corroded by hydrofluoric acid, surface generate
White atomizing effect, and then influence radio frequency power source glow discharge；Reaction lumen wall be corroded position can sharply it is thinning occur it is small
Pinprick, or due to tube wall be corroded it is thinning and the pressure difference between vacuum and atmospheric pressure cannot be born and cause explosion etc.,
It will lead to vacuum leak, cause radio frequency power source cannot normal build-up of luminance；Quartz glass samples bracket also can be gradually in use process
Corroded by hydrofluoric acid, and need to often replace.Not only increase semiconductors manufacture cost, it is often more important that affect the etching of silicon wafer
Efficiency, continuity and quality stability etc., thus integrated circuit etching process must use corrosion resistance silica glass material and
Product, improving its hydrofluoric acid corrosion resistance is those skilled in the art's technical problem urgently to be solved.
In technical solution provided in an embodiment of the present invention, select aluminum contained compound as the first doped compound, selection contains
Zr compound, compound containing Y, compound containing La, compound containing Sc, compound containing Th, compound containing V, in compound containing Ti
At least one is used as the second doped compound, is mixed the first doped compound, the dissolution of the second doped compound by lytic agent
Doping mixed solution is formed, parts by volume L is selected1Doping mixed solution, parts by volume L2Water mixing after, with silicon tetrachloride liquid phase
Reaction obtains doping silicon dioxide gel；Finally, firing the doping silicon dioxide gel by burning process for quartzy glass
Glass finished product, wherein include in the quartz glass finished product through it is described doping mixed solution in first part fire conversion and
At Al2O3, through the second part in the doping mixed solution fire the ZrO that is transformed2、Y2O3、La2O3、Sc2O3、
ThO2、V2O5、TiO2At least one of.In quartz glass finished product provided by the invention, Al2O3、ZrO2、Y2O3、La2O3、
Sc2O3、ThO2、V2O5、TiO2SiO is filled in the form of network intermediate or network outer body2In the hole of tetrahedral network structure,
Keep quartz glass of the present invention finer and close；Meanwhile Al2O3、ZrO2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2Resolution
Valence ratio SiO2Height, i.e., compared with SiO2Resistant to hydrogen fluoric acid corrosivity it is strong, quartz glass can be reduced in acid solution or sour gas
The corrosion rate of (such as hydrofluoric acid environment), and then improve the acid-resisting corrosive nature of quartz glass.
Meanwhile in technical solution provided in an embodiment of the present invention, simultaneously as Al2O3It is formed in quartz glass with network
The form of body or network intermediate exists, and can effectively adjust the network structure in quartz glass, avoid being doped with ZrO2、Y2O3、
La2O3、Sc2O3、ThO2、V2O5Or TiO2Powder there is crystallization or cluster in melting process.
In specific implement, liquid phase reactor with silicon tetrachloride can carry out, for details, reference can be made to such as through a variety of ways
Under type, as shown in Fig. 2,
One, the preparation method of above-mentioned quartz glass, it is described by parts by volume L1Doping mixed solution, parts by volume L2Water
After mixing, doping silicon dioxide gel is obtained with silicon tetrachloride liquid phase reactor, is specifically included:
Step 21, during silicon tetrachloride is gradually added doping mixed solution and water mixed mixed liquor, and it is right
The mixed liquor is stirred, and obtains doping silicon dioxide gel.
, can be by the addition mixed liquor of silicon tetrachloride drop by drop in operation, the rate of addition is directly proportional to stirring rate.
After finishing the reactant reaction in mixed liquor to silicon tetrachloride, stop that silicon tetrachloride is added.Wherein, the mode of stirring can adopt
It manually stirs or machine stirs.
Or,
Two, the preparation method of above-mentioned quartz glass, it is described by parts by volume L1Doping mixed solution, parts by volume L2Water
After mixing, doping silicon dioxide gel is obtained with silicon tetrachloride liquid phase reactor, is specifically included:
Step 22 by silicon tetrachloride, doping mixed solution and after the mixed mixed liquor of water is atomized respectively, while being passed through instead
It answers and carries out phase reaction acquisition doping silicon dioxide gel in room.
By the way of atomization, silicon tetrachloride can be made sufficiently to react with mixed liquor, and it is very fast to react contact, production efficiency compared with
It is high.
Wherein, described by parts by volume L1Doping mixed solution, parts by volume L2Water mixing after, it is anti-with silicon tetrachloride liquid phase
Doping silicon dioxide gel should be obtained, is specifically included:
It is mixed doping mixed solution, water mixed liquor obtained under 10~100 degrees Celsius with silicon tetrachloride liquid phase reactor
Obtain doping silicon dioxide gel.
That is, specific reaction environment can carry out at normal temperature, do not need to heat；Or reaction environment can be heated,
60~90 degrees Celsius are such as heated to, reaction rate can be improved.
In specific implement, the preparation method of above-mentioned quartz glass,
The lytic agent includes the first lytic agent for dissolving first doped compound, the first lytic agent packet
Include at least one of methanol, ethyl alcohol, acetic acid, hydrochloric acid, nitric acid, distilled water, hydrogen peroxide；
First doped compound includes nitric hydrate aluminium Al (NO3)3·H2O, ANN aluminium nitrate nonahydrate Al (NO3)3·
9H2O, six hydration aluminium chlorate Al (ClO3)3·6H2O, aluminium chloride AlCl3At least one of.The first selected doped compound
It is mutually matched with the first lytic agent of the selection, the first doped compound is enable to be mutually dissolved with the first lytic agent.It is described
Single or multiple combinations can be used in first lytic agent, a doped compound.
In specific implement, the preparation method of above-mentioned quartz glass,
The lytic agent includes the second lytic agent for dissolving second doped compound, the second lytic agent packet
Include at least one of methanol, ethyl alcohol, acetic acid, hydrochloric acid, nitric acid, distilled water, hydrogen peroxide；
The compound containing Zr includes zirconium nitrate Zr (NO3)4·5H2O, zirconium carbonate ammonium ZrO (CO3)2(NH4)2·nH2O, carbon
Sour zirconium ZrOCO3·nH2O, eight water oxygen zirconium chloride ZrOCl2·8(H2O), zirconium chloride ZrCl4, eight water basic zirconium chloride ZrOCl2·
8H2At least one of O；
The compound containing Y includes yttrium oxalate Y2(C2O4)3·10H2O, yttrium nitrate Y (NO3)3·6H2O, it is hydrated yttrium carbonate Y2
(CO3)3·3H2O, six water YCl of yttrium chloride3·6H2O, chloride hydrate yttrium YCl3H2At least one of O；
The compound containing La includes lanthanum chloride LaCl3, Lanthanum trichloride hexahydrate LaCl3·6H2O, lanthanum nitrate La (NO3)3·
6H2O, lanthanum carbonate La2(CO3)3.8H2At least one of O；
The compound containing Sc includes six water scandium chloride ScCl3·6H2O, scandium chloride ScCl3, scandium nitrate Sc (NO3)3·
3H2O, scandium nitrate Sc (NO3)3·4H2O, scandium nitrate Sc (NO3)3·5H2O, scandium nitrate Sc (NO3)3·6H2O, six water plant acid scandium Sc2
(C2O4)3·6H2At least one of O；
The compound containing Th includes thorium nitrate Th (NO3)4·4H2O, thhorium oxalate Th (C2O4)2, thorium tetrachloride ThCl4, it is high
Chloric acid thorium Th (ClO4)4At least one of；
The compound containing V includes vanadium chloride VCl3, nitric acid vanadium acyl VO2NO3At least one of；
The compound containing Ti includes Titanium Nitrate Ti (NO3)4。
The second selected doped compound and the second lytic agent of the selection are mutually matched, and make the second doped compound
It can be mutually dissolved with the second lytic agent.Single or a variety of groups can be used in second lytic agent, two doped compound
It closes.
In the quartz glass finished product made from the preparation method through above-mentioned quartz glass, Al2O3And ZrO2、Y2O3、La2O3、
Sc2O3、ThO2、V2O5、TiO2At least one of shared by specific gravity, the corrosion resistance of quartz glass finished product is determined, in order to same
When get both the script quality and corrosion resistance of glass, the Al2O3With SiO in the quartz glass finished product2Weight ratio can be
0.5~10%；Such as, 1%, 2%, 3%, 4%, 5%, 6%, 7%, 8%, 9% preferably, can be ZrO2、Y2O3、La2O3、Sc2O3、
ThO2、V2O5、TiO2At least one of more firm support is provided.
In order to reach above-mentioned weight proportion, specifically: the silicon tetrachloride for choosing m parts by weight, according to the Al2O3With institute
State SiO in quartz glass finished product2Weight ratio meter calculate the first doped compound weight.The specific weight of first doped compound
Amount is depending on the specific material of selection.
In addition, ZrO2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2At least one of in the quartz glass finished product
SiO2Weight ratio 0.5~5%.It is greatly improved, the corrosion resistance of quartz glass finished product.
According to the ZrO2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2At least one of with the quartz glass at
SiO in product2Weight ratio meter calculate the second doped compound weight.The specific weight of second doped compound is according to selection
Depending on specific material.
In specific implement, the preparation method of above-mentioned quartz glass is described by the doping silicon dioxide gel
Firing by burning process is quartz glass finished product, is specifically included:
Step 31, in T1At a temperature of to the doping silicon dioxide gel drying, obtain amorphous doping silicon dioxide
Powder, T1At 100~1000 degrees Celsius；
Amorphous doping silicon dioxide powder macroscopically shows as isotropism, without apparent fusing point when melting, only
Gradually soften with the raising of temperature, viscosity reduces, and is gradually transitions liquid.Amorphous state is also known as glassy state, can regard as
The very big subcooled liquid of viscosity.
Step 32, in T2At a temperature of to the doping silicon dioxide powder calcine, make the doping silicon dioxide powder turn
Become the doping silicon dioxide powder of crystalline state, T2At 1000~1500 degrees Celsius；
The doping silicon dioxide powder of crystalline state refers to prevailing form existing for solid body.
The doping silicon dioxide powder of crystallized state prepares the quartz glass finished product.
Further, the preparation method of above-mentioned quartz glass, it is described in T1At a temperature of it is solidifying to the doping silicon dioxide
Glue is dry, specifically includes:
Dry atmosphere is passed through the hothouse of the drying doping silicon dioxide gel, wherein the dry atmosphere includes sky
Gas, oxygen O2, chlorine Cl2, dichloride oxygen sulphur SOCl2At least one of.
In drying, carbon, moisture or hydroxyl remaining in doping silicon dioxide gel can remove.
In order to obtain the quartz glass finished product of high quality, the preparation method of above-mentioned quartz glass, the crystallized state
Doping silicon dioxide powder prepares the quartz glass finished product, specifically:
Step 33 carries out grinding to the doping silicon dioxide powder of the crystalline state, and to the doping titanium dioxide after grinding
Silicon dioxide powder after screening is used melting technology, 1000 by silicon powder material screen point, the silicon dioxide powder after being sieved
Under~2500 degrees Celsius, it is melting into the quartz glass finished product.
Using in different melting technologies, need to screen out the doping batch of corresponding particle size, for details, reference can be made to
Following embodiments:
One, vacuum electric process of smelting fusion process:
The doping silicon dioxide powder to the crystalline state carries out grinding, and to the doping silicon dioxide powder after grinding
Material screen point, the silicon dioxide powder after being sieved, by the silicon dioxide powder after screening using melting technology, 1000~
Under 2500 degrees Celsius, it is melting into the quartz glass finished product, specifically:
To after grinding doping silicon dioxide powder screening, obtain particle 20~200 mesh doping silicon dioxide powder,
The doping silicon dioxide powder of 20~200 mesh is melting into the quartz glass finished product using vacuum electric process of smelting.
Two, high-frequency plasma melting technology fusion process:
The doping silicon dioxide powder to the crystalline state carries out grinding, and to the doping silicon dioxide powder after grinding
Material screen point, the silicon dioxide powder after being sieved, by the silicon dioxide powder after screening using melting technology, 1000~
Under 2500 degrees Celsius, it is melting into the quartz glass finished product, specifically:
To after grinding doping silicon dioxide powder screening, obtain particle 40~300 mesh doping silicon dioxide powder,
The doping silicon dioxide powder of 40~300 mesh is melting into the quartz glass finished product using high-frequency plasma melting technology.
Three, gas refines melting technology fusion process:
The doping silicon dioxide powder to the crystalline state carries out grinding, and to the doping silicon dioxide powder after grinding
Material screen point, the silicon dioxide powder after being sieved, by the silicon dioxide powder after screening using melting technology, 1000~
Under 2500 degrees Celsius, it is melting into the quartz glass finished product, specifically:
To after grinding doping silicon dioxide powder screening, obtain particle 40~300 mesh doping silicon dioxide powder,
The doping silicon dioxide powder of 40~300 mesh is melting into the quartz glass finished product using gas refining melting technology.
Four, continuous melting technique fusion process:
The doping silicon dioxide powder to the crystalline state carries out grinding, and to the doping silicon dioxide powder after grinding
Material screen point, the silicon dioxide powder after being sieved, by the silicon dioxide powder after screening using melting technology, 1000~
Under 2500 degrees Celsius, it is melting into the quartz glass finished product, specifically:
To after grinding doping silicon dioxide powder screening, obtain particle 40~300 mesh doping silicon dioxide powder,
The doping silicon dioxide powder of 40~300 mesh is melting into the quartz glass finished product using continuous melting technique.
The present invention provides the preparation methods of the quartz glass of several samples, referring specifically to table 1:
The quartz glass that above-mentioned 3 samples obtain is in etching condition are as follows:
Corroded in 40 DEG C of temperature, excellent pure grade HF and volume ratio=9:4 solution of the pure acetic acid of analysis, the present invention obtains
Quartz glass corrosion rate be respectively less than 26 μm/h, existing pure quartz glass corrosion rate under above-mentioned etching condition is 60 μ
m/h；
40 DEG C of temperature, F2In in corroded, the corrosion rate of the quartz glass that the present invention obtains is 65 μm/h, existing height
Pure quartz glass corrosion rate under above-mentioned etching condition is 150 μm/h；
Through above-mentioned experiment it is found that corrosion rate is respectively 60 μm/h under above-mentioned etching condition with existing pure quartz glass
It is compared with 150 μm/h, the quartz glass that the present invention obtains substantially increases the corrosion resistance of quartz glass.Inventive embodiments system
The quartz glass obtained belongs to high-quality quartz glass, can be suitable for the application demand in the fields such as semiconductors manufacture.
Embodiment two
A kind of quartz glass that one embodiment of the present of invention proposes, comprising:
The preparation method of quartz glass finished product, the quartz glass finished product quartz glass is prepared；
The preparation method of the quartz glass, comprising:
The first doped compound, the dissolution of the second doped compound are mixed to form doping mixed solution, institute by lytic agent
Stating the first doped compound is aluminum contained compound, and second doped compound includes compound containing Zr, compound containing Y, contains La
At least one of compound, compound containing Sc, compound containing Th, compound containing V, compound containing Ti；
By parts by volume L1Doping mixed solution, parts by volume L2Water mixing after, adulterated with silicon tetrachloride liquid phase reactor
Silica dioxide gel；
The doping silicon dioxide gel is fired by burning process as quartz glass finished product, wherein the quartz glass
It include to fire the Al being transformed through the first part in the doping mixed solution in glass finished product2O3, through the doping mix
Second part in solution fires the ZrO being transformed2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2At least one of；
Al2O3And ZrO2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2At least one of with network intermediate or network
Ectosome form is filled in SiO2In the hole of tetrahedral network structure.
In quartz glass finished product provided by the invention, Al2O3、ZrO2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2With net
Network intermediate or network outer body form are filled in SiO2In the hole of tetrahedral network structure, cause quartz glass of the present invention more
It is close；Meanwhile Al2O3、ZrO2、Y2O3、La2O3、Sc2O3、ThO2、V2O5、TiO2Resolution valence ratio SiO2Height, i.e., compared with SiO2It is anti-
The corrosivity of hydrofluoric acid is strong, and it is fast can to reduce quartz glass corrosion of (such as hydrofluoric acid environment) in acid solution or sour gas
Rate, and then improve the acid-resisting corrosive nature of quartz glass.
Specifically, the preparation method of quartz glass described in the present embodiment two can directly adopt the offer of above-described embodiment one
The quartz glass preparation method, concrete implementation structure can be found in related content described in above-described embodiment one, this
Place repeats no more.
Wherein, quartz glass finished product can be according to using different grinding tools to burn out product of different shapes.The quartz glass
Glass finished product can be quartz glass stone roller, quartz glass bar, quartz glass tube, quartz glass plate, quartz glass ring, quartz glass branch
Frame, quartz glass plate, quartz glass flange, quartz glass cutting boat or quartz glass rinse bath.
In the above-described embodiments, it all emphasizes particularly on different fields to the description of each embodiment, there is no the portion being described in detail in some embodiment
Point, reference can be made to the related descriptions of other embodiments.
It is understood that the correlated characteristic in above-mentioned apparatus can be referred to mutually.In addition, in above-described embodiment " the
One ", " second " etc. is and not represent the superiority and inferiority of each embodiment for distinguishing each embodiment.
In the instructions provided here, numerous specific details are set forth.It is to be appreciated, however, that implementation of the invention
Example can be practiced without these specific details.In some instances, well known structure and skill is not been shown in detail
Art, so as not to obscure the understanding of this specification.
Similarly, it should be understood that in order to simplify the disclosure and help to understand one or more of the various inventive aspects,
Above in the description of exemplary embodiment of the present invention, each feature of the invention is grouped together into single implementation sometimes
In example, figure or descriptions thereof.However, the device of the disclosure should not be construed to reflect an intention that i.e. required guarantor
Shield the present invention claims features more more than feature expressly recited in each claim.More precisely, as following
Claims reflect as, inventive aspect is all features less than single embodiment disclosed above.Therefore,
Thus the claims for following specific embodiment are expressly incorporated in the specific embodiment, wherein each claim itself
All as a separate embodiment of the present invention.
Those skilled in the art will understand that can be carried out adaptively to the component in the device in embodiment
Change and they are arranged in one or more devices unlike this embodiment.It can be the component combination in embodiment
At a component, and furthermore, they can be divided into multiple subassemblies.In addition at least some of such feature is mutual
It, can be using any combination to institute disclosed in this specification (including adjoint claim, abstract and attached drawing) except repulsion
There are feature and all components of so disclosed any device to be combined.Unless expressly stated otherwise, this specification (including
Adjoint the claims, abstract and drawings) disclosed in each feature can be by providing the substitution of identical, equivalent, or similar purpose
Feature replaces.
In addition, it will be appreciated by those of skill in the art that although some embodiments described herein include other embodiments
In included certain features rather than other feature, but the combination of the feature of different embodiments mean it is of the invention
Within the scope of and form different embodiments.For example, in the following claims, embodiment claimed is appointed
Meaning one of can in any combination mode come using.Various component embodiments of the invention can be implemented in hardware, or
It is implemented in a combination thereof.
It should be noted that the above-mentioned embodiments illustrate rather than limit the invention, and ability
Field technique personnel can be designed alternative embodiment without departing from the scope of the appended claims.In the claims,
Any reference symbol between parentheses should not be configured to limitations on claims.Word "comprising" does not exclude the presence of not
Component or component listed in the claims.Word "a" or "an" before component or component does not exclude the presence of multiple
Such component or component.The present invention can be realized by means of including the device of several different components.It is several listing
In the claim of component, several in these components, which can be through the same component item, to be embodied.Word first,
Second and the use of third etc. do not indicate any sequence.These words can be construed to title.
The above described is only a preferred embodiment of the present invention, be not intended to limit the present invention in any form, according to
According to technical spirit any simple modification, equivalent change and modification to the above embodiments of the invention, this hair is still fallen within
In the range of bright technical solution.
Claims (13)
1. a kind of preparation method of quartz glass characterized by comprising
The first doped compound, the dissolution of the second doped compound are mixed to form doping mixed solution by lytic agent, described the
One doped compound is aluminum contained compound, and second doped compound includes compound containing Zr, compound containing Y, chemical combination containing Sc
At least one of object, compound containing Th, compound containing V, compound containing Ti；
By parts by volume L1Doping mixed solution, parts by volume L2Water mixing after, with silicon tetrachloride liquid phase reactor obtain doping dioxy
SiClx gel, specifically includes:
During silicon tetrachloride is gradually added doping mixed solution and water mixed mixed liquor, and to the mixed liquor into
Row stirring, obtains doping silicon dioxide gel；Or, silicon tetrachloride, doping mixed solution and the mixed mixed liquor of water are distinguished
After atomization, while being passed through in reaction chamber and carrying out phase reaction acquisition doping silicon dioxide gel；
The doping silicon dioxide gel is fired as quartz glass finished product by burning process, wherein the quartz glass at
It include to fire the Al being transformed through the first part in the doping mixed solution in product2O3, through the doping mixed solution
In second part fire the ZrO that is transformed2、Y2O3、Sc2O3、ThO2、V2O5、TiO2At least one of.
2. the preparation method of quartz glass according to claim 1, which is characterized in that
L1、L2Ratio in 1:5~200.
3. the preparation method of quartz glass according to claim 1, which is characterized in that
The reaction rate of the silicon tetrachloride is in 20~500ml/min.
4. the preparation method of quartz glass according to claim 1, which is characterized in that
It is described by parts by volume L1Doping mixed solution, parts by volume L2Water mixing after, adulterated with silicon tetrachloride liquid phase reactor
Silica dioxide gel specifically includes:
It is mixed doping mixed solution, water mixed liquor mixed under 10~100 degrees Celsius with silicon tetrachloride liquid phase reactor
Miscellaneous silica dioxide gel.
5. the preparation method of quartz glass according to claim 1, which is characterized in that
The lytic agent includes the first lytic agent for dissolving first doped compound, and first lytic agent includes first
At least one of alcohol, ethyl alcohol, acetic acid, hydrochloric acid, nitric acid, distilled water, hydrogen peroxide；
First doped compound includes nitric hydrate aluminium Al (NO3)3·H2O, ANN aluminium nitrate nonahydrate Al (NO3)3·9H2O, six
It is hydrated aluminium chlorate Al (ClO3)3·6H2O, aluminium chloride AlCl3At least one of.
6. the preparation method of quartz glass according to claim 1, which is characterized in that
The lytic agent includes the second lytic agent for dissolving second doped compound, and second lytic agent includes first
At least one of alcohol, ethyl alcohol, acetic acid, hydrochloric acid, nitric acid, distilled water, hydrogen peroxide；
The compound containing Zr includes zirconium nitrate Zr (NO3)4·5H2O, zirconium carbonate ammonium ZrO (CO3)2(NH4)2·nH2O, zirconium carbonate
ZrOCO3·nH2O, eight water oxygen zirconium chloride ZrOCl2·8(H2O), zirconium chloride ZrCl4, eight water basic zirconium chloride ZrOCl2·8H2O
At least one of；
The compound containing Y includes yttrium oxalate Y2(C2O4)3·10H2O, yttrium nitrate Y (NO3)3·6H2O, it is hydrated yttrium carbonate Y2
(CO3)3·3H2O, six water YCl of yttrium chloride3·6H2O, chloride hydrate yttrium YCl3H2At least one of O；
The compound containing Sc includes six water scandium chloride ScCl3·6H2O, scandium chloride ScCl3, scandium nitrate Sc (NO3)3·3H2O, nitre
Sour scandium Sc (NO3)3·4H2O, scandium nitrate Sc (NO3)3·5H2O, scandium nitrate Sc (NO3)3·6H2O, six water plant acid scandium Sc2
(C2O4)3·6H2At least one of O；
The compound containing Th includes thorium nitrate Th (NO3)4·4H2O, thhorium oxalate Th (C2O4)2, thorium tetrachloride ThCl4, perchloric acid
Thorium Th (ClO4)4At least one of；
The compound containing V includes vanadium chloride VCl3, nitric acid vanadium acyl VO2NO3At least one of；
The compound containing Ti includes Titanium Nitrate Ti (NO3)4。
7. the preparation method of quartz glass according to claim 1, which is characterized in that
The Al2O3With SiO in the quartz glass finished product2Weight ratio 0.5~10%；
ZrO2、Y2O3、Sc2O3、ThO2、V2O5、TiO2With SiO in the quartz glass finished product2Weight ratio respectively 0.5~
5%.
8. the preparation method of any quartz glass according to claim 1~7, which is characterized in that
It is described to fire the doping silicon dioxide gel for quartz glass finished product by burning process, it specifically includes:
In T1At a temperature of to the doping silicon dioxide gel drying, obtain amorphous doping silicon dioxide powder, T1100
~1000 degrees Celsius；
In T2At a temperature of to the doping silicon dioxide powder calcine, so that the doping silicon dioxide powder is changed into crystalline state
Doping silicon dioxide powder, T2At 1000~1500 degrees Celsius；
The doping silicon dioxide powder of crystallized state prepares the quartz glass finished product.
9. the preparation method of quartz glass according to claim 8, which is characterized in that
It is described in T1At a temperature of to the doping silicon dioxide gel drying, specifically include:
Dry atmosphere is passed through the hothouse of the drying doping silicon dioxide gel, wherein the dry atmosphere include air,
Oxygen O2, chlorine Cl2, dichloride oxygen sulphur SOCl2At least one of.
10. the preparation method of quartz glass according to claim 8, which is characterized in that
The doping silicon dioxide powder of the crystallized state prepares the quartz glass finished product, specifically:
Grinding is carried out to the doping silicon dioxide powder of the crystalline state, and the doping silicon dioxide powder after grinding is sieved,
Silicon dioxide powder after screening is used melting technology by the silicon dioxide powder after being sieved, Celsius 1000~2500
Under degree, it is melting into the quartz glass finished product.
11. the preparation method of quartz glass according to claim 10, which is characterized in that
The doping silicon dioxide powder to the crystalline state carries out grinding, and to the doping silicon dioxide Powder screen after grinding
Point, the silicon dioxide powder after screening is used melting technology, taken the photograph 1000~2500 by the silicon dioxide powder after being sieved
Under family name's degree, it is melting into the quartz glass finished product, specifically:
To the doping silicon dioxide powder screening after grinding, particle is obtained in the doping silicon dioxide powder of 20~200 mesh, by 20
The doping silicon dioxide powder of~200 mesh is melting into the quartz glass finished product using vacuum electric process of smelting；Or,
To the doping silicon dioxide powder screening after grinding, particle is obtained in the doping silicon dioxide powder of 40~300 mesh, by 40
The doping silicon dioxide powder of~300 mesh is melting into the quartz glass finished product using high-frequency plasma melting technology；Or,
To the doping silicon dioxide powder screening after grinding, particle is obtained in the doping silicon dioxide powder of 40~300 mesh, by 40
The doping silicon dioxide powder of~300 mesh is melting into the quartz glass finished product using gas refining melting technology；Or,
To the doping silicon dioxide powder screening after grinding, particle is obtained in the doping silicon dioxide powder of 40~300 mesh, by 40
The doping silicon dioxide powder of~300 mesh is melting into the quartz glass finished product using continuous melting technique.
12. a kind of quartz glass characterized by comprising
Quartz glass finished product, the quartz glass finished product use the system of any quartz glass in the claims 1-11
Preparation Method is prepared.
13. quartz glass according to claim 12, which is characterized in that
The quartz glass finished product be quartz glass stone roller, quartz glass bar, quartz glass tube, quartz glass plate, quartz glass ring,
Quartz glass bracket, quartz glass plate, quartz glass flange, quartz glass cutting boat or quartz glass rinse bath.
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| CN105481246A (en) * | 2015-12-01 | 2016-04-13 | 中国科学院上海光学精密机械研究所 | Rare earth, lanthanum and aluminum codoped quartz glass and preparation method thereof |
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