CN106414829A - Method of dynamically changing stitch density for optimal quilter throughput - Google Patents

Method of dynamically changing stitch density for optimal quilter throughput Download PDF

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Publication number
CN106414829A
CN106414829A CN201580027412.7A CN201580027412A CN106414829A CN 106414829 A CN106414829 A CN 106414829A CN 201580027412 A CN201580027412 A CN 201580027412A CN 106414829 A CN106414829 A CN 106414829A
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China
Prior art keywords
increment
stitch density
pattern
sewing
axis
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Granted
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CN201580027412.7A
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Chinese (zh)
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CN106414829B (en
Inventor
J·A·卡里尔
J·T·加勒特
J·W·迈尔斯
T·L·迈尔斯
J·B·特纳
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L&P Property Management Co
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L&P Property Management Co
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    • DTEXTILES; PAPER
    • D05SEWING; EMBROIDERING; TUFTING
    • D05BSEWING
    • D05B11/00Machines for sewing quilts or mattresses
    • DTEXTILES; PAPER
    • D05SEWING; EMBROIDERING; TUFTING
    • D05BSEWING
    • D05B19/00Programme-controlled sewing machines
    • D05B19/02Sewing machines having electronic memory or microprocessor control unit
    • D05B19/04Sewing machines having electronic memory or microprocessor control unit characterised by memory aspects
    • D05B19/10Arrangements for selecting combinations of stitch or pattern data from memory ; Handling data in order to control stitch format, e.g. size, direction, mirror image
    • DTEXTILES; PAPER
    • D05SEWING; EMBROIDERING; TUFTING
    • D05BSEWING
    • D05B19/00Programme-controlled sewing machines
    • D05B19/02Sewing machines having electronic memory or microprocessor control unit
    • D05B19/12Sewing machines having electronic memory or microprocessor control unit characterised by control of operation of machine
    • DTEXTILES; PAPER
    • D05SEWING; EMBROIDERING; TUFTING
    • D05CEMBROIDERING; TUFTING
    • D05C5/00Embroidering machines with arrangements for automatic control of a series of individual steps

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Sewing Machines And Sewing (AREA)

Abstract

A method of dynamically changing stitch density of a pattern during sewing is provided. Embodiments of the invention include dynamically changing stitch density along an axis of a sewing pattern based on identifying pattern elements, which may include line segments and arc segments. Each of the line and/or arc segments is assigned a dynamically adjusted stitch density based on analysis of each pattern element and/or adjacent element. An adjusted stitch density is assigned to portions of pattern elements that satisfy a threshold measurement for sewing with an adjusted stitch density. In embodiments, a standard stitch density, intermediate stitch density, or an altered stitch density is automatically assigned to each portion of a sewing pattern based on an analysis of threshold length of an element, a threshold angle of a portion of the element with respect to the axis, and/or the stitch density assigned to an adjacent element.

Description

Dynamically change the method to optimize quilter output for the stitch density
Technical field
Embodiments of the invention be related to a kind of for dynamically changing the method to optimize quilter output for the stitch density And system.More specifically, embodiments of the invention are related to a kind of being based on and automatically analyzing specific pattern element and sets corresponding stitch The method to dynamically change the stitch density of quilter sewing pattern for the density.
Background technology
In the manufacture of sewing materials (such as quilting bed clothes material), may sew and there is the difference of different difficulty levels Pattern.For example, quilting pattern potentially includes the pattern element of complexity and/or details, and these pattern elements are preferably with higher pin Pin density is sewed, thus providing higher precision during sewing.So, the only some parts institute being limited to this pattern is excellent Choosing and/or the higher stitch density requiring, whole quilting patterns of may sewing under these constraints.However, from efficiency and Produce angle for, may certify that these complexity sewing region constraint existing problems because sacrifice output and remaining The decoration polytropy of pattern.Quilting pattern have the other parts of minimum details compared to the remainder of quilting pattern for Also generally it is sewed with identical stitch density, although these parts may be preferably compared to for the pattern element of more details And/or need to be sewed with less stitch density.For example, in traditional machine quilting system, with stitch consistent all the time Density sewing quilting pattern (that is, adopts higher stitch density for the pattern including details element), regardless of whether pattern is each Partial specific features.Accordingly, it would be desirable to a kind of feature based on quilting pattern element, for example, pass through in high stitch density, centre Checker between stitch density and low stitch density, and the system of specific stitch density of sewing in the element-specific of pattern and Method.
Content of the invention
Present invention relates in general to a kind of side of the stitch density for dynamically changing the pattern sewed by quilter Method and system.Embodiments of the invention are dynamic during sewing to change stitch density, thus optimizes measuring by yardage of quilter Output, sewing velocity is maintained at constant pin number (SPM) per minute and/or the constant number of turns per minute (RPM) speed simultaneously. So, automatically apply variable stitch density based on analysis sewing/quilting pattern with the element-specific of pattern, do not changing In the case of sewing velocity, embodiments of the invention can be used for dynamically making the figuratum sewing machine of sewing and/or quilting The yardage of machine maximizes.For example, a kind of method for change stitch density dynamic during sewing can be included, with constant Speed (such as SPM) is sewed, and automatically concentrates more stitch in the higher region of the stitch density determining simultaneously, and Automatically concentrate less stitch in the relatively low region of the stitch density determining.
In other embodiments, provide to sewing for the system and method changing stitch density dynamic during sewing The real-time analysis of the various elements (element of such as quilting pattern) of pattern.Therefore, need for comparing other sewing regions Will lower stitch density pattern element, the analysis of the present invention can provide the pattern automatically adjusting special stitch density.Similar Ground, during sewing, to provide the special stitch of pattern for some elements close for the dynamic embodiments of the invention changing stitch density Degree, for the relatively low element of the stitch density of surrounding, these elements can be stitched into that to have higher stitch clear Degree and accordingly higher stitch density.Optimum stitch density or preferred stitch density may be defined as the stitch of per inch Quantity, it can be used in sewing, for example to retain and/or to emphasize the one or more desired thin of sewing pattern Portion.
Embodiments of the invention include the variable stitch density in a kind of multiple elements for specifying specific pattern Method and system.In one exemplary embodiment of the invention, there is provided a kind of is that the first pattern element specifies first automatically Stitch density and the method specifying the second stitch density for the second pattern element.First stitch density per inch can be included than The less stitch quantity of two stitch density.In another embodiment, first and second can be determined with respect to standard stitch density Stitch density.So, embodiments of the invention can be used for automatically (1) is that first group of pattern element is specified closeer than standard stitch Spend the first lower stitch density, (2) are that second group of pattern element specifies second stitch density higher than standard stitch density, (3) it is the 3rd group of pattern element specified value stitch density.In such an embodiment, first, second, and third group of pattern unit Element differs.Therefore, the present invention can be used for the element-specific of automatic identification sewing pattern, and these elements are determined to be needs relatively Few stitch definition, and be thus suitable for being sewed using the stitch density lower than peripheral part of this pattern.This Plant lower stitch density and can be referred to as " hydridization stitch (wild stitch) " density of sewing.In other embodiments, sew The element-specific (such as first, second and/or the 3rd group of pattern element) of pattern needs higher stitch definition, and permissible Automatic identification stitch density higher than peripheral part of pattern accordingly.Determine alternatively, it is also possible to some parts for pattern Optimum stitch definition and/or stitch density optimum accordingly.In embodiments, can be by required minimum code Several, required maximum yardage, for determining the slowest sewing velocity (such as SPM) of stitch density, for determining stitch density The fastest sewing velocity (such as SPM), the Low threshold stitch density for the concrete material that will sew and/or for will stitch The high threshold stitch density of the concrete material threaded is determining the optimum of one or more parts for pattern and/or whole pattern Stitch definition, optimum stitch density and/or preferred stitch density.
In one embodiment of the invention, there is provided a kind of axis along sewing pattern dynamically changes stitch density Method.The method includes:Determine multiple elements of sewing pattern, the plurality of element includes one or more straight sections and one At least one of or multiple arcs section;Analyze each in one or more straight sections and one or more arc section Individual;The corresponding stitch density with least one of dynamic regulation and multiple elements, wherein, dynamic regulation stitch density bag Include:Based on the analysis to each of one or more straight sections and one or more arc section, it is in multiple elements At least one specify adjust after stitch density.
At another schematic aspect, a kind of for automatically adjusting pin between the element of the sewing pattern sewed along axis The method of pin density includes:Receive the pattern with multiple pattern elements, wherein, each of multiple pattern elements include one Individual or some;Analyze each of one or more parts of multiple pattern elements, to determine in multiple pattern elements Each whether meet the threshold value specifying the stitch density after change at least a portion for multiple pattern elements;And base In the analysis to each of one or more parts, it is that each of one or more parts of multiple pattern elements refer to Calibrate quasi- stitch density, change after stitch density and at least one of middle stitch density.
According to the 3rd schematic aspect, embodiments of the invention are related to a kind of automatic for the pattern element for sewing pattern The method specifying variable stitch density.The method includes:Receive the sewing pattern with multiple pattern elements, wherein, multiple Pattern element includes at least one of one or more straight sections and one or more arc section;Analyze multiple pattern units Each of element, with least a portion determining each of multiple pattern elements whether meet threshold length and with respect to The threshold angle of axis;With based on this analysis, be each of multiple pattern elements automatically specify corresponding stitch density.
The additional purpose of the present invention, advantage and novel feature will be partly articulated in the following description, and work as In part will become when those skilled in the art studies carefully hereafter it is clear that or can be led by the practice of the present invention Can arrive.
Brief description
Below with reference to the accompanying drawings the present invention, in figure are described in detail:
Fig. 1 is according to embodiments of the invention, using the exemplary patterns of stitch density sewing consistent all the time;
Fig. 2 is according to embodiments of the invention, using the exemplary patterns of variable stitch density sewing;
Fig. 3 is according to embodiments of the invention, using the exemplary patterns of variable stitch density sewing;
Fig. 4 is according to embodiments of the invention, using the exemplary patterns of variable stitch density sewing;
Fig. 5 is according to embodiments of the invention, using the exemplary patterns of variable stitch density sewing;
Fig. 6 A is according to embodiments of the invention, using the exemplary patterns of variable stitch density sewing;
Fig. 6 B is putting of the exemplary patterns of Fig. 6 A according to embodiments of the invention, being sewed using variable stitch density Most of;
Fig. 6 C is putting of the exemplary patterns of Fig. 6 A according to embodiments of the invention, being sewed using variable stitch density Most of;
Fig. 6 D is putting of the exemplary patterns of Fig. 6 A according to embodiments of the invention, being sewed using variable stitch density Most of;
Fig. 6 E is putting of the exemplary patterns of Fig. 6 A according to embodiments of the invention, being sewed using variable stitch density Most of;
Fig. 6 F is putting of the exemplary patterns of Fig. 6 A according to embodiments of the invention, being sewed using variable stitch density Most of;
Fig. 7 is according to embodiments of the invention, using the flow process of the illustrative methods of variable stitch density sewing pattern Figure;
Fig. 8 is according to embodiments of the invention, using the flow process of the illustrative methods of variable stitch density sewing pattern Figure;
Fig. 9 is according to embodiments of the invention, using the flow process of the illustrative methods of variable stitch density sewing pattern Figure;
Figure 10 is according to embodiments of the invention, using the flow process of the illustrative methods of variable stitch density sewing pattern Figure;
Figure 11 is according to embodiments of the invention, using the example system of variable stitch density sewing pattern;With
Figure 12 is according to embodiments of the invention, using the exemplary means of variable stitch density sewing pattern.
Specific embodiment
Present invention relates in general to a kind of for the dynamic stitch density that changes to optimize the method for quilter output and to be System.Embodiments of the invention include, and determine which part (if present) of quilting pattern meets and substitute pin for sewing The threshold requirement of pin density, this replacement stitch density is different from the standard stitch density being initially applied to sewing pattern.As herein Used in, " requirement " is not construed as strict or absolute restriction, and only refers only to or define that the present invention exists The one or more preferred or optimum measured value (such as threshold angle) using for realizing its purpose herein.In each reality Apply in example, for any number of applicable threshold value described below, " requirement " can be the correlative measurement determining in pattern The scope of value (such as inch, the number of degrees), can be determined in advance, can be limited by user, can be arranged by machine or manufacture Constraints determines.In certain embodiments, the method dynamically changing the stitch density of pattern sewed by quilter is included, Determine whether the part of the element-specific of pattern meets for the dynamic threshold value changing stitch density (that is, applying " hydridization stitch ") Require.
Based on the analysis to some embodiments of the present invention, dynamically change the stitch density of the specific part of sewing pattern, Thus optimize the yardage output of quilter, sewing velocity is maintained at constant SPM and/or RPM speed simultaneously.So, exist In the case of not changing sewing velocity, embodiments of the invention can be used for dynamically being used in sewing/quilting figuratum The yardage of sewing machine and/or quilter maximizes.Based on analysis sewing/quilting pattern and in the element-specific of pattern automatically Apply variable stitch density, with respect to using the sewing thread amount needed for constant higher stitch density sewing identical patterns Speech, it is possible to reduce sewing thread amount (the line code number consuming).In addition, in an embodiment of the present invention, sewing can be maintained reliable Property, optimize yardage output simultaneously.In one embodiment, sewing reliability also refers to during sewing or quilting pattern The not ability of bouncing pilotage and/or dropped stitch.
In other embodiments, during sewing, the dynamic stitch density that changes provides each element (example to sewing pattern Element as quilting pattern) real-time analysis.Therefore, need lower stitch density for comparing other sewing regions Pattern element, the analysis of the present invention can provide the pattern automatically adjusting special stitch density.Similarly, dynamic during sewing The embodiments of the invention changing stitch density provide the special stitch density of pattern for some elements, with respect to the stitch of surrounding For the relatively low element of density, these elements need higher stitch definition and accordingly higher stitch density.In the present invention Other embodiments in, can to whole quilting pattern application standard stitch density, and application the present invention analysis after, The one or more of quilting pattern partly can be identified as being suitable for being stitched with the stitch density lower than standard stitch density Thread.Therefore, these lower stitch density adjust and can lead to save line code number (for example, when making sewing pattern or part thereof Shi Keneng needs or using less line code number).Other embodiments of the invention include, for standard stitch density is usually used The pattern element of sewing is analyzed, to determine whether to meet for the identified part change stitch density to pattern element Threshold requirement.
Embodiments of the invention include a kind of for specifying variable stitch density in multiple elements of specific pattern Method and system.In one exemplary embodiment of the present invention, there is provided one kind is for automatically referring to the first pattern element Fixed first stitch density and the method that the second stitch density is specified to the second pattern element.First stitch density can be than the second pin Pin density includes less stitch quantity on per inch.Therefore, the present invention can be used for automatically identifying the spy of sewing pattern Determine element, these elements are determined to be needs less stitch definition, and is thus suitable for using the periphery than pattern Lower stitch density is divided to be sewed.So, the specific part of sewing pattern can be identified as being adapted for use with " hydridization pin Pin " (that is, the stitch density lower than the remainder of quilting pattern) is sewed.
Turning now to the exemplary embodiment of in figure, Fig. 1 shows showing using stitch density 12 sewing consistent all the time The embodiment of example property pattern 10.As shown in figure 1, exemplary patterns can include multiple patterns of the method according to the invention identification Element.As used below, element generally refer to can to differentiate with other side can the setting of visual identity Meter aspect.For example, the design aspect of such as straight line can visually be differentiated with curve, and right angle (is for example made up of sewing thread Acute angle turn turning shape) can visually with obtuse angle (for example by the sewing thread structure of two line segments having more than an angle of 90 degrees degree Become turns turning shape, and the summit constituting with respect to this two line segments measures this angle) differentiate.So, in these embodiments, First element 14, second element 16, third element 18, fourth element 20 and The Fifth Element 22 can be identified as quilting pattern 10 Different piece, need during sewing analysis which kind of stitch density is applied to each pattern element.For example, this analysis can be used In determining whether possible application " hydridization stitch " (that is, the stitch density of change).In other words, each of quilting pattern can be analyzed Element, to determine when the different pattern element in sewing pattern 10, if the stitch density being transformed into change (is for example adjusted to The stitch density more higher or lower than standard stitch density).
With reference now to Fig. 2, exemplary quilting pattern 24 describes a kind of change stitch density dynamic during sewing Method.In certain embodiments, the dynamic stitch density that changes is included between more than one stitch density (for example low, middle And high stitch density between;Or in standard and the stitch density of change between) automatically change, and manual identification should be to it Application or the specific pattern element using specific stitch density.In the figure 2 example, the element of the change based on pattern 24, makes With variable stitch density sewing pattern 24.So, the first stitch density 26 is used for sewing the first element 32, third element 36 and The Fifth Element 40, and the second stitch density 28 and 30 is used for sew second element 34 and fourth element 38.In an embodiment, second Stitch density 28 and 30 is identical stitch density, is applied to the similar element of pattern 24.For example, for quilting pattern 24 Straight sections, such as Part I 32, Part III 36 and Part V 40, embodiments of the invention can determine with the first pin Pin density 26 this pattern of sewing.In another embodiment, the bending for the specific part of quilting pattern 24 and/or curved portions Section, such as Part II 34 and Part IV 38, embodiments of the invention can determine with the second stitch density 28 and/or 30 seam Thread this pattern.So, for the straight sections of pattern 24, can be to the needs of pattern 24 less stitch definition (such as straight line) The lower change of certain applications stitch density (that is, " hydridization stitch ").It is likewise possible to the remainder to pattern 24 (including exemplary Part II 34 and Part IV 38) higher stitch density of application is for example higher than the stitch density changing Standard stitch density.
Turning now to Fig. 3, exemplary pattern 42 includes the multiple different units for sewing pattern (such as quilting pattern) The variable stitch density of element.The embodiment of pattern 42 is included with the first element 54 of the first density 44 sewing, with the second density 46 sewing second elements 56, with triple density 48 sewing third element 58, with the 4th density 50 sewing fourth element 60, With the The Fifth Element 62 sewed with the 5th density 52.In an embodiment it may be determined that using variable stitch density 44,46,48, Each of 50 and 52 sewing first, second, third, fourth and fifth pattern elements 54,56,58,60 and 62.Real at some Apply in example, the element (such as 54,56,58,60 and 62) to pattern 42 carries out Threshold Analysis, to identify and/or to determine whether to Using one or more elements (such as 54,56,58,60 and 62) of standard stitch density sewing pattern 42, or whether to use The stitch density one or more elements of sewing (such as 54,56,58,60 and 62) changing.In one embodiment, to pattern 42 Element (such as 54,56,58,60 and 62) carry out stitch density Threshold Analysis determine so as to each element (such as 54,56, 58th, 60 and 62) stitch density determining does not damage sewing machine performance, the quality of final products or productivity ratio.
In other embodiments, variable stitch density 44,46,48,50 and 52 can be different from each other, and can be according to Low, middle or high stitch density classification.For example, stitch density 44 can include the stitch density bigger than stitch density 46.In addition, Stitch density 48 can be middle stitch density so that it is the stitch density lower than stitch density 46, but be closeer than stitch Spend 44 high stitch density.In another embodiment, the method according to the invention, variable stitch density 44,46,48,50 and 52 can be the stitch density increasing little by little and/or step by step or reducing.When changing between different stitch density, this Increase kind progressively or reduce and can allow each variable stitch density close to the pin specified for neighbouring and/or adjacent element Pin density (that is, progressively reaches adjacent stitches density).For example, it is that variable stitch density 44 that element 54 is specified can be with unit Element 54 and 56 between the reduction (for example, persistently sewing to element 56 from element 54 with sewing head) of sewing distance and progressively increase Plus its stitch density.So, in an embodiment of the present invention, the stitch density of a part of element 54 can " oblique ascension " arrive step by step The stitch density specified for element 56.In this example, for a part of element 54 of the starting point near element 56, variable The stitch density of stitch density 44 can increase little by little and/or step by step.In alternative embodiments, be pattern element assignment Stitch density can " oblique deascension ", to include the middle stitch density of the first element portions for neighbouring second element, wherein This second element has the stitch density less than the first element.
In certain embodiments, according to the Threshold Analysis for each element in pattern, each element can be specified multiple Stitch density (and each corresponding element of subsequently sewing).For example, it is possible to the length of analysis straight line, the curvature of arc section, element Angle with regard to axis and/or the relation of an element and another element.In certain embodiments, additional factor is acceptable Including for produce and one or more technical elements assessment, for example possible pin deviation, the machine type being used are (for example Needle ring (needle and looper) is with respect to needlework axle (needle and bobbin) sewing system) and sewed, sew with long stitches The feature of the material of seam, embroidery and/or lock seaming.In an embodiment of the present invention, it is possible to use one or more be used for specify and/ Or the algorithm of the change of regulation stitch density, to optimize accuracy and efficiency, and so that yardage is maximized, ensure not damage simultaneously Sewing reliability (for example preventing bouncing pilotage, poly- line or kinking, broken string).So, in certain embodiments, based on Threshold Analysis and/ Or other analysis, specific element can be identified as needing specific first seam density.For example, Threshold Analysis determine permissible Show, the first seam density of element-specific can meet one or more threshold values, this will enable element-specific with second Seam density is sewed, and thus optimizes one or more of accuracy, efficiency, sewing yardage, sewing reliability etc..
Below with reference to Fig. 4, using variable stitch density along axis 114 sewing pattern 64.In an embodiment, using can The stitch density sewing pattern 64 becoming refers to, sewing pattern 64 is so that at least a portion of at least one element of this pattern 64 Sewed with the first stitch density, at least a portion of at least one element of this pattern 64 is sewed with the second stitch density.For example, One element of pattern 64 can include straight sections, and the Part I of this straight sections is sewed with the first stitch density, and this is straight The Part II of line section is sewed with the second stitch density.In some embodiments of the invention, straight sections can include one Individual or some.Similarly, an element of pattern 64 can include arc section (the bending element of such as pattern), this arc The Part I of shape section is sewed with the first stitch density, and the Part II of this arc section is sewed with the second stitch density.This Sample, which of each pattern element embodiments of the invention be determined for partly will be with the first stitch density (such as standard pin Pin density) sewing, which of each pattern element partly will be sewed with the second stitch density (stitch density of such as change).At it In its embodiment, the stitch density of any number of change can be applied to the different piece of any number of pattern element, Such as the 3rd stitch density is used for a part at least one element of sewing pattern 64.In an embodiment, can be according to this One of multiple stitch density of multiple element assignments of invention identification, with using variable stitch density, with constant sewing Speed is sewed.
In the fig. 4 embodiment, pattern 64 shows sewing pattern 66, and it includes multiple elements, such as first straight line portion Section the 68, first arc section 70, second straight line section 72, the second arc section 74 and the 3rd straight sections 76.The present invention's In embodiment, based on the determination that whether each several part of each element is met with one or more threshold requirement, it is sewing pattern 66 Each section specifies the stitch density for sewing.As shown in the embodiment depicted in fig. 4, during sewing along axis 114, according to this Bright method dynamically changes stitch density.In certain embodiments, axis 114 can be x-axis, and wherein, x-axis have corresponded to Become the bracket axis of the sewing device of sewing pattern (and/or being ready to complete at least a portion sewing pattern).Alternatively, another In embodiment, axis 114 can be y-axis, and wherein y-axis correspond to and complete sewing pattern and (and/or be ready to complete at least one Point sewing pattern) sewing device charging axis.In certain embodiments, the orientation of axis 114 is corresponding to sewing technology One or more technical elements (type for example to the sew related machine of this sewing pattern or device) determination.In Fig. 4 Embodiment in, when for sewing material advance along axis 114 when, with constant speed, sewing pattern 66 can be sewed To on material, and on whole sewing pattern 66, there is variable stitch density.
In one embodiment of the invention, first straight line section 68 is determined meeting for referring to for first straight line section 68 The threshold requirement of the fixed stitch density 80 changing.In an embodiment, first straight line section 68 meets threshold length and with respect to axle The threshold angle of line 114, and therefore it is designated the stitch density 80 (i.e. " hydridization stitch " density) to change.Implement other Example in, based on the analysis of the one or more parts to the first arc section 70, determine the first arc section 70 be unsatisfactory for for Specify the threshold requirement of the stitch density 80 changing, and therefore sewed with standard stitch density 78.In an embodiment, same Sample determines that second straight line section 72 and the 3rd straight sections 76 meet the threshold requirement of the stitch density 80 for specifying change, and Threshold requirement that threeth arc section 74 be unsatisfactory for stitch density 80 for specify change is similarly determined, and is therefore referred to Determine with standard stitch density 78.In one example, by for the first arc section 70 and the second arc section 74 institute of sewing The high level of detail (that is, high stitch definition) needing, therefore for this two section specified value stitch density 78.In other In embodiment, due to for first straight line section 68 of sewing, second straight line section 72 and low needed for the 3rd straight sections 76 Level of detail (that is, relatively low stitch definition), therefore specifies the stitch density 80 of change, this makes for these three straight sections Can be (that is, only to pass through with pattern remainder identical sewing speed these parts of sewing in the case that output is bigger Adjust the stitch quantity of sewing in predetermined distance, the pin number of such as per inch).
Can determine that the first arc section 70 and the second arc section 74 are not suitable for and/or meet for specifying the pin changing The threshold requirement of pin density 80.First and second arc sections 70 and 74 show compact circle or oval bent in the diagram Rate.In order to keep enough curvature details of the first and second arc sections 70 and 74, example during the sewing of sewing pattern 64 As stitch density that is preferred and/or needing bigger stitch concentration degree or higher.Higher stitch density remains arc section 70 and 74 more details, and create smooth, completely curvature.If using standard stitch density, first and second The curvature of arc section 70 and 74 may be less smooth, and this is possibly undesirable in final sewing pattern.Generally, more High per inch sews pin number (such as SPI) corresponding to the higher levels of fine detail that can retain in sewing pattern. Therefore, it may be determined that using, there is ratio for the element (being for example characterized as the element of straight line) needing less or least amount of detail The stitch density (such as " hydridization stitch ") of the change of the less SPI of standard stitch density.Using having ratio standard stitch density The stitch density of the change of less SPI may further result in faster sewing velocity, because being sewed using less SPI one Or multiple it is determined to be the element with less details.
With reference now to Fig. 5, according to embodiments of the invention, using variable stitch density along axis 114 sewing example The pattern 82 of property.In the 5 embodiment of figure 5, sewing pattern 84 includes multiple different elements for sewing with variable density. So, sewing pattern 84 is included with the first straight line section 86 of standard stitch density 88 sewing and is stitched with the stitch density 92 changing The second straight line section 90 threaded.Show the stitch density 92 being suitable for changing of sewing pattern 84 with relatively low stitch density Each several part, and it is shown suitable for each several part of standard stitch density 88 with higher stitch density.
As shown in figure 5, embodiments of the invention include determining whether the part of the element-specific of pattern 82 meets and be used for making The threshold value of the stitch density sewing with adjusting.In one embodiment, for the threshold value bag using the stitch density sewing adjusting Include, determine whether the part of pattern element meets threshold value sewing distance.According on one side, threshold value sewing distance can be between half Between inch and three inches.In another embodiment, at least one inch of the length of threshold value sewing distance.So, according to this Bright embodiment, when determine analyzed straight sections part be less than one inch threshold value sewing apart from when, this line part The stitch density sewing partly may being not suitable for using regulation of section.It should be noted that sewing distance included here is only It is example, is not construed as restricted, need because each sewing pattern is potentially based on the element of each sewing pattern The threshold value sewing distance of different determinations.And, it will be appreciated by persons skilled in the art that according to application and pattern, in millimeter extremely Threshold value sewing distance on the foot order of magnitude all should be considered in embodiment considered here.For example, for sewing landing The threshold value that umbrella limited or determined sews distance may be with the threshold value seam that pillowcase limited or determined for sewing on the order of magnitude Distance of threading is different.
In one embodiment, due to the length of the sewing pattern in the part 94 of Fig. 5, for the whole seam in this part 94 Thread pattern 82 specified value stitch density 88, and the single straight sections (such as 93,95 and 97) in this part 94 are all unsatisfactory for For the threshold length using stitch density 92 sewing changing.Similarly, according to embodiments of the invention, when arc section (distance of the second point for example on first point arc section to arc section, wherein, along arc in length for part This distance of the curvature measurement of section) less than one inch when, this arc section partly may be not suitable for using adjust stitch Density is sewed.So, as shown in figure 5, when each turning section 96 of sewing pattern 84 is less than one inch of threshold length, permissible Each turning section 96 with standard stitch density 88 this sewing pattern 84 of sewing.For example, " zig zag " in sewing pattern 84 can Threshold length can be unsatisfactory for, and the standard stitch density specified can be kept, thus maintaining this " zig zag " pattern part On sewing details integrality.
In an embodiment, once meeting the threshold value for minimum sewing distance, then each element of analysis sewing pattern is each Part, to determine whether this pattern and/or pattern part meet the threshold angle with respect to axis 114.In one embodiment, After having met threshold length, the threshold angle of a part for sewing pattern can be equal to or less than specific or restriction Threshold angle, such as be in 40 degree or less of angle with axis 114, to be suitable for the stitch density changing.Typically can pass through Element portions at least partially define threshold angle with respect to the orientation of axis 114, regardless of whether this axis is towards which direction (such as x-axis or y-axis), no matter also for the pattern with regard to axis of sewing, if with respect to horizontal or vertical axle Line is measuring this threshold angle.In other words, the every side in axis 114 there is the sewing pattern part of angle within 40 degree can To meet the threshold value using the stitch density sewing changing.In this context it is noted that for the horizontally and vertically axle being previously mentioned Line, they are descriptive with respect to pattern in itself, and do not mean that the vertical motion of such as needle.
Embodiments of the invention can also include determining whether a part for the element-specific of pattern meets for using tune The threshold value of the stitch density sewing of section.For example, in certain embodiments, in addition to determining and meeting threshold length, arc section Respective increment may each meet a threshold angle with respect to axis so that be designated with change stitch density.In figure In the exemplary patterns 98 of 6A, the method for variable stitch density of sewing includes multiple discernible pattern units that determine and sew Element.Fig. 6 A includes arc section sewing pattern 100, and it has some, for example, sewed (for example with standard stitch density 104 Be determined to be using preferred stitch density and/or specify stitch density sewing) Part I 102 and the stitch changing Density 108 is sewed the Part II 106 of (being for example determined to be the stitch density having preferred stitch density and/or specifying). In an embodiment, the threshold angle partly may being unsatisfactory for respect to axis 114 in Part I 102 for the sewing pattern 100. Therefore, in this case, even the Part I 102 in arc section may meet for using the stitch density changing It is also possible to discomfort is combined into Part I 102 specifies the stitch density 108 changing in the case of the threshold length of 108 sewing.In reality Apply in example, in all parts of sewing pattern 100, stitch density can change over the second stitch density from the first stitch density (and returning to the first stitch density).For example, point 110 at, when sewing clockwise with respect to axis 114, sewing pattern 100 from Standard stitch density 104 is changing into the stitch density 108 (such as " hydridization stitch " density) of change.Continuing sewing pattern 98 When, stitch density can be changing into standard stitch density 104 from the stitch density 108 changing at point 112 again.In embodiment In, variable density in pattern 98 can be depending on sewing pattern 100 when from being unsatisfactory for the threshold angle with respect to axis 114 Degree changes over the threshold angle (for example at point 110) meeting with respect to axis 114.In addition, in an embodiment, identical is sewed Pattern 100 from meet change over respect to the threshold angle of axis 114 be unsatisfactory for respect to axis 114 threshold angle (for example At point 110).So, single arc section can include some differing, and each of the plurality of part is corresponding In one or more different stitch density.
Referring now to Fig. 6 B, according to embodiments of the invention, the exemplary diagram of Fig. 6 A that sewed using variable stitch density The amplifier section 116 of case 98, the stitch density 108 including the Part I 102 sewed with standard stitch density 104 with to change The Part II 106 of sewing.In an embodiment, along amplifier section 116 arc section produce multiple increments, including increment A, B, C and D.Therefore, the arc section of interpolation (interpolated) can be to have the multiple increasings being compared with regard to axis 114 Any arc section of amount.The arc section of the interpolation of Fig. 6 B defines the increment being equal or approximately equal, in order to determine this arc Whether at least a portion of shape section meets the threshold angle with respect to axis 114, and wherein, a part can include one or many Individual increment.In an embodiment, the arc section of sewing pattern 100 can be interpolated to including multiple increment A, B, C and D, wherein, Each increment A, B, C and D approximately uniformly can be spaced apart with angle 126 with respect to arc axis 128.So, when with side clockwise During formula sewing, increment A can have in the increment starting point at point 118 and the increment terminal at point 120.Similarly, increment B can To have in the increment starting point at point 120 and the increment terminal at point 110;The increment that increment C can have at point 110 rises Point and the increment terminal at point 122;Increment D can have whole in the increment starting point at point 122 and the increment at point 124 Point.In the example of 6 b it, can be along the arc section of each incremental evaluation sewing pattern 100 of arc section, such as by increasing Amount A, B, C and D are limited.In another example, increment A, B, C and/or D can wholly or partly combine, to carry A part for arc section.During the analysis of sewing pattern 100, have multiple increments arc section a part of permissible It is compared with axis 114.In some embodiments of the invention, a part also referring to sewing pattern with another increment Neighbouring and/or adjacent increment.Usually it is appreciated that neighbouring and/or adjacent increment can form at least one of pattern The part of continuous sewing.
Therefore, below with reference to Fig. 6 C, the amplifier section 130 of the exemplary patterns 98 of Fig. 6 A describes, in sewing pattern 98 Inclusion one or more elements each several part when, determine using which kind of stitch density embodiment.Especially, the enforcement of Fig. 6 C Example describes the stitch density that the increment of the interpolation using Fig. 6 B determines whether using changing and sews arc section A part.In other embodiments, determine a little part between 118 and 110 meet threshold length and/or threshold value sewing away from From afterwards, determine, using the x-axis of positioning and y-axis at point 118, the angle that increment A is with respect to axis 114.In other words, Using the straight line 132 drawn between point 118 and point 120, determine increment with respect to axis 114 (parallel with y-axis at point 118) The angle 134 of A.In one embodiment, determine whether the first increment A meets the threshold angle with respect to axis 114.In Fig. 6 C Embodiment in, increment A is positioned with the angle bigger than threshold quantity with respect to axis 114, and is therefore designated with standard stitch Density.
Turning now to Fig. 6 D, the amplifier section 136 of the exemplary patterns 98 of Fig. 6 A further describes determination and is used for sewing Stitch density embodiment.For increment B, it is possible to use at point 120, with y-axis, the x-axis of positioning determine that increment B is relative Angle 140 in axis 114.In other words, using the straight line 138 drawn between point 120 and 110, can be with respect to axis 114 (being expressed as parallel with y-axis at point 120) determines the angle 140 of increment B.In one embodiment, based on the angle to increment A The assessment of the angle 140 of degree 134 and increment B, when angle 134 and angle 140 meet the threshold angle with respect to axis 114, Can determine whether the whole part of a little arc section between 118 and 110 meets the threshold angle with respect to axis 114.? In the embodiment of Fig. 6 D, increment B can be positioned with the angle bigger than threshold quantity with respect to axis 114, and therefore can be for increasing Amount B specified value stitch density.
It is likewise possible to determine the angle that increment C and D is with respect to axis 114 respectively, and determined specified using this angle Standard stitch density or the stitch density of change.In an embodiment, once it is determined that two of arc section neighbouring and/or adjacent Increment meet with respect to axis 114 specific threshold angle, then when can meet further combination increment threshold length When (with reference to Fig. 6 B), the stitch density of change can be specified for this two increments.Correspondingly, in the example of Fig. 6 C-6D, due to , more than the threshold angle angle value with respect to y-axis (that is, with respect to axis 114), therefore arbitrary increment is all for angle 134 and angle 140 The stitch density to change cannot be designated.So, in the embodiment of Fig. 6 C-6D, increment A and B be described as by Specify the standard stitch density for sewing.In certain embodiments, can be all parts specified value of sewing pattern Stitch density, for example, " give tacit consent to " stitch density specified.Therefore, in an embodiment, only figuratum meet whole two and can fit Threshold value just may adapt to using the pin changing with regard to those parts of threshold angle and threshold value sewing distance Pin density (for example lower than the existing of pattern and/or standard stitch density stitch density) sewing.In one embodiment, phase Threshold angle for axis 114 is 40 degree or less.
Turning now to Fig. 6 E, according to embodiments of the invention, the amplifier section 142 of the exemplary patterns 98 of Fig. 6 A includes really Determine the example of the stitch density in pattern element.Fig. 6 E describe with above respectively in Fig. 6 C and 6D with regard to described in increment A and B Similar determination method.However, as illustrated in fig. 6e, when x-axis and y-axis are positioned at a little at 110, can be by from point 110 Extend to a little 122 straight line 144 to determine into respect to axis 114 (for example, its axis 114 is parallel with y-axis at point 110) There is and/or formed the special angle 146 that may be unsatisfactory for threshold angle.In one embodiment it may be determined that increment C meets Threshold angle with respect to axis 114.In one embodiment, angle 146 can less than threshold angle angle value (for example with respect to axle Line 114 is less than 40 degree), and the stitch density to change therefore can be designated when meeting other threshold value.For example, at some In embodiment, the increment of at least two adjacent increments and/or number of thresholds can meet the threshold angle with respect to axis 114 Degree, to be adapted to determine that and/or to specify the stitch density (i.e. " hydridization stitch ") changing.So, in other embodiments, except The increment of number of thresholds meets outside the threshold angle with respect to axis 114, can refer to for a part for curved portions section determining Before the fixed stitch density changing, this part of this arc section can also meet threshold value sewing distance.Satisfaction in the present invention In one embodiment of this determination, this of this arc section partly can generally include and one or more meet threshold angle Neighbouring and/or adjacent increment.
Therefore, Fig. 6 F includes the amplifier section 148 of the exemplary patterns 98 of Fig. 6 A, close in order to determine the stitch for sewing Degree.In an embodiment, once it is determined that increment C meets the threshold angle with respect to axis 114, then permissible in exemplary diagram 6F Determine whether increment D also meets threshold angle.As fig 6 f illustrates, the crosspoint of x-axis and y-axis is described as being positioned at a little At 122, (for example can extend to a little 124 from point 122 with respect to straight line 150 that y-axis measurement draws between point 122 and 124 Straight line 150).As fig 6 f illustrates, the angle 152 between straight line 150 and y-axis represents the angle that increment D is with respect to axis 114 Degree.In embodiment shown in Fig. 6 F, when x-axis and y-axis are positioned at 122 it may be determined that between point 122 and 124 Straight line 150 provides the special angle 152 meeting the threshold angle with respect to axis 114.In one embodiment it may be determined that Increment C and D meets the threshold angle with respect to axis 114, and the satisfaction to threshold angle, Ke Yiwei based on increment C and D Section between point 110 and 124 partly specifies the stitch density changing.
With reference now to Fig. 7-9, exemplary flow chart describes for the dynamic method changing the stitch density in pattern Embodiment.In other embodiments, in the environment of general computer executable instructions, these can be described exemplary Method.Generally, computer executable instructions can include the customary journey executing specific function or realizing particular abstract data type Sequence, program, object, part, data structure, subprogram, module, function etc..Can also be realized this in a distributed computing environment Method, wherein, realizes these functions by by the remote processing device that communication network or communication cloud are associated.In distributed meter Calculate under environment, computer executable instructions may be located in local and remote computer-readable storage medium, including memory storage.
This illustrative methods is depicted as representing the set of the logical flow chart square frame of sequence of operations, these operations are permissible Hardware, software, firmware (firmware) or a combination thereof are realized.The order of description the method is not construed as restricted , the square frame of any number of methods described can combine in any order, in order to implement the method or substitution method.Separately Outward, in the case of the spirit and scope without departing substantially from theme described herein, individual operations can be omitted from the method.In software loop Under border, square frame represents computer instruction, and when being executed by one or more processors, this computer instruction is realized cited Operation.For convenience of description, in the environment of device or computer software, do not illustrate method described herein.This description should not It is understood as that in the case of the enforcement of the method is limited in not having device and/or software, or be understood as the reality of the method Apply and be limited to specific device and/or computer software.
From the beginning of the embodiment of Fig. 7, there is provided dynamically change showing of stitch density for the axis along sewing pattern The method 700 of meaning property.First, in block 710, the method includes determining multiple elements of sewing pattern, the plurality of element bag Include at least one of one or more straight sections and one or more arc section.
Then, in block 720, each in the one or more straight sections of analysis and one or more arc section Individual.In one embodiment of the invention, it is not have user to hand over to the analysis of one or more arc sections of sewing pattern Automatically carry out in the case of interaction, embodiments of the invention are applied at least a portion of sewing pattern.Substituting In embodiment, analysis can be realized by customer interaction.In certain embodiments, analyze in one or more straight sections Each can include, determine whether at least a portion of each of this one or more straight sections meets:1) exist Threshold value between the straight sections starting point of each several part of each of one or more straight sections and straight sections terminal is long Degree, and 2) with respect to axis threshold angle.In other embodiments, analyzing each of one or more straight sections can To include, it is the specified regulation of each several part meeting threshold length and threshold angle of each of one or more straight sections Stitch density afterwards.In other embodiments, analyze each of one or more straight sections can include, be one or The each several part specified value stitch density being unsatisfactory for following conditions of each of multiple straight sections, these conditions be between One or more of threshold length between straight sections starting point and straight sections terminal and the threshold angle with respect to axis. At some aspects of the present invention, this axis can be charging axis or bracket axis.
In certain embodiments, analyze each of one or more arc sections to include, to one or more arcs Each of section interpolation, to provide multiple increments for each arc section.Then, one or more arc sections are analyzed The first arc section Part I.This Part I can generally include the first increment and second increasing of multiple increments Amount.In an embodiment, the first increment can be adjacent with the second increment, such that it is able in sewing immediately front first increasing of the second increment Amount.In other embodiments, the Part I analyzing the first arc section of one or more arc sections includes, and analysis has First increment starting point and the first increment of the first increment terminal.In addition, analysis the first increment can include, determine that the first increment is full Foot is with respect to the threshold angle of axis.And, analysis has the second increment starting point and the second increment of the second increment terminal is permissible Including, determine second increment meet with respect to axis threshold angle.In an embodiment, once it is determined that the first increment and second Increment all meets the threshold angle with respect to axis, then this analysis can include, and determines the total of the first increment and the second increment Length also meets threshold length.Based on the analysis to the first and second increments, and having determined the first and second increments all After meeting with respect to the threshold angle of axis and threshold length, the stitch density after regulation can be specified for Part I.
In other embodiments, each of one or more arc sections can be analyzed.In this enforcement In example, analysis can include the Part II of the first arc section analyzing one or more arc sections.Part II is permissible The 3rd increment including one or more increments and the 4th increment.In addition, in an embodiment, the 3rd increment can neighbouring 4th increasing Amount, thus the 3rd increment is located so that the 3rd increment of can just sewing before sewing the 4th increment.Alternatively, the 3rd increasing Amount can one-tenth in place allow to and then sew the 3rd increment after sewing the 4th increment.In addition, analysis is one or more Each of arc section includes, and analysis has the 3rd increment of the 3rd increment starting point and the 3rd increment terminal.Analyze the 3rd Increment can include, and determines that the 3rd increment meets the threshold angle with respect to axis.In addition, described analysis can also include, point Analysis has the 4th increment of the 4th increment starting point and the 4th increment terminal.Analyze the 4th increment can include, determine the 4th increment Whether meet the threshold angle with respect to axis.And, once it is determined that the 4th increment may be unsatisfactory for the threshold with respect to axis Value angle, then can be Part II specified value stitch density.
After having analyzed these elements, in square frame 730, dynamically adjust stitch density.Dynamically metering needle Pin density (for example at least one of multiple elements) includes, based on to one or more straight sections and one or more The analysis of each of arc section, is the stitch density that at least one of multiple elements specify after adjusting.Other real Apply in example, method 700 can also include, identify the stitch density of two or more adjacent elements, and for sewing pattern at least A part specifies middle stitch density.
As described above, in certain embodiments, it is possible to use of the first element of the first stitch density sewing pattern Point, and use the Part II of second stitch density sewing the first element.So, the stitch density of the specific part of individual element (for example including more than one different stitch density) can be changed, wherein, this individual element includes more than one with respect to axis Individual angle.Generally can be for illustration purposes only with reference to Fig. 6 A below, and be not construed as the side of restriction by any way Method 700.Previously, as shown in exemplary Fig. 6 A, single arc section " element " can include multiple different parts, When compared with the applicable threshold value of the present invention, the specified stitch density of these parts is different.For example, Part I 102 wraps Include standard stitch density 104, extend along axis 114 with arc section, based on the satisfaction to one or more threshold values, second Part 106 can be designated the stitch density 108 to change.
In fig. 8 it is shown that for automatically adjusting stitch density between the element of the sewing pattern sewed along axis Method 800 flow chart.The reception that method 800 is included in block 810 has the pattern of multiple pattern elements, plurality of Each of pattern element includes one or more parts.In certain embodiments, multiple pattern elements include one or many Individual straight sections.Additionally or alternatively, multiple pattern elements can also include one or more arc sections, wherein, one Or each of multiple arcs section also includes one or more increments.
Then, in square frame 820, method 800 include analyzing multiple pattern elements one or more partly in each Individual, changed with determining whether each of multiple pattern elements meet to specify at least one portion for multiple pattern elements The threshold value of the stitch density becoming.In one embodiment, analyze each of multiple pattern elements to include, determine one or many Whether a part for each of individual straight sections meets threshold length, and determines every in one or more straight sections Whether each several part meeting threshold length of also meets the threshold angle with respect to axis.In another embodiment, analyze Each of multiple pattern elements include, and determine whether each increment of each of one or more arc sections meets phase For the threshold angle of axis, and the threshold value with respect to axis for the satisfaction determining each of one or more arc sections Whether each increment of angle also meets threshold length.In other embodiments, determine each in one or more arc sections Individual satisfaction also includes with respect to whether each increment of the threshold angle of axis meets threshold length, determines that presence meets threshold angle The multiple adjacent increment of degree, each of the plurality of adjacent increment all includes increment starting point and increment terminal, and really Fixed satisfaction meets threshold length with respect to the total length of the multiple adjacent increment of the threshold angle of axis.
Turn to square frame 830, method 800 also includes each of one or more parts for multiple pattern elements and specifies At least one of standard stitch density, the stitch density changing and middle stitch density.In certain embodiments, one or many The each several part of individual straight sections includes straight sections starting point and straight sections terminal, wherein, for one or more straight sections Each several part, threshold length includes the sewing distance between straight sections starting point and straight sections terminal.
With reference to Fig. 9, method 900 is included for dynamically changing the stitch density in sewing pattern and the figure for sewing pattern Case element specifies the multiple exemplary step of variable stitch density automatically.Embodiments of the invention are included in square frame 910 Reception there is the sewing pattern of multiple pattern elements, wherein, multiple pattern elements include one or more straight sections and one At least one of individual or multiple arcs section.
Upon receipt of sewing (pattern), in square frame 920, method 900 includes analyzing each in multiple pattern elements Individual, whether threshold length and the threshold value with respect to axis are met with least a portion determining each of multiple pattern elements Angle.In certain embodiments, each of one or more straight sections include straight sections starting point and straight sections are whole Point;Analyze each of multiple pattern elements to include, determine whether each of one or more straight sections meet phase For the threshold angle of axis, and based on the sewing distance between straight sections starting point and straight sections terminal, determine Whether at least a portion of each of one or more straight sections meets threshold length.In certain embodiments, one Or each of multiple arcs section includes arc section starting point and curved portions segment endpoint, wherein, multiple pattern elements are analyzed Each of include, determine whether at least a portion of each of one or more arc sections meets with respect to axis Threshold angle, and based between the sewing distance between arc section starting point and curved portions segment endpoint, determine one or many Whether individual arc section meets threshold length.
In some respects, determine at least a portion of each of one or more arc sections whether meet with respect to The threshold angle of axis includes, and is that each of one or more arc sections determine multiple increments, every in multiple increments One includes increment starting point and increment terminal.Once it is determined that described increment, for the first arc of one or more arc sections First increment of shape section, method 900 can also include determining the first increment based on the first increment starting point and the first increment terminal Whether meet the threshold angle with respect to axis, and the second increasing of the first arc section for one or more arc sections Based on the second increment starting point and the second increment terminal, amount, determines whether the second increment meets the threshold angle with respect to axis.
Continue Fig. 9, in square frame 930, method 900 is also included based on this analysis for each of multiple pattern elements certainly Dynamic specified corresponding stitch density.In certain embodiments, once it is determined that the second increment meets threshold angle, once and base Determine the first increment in the sewing distance between the first increment starting point and the second increment terminal and the second increment meets threshold Value length, then method 900 include specifying the stitch density of change for the first increment and the second increment.In other embodiments, one Denier determines the second increment and is unsatisfactory for threshold angle, and it is the first increment that method 900 includes and the second increment specified value stitch is close Degree.
Figure 10 shows flow chart 1000, and this flow chart 1000 includes close for dynamically changing the stitch in sewing pattern The exemplary step of degree.In square frame 1010, embodiments of the invention include identifying the pattern element along axis sewing, example Straight sections and arc section as pattern.In square frame 1020, analyze each identified straight sections (from square frame 1010) Meet threshold length including determination straight sections, this straight sections has a starting point and a terminal.For example, of sewing pattern Divide and can be identified as including straight sections, then identify this straight sections according to beginning and end, can be thereon with determination Specify the sewing distance of specific stitch density.In certain embodiments, for the threshold length at least half of straight sections of sewing Inch.In other embodiments, the threshold length for straight sections of sewing can be the seam along an inch of straight sections Thread distance.Once meeting threshold length to determine, in square frame 1030, determination has a starting point and the straight sections of a terminal are The no threshold angle meeting with respect to axis.As described above for described in Fig. 5, although a part for pattern potentially includes, to meet threshold value long The straight sections of degree, but this section is also possible to meet the threshold angle with respect to axis, to be adapted for use with the stitch changing Density is sewed.So, multiple straight sections of Fig. 5 are described as sewing using standard stitch density 88, although multiple this Plant section and meet threshold value sewing distance.
Referring now to the determination with regard to arc section, in square frame 1040, to arc section interpolation to provide multiple increments, Each increment has a starting point and a terminal.As such, it is possible to determine each increment with respect to axis using each beginning and end Threshold angle.In square frame 1050, the first increment for multiple increments it may be determined that the first increment whether meet with respect to The threshold angle of axis.Once it is determined that the first increment meets threshold angle, it may be considered that second increment in square frame 1060. Especially, in square frame 1060, or adjacent second increment neighbouring with the first increment can be analyzed, whether to determine the second increment Meet the threshold angle with respect to axis.In square frame 1070, if the second increment also meets the threshold angle with respect to axis, Then next can determine whether the first and second increments meet threshold length together by analysis.If it is long that increment meets threshold value Degree, then in square frame 1080, it is possible to achieve hydridization stitch feature (i.e., it is possible to specify the stitch of change for the first and second increments Density).In square frame 1090, if the second increment is unsatisfactory for threshold angle, continue this sewing figure using standard stitch density Case.
Description can realize the exemplary sewing system of the many aspects of the present invention below, so that multiple for the present invention Aspect provides general environment.With reference to Figure 11, the schematic system for realizing embodiments of the invention be generally illustrated and It is marked as sewing system 1100.Sewing system 1100 shown in Figure 11 is the example of a suitable system, and is not intended to Carry out any restriction for by the use of embodiments of the invention disclosed in the literature or envelop of function.Exemplary system 1100 are not construed as thering is any dependence or needs with regard to the combination of any single part shown in this article or part. For example, analysis component 1120 and stitch density specified parts 1130 can be integrated in single part, or can directly that This communication.Although system 1100 is described as one group of integrated component, system 1100 can essentially be distributed on network and On one or more devices, such as on described part.Described part can directly or indirectly communication with one another, and with Described part is integrated on individual system or device or is distributed in unrelated on network and more than one device.
Those of ordinary skill in the art will be appreciated that, the part shown in Figure 11 is exemplary in essence and quantity, It is restricted for being not interpreted as.In the range of the embodiments herein, it is possible to use any number of part/module is come Realize desired feature.In addition, part/module may be located on any number of computing device.
In an embodiment, the sewing system 1100 of Figure 11 includes patterned member 1110, analysis component 1120, stitch density refer to Determine part 1130 and control parts 1140.Here generally with reference to illustrating Fig. 3 only in order to illustrate system 1100 hereinafter described The function of operation, part and part.Fig. 3 and the description above for Fig. 3 are not construed as limiting by any way or reducing The sewing system 1100 of Figure 11 and any claim corresponding to sewing system 1100.Merely for exemplary purpose reference Fig. 3.In addition, the system 1100 of Figure 11 is not construed as the example sewed using variable stitch density described in Fig. 3 There is any dependence or restricted in property pattern.
Patterned member 1110 generally can be configured to receive sewing pattern (the exemplary sewing pattern 42 of such as Fig. 3) Mark.In certain embodiments, patterned member can be connected to, in communication, the data storing one or more sewing patterns Storehouse (not shown).Analysis component 1120 can be configured to analyze sewing pattern.Analysis sewing pattern can include identifying sewing figure One or more elements of case.For example, analysis component 1120 can identify one or more elements, for example exemplary first yuan Element 54, second element 56, third element 58, fourth element 60 and The Fifth Element 62.Can be to one or more identified units Element is analyzed, to determine whether at least one of one or more elements meet applicable threshold value (such as threshold angle Or threshold length).When determine one or more applicable threshold value is met for an element when, may further determine that can With using specific stitch density (such as " hydridization " stitch density) this element of sewing.
Analysis component 1120 can also be realized determining outside Threshold Analysis.For example, analysis component 1120 can determine figure In case, element is with respect to the position of another element.It is used signal Fig. 3 as reference, the first exemplary element 54 is described Become adjacent with second element 56 and continuous, however, the first element 54 be described as non-conterminous with third element 58 and discontinuous.? In embodiment, analysis component 1120 can be configured to determine that the first element 54 is adjacent with second element 56 and continuous.In addition, analysis Part 1120 can be configured to the feature of element in identification icon.Analysis component 1120 can be also configured to element in Comparing patternses The identical point of feature and/or difference.For example, analysis component 1120 can determine that the first element 54 has and second element 56 Different features.Feature can include global shape, curvature, not have curvature, size, yardage (for example when close using standard stitch Degree sew this element when the line code quantity that will use), yardage length range is (for example when being sewed this yuan using minimum stitch density When plain by the line code quantity of use to when using maximum stitch density sew this element when will use line code quantity) etc..Line code The estimate that number can be determined by analysis component 1120.For example, analysis component 1120 is it may also be determined that the first element 54 has With third element 58 and the same or similar feature of The Fifth Element 62.
Can be analyzed one at a time by analysis component 1120, analyze in a continuous manner (for example, before second element Analyze the first element, analyze second element before third element) or analyze each element simultaneously.In another embodiment, have The element having same or like feature can be analyzed together and (for example, be identified as one or more element quilts with curvature Analyze together, and be identified as rectilinear one or more element and be analyzed together).Analysis has same or like feature Element can aid in and improves the accuracy that analysis component 1120 determines stitch density.For example, as illustrated shown in Fig. 3, analysis portion The second element 56 of part 1120 analysis examples and fourth element 60, and determine that second element 56 has different curvature.For example, When the curvature finding second element 56 is more than fourth element 60 it may be determined that the stitch density of second element 56 and fourth element 60 is different, even if second has similar spy with 60 both relative to other elements (such as third element 58) with fourth element 56 Levy.So, by the element in Comparing patternses, can improve and/or improve the essence of the analysis carrying out by analysis component 1120 Exactness and detailed result.In other embodiments, analysis component 1120 may be referred to the database of pattern and/or previously to one The analysis result of individual or multiple other pattern, it can be with analyzed part 1120 using analyzing current pattern.
In other embodiments, analysis component 1120 can analysis based on the element to pattern and/or pattern determining Threshold value sewing distance, threshold length and/or threshold angle.Alternatively, when the element to pattern and/or pattern is analyzed, Analysis component 1120 can apply one or more predetermined or predetermined threshold value.For example, the sewing of predetermined threshold value away from From system being sent to by corresponding sewing pattern.In another example, analysis component 1120 may be referred to database Identify the one or more predetermined threshold value for analyzing sewing pattern.
Based on the analysis being carried out by analysis component 1120, stitch density specified parts 1130 can be of sewing pattern Or multiple element assignment stitch density.Stitch density specified parts 1130 can receive the mark to one or more stitch density (for example including feature, threshold value meets the analysis result of situation), described mark may be based on to figure by analysis component 1120 The analysis of case and/or wherein element is identified.Additionally and/or alternatively, stitch density specified parts 1130 can connect Receive the mark to the one or more elements meeting threshold angle and the one or more elements being unsatisfactory for threshold angle.Additionally And/or alternatively, stitch density specified parts 1130 can receive to the one or more elements meeting threshold length and be discontented with The mark of one or more elements of sufficient threshold length.Additionally and/or alternatively, stitch density specified parts 1130 can connect Receive the mark to the one or more elements meeting threshold value sewing distance and the one or more elements being unsatisfactory for threshold value sewing distance Know.It is contemplated that any number of mark for applicable threshold value and analysis result and combinations thereof is in the scope of the present invention Interior.
Based on the mark of the received one or more elements being related to sewing pattern, stitch density specified parts 1130 can be the specified stitch density of each element of sewing pattern.For being e.g. determined to be the line part meeting threshold angle The element of section, stitch density specified parts 1130 can specify the stitch density (such as " hydridization stitch " density) of change.For E.g. it is determined to be the element of the arc section meeting threshold length, stitch density specified parts 1130 can specify change Stitch density (such as " hydridization stitch " density).For being determined to be the element meeting threshold length, stitch density specified parts 1130 stitch density (such as " hydridization stitch " density) that can specify change.In other embodiments, stitch density specifying part Part 1130 can for meet simultaneously threshold angle and threshold length or meet simultaneously threshold length and threshold value sewing distance or its The stitch density that the element assignment that it combines changes.Additionally and/or alternatively, stitch density specified parts 1130 can be full Sufficient threshold angle but be unsatisfactory for the element of threshold length or meet what the element assignment of threshold length and threshold angle changed simultaneously Stitch density.For the purpose of stitch density specified parts 1130, any number of threshold value determining during analyzing and/or its Combination is all considered as within the scope of the invention.
Control parts 1140 can by one of sewing pattern, element and/or the stitch density specified for each element or Multiple being sent in computing device and/or sewing machine is used for executing.Control parts 1140 can also be in real time using the stitch specified Density sewing pattern.For example, when real-time sewing pattern, control parts 1140 suffer element based on specified stitch density with element Based on dynamically change stitch density.It is the stitch density of element assignment based on stitch density specified parts 1130, control unit Part 1140 automatically can be changed with finishing patterns between one or more stitch density.Those skilled in the art will manage Solution, control parts 1140 can provide mark to sewing machine and/or computing device and/or instruct, to realize the pin of sewing pattern Effectively dynamically the changing of pin density.So, control parts 1140 can directly or indirectly with Figure 11 unshowned other portion Part communication link, these other parts can be that system 1100 is local or remote.
The other embodiments of system 1100 can include the unshowned part of Figure 11.For example, system 1100 can include connecing Receive part, this receiving part receives sewing pattern and/or downloads sewing pattern from data source, website or application program.Acceptance division Part can also receive sewing machine specification, and this specification is with acting on analysis component 1120 and/or stitch density specified parts The input of 1130 analyses being carried out and/or guide.In other embodiments, receiving part can receive sewing machine setting and/ Or other device setting.When realizing corresponding function described herein, one or more parts of system 1100 can utilize this A little settings.
In other embodiments, system 1100 can include transferring the instructions to the communication of computing device and/or sewing machine Part.The information receiving from control parts 1140 can be translated into instruction by communication component.Instruction can be described as sewing figure The stitch density that each element in case is specified.The instruction translation receiving from control parts 1140 can be become machine by communication component Readable language and/or computer-sensitive language.It should be understood that each part described herein can directly or indirectly with retouch herein Each the other part communication stated.
In fig. 12, there is provided a kind of computing device 1200, sewing system (for example exemplary sewing system 1100) can To be realized using this computing device 1200, or sewing system can be with this computing device 1200 communication link.In an embodiment, Exemplary computing device 1200 includes processor 1210, memory 1220, I/O part 1230 and display unit 1240.Although For clarity, each square frame of Figure 12 is expressed as independent part, but in fact, described each part is less clear Chu, draws an analogy, these frameworks more precisely grey and fuzzy.For example, it is possible to display unit (such as display device) Consider into I/O part.Equally, processor has memory.Inventors realized that this is the property of this area, and reaffirm Figure 12 The schematic diagram of exemplary computing device that only can be used together with one or more embodiments of the invention of figure. Do not carry out between the type such as " work station ", " server ", " notebook computer ", " handheld apparatus ", " board " Distinguish, because all of which is considered as in the range of Figure 12 and is referred to as " computing device ".
Memory 1220 includes the computer executable instructions being stored in volatile memory and/or nonvolatile storage (not shown).Memory 1220 can be removable, non-removable formula or a combination thereof.Exemplary hardware unit includes solid State memory, hard disk drive, CD drive etc..Memory 1220 is the example of computer-readable medium.Computer-readable Medium includes at least two class computer-readable mediums, i.e. computer-readable storage medium and communication media.
Computing device 1200 typically comprises a large amount of computer-readable mediums.Computer-readable medium can be can be by calculating Any available medium that device 1200 accesses, and include volatile and nonvolatile medium, removable and non-removable formula Jie Matter.Computer-readable medium includes computer-readable storage medium and communication media, and computer-readable storage medium does not include signal itself.Meter Calculation machine storage medium is included with any information storage means or technology (such as computer-readable instruction, data structure, program mould Block or other data) volatile and nonvolatile, removable and the non-removable formula medium realized.Computer-readable storage medium includes But be not limited to RAM, ROM, EEPROM, flash storage or other memory technology, CM-ROM, Digital versatile disc (DVD) or Other disk storages, cassette, tape, magnetic disc store or other magnetic storage device or can be used for storing desired letter Breath and any other medium that can be accessed by computing device 1200.
On the other hand, communication media is presented as computer-readable instruction, data structure, program module or modulated data signal Other data in (such as carrier wave or other connecting gear), and include any information-delivery media.Term " believe by modulation data Number " refer to that one or more feature is set or changed into the signal encoding information onto in the signal.Such as but not limited to, lead to News medium include wire medium such as cable network or straight path connect and wireless medium for example sound wave, RF, infrared ray and Other wireless mediums.Above-mentioned any combination should also be as being included within the scope of computer readable media.
Computing device 1200 includes one or more processors (such as 1210), and this processor is from e.g. memory 1220 Or the various entities of I/O part 1230 read data.In one embodiment, one or more processors 1210 execution computer Executable instruction, to realize the various tasks and the method that are limited by computer executable instructions.Display unit 1240 is to user Or other device display data mark.Exemplary display unit includes display device, loudspeaker, printing unit etc..
Schematically I/O part 1230 includes microphone, control bar, handle, scanner, printer, wireless device, control Device, recording needle (stylus), keyboard, mouse, speech input device, touch input unit, touch screen-device, interaction display dress Put, natural user interface (NUI) etc..I/O part 1230 can be via network environment (such as Wireless Fidelity, bluetooth or Ethernet) It is communicatively connected to computing device 1200 and/or remote-control device, for example other computing devices, server, router etc..
The each side of embodiments of the invention can be described under the general environment of computer program, including by calculating Computer code performed by machine or other machine (such as personal digital assistant or other computing device) or machine usable instructions, Including computer executable instructions (such as program module).Generally, including routine, program, object, part, data structure Deng program module refer to complete particular task or the code of execution specific data type.The present invention can be realized with various configurations Embodiment, including private server, all-purpose computer, notebook computer, more professional computing device etc..Can also divide Realize the present invention under cloth computing environment, wherein, task is completed by the remote processing device connecting by communication network.
It should be understood that can be implemented as being stored in computer-readable Jie for dynamically changing the method and system of stitch density Computer executable instructions in matter (such as computer-readable storage medium) are so that one or more processors and storage can be passed through Device executes this computer executable instructions, and the result of execution achieves the performance of methods and systems described herein.
Will be seen that from the above, the present invention is well suited for reaching whole purposes mentioned above and for this structure Obvious and intrinsic further advantage.It should be understood that some features and sub-portfolio have practicality, and can be without reference to other Use in the case of feature and sub-portfolio.This is considered by claim and within the scope of the claims.Due to not carrying on the back The present invention can be implemented as multiple possible embodiments in the case of the scope of the present invention, therefore it should be understood that this paper institute State or full content shown in the drawings all should be construed as schematic rather than restricted.

Claims (20)

1. a kind of method dynamically changing stitch density for the axis along sewing pattern, the method includes:Determine sewing Multiple elements of pattern, the plurality of element includes at least in one or more straight sections and one or more arc section Individual;Analyze each of one or more straight sections and one or more arc section;Dynamically adjust and described many The corresponding stitch density of at least one of individual element, wherein, dynamically adjusts stitch density and includes based on to one Or the analysis of each of multiple straight sections and one or more of arc section come in the plurality of element extremely A few stitch density specified after adjusting.
2. method according to claim 1, wherein, analyzes each of one or more of straight sections and includes: Determine whether at least a portion of each of one or more of straight sections meets 1) between one or more of Threshold length between the straight sections starting point of each several part of each of straight sections and straight sections terminal, with 2) relative Threshold angle in axis;With meet described threshold length and described for each of one or more of straight sections The each several part of threshold angle specifies the stitch density after regulation.
3. method according to claim 1, wherein, analyzes each of one or more of straight sections and includes: Being unsatisfactory between straight sections starting point and straight sections terminal for each of one or more of straight sections Threshold length and one or more of threshold angle with respect to axis each several part specified value stitch density.
4. method according to claim 1, wherein, described axis is charging axis or bracket axis.
5. method according to claim 1, wherein, analyzes each of one or more of arc sections and includes: To each of one or more of arc sections interpolation, to provide multiple increments for each arc section;With analysis institute State the Part I of the first arc section in one or more arc sections, wherein Part I is included in the plurality of increment The first increment and the second increment, the wherein first increment is adjacent with the second increment, and wherein, analysis Part I includes:Point Analysis has the first increment starting point and the first increment of the first increment terminal, wherein analyzes the first increment and includes determining that the first increment is full Foot is with respect to the threshold angle of axis;Analysis has the second increment starting point and the second increment of the second increment terminal, wherein analyzes Second increment includes determining the threshold angle that the second increment meets with respect to axis;With once it is determined that first increment and the second increasing Amount all meets the threshold angle with respect to axis it is determined that the total length of the first increment and the second increment meets threshold length, and Specify the stitch density after regulation for Part I.
6. method according to claim 5, wherein, analyzes each of one or more of arc sections and also wraps Include:Analyze the Part II of the first arc section in one or more of arc sections, wherein Part II include described The 3rd increment in multiple increments and the 4th increment, the wherein the 3rd increment is adjacent with the 4th increment, and wherein, analyzes second Divide and include:Analysis has the 3rd increment of the 3rd increment starting point and the 3rd increment terminal, and wherein analysis the 3rd increment includes determining 3rd increment meets the threshold angle with respect to axis;Analysis has the 4th increment starting point and the 4th increasing of the 4th increment terminal Amount, wherein analysis the 4th increment includes determining whether the 4th increment meets the threshold angle with respect to axis;With once it is determined that 4th increment is unsatisfactory for the threshold angle with respect to axis, then for Part II specified value stitch density.
7. method according to claim 1, also includes:Identify the stitch density of two or more adjacent elements;With for seam Thread pattern at least a portion specify in the middle of stitch density.
8. the method for the stitch density between a kind of element for automatically adjusting the sewing pattern sewed along axis, the method Including:Receive the pattern with multiple pattern elements, each of wherein said multiple pattern elements include one or more Part;Analyze each of one or more parts of the plurality of pattern element, to determine in the plurality of pattern element Each whether meet the threshold value of the stitch density specifying change at least a portion for the plurality of pattern element;With Each of one or more parts for the plurality of pattern element specified value stitch density, change stitch density and At least one of middle stitch density.
9. method according to claim 8, wherein, the plurality of pattern element includes one or more straight sections.
10. method according to claim 9, wherein, analyzes each of the plurality of pattern element and includes:Determine institute Whether the part stating each of one or more straight sections meets threshold length, and determines one or more of straight Whether each several part meeting threshold length of each of line section meets the threshold angle with respect to axis.
11. methods according to claim 9, wherein, each several part of one or more of straight sections includes line part Duan Qidian and straight sections terminal, wherein, for each several part of one or more of straight sections, threshold length include between Sewing distance between straight sections starting point and straight sections terminal.
12. methods according to claim 9, wherein, be the plurality of pattern element one or more partly in every The stitch density of one specified value stitch density or change includes:For one or more of straight sections to meet threshold value long Degree and the stitch density specifying change with respect to each several part of the threshold angle of axis.
13. methods according to claim 8, wherein, the plurality of pattern element includes one or more arc sections, institute State each of one or more arc sections and include one or more increments.
14. methods according to claim 13, wherein, analyze each of the plurality of pattern element and include:Determine Whether each increment of each of one or more of arc sections meets the threshold angle with respect to axis;With determination institute Whether the satisfaction stating each of one or more arc sections also meets threshold with respect to each increment of the threshold angle of axis Value length.
15. methods according to claim 14, wherein it is determined that the expiring of each of one or more of arc section Foot includes with respect to whether each increment of the threshold angle of axis meets threshold length:Determine to exist and meet the multiple of threshold angle Adjacent increment, each of the plurality of adjacent increment all includes increment starting point and increment terminal;Meet phase with determination Total length for the plurality of adjacent increment of the threshold angle of axis meets threshold length.
A kind of 16. methods automatically specifying variable stitch density for the pattern element for sewing pattern, the method includes:Connect Receive the sewing pattern with multiple pattern elements, wherein, the plurality of pattern element includes one or more straight sections and one At least one of individual or multiple arcs section;Analyze each of the plurality of pattern element, to determine the plurality of figure Whether at least a portion of each of case element meets threshold length and the threshold angle with respect to axis;Be based on this point Analysis, is that each of the plurality of pattern element specifies corresponding stitch density automatically.
17. methods according to claim 16, wherein, each of one or more of straight sections include straight line Section starting point and straight sections terminal, wherein, analyze each of the plurality of pattern element and include:Determine one or Whether each of multiple straight sections meet the threshold angle with respect to axis;With based between straight sections starting point with straight Whether sewing distance between line section terminal, determine at least a portion of each of one or more of straight sections Meet threshold length.
18. methods according to claim 16, wherein, each of one or more of arc sections include arc Section starting point and curved portions segment endpoint, wherein, analyze each of the plurality of pattern element and include:Determine one or Whether at least a portion of each of multiple arcs section meets the threshold angle with respect to axis;With based between arc Sewing distance between section starting point and curved portions segment endpoint, determines whether one or more of arc sections meet threshold value long Degree.
19. methods according to claim 18, wherein it is determined that each of one or more of arc section is extremely Whether a few part meets includes with respect to the threshold angle of axis:For each of one or more of arc sections really Fixed multiple increments, each of the plurality of increment includes increment starting point and increment terminal;For one or more of arcs First increment of the first arc section of shape section, based on the first increment starting point and the first increment terminal, determines that the first increment is full Foot is with respect to the threshold angle of axis;With the second increment of the first arc section for one or more of arc sections, Based on the second increment starting point and the second increment terminal, determine whether the second increment meets the threshold angle with respect to axis.
20. methods according to claim 19, wherein, once it is determined that the second increment meets threshold angle, and are based on It is long that sewing between the first increment starting point and the second increment terminal meets threshold value apart from determination the first increment and the second increment Degree, then specify the stitch density of change for the first increment and the second increment;And wherein, once it is determined that second increment is unsatisfactory for Threshold angle, will be the first increment and the second increment specified value stitch density.
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