CN106407987B - Electro-optic crystal optical axis exposure point extraction method based on image cross-correlation matching - Google Patents
Electro-optic crystal optical axis exposure point extraction method based on image cross-correlation matching Download PDFInfo
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Abstract
Disclosure of the inventionThe method for extracting the optical axis dew point of the electro-optic crystal based on image cross-correlation matching belongs to the technical field of optical precision detection, and solves the problem of poor extraction precision of the optical axis dew point in the method for determining the optical axis direction of the electro-optic crystal by using a polarization interference pattern. The invention specifically comprises the following steps: obtaining a polarization interference pattern I, and simulating to obtain a proper initial characteristic template T0(ii) a For initial feature template T0Performing geometric transformation to obtain a series of characteristic template images T with different sizes and different rotation anglesmn(ii) a Template T of the featuremnRespectively performing image cross-correlation matching operation with the polarized interference pattern I by using the correlation coefficient rmn(x, y) quantitative characterization template TmnObtaining the correlation degree with the polarized light interference pattern I through image cross-correlation matching operation to obtain a characteristic template TmnMaximum correlation coefficient r ofmn‑maxAnd position coordinate (x) of maximum correlation coefficientmn,ymn) (ii) a And selecting the maximum correlation coefficient rmn‑maxMaximum value r ofmaxPosition coordinates (x)max,ymax) As the coordinates of the position of the optical axis at which the light beam emerges from the spot.
Description
Technical Field
An electro-optic crystal optical axis exposure point extraction method based on image cross-correlation matching is used for accurately extracting an optical axis exposure point, belongs to the technical field of optical precision detection, and relates to an automatic extraction method of an electro-optic crystal polarization interference pattern optical axis exposure point.
Background
The plasma electrode pockels cell is one of key components for realizing the multi-pass amplification technology of a large laser device, and the pockels effect is realized by adding thin gas at two sides of an electro-optic crystal and forming high-conductivity transparent plasma as an electrode after discharge. Because of its pockels effect, the electro-optical crystal is often used as an optical switch for controlling laser output or isolating reflected laser. The electro-optical crystal used as an optical switch is designed such that the optical axis direction thereof needs to be parallel to the normal direction of the light-transmitting surface. In order to ensure a good extinction ratio, accurate measurement of the optical axis direction of the electro-optical crystal needs to be realized.
The traditional precise method for determining the direction of the optical axis of the crystal is an X-ray diffraction method, but an X-ray diffractometer is expensive, needs special inspection and protection measures and is inconvenient to use. Moreover, when the direction of the optical axis of the crystal is measured by using the X-ray diffraction direction finder, the structural parameters of the crystal and the corresponding relation between the crystal face and the diffraction peak need to be known in advance, the measuring method is complex, the measuring range is limited, and the existing X-ray diffraction direction finder can not realize the optical axis orientation of a large-caliber crystal element.
The optical axis direction of the crystal can be determined by utilizing the polarization interference pattern of the crystal, and the requirement of large-aperture test can be met. By finding the exposure point of the optical axis (i.e., the intersection of the black crosses) in the interferogram, the direction of the optical axis is measured from the position of the optical axis exposure point with respect to the center of the field of view. The method is characterized in that the interference of crystal polarized light is realized by a common polarization microscope, the distance of an optical axis dew point relative to the center of a visual field is measured by a reticle of an eyepiece and a visual inspection method, and an optical axis deviation angle can be obtained by combining the numerical aperture of the microscope, so that the method has large error (3-5 degrees).
Disclosure of Invention
The invention provides an electro-optic crystal optical axis exposure point extraction method based on image cross-correlation matching, aiming at the defects, and solving the problem of large optical axis deviation angle measurement error caused by poor extraction precision of the optical axis exposure point in the method for determining the optical axis direction of the crystal by using the polarization interference pattern in the prior art.
In order to achieve the purpose, the invention adopts the technical scheme that:
an electro-optic crystal optical axis exposure point extraction method based on image cross-correlation matching is characterized by comprising the following steps:
(1) obtaining a polarization interference pattern I;
(2) obtaining a proper initial characteristic template T through analog simulation according to the principle of polarization interference0；
(3) Initial characteristic template T obtained by simulation0At a series of different scaling ratios SnDifferent rotation angles thetamPerforming geometric transformation to obtain feature template images T with different sizes and different rotation anglesmn；
(4) All the characteristic templates T obtained after geometric transformationmnRespectively performing image cross-correlation matching operation with the polarized interference pattern I by using the correlation coefficient rmn(x, y) quantitative characterization template TmnAnd obtaining all characteristic templates T by the correlation degree with the polarized light interference pattern I through image cross-correlation matching operationmnMaximum correlation coefficient r ofmn-maxAnd position coordinate (x) of maximum correlation coefficientmn,ymn)；
(5) Selecting the maximum correlation coefficient rmn-maxMaximum value r ofmaxWill be the maximum value rmaxPosition coordinates (x)max,ymax) As the coordinates of the position of the optical axis at which the light beam emerges from the spot.
Further, the formula of the geometric transformation in the step (3) is as follows:
in the formula, SnTo scale the ratio, θmIs the angle of rotation, (x)i,yj) For initial feature template T0A certain pixel of (1); (x)imn,yjmn) To scale the ratio to SnThe rotation angle is thetamLower characteristic template TmnIn (x)i,yj) Corresponding pixel of, TmnTo scale the ratio SnAngle of rotation thetamA characteristic template of wherein Sn1 ± N Δ S (N is 0,1,2, …, N is an integer), Δ S is the scaled variation interval; thetamWhere M Δ θ (M is 0,1,2, …, M is an integer), Δ θ is the change interval of the rotation angle.
Further, in the geometric transformation process, if the feature template T ismnMiddle corresponding pixel (x)i,yj) The position coordinates are not integers, and a nearest neighbor interpolation method or other interpolation methods in digital image processing are adopted for approximate processing.
Further, in the step (4), the correlation coefficient rmnThe calculation formula of (x, y) is as follows:
in the formula, TmnIn order to obtain the gray scale distribution of the feature template, I is the gray scale distribution of the polarization interference pattern, p and Q are horizontal and vertical coordinates of the image (p is 1,2, …, P, Q is 1,2, …, Q, where P, Q is the number of rows and columns of the feature template), and x and y are horizontal and vertical offset pixels of the feature template and the polarization interference pattern, respectively.
Compared with the prior art, the invention has the advantages that:
firstly, the template image with a known center is subjected to certain geometric transformation and then is subjected to cross-correlation matching operation with the cone light interference pattern to be measured, and the position coordinate with the maximum cross-correlation coefficient is selected as the position coordinate of the optical axis exposure point, so that the high-precision automatic extraction of the optical axis exposure point is realized, and the measurement precision and efficiency are improved.
Drawings
FIG. 1 is a schematic flow diagram of the present invention;
FIG. 2 is a polarization interference diagram of an electro-optic crystal with a thickness of 30mm in example 1 of the present invention;
fig. 3 is an initial feature template and a feature template after geometric transformation in embodiment 1 of the present invention, where (a) is the initial feature template, (b), (c), and (d) are the feature templates after geometric transformation;
FIG. 4 shows the correlation coefficient r in example 1 of the present inventionmnAnd corresponding position coordinates (x)mn,ymn) The figure of (a) shows the intent;
FIG. 5 is a drawing showing different feature templates T in example 2 of the present inventionmnLower correlation coefficient rmnSchematic diagram of the variation curve of (1);
FIG. 6 is a polarization interference diagram of an electro-optic crystal with a thickness of 10mm in example 2 of the present invention;
fig. 7 is an initial feature template and a feature template after geometric transformation in embodiment 2 of the present invention, where (a) is the initial feature template, (b), (c), and (d) are the feature templates after geometric transformation;
FIG. 8 shows the correlation coefficient r in example 2 of the present inventionmnAnd corresponding position coordinates (x)mn,ymn) The figure of (a) shows the intent;
FIG. 9 is a drawing showing different feature templates T in example 2 of the present inventionmnLower correlation coefficient rmnSchematic diagram of the variation curve of (1);
FIG. 10 is a flow chart illustrating steps corresponding to the variation of the present invention.
Detailed Description
The invention is further illustrated by the following figures and examples.
Example 1
An electro-optic crystal optical axis exposure point extraction method based on image cross-correlation matching specifically comprises the following steps:
for thicker electro-optic crystals, the thickness of the electro-optic crystal in this embodiment is 30 mm. Collecting an electro-optic crystal polarization interference pattern I with the thickness of 30mm in a polarization interference measurement system, as shown in FIG. 2;
(1) according to the principle of polarized light interference, obtaining a proper polarized light interference pattern initial characteristic template T by analog simulation0(ii) a As shown in fig. 3 (a);
(2) initial characteristic template T obtained by simulation0At a series of different scaling ratios SnDifferent rotation angles thetamPerforming geometric transformation to obtain feature template images T with different sizes and different rotation anglesmn(ii) a As shown in fig. 3(b), fig. 3(c), fig. 3 (d); the formula for the geometric transformation is as follows:
in the formula, SnTo scale the ratio, θmIs the angle of rotation, (x)i,yj) For initial feature template T0A certain pixel of (1); (x)imn,yjmn) To scale the ratio to SnThe rotation angle is thetamLower characteristic template TmnIn (x)i,yj) Corresponding pixel of, TmnTo scale the ratio SnAngle of rotation thetamA characteristic template of wherein Sn1 ± N Δ S (N is 0,1,2, …, N is an integer), Δ S is the scaled variation interval; thetamWhere M Δ θ (M is 0,1,2, …, M is an integer), Δ θ is the change interval of the rotation angle. During the geometric transformation, if the feature template TmnMiddle corresponding pixel (x)i,yj) The position coordinate is not an integer, a nearest neighbor interpolation method or other interpolation methods in digital image processing are adopted for approximate processing, otherwise, no processing is carried out.
(3) All the characteristic templates T obtained after geometric transformationmnRespectively performing image cross-correlation matching operation with the polarized interference pattern I by using the correlation coefficient rmn(x, y) quantitative characterization template TmnAnd obtaining all characteristic templates T by the correlation degree with the polarized light interference pattern I through image cross-correlation matching operationmnMaximum correlation coefficient r ofmn-maxAnd position coordinate (x) of maximum correlation coefficientmn,ymn) As shown in FIG. 4, in which different feature templates TmnLower correlation coefficient rmn-maxThe change curve relation shown in FIG. 5 is satisfied; the correlation coefficient is calculated as follows:
in the formula，TmnThe grayscale distribution of the feature template (the image grayscale value stored in the computer of the feature template), I the grayscale distribution of the polarization interference pattern (the image grayscale value stored in the computer of the polarization interference pattern), p and Q the horizontal and vertical coordinates of the image (p is 1,2, …, P, Q is 1,2, …, Q, wherein P, Q is the number of rows and columns of the feature template), and x and y the horizontal and vertical offset pixels of the feature template and the polarization interference pattern.
(4) Selecting the maximum correlation coefficient rmn-maxMaximum value r ofmaxWill be the maximum value rmaxPosition coordinates (x)max,ymax) As the coordinates of the position of the optical axis at which the light beam emerges from the spot. The embodiment selects the correlation coefficient rmn-maxThe position coordinate (251,254) corresponding to the maximum value of 0.996 is taken as the position coordinate of the optical axis exposure point.
Example 2
An electro-optic crystal optical axis exposure point extraction method based on image cross-correlation matching specifically comprises the following steps:
for thicker electro-optic crystals, the thickness of the electro-optic crystal in this embodiment is 30 mm. Collecting an electro-optic crystal polarization interference pattern I with the thickness of 30mm in a polarization interference measurement system, as shown in FIG. 6;
(1) according to the principle of polarized light interference, obtaining a proper polarized light interference pattern initial characteristic template T by analog simulation0(ii) a As shown in fig. 7 (a);
(2) initial characteristic template T obtained by simulation0At a series of different scaling ratios SnDifferent rotation angles thetamPerforming geometric transformation to obtain feature template images T with different sizes and different rotation anglesmn(ii) a As shown in fig. 7(b), fig. 7(c), fig. 7 (d); the formula for the geometric transformation is as follows:
in the formula, SnTo scale the ratio, θmIs the angle of rotation, (x)i,yj) For initial feature template T0A certain pixel of (1); (x)imn,yjmn) To scale the ratioIs SnThe rotation angle is thetamLower characteristic template TmnIn (x)i,yj) Corresponding pixel of, TmnTo scale the ratio SnAngle of rotation thetamA characteristic template of wherein Sn1 ± N Δ S (N is 0,1,2, …, N is an integer), Δ S is the scaled variation interval; thetamWhere M Δ θ (M is 0,1,2, …, M is an integer), Δ θ is the change interval of the rotation angle. During the geometric transformation, if TmnMiddle corresponding pixel (x)i,yj) The position coordinate is not an integer, a nearest neighbor interpolation method or other interpolation methods in digital image processing are adopted for approximate processing, otherwise, no processing is carried out.
(3) All the characteristic templates T obtained after geometric transformationmnRespectively performing image cross-correlation matching operation with the polarized interference pattern I by using the correlation coefficient rmn(x, y) quantitative characterization template TmnObtaining the correlation degree with the polarized light interference pattern I through image cross-correlation matching operation to obtain a characteristic template TmnMaximum correlation coefficient r ofmn-maxAnd position coordinate (x) of maximum correlation coefficientmn,ymn) As shown in FIG. 8, in which different feature templates TmnLower correlation coefficient rmn-maxThe relationship of the change curves shown in FIG. 9 is satisfied; the correlation coefficient is calculated as follows:
in the formula, TmnThe grayscale distribution of the feature template (the image grayscale value stored in the computer of the feature template), I the grayscale distribution of the polarization interference pattern (the image grayscale value stored in the computer of the polarization interference pattern), p and Q the horizontal and vertical coordinates of the image (p is 1,2, …, P, Q is 1,2, …, Q, wherein P, Q is the number of rows and columns of the feature template), and x and y the horizontal and vertical offset pixels of the feature template and the polarization interference pattern.
(4) Selecting the maximum correlation coefficient rmn-maxMaximum value r ofmaxWill be the maximum value rmaxPosition coordinates (x)max,ymax) As exposure of optical axisThe position coordinates of the points. The embodiment selects the correlation coefficient rmn-maxThe position coordinates (250 ) corresponding to the maximum value of 0.996 are used as the position coordinates of the optical axis exposure point.
The above-mentioned embodiments only express the specific embodiments of the present application, and the description thereof is more specific and detailed, but not construed as limiting the scope of the present application. It should be noted that, for those skilled in the art, without departing from the technical idea of the present application, several changes and modifications can be made, which are all within the protection scope of the present application.
Claims (3)
1. An electro-optic crystal optical axis exposure point extraction method based on image cross-correlation matching is characterized by comprising the following steps:
(1) obtaining a polarization interference pattern I;
(2) obtaining a proper initial characteristic template T through analog simulation according to the principle of polarization interference0；
(3) Initial characteristic template T obtained by simulation0At a series of different scaling ratios SnDifferent rotation angles thetamPerforming geometric transformation to obtain feature template images T with different sizes and different rotation anglesmn；
(4) All the characteristic templates T obtained after geometric transformationmnRespectively performing image cross-correlation matching operation with the polarized interference pattern I by using the correlation coefficient rmn(x, y) quantitative characterization template TmnAnd obtaining all characteristic templates T by the correlation degree with the polarized light interference pattern I through image cross-correlation matching operationmnMaximum correlation coefficient r ofmn-maxAnd position coordinate (x) of maximum correlation coefficientmn，ymn)；
(5) Selecting the maximum correlation coefficient rmn-maxMaximum value r ofmaxWill be the maximum value rmaxPosition coordinates (x)max，ymax) As the position coordinates of the optical axis exposure point;
the formula of the geometric transformation in the step (3) is as follows:
in the formula, SnTo scale the ratio, θmIs the angle of rotation, (x)i，yj) For initial feature template T0A certain pixel of (1); (x)imn，yjmn) To scale the ratio to SnThe rotation angle is thetamLower characteristic template TmnIn (x)i，yj) Corresponding pixel of, TmnTo scale the ratio SnAngle of rotation thetamA characteristic template of wherein Sn1 ± N Δ S, N is 0,1,2, …, N is an integer, Δ S is a scaled variation interval; thetamWhere M is 0,1,2, …, M is an integer, and Δ θ is the variation interval of the rotation angle.
2. The method for extracting the optical axis exposure point of the electro-optic crystal based on the image cross-correlation matching as claimed in claim 1, wherein: during the geometric transformation, if the feature template TmnMiddle corresponding pixel (x)i，yj) The position coordinates are not integers, and a nearest neighbor interpolation method or other interpolation methods in digital image processing are adopted for approximate processing.
3. The method for extracting the optical axis exposure point of the electro-optic crystal based on the image cross-correlation matching as claimed in claim 1, wherein in the step (4), the correlation coefficient r ismnThe calculation formula of (x, y) is as follows:
in the formula, TmnIn order to obtain the gray scale distribution of the feature template, I is the gray scale distribution of the polarization interference pattern, p and Q are respectively the horizontal and vertical coordinates of the image, p is 1,2, …, P, Q is 1,2, … and Q, wherein P, Q is the number of rows and columns of the feature template, and x and y are respectively the horizontal and vertical offset pixels of the feature template and the polarization interference pattern.
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| US4512640A (en) * | 1982-06-04 | 1985-04-23 | Nippon Kogaku K.K. | Polarizing microscope |
| CN101419311A (en) * | 2008-11-11 | 2009-04-29 | 北京大学 | Countershaft matching method for side elevation of polarization maintaining optical fibre and apparatus thereof |
| CN101556695A (en) * | 2009-05-15 | 2009-10-14 | 广东工业大学 | Image matching method |
| CN105066910A (en) * | 2015-08-21 | 2015-11-18 | 中国工程物理研究院激光聚变研究中心 | Electro-optic crystal Z axis deviation angle measurement device and measurement method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4512640A (en) * | 1982-06-04 | 1985-04-23 | Nippon Kogaku K.K. | Polarizing microscope |
| CN101419311A (en) * | 2008-11-11 | 2009-04-29 | 北京大学 | Countershaft matching method for side elevation of polarization maintaining optical fibre and apparatus thereof |
| CN101556695A (en) * | 2009-05-15 | 2009-10-14 | 广东工业大学 | Image matching method |
| CN105066910A (en) * | 2015-08-21 | 2015-11-18 | 中国工程物理研究院激光聚变研究中心 | Electro-optic crystal Z axis deviation angle measurement device and measurement method |
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| "CCD图像法测量晶体光轴方向";沈为民 等;《半导体光电》;20060831;第27卷(第4期);第485-488页 * |
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