CN106384604A - Electrically erasable programmable read-only memory - Google Patents

Electrically erasable programmable read-only memory Download PDF

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Publication number
CN106384604A
CN106384604A CN201610885992.XA CN201610885992A CN106384604A CN 106384604 A CN106384604 A CN 106384604A CN 201610885992 A CN201610885992 A CN 201610885992A CN 106384604 A CN106384604 A CN 106384604A
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CN
China
Prior art keywords
wordline
electrically erasable
memory
erasable read
dummy cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610885992.XA
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Chinese (zh)
Inventor
于涛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Huahong Grace Semiconductor Manufacturing Corp
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Shanghai Huahong Grace Semiconductor Manufacturing Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Shanghai Huahong Grace Semiconductor Manufacturing Corp filed Critical Shanghai Huahong Grace Semiconductor Manufacturing Corp
Priority to CN201610885992.XA priority Critical patent/CN106384604A/en
Publication of CN106384604A publication Critical patent/CN106384604A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/08Address circuits; Decoders; Word-line control circuits
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/30Circuit design
    • G06F30/39Circuit design at the physical level
    • G06F30/392Floor-planning or layout, e.g. partitioning or placement

Abstract

The present invention provides an electrically erasable programmable read-only memory. The electrically erasable programmable read-only memory comprises: a valid memory cell and a dummy cell; and in the layout of the electrically erasable programmable read-only memory, the valid memory cell has a first word line, the dummy cell has a second word line, and the first word line and the second word line are isolated from each other without forming a connection. The technical advantages of the electrically erasable programmable read-only memory provided by the present invention are that the first word line of the valid memory cell and second word line of the dummy cell, are isolated from each other without forming the connection, so that the pull-down current will increase because the word line voltage can increase; the pull-down performance is not impaired during the cycle because the word line erase voltage cannot be increased to the word line of the dummy cell; and in addition, the source line voltage drop will become smaller because the pull-down current is larger.

Description

Electrically Erasable Read Only Memory
Technical field
The present invention relates to field of semiconductor manufacture and reservoir designs field, it is more particularly related to a kind of Electrically Erasable Read Only Memory, i.e. EEPROM (Erasable programmable Read-Only Memory) storage Device.
Background technology
Memorizer (Memory) is the memory device in computer system, for depositing program data.The master of memorizer Want function to be storage program and various data, and can in computer running high speed, be automatically completed program or data Access.
Wherein, EPROM EPROM (Erasable programmable Read-Only Memory it is) that to remain to the computer memory chips of retention data after a kind of power-off be non-volatile (non-volatile) storage Device.EPROM EPROM is typically made up of one group of floating transistor, is more often provided than in electronic circuit by one Programmed respectively with the electronic device of voltage higher voltage.Once after the completion of programming, EPROM EPROM can only Wiped with strong ultraviolet radiation.
Electrically Erasable Read Only Memory (Electrically-Erasable Programmable Read-Only Memory, abbreviation EEPROM or E2PROM) it is a kind of semiconductor memory apparatus that can pass through electronically repeatedly manifolding, permissible Wipe existing information, reprogramming on computers or on special equipment.Compared to EPROM EPROM, electricity Erasable Programmable Read Only Memory EPROM EEPROM does not need to be irradiated with ultraviolet, is not required to take off it is possible to use specific voltage yet, Come the information on chip of erasing, to write new data.
Fig. 1 schematically shows the laying out pattern of the Electrically Erasable Read Only Memory according to prior art.Tool Body ground, as shown in figure 1, in the Electrically Erasable Read Only Memory according to prior art, efficient memory unit 11 The wordline of wordline and dummy cell 12 is joined together to form the annular wordline 13 for example shown in Fig. 1, and described effective storage Device unit 11 and described dummy cell 12 share source electrode line 14.
And, Fig. 2 schematically shows the wordline layout version of the Electrically Erasable Read Only Memory of prior art The details of one example of figure layout.
Wherein, in FIG, described efficient memory unit 11 is used for data storage, and under described dummy cell 12 is used as Pull transistor.
The shortcoming of the laying out pattern of the Electrically Erasable Read Only Memory according to prior art shown in Fig. 1 is: First, when reading data, larger due to reading electric current, the voltage drop on higher source electrode line can be produced, so that reading electricity Stream reduces.Secondly, the pull-down current of described dummy cell 12 is limited, this is because the read voltage of wordline is effectively deposited by described The wordline of storage unit 11 links together, thus being limited by read voltage, and the word of described efficient memory unit 11 Line read voltage limits only about 3V.And, in erasing, word line voltage is 12V, under the continuous effect of this high pressure Belonging to lower, the wordline grid oxygen of dummy cell 12 is degenerated, and leads to threshold voltage to raise, pull-down current reduces, and drop-down performance can be impaired.
Accordingly, it is desirable to provide a kind of Electrically Erasable Read Only Memory laying out pattern, enabling increase drop-down electricity Stream, reduces the voltage drop of source electrode line, and avoids the pull-down current leading to during high pressure erasing to degenerate.
Content of the invention
The technical problem to be solved is that there is drawbacks described above in prior art, provides one kind can increase Pull-down current, reduce the voltage drop of source electrode line, and avoid the electric erasable that during high pressure erasing, the pull-down current that leads to is degenerated can Program read-only memory laying out pattern.
In order to realize above-mentioned technical purpose, according to the present invention, there is provided a kind of Electrically Erasable Read Only Memory, bag Include:Efficient memory unit and dummy cell;And, in the laying out pattern of described Electrically Erasable Read Only Memory, Described efficient memory unit has the first wordline, and described dummy cell has the second wordline, and described first wordline and institute State the second wordline mutually isolated and do not form connection.
Preferably, in described Electrically Erasable Read Only Memory, change to realize described first by domain Wordline and described second wordline mutually isolated.
Preferably, in described Electrically Erasable Read Only Memory, described first wordline and described second wordline Mutually isolated and do not form connection by isolated part.
Preferably, in described Electrically Erasable Read Only Memory, described isolated part is in described first word In the middle of line and described second wordline.
Preferably, in described Electrically Erasable Read Only Memory, described first wordline and described second wordline The region being respectively provided with embedded described isolated part is connected with other layers with being formed respectively.
Preferably, in described Electrically Erasable Read Only Memory, described first wordline and described second wordline It is arranged symmetrically with respect to described isolated part.
Preferably, in described Electrically Erasable Read Only Memory, in read operation, described efficient memory Unit and described dummy cell jointly constitute a point of gate transistor device.
Preferably, in described Electrically Erasable Read Only Memory, in read operation, for the word selecting Line, the word line voltage of described dummy cell is 5V.
Preferably, in described Electrically Erasable Read Only Memory, for same a line, unselected wordline, described The word line voltage of dummy cell is also 5V.
Preferably, in described Electrically Erasable Read Only Memory, described efficient memory unit and described void If unit shares source electrode line.
According to the Electrically Erasable Read Only Memory of the present invention it is a technical advantage that, by making efficient memory The wordline of the wordline of unit and described dummy cell is mutually isolated and does not form connection, and pull-down current will become greatly, this is because word Line voltage can increase, and typically increases to 5V from 3V;And, during circulating, drop-down performance is not damaged, this is because wordline is wiped Except voltage will not be increased to the wordline of described dummy cell;Additionally, the voltage drop of source electrode line will diminish, this is because illusory list The pull-down current of unit becomes big.
Brief description
In conjunction with accompanying drawing, and by reference to detailed description below, it will more easily have more complete understanding to the present invention And its adjoint advantages and features are more easily understood, wherein:
Fig. 1 schematically shows the laying out pattern of the Electrically Erasable Read Only Memory according to prior art.
Fig. 2 schematically shows the wordline layout laying out pattern of the Electrically Erasable Read Only Memory of prior art Details.
Fig. 3 schematically shows the domain of Electrically Erasable Read Only Memory according to the preferred embodiment of the invention Layout.
Fig. 4 schematically shows the wordline of Electrically Erasable Read Only Memory according to the preferred embodiment of the invention Layout laying out pattern details.
It should be noted that accompanying drawing is used for the present invention is described, and the unrestricted present invention.Note, represent that the accompanying drawing of structure can Can be not necessarily drawn to scale.And, in accompanying drawing, same or like element indicates same or like label.
Specific embodiment
In order that present disclosure is more clear and understandable, with reference to specific embodiments and the drawings in the present invention Appearance is described in detail.
The invention provides a kind of new EPROM EPROM framework, wherein so that effective store The wordline of the wordline of device unit and described dummy cell is mutually isolated and does not form connection, so that pull-down current will become greatly, And drop-down performance during circulating is not damaged, the voltage drop additionally realizing source electrode line diminishes.
The specific embodiment of the present invention to be described below in conjunction with accompanying drawing.
Fig. 3 schematically shows the domain of Electrically Erasable Read Only Memory according to the preferred embodiment of the invention Layout.
Specifically, as shown in figure 3, Electrically Erasable Read Only Memory according to the preferred embodiment of the invention includes Effect memory cell 21 and dummy cell 22;And, deposit electrically erasable according to the preferred embodiment of the invention is read-only In the laying out pattern of reservoir, described efficient memory unit 21 has the first wordline 23, and described dummy cell 22 has the second word Line 24, and described first wordline 23 and described second wordline 24 are mutually isolated and do not form connection.
Additionally, described efficient memory unit 21 and described dummy cell 22 share source electrode line 25.
It is further preferred that changed by domain to realize described first wordline 23 and described second wordline 24 mutual every From.
For example, Fig. 4 schematically shows Electrically Erasable Read Only Memory according to the preferred embodiment of the invention Wordline layout laying out pattern details.
Specifically, as shown in figure 4, described first wordline 23 and described second wordline 24 are mutually isolated by isolated part 25 And do not form connection;And, wherein said isolated part 25 is in the middle of described first wordline 23 and described second wordline 24.Excellent Selection of land, described first wordline 23 and described second wordline 24 are arranged symmetrically with respect to described isolated part.It is further preferred that institute State the first wordline 23 and described second wordline 24 is respectively provided with the region of embedded described isolated part 25 to be formed respectively and other Layer connects.
In particular preferred embodiment, described efficient memory unit 21 and described dummy cell 22 jointly constitute one Divide gate transistor device.
In Electrically Erasable Read Only Memory according to the preferred embodiment of the invention, change to realize by domain Described first wordline 23 and described second wordline 24 mutually isolated, the wordline of described dummy cell 22 is in mutually in colleague, but It is can to realize connecting by reducing the transistor of selection between different words.
Table below 1 shows the example of Electrically Erasable Read Only Memory according to the preferred embodiment of the invention Programming operation, the running voltage under erasing operation and read operation, the unit of wherein data is volt.
Form 1
As shown in Table 1, in read operation, for the wordline selecting, the word line voltage of described dummy cell is 5V;And And, in read operation, for unselected wordline, the word line voltage of described dummy cell is also 5V.
The technical advantage of Electrically Erasable Read Only Memory according to the preferred embodiment of the invention at least includes:
1. in Electrically Erasable Read Only Memory according to the preferred embodiment of the invention, described effective by making First wordline 23 of memory cell 21 and described dummy cell 22 and described second wordline 24 are mutually isolated and do not form connection, Pull-down current will become greatly, this is because word line voltage can increase (typically increasing to 5V from 3V).
2. and, in Electrically Erasable Read Only Memory according to the preferred embodiment of the invention, during circulating Drop-down performance is not damaged, this is because wordline erasing voltage (generally 12V) will not be increased to the word of described dummy cell Line.
3. additionally, in Electrically Erasable Read Only Memory according to the preferred embodiment of the invention, the electricity of source electrode line Pressure drop will diminish, this is because pull-down current is larger.
Furthermore, it is necessary to explanation, unless stated otherwise or point out, otherwise the term in description " first ", " the Two ", " 3rd " etc. describes each assembly being used only in differentiation description, element, step etc., rather than is used for representing each Logical relation between assembly, element, step or ordering relation etc..
Although it is understood that the present invention is disclosed as above with preferred embodiment, but above-described embodiment being not used to Limit the present invention.For any those of ordinary skill in the art, without departing under technical solution of the present invention ambit, The technology contents that the disclosure above all can be utilized are made many possible variations and modification, or are revised as to technical solution of the present invention Equivalent embodiments with change.Therefore, every content without departing from technical solution of the present invention, according to the technical spirit pair of the present invention Any simple modification made for any of the above embodiments, equivalent variations and modification, all still fall within the scope of technical solution of the present invention protection Interior.
And it should also be understood that the present invention is not limited to specific method described herein, compound, material, system Make technology, usage and application, they can change.It should also be understood that term described herein be used merely to describe specific Embodiment, rather than be used for limiting the scope of the present invention.Must be noted that herein and claims used in Singulative " one ", " a kind of " and " being somebody's turn to do " include complex reference, unless context explicitly indicates that contrary.Therefore, example As the citation of " element " meaned with the citation to one or more elements, and including known to those skilled in the art Its equivalent.Similarly, as another example, the citation of " step " or " device " is meaned to one or Multiple steps or the citation of device, and potentially include secondary step and second unit.Should be managed with broadest implication All conjunctions that solution uses.Therefore, word "or" should be understood that the definition with logical "or", rather than logical exclusive-OR Definition, unless context explicitly indicates that contrary.Structure described herein will be understood as also quoting from the function of this structure Equivalent.Can be interpreted that approximate language should be understood like that, unless context explicitly indicates that contrary.

Claims (10)

1. a kind of Electrically Erasable Read Only Memory is it is characterised in that include:Efficient memory unit and dummy cell;And And, in the laying out pattern of described Electrically Erasable Read Only Memory, described efficient memory unit has the first wordline, Described dummy cell has the second wordline, and described first wordline and described second wordline are mutually isolated and do not form connection.
2. Electrically Erasable Read Only Memory according to claim 1 is it is characterised in that change to come in fact by domain Existing described first wordline and described second wordline mutually isolated.
3. Electrically Erasable Read Only Memory according to claim 1 and 2 is it is characterised in that described first wordline Mutually isolated and do not form connection by isolated part with described second wordline.
4. Electrically Erasable Read Only Memory according to claim 3 is it is characterised in that described isolated part is in In the middle of described first wordline and described second wordline.
5. Electrically Erasable Read Only Memory according to claim 3 is it is characterised in that described first wordline and institute State the second wordline and be respectively provided with the region of embedded described isolated part and be connected with other layers with being formed respectively.
6. Electrically Erasable Read Only Memory according to claim 1 and 2 is it is characterised in that described first wordline It is arranged symmetrically with respect to described isolated part with described second wordline.
7. Electrically Erasable Read Only Memory according to claim 1 and 2 is it is characterised in that in read operation, Described efficient memory unit and described dummy cell jointly constitute a point of gate transistor device.
8. Electrically Erasable Read Only Memory according to claim 1 and 2 is it is characterised in that in read operation, For the wordline selecting, the word line voltage of described dummy cell is 5V.
9. Electrically Erasable Read Only Memory according to claim 1 and 2 is not it is characterised in that for same a line The wordline selecting, the word line voltage of described dummy cell is also 5V.
10. Electrically Erasable Read Only Memory according to claim 1 and 2 is it is characterised in that described effective storage Device unit and described dummy cell share source electrode line.
CN201610885992.XA 2016-10-10 2016-10-10 Electrically erasable programmable read-only memory Pending CN106384604A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109273036A (en) * 2017-07-18 2019-01-25 意法半导体国际有限公司 Nonvolatile memory with the dummy row for supporting storage operation
CN111627885A (en) * 2019-02-28 2020-09-04 爱思开海力士有限公司 Vertical memory device
CN111693839A (en) * 2020-06-17 2020-09-22 西安交通大学 Method for distinguishing degradation reason of SiC MOSFET under repeated surge current of body diode

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101026005A (en) * 2006-02-16 2007-08-29 株式会社东芝 Semiconductor memory device
CN101465353A (en) * 2007-12-17 2009-06-24 三星电子株式会社 Nonvolatile memory devices that utilize dummy memory cells to improve data reliability in charge trap memory arrays

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101026005A (en) * 2006-02-16 2007-08-29 株式会社东芝 Semiconductor memory device
CN101465353A (en) * 2007-12-17 2009-06-24 三星电子株式会社 Nonvolatile memory devices that utilize dummy memory cells to improve data reliability in charge trap memory arrays

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109273036A (en) * 2017-07-18 2019-01-25 意法半导体国际有限公司 Nonvolatile memory with the dummy row for supporting storage operation
CN109273036B (en) * 2017-07-18 2023-05-23 意法半导体国际有限公司 Nonvolatile memory with virtual rows supporting memory operations
CN111627885A (en) * 2019-02-28 2020-09-04 爱思开海力士有限公司 Vertical memory device
CN111627885B (en) * 2019-02-28 2023-05-26 爱思开海力士有限公司 Vertical memory device
CN111693839A (en) * 2020-06-17 2020-09-22 西安交通大学 Method for distinguishing degradation reason of SiC MOSFET under repeated surge current of body diode

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Application publication date: 20170208