CN106367726B - 一种本征超疏水陶瓷涂层及其制备方法 - Google Patents
一种本征超疏水陶瓷涂层及其制备方法 Download PDFInfo
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- 230000003075 superhydrophobic effect Effects 0.000 title claims abstract description 61
- 238000005524 ceramic coating Methods 0.000 title claims abstract description 38
- 238000002360 preparation method Methods 0.000 title claims abstract description 30
- 210000002381 plasma Anatomy 0.000 claims abstract description 45
- 229910052751 metal Inorganic materials 0.000 claims abstract description 44
- 239000002184 metal Substances 0.000 claims abstract description 44
- 239000011159 matrix material Substances 0.000 claims abstract description 25
- 239000011248 coating agent Substances 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 24
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 18
- 229910001069 Ti alloy Inorganic materials 0.000 claims abstract description 16
- 229910052747 lanthanoid Inorganic materials 0.000 claims abstract description 16
- 230000003647 oxidation Effects 0.000 claims abstract description 16
- 150000002602 lanthanoids Chemical class 0.000 claims abstract description 15
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 14
- 238000005516 engineering process Methods 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 9
- 239000010935 stainless steel Substances 0.000 claims abstract description 7
- 239000011224 oxide ceramic Substances 0.000 claims abstract description 4
- 238000000280 densification Methods 0.000 claims abstract description 3
- 229910052574 oxide ceramic Inorganic materials 0.000 claims abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 29
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 20
- 239000008367 deionised water Substances 0.000 claims description 16
- 229910021641 deionized water Inorganic materials 0.000 claims description 16
- 229910000883 Ti6Al4V Inorganic materials 0.000 claims description 14
- 229910052684 Cerium Inorganic materials 0.000 claims description 12
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052691 Erbium Inorganic materials 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 claims description 10
- 230000001590 oxidative effect Effects 0.000 claims description 10
- 229910052689 Holmium Inorganic materials 0.000 claims description 8
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 2
- 229910052693 Europium Inorganic materials 0.000 claims description 2
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 2
- 229910052765 Lutetium Inorganic materials 0.000 claims description 2
- 229910052779 Neodymium Inorganic materials 0.000 claims description 2
- 229910052777 Praseodymium Inorganic materials 0.000 claims description 2
- 229910052773 Promethium Inorganic materials 0.000 claims description 2
- 229910052772 Samarium Inorganic materials 0.000 claims description 2
- 229910052771 Terbium Inorganic materials 0.000 claims description 2
- 229910052775 Thulium Inorganic materials 0.000 claims description 2
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 2
- 238000005422 blasting Methods 0.000 claims description 2
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 claims description 2
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 claims description 2
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 238000007731 hot pressing Methods 0.000 claims description 2
- 229910052746 lanthanum Inorganic materials 0.000 claims description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 2
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 claims description 2
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims description 2
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 claims description 2
- VQMWBBYLQSCNPO-UHFFFAOYSA-N promethium atom Chemical compound [Pm] VQMWBBYLQSCNPO-UHFFFAOYSA-N 0.000 claims description 2
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 claims description 2
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 claims description 2
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 13
- 239000000463 material Substances 0.000 abstract description 12
- 238000012545 processing Methods 0.000 abstract description 10
- 230000007613 environmental effect Effects 0.000 abstract description 5
- -1 lanthanide metal oxide Chemical class 0.000 abstract 1
- 229910044991 metal oxide Inorganic materials 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000005520 cutting process Methods 0.000 description 8
- 229910052573 porcelain Inorganic materials 0.000 description 8
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000005611 electricity Effects 0.000 description 5
- 229910000420 cerium oxide Inorganic materials 0.000 description 4
- VQCBHWLJZDBHOS-UHFFFAOYSA-N erbium(iii) oxide Chemical compound O=[Er]O[Er]=O VQCBHWLJZDBHOS-UHFFFAOYSA-N 0.000 description 4
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 230000002153 concerted effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
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Abstract
本发明公开了一种本征超疏水陶瓷涂层及其制备方法,属于金属基体表面处理技术领域。钛合金或不锈钢作为基体材料,首先采用双辉等离子渗技术,以镧系金属作为双辉等离子渗用金属靶材,在基体材料表面制备一层镧系金属涂层,随后采用等离子氧化技术将制备的镧系金属涂层转变为致密的氧化物陶瓷涂层。由于在等离子渗与等离子氧化过程中,金属基体表面不断地被Ar离子轰击而形成一定的微观粗糙结构,导致所制备的镧系金属氧化物陶瓷涂层,具有一定的超疏水特性,其接触角均大于150°。依据本发明提供的方法,制备的超疏水陶瓷涂层具有较稳定的环境适应性,相比于传统技术手段制备的超疏水表面将大幅度提高其工业化使用寿命。
Description
技术领域
本发明属于金属基体表面处理技术领域,特别涉及一种具有本征超疏水特性的功能陶瓷的制备方法。制备的本征超疏水陶瓷涂层对促进超疏水表面的工业化应用具有重要实践意义。
背景技术
仿生超疏水涂层(指表观接触角大于150°,滚动角小于10°)因其具有优异的自清洁性、防腐蚀性、流体减阻、防覆冰以及防水性能,在工业生产、日常生活及国防装备中展示出较强的应用潜力,而引起了各国科研工作者的广泛研究兴趣,期望能够在金属材料、无机材料和高分子材料基体表面实现功能化复制[1-3]。当前主要是通过低表面自由能修饰剂修饰微观粗糙结构表面或者在低表面自由能材料基体表面加工微观粗糙结构来实现超疏水表面的有效制备。然而,纵观当前的制备手段,超疏水表面的制备离不开低表面自由能修饰剂的功能化修饰,且分析表明低表面自由能修饰剂主要由含氟有机物组成,卤素中的氟取代氢原子可以有效地降低高聚物的表面自由能,而且取代的氢原子数越多,表面自由能越低,材料表面则越难被润湿。Nishino T.等人研究发现迄今为止最低的表面自由能大约为6.7mJ/m2,由十七个氟原子取代硅烷上的氢原子获得。
然而,正是由于存在这样的低表面自由能的有机物修饰剂严重影响了超疏水表面在环境作用下的稳定性,进而限制了其在工业领域的实践应用,尤其是在一些航空航天等苛刻环境下的使用。研究表明,超疏水表面在常规的室外环境条件下,经过150d的风吹雨淋其表面接触角降低约20~30%,同时其滚动角出现大幅度增加,甚至失去超疏水的能力。此外,由于目前构筑超疏水表面的微观结构多以原位生长或者颗粒团聚附着为主,导致其表面微观结构与材料基体本身具有较低的结合力,因而在风沙等环境作用下,其表面微观结构极其容易遭到破坏,而失去超疏水性能,也直径影响其工业化应用。
因此,在已有的超疏水表面润湿理论基础上,开发出一种免于低表面自由能有机物修饰剂的修饰,同时在苛刻环境作用下又具有较高的稳定性对促进超疏水表面的实际应用具有重要的意义。
发明内容
本发明的目的在于提出一种免于低表面自由能有机物修饰的超疏水表面制备方法,以解决超疏水表面低使用寿命的问题。
针对现有技术制备的超疏水表面具有较低的耐环境作用能力,本发明提供的一种新型本征超疏水陶瓷涂层的制备方法,由以下步骤组成:
1)以Ti6Al4V钛合金或不锈钢为基体材料,采用金相砂纸对基体进行打磨,直至表面没有明显划痕,并进行抛光处理,最后采用去离子水、丙酮、无水乙醇以及去离子水依次进行超声清洗并晾干待用;
2)以镧系金属为靶材,通过双辉等离子渗技术手段,并调节相应的工艺参数,在纯Ar气氛围下实现上述金属基体表面镧系金属涂层的制备;
3)利用等离子氧化技术,在一定比例的Ar和O2的混合气体中,将金属基体表面的镧系金属涂层氧化成致密的氧化物陶瓷涂层。
所述制备方法,步骤2)中,镧系金属靶材为镧、铈、镨、钕、钷、钐、铕、钆、铽、镝、钬、铒、铥、镱、镥金属之一经过热压制成的等离子渗用金属靶材。
所述制备方法,步骤2)中,金属基体表面镧系金属涂层的制备工艺参数为:在纯Ar气氛围下,压强为30~50MPa,控制工艺参数:源级电压500~800V、工件电压300~500V、极间距10~30mm、时间2~5h、温度500~750℃。
所述制备方法,步骤3)中,镧系金属涂层等离子氧化工艺参数为:在体积比4:1的Ar和O2的混合气体中,调节工件电压400~600V、氧化温度400~700℃和氧化时间2~4h。
根据任一所述方法获得的本征超疏水陶瓷涂层。
本发明制备的产品可以通过以下手段进行结构、形貌、物相和超疏水特性等表征:采用德国BRUKER Advance D8的X射线衍射仪(XRD)对样品进行物相结构表征分析;选用日本HITACHI SU-4800的场发射扫描电子显微镜(FE-SEM)对样品进行微观形貌观察;选用德国DATAPHYSICS接触角测量仪OCA20测试分析其表面超疏水性能。
采用本发明的方法制备的本征超疏水陶瓷涂层具有以下特点:
1)制备的陶瓷涂层由于在Ar离子轰击作用表面存在一定的微观粗糙结构,同时不需要低表面自由能有机物修饰即可呈现出超疏水特性,即对水的接触角大于150°。
2)制备的本征超疏水陶瓷涂层与基体之间具有较高的结合力,划痕法测其临界结合力达到了60N。
3)制备的本征超疏水陶瓷涂层在苛刻环境的作用下仍具有较高的使用寿命,可用于国防装备工业、石油化工管道等领域。
4)制备的本征超疏水陶瓷涂层在具有较高的超疏水性同时,还具有较高的耐磨损与耐腐蚀性能。
附图说明
图1为本发明中实施例1的方法所制备的本征超疏水陶瓷涂层表面微观结构形貌;
图2为本发明中实施例1的方法所制备的本征超疏水陶瓷涂层的XRD图谱;
图3为本发明中实施例1的方法所制备的本征超疏水陶瓷涂层的EDS能谱;
图4为本发明中实施例1的方法所制备的本征超疏水陶瓷涂层表面静态液滴光学图片;
具体实施方式
以下结合具体实施例,对本发明进行详细说明。
实施例1
本发明的本征超疏水陶瓷涂层制备方法如下:
第一步,以Ti6Al4V钛合金为基体材料,利用线切割将基体材料加工成15mm×15mm×3mm大小,依次采用1~6号金相砂纸打磨基体材料表面,直至肉眼观察下没有划痕为止,然后将其机械抛光直至在金相显微镜下没有明显的划痕,并在去离子水、丙酮、无水乙醇及去离子水中超声清洗10min,晾干待用;
第二步,以高纯度(99.99%)的金属铈为靶材,在双辉等离子渗炉中将靶材置于源极处,Ti6Al4V钛合金置于工件电极处,并控制Ar气压强为40MPa、源级电压为600V、工件电压为400V、极间距为20mm、温度为650℃,等离子反应处理3h后,在钛合金基体表面获得纯金属铈涂层;
第三步,从双辉等离子渗炉中取出金属铈靶,在一定比例(体积比4:1)的Ar和O2的混合气体中,调节工件电压500V、氧化温度550℃,等离子氧化处理3h后,即可获得超疏水陶瓷氧化铈涂层。
依照上述实施步骤制备的本征超疏水陶瓷涂层表面的扫描电子显微镜照片如附图1所示。样品表面的XRD图谱如附图2所示,从图中可以看出所得到的氧化铈涂层纯度较高,且晶型单一。样品表面的EDS能谱如附图3所示。附图4为液滴在所制备的本征超疏水陶瓷涂层表面的静态光学照片,可以看出液滴呈完整球形,其接触角为157°达到了超疏水效果。
实施例2
本发明的本征超疏水陶瓷涂层制备方法如下:
第一步,以316L不锈钢为基体材料,利用线切割将基体材料加工成15mm×15mm×3mm大小,依次采用1~6号金相砂纸打磨基体材料表面,直至肉眼观察下没有划痕为止,然后将其机械抛光直至在金相显微镜下没有明显的划痕,并在去离子水、丙酮、无水乙醇及去离子水中超声清洗10min,晾干待用;
第二步,以高纯度(99.99%)的金属铈为靶材,在双辉等离子渗炉中将靶材置于源极处,316L不锈钢置于工件电极处,并控制Ar气压强为40MPa、源级电压为650V、工件电压为300V、极间距为20mm、温度为550℃,等离子反应处理2.5h后,即可在不锈钢基体表面获得纯金属铈涂层;
第三步,从双辉等离子渗炉中取出金属铈靶,在一定比例(体积比4:1)的Ar和O2的混合气体中,调节工件电压500V、氧化温度550℃,等离子氧化处理3h后,即可获得超疏水陶瓷氧化铈涂层。
依照上述实施步骤制备的本征超疏水陶瓷涂层表面,其接触角为160°达到了超疏水效果。
实施例3
本发明的本征超疏水陶瓷涂层制备方法如下:
第一步,以Ti6Al4V钛合金为基体材料,利用线切割将基体材料加工成15mm×15mm×3mm大小,依次采用1~6号金相砂纸打磨基体材料表面,直至肉眼观察下没有划痕为止,然后将其机械抛光直至在金相显微镜下没有明显的划痕,并在去离子水、丙酮、无水乙醇及去离子水中超声清洗10min,晾干待用;
第二步,以高纯度(99.99%)的金属铒为靶材,在双辉等离子渗炉中将靶材置于源极处,Ti6Al4V钛合金置于工件电极处,并控制Ar气压强为35MPa、源级电压为800V、工件电压为400V、极间距为20mm、温度为700℃,等离子反应处理3h后,即可在Ti6Al4V钛合金基体表面获得纯金属铒涂层;
第三步,从双辉等离子渗炉中取出金属铒靶,在一定比例(体积比4:1)的Ar和O2的混合气体中,调节工件电压600V、氧化温度600℃,等离子氧化处理3h后,即可获得超疏水陶瓷氧化铒涂层。
依照上述实施步骤制备的本征超疏水陶瓷涂层表面,其接触角为154°达到了超疏水效果。
实施例4
本发明的本征超疏水陶瓷涂层制备方法如下:
第一步,以316L不锈钢为基体材料,利用线切割将基体材料加工成15mm×15mm×3mm大小,依次采用1~6号金相砂纸打磨基体材料表面,直至肉眼观察下没有划痕为止,然后将其机械抛光直至在金相显微镜下没有明显的划痕,并在去离子水、丙酮、无水乙醇及去离子水中超声清洗10min,晾干待用;
第二步,以高纯度(99.99%)的金属铒为靶材,在双辉等离子渗炉中将靶材置于源极处,316L不锈钢置于工件电极处,并控制Ar气压强为35MPa、源级电压为800V、工件电压为300V、极间距为20mm、温度为550℃,等离子反应处理3h后,即可在316L不锈钢基体表面获得纯金属铒涂层;
第三步,从双辉等离子渗炉中取出金属铒靶,在一定比例(体积比4:1)的Ar和O2的混合气体中,调节工件电压600V、氧化温度600℃,等离子氧化处理3h后,即可获得超疏水陶瓷氧化铒涂层。
依照上述实施步骤制备的本征超疏水陶瓷涂层表面,其接触角为154°达到了超疏水效果。
实施例5
本发明的本征超疏水陶瓷涂层制备方法如下:
第一步,以Ti6Al4V钛合金为基体材料,利用线切割将基体材料加工成15mm×15mm×3mm大小,依次采用1~6号金相砂纸打磨基体材料表面,直至肉眼观察下没有划痕为止,然后将其机械抛光直至在金相显微镜下没有明显的划痕,并在去离子水、丙酮、无水乙醇及去离子水中超声清洗10min,晾干待用;
第二步,以高纯度(99.99%)的金属铈为靶材,在双辉等离子渗炉中将靶材置于源极处,Ti6Al4V钛合金置于工件电极处,并控制Ar气压强为30MPa、源级电压为500V、工件电压为400V、极间距为20mm、温度为550℃,等离子反应处理3h后,即可在Ti6Al4V钛合金基体表面获得纯金属铈涂层;
第三步,从双辉等离子渗炉中取出金属铒靶,在一定比例(体积比4:1)的Ar和O2的混合气体中,调节工件电压400V、氧化温度500℃,等离子氧化处理4h后,即可获得超疏水陶瓷氧化铈涂层。
依照上述实施步骤制备的本征超疏水陶瓷涂层表面,其接触角为157°达到了超疏水效果。
实施例6
本发明的本征超疏水陶瓷涂层制备方法如下:
第一步,以316L不锈钢为基体材料,利用线切割将基体材料加工成15mm×15mm×3mm大小,依次采用1~6号金相砂纸打磨基体材料表面,直至肉眼观察下没有划痕为止,然后将其机械抛光直至在金相显微镜下没有明显的划痕,并在去离子水、丙酮、无水乙醇及去离子水中超声清洗10min,晾干待用;
第二步,以高纯度(99.99%)的金属铈为靶材,在双辉等离子渗炉中将靶材置于源极处,316L不锈钢置于工件电极处,并控制Ar气压强为35MPa、源级电压为500V、工件电压为300V、极间距为20mm、温度为550℃,等离子反应处理4h后,即可在316L不锈钢基体表面获得纯金属铈涂层;
第三步,从双辉等离子渗炉中取出金属铒靶,在一定比例(体积比4:1)的Ar和O2的混合气体中,调节工件电压400V、氧化温度500℃,等离子氧化处理3.5h后,即可获得超疏水陶瓷氧化铈涂层。
依照上述实施步骤制备的本征超疏水陶瓷涂层表面,其接触角为158°达到了超疏水效果。
实施例7
本发明的本征超疏水陶瓷涂层制备方法如下:
第一步,以Ti6Al4V钛合金为基体材料,利用线切割将基体材料加工成15mm×15mm×3mm大小,依次采用1~6号金相砂纸打磨基体材料表面,直至肉眼观察下没有划痕为止,然后将其机械抛光直至在金相显微镜下没有明显的划痕,并在去离子水、丙酮、无水乙醇及去离子水中超声清洗10min,晾干待用;
第二步,以高纯度(99.99%)的金属钬为靶材,在双辉等离子渗炉中将靶材置于源极处,Ti6Al4V钛合金置于工件电极处,并控制Ar气压强为35MPa、源级电压为800V、工件电压为400V、极间距为20mm、温度为750℃,等离子反应处理3h后,即可在Ti6Al4V钛合金基体表面获得纯金属钬涂层;
第三步,从双辉等离子渗炉中取出金属钬靶,在一定比例(体积比4:1)的Ar和O2的混合气体中,调节工件电压500V、氧化温度500℃,等离子氧化处理4h后,即可获得超疏水陶瓷氧化钬涂层。
依照上述实施步骤制备的本征超疏水陶瓷涂层表面,其接触角为152°达到了超疏水效果。
实施例8
本发明的本征超疏水陶瓷涂层制备方法如下:
第一步,以316L不锈钢为基体材料,利用线切割将基体材料加工成15mm×15mm×3mm大小,依次采用1~6号金相砂纸打磨基体材料表面,直至肉眼观察下没有划痕为止,然后将其机械抛光直至在金相显微镜下没有明显的划痕,并在去离子水、丙酮、无水乙醇及去离子水中超声清洗10min,晾干待用;
第二步,以高纯度(99.99%)的金属钬为靶材,在双辉等离子渗炉中将靶材置于源极处,Ti6Al4V钛合金置于工件电极处,并控制Ar气压强为35MPa、源级电压为800V、工件电压为300V、极间距为20mm、温度为750℃,等离子反应处理3h后,即可在316L不锈钢基体表面获得纯金属钬涂层;
第三步,从双辉等离子渗炉中取出金属钬靶,在一定比例(体积比4:1)的Ar和O2的混合气体中,调节工件电压600V、氧化温度700℃,等离子氧化处理3h后,即可获得超疏水陶瓷氧化钬涂层。
依照上述实施步骤制备的本征超疏水陶瓷涂层表面,其接触角为150°达到了超疏水效果。
应当理解的是,对本领域普通技术人员来说,可以根据上述说明加以改进或变换,而所有这些改进和变换都应属于本发明所附权利要求的保护范围。
Claims (5)
1.一种本征超疏水陶瓷涂层的制备方法,其特征在于,由以下步骤组成:
1)以Ti6Al4V钛合金或不锈钢为基体材料,采用金相砂纸对基体进行打磨,直至表面没有明显划痕,并进行抛光处理,最后采用去离子水、丙酮、无水乙醇以及去离子水依次进行超声清洗并晾干待用;
2)以镧系金属为靶材,通过双辉等离子渗技术手段,并调节相应的工艺参数,在纯Ar气氛围下实现上述金属基体表面镧系金属涂层的制备;
3)利用等离子氧化技术,在一定比例的Ar和O2的混合气体中,将金属基体表面的镧系金属涂层氧化成致密的氧化物陶瓷涂层。
2.根据权利要求1所述的制备方法,其特征在于,步骤2)中,镧系金属靶材为镧、铈、镨、钕、钷、钐、铕、钆、铽、镝、钬、铒、铥、镱、镥金属之一经过热压制成的等离子渗用金属靶材。
3.根据权利要求1所述的制备方法,其特征在于,步骤2)中,金属基体表面镧系金属涂层的制备工艺参数为:在纯Ar气氛围下,压强为30~50MPa,控制工艺参数:源极 电压500~800V、工件电压300~500V、极间距10~30mm、时间2~5h、温度500~750℃。
4.根据权利要求1所述的制备方法,其特征在于,步骤3)中,镧系金属涂层等离子氧化工艺参数为:在体积比4:1的Ar和O2的混合气体中,调节工件电压400~600V、氧化温度400~700℃和氧化时间2~4h。
5.根据权利要求1-4任一所述方法获得的本征超疏水陶瓷涂层。
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