CN106356272B - A kind of electron diffraction apparatus accelerated based on laser plasma coda Q values - Google Patents
A kind of electron diffraction apparatus accelerated based on laser plasma coda Q values Download PDFInfo
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- CN106356272B CN106356272B CN201610847216.0A CN201610847216A CN106356272B CN 106356272 B CN106356272 B CN 106356272B CN 201610847216 A CN201610847216 A CN 201610847216A CN 106356272 B CN106356272 B CN 106356272B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
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- H01J37/295—Electron or ion diffraction tubes
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Abstract
The present invention proposes a kind of femtosecond electronic diffraction device accelerated based on laser plasma coda Q values, and the electron diffraction apparatus is made up of laser, gas generation apparatus, micropore, magnetic lenses, specimen holder, detection system, vacuum chamber, vacuum system, five dimension regulating systems etc..Wherein laser is used to produce ultrashort, super strong laser pulse, gas generation apparatus is used to produce highdensity gas target, ultrashort superpower pulse can produce electron beam with gas target interaction, and electron beam is had an effect after being focused on by micropore collimation and magnetic lenses with sample produces electron diffraction pattern and detected systematic collection.The time resolution of apparatus of the present invention is up to 10 femtoseconds, pump light has good time synchronized with detection electron beam in femtosecond electronic diffraction experiment, and without components such as photocathode, high-field electrode or microwave sources, make device eased and compact, can be widely applied in the scientific research of ultra-fast dynamics process.
Description
Technical field
The invention belongs to electron diffraction technique field, and in particular to a kind of electricity accelerated based on laser plasma coda Q values
Sub- diffraction instrument.
Background technology
Ultrafast electric diffraction technology has high space (sub- nanometer) and time (subpicosecond) resolution capability, is to see in real time
The important means of material interior atoms motion dynamic process is examined, expansion and contraction, phonon available for study sample internal crystal framework
Propagation, the formation and fracture, the structural phase transition of material etc. of chemical bond, have in numerous areas such as material, physics, chemistry, biologies
Important application.
The course of work of ultrafast electric diffraction technology is as follows：A branch of ultrafast laser is divided into two beams, wherein a branch of be used as pump
Pu light excites sample, the structure of sample is changed；The photoelectric cathode materials that another beam of laser is used for bombarding electron gun produce
Photoelectron, photoelectron is accelerated and shaping after form ultrafast electron beam and interacted with sample, formation diffraction pattern.Pass through change
Optical delay between two-beam, can obtain different time postpone under the conditions of femtosecond laser excite sample when ultrafast electronics with
The diffraction pattern of sample interaction.Analyze the letter such as the intensity of these diffraction patterns changed over time, peak, pattern
Breath, it is possible to realize the research to the lattice dynamics process of sample.Because the interior change process of material generally occurs in skin
The second even time scale of femtosecond, therefore the laser beam of ultrafast electric diffraction system and the time scale of electron beam are all necessarily less than
The time scale of sample dynamic variation process.
Mainly there is two categories below ultrafast electric diffraction apparatus at present：
Patent ZL 200510066313.8 proposes a kind of femtosecond electronic diffraction device, and its operation principle is to utilize femtosecond
Laser bombardment photocathode produces photoelectron, and photoelectron is accelerated under the driving of high direct voltage, and usual accelerating potential is up to 50,000 volts
Spy, accelerating gradient is close to 10 megavolts every meter.Because electron beam replicates the time response of light pulse, pulse width can be achieved about
The ultrafast electron beam of 500 femtoseconds.In this device, the kinetic energy of electron beam is determined by accelerating potential, is limited by breakdown voltage
System, the kinetic energy of electron beam is difficult further to improve.Simultaneously as being influenceed by space charge effect, beam pulse is passing
Can gradual broadening during broadcasting.Therefore, the time resolution highest of the ultrafast electric diffraction system formed using above-mentioned principle
About 300 femtoseconds, it is impossible to meet faster time-resolved requirement of experiment.In addition, the electronics that each electron beam is rolled into a ball in this device
Number is typically 104Magnitude, in order to obtain the diffraction pattern of high s/n ratio, it is necessary to the considerably long time for exposure could obtain it is high-quality
The diffraction pattern of amount.
Patent CN101403714B proposes a kind of ultrafast electric diffraction system based on X-band photocathode protection
System, i.e., photoelectron caused by negative electrode is accelerated by radiofrequency field.Because the accelerating gradient in microwave electron source is very high, space electricity can be reduced
The influence of lotus effect, and can spatially compression of electronic beam pulse width, therefore the time resolution energy of 100 femtoseconds can be realized
Power, the energy of electron beam is up to million-electron-volt, and the number of electrons in Single Electron beam group is up to 106Magnitude, make faster
The diffraction pattern for being obtained sample in time scale using single electron beam group is possibly realized.But the shortcomings that this method is desirable
Powerful power supply accessory system, and electronics is needed with accelerating field synchronization, therefore extra time jitter can be introduced, make ultrafast electronics
The time resolution of diffraction system is limited in 100 femtoseconds, this research for some physical processes, such as the phonon of graphene
Relaxation process can not be observed in 10 femtoseconds or so.In addition, the energy of electron beam caused by this method dissipate it is larger so that electricity
Sub- diffraction pattern broadens, and spatial resolution is deteriorated.
Therefore, ultrafast electric diffraction technical field there is an urgent need to research and develop a kind of spatial and temporal resolution is higher, working method more
Ultrafast electric diffraction apparatus flexible and simple and easy, stability is high, more new phenomenons and new physicses can be observed, can
Serve the every field such as physics, chemistry, biology, medical science.There is presently no the ultrafast electricity that time resolution is less than 100 femtoseconds
Sub- diffraction experiment system.
The content of the invention
The purpose of the present invention is to realize a kind of electron diffraction apparatus accelerated based on laser plasma coda Q values, the device
There is higher time resolution compared with existing electron diffraction apparatus, pump light and detection electronics in electronic diffraction experiment
Beam has good time synchronized, and without components such as photocathode, high-field electrode or microwave sources, makes device eased and tight
Gather, can be widely applied in the scientific research of ultra-fast dynamics process.
The technical scheme that the present invention takes is as follows：
The invention provides it is a kind of based on laser plasma coda Q values accelerate electron diffraction apparatus, including laser,
Optics incidence window, vacuum chamber, gas generation apparatus, the first micropore, the second micropore, magnetic lenses, five dimension regulating systems, sample
Frame, detection system and vacuum supply system；
The laser is used to produce laser pulse and laser pulse is squeezed into vacuum chamber by optics incidence window；
Gas generation apparatus, the first micropore, second micro- is disposed with along the direction of laser pulse in the vacuum chamber
Hole, specimen holder and detection system；
Multiple vacuum flanges are provided with outside the vacuum chamber, for being observed internal vacuum chamber and external equipment
Connection；
The gas generation apparatus and external connection, for repeating to produce gas target；Laser pulse and gas target phase interaction
With being ionized the molecule in gas target, produce electron beam group；
Electron beam is successively rolled into a ball by the first micropore and the second micropore by the electron beam group to be collimated；
The magnetic lenses is used to compress and focus on electron beam group between the first micropore and the second micropore；The magnetic lenses
The direction that outgoing can be rolled into a ball along electron beam is moved, for electron beam group to be focused on to different positions；
The specimen holder is used to place diffraction sample, and electron beam group can produce electronic diffraction after being had an effect with diffraction sample
Pattern；
The five dimensions regulating system is connected with specimen holder, is adjusted for carrying out position and direction to diffraction sample；
The detection system is used to be collected electron diffraction pattern, amplify and detect；
The vacuum supply system is used to provide vacuum environment to vacuum chamber, and the vacuum supply system is multiple vavuum pumps
Cascade composition.
Detection system in this patent is divided into two kinds：
Wherein, a kind of detection system is micro-channel type image intensifier；Micro-channel type image intensifier is included along electronics
Sandwich MCP, fluorescent screen, lens and the camera that the exit direction of diffraction pattern is set gradually.
Another detection system is back-illuminated type CMOS active pixel sensor；The back-illuminated type CMOS active pixel sensor includes silicon
Substrate, pixel cell and routing cell；Silicon substrate face diffraction sample, pixel cell and routing cell are configured in silicon lining successively
On bottom.
Specifically, multiple vacuum flanges are six, including the first vacuum flange, the second vacuum flange, the 3rd vacuum
Method, the 4th vacuum flange, the 5th vacuum flange and the 6th vacuum method；First vacuum flange is used to install optical observation
Window observes the state of gas target；Second vacuum flange is used to connect gas generation apparatus；3rd vacuum flange is used for specimen holder
Fixation and five dimension regulating systems connection；4th vacuum flange is used for the state for installing optical observation window observation sample；The
Five vacuum flanges can be used for the upgrading to system as reserved blank flange；6th vacuum flange is used to connect vacuum supply system
System.
Above-mentioned diffraction sample is placed on specimen holder by mesh；20 microns to 200 microns of the mesh diameter；Diffraction sample
The thickness of product is less than 200 nanometers.
Above-mentioned laser pulse power density is more than 1018Watts per square centimeter, width are less than 100 femtoseconds.
The gas source of above-mentioned gas process units is hydrogen or helium or nitrogen or argon gas；Gas molecule institute in gas source
It is more than 10 containing electron number densitiy18It is individual per cubic centimeter.
Above-mentioned vacuum supply system is made up of either by mechanical pump, molecular pump and titanium mechanical pump, molecular pump and ionic pump
Pump group is into the background vacuum of vacuum supply system is up to 10-6Below Pa.Advantages of the present invention：
1st, the present invention eliminates photocathode, high-tension electricity compared with the ultrafast electric diffraction apparatus based on DC electronic rifle
The components such as source, experimental provision is simplified, and utilize the contained electricity of Single Electron beam group caused by the length acceleration of laser plasma coda wave
Subnumber mesh is more than 106It is individual, the experimental study of single-shot ultrafast electric diffraction can be carried out, has saved the time needed for experiment；
2nd, the present invention is compared with the ultrafast electric diffraction apparatus based on radio frequency electric rifle, without photocathode, microwave power supply
Deng component, make device compacter, and extra time jitter will not be produced, therefore ultrafast electric diffraction experimental provision is more steady
It is fixed.
3. the present invention has the characteristics of electron beam that can produce more high time resolution, specifically the pulse of electron beam group
Width can be to 10 femtosecond magnitudes, therefore can carry out the research of the ultra-fast dynamics experiment of higher time scale.In addition, in the present invention
Caused ultrafast electron beam is naturally synchronous with pump laser beam, the time synchronization process without complexity.
4th, the present invention proposes the detection system tested by the use of back-illuminated type CMOS active pixel sensor as ultrafast electric diffraction, can
Further simplify device and reduce system noise.
Brief description of the drawings
Fig. 1 is ultrafast electric diffraction apparatus structural representation
Fig. 2 is specimen holder structural representation
Fig. 3 is back-illuminated type CMOS active pixel sensor structural representation.
1- lasers, 2- vacuum chambers, 3- optics incidence window, the vacuum flanges of 4- first, the vacuum flanges of 5- second, 6- gases
Generation device, 7- outgoing gas, the micropores of 8- first, 9- electron beams group, 10- magnetic lenses, the micropores of 11- second, the vacuum methodes of 12- the 3rd
Blue, 13- five tie up regulating system, 14- specimen holders, the vacuum flanges of 15- the 4th, the vacuum flanges of 16- the 5th, the vacuum flanges of 17- the 6th,
18- Sandwich MCPs, 19- fluorescent screens, 20- lens, 21- cameras, 22- mesh, 23- diffraction samples, 24- silicon substrates, 25- pixels
Unit, 26- routing cells, 27- vacuum systems.
Embodiment
Invention is described further below in conjunction with the accompanying drawings.It should be understood that embodiment shown in the drawings is not this
The limitation of invention, and simply to illustrate that the connotation of technical solution of the present invention.
The electron diffraction apparatus of the present invention is as shown in Figure 1.
The device includes laser 1, optics incidence window 3, vacuum chamber 2, gas generation apparatus 6, the first micropore 8, second
Regulating system 13, specimen holder 14, detection system and vacuum supply system 27 are tieed up in micropore 11, magnetic lenses 10, five；
In vacuum chamber 2 gas generation apparatus 6, the first micropore 8, the second micropore are disposed with along the direction of laser pulse
11st, specimen holder 14 and detection system；
Wherein, laser 1 can generate less than the ultrashort pulse of 100 femtoseconds, and the wavelength of laser pulse is 800 nanometers,
Energy is less than 100 millijoules, and repetition rate is less than 1 KHz, and spot size is less than 5 microns after focusing.The laser passes through true
The optics incidence window 3 of the front end of empty room 2 enters in vacuum chamber, and from high density, high repetition frequency caused by gas generation apparatus 6
Outgoing gas 7 react, electricity production beamlet group 9.
Wherein, for gas generation apparatus 6 by the second vacuum flange 5 and external connection, the exit portal of gas generation apparatus 6 can
Rectangular configuration or figure circular configuration are selected, the diameter of circular configuration is less than 1 millimeter, and the representative width of rectangular configuration is 1 millimeter,
Length is 3 millimeters.The gas source of gas producing plant is hydrogen or helium or nitrogen or argon gas；Gas molecule institute in gas source
It is more than 10 containing electron number densitiy18It is individual per cubic centimeter.
The interaction of light laser and gas can produce Plasma wake field, and plasma is by pondermotive force by electron beam
Constraint, form electron beam group.The kinetic energy of electron beam group is 100,000 electron-volts to 1 million-electron-volt, can be dissipated less than 3%, electronics
The pulse width of beam group is consistent with the pulse width of incoming laser beam.
The first micropore 8 is placed being emitted 5 centimeters apart from electron beam, for being collimated to electron beam, the diameter of micropore is less than 2
Millimeter.
Electron beam is by the 8 backward preceding propagation of the first micropore, in order to carry out further focusing on to incide sample to electron beam
On product, there is magnetic lenses 10 in communication process, magnetic lenses 10 is made up of the part such as coil, protective layer, pole shoe, cooling, to line
After circle applies electric current, magnetic field can be produced, constrains size and the path of electron beam.The typical sizes of electron beam are 500 micro- after focusing
Rice, magnetic field is less than 100 milli teslas.
At the focal position of electron beam, specimen holder 14 is provided with.In order to further improve the quality of incident beam,
5 centimeters place the second micropore 11 before specimen holder, and the diameter of the second micropore is less than 2 millimeters.
Specimen holder 14 is fixed by the 3rd vacuum flange 12, and passes through five times regualting frame 13 in the case of being controlled in outside
Carry out the regulation of position and direction.Specimen holder is apart from 10-100 centimetres of laser distance gas generation apparatus, to prevent light laser from damaging
Bad sample.
The detailed construction of specimen holder on specimen holder as shown in Fig. 2 be provided with multiple a diameter of 3 millimeters of mesh 22, net
20 microns to 200 microns of bore dia, is placed with super-thin electronic diffraction sample 23 on mesh, and the thickness of sample is less than 200 nanometers.
Electron beam interacts with diffraction sample, can produce electron diffraction pattern.Electron diffraction pattern is by detection
It is collected after system.Wherein detection system is made up of Sandwich MCP 18, fluorescent screen 19, lens 20 and camera 21.
Further, since electron beam has very high kinetic energy in the present invention, another detector, i.e. back-illuminated type can be also used
Charge coupling device or back-illuminated type CMOS active pixel sensor.In figure 3, it is the back side of detector, material is silicon substrate 24, thickness
Less than 50 nanometers.Pixel cell 25 and routing cell 26 are configured on silicon substrate 24 successively.Electronics incides picture from silicon substrate 24
Electron-hole pair is produced on plain unit 25, electron bombardment gain can be produced under electron bombardment effect, faint electronics can be spread out
Signal amplification is penetrated, by being collected after routing cell 26.It is compacter with micro-channel plate detector system structure compared.
In addition, the front end of vacuum chamber 2 is additionally provided with the first vacuum flange 4, the first vacuum relative to gas producing plant position
Flange 4 is observed electron beam group for installing optical observation window；Also set up on vacuum chamber 2 relative to diffraction sample position
There is the 4th vacuum flange 15, the 4th vacuum flange 15 is used to install state of the optical observation window to sample observation sample；Vacuum
The latter end of room 2 is additionally provided with the 5th vacuum flange 16 and the 6th vacuum flange 17；5th vacuum flange 16 is as reserved blind plate
Flange can be used for the upgrading to system；6th vacuum flange 17 is used to connect vacuum supply system 27.
Claims (6)
- A kind of 1. electron diffraction apparatus accelerated based on laser plasma coda Q values, it is characterised in that：Including laser, optics Incidence window, vacuum chamber, gas generation apparatus, the first micropore, the second micropore, magnetic lenses, five dimension regulating systems, specimen holder, spy Examining system and vacuum supply system；The laser is used to produce laser pulse and laser pulse is squeezed into vacuum chamber by optics incidence window；In the vacuum chamber gas generation apparatus, the first micropore, the second micropore, sample are disposed with along the direction of laser pulse Product frame and detection system；Multiple vacuum flanges are provided with outside the vacuum chamber, for being observed internal vacuum chamber and the company of external equipment Connect；The gas generation apparatus and external connection, for repeating to produce gas target；Laser pulse interacts with gas target, makes Molecule in gas target is ionized, and produces electron beam group；Electron beam is successively rolled into a ball by the first micropore and the second micropore by the electron beam group to be collimated；The magnetic lenses is used to compress and focus on electron beam group between the first micropore and the second micropore；The magnetic lenses can edge The direction movement of electron beam group's outgoing, for electron beam group to be focused on to different positions；The specimen holder is used to place diffraction sample, and electron beam group can produce electron diffraction diagram after being had an effect with diffraction sample Sample；The five dimensions regulating system is connected with specimen holder, is adjusted for carrying out position and direction to diffraction sample；The detection system is used to be collected electron diffraction pattern, amplify and detect；The vacuum supply system is used to provide vacuum environment to vacuum chamber, and the vacuum supply system cascades for multiple vavuum pumps Composition；Described detection system is back-illuminated type CMOS active pixel sensor；The back-illuminated type CMOS active pixel sensor include silicon substrate, Pixel cell and routing cell；Silicon substrate face diffraction sample, pixel cell and routing cell are configured on silicon substrate successively.
- 2. the electron diffraction apparatus according to claim 1 accelerated based on laser plasma coda Q values, it is characterised in that：The multiple vacuum flange include the first vacuum flange, the second vacuum flange, the 3rd vacuum flange, the 4th vacuum flange, 5th vacuum flange and the 6th vacuum flange；First vacuum flange is used to install optical observation window observation gas target State；Second vacuum flange is used to connect gas generation apparatus；3rd vacuum flange is used for fixation and five dimensions article of specimen holder The connection of part regulating system；4th vacuum flange is used to install state of the optical observation window to sample observation sample；5th is true Empty flange can be used for the upgrading to system as reserved blank flange；6th vacuum flange is used to connect vacuum supply system.
- 3. the electron diffraction apparatus according to claim 2 accelerated based on laser plasma coda Q values, it is characterised in that： The diffraction sample is placed on specimen holder by mesh；20 microns to 200 microns of the mesh diameter；The thickness of diffraction sample Less than 200 nanometers.
- 4. the electron diffraction apparatus according to claim 3 accelerated based on laser plasma coda Q values, it is characterised in that： The laser pulse power density is more than 1018Watts per square centimeter, width are less than 100 femtoseconds.
- 5. the electron diffraction apparatus according to claim 4 accelerated based on laser plasma coda Q values, it is characterised in that：The gas source of the gas producing plant is hydrogen or helium or nitrogen or argon gas；It is electric contained by gas molecule in gas source Subnumber density is more than 1018It is individual per cubic centimeter.
- 6. the electron diffraction apparatus according to claim 5 accelerated based on laser plasma coda Q values, it is characterised in that：The vacuum supply system is made up of either by mechanical pump, molecular pump and titanium pump group mechanical pump, molecular pump and ionic pump Into the background vacuum of vacuum supply system is up to 10-6Below Pa.
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| CN107222968A (en) * | 2017-06-05 | 2017-09-29 | 北京大学 | Can device and choosing energy method applied to the electronics choosing in Laser Driven coda Q values accelerator |
| CN109718480A (en) * | 2019-03-05 | 2019-05-07 | 北京中百源国际科技创新研究有限公司 | A kind of lasing ion treatment of cancer device |
| CN114252653B (en) * | 2021-01-06 | 2023-12-12 | 中国科学院物理研究所 | Ultrafast imaging device and method thereof |
| CN113225890B (en) * | 2021-05-08 | 2024-03-29 | 湖南太观科技有限公司 | Micro accelerator based on intelligent metamaterial and acceleration method thereof |
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