CN106319470B - Thimble bracket and processing chamber - Google Patents
Thimble bracket and processing chamber Download PDFInfo
- Publication number
- CN106319470B CN106319470B CN201510330005.5A CN201510330005A CN106319470B CN 106319470 B CN106319470 B CN 106319470B CN 201510330005 A CN201510330005 A CN 201510330005A CN 106319470 B CN106319470 B CN 106319470B
- Authority
- CN
- China
- Prior art keywords
- thimble
- bearing
- bracket
- seat
- pedestal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of thimble bracket and processing chamber, which is fitted at the pedestal in process cavity, for processed wafer picking and placeing on pedestal；The thimble bracket includes bearing and thimble seat, and thimble seat is fitted on bearing, and can be produced relative sliding with bearing；It is provided with linking arm on bearing, and is mounted on thimble bracket elevating mechanism by linking arm；Several thimbles are installed on thimble seat；When installation and adjustment, thimble seat relative seat sliding so that after thimble is directed at the corresponding aperture on pedestal, thimble seat and bearing are fixed.Thimble bracket of the present invention increases the adjustable range of thimble position, by the relative position relation for adjusting thimble seat and bearing, you can so that the corresponding aperture of thimble and pedestal is matched better, to reduce the difficulty of pedestal installation.
Description
Technical field
The present invention relates to a kind of thimble bracket, which is fitted at the pedestal in process cavity, for processing crystalline substance
Member picking and placeing on pedestal.
Background technology
PVD (Physical Vapor Deposition) i.e. physical vapour deposition (PVD)s are current elder generations widely applied in the world
Into process for treating surface.Its operation principle is exactly under vacuum, to make the ionization of gas part using gas discharge, after ionization
Gas ion bombardment target, the target ion of sputtering or its reactant are deposited in wafer (Wafer).
Object of the wafer as sputtering, needs to be passed to piecewise in technical process, spreads out of vacuum chamber.In addition, in order to
Ensure the clarity of plasma sputter, masking disk (Shutter Disk) is often needed to use before technique and replaces wafer, in vacuum
Pre-sputtering is carried out in chamber, cleans target material surface.The two processes are required to complete using thimble bracket carrying thimble (Pin)
Corresponding technique picks and places function, referring specifically to Fig. 1.
Fig. 1 show thimble bracket fundamental diagram.It includes pedestal (ESC pedestal) 1, thimble that technique, which picks and places structure,
(Pin) 2, thimble bracket 3, thimble elevating mechanism 4, pedestal elevating mechanism 5, process cavity bottom plate 6, masking disk (Shutter Disk)
7, shutter bracket 8, fast door pivot 9, wafer (Wafer) 10 and manipulator 11.Wherein, manipulator 11 is located in transmission cavity, is used for
Wafer 10 is transmitted between different chamber, remaining each component is respectively positioned in process cavity；Thimble elevating mechanism 4 and pedestal elevating mechanism 5
It is installed on bottom plate 6 by screw；Thimble bracket 3, pedestal 1 are installed on thimble elevating mechanism 4 and pedestal liter by screw respectively
On descending mechanism 5, and the vertical lift in process cavity is realized by elevating mechanism.Three thimbles 2 are fixedly mounted on thimble bracket 3
On, and three through-holes on pedestal 1.Fast door pivot 9 is mounted on by screw on bottom plate 6, and fast door pivot 9 drives when rotating
Shutter bracket 8 is sent to disk 7 is covered right over pedestal 1, or sends initial position shown in Fig. 1 back to.When technique film releasing, machinery
Hand 11 is moved to wafer 10 right over pedestal 1, and thimble bracket 3 rises with three thimbles 2 and holds up wafer 10, manipulator
11 return to initial position；When technique takes piece, first three thimbles 2 are risen and hold up wafer 10, then manipulator 11 stretches into work
The lower section of wafer 10 in skill chamber, three thimbles, 2 times general who has surrendered's wafers 10 are put on manipulator 11, and manipulator 11 returns to initial bit
It sets.The fetching process for covering disk 7 is identical as wafer 10.Finally, as pedestal 1 vertically lifts, three thimbles 2 stretch out base
The length of seat 1 changes, and is achieved in wafer 10 or masking disk 7 replaces in thimble 2 with the position on pedestal 1, to carry out
Related process sputters.
In view of the sputtering size requirement of the uniformity requirement and wafer 10 of sputter coating, the radial dimension of pedestal 1 needs
More than the radial dimension of wafer 10, and extending into below wafer for ease of manipulator 11, the radial ruler of circle where three thimbles 2
It is very little to be the bigger the better.When the radial dimension of circle is equal to the radial dimension of wafer 10 where three thimbles 2, it can just hold up
Wafer 10 should be to ensure that normal work reserve corresponding smaller surplus in engineering.At this point, if thimble bracket 3 and pedestal 1
Concentricity installation error is larger, when wafer 10 or masking disk 7 be transmitted to 1 surface of pedestal when, it is possible to occur wafer 10 or
Person cover disk 7 cannot stablize be located at three 2 upper ends of thimble the phenomenon that, thus, the installation accuracy of pedestal 1 is wanted in installation process
Ask higher.
For example, Fig. 2 show a kind of existing thimble carrier structure, thimble bracket 3 therein, pedestal 1 are respectively by each
From elevating mechanism 4,5 be installed on the bottom plate of processing chamber；There are three uniformly distributed through-hole, end bands for processing on thimble bracket 3
Threaded thimble 2 passes through through-hole, and is installed on thimble bracket 3 by gasket and nut, three on thimble bracket 3 piece thimble
2 upper end passes through three through-holes of pedestal 1.It is adjusted by four holding screws 12 between thimble bracket 3 and its elevating mechanism 4
It is flat, and fixed by four mounting screws 13；It is machined with along thimble elevating mechanism 4 on thimble bracket 3 at mounting screw 13
The long slot bore of the circumferentially extending of concentric circles does appropriate angle when thimble bracket 3 being enable to install around 4 center of thimble elevating mechanism
Rotation adjustment.
Fig. 3 show existing error schematic diagram when thimble bracket is installed in Fig. 2, including pedestal 1, thimble 2, thimble
Bracket 3, thimble elevating mechanism 4.When depositing direction shown in arrow in figure 3 or reversed small angle error when pedestal 1 is installed,
To ensure that thimble 2 is in the center of corresponding aperture on pedestal 1 as possible, thimble bracket 3 should do respective angles on same direction
Adjustment.But it is adjusted as rotation center using the center of thimble elevating mechanism 4 when being installed due to thimble bracket 3, in the rotation
The center of the heart and pedestal 1 is misaligned, thus the center of circle of three 2 place circles of thimbles will be made to shift relative to the center of pedestal 1,
May occur wafer 10 or cover disk 7 cannot stablize be located at three 2 upper ends of thimble the phenomenon that, thus, in installation process
It is more demanding to the installation accuracy of pedestal 1.
Invention content
In view of the problems of the existing technology, the object of the present invention is to provide a kind of thimble bracket, which passes through
Structure is improved, the convenience of installation is increased, the requirement to pedestal installation accuracy is reduced, improves thimble and pedestal
Upper hole to neutrality.
The present invention also aims to provide a kind of processing chamber, above-mentioned thimble bracket is provided in the processing chamber, on
The convenience that processing chamber increases installation is stated, the requirement to pedestal installation accuracy is reduced.
To achieve the above object, technical solution of the present invention is as follows：
A kind of thimble bracket, including bearing and thimble seat, wherein：
The thimble seat is fitted on the bearing, and can be produced relative sliding with the bearing；
It is provided with linking arm on the bearing, and is mounted on thimble bracket elevating mechanism by the linking arm；
Several thimbles are installed on the thimble seat；
When installation and adjustment, the relatively described bearing sliding of the thimble seat so that the corresponding aperture on the thimble alignment pedestal
Afterwards, the thimble seat is fixed with bearing.
Preferably, sliding slot is provided on the bearing, the thimble seat is embedded in the sliding slot.
Preferably, the sliding slot in annular shape, and with the concentric.
Preferably, the cross section of the sliding slot is U-shaped or L-type.
Preferably, it is provided with slideway on the bearing, is provided on the thimble seat and the mutually matched cunning of the slideway
Block.
Preferably, several described slideways being spaced apart are provided on the bearing, all slideways are located at same circumference
On, and the circumference and the concentric.
Preferably, the thimble seat is mutually fixed with the bearing by screw or by bolt attaching nut.
Preferably, position corresponding with the thimble is provided with adjustment hole on the bearing；
When installation and adjustment, the adjustment hole is run through in the lower end of the thimble, and it is micro- that progress can be moved in the adjustment hole
It adjusts, the lower end of the thimble is provided with screw thread, is fixed the bearing with thimble seat with the screw-thread fit by nut.
A kind of processing chamber is provided with the thimble bracket described in any of the above item in the processing chamber.
The present invention proposes a kind of thimble bracket with rotatable thimble seat, increases the adjustable range of thimble position,
By the relative position relation for adjusting thimble seat and bearing, you can so that the corresponding aperture of thimble and pedestal is matched better, to
The requirement to pedestal installation accuracy is reduced, reduces the difficulty of pedestal installation accordingly.Compared with prior art, energy of the present invention
The center of circle of circle and base disc off-centring where enough avoiding the problem that thimble, and then wafer or masking disk are avoided from thimble
Upper landing.
Description of the drawings
Fig. 1 is a kind of thimble bracket fundamental diagram in the prior art；
Fig. 2 is a kind of structural schematic diagram of thimble bracket in the prior art；
Fig. 3 is existing error schematic diagram when thimble bracket is installed in Fig. 2；
Fig. 4 is the fundamental diagram of thimble bracket provided by the invention；
Fig. 5 is the structural schematic diagram of thimble bracket provided by the invention；
Fig. 6 is the section structure diagram for the thimble bracket that the embodiment of the present invention 1 provides；
Fig. 7 is the section structure diagram for the thimble bracket that the embodiment of the present invention 2 provides；
Fig. 8 is the section structure diagram for the thimble bracket that the embodiment of the present invention 3 provides；
Fig. 9 is the section structure diagram for the thimble bracket that the embodiment of the present invention 4 provides；
Figure 10 is the section structure diagram for the thimble bracket that the embodiment of the present invention 5 provides.
Specific implementation mode
With reference to examples illustrate the present invention.
Thimble bracket of the present invention can be applied to physical gas-phase deposition, can also be applied to chemical vapor deposition method or
PSS etching technics, and be mutually equipped with the pedestal in process cavity.In process cavity, thimble bracket and pedestal are mounted on respective lifting
In mechanism, in the corresponding hole that several thimbles for being arranged on thimble bracket are threaded through one by one on pedestal；With thimble bracket and
Pedestal rises or declines under the driving of respective elevating mechanism, realizes to processed wafer picking and placeing on pedestal.Referring to Fig. 1.
Thimble bracket disclosed by the invention includes bearing 31 and thimble seat 32, wherein thimble seat 32 is fitted to bearing
On 31, and it can be produced relative sliding with bearing 31；It is provided with linking arm on bearing 31, and thimble support is mounted on by linking arm
On frame elevating mechanism；Several thimbles 2 are installed, when installation and adjustment, the sliding of 32 relative seat 31 of thimble seat makes on thimble seat 32
After obtaining the corresponding aperture that thimble 2 is aligned on pedestal, thimble seat 32 and bearing 31 are fixed.
In this present embodiment, the effect of bearing 31 be used to support thimble seat 32, and can make thimble seat 32 on it around
The center of circle of thimble seat 32 rotates；The effect of thimble seat 32 is installation thimble 2, and keeps the relative position of each thimble 2 constant.
Fig. 4 is the fundamental diagram of thimble bracket provided by the invention, and Fig. 5 is the structure of thimble bracket provided by the invention
Schematic diagram.
Referring to Fig. 5, which includes bearing 31 and thimble seat 32, and bearing 31 is circular ring shape, from the radial direction of bearing 31
Integrally extend a lug boss 33 outward in outside, wherein linking arm of the lug boss 33 as bearing 31 is provided with four peaces
Cartridge screw hole, the mounting screw holes are distributed on a circumference, also, mounting screw holes is prolongs along it in a circumferential direction
The arc long slot bore stretched；Meanwhile set screw hole there are four being also set up on lug boss 33.Thimble seat 32 is similarly circular ring shape, top
It is circumferentially uniformly distributed there are three thimble 2 for 32 upper edge of needle stand, which is arranged on the same circumference concentric with thimble seat 32.
Thimble seat 32 is mounted on bearing 31, and concentric with bearing 31.
Referring to Fig. 4, bearing 31 is mounted on thimble bracket elevating mechanism by the lug boss 33 on bearing 31 as linking arm,
Four mounting screws 13 mutually fix lug boss 33 and thimble bracket elevating mechanism through four mounting screw holes on lug boss 33.
Before fixation, the support first with the screw 12 in four set screw holes on lug boss 33 to three thimbles 2 of thimble seat 32
Face carries out leveling, so that it is parallel with the wafer supporting surface on pedestal 1.
Because the mounting screw holes on lug boss 33 is arc long slot bore, thus by lug boss 33 and thimble bracket elevating mechanism
When fixed, coarse adjustment is carried out with the relative position in the corresponding hole on pedestal 1 to thimble 2 first with arc long slot bore, is then led to again
Crossing keeps thimble seat 32 micro- to each thimble 2 and the relative position progress in the corresponding hole on each comfortable pedestal 1 around its center rotating
It adjusts, so that each thimble 2 is respectively positioned on the center in respective corresponding hole, and after fine tuning, by thimble seat 32 and bearing 31
It is mutually fixed.
It describes in detail below to the matching relationship of bearing 31 and thimble seat 32：
It can be provided with sliding slot on bearing 31, thimble seat 32 is embedded in sliding slot.Wherein, sliding slot is in annular shape, and with
Bearing 31 is concentric, and the cross section of sliding slot is U-shaped, L-type or other shapes.
One or several slideways being spaced apart can also be set on bearing 31, be provided on thimble seat 32 and slideway
Mutually matched sliding block.Wherein, several slideways are located on same circumference, and place circumference and bearing 31 are concentric.
Fig. 6 is the section structure diagram for the thimble bracket that the embodiment of the present invention 1 provides.As shown in fig. 6, in bearing 31
Side surface is step surface, and circular ring shape thimble seat 32 is located on the step surface of bearing 31, upper surface and the bearing 31 of thimble seat 32
Upper surface flush, the hole wall of thimble seat 32 flushes with the inner hole wall of bearing 31.Thimble 2 is inserted into the circle being arranged on thimble seat 32
The lower end of Kong Zhong, thimble 2 are provided with screw thread, meanwhile, it is corresponded on bearing 31 and is both provided with an adjustment hole 34 at each thimble 2, it should
Adjustment hole 34 is arc long slot bore.When installation, the lower end of thimble 2 is first passed through into adjustment hole 34 so that 2 lower end of thimble is provided with spiral shell
At least partly stretching adjustment hole 34 of line, then relative seat 31 rotate thimble seat 32, are finely adjusted to the position of thimble 2, set up
Nut 35 is recycled to fix thimble seat 32 and 31 phase of bearing with screw-thread fit afterwards.In this structure,；Thimble 2 becomes thimble
Seat 32 and 31 mutually fixed screw of bearing.
Fig. 7 is the section structure diagram for the thimble bracket that the embodiment of the present invention 2 provides.As shown in fig. 7, in the embodiment
The inboard surface of bearing 31 remain as step surface, with embodiment 1 the difference is that the thickness of thimble seat 32 and 31 phase of bearing
Together, the radial outside surface of thimble seat 32 is the folding face to match with the entire radial inboard surface of bearing 31, thimble seat 32 it is upper
Lower surface is flushed with the upper and lower surface of bearing 31 respectively.In this present embodiment, thimble seat 32 by screw or passes through with bearing 31
Bolt attaching nut is mutually fixed.
Fig. 8 is the section structure diagram for the thimble bracket that the embodiment of the present invention 3 provides.In this embodiment, thimble seat
The entire upper surface of 32 covering bearings 31, meanwhile, it extends downward into along the hole wall of bearing 31 and is flushed with the lower surface of bearing 31.In
In the present embodiment, thimble seat 32 is mutually fixed with bearing 31 by screw or by bolt attaching nut.
Fig. 9 is the section structure diagram for the thimble bracket that the embodiment of the present invention 4 provides.In this embodiment, thimble seat
32 lower surface carries U-lag, and thimble seat 32 is buckled in by its U-lag on the upper surface of bearing 31.The U-lag of thimble seat 32 with
Radial inboard face, lateral surface and the upper surface of bearing 31 constitute opposite slide construction between the two.It should be noted that because of top
Needle stand 32 covers three sides of bearing 31, and the lug boss 33 being connected with bearing 31 need to be extended downwardly from the lower surface of bearing 31
Afterwards, then to radial outside it extends to form.In this present embodiment, thimble seat 32 coordinates spiral shell with bearing 31 by screw or by bolt
Parent phase is fixed.
Figure 10 is the section structure diagram for the thimble bracket that the embodiment of the present invention 5 provides.In this embodiment, bearing 31
Upper surface and the lower surface of thimble seat 32 be plane, thimble seat 32 is placed on bearing 31；Thimble 2 is fixed on thimble seat 32
On, the part that thimble 2 is extended downwardly from 32 lower surface of thimble seat carries smooth cylindrical section；Bearing 31 corresponds to equal at each thimble 2
It is provided with adjustment hole, which is arc elongated slot, and width and the smooth cylindrical section on thimble 2 of the elongated slot match, and thus
The sliding of 32 relative seat 31 of thimble seat is oriented to.2 lower end of thimble is threaded, and will by nut 35 and screw-thread fit
Thimble seat 32 is fixed with 31 phase of bearing.
Present invention also provides a kind of processing chambers, wherein above-described thimble support is provided in the processing chamber
Frame.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, the present invention is not limited thereto.For those skilled in the art, do not depart from the principle of the present invention and
In the case of essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (8)
1. a kind of thimble bracket, which is characterized in that including bearing and thimble seat, wherein：
The thimble seat is fitted on the bearing, and can be produced relative sliding with the bearing；
It is provided with linking arm on the bearing, and is mounted on thimble bracket elevating mechanism by the linking arm；
Several thimbles are installed on the thimble seat；
When installation and adjustment, the relatively described bearing sliding of the thimble seat so that, will after the corresponding aperture on the thimble alignment pedestal
The thimble seat is fixed with bearing；
Sliding slot is provided on the bearing, the thimble seat is embedded in the sliding slot.
2. thimble bracket as described in claim 1, which is characterized in that the sliding slot is in circular and same with the bearing
The heart.
3. the thimble bracket as described in claim 1, which is characterized in that the cross section of the sliding slot is in U types or L types.
4. the thimble bracket as described in claim 1, which is characterized in that be provided with slideway, the thimble seat on the bearing
On be provided with and the mutually matched sliding block of the slideway.
5. thimble bracket as claimed in claim 4, which is characterized in that be provided with what several were spaced apart on the bearing
The slideway, all slideways are located on same circumference, and the circumference and the concentric.
6. the thimble bracket as described in claim 1, which is characterized in that the thimble seat by screw or leads to the bearing
Bolt attaching nut is crossed mutually to fix.
7. the thimble bracket as described in claim 1, which is characterized in that the position corresponding with the thimble on the bearing
It installs and is equipped with adjustment hole；
When installation and adjustment, the adjustment hole is run through in the lower end of the thimble, and can move and be finely adjusted in the adjustment hole, institute
The lower end for stating thimble is provided with screw thread, is fixed the bearing with thimble seat with the screw-thread fit by nut.
8. a kind of processing chamber, which is characterized in that be provided in the processing chamber as described in any one of claim 1 to 7
Thimble bracket.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510330005.5A CN106319470B (en) | 2015-06-15 | 2015-06-15 | Thimble bracket and processing chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510330005.5A CN106319470B (en) | 2015-06-15 | 2015-06-15 | Thimble bracket and processing chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106319470A CN106319470A (en) | 2017-01-11 |
| CN106319470B true CN106319470B (en) | 2018-11-06 |
Family
ID=57733353
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510330005.5A Active CN106319470B (en) | 2015-06-15 | 2015-06-15 | Thimble bracket and processing chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106319470B (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104465447A (en) * | 2013-09-17 | 2015-03-25 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Carrying platform elevating gear, reaction cavity, and plasma processing device |
| CN104658957A (en) * | 2013-11-18 | 2015-05-27 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Ejector pin mechanism and plasma processing equipment |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002134592A (en) * | 2000-10-19 | 2002-05-10 | Tokyo Ohka Kogyo Co Ltd | Method and equipment for heat treatment |
| US6440879B1 (en) * | 2001-01-05 | 2002-08-27 | Integrated Device Technology, Inc. | Physical vapor deposition apparatus with modified shutter disk and cover ring |
-
2015
- 2015-06-15 CN CN201510330005.5A patent/CN106319470B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104465447A (en) * | 2013-09-17 | 2015-03-25 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Carrying platform elevating gear, reaction cavity, and plasma processing device |
| CN104658957A (en) * | 2013-11-18 | 2015-05-27 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Ejector pin mechanism and plasma processing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106319470A (en) | 2017-01-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8241473B2 (en) | Sputter-coating apparatus | |
| US10760160B2 (en) | Showerhead tilt mechanism | |
| EP0585445A1 (en) | Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile | |
| JP2003519908A (en) | Linear drive system used in plasma processing system | |
| US8486242B2 (en) | Deposition apparatus and methods to reduce deposition asymmetry | |
| JP2017143244A (en) | Control of incidence angle of ion beam on substrate | |
| KR20190019225A (en) | Physical vapor deposition (PVD) plasma energy control by dynamic magnetron control | |
| CN103993269B (en) | Coating apparatus and film plating process | |
| CN104109841B (en) | Magnetron sputtering inclined deposition plating apparatus | |
| US20150362473A1 (en) | Low-E Panels Utilizing High-Entropy Alloys and Combinatorial Methods and Systems for Developing the Same | |
| TWI316744B (en) | Wafer holder | |
| CN106319470B (en) | Thimble bracket and processing chamber | |
| CN106350781B (en) | Processing chamber and semiconductor processing equipment | |
| WO2012097024A2 (en) | Pvd process with synchronized process parameters and magnet position | |
| CN110574149B (en) | Gimbal Assembly for Heater Base | |
| KR102429613B1 (en) | Plasma processing apparatus and upper electrode assembly | |
| CN210826329U (en) | Coating apparatus, ion source, and gate structure | |
| US20140174911A1 (en) | Methods and Systems for Reducing Particles During Physical Vapor Deposition | |
| CN109983150A (en) | Device and method for the sedimentary on substrate | |
| CN113388820B (en) | Base device for improving uniformity of filling film, sputtering equipment and sputtering process | |
| US20150114826A1 (en) | Pvd apparatus for directional material deposition, methods and workpiece | |
| US20130146451A1 (en) | Magnetic Confinement and Directionally Driven Ionized Sputtered Films For Combinatorial Processing | |
| CN106298420B (en) | Lower electrode and semiconductor processing equipment | |
| TW201527564A (en) | Coating apparatus | |
| CN218507891U (en) | Coating system and rotating device for X-ray tube liquid metal bearing |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information | ||
| CB02 | Change of applicant information |
Address after: 100176 No. 8 Wenchang Avenue, Beijing economic and Technological Development Zone Applicant after: Beijing North China microelectronics equipment Co Ltd Address before: 100176 No. 8, Wenchang Avenue, Daxing District economic and Technological Development Zone, Beijing Applicant before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant |