CN106292197A - A kind of focusing leveling device based on image processing techniques and method - Google Patents

A kind of focusing leveling device based on image processing techniques and method Download PDF

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CN106292197A
CN106292197A CN201510270167.4A CN201510270167A CN106292197A CN 106292197 A CN106292197 A CN 106292197A CN 201510270167 A CN201510270167 A CN 201510270167A CN 106292197 A CN106292197 A CN 106292197A
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focusing
glass plate
leveling device
measured workpiece
image processing
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CN106292197B (en
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魏礼俊
陈飞彪
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Abstract

The present invention relates to a kind of focusing leveling device based on image processing techniques and method, this device includes the mask being arranged in order from top to bottom, projection objective, measured workpiece and carries the work stage of described measured workpiece, also include light source, the first reflecting mirror, projection slit, projection lens's group, the second reflecting mirror, imaging lens group, the 3rd reflecting mirror, the 4th reflecting mirror, imaging len, detection slit and the photodetector being arranged in order along paths direction, between described projection slit and measured workpiece, be additionally provided with rotatable glass plate.The present invention utilizes glass plate to rotate the measurement facula position moving horizontally measured workpiece surface, finds the alternative site that completely or can partly measure tested region height measured value, thus extrapolates tested region height measured value.The present invention can be effectively improved certainty of measurement and the Technological adaptability of focusing leveling device, and then improves finished product yield.

Description

A kind of focusing leveling device based on image processing techniques and method
Technical field
The present invention relates to lithographic equipment field, particularly relate to a kind of focusing leveling device based on image processing techniques And method.
Background technology
Projection mask aligner's (or claiming projection lithography apparatus) is that by projection objective, the pattern on mask is projected to work The device on part surface.In projection lithography apparatus, it is necessary to have device for automatically focusing and leveling to guide work stage by workpiece Surface is moved precisely to the exposure position specified.Existing focusing leveling device based on image processing techniques Physical arrangement is as it is shown in figure 1, pattern on mask 10 projects to work stage 31 by projection objective 20 carries Measured workpiece 30 surface, wherein, the light that light source 40 sends sequentially passes through the first reflecting mirror 41, projection slit 50, organize camera lens 62 after organizing camera lens the 61, second reflecting mirror 60 and projection lens's group before projection lens's group and expose to tested Workpiece 30 surface, organizes camera lens the 71, the 3rd reflecting mirror after measured workpiece 30 reflects after the most imaged mirror group 70, camera lens the 72, the 4th reflecting mirror 81, imaging len 82 and detection slit 80 are organized before imaging lens group, finally Imaging on photodetector 90.When adjusting upper surface location and the projection objective 20 of measured workpiece 30 When good focal plane position (in Fig. 1 shown in measured workpiece 30 upper horizontal dotted line) overlaps, measured workpiece 30 Reflection opticpath as shown in dotted line in 1 figure, projection slit 50 imaging on photodetector 90;When tested When the height tolerance of the upper surface location of workpiece 30 and the optimal focal plane position of projection objective 20 is Δ H, projection Slit 50 imaging on photodetector 90 at the position change Δ e of Z-direction is:
Δ e=2 β 1 β 2 Δ H sin φ (1-1)
In formula (1-1), β 1 is that imaging lens group (organizes group after camera lens 72 and imaging lens group before including imaging lens group Camera lens 71) amplification, β 2 is the amplification of imaging len 82, and Ф is that light beam is on measured workpiece 30 Angle of incidence.
Existing focusing leveling device based on image processing techniques is according to hot spot position on photodetector 90 Putting change and draw the defocusing amount on measured workpiece 30 surface, general employing many facula measurements scheme is to increase unit quilt Survey area, improve certainty of measurement and efficiency.For increasing Technological adaptability, reducing measured workpiece under large area hot spot The impact that measured workpiece 30 surface defocusing amount is measured by 30 surface reflectivity inhomogeneities, typically by single hot spot Split into many sub-hot spots to measure, utilize average effect to improve certainty of measurement further.Below with many hot spots Some hot spot as a example by this hot spot is split into 3 sub-hot spots in measurement scheme, describes existing based on figure Measurement process as treatment technology focusing leveling device.
Fig. 2 A, 2B, 2C show most of operating mode of measured workpiece 30, i.e. 3 sub-hot spots (p1, p2, All being reflected when p3) being irradiated to measured workpiece 30 surface, imaging on photodetector 90, through successive image 3 gray scale crests (q1, q2, q3) are drawn, according to each gray scale after suppression noise, filtering, digital processing The width of crest and the location of pixels in entire image thereof, and the parameter such as gray scale corrugation pitch can calculate The defocusing amount on measured workpiece 30 surface that whole hot spot is corresponding.But under the small part operating mode of measured workpiece 30, When particularly measured workpiece 30 is technique sheet, measured surface groove is more, relatively deep, such as Fig. 2 D, 2E, 2F Shown in, the reflection light of sub-hot spot has and is partially or completely blocked, and on photodetector 90, imaging is just Imperfect, then after successive image suppression noise, filtering, digital processing, show that gray scale crest is the most imperfect, very To there is no gray scale peak value.It addition, at the marginal position of measured workpiece 30, because the factors such as processing technique cause table Face is irregular, as shown in Fig. 2 G, 2H, 2I, 2J, 2K, again such that the reflected beam portion of sub-hot spot is even All lose, cause gray scale crest imperfect.Ultimately result in and can not record complete tested region height measured value.
Summary of the invention
The present invention provides a kind of focusing leveling device based on image processing techniques and method, to solve above-mentioned technology Problem.
For solving above-mentioned technical problem, the present invention provides a kind of focusing leveling device based on image processing techniques, Including the mask being arranged in order from top to bottom, projection objective, measured workpiece and the work carrying described measured workpiece Part platform, the light source also including being arranged in order along paths direction, the first reflecting mirror, projection slit, projection lens Group, the second reflecting mirror, imaging lens group, the 3rd reflecting mirror, the 4th reflecting mirror, imaging len, detection slit with And photodetector, it is additionally provided with optical path-deflecting device between described projection slit and measured workpiece, as rotatable Glass plate, other optical elements such as prism that maybe can carry out optical path-deflecting.
It is connected it is preferred that described glass plate is fixing with the drive end of motor, drives described glass plate around X Direction of principal axis rotates.
The present invention also provides for a kind of focusing and leveling method based on image processing techniques, is applied to above-mentioned focusing and adjusts In leveling device, comprise the steps:
S100: pretreatment, determines slewing area and the step pitch of described glass plate;
S200: measurement processing, 3 the sub-light spot images obtained according to described photodetector, calculate vertical survey Value.
It is preferred that in step S100, the slewing area of described glass plate and the vertical survey of focusing leveling device Weight range matches.
It is preferred that the slewing area of described glass plate is maximum by local gash depth in every batch of measured workpiece or The measured workpiece actual measurement of gradient maximum determines.
It is preferred that the specifically comprising the following steps that of measurement processing
S210: if 3 sub-light spot images that described photodetector obtains obtain 3 gray scales after subsequent treatment Crest, the most vertical measured value Δ e is:
Δ e=2 β 1 β 2 Δ H sin φ,
In above formula, β 1 is the amplification of imaging lens group, and β 2 is the amplification of imaging len, and Ф is that light beam exists Angle of incidence on measured workpiece;
S221: if 3 sub-light spot images that described photodetector obtains obtain 0~2 ash after subsequent treatment Degree crest, then control described glass plate by step pitch in the slewing area of glass plate and rotate, if finally can Obtain 3 gray scale crests, the most vertical measured value ZiFor:
Zi=Zi-1+(Z′i-Z0)+Δoffset, wherein, Δoffset=Lyi*ΔRxi-Lxi*ΔRyi,
In above formula, Zi-1For not rotating focusing leveling device measured value last time before glass plate, Z 'iFor rotating glass Flat board this measured value of back focusing levelling device, Z0It is in original position θ for glass plate0Time focusing leveling device Measured value, ΔoffsetFor moving horizontally the vertical side-play amount drawn with measured workpiece face type, Δ Rx because of hot spoti、ΔRyi For focusing leveling device this with last time measured value difference, Lxi、LyiBe respectively focusing leveling device this with upper Secondary X, the difference of Y-direction coordinate figure;
S222: if after glass plate rotates, obtaining 1 or 2 gray scale crest, the most vertical measured value ZiFor:
Zi=Zi-1offset, wherein, Δoffset=Lyi*ΔRxi-1-Lxi*ΔRyi-1,
In above formula, Zi-1For not rotating focusing leveling device measured value last time before glass plate, ΔoffsetFor because of hot spot Move horizontally the vertical side-play amount drawn with measured workpiece face type, Δ Rxi-1、ΔRyi-1For on focusing leveling device two The difference of secondary measured value, Lxi、LyiBe respectively focusing leveling device this with last time X, the difference of Y-direction coordinate figure;
S223: if after glass plate rotates, can not get gray scale crest all the time, then this measured workpiece is not in this focusing In the measurable range of levelling device.
It is preferred that in every incomplete position of sub-light spot image, by focusing leveling device measurable range by Step increases step pitch, the most forward and reverse rotation glass plate.
Compared with prior art, the present invention provide a kind of based on image processing techniques focusing leveling device and side Method, this device includes the mask being arranged in order from top to bottom, projection objective, measured workpiece and carries described quilt Survey workpiece work stage, also include the light source being arranged in order along paths direction, the first reflecting mirror, project narrow Seam, projection lens's group, the second reflecting mirror, imaging lens group, the 3rd reflecting mirror, the 4th reflecting mirror, imaging len, Detection slit and photodetector, be additionally provided with rotatable glass and put down between described projection slit and measured workpiece Plate.The present invention utilizes glass plate to rotate the measurement facula position moving horizontally on measured workpiece surface, finds Completely or can partly measure the alternative site of tested region height measured value, thus extrapolate tested region height Measured value.The present invention can be effectively improved certainty of measurement and the Technological adaptability of focusing leveling device, and then improves into Product yield.
Accompanying drawing explanation
Fig. 1 is existing focusing leveling device based on image processing techniques and the structural representation of method;
Fig. 2 A~2K is existing Test Cycle schematic diagram based on image processing techniques focusing leveling device;
Fig. 3 is that the structure of the focusing leveling device based on image processing techniques of the embodiment of the invention is shown It is intended to;
Fig. 4 is the process effect of the focusing leveling device based on image processing techniques of the embodiment of the invention Really schematic diagram;
Fig. 5 A~5J is the measurement based on image processing techniques focusing leveling device of invention one detailed description of the invention Operating mode schematic diagram;
Fig. 6 is the pretreatment process based on image processing techniques focusing and leveling method of invention one detailed description of the invention Schematic diagram;
Fig. 7 is the measurement processing stream based on image processing techniques focusing and leveling method of invention one detailed description of the invention Journey schematic diagram.
In Fig. 1: 10-mask, 20-projection objective, 30-measured workpiece, 31-work stage, 40-light source, 41- Camera lens, 62-projection lens is organized before first reflecting mirror, 50-projection slit, 60-the second reflecting mirror, 61-projection lens group Camera lens, 80-is organized before organizing camera lens, 72-imaging lens group after organizing camera lens, 70-the 3rd reflecting mirror, 71-imaging lens group after group Detection slit, 81-the 4th reflecting mirror, 82-imaging len, 90-photodetector;
In Fig. 3 and Fig. 4: 110-mask, 120-projection objective, 130-measured workpiece, 140-work stage;
210-light source, 220-the first reflecting mirror, 230-projection slit, 240-the second reflecting mirror, 251-projection lens group Camera lens is organized after front group of camera lens, 252-projection lens group;
Organize after 310-the 3rd reflecting mirror, 321-imaging lens group and organize camera lens, 330-the before camera lens, 322-imaging lens group Four reflecting mirrors, 340-imaging len, 350-detect slit, 360-photodetector;
410-glass plate, 411-motor.
Detailed description of the invention
For the technical scheme of more detailed statement foregoing invention, it is exemplified below specific embodiment and proves skill Art effect;It is emphasized that these embodiments are for illustrating that the present invention is not limited to limit the scope of the present invention.
The present invention provide a kind of based on image processing techniques focusing leveling device, as it is shown on figure 3, include from The mask 110, projection objective 120, the measured workpiece 130 that are arranged in order down and carry described tested work The work stage 140 of part 130, also includes light source the 210, first reflecting mirror being arranged in order along paths direction 220, projection slit 230, projection lens's group, the second reflecting mirror 240, imaging lens group, the 3rd reflecting mirror 310, 4th reflecting mirror 330, imaging len 340, detection slit 350 and photodetector 360, described projection is narrow It is additionally provided with rotatable glass plate 410 between seam 230 and measured workpiece 130.Specifically, on mask 110 Pattern by projection objective 120 project to work stage 140 carrying measured workpiece 130 surface, light source 210 The light sent organizes camera lens 251, second before sequentially passing through the first reflecting mirror 220, projection slit 230, projection lens's group Organize camera lens 252 after reflecting mirror 240 and projection lens's group and expose to measured workpiece 130 surface, through measured workpiece 130 Organize after the most imaged mirror group after reflection organize before camera lens the 321, the 3rd reflecting mirror 310, imaging lens group camera lens 322, 4th reflecting mirror 330, imaging len 340 and detection slit 350, finally become on photodetector 360 Picture.The present invention is by increasing rotatable glass plate between described projection slit 230 and measured workpiece 130 410, specifically, described glass plate 410 can be arranged on projection slit 230 and organize camera lens before projection lens's group Between 251 (as shown in Figure 3 and Figure 4), it is also possible to before being arranged on projection lens's group, organize camera lens 251 and the second reflection Organize between mirror 240, after the second reflecting mirror 240 and projection lens's group and between camera lens 252 or after projection lens's group, organize mirror Between 252 and the incidence point of measured workpiece 130, as long as enabling to measure hot spot to do level at measured surface Move.It is connected it is preferred that described glass plate 410 is fixing with the drive end of motor 411, drives described Glass plate 410 rotates in X-direction, say, that under the dragging of motor 411, described glass plate 410 can in figure 3 shown in around X-direction, at [-θmaxmaxRotate around its center point in the range of].
Please emphasis with reference to Fig. 3, if moving to the optimal of projection objective 120 by vertical for the surface of measured workpiece 130 Focal plane position (in Fig. 3 shown in measured workpiece 130 upper horizontal dotted line), by optimal for projection objective 120 burnt Plan-position is as focusing leveling device vertical measurement target location, in other words, measures hot spot at measured surface Move horizontally the vertical movement being equivalent to focusing leveling device vertical measurement target location.It is to say, glass The rotation of flat board 410 have adjusted focusing leveling device vertical measurement target location, and, glass plate 410 Amount of spin and focusing leveling device vertical measurement target location adjustment amount are between the two in one-to-one relationship.Specifically Ground, as shown in Figure 4, the slewing area [-θ of described glass plate 410maxmax] depend on focusing leveling device Vertical measurement scope, i.e. the rotation of glass plate 410 can not be beyond the vertical measurement model of focusing leveling device Enclose.It addition, rotate after glass plate 410, focusing leveling device vertical measurement target location be adjusted to new position, The vertical measurement scope of focusing leveling device is unaffected, say, that rotate that glass plate 410 changes only It it is the datum mark position of focusing leveling device.
The present invention also provides for a kind of focusing and leveling method based on image processing techniques, is applied to above-mentioned focusing and adjusts In leveling device, comprise the steps:
S100: pretreatment, determines slewing area and the step pitch of described glass plate 410, it is preferred that described glass The slewing area of glass flat board 410 matches with the vertical measurement scope of focusing leveling device, specifically, and described glass The slewing area of glass flat board 410 is maximum or gradient maximum by local gash depth in every batch of measured workpiece 130 Measured workpiece 130 actual measurement determines.In engineer applied, in order to reduce the number of revolutions of glass plate 410, increasing Big production capacity, the slewing area of glass plate 410 can be further with local ditch groove depth in every batch of measured workpiece 130 The workpiece actual measurement of degree maximum (as shown in Figure 2 F) or the gradient maximum (as shown in figure 2k) determines, after determining Slewing area can make suitable nargin processing and amplifying in the range of the vertical measurement of focusing leveling device, finally further according to Capacity requirements selects optimized rotation step pitch.
The process of pretreatment is explained in detail below, asks emphasis reference Fig. 6, at the workpiece producing a collection of same size in batches Before,
First, wherein local gash depth maximum (as shown in Figure 2 F) or the gradient are uploaded maximum (such as Fig. 2 K institute Show) workpiece;Then original position θ of glass plate 410 is set0(being typically 0);Workpiece motion s is arrived Work stage 140 center, performs overall situation Levelling operation;By measuring trajectory planning motion measured workpiece 130, read Starting altitude value Z that hot spot records0
Record each exposure field horizontal position coordinate (X, Y), check that each exposure field is interior with CCD as representative The image of photodetector 360;
Every incomplete position of sub-light spot image, incrementally increase step by focusing leveling device measurable range Away from, the most forward and reverse rotation glass plate 410, if complete at the sub-light spot image in 3, a certain position, Then record now glass plate 410 rotates forward number of times i or negative sense number of revolutions j;If filled at focusing and leveling Put and only have 2 or the complete position of 1 sub-light spot image in measurable range, then record occur first 2 or What 1 sub-light spot image completely located glass plate 410 rotates forward number of times i or negative sense number of revolutions j;If All the time the position that any 1 sub-light spot image is complete is can not find, then to whole in focusing leveling device measurable range Machine reports an error " without effective facula measurement value ", is downloaded workpiece by complete machine, is analyzed reason;
After bottom sheet, by the maximum of i, j and suitable nargin scope, complete machine capacity requirements, choose glass plate Optimization the slewing area [-θ of 410maxmax] and rotate step pitch θstep
S200: measurement processing, 3 the sub-light spot images obtained according to described photodetector 360, calculate and hang down To measured value.
It is preferred that the step of measurement processing is as follows:
S210: if 3 sub-light spot images that described photodetector 360 obtains obtain 3 after subsequent treatment Gray scale crest, namely under most of operating mode of the measured workpiece 130 shown in Fig. 2 A, 2B, 2C, the present invention The measurement process provided is identical with existing measurement process based on image processing techniques focusing leveling device, The most vertical measured value Δ e is:
Δ e=2 β 1 β 2 Δ H sin φ (1-1)
In formula (1-1), β 1 is that imaging lens group (organizes group before camera lens 321 and imaging lens group after including imaging lens group Camera lens 322) amplification, β 2 is the amplification of imaging len 340, and Ф is that light beam is at measured workpiece 130 On angle of incidence;
S221: if 3 sub-light spot images that described photodetector 360 obtains obtain 0~2 after subsequent treatment Individual gray scale crest, namely under the operating mode shown in Fig. 2 D~2K, then in the slewing area of glass plate 410 Control described glass plate 410 by step pitch to rotate, hot spot is carried out horizontal translation, if in its rotatable scope In can situation as shown in Fig. 5 A, 5B, 5F or 5G, it may be assumed that 3 sub-hot spots can be arrived and the most not hidden The position of gear, finally gives 3 gray scale crests (being i.e. changed into the operating mode shown in Fig. 2 D~2K), the most now hangs down To measured value ZiFor:
Zi=Zi-1+(Z′i-Z0)+Δoffset,
Δoffset=Lyi*ΔRxi-Lxi*ΔRyi (1-2)
In formula (1-2), Zi-1For not rotating focusing leveling device measured value last time before glass plate 410, Z 'iFor Rotate glass plate 410 this measured value of back focusing levelling device, Z0It is in original position for glass plate 410 θ0Focusing leveling device measured value time (being typically 0), ΔoffsetFor moving horizontally and measured workpiece 130 because of hot spot The vertical side-play amount that face type draws, Δ Rxi、ΔRyiFor focusing leveling device this with last time measured value (initial value Can by the overall situation focusing and leveling result be configured) difference, Lxi、LyiBe respectively focusing leveling device this with Last time X, the difference (i.e. this displacement) of Y-direction coordinate figure;
S222: if after glass plate 410 rotates in movable range, obtain 1 or 2 gray scale crest, change sentence Talk about, be only capable of the situation as shown in Fig. 5 C, 5D, 5H or 5I, it may be assumed that be most in certain or some positions Only have 1 or 2 sub-hot spots are not blocked, the most vertical measured value ZiFor:
Zi=Zi-1offset,
Δoffset=Lyi*ΔRxi-1-Lxi*ΔRyi-1 (1-3)
In formula (1-3), Zi-1For not rotating focusing leveling device measured value last time before glass 410 flat board, Δoffset For moving horizontally the vertical side-play amount drawn with 130 types of measured workpiece, Δ Rx because of hot spoti-1、ΔRyi-1For focusing The difference of twice measured value (initial value can be configured by overall situation focusing and leveling result), Lx on levelling devicei、 LyiBe respectively focusing leveling device this with last time X, the difference (i.e. this displacement) of Y-direction coordinate figure;
S223: if after glass plate 410 rotates, can not get gray scale crest all the time, in other words, as Fig. 5 E, Shown in 5J, glass plate 410 rotatable in the range of can not find the position that sub-hot spot is not blocked all the time, then This measured workpiece 130 is not in the measurable range of this focusing leveling device, say, that measured workpiece 130 Surface grooves dense degree, the degree of depth or degree of irregularity, should beyond the measurable range of focusing leveling device Find measurement scheme separately or measured workpiece 130 is re-started surface process.
The process of measurement processing being explained in detail below, asks emphasis with reference to Fig. 7, complete machine is uploaded workpiece, is then arranged glass Original position θ of flat board 4100After (being typically 0), by workpiece motion s to work stage 140 center, perform Overall situation Levelling operation, then presses trajectory planning travelling workpiece platform 140, checks the photodetector that CCD is representative The image of 360, if the image of 3 sub-hot spots is complete, then reads the height value Z that hot spot records, after carrying out The operations such as continuous alignment, exposure, then proceed to by trajectory planning travelling workpiece platform 140, and circulation performs aforesaid operations, Until end exposure, download workpiece;
If the image of 3 sub-hot spots is imperfect, then according to exposure field horizontal position coordinate (X, Y) with pre- The glass plate 410 corresponding with exposure field horizontal level of processing procedure record rotates forward number of times i or negative sense Number of revolutions j rotates glass plate 410, then checks the image of photodetector 360 that CCD is representative: as Really the image of 3 sub-hot spots is complete, then read the height value Z that now hot spot recordsi', then push away by formula (1-2) Calculate current 3 sub-light spot image imperfect position height values Z', then carry out the operations such as follow-up alignment, exposure, Being further continued for by trajectory planning travelling workpiece platform 140, circulation performs aforesaid operations, until end exposure, downloads work Part;
If only the image of 1 or 2 sub-hot spot is complete, then calculates by formula (1-3) and calculate current 3 Sub-light spot image imperfect position height value Z';
Image without sub-hot spot is complete, then with glass plate 410 current location θiBased on, at [θimax] (forward) or [-θmaxi] in the range of (reversely), continue to press θstepRotate glass plate 410, if looked for all the time The position the most complete less than 3 sub-light spot images, then report an error to complete machine: does not has effective facula measurement value, by Complete machine is downloaded workpiece, is analyzed reason.
In sum, the present invention seriously, partly or entirely measures hot spot in measured workpiece 130 local surfaces deformation When can not record complete tested region height measured value, glass plate 410 rotation is utilized to move horizontally tested Measurement facula position on workpiece 130 surface, finds and can go out the replacement of tested region height measured value by perfect measurement Position, thus extrapolate tested region height measured value.The focusing based on image processing techniques that the present invention provides The severe technique sheets such as TSV can be measured by levelling device and method.
Obviously, those skilled in the art can carry out various change and modification without deviating from the present invention to invention Spirit and scope.So, if the present invention these amendment and modification belong to the claims in the present invention and Within the scope of equivalent technologies, then the present invention is also intended to change and including modification include these.

Claims (8)

1. a focusing leveling device based on image processing techniques, including the mask being arranged in order from top to bottom, Projection objective, measured workpiece and carry the work stage of described measured workpiece, also include depending on along paths direction The light source of secondary arrangement, the first reflecting mirror, projection slit, projection lens's group, the second reflecting mirror, imaging lens group, Three reflecting mirrors, the 4th reflecting mirror, imaging len, detection slit and photodetector, it is characterised in that institute State and between projection slit and measured workpiece, be additionally provided with optical path-deflecting device.
A kind of focusing leveling device based on image processing techniques, it is characterised in that Described optical path-deflecting device is rotatable glass plate.
A kind of focusing leveling device based on image processing techniques, it is characterised in that Described glass plate is fixing with the drive end of motor to be connected, and drives described glass plate rotating around X-direction.
4. a focusing and leveling method based on image processing techniques, is applied to such as claim 1 or 2 or 3 institute In the focusing leveling device stated, it is characterised in that comprise the steps:
S100: pretreatment, determines slewing area and the step pitch of glass plate;
S200: measurement processing, 3 the sub-light spot images obtained according to described photodetector, calculate vertical survey Value.
A kind of focusing and leveling method based on image processing techniques, it is characterised in that In step S100, the slewing area of described glass plate matches with the vertical measurement scope of focusing leveling device.
A kind of focusing and leveling method based on image processing techniques, it is characterised in that The slewing area of described glass plate is maximum or gradient maximum by local gash depth in every batch of measured workpiece Measured workpiece actual measurement determines.
A kind of focusing and leveling method based on image processing techniques, it is characterised in that Specifically comprising the following steps that of measurement processing
S210: if 3 sub-light spot images that described photodetector obtains obtain 3 gray scales after subsequent treatment Crest, the most vertical measured value Δ e is:
Δ e=2 β 1 β 2 Δ H sin φ,
In above formula, β 1 is the amplification of imaging lens group, and β 2 is the amplification of imaging len, and Ф is that light beam exists Angle of incidence on measured workpiece;
S221: if 3 sub-light spot images that described photodetector obtains obtain 0~2 ash after subsequent treatment Degree crest, then control described glass plate by step pitch in the slewing area of glass plate and rotate, if finally can Obtain 3 gray scale crests, the most vertical measured value ZiFor:
Zi=Zi-1+(Z′i-Z0)+Δoffset, wherein, Δoffset=Lyi*ΔRxi-Lxi*ΔRyi,
In above formula, Zi-1For not rotating focusing leveling device measured value last time before glass plate, Z 'iFor rotating glass Flat board this measured value of back focusing levelling device, Z0It is in original position θ for glass plate0Time focusing leveling device Measured value, ΔoffsetFor moving horizontally the vertical side-play amount drawn with measured workpiece face type, Δ Rx because of hot spoti、ΔRyi For focusing leveling device this with last time measured value difference, Lxi、LyiBe respectively focusing leveling device this with upper Secondary X, the difference of Y-direction coordinate figure;
S222: if after glass plate rotates, obtaining 1 or 2 gray scale crest, the most vertical measured value ZiFor:
Zi=Zi-1offset, wherein, Δoffset=Lyi*ΔRxi-1-Lxi*ΔRyi-1,
In above formula, Zi-1For not rotating focusing leveling device measured value last time before glass plate, ΔoffsetFor because of hot spot Move horizontally the vertical side-play amount drawn with measured workpiece face type, Δ Rxi-1、ΔRyi-1For on focusing leveling device two The difference of secondary measured value, Lxi、LyiBe respectively focusing leveling device this with last time X, the difference of Y-direction coordinate figure;
S223: if after glass plate rotates, can not get gray scale crest all the time, then this measured workpiece is not in this focusing In the measurable range of levelling device.
A kind of focusing and leveling method based on image processing techniques, it is characterised in that Every incomplete position of sub-light spot image, incrementally increase step pitch by focusing leveling device measurable range, Alternately forward and reverse rotation glass plate.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109297940A (en) * 2018-09-06 2019-02-01 中国科学院沈阳自动化研究所 One kind laser defocusing amount self-checking device and its adjusting method under micro-meter scale
CN109426093A (en) * 2017-08-31 2019-03-05 上海微电子装备(集团)股份有限公司 A kind of focusing-levelling detection device
CN110057839A (en) * 2019-04-18 2019-07-26 中国科学院微电子研究所 Focusing control apparatus and method in a kind of Optical silicon wafer detection system
CN113256630A (en) * 2021-07-06 2021-08-13 深圳中科飞测科技股份有限公司 Light spot monitoring method and system, dark field defect detection equipment and storage medium

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101169601A (en) * 2007-11-21 2008-04-30 上海微电子装备有限公司 Focusing leveling measuring system
CN101201546A (en) * 2007-11-28 2008-06-18 上海微电子装备有限公司 Device for automatically focusing and leveling
CN101344727A (en) * 2008-06-26 2009-01-14 上海微电子装备有限公司 Focusing and leveling detection device and method
CN101344734A (en) * 2007-12-28 2009-01-14 上海微电子装备有限公司 Silicon slice focusing and leveling measurement device
CN102768469A (en) * 2011-05-03 2012-11-07 上海微电子装备有限公司 Focusing and bisecting system and adjustment method thereof
CN103838088A (en) * 2012-11-23 2014-06-04 上海微电子装备有限公司 Focusing and levelling device and method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101169601A (en) * 2007-11-21 2008-04-30 上海微电子装备有限公司 Focusing leveling measuring system
CN101201546A (en) * 2007-11-28 2008-06-18 上海微电子装备有限公司 Device for automatically focusing and leveling
CN101344734A (en) * 2007-12-28 2009-01-14 上海微电子装备有限公司 Silicon slice focusing and leveling measurement device
CN101344727A (en) * 2008-06-26 2009-01-14 上海微电子装备有限公司 Focusing and leveling detection device and method
CN102768469A (en) * 2011-05-03 2012-11-07 上海微电子装备有限公司 Focusing and bisecting system and adjustment method thereof
CN103838088A (en) * 2012-11-23 2014-06-04 上海微电子装备有限公司 Focusing and levelling device and method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109426093A (en) * 2017-08-31 2019-03-05 上海微电子装备(集团)股份有限公司 A kind of focusing-levelling detection device
CN109426093B (en) * 2017-08-31 2020-12-11 上海微电子装备(集团)股份有限公司 Focusing and leveling detection device
CN109297940A (en) * 2018-09-06 2019-02-01 中国科学院沈阳自动化研究所 One kind laser defocusing amount self-checking device and its adjusting method under micro-meter scale
CN110057839A (en) * 2019-04-18 2019-07-26 中国科学院微电子研究所 Focusing control apparatus and method in a kind of Optical silicon wafer detection system
CN113256630A (en) * 2021-07-06 2021-08-13 深圳中科飞测科技股份有限公司 Light spot monitoring method and system, dark field defect detection equipment and storage medium

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