CN106283142B - A kind of processing method for improving Brush Plating anchoring strength of coating - Google Patents
A kind of processing method for improving Brush Plating anchoring strength of coating Download PDFInfo
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- CN106283142B CN106283142B CN201610839417.6A CN201610839417A CN106283142B CN 106283142 B CN106283142 B CN 106283142B CN 201610839417 A CN201610839417 A CN 201610839417A CN 106283142 B CN106283142 B CN 106283142B
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- brush plating
- low frequency
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
- C25D5/06—Brush or pad plating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
The invention discloses a kind of processing methods for improving Brush Plating anchoring strength of coating, part after Brush Plating is placed in 85 DEG C~75 DEG C of container, the container is placed in low frequency composite pulse magnetic field, electric current is applied to handle the part after the Brush Plating with intermittent mode for the container that is placed in the low frequency composite pulse magnetic field.The processing method provided by the invention for improving Brush Plating anchoring strength of coating, it is simple for process, it is easy to operate, the bond strength of brush plating coating and matrix can be improved.
Description
Technical field
The present invention relates to a kind of processing methods for improving Brush Plating anchoring strength of coating.
Background technology
Brush Plating is the process for obtaining coating in workpiece surface with electrolytic method, is mainly used in improvement and reinforced metal material
Expect the surface nature of workpiece, be allowed to obtain one or several kinds of performances of wear-resistant, corrosion-resistant, anti-oxidant, high temperature resistant etc..
In terms of repair of machine and maintenance, Brush Plating is widely used in reparation because of honing failure, fatigue failure, corrosion failure
And the component of machine scrapped, restore its original dimensional accuracy, with maintenance cycle is short, expense is low, the machinery zero after reparation
The features such as component service life is long, it is particularly more notable to large-scale and expensive machines parts reparation economic benefit.It is applying
Basis material is the optimised process for repairing surface of workpiece failure without deformation, coating even compact during plating.
Resisting Property of Brush Electroplating Coating metal and the solid that parent metal is typically all different chemical composition, on their interface, plating
Layer atom is all with some matrix atoms according to the lattice of certain rule composition certain forms.These atoms are simply piled up by no means
Together, between atom there is strong interaction, such active force becomes chemical bond, the atom in metallic crystal with from
Metallic bond is become by the chemical bond that electron institute is formed.The intensity of metal bonding is decided by the crystal lattices and crystal face at two kinds of interfaces
Matter and coat binding strength then depend primarily on the intensity of bonding, thus cause brush plating coating generally existing bond strength low,
Caducous shortcoming.
Invention content
In view of the deficiencies of the prior art, the purpose of the present invention is to provide a kind of places for improving Brush Plating anchoring strength of coating
Reason method can improve the bond strength of brush plating coating.
For the purpose of the present invention, technical solution provided by the invention is：
A kind of processing method for improving Brush Plating anchoring strength of coating, -85 DEG C~-75 DEG C are placed in by the part after Brush Plating
Container in, the container is placed in low frequency composite pulse magnetic field, for the institute being placed in the low frequency composite pulse magnetic field
It states container and electric current is applied to handle the part after the Brush Plating with intermittent mode.
In some embodiments wherein, the induction in the low frequency composite pulse magnetic field is 1~20T, and magnetic field is frequently
Rate is 10~60Hz, and the continuous pulse number that applies applies 10~1000A/cm of pulse current density to be continuous2, single pulse effect
Time is 0.1~10ms, and continuous input current umber of pulse is 10~20, and after being spaced 1~10S, it is close to input similary electric current again
Degree, same purpose time and same amount of current impulse.
In some embodiments wherein, place of the part in the low frequency composite pulse magnetic field after the Brush Plating
The reason time is 120~800s.
In some embodiments wherein, the low frequency pulsed magnetic fields are generated by two electromagnet, and two electromagnetism are ferromagnetic
Property it is opposite and they between there is spacing, the hump current strength of application is 20~50A, output magnetic induction intensity for 1~
20T, field frequency are 10~60Hz, and low-frequency pulse is with intermittently alternately, until entire processing procedure terminates.
Relative to scheme of the prior art, it is an advantage of the invention that：
1st, technical solution using the present invention, can improve brush plating coating after treatment by using the treatment method and the engagement of matrix is strong
Degree, while reduce the internal stress of brush plating coating；
2nd, technical solution using the present invention, does not need to be heat-treated, be surface-treated, and does not change the size of part, avoids
Influence to former parts size precision, can significantly improve the service life of part, and treatment effeciency is high and at low cost.
Specific embodiment
Said program is described further below in conjunction with specific embodiment.It should be understood that these embodiments are for illustrating
The present invention and be not limited to limit the scope of the invention.The implementation condition used in embodiment can be done according to the condition of specific producer
Further adjustment, the implementation condition being not specified is usually the condition in routine experiment.
Embodiment 1
Part after Brush Plating is placed in -78 DEG C of container, container is placed in low frequency composite pulse magnetic field, for putting
Electric current is applied to handle the part after Brush Plating, low frequency composite pulse with intermittent mode in the container in low frequency composite pulse magnetic field
The induction in magnetic field is 1T, field frequency 10Hz, continuously applies pulse current density 800A/cm2, when single pulse acts on
Between for 5ms, continuous input current umber of pulse is 15, after being spaced 3S, input again similary current density, the same purpose time and
Same amount of current impulse, processing time of the part in low frequency composite pulse magnetic field after Brush Plating is 120s.
Embodiment 2
Part after Brush Plating is placed in -80 DEG C of container, container is placed in low frequency composite pulse magnetic field, for putting
Electric current is applied to handle the part after Brush Plating, low frequency composite pulse with intermittent mode in the container in low frequency composite pulse magnetic field
The induction in magnetic field is 20T, field frequency 60Hz, continuously applies pulse current density 400A/cm2, single pulse effect
Time is 6ms, and continuous input current umber of pulse is 10, after being spaced 5S, inputs similary current density, same purpose time again
With same amount of current impulse, processing time of the part in low frequency composite pulse magnetic field after Brush Plating is 800s.
Embodiment 3
Part after Brush Plating is placed in -82 DEG C of container, container is placed in low frequency composite pulse magnetic field, for putting
Electric current is applied to handle the part after Brush Plating, low frequency composite pulse with intermittent mode in the container in low frequency composite pulse magnetic field
The induction in magnetic field is 10T, field frequency 30Hz, continuously applies pulse current density 600A/cm2, single pulse effect
Time is 6ms, and continuous input current umber of pulse is 12, after being spaced 5S, inputs similary current density, same purpose time again
With same amount of current impulse, processing time of the part in low frequency composite pulse magnetic field after Brush Plating is 500s.
Embodiment 4
Part after Brush Plating is placed in -76 DEG C of container, container is placed in low frequency composite pulse magnetic field, for putting
Electric current is applied to handle the part after Brush Plating, low frequency composite pulse with intermittent mode in the container in low frequency composite pulse magnetic field
The induction in magnetic field is 5T, field frequency 20Hz, continuously applies pulse current density 900A/cm2, when single pulse acts on
Between for 6ms, continuous input current umber of pulse is 15, after being spaced 8S, input again similary current density, the same purpose time and
Same amount of current impulse, processing time of the part in low frequency composite pulse magnetic field after Brush Plating is 300s.
Embodiment 5
Part after Brush Plating is placed in -80 DEG C of container, container is placed in low frequency composite pulse magnetic field, for putting
Electric current is applied to handle the part after Brush Plating, low frequency composite pulse with intermittent mode in the container in low frequency composite pulse magnetic field
The induction in magnetic field is 15T, field frequency 50Hz, continuously applies pulse current density 700A/cm2, single pulse effect
Time is 9ms, and continuous input current umber of pulse is 18, after being spaced 6S, inputs similary current density, same purpose time again
With same amount of current impulse, processing time of the part in low frequency composite pulse magnetic field after Brush Plating is 700s.
Embodiment 6
Part after Brush Plating is placed in -81 DEG C of container, container is placed in low frequency composite pulse magnetic field, for putting
Electric current is applied to handle the part after Brush Plating, low frequency composite pulse with intermittent mode in the container in low frequency composite pulse magnetic field
The induction in magnetic field is 3T, field frequency 15Hz, continuously applies pulse current density 500A/cm2, when single pulse acts on
Between for 6ms, continuous input current umber of pulse is 12, after being spaced 4S, input again similary current density, the same purpose time and
Same amount of current impulse, processing time of the part in low frequency composite pulse magnetic field after Brush Plating is 200s.
Embodiment 7
Part after Brush Plating is placed in -80 DEG C of container, container is placed in low frequency composite pulse magnetic field, for putting
Electric current is applied to handle the part after Brush Plating, low frequency composite pulse with intermittent mode in the container in low frequency composite pulse magnetic field
The induction in magnetic field is 9T, field frequency 18Hz, continuously applies pulse current density 600A/cm2, when single pulse acts on
Between for 5ms, continuous input current umber of pulse is 15, after being spaced 8S, input again similary current density, the same purpose time and
Same amount of current impulse, processing time of the part in low frequency composite pulse magnetic field after Brush Plating is 300s.
Embodiment 8
Part after Brush Plating is placed in -79 DEG C of container, container is placed in low frequency composite pulse magnetic field, for putting
Electric current is applied to handle the part after Brush Plating, low frequency composite pulse with intermittent mode in the container in low frequency composite pulse magnetic field
The induction in magnetic field is 18T, field frequency 52Hz, continuously applies pulse current density 600A/cm2, single pulse effect
Time is 7ms, and continuous input current umber of pulse is 12, after being spaced 6S, inputs similary current density, same purpose time again
With same amount of current impulse, processing time of the part in low frequency composite pulse magnetic field after Brush Plating is 750s.
Embodiment 9
Part after Brush Plating is placed in -79 DEG C of container, container is placed in low frequency composite pulse magnetic field, for putting
Electric current is applied to handle the part after Brush Plating, low frequency composite pulse with intermittent mode in the container in low frequency composite pulse magnetic field
The induction in magnetic field is 12T, field frequency 45Hz, continuously applies pulse current density 1000A/cm2, single pulse effect
Time is 8ms, and continuous input current umber of pulse is 18, after being spaced 5S, inputs similary current density, same purpose time again
With same amount of current impulse, processing time of the part in low frequency composite pulse magnetic field after Brush Plating is 650s.
Embodiment 10
Part after Brush Plating is placed in -80 DEG C of container, container is placed in low frequency composite pulse magnetic field, for putting
Electric current is applied to handle the part after Brush Plating, low frequency composite pulse with intermittent mode in the container in low frequency composite pulse magnetic field
The induction in magnetic field is 16T, field frequency 20Hz, continuously applies pulse current density 800A/cm2, single pulse effect
Time is 8ms, and continuous input current umber of pulse is 13, after being spaced 6S, inputs similary current density, same purpose time again
With same amount of current impulse, processing time of the part in low frequency composite pulse magnetic field after Brush Plating is 500s.
(1) brush plating coating is tested with substrate combinating strength
The same batch of 20 Brush Plating parts produced using similary base material, similary electric brush plating liquor, same process.Wherein 10
Part is respectively through embodiment 1-10 processing, and in addition 10 parts are unprocessed, uses cupping machine, testing machine predetermined load
10KN presets load time 20s.As a result it is completely fallen off with coating as valid data, coating detection intensity.Testing result such as following table
1：
1 brush plating coating of table and substrate combinating strength (Mpa)
| Serial number | Untreated bond strength | Embodiment | Bond strength after processing |
| 1 | 32.2 | 1 | 75.1 |
| 2 | 35.9 | 2 | 78.3 |
| 3 | 40.2 | 3 | 82.2 |
| 4 | 38.3 | 4 | 83.3 |
| 5 | 35.4 | 5 | 79.4 |
| 6 | 36.6 | 6 | 76.2 |
| 7 | 37.1 | 7 | 80.1 |
| 8 | 35.8 | 8 | 80.5 |
| 9 | 37.4 | 9 | 76.3 |
| 10 | 36.3 | 10 | 72.2 |
| Untreated mean value | 36.52 | Mean value after processing | 78.36 |
The result shows that the bond strength of brush plating coating and matrix at least increases more than 40MPa after processing.
(2) brush plating coating internal stress is tested
10 difference in the same batch of Brush Plating part produced using similary base material, similary electric brush plating liquor, same process
Through embodiment 1-10 processing, internal stress detection is carried out using X-ray diffraction method.Front and rear respectively to take 3 points, nanometer homogenizes front and rear detection
Point it is close as possible.Inspection result such as the following table 2：
The brush plating coating internal stress variation (Mpa) before and after the processing of table 2
The result shows that brush plating coating internal stress generally improves more than 21% after processing.
The foregoing examples are merely illustrative of the technical concept and features of the invention, its object is to allow one skilled in the art
Present disclosure can be understood and implemented according to this, it is not intended to limit the scope of the present invention.It is all smart according to the present invention
The equivalent transformation or modification that refreshing essence is done, should be covered by the protection scope of the present invention.
Claims (3)
1. a kind of processing method for improving Brush Plating anchoring strength of coating, it is characterised in that：Part after Brush Plating is placed in -85
DEG C~-75 DEG C of container in, the container is placed in low frequency composite pulse magnetic field, for being placed in the low frequency composite pulse magnetic
The container in applies electric current to handle the part after the Brush Plating with intermittent mode；
The induction in the low frequency composite pulse magnetic field is 1~20T, and field frequency is 10~60Hz, continuous to apply pulse electricity
10~1000A/cm of current density2, single pulse action time is 0.1~10ms, and continuous input current umber of pulse is 10~20,
After being spaced 1~10S, similary current density, same purpose time and same amount of current impulse are inputted again.
2. the processing method according to claim 1 for improving Brush Plating anchoring strength of coating, it is characterised in that：The brush
Processing time of the part in the low frequency composite pulse magnetic field after plating is 120~800s.
3. the processing method according to claim 1 for improving Brush Plating anchoring strength of coating, it is characterised in that：The low frequency
Pulsed magnetic field is generated by two electromagnet, and two electromagnetism ferromagnetism have spacing, the hump electricity of application on the contrary and between them
Intensity of flow is 20~50A, and output magnetic induction intensity is 1~20T, and field frequency is 10~60Hz, and low-frequency pulse is intermittently to hand over
For progress, until entire processing procedure terminates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201610839417.6A CN106283142B (en) | 2016-09-22 | 2016-09-22 | A kind of processing method for improving Brush Plating anchoring strength of coating |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610839417.6A CN106283142B (en) | 2016-09-22 | 2016-09-22 | A kind of processing method for improving Brush Plating anchoring strength of coating |
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| CN106283142B true CN106283142B (en) | 2018-07-06 |
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| CN101202147B (en) * | 2007-11-08 | 2011-09-14 | 上海工程技术大学 | Addition magnetic field device for plating magnetic field brush |
| US8257572B2 (en) * | 2008-03-28 | 2012-09-04 | Tenaris Connections Limited | Method for electrochemical plating and marking of metals |
| RU2463391C2 (en) * | 2010-12-20 | 2012-10-10 | Государственное образовательное учреждение высшего профессионального образования Новгородский государственный университет имени Ярослава Мудрого | Method to apply double-layer coatings |
| CN102925937B (en) * | 2012-09-07 | 2015-07-01 | 上海大学 | Method and device for continuously preparing high-silicon steel ribbon under magnetic field |
| CN103726081A (en) * | 2014-01-22 | 2014-04-16 | 哈尔滨辰能工大环保科技股份有限公司 | Cyanide-free alkaline copper plating method for improving impermeable carbon copper film |
| CN105441991A (en) * | 2015-11-18 | 2016-03-30 | 刘博文 | Processing method for outer surface of steel sheet pile |
| CN105780074A (en) * | 2016-04-29 | 2016-07-20 | 南京晨光艺术工程有限公司 | Steel piece cyanide-free copper plating method adopting applied magnetic field |
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Effective date of registration: 20221129 Address after: 215000 No. 1202, Fuxin Road, yangshe Town, Zhangjiagang City, Suzhou City, Jiangsu Province Patentee after: ZHANGJIAGANG QINGYAN DETECTION TECHNOLOGY Co.,Ltd. Address before: 215600 Fuxin Road, Zhangjiagang economic and Technological Development Zone, Suzhou, Jiangsu 2 Patentee before: ZHANGJIAGANG QINGYAN REMANUFACTURING INDUSTRY RESEARCH INSTITUTE Co.,Ltd. |