CN106270436A - A kind of method improving the wide precision of crystallizer tune - Google Patents

Abstract

The present invention relates to the control field of conical degree of crystallizer and width, spy relates to a kind of method improving the wide precision of crystallizer tune.The present invention utilize current leptoprosopy copper plate of crystallizer absolute tapering Bi, upper rotating shaft, lower rotary shaft central point to length La of leptoprosopy copper plate of crystallizer, upper rotating shaft, lower rotary shaft central point to leptoprosopy copper plate of crystallizer top (bottom) upright projection length Lt (Lb), obtained by algorithm current upper rotating shaft, lower rotary shaft central point to the horizontal length of leptoprosopy copper plate of crystallizer, and compensate in the position setting value of rotating shaft, lower rotary shaft central point.This invention removes the air gap between green shell and strand during hot tune width, the stress making green shell bear is the lowest the most uniform, make crystallizer both sides adjust wide speed to bring up to the basis of maximum 200mm/min simultaneously, shorten the crystallizer hot width adjusting time, reduce the wedge shape base cutting waste because adjusting width to cause, have particularly important meaning to improving strand recovery rate with caster work rate.

Description

A kind of method improving the wide precision of crystallizer tune

Technical field

The present invention relates to the control field of conical degree of crystallizer and width, spy relates to a kind of crystallizer that improves and adjusts the side of wide precision Method.

Background technology

In metallurgical steel-making continuous casting industry, user is diversified to the demand of width of plate slab, it is therefore desirable to according to user The width of crystallizer is adjusted by demand.If using the way changing crystallizer to realize the width adjustment of slab, not only need Crystallizer quantity to be increased, and the time changing crystallizer is longer, affects productivity ratio and the benefit of steel mill.Therefore, for improving The working performance of conticaster, can meet again many specifications of each client, the demand of small lot batch manufacture simultaneously, needs in casting cycle Change width and the tapering of strand, i.e. realize crystallizer heat online and adjust width.And the hottest high velocity modulation width of crystallizer, can not reduce and draw Speed and carry out adjust width, thus significantly shorten the crystallizer hot width adjusting time, and reduce because of adjust width cause wedge shape base cutting Waste, thus productivity ratio and benefit can be greatly improved.The position setting value of the accurate upper and lower guiding mechanism of leptoprosopy is to ensure that crystallization The basic guarantee that the hottest high velocity modulation width of device is implemented smoothly.

Crystallizer width regulator mainly by width face, interior outer arc side copper coin, wide face copper coin clamping device, left and right sides narrow copper plate, Left and right sides narrow copper plate Width adjusting mechanisms etc. form, and the mainly left and right sides narrow copper plate width adjusting mechanism of wide feature is adjusted in impact, Its structure left and right sides is symmetrical.

Accompanying drawing Fig. 1 is right side narrow copper plate and right side Width adjusting mechanism schematic diagram.Critical piece by leptoprosopy copper plate of crystallizer, on Rotating shaft, lower rotary shaft, Width adjusting mechanism, position measurement element composition.

Hereinafter describing is all as a example by the leptoprosopy width adjusting mechanism of right side, and left side is similar to.

Definition:

Leptoprosopy crystallizer copper plate height is H；

Leptoprosopy copper plate of crystallizer is La with the vertical length of upper rotating shaft and lower rotary shaft central point；

With the upper spindle central point a length of Lt of upright projection above leptoprosopy copper plate of crystallizer；

With the lower rotary shaft a length of Lb of central point upright projection above leptoprosopy copper plate of crystallizer；

Above leptoprosopy copper plate of crystallizer, the horizontal length with strand centrage is WRti；

Below leptoprosopy copper plate of crystallizer, the horizontal length with strand centrage is WRbi；

Leptoprosopy copper plate of crystallizer absolute tapering Bi is WRti-WRbi

Strand centrage and leptoprosopy copper plate of crystallizer angle are θ.

Cross the central point horizontal extension line of rotating shaft and the named upper intersection point of intersection point in narrow copper plate face；

Cross the central point horizontal extension line of lower rotary shaft and the named lower intersection point of intersection point in narrow copper plate face；

Strand centrage is XRti with the horizontal length of upper spindle central point；

Strand centrage is XRbi with the horizontal length of lower rotary shaft central point；

Upper rotating shaft, the side of lower rotary shaft connect leptoprosopy copper plate of crystallizer respectively, and opposite side connects Width adjusting mechanism.Width adjusting mechanism Can be with horizontal extension, it drives upper rotating shaft, lower rotary shaft to move horizontally, thus drive narrow copper plate to move horizontally, narrow copper plate It is moved to the left, narrowed width；It moves right, and width broadens.By the movement of narrow copper plate, it is achieved crystallizer width adjustment merit Energy.Obviously, rotating shaft on narrow copper plate, lower rotary shaft central point horizontal level difference, the tapering of leptoprosopy copper plate of crystallizer also differs, By controlling upper rotating shaft, the relative position of lower rotary shaft central point level, it is achieved conical degree of crystallizer adjusts function.The slab produced is more Width, conical degree of crystallizer is the biggest, for static tapering；Adjusting wide speed the highest, conical degree of crystallizer is the biggest, for dynamic tapering.Position measurement Element measures upper rotating shaft, the movement position of lower rotary shaft central point.

Existing in crystallizer Width adjusting mechanism position setting value computational algorithm, do not consider that upper and lower intersection point is bored with narrow copper plate Degree is different and lower mobile thereon, it is believed that no matter how narrow copper plate tapering changes, upper rotating shaft, lower rotary shaft central point to upper Under () length of intersection point is always La, have ignored, actually rotating shaft, lower rotary shaft central point to the horizontal length of copper plate of crystallizer Can change along with tapering change, in the case of tapering is smaller, impact herein is smaller, but when taper ratio is bigger, Impact cannot have ignored.As being wider than in journey, when leptoprosopy conical degree of crystallizer is static in the execution the hottest high velocity modulation of crystallizer Several times even tens times, adjust wide speed the fastest, and tapering is the biggest, affects the biggest.In existing known technology or open source literature, And have no that the position of upper and lower intersection point changes the method affecting crystallizer Width adjusting mechanism position setting value with narrow copper plate tapering.

Such as Chinese invention patent " on-line continuous quickly adjusts the method that crystallizer width increases " (application number 201210080735.0) disclose based on the process of setting of high-temperature molten steel, from the solidification shrinkage of green shell, by crystallizer Width increases process and imports during on-line width adjustment, the control basis of the method still with conical degree of crystallizer and speed for for control Target, the wide speed of its tune can not be the highest.

Summary of the invention

For the deficiencies in the prior art, the invention provides a kind of method improving the wide precision of crystallizer tune.Present invention profit With current leptoprosopy copper plate of crystallizer absolute tapering Bi, upper rotating shaft, lower rotary shaft central point to leptoprosopy copper plate of crystallizer length La, Upper rotating shaft, lower rotary shaft central point to leptoprosopy copper plate of crystallizer top (bottom) upright projection length Lt (Lb), pass through algorithm Obtain current upper rotating shaft, lower rotary shaft central point to the horizontal length of leptoprosopy copper plate of crystallizer, and compensate rotating shaft, lower turn In the position setting value of axle central point.This invention removes the air gap between green shell and strand during hot tune width, make green shell hold The stress that is subject to is the lowest uniform again, i.e. effectively reduces risk and the casting blank defect incidence rate adjusting bleedout during width, makes crystallizer Both sides adjust wide speed to bring up to the basis of maximum 200mm/min simultaneously, thus can not reduce pulling rate and carry out adjusting width, significantly shorten knot The brilliant device hot width adjusting time, and reduce the wedge shape base cutting waste because adjusting width to cause, to improving strand recovery rate and casting machine Operating rate has particularly important meaning.

The technical scheme is that a kind of method improving the wide precision of crystallizer tune, it is characterised in that: include following step Suddenly,

Confirm the step of the value of cos θ and sin θ,

$cos\mathrm{\θ}=N/\stackrel{\‾}{(1-(Bi/H)L_{)}}:$

Sin θ=Bi/H；

Determine that the horizontal length of strand centrage and upper spindle central point is XRti and strand centrage and lower rotary shaft 2 center The step that horizontal length is XRbi of point；

XRti=La*cos θ+(H-Lt) * sin θ+WRbi；

XRbi=La*cos θ+Lb*sin θ+WRbi；

Control the motion of crystallizer Width adjusting mechanism, make the actual value XRti of rotating shaft, lower rotary shaft_Act=XRti, XRbi_Act= XRbi；

Wherein θ is strand centrage and leptoprosopy copper plate of crystallizer angle；Leptoprosopy crystallizer copper plate height is H；Front leptoprosopy is tied Brilliant device copper coin absolute tapering Bi；Leptoprosopy copper plate of crystallizer is La with the vertical length of upper rotating shaft and lower rotary shaft central point, and leptoprosopy is tied With the upper spindle central point a length of Lt of upright projection above brilliant device copper coin；Hang down with lower rotary shaft central point above leptoprosopy copper plate of crystallizer Deliver directly a length of Lb of shadow；Below leptoprosopy copper plate of crystallizer, the horizontal length with strand centrage is WRbi.

The method that wide precision adjusted by crystallizer is improved according to as above, it is characterised in that: also include validating that narrow copper plate Definitely tapering actual value Bi_ActWith narrow copper plate width actual value WRbi_Act,

Bi_Act=(XRti_Act-XRbi_Act)*H/(H-Lt-Lb)；

WRbi_Act=XRbi_Act-La*cosθ_Act-Lb*sinθ_Act。

The invention has the beneficial effects as follows:

(1) 1#, 2# model algorithm is applicable to the setting of the most definitely tapering.When crystallizer heat online is adjusted wide from being too narrow to width, Definitely setting value Bi of tapering is just, and it is negative for leniently arriving narrow, and sin θ=Bi/H is signed value, embodies this feature.Institute It is applicable to any situation with this method invented.

(2) 1#, 2# model algorithm considers the impact of absolute tapering, and model result is exact value, is not approximation.Cause For leptoprosopy tapering and width, adjust wide speed, current pulling rate relevant.When online crystallizer heat is adjusted wide, adjust wide speed the fastest, required The tapering wanted is the biggest.The method of the present invention, without approximate processing, is i.e. applicable to low velocity modulation width and is applied equally to high velocity modulation width.

(3) as described in 4# model algorithm, Bi_ActAnd WRbi_ActIt it is indirect measurement.4# model algorithm combine 1#, 2#, The geometrical relationship determined in 3# model algorithm correlated variables, so indirectly improving Bi_ActAnd WRbi_ActControl accuracy.

Accompanying drawing explanation

Fig. 1 is that narrow face copper plate of crystallizer of the present invention adjusts geometry schematic diagram on the left of width, right side and this specular.

Labelling in figure: 1-copper plate of crystallizer, rotating shaft on 21,22 lower rotary shafts, 3 Width adjusting mechanisms, 4 position measurement units Part.Wherein 2,3,4 represent on device, lower like device structure.

Detailed description of the invention

Enforcement to technical solution of the present invention is described in further detail below in conjunction with the accompanying drawings:

In Fig. 1 based on the geometrical length of mark, by algoritic module, in rotating shaft 21 in real-Time Compensation, lower rotary shaft 22 The position setting value of heart point.

XRti, XRbi are upper rotating shaft 21, lower rotary shaft 22 center position setting value respectively.Manufacturing parameter sets WRbi, Bi, By control XRti, XRbi setting value size, production technology can be obtained required for the absolute tapering of leptoprosopy copper plate of crystallizer Bi and narrow copper plate width WRbi.

XRti is made up of 2 parts, and it is obtained by 1# algoritic module.Part I is the level of coordinate reference line and upper intersection point Length WRHti, Part II is the horizontal length WRHtLa of upper intersection point and upper rotating shaft 21 central point.

XRbi is made up of 2 parts, and it is obtained by 2# algoritic module.Part I is the level of coordinate reference line and lower intersection point Length XRHbi, Part II is the horizontal length WRHbLa of lower intersection point and lower rotary shaft 22 central point.

Upper and lower intersection point corresponding to the different absolute tapering of narrow copper plate position on narrow copper plate is the most different.1# algorithm Module considers the impact on WRHti of the intersection point position different on narrow copper plate, and upper intersection point is different on narrow copper plate The position impact on WRHtLa.

Equally, 2# algoritic module considers the impact on WRHbi of the lower intersection point position different on narrow copper plate, lower intersection point The positions different on the narrow copper plate impact on WRHbLa.

By analyzing accompanying drawing Fig. 1, the absolute tapering of narrow copper plate is the biggest, and the position of upper and lower intersection point is the closer to leptoprosopy copper Bottom plate.Upper and lower intersection point is the closer to bottom narrow copper plate, and the length of WRHtLa and WRHbLa is the longest, the following is determining of they Quantity algorithm.

(1) it is responsible for calculating XRti by 1# algoritic module.Coordinate reference line and the horizontal length WRHti of upper intersection point.It is by 2 It is grouped into, is the absolute tapering of WRbi and upper point of intersection respectively.

WRHti=WRbi+ [(H-Lt)-La*tan θ] * sin θ formula 1

Upper intersection point considers tapering effect with the horizontal length WRHtLa of upper rotating shaft 21 central point.

WRHtLa=La/cos θ formula 2

Strand centrage is WRHti Yu WRHtLa sum with the horizontal length XRti of upper rotating shaft 21 central point.

XRti=WRHti+WRHtLa formula 3

Formula 1, formula 2 substitutes into formula 3, and abbreviation obtains:

XRti=La*cos θ+(H-Lt) * sin θ+WRbi formula 4

The most in like manner, 2# algoritic module it is responsible for calculating XRbi.

XRbi=La*cos θ+Lb*sin θ+WRbi formula 5

(3) it is responsible for calculating sin θ and cos θ by 3# algoritic module.From accompanying drawing Fig. 1,

Sin θ=Bi/H formula 6

So

Its result substitutes into formula 4, formula 5, and its effect is to simplify 1# algoritic module and 2# algoritic module programming difficulty.

(4) it is responsible for calculating narrow copper plate absolute tapering actual value Bi by 4# algoritic module_ActWith narrow copper plate width actual value WRbi_Act.Because Bi aborning_ActAnd WRbi_ActBe not easy measure, can only by position measurement element 4 obtain upper rotating shaft 21, Lower rotary shaft 22 central point actual value XRti_ActAnd XRbi_Act, indirectly obtain Bi by their position measurements_ActAnd WRbi_Act。

Utilize formula 4, formula 5, the formula of formula 6, can be readily available:

Bi_Act=(XRti_Act-XRbi_Act) * H/ (H-Lt-Lb) formula 8

Utilize formula 5,3# algoritic module, can be readily available:

WRbi_Act=XRbi_Act-La*cosθ_Act-Lb*sinθ_Act

sinθ_Act=Bi_Act/H

${\mathrm{cos\θ}}_{Act}=N/\stackrel{\‾}{(1-({\mathrm{Bi}}_{Act}/H)L})$

It is static and dynamic that crystallizer heat online adjusts wide state to be divided into.Static state refers to that crystallizer width keeps constant, now WRbi and Bi also keeps constant.During dynamically referring to that crystallizer width is in regulation, it is divided into again width adjustment from being too narrow to wide Bi It is negative for just and leniently arriving narrow Bi.Dynamically starting and terminating the tune wide velocity variations stage, now WRbi and Bi value is continually changing； Adjusting the wide constant airspeed stage at dynamic process, now WRbi is continually changing, and Bi value keeps constant.Referring to of following choice of dynamical Dynamic process adjusts wide constant airspeed stage, the setting value of WRbi and Bi in a certain moment.This manufacturing parameter is cold conditions width of plate slab 1000mm, pulling rate 1m/min, pyrocondensation ratio 1.013, taper ratio 0.01, wide speed 100mm/min of unilateral tune.

For ease of explanation embodiment, in the present embodiment, set as follows there being related parameter to do:

The a length of H=900mm of leptoprosopy copper plate of crystallizer；

Leptoprosopy copper plate of crystallizer is La=270mm with the vertical length of upper rotating shaft 21 and lower rotary shaft 22 central point；

With the upper rotating shaft 21 a length of Lt=140mm of central point upright projection above leptoprosopy copper plate of crystallizer；

With the lower rotary shaft 22 a length of Lb=140mm of central point upright projection above leptoprosopy copper plate of crystallizer；

Leptoprosopy copper plate of crystallizer bottom width is WRbi=1000*1.013/2=506.5mm；

Leptoprosopy copper plate of crystallizer absolute tapering Bi=WRbi*0.01=5.065mm time static,

Leptoprosopy copper plate of crystallizer absolute tapering Bi=-84.488mm when dynamically the wide speed of tune is-100mm/min；

Leptoprosopy copper plate of crystallizer absolute tapering Bi=94.618mm when dynamically the wide speed of tune is 100mm/min；

(1) it is responsible for calculating XRti by 1# algoritic module.Calculating is divided into static and dynamic.Relevant parameter substitutes into formula 4 and 3# calculate Method module.

Static state obtains

Dynamically obtain

$XRti=(900-140)*94.618/900+270*N^{/\stackrel{\‾}{(1-94.618{/}^{\mathrm{\Λ}}9002})+}506.5=854.9031\Π1\Π:$

(2) it is responsible for calculating XRti by 2# algoritic module.Calculating is divided into static and dynamic.Relevant parameter substitutes into formula 5 and 3# calculate Method module.

Static state obtains

Dynamically obtain

$XRbi=140*94.618/900+270*N^{/\stackrel{\‾}{(1-94.618{/}^{\mathrm{\Λ}}9002})+}506.5=789.7221\Π1\Π:$

Static state, crystallizer width keeps constant, is in normal production status, such as XRti=780.773mm, XRbi= 777.284mm。

Dynamically, adjust during crystallizer width is in regulation a certain moment in wide constant airspeed stage:

Width adjustment leniently arrives narrow, and adjusting wide speed is-100mm/min, such as XRti=703.962mm, XRbi= 762.165mm；

Width adjustment is from being too narrow to width, and adjusting wide speed is 100mm/min, such as XRti=854.903mm, XRbi= 789.722mm。

It is an advantage of the invention that model is applicable to arbitrary taper, low speed and high velocity modulation width, improve Bi_ActAnd WRbi_Act's Computational accuracy.Analysis is compared below by data.

Existing mode it is generally acknowledged upper and lower intersection point invariant position on narrow copper plate face, so approximate data is typically adopted With:

XRti=La+ (H-Lt) * sin θ+WRbi

XRbi=La+Lb*sin θ+WRbi

The following is inventive algorithm and approximate data relevant parameter and results contrast table:

Production status		WRbi	Bi	XRti	XRbi	WRbiAct
							Static	Approximate data (mm)	506.5	5.065	780.777	777.288	506.504
	This algorithm (mm)	506.5	5.065	780.773	777.284	506.5
								Error (mm)			0.004	0.004	0.004
Dynamically leniently arrive narrow	Approximate data (mm)	506.5	-84.488	705.155	763.357	507.692
								This algorithm (mm)	506.5	-84.488	703.692	762.165	506.5
	Error (mm)			1.463	1.192	1.192
							Dynamically from being too narrow to width	Approximate data (mm)	506.5	94.618	856.4	791.218	507.996
	This algorithm (mm)	506.5	94.618	854.903	789.722	506.5
								Error (mm)			1.497	1.496	1.496

By above-mentioned example, it can be seen that this approximate data meets static state, because now taper value is little, approximation is calculated The error of method is the least, negligible.But when needs high velocity modulation width, as adjusted wide speed more than 100mm/min, the most dynamically bore When angle value is static state tens times, and adjust the wide the fastest taper value of speed the biggest, the defect of approximate data just displays.From by mistake It can be seen that approximate data XRbi setting value is bigger than the width value needed for developed width in difference analysis.Because in dynamic process, XRbi is that position setting value is equivalent to the pre-control value in position, and this value is bigger than normal, be equivalent to add hot plate green shell and copper plate of crystallizer it Between gap, easily cause online heat to adjust wide accident.The most domestic it is substantially low velocity modulation width, adjusts wide speed less than 20mm/ Min, tapering is little, and approximate data error is little, so problem is inconspicuous.The method of the present invention does not only have XRbi position pre-control, also needs Adjusting wide speed pre-control, their operating basis is all XRbi position setting value, say, that accurate XRbi position algorithm is Realize the basis that online hot high velocity modulation is wide, use the method maximum of the present invention to adjust wide speed can reach 200mm/min.

These are only embodiments of the invention, but be not limited to the present invention, all within present invention spirit and principle Any amendment, equivalent or the improvement etc. made, within should be included in scope of the presently claimed invention.

Claims (2)

1. one kind is improved the method that wide precision adjusted by crystallizer, it is characterised in that: comprise the following steps,

Confirm the step of the value of cos θ and sin θ,

Sin θ=Bi/H；

Determine that the horizontal length of strand centrage and upper spindle central point is XRti and strand centrage and lower rotary shaft 2 central point Horizontal length is the step of XRbi；

XRti=La*cos θ+(H-Lt) * sin θ+WRbi；

XRbi=La*cos θ+Lb*sin θ+WRbi；

Control the motion of crystallizer Width adjusting mechanism, make the actual value XRti of rotating shaft_ActEqual to XRti, the actual value of lower rotary shaft XRbi_ActEqual to XRbi；

Wherein θ is strand centrage and leptoprosopy copper plate of crystallizer angle；Leptoprosopy crystallizer copper plate height is H；Front leptoprosopy crystallizer Copper coin absolute tapering Bi；Leptoprosopy copper plate of crystallizer is La with the vertical length of upper rotating shaft and lower rotary shaft central point, leptoprosopy crystallizer With the upper spindle central point a length of Lt of upright projection above copper coin；Vertical with lower rotary shaft central point above leptoprosopy copper plate of crystallizer throw The a length of Lb of shadow；Below leptoprosopy copper plate of crystallizer, the horizontal length with strand centrage is WRbi.

The method of wide precision adjusted by raising crystallizer the most according to claim 1, it is characterised in that: also include validating that leptoprosopy copper Plate absolute tapering actual value Bi_ActWith narrow copper plate width actual value WRbi_Act,

Bi_Act=(XRti_Act-XRbi_Act)*H/(H-Lt-Lb)；

WRbi_Act=XRbi_Act-La*cosθ_Act-Lb*sinθ_Act。