CN106087062A - A kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth - Google Patents

A kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth Download PDF

Info

Publication number
CN106087062A
CN106087062A CN201610509503.0A CN201610509503A CN106087062A CN 106087062 A CN106087062 A CN 106087062A CN 201610509503 A CN201610509503 A CN 201610509503A CN 106087062 A CN106087062 A CN 106087062A
Authority
CN
China
Prior art keywords
tantalum
ramet
metalwork
carbon
carbon felt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610509503.0A
Other languages
Chinese (zh)
Inventor
程章勇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BEIJING HUAJIN CHUANGWEI ELECTRONICS Co Ltd
Original Assignee
BEIJING HUAJIN CHUANGWEI ELECTRONICS Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BEIJING HUAJIN CHUANGWEI ELECTRONICS Co Ltd filed Critical BEIJING HUAJIN CHUANGWEI ELECTRONICS Co Ltd
Priority to CN201610509503.0A priority Critical patent/CN106087062A/en
Publication of CN106087062A publication Critical patent/CN106087062A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00Single-crystal growth by condensing evaporated or sublimed materials
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002Crucibles or containers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacture And Refinement Of Metals (AREA)

Abstract

The invention discloses a kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth, described carbonization method comprises the steps: 1) cleaning of ramet part: ramet part is carried out;2) cutting carbon felt sheet: according to geometric shape and the size of ramet part, carbon felt is cut into the carbon felt setting shape;3) assemble: the carbon felt cut, carbon dust, ramet part are placed in cartridge heater with being laminated with order;4) carbonization: heat cartridge heater, to complete the carbonization to ramet part;5) take out ramet part and clean: in Heating tube, take out ramet part and be carried out;6) by step 5) in clean after ramet part be in store for after drying.The carbonization method of the application can make full use of the volume space in Heating tube, improves space availability ratio, efficiently and effectively decreases energy waste, and the carbonization of ramet part is highly uniform.

Description

A kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth
Technical field
The present invention relates to a kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth.
Background technology
Aluminium nitride material belongs to III-V race's semiconductor material with wide forbidden band, and its direct band gap is 6.2eV, and aluminium nitride is big Size single crystal has high thermal conductivity and chemical stability, owing to it has good physicochemical property, so high temperature, high frequency, High-power component and DUV electronic device and spin semiconductor device aspect are respectively provided with wide application prospect;Aluminum Al again Being subordinate to of the same clan with gallium Ga, indium In element, itself and nitrogen element all can form the crystalline material of hexagonal wurtzite structure, by artificial Technological means can realize ternary or quaternary compound, prepares with this and has the adjustable crystalline material of band gap width, enters one Step can form the adjustable crystalline material of band gap width.Aluminium nitride material is the ideal substrate of GaN epitaxial growth again, so nitrogen Change aluminum monocrystalline and there is good market using value.
At present, the growth of aluminum nitride body monocrystalline mainly utilizes physical vaporous deposition principle, uses intermediate frequency furnace by former Material heating, again forms deposition in order on the substrate that temperature is relatively low, thus completes aluminum nitride body list after aln raw material distillation Brilliant growth.Owing to aluminum nitride body crystal growth temperature is higher, the aluminum atom under negative pressure hot conditions has higher activity, this Bring certain difficult problem for aluminum-nitride single crystal growth to the crucible selecting which kind of material.It is lazy that ramet has higher chemistry Property become aluminum-nitride single crystal growth preferred material.The ramet with hard fragility is difficult to machine-shaping, is typically prepared The technology path of ramet crucible is first to prepare tantalum crucible, then tantalum crucible is carried out high temperature cabonization, the ramet prepared with this Aluminum-nitride single crystal growth can be met.
Summary of the invention
For problems of the prior art, it is an object of the invention to provide a kind of for aluminum-nitride single crystal growth Tantalum metalwork carbonization method, the method can make full use of the volume space in Heating tube, improve space availability ratio, conscientiously have Decrease energy waste to effect, and the carbonization of ramet part is highly uniform.
For achieving the above object, the present invention is by the following technical solutions:
A kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth, described carbonization method comprises the steps:
1) cleaning of tantalum metalwork: tantalum metalwork is carried out;
2) cutting carbon felt sheet: according to geometric shape and the size of tantalum metalwork, carbon felt is cut into setting shape Carbon felt;
3) assemble: the carbon felt cut, carbon dust, tantalum metallic member are placed in cartridge heater with being laminated with order;
4) carbonization: heat cartridge heater, to complete the carbonization to tantalum metalwork;
5) take out ramet part and clean: in Heating tube, take out ramet part and be carried out;
6) by step 5) in clean after ramet part be in store for after drying.
Further, step 1) particularly as follows: by tantalum metalwork submergence in acetone, supersound process 2~taking-up after 30 minutes, then Supersound process 0~5 minutes twice in dehydrated alcohol;After cleaning with pure water, tantalum metalwork being placed in concentration is 5%~65% Supersound process 3~60 minutes in potassium hydrogen sulfate solution, after taking-up in the hydrochloric acid solution that concentration is suitable supersound process 0~30 points Clock, after cleaning with pure water again with washes of absolute alcohol once, dries up standby.
Further, step 3) particularly as follows:
The most first Heating tube is cleared up, afterwards by evenly laid out for carbon dust bottom Heating tube, during its thickness tired paving 5mm thickness, will The carbon felt cut gently is placed on carbon dust layer;
B. the last layer that tiles equably in the carbon felt inserted sets the carbon dust of thickness, more gently puts on carbon dust layer Put the carbon felt cut, depending on the geometry of carbon felt, size, modes of emplacement are based on tantalum metalwork;
C. tantalum metalwork is fixed in carbon felt, afterwards carbon dust is uniformly filled between carbon felt and tantalum metalwork, directly Flooding wherein to carbon dust by tantalum metalwork, carbon dust face layer is higher than tantalum metalwork face layer;
D. atresia carbon felt is put down gently on carbon dust layer, then carbon dust is laid in atresia carbon felt equably;
E. repetitive operation step a, b, c, d, until all tantalum metallic member are laminated with order ground, it tired is placed in Heating tube.
Further, step 4) particularly as follows: cartridge heater is heated, little at high temperature 2050~2300 DEG C of holdings 8~100 Time, pressure is maintained at 1~90,000 handkerchiefs.
Further, step 5) particularly as follows: after ramet part after the carbonization taken out in Heating tube, by ramet object table The bur in face wipes out;Ramet object is immersed in acetone or alcohol liquid supersound process 2~30 minutes, again will after taking-up Ramet object is placed in pure water supersound process 1~3 times, each 0.5~5 minute;The most again ramet object is placed on dense In sulfuric acid solution, in Ultrasound Instrument, heating in water bath is to 50~70 DEG C, maintains 20~60 minutes, afterwards by ramet object from dense sulfur Acid is taken out, after being removed by the concentrated sulphuric acid of ramet object surface with pure water, then ramet object is placed on hydrochloric acid solution Middle supersound process 5~30 minutes, then by ramet object pure water ultrasonic cleaning 1~5 times.
The present invention has a following Advantageous Effects:
The ramet part carbonization method of the present invention can make full use of the volume space in Heating tube, improves space utilization Rate, efficiently and effectively decreases energy waste, and the carbonization of ramet part is highly uniform.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the ramet part carbonization method multiple tantalum crucible lids of assembling of the present invention;
Fig. 2 is that the ramet part carbonization method of the present invention assembles a tantalum crucible lid and the schematic diagram of a tantalum crucible body;
Detailed description of the invention
Below, with reference to accompanying drawing, the present invention is more fully illustrated, shown in the drawings of the exemplary enforcement of the present invention Example.But, the present invention can be presented as multiple multi-form, is not construed as the exemplary enforcement being confined to describe here Example.And it is to provide these embodiments, so that the present invention is fully and completely, and will fully convey the scope of the invention to this The those of ordinary skill in field.
For ease of explanation, here can use such as " on ", the space relative terms such as D score " left " " right ", be used for Shown in bright figure a element or feature are relative to another element or the relation of feature.It should be understood that except in figure Outside the orientation illustrated, spatial terminology is intended to include device different azimuth in use or operation.Such as, if in figure Device is squeezed, be stated as being positioned at the element of other elements or feature D score will be located into other elements or feature " on ".Cause This, exemplary term D score can comprise upper and lower both orientation.Device can otherwise position (90-degree rotation or be positioned at Other orientation), relatively illustrate used herein of space correspondingly to explain.
This application provides a kind of ramet part carbonization method for aluminum-nitride single crystal growth, described carbonization method includes Following steps:
1) cleaning of tantalum metalwork: tantalum metalwork is carried out;Tantalum crucible, tantalum crucible cover through machining molding After, there is more physically or chemically adsorbate on tantalum metalwork surface, such as the adhesion oil contamination on tantalum metalwork surface, meanwhile, by In machining and being chronically exposed in air, tantalum metalwork surface adsorption has oxygen atom and other atoms;By tantalum metalwork Submergence in acetone, supersound process 2~take out after 30 minutes, then supersound process 0~5 minutes twice in dehydrated alcohol;With pure Tantalum metalwork is placed in the potassium hydrogen sulfate solution that concentration is 5%~65% supersound process 3~60 minutes by water after cleaning, after taking-up Supersound process 0~30 minutes in the hydrochloric acid solution that concentration is suitable, after cleaning with pure water again with washes of absolute alcohol once, dry up Standby.
2) cutting carbon felt sheet: according to geometric shape and the size of tantalum metalwork, the cutting mould using carbon felt will Carbon felt is cut into the carbon felt of definite shape;In order to preferably increase in Heating tube space availability ratio and effectively reduce energy waste, Make to have being more uniformly distributed of tantalum metalwork carbonization of irregular figure simultaneously, need fault in Heating tube to place several layers of carbon with having order Felt.Carbon felt is cut into the disk being sized for by the cutting mould utilizing carbon felt, according to profile and the size of tantalum metalwork Size, cuts out the ring-type carbon felt being sized for.
3) assemble: the carbon felt cut, carbon dust, tantalum metallic member are placed in cartridge heater with being laminated with order;During assembling Make to be evenly distributed with around tantalum metalwork certain thickness carbon dust possibly, so that there being enough carbon atoms in carbonisation greatly Spread to tantalum metal inside and be bonded.Graphite felt after cutting, carbon dust, ramet part are placed on cartridge heater with being laminated with order In.
4) carbonization: heat cartridge heater, to complete the carbonization to tantalum metalwork;Uniformly heating, slow cooling.From room Temperature is in high-temperature heating process, and temperature rate is all unsuitable too fast;Especially rate of temperature fall should suitably reduce.At high temperature 2050~ 2300 DEG C keep 8~100 hours, and pressure is maintained at 1~90,000 handkerchiefs.
5) take out ramet part and clean: in Heating tube, take out ramet part and be carried out;Ramet after carbonization Surface adhesion has a lot of carbon dust, needs to clean.After the ramet object taken out in Heating tube, need gluing ramet surface Addendum wipes out;Ramet object is immersed in acetone or alcohol liquid supersound process 2~30 minutes, again by ramet after taking-up Object is placed in pure water supersound process 1~3 times, each 0.5~5 minute;The most again ramet object is placed on concentrated sulphuric acid molten In liquid, in Ultrasound Instrument, heating in water bath is to 50~70 DEG C, time 20~60 minutes, afterwards ramet object is taken from concentrated sulphuric acid Go out, after the concentrated sulphuric acid of ramet object surface being removed with pure water, then ramet object is placed in hydrochloric acid solution ultrasonic Process 5~30 minutes, then by ramet object pure water ultrasonic cleaning 1~5 times.
6) by step 5) in clean after ramet part be in store for after drying.
Below in conjunction with specific embodiment, the assembling process of the application is further described:
As it is shown in figure 1, Heating tube is first cleared up by 1., afterwards by evenly laid out for carbon dust bottom Heating tube, the tired paving of its thickness During 5mm thickness, the atresia carbon felt cut gently is placed on carbon dust layer.
2. the last layer that tiles equably in the carbon felt inserted sets the carbon dust of thickness, and such as thickness is 5mm, then at carbon Gently placing a piece of carbon felt cut on bisque, the pore size of carbon felt is with tantalum crucible lid outside dimension as foundation.
3. tantalum crucible lid is placed in the hole slot of carbon felt 3, afterwards carbon dust is uniformly filled in carbon felt and tantalum metalwork Between, until tantalum metalwork is flooded wherein by carbon dust, carbon dust face layer is higher than tantalum metalwork face layer;Preferably, carbon dust upper strata Face is higher than tantalum metalwork face layer 5mm.
4. atresia carbon felt is put down gently on carbon dust layer, then carbon dust is laid in atresia carbon felt equably.
5. repetitive operation step 1,2,3,4, multiple tantalum crucible cap rocks are laminated with order ground, and it tired is placed in Heating tube.
In Fig. 1,1 is heating cover, and 2 is gap, and 3 is carbon felt with holes, and 4,5,9,10 is carbon dust layer, and 6 is tantalum crucible lid, 7 For atresia carbon felt, 8 is Heating tube.
As in figure 2 it is shown, Heating tube is first cleared up by 1., afterwards by evenly laid out for carbon dust bottom Heating tube, the tired paving of its thickness During 5mm thickness, the atresia carbon felt cut gently is placed on carbon dust layer.
2. the last layer that tiles equably in the carbon felt inserted sets the carbon dust of thickness, and such as thickness is 5mm, then at carbon Gently placing a piece of carbon felt cut on bisque, the pore size of carbon felt is with tantalum crucible lid outside dimension as foundation.
3. tantalum crucible lid is placed in the hole slot of carbon felt 3 with holes, afterwards carbon dust is uniformly filled in carbon felt and tantalum gold Belonging between part, until tantalum metalwork is flooded wherein by carbon dust, carbon dust face layer is higher than tantalum metalwork face layer;Preferably, carbon dust Face layer is higher than tantalum metalwork face layer 5mm.
4. atresia carbon felt is put down gently on carbon dust layer, then carbon dust is laid in atresia carbon felt equably.
5. repetitive operation step 1,2, tantalum crucible body is placed in the hole of carbon felt with holes, and ensures that vertical centrage is coaxial, Again by carbon dust load wherein, according on crucible body mouth along position, carbon dust is evenly laid out, the carbon dust layer after tiling is placed with holes Carbon felt, loads onto carbon dust layer and Karbate carpet veneer simultaneously successively.
6. edge on cleaning Heating tube, covers heating cover;Have between the superiors' carbon felt in guarantee heating cover and Heating tube Certain interval.
In Fig. 2,1-generates heat cover, 2-gap, 3-carbon felt with holes, 4,5,9,10-carbon dust, 6-tantalum crucible lid, 7-Karbate Felt, 8-Heating tube, 11-tantalum crucible body.
Described above simply to illustrate that the present invention, it is understood that to the invention is not limited in above example, meet The various variants of inventive concept are all within protection scope of the present invention.

Claims (5)

1. one kind for aluminum-nitride single crystal growth tantalum metalwork carbonization method, it is characterised in that described carbonization method include as Lower step:
1) cleaning of tantalum metalwork: tantalum metalwork is carried out;
2) cutting carbon felt sheet: according to geometric shape and the size of tantalum metalwork, carbon felt is cut into the carbon setting shape Felt;
3) assemble: the carbon felt cut, carbon dust, tantalum metallic member are placed in cartridge heater with being laminated with order;
4) carbonization: heat cartridge heater, to complete the carbonization to tantalum metalwork;
5) take out ramet part and clean: in Heating tube, take out ramet part and be carried out;
6) by step 5) in clean after ramet part be in store for after drying.
Tantalum metalwork carbonization method the most according to claim 1, it is characterised in that step 1) particularly as follows: by tantalum metalwork Submergence in acetone, supersound process 2~take out after 30 minutes, then supersound process 0~5 minutes twice in dehydrated alcohol;With pure Tantalum metalwork is placed in the potassium hydrogen sulfate solution that concentration is 5%~65% supersound process 3~60 minutes by water after cleaning, after taking-up Supersound process 0~30 minutes in the hydrochloric acid solution that concentration is suitable, after cleaning with pure water again with washes of absolute alcohol once, dry up Standby.
Tantalum metalwork carbonization method the most according to claim 1, it is characterised in that step 3) particularly as follows:
The most first Heating tube is cleared up, afterwards by evenly laid out for carbon dust bottom Heating tube, during its thickness tired paving 5mm thickness, by cutting Good carbon felt is gently placed on carbon dust layer;
B. the last layer that tiles equably in the carbon felt inserted sets the carbon dust of thickness, more gently places sanction on carbon dust layer The carbon felt sheared, depending on the geometry of carbon felt, size, modes of emplacement are based on tantalum metalwork;
C. tantalum metalwork is fixed in carbon felt, afterwards carbon dust is uniformly filled between carbon felt and tantalum metalwork, until carbon Tantalum metalwork is flooded wherein by powder, and carbon dust face layer is higher than tantalum metalwork face layer;
D. atresia carbon felt is put down gently on carbon dust layer, then carbon dust is laid in atresia carbon felt equably;
E. repetitive operation step a, b, c, d, until all tantalum metallic member are laminated with order ground, it tired is placed in Heating tube.
Tantalum metalwork carbonization method the most according to claim 1, it is characterised in that step 4) particularly as follows: cartridge heater is entered Row heating, keeps 8~100 hours high temperature 2050~2300 DEG C, and pressure is maintained at 1~90,000 handkerchiefs.
Tantalum metalwork carbonization method the most according to claim 1, it is characterised in that step 5) particularly as follows: in Heating tube After ramet part after the carbonization taken out, the bur of ramet object surface is wiped out;Ramet object is immersed acetone Or supersound process 2~30 minutes in alcohol liquid, ramet object is placed in pure water supersound process 1~3 times again, often after taking-up Secondary 0.5~5 minute;Being placed in concentrated sulfuric acid solution by ramet object, in Ultrasound Instrument, heating in water bath is to 50~70 the most again DEG C, maintain 20~60 minutes, afterwards ramet object is taken out from concentrated sulphuric acid, with pure water by the dense sulfur of ramet object surface After acid removes, then ramet object is placed in hydrochloric acid solution supersound process 5~30 minutes, then by ramet object pure water Ultrasonic cleaning 1~5 times.
CN201610509503.0A 2016-06-30 2016-06-30 A kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth Pending CN106087062A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610509503.0A CN106087062A (en) 2016-06-30 2016-06-30 A kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610509503.0A CN106087062A (en) 2016-06-30 2016-06-30 A kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth

Publications (1)

Publication Number Publication Date
CN106087062A true CN106087062A (en) 2016-11-09

Family

ID=57211626

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610509503.0A Pending CN106087062A (en) 2016-06-30 2016-06-30 A kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth

Country Status (1)

Country Link
CN (1) CN106087062A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112939569A (en) * 2021-03-19 2021-06-11 哈尔滨化兴软控科技有限公司 Method for recycling tantalum carbide crucible material for PVT (physical vapor transport) method
CN113846383A (en) * 2021-09-27 2021-12-28 哈尔滨科友半导体产业装备与技术研究院有限公司 Graphite heater for simultaneously carbonizing tantalum crucibles of different sizes and using method
CN115819088A (en) * 2023-02-21 2023-03-21 宁波合盛新材料有限公司 Silicon carbide crystal growth device, filter material thereof and preparation method of filter material
CN115874279A (en) * 2023-02-28 2023-03-31 中国电子科技集团公司第四十六研究所 Preparation method of tantalum carbide substrate for growing aluminum nitride on silicon carbide

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101220521A (en) * 2007-09-28 2008-07-16 中国科学院物理研究所 Split type tantalum crucible and manufacturing method thereof
CN101565810A (en) * 2009-06-09 2009-10-28 天津大学 Preparation method and device for industrial microwave heating diffusion coating
CN102240809A (en) * 2011-06-24 2011-11-16 中国科学院上海硅酸盐研究所 Method for preparing functional gradient composite material containing components with obvious melting point difference
CN103060744A (en) * 2013-02-05 2013-04-24 中国电子科技集团公司第四十六研究所 Preparation method of combination type crucible utilized at ultra-high temperature
CN103261467A (en) * 2010-11-30 2013-08-21 东洋炭素株式会社 Method for carburizing tantalum container
CN103643305A (en) * 2013-12-04 2014-03-19 北京华进创威电子有限公司 Preparation method of TaC crucible for high-temperature gas phase method crystal growth
CN203639536U (en) * 2013-12-18 2014-06-11 湖北三江航天万山特种车辆有限公司 Multilayer parts carburizing placement device
CN104745807A (en) * 2013-12-31 2015-07-01 北京有色金属研究总院 Method for extracting valuable metal elements in niobium-tantalum ore

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101220521A (en) * 2007-09-28 2008-07-16 中国科学院物理研究所 Split type tantalum crucible and manufacturing method thereof
CN101565810A (en) * 2009-06-09 2009-10-28 天津大学 Preparation method and device for industrial microwave heating diffusion coating
CN103261467A (en) * 2010-11-30 2013-08-21 东洋炭素株式会社 Method for carburizing tantalum container
CN102240809A (en) * 2011-06-24 2011-11-16 中国科学院上海硅酸盐研究所 Method for preparing functional gradient composite material containing components with obvious melting point difference
CN103060744A (en) * 2013-02-05 2013-04-24 中国电子科技集团公司第四十六研究所 Preparation method of combination type crucible utilized at ultra-high temperature
CN103643305A (en) * 2013-12-04 2014-03-19 北京华进创威电子有限公司 Preparation method of TaC crucible for high-temperature gas phase method crystal growth
CN203639536U (en) * 2013-12-18 2014-06-11 湖北三江航天万山特种车辆有限公司 Multilayer parts carburizing placement device
CN104745807A (en) * 2013-12-31 2015-07-01 北京有色金属研究总院 Method for extracting valuable metal elements in niobium-tantalum ore

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112939569A (en) * 2021-03-19 2021-06-11 哈尔滨化兴软控科技有限公司 Method for recycling tantalum carbide crucible material for PVT (physical vapor transport) method
CN113846383A (en) * 2021-09-27 2021-12-28 哈尔滨科友半导体产业装备与技术研究院有限公司 Graphite heater for simultaneously carbonizing tantalum crucibles of different sizes and using method
CN113846383B (en) * 2021-09-27 2023-12-01 哈尔滨科友半导体产业装备与技术研究院有限公司 Graphite heater for simultaneously carbonizing tantalum crucibles with different sizes and use method
CN115819088A (en) * 2023-02-21 2023-03-21 宁波合盛新材料有限公司 Silicon carbide crystal growth device, filter material thereof and preparation method of filter material
CN115874279A (en) * 2023-02-28 2023-03-31 中国电子科技集团公司第四十六研究所 Preparation method of tantalum carbide substrate for growing aluminum nitride on silicon carbide

Similar Documents

Publication Publication Date Title
CN101985773B (en) Seed crystal treatment method and silicon carbide mono-crystal growing method
CN106087062A (en) A kind of tantalum metalwork carbonization method for aluminum-nitride single crystal growth
Ogah et al. Thin films of tin sulphide for use in thin film solar cell devices
CN104058458A (en) Method for preparing high-quality single/double-layer controllable molybdenum disulfide
CN106400116B (en) The method of high quality growing silicon carbice crystals oblique seed crystal support and growing silicon carbide crystal with high quality
CN104499047A (en) Substrate for realizing heteroepitaxial growth of large-size monocrystal diamond and preparation method thereof
Li Preparation and properties of CdS thin films deposited by chemical bath deposition
CN112289932A (en) Perovskite thin film and preparation method and application thereof
CA1087758A (en) Process for the manufacture of large surface area bonded to a substrate
CN105463575A (en) Seed crystal processing method for growing high-quality silicon carbide crystals
CN103606514A (en) Chemical corrosion transfer method based on GaN substrate CVD epitaxial growth graphene
US20220238746A1 (en) Germanium single-crystal wafer, method for preparing germanium single-crystal wafer, method for preparing crystal bar, and use of single-crystal wafer
JP2005159312A (en) Base material of polycrystalline silicon substrate for solar battery, and the polycrystalline silicon substrate for solar battery
Boeck et al. Growth of crystalline semiconductor structures on amorphous substrates for photovoltaic applications
CN108998830A (en) A kind of passivating method of mercury cadmium telluride
CN106245110A (en) A kind of reduce SiC crystal growth in defect produce method
CN103496736B (en) ZnS nano-crystalline film and preparation method and application thereof
CN105420812B (en) A method of removing silicon carbide seed from seed crystal support
JP2013070032A (en) Manufacturing method of buffer layer and manufacturing method of photoelectric conversion element
CN103938178A (en) Method for direct autocatalysis growth of InAsSb nanowire on Si substrate
CN109371462A (en) Epitaxial growth organic metal halide perovskite monocrystal thin films preparation method
Vallejo et al. Synthesis and characterization of Zn (O, OH) S and AgInS2 layers to be used in thin film solar cells
CN102286741B (en) Method for preparing cadmium telluride film
CN108360065A (en) A kind of method and growth structure of growth single-crystal diamond
Shi et al. Improved silicon thin film growth on glass substrates by periodic regrowth

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20161109

RJ01 Rejection of invention patent application after publication