CN106076080A - Exhaust gas scrubber for low-temperature plasma reactor - Google Patents

Exhaust gas scrubber for low-temperature plasma reactor Download PDF

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Publication number
CN106076080A
CN106076080A CN201610692972.0A CN201610692972A CN106076080A CN 106076080 A CN106076080 A CN 106076080A CN 201610692972 A CN201610692972 A CN 201610692972A CN 106076080 A CN106076080 A CN 106076080A
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CN
China
Prior art keywords
low
exhaust gas
valve
plasma reactor
temperature plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610692972.0A
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Chinese (zh)
Inventor
王泳
陈双艳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suzhou Cloud White Environmental Equipment Ltd By Share Ltd
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Suzhou Cloud White Environmental Equipment Ltd By Share Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Suzhou Cloud White Environmental Equipment Ltd By Share Ltd filed Critical Suzhou Cloud White Environmental Equipment Ltd By Share Ltd
Priority to CN201610692972.0A priority Critical patent/CN106076080A/en
Publication of CN106076080A publication Critical patent/CN106076080A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/1487Removing organic compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18Absorbing units; Liquid distributors therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/70Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
    • B01D2257/708Volatile organic compounds V.O.C.'s
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/80Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818Employing electrical discharges or the generation of a plasma

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)

Abstract

The present invention relates to purification technology field, particularly for the exhaust gas scrubber of low-temperature plasma reactor.This is used for the exhaust gas scrubber of low-temperature plasma reactor, including air inlet pipe, gas drier, efficient filter screen, exhaust gas washing tower, valve positioner and valve one.Exhaust gas scrubber for low-temperature plasma reactor involved in the present invention, this device is provided with low-temperature plasma reactor and exhaust gas washing tower, Organic substance in waste gas can be decomposed by low-temperature plasma reactor, and exhaust gas washing tower can be by undecomposed a small amount of VOCs solution absorption, empty after waste gas purification the most at last, this device is applicable to the organic waste-gas purification of low concentration Wind Volume, and whole purification process can maintain self-heating to run, energy consumption is low, do not produce secondary pollution, there is higher stability, organic exhaust gas concentration range applicatory is low, the composition of device is compact simply, have broad application prospects.

Description

Exhaust gas scrubber for low-temperature plasma reactor
Technical field
The present invention relates to purification technology field, the waste gas particularly for low-temperature plasma reactor washs dress Put.
Background technology
In China, VOCs(volatile organic compounds) volatile organic matter, refer to saturated steaming under room temperature Vapour pressure more than boiling point organic compound less than 260 DEG C under 70 Pa, normal pressure, or under the conditions of 20 DEG C vapour pressure be more than or Equal to 10 Pa, there are corresponding volatile whole organic compound
Generally, for the low concentration VOCs gas discharged in spray coating process, there is the spy that flow is big and concentration is low Point, uses absorption method also the most uneconomical, and the most current more employing combines absorption method and disruptive method in addition purified treatment, but This adds the complexity of whole purifier system virtually, increases investment and operating cost, the most also to corresponding operation With control system, certain requirement is proposed.How can be one be badly in need of solving quickly by substantial amounts of organic waste-gas purification Problem.
In order to solve above-mentioned technical problem, the present invention devises the exhaust gas scrubber for low-temperature plasma reactor, Being provided with low-temperature plasma reactor and exhaust gas washing tower in this device, low-temperature plasma reactor can be by the Organic substance in waste gas Decompose, and undecomposed a small amount of VOCs solution absorption can be emptied after waste gas purification by exhaust gas washing tower the most at last, this device It is applicable to the organic waste-gas purification of low concentration Wind Volume, and whole purification process can maintain, and self-heating is run, energy consumption is low, do not produce two Secondary pollution, has higher stability, and organic exhaust gas concentration range applicatory is low, and the composition of device is compact simply, has wide Wealthy application prospect.Additionally, this is used for the exhaust gas scrubber reasonable in design of low-temperature plasma reactor, uses and keep in repair Convenient and swift, it is suitable for promoting the use of.
Summary of the invention
In order to overcome defect present in background technology, the technical solution adopted for the present invention to solve the technical problems is: For the exhaust gas scrubber of low-temperature plasma reactor, including air inlet pipe, gas drier, efficient filter screen, waste gas washing Tower, valve positioner and valve one, described air inlet pipe is arranged on gas drier, and described air inlet pipe is provided with valve two, Described gas drier is provided with efficient filter screen, and described high-efficient filter is provided with low-temperature plasma reactor, described low temperature etc. on the net Linked together by connecting tube between ion reactor and exhaust gas washing tower, between described exhaust gas washing tower and concentration detector Being linked together by exhaustor, be provided with valve four between described concentration detector and evacuated tube, one end of described valve one sets Putting between valve four and concentration detector, the other end of described valve one is arranged on valve two and gas drying by recovery tube In air inlet pipe between device, described valve positioner is connected with valve one, valve four and concentration detector respectively.
Preferred described connecting tube is provided with valve three.
The solvent that preferred described exhaust gas washing tower uses is aqueous surfactant solution.
Exhaust gas scrubber for low-temperature plasma reactor involved in the present invention, this device is provided with low temperature etc. from Sub-reactor and exhaust gas washing tower, the Organic substance in waste gas can be decomposed by low-temperature plasma reactor, and exhaust gas washing tower energy Enough by undecomposed a small amount of VOCs solution absorption, empty after waste gas purification the most at last, this device is applicable to low concentration Wind Volume Organic waste-gas purification, and whole purification process can maintain self-heating run, energy consumption is low, do not produce secondary pollution, has higher Stability, organic exhaust gas concentration range applicatory is low, and the composition of device is compact simply, has broad application prospects.Additionally, This is used for the exhaust gas scrubber reasonable in design of low-temperature plasma reactor, and convenient maintenance is quick, is suitable for promoting Use.
Accompanying drawing explanation
The present invention is further described with embodiment below in conjunction with the accompanying drawings.
Fig. 1 is the present invention structural representation for the exhaust gas scrubber of low-temperature plasma reactor;
Wherein: 1, air inlet pipe;2, gas drier;3, efficient filter screen;4, low-temperature plasma reactor;5, exhaust gas washing tower; 6, concentration detector;7, valve positioner;8, valve one;9, connecting tube;10, recovery tube;11, evacuated tube;12, exhaustor;13、 Valve two;14, valve three;15, valve four.
Detailed description of the invention
In conjunction with the accompanying drawings, the present invention is further detailed explanation.Accompanying drawing is the schematic diagram simplified, only with signal side The basic structure of the formula explanation present invention, therefore it only shows the composition relevant with the present invention.
Specific embodiment, refers to Fig. 1, for the exhaust gas scrubber of low-temperature plasma reactor, including air inlet pipe 1, Gas drier 2, efficient filter screen 3, exhaust gas washing tower 5, valve positioner 7 and valve 1, described air inlet pipe 1 is arranged on gas On body drying device 2, described air inlet pipe 1 is provided with valve 2 13, and described gas drier 2 is provided with efficient filter screen 3, described Efficiently filter screen 3 is provided with low-temperature plasma reactor 4, by even between described low-temperature plasma reactor 4 and exhaust gas washing tower 5 Adapter 9 links together, and is linked together by exhaustor 12 between described exhaust gas washing tower 5 and concentration detector 6, described dense Being provided with valve 4 15 between degree detector 6 and evacuated tube 11, one end of described valve 1 is arranged on valve 4 15 and Concentration Testing Between device 6, the other end of described valve 1 is arranged on entering between valve 2 13 and gas drier 2 by recovery tube 10 On trachea 1, described valve positioner 7 is connected with valve 1, valve 4 15 and concentration detector 6 respectively, preferred described company Adapter 9 is provided with valve 3 14, and the solvent that preferred described exhaust gas washing tower 5 uses is aqueous surfactant solution.
Exhaust gas scrubber for low-temperature plasma reactor involved in the present invention, this device in use, Opening valve 2 13, organic exhaust gas enters gas drier 2 from air inlet pipe 1, and organic exhaust gas is carried out by gas drier 2 Being dried, enter efficient filter screen 3 by dried organic exhaust gas, efficient filter screen 3 can be by the dust in waste gas and solid particle Remove, then organic exhaust gas enters in low-temperature plasma reactor 4 and decomposes, in low-temperature plasma reactor 4 out Gas enters exhaust gas scrubber 5, is absorbed by the Organic substance in gas further, through the gas of exhaust gas scrubber 5, through overrich Degree detector 6, if the content of organics in gas is less than discharge standard, gas is just discharged into air from evacuated tube 11;As Really the content of organics in gas is more than discharge standard, and gas runs past recovery tube 10 and again purifies.This device sets Having low-temperature plasma reactor and exhaust gas washing tower, the Organic substance in waste gas can be decomposed by low-temperature plasma reactor, and gives up Undecomposed a small amount of VOCs solution absorption can be emptied after waste gas purification by gas wash tower the most at last, and this device is applicable to low The organic waste-gas purification of concentration Wind Volume, and whole purification process can maintain self-heating operation, energy consumption is low, do not produce secondary pollution, Having higher stability, organic exhaust gas concentration range applicatory is low, and the composition of device is compact simply, has wide application Prospect.Additionally, this is used for the exhaust gas scrubber reasonable in design of low-temperature plasma reactor, convenient maintenance is fast Victory, is suitable for promoting the use of.
Obviously, above-described embodiment is only for clearly demonstrating example, and not restriction to embodiment.Right For those of ordinary skill in the field, can also make on the basis of the above description other multi-form change or Variation.Here without also cannot all of embodiment be given exhaustive.And the obvious change thus extended out or Change among still in the protection domain of the invention.

Claims (3)

1. for the exhaust gas scrubber of low-temperature plasma reactor, including air inlet pipe (1), gas drier (2), high-efficient filter Net (3), exhaust gas washing tower (5), valve positioner (7) and valve one (8), it is characterised in that: described air inlet pipe (1) is arranged on gas On body drying device (2), described air inlet pipe (1) is provided with valve two (13), and described gas drier (2) is provided with high-efficient filter Net (3), described efficient filter screen (3) is provided with low-temperature plasma reactor (4), described low-temperature plasma reactor (4) and waste gas Linked together by connecting tube (9) between scrubbing tower (5), pass through between described exhaust gas washing tower (5) and concentration detector (6) Exhaustor (12) links together, and is provided with valve four (15), described valve between described concentration detector (6) and evacuated tube (11) One end of one (8) is arranged between valve four (15) and concentration detector (6), and the other end of described valve one (8) is by reclaiming Pipe (10) is arranged in the air inlet pipe (1) between valve two (13) and gas drier (2), described valve positioner (7) point It is not connected with valve one (8), valve four (15) and concentration detector (6).
Exhaust gas scrubber for low-temperature plasma reactor the most according to claim 1, it is characterised in that described company Adapter (9) is provided with valve three (14).
Exhaust gas scrubber for low-temperature plasma reactor the most according to claim 1, it is characterised in that waste gas is washed Washing the solvent that tower (5) uses is aqueous surfactant solution.
CN201610692972.0A 2016-08-22 2016-08-22 Exhaust gas scrubber for low-temperature plasma reactor Pending CN106076080A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610692972.0A CN106076080A (en) 2016-08-22 2016-08-22 Exhaust gas scrubber for low-temperature plasma reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610692972.0A CN106076080A (en) 2016-08-22 2016-08-22 Exhaust gas scrubber for low-temperature plasma reactor

Publications (1)

Publication Number Publication Date
CN106076080A true CN106076080A (en) 2016-11-09

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Family Applications (1)

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Country Status (1)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090081985A (en) * 2008-01-25 2009-07-29 한국기계연구원 Harmfulness gas cleaning system
CN204395758U (en) * 2015-01-16 2015-06-17 济南城市之翼环保科技有限公司 The waste gas treatment device of a kind of VOCs
CN105617826A (en) * 2016-02-17 2016-06-01 大连举扬科技股份有限公司 Low-temperature plasma oil gas ultra-clean emission treatment process and device
CN206045749U (en) * 2016-08-22 2017-03-29 苏州云白环境设备股份有限公司 For the exhaust gas scrubber of low-temperature plasma reactor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090081985A (en) * 2008-01-25 2009-07-29 한국기계연구원 Harmfulness gas cleaning system
CN204395758U (en) * 2015-01-16 2015-06-17 济南城市之翼环保科技有限公司 The waste gas treatment device of a kind of VOCs
CN105617826A (en) * 2016-02-17 2016-06-01 大连举扬科技股份有限公司 Low-temperature plasma oil gas ultra-clean emission treatment process and device
CN206045749U (en) * 2016-08-22 2017-03-29 苏州云白环境设备股份有限公司 For the exhaust gas scrubber of low-temperature plasma reactor

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Application publication date: 20161109

RJ01 Rejection of invention patent application after publication