CN106024831B - A kind of production method of array substrate, display panel and the array substrate - Google Patents
A kind of production method of array substrate, display panel and the array substrate Download PDFInfo
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- CN106024831B CN106024831B CN201610366307.2A CN201610366307A CN106024831B CN 106024831 B CN106024831 B CN 106024831B CN 201610366307 A CN201610366307 A CN 201610366307A CN 106024831 B CN106024831 B CN 106024831B
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- planarization layer
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- array substrate
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- sunk area
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/854—Arrangements for extracting light from the devices comprising scattering means
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Optics & Photonics (AREA)
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- Microelectronics & Electronic Packaging (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
This application provides the production methods of a kind of array substrate, display panel and the array substrate, to pass through setting sunk area, it realizes and incident light is changed into scattering light, to increase include the array substrate display panel viewing angle range, improve include the array substrate display panel viewing visual angle.The array substrate includes: pixel unit and planarization layer；Wherein, pixel unit region corresponding on the planarization layer is sunk area.
Description
Technical field
This application involves field of communication technology more particularly to the systems of a kind of array substrate, display panel and the array substrate
Make method.
Background technique
With rapidly improving for display technology, the semiconductor component technology as display device core is also flown therewith
The progress of jump property.For existing display device, Organic Light Emitting Diode (Organic Light Emitting
Diode, OLED) it is used as a kind of current mode luminescent device, because of its self-luminous, quick response, wide viewing angle and can make
On flexible substrates the features such as and be applied in high-performance display field more and more.Wherein, OLE can by driving method
It is divided into passive matrix drive Organic Light Emitting Diode (Passive Matrix Driving, OLED, PMOLED) and active matrix
It drives Organic Light Emitting Diode (Active Matrix Driving, OLED, AMOLED), since displayer is with low
The advantages that manufacturing cost, high answer speed, power saving, the DC driven that can be used for portable device, operating temperature range are big etc., and
It is expected to become the next-generation novel flat panel display for replacing liquid crystal display (Liquid Crystal Display, LCD).Existing
In some AMOLED display panels, each OLED includes that multiple thin film transistor (TFT)s (Thin Film Transistor, TFT) are opened
Powered-down road.Wherein, low temperature polycrystalline silicon (Low Temperature Poly Silicon) TFT is since it is with superior Static Electro
Learn characteristic, by as a kind of important electronic device liquid crystal display, in terms of obtained it is extensive
Using.
In the backboard process of OLED, planarization layer (Planar Layer, PLN) plays considerable effect.Pass through
The non-planar regions of lower circuit are bulldozed by organic film material.But, the light due to being projected from existing OLED display panel
Line is directional light mostly, and therefore, the viewing angle range very little of display panel affects the viewing visual angle of OLED display panel
(View Angle)。
In conclusion since the light projected from existing OLED display panel is directional light mostly, display surface
The viewing angle range very little of plate, that is, affect the viewing visual angle of OLED display panel.
Summary of the invention
The embodiment of the present application provides the production method of a kind of array substrate, display panel and the array substrate, to logical
Cross setting sunk area, realize and incident light is changed into scattering light, thus increase include the array substrate display surface
The viewing angle range of plate, improve include the array substrate display panel viewing visual angle.
A kind of array substrate provided by the embodiments of the present application, the array substrate include: pixel unit and planarization layer；Its
In, pixel unit region corresponding on the planarization layer is sunk area.
In the embodiment of the present application, by the way that sunk area is arranged, realizes and incident light is changed into scattering light, to increase
Include the viewing angle range of the display panel of the array substrate, improve include the array substrate display panel sight
See visual angle.
Preferably, the thickness value of the sunk area is in the first preset range.
Preferably, first preset range is greater than or equal to 1.9 microns, and it is less than or equal to 3.0 microns.
Preferably, first preset range is greater than or equal to 2.4 microns, and it is less than or equal to 2.6 microns.
In the embodiment of the present application, by the limitation of the thickness value to sunk area, the microcavity effect of sunk area ensure that,
Avoid influence of the sunk area to display panel display effect.
Preferably, the array substrate further include: source-drain electrode and anode, wherein the planarization layer is located at the source and drain
Between pole and the anode；
The institute on the planarization layer is right with the anode in source-drain electrode region corresponding on the planarization layer
The thickness value of the overlapping region in the region answered is greater than the thickness value of the sunk area.
Preferably, the thickness value of the overlapping region is in the second preset range.
Preferably, second preset range is greater than or equal to 1.5 microns, and it is less than or equal to 3.0 microns.
Preferably, the thickness value of the overlapping region is 2.0 microns.
In the embodiment of the present application, by the limitation of the thickness to overlapping region, the string between source-drain electrode and anode is avoided
It disturbs.
A kind of display panel provided by the embodiments of the present application, the display panel include: the above-mentioned array substrate of any one.
A kind of production method of above-mentioned array substrate provided by the embodiments of the present application, this method comprises:
Planarization layer is formed on source-drain electrode, pixel unit, wherein pixel unit institute on the planarization layer is right
The region answered is sunk area；
Anode is formed on the planarization layer.
In the embodiment of the present application, by the way that sunk area is arranged, realizes and incident light is changed into scattering light, to increase
Include the viewing angle range of the display panel of the array substrate, improve include the array substrate display panel sight
See visual angle.
Preferably, the thickness value of the sunk area is in the first preset range.
Preferably, first preset range is greater than or equal to 1.9 microns, and it is less than or equal to 3.0 microns.
Preferably, first preset range is greater than or equal to 2.4 microns, and it is less than or equal to 2.6 microns.
In the embodiment of the present application, by the limitation of the thickness value to sunk area, the microcavity effect of sunk area ensure that,
Avoid influence of the sunk area to display panel display effect.
Preferably, forming planarization layer on source-drain electrode, pixel unit, comprising:
The first planarization layer is formed on source-drain electrode, pixel unit, wherein the thickness of first planarization layer is in third
In preset range；
It is right to be obtained by exposure technology for pixel unit institute on first planarization layer using gray level mask plate
The region answered is the second planarization layer of sunk area.
Preferably, the third preset range is greater than or equal to 2.4 microns, and it is less than or equal to 3.6 microns.
Preferably, the third preset range is greater than or equal to 2.9 microns, and it is less than or equal to 3.1 microns.
Preferably, the transmitance of the gray level mask plate is greater than or equal to 0.1%, and it is less than or equal to 10%.
Preferably, the transmitance of the gray level mask plate is greater than or equal to 1%, and it is less than or equal to 5%.
In the embodiment of the present application, gradually it is thinned by above-mentioned gray level mask plate using exposure technology, to obtain smooth arc
The sunk area of degree realizes incident light being changed into scattering light, thus increase include the array substrate display panel
Viewing angle range, improve include the array substrate display panel viewing visual angle.
Preferably, after forming the first planarization layer, this method further include:
To source-drain electrode region corresponding on the planarization layer and anode institute on the planarization layer
The overlapping region in corresponding region carries out curing process, forms third planarization layer；
It is right to be obtained by exposure technology for pixel unit institute on first planarization layer using gray level mask plate
The region answered is the second planarization layer of sunk area, comprising:
It is right to be obtained by exposure technology for pixel unit institute on the third planarization layer using gray level mask plate
The region answered is the second planarization layer of sunk area.
Preferably, the thickness value of the overlapping region is greater than the thickness value of the sunk area.
In the embodiment of the present application, by be arranged be greater than sunk area thickness value overlapping region, avoid source-drain electrode with
Crosstalk between anode, and sunk area is arranged in position corresponding to pixel unit in planarization layer, improves excessively flat
Influence of the planarization layer to viewing visual angle.
Preferably, the thickness value of the overlapping region is in the second preset range.
Preferably, second preset range is greater than or equal to 1.5 microns, and it is less than or equal to 3.0 microns.
Preferably, the thickness value of the overlapping region is 2.0 microns.
In the embodiment of the present application, by the limitation of the thickness value to overlapping region, source-drain electrode and anode are effectively avoided
Between crosstalk.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of array substrate provided by the embodiments of the present application；
Fig. 2 is the operation principle schematic diagram of array substrate provided by the embodiments of the present application；
Fig. 3 is the structural schematic diagram of the sunk area of array substrate provided by the embodiments of the present application；
Fig. 4 is a kind of structural schematic diagram of array substrate provided by the embodiments of the present application；
Fig. 5 is a kind of structural schematic diagram of array substrate provided by the embodiments of the present application；
Fig. 6 is a kind of flow diagram of the production method of above-mentioned array substrate provided by the embodiments of the present application；
Fig. 7 is the flow diagram of the production method of the planarization layer of above-mentioned array substrate provided by the embodiments of the present application.
Specific embodiment
The embodiment of the present application provides the production method of a kind of array substrate, display panel and the array substrate, to logical
Cross setting sunk area, realize and incident light is changed into scattering light, thus increase include the array substrate display surface
The viewing angle range of plate, improve include the array substrate display panel viewing visual angle.
Below in conjunction with the attached drawing in the embodiment of the present application, the technical solution in the application is clearly and completely retouched
It states, it is clear that described embodiment is some embodiments of the present application, instead of all the embodiments.Based in the application
Embodiment, every other embodiment obtained by those of ordinary skill in the art without making creative efforts, all
Belong to the range of the application protection.
Referring to Fig. 1, the embodiment of the present application provides a kind of array substrate, which includes: 101 peace of pixel unit
Smoothization layer 102；Wherein, the pixel unit 101 region corresponding on the planarization layer 102 is sunk area 103.
Wherein, the sunk area 103 is used to convert incident light 201 to scattering light 202, the effect of the embodiment of the present application
As shown in Figure 2.
Specifically, the radian of the sunk area 103 is in the 4th preset range.Wherein, the 4th preset range is big
In or be equal to 0.1 degree, and less than 180 degree.
Specifically, the 4th preset range is greater than or equal to 15 degree, and is less than or equal to 40 degree.
Specifically, the 4th preset range is greater than or equal to 15 degree, and is less than or equal to 36 degree.
Wherein, the radian of the sunk area 103 is the radian of smooth excessiveness, i.e., the radian of the described sunk area is equal difference
Ordered series of numbers, and tolerance is smaller, the dispersion effect of the sunk area is better.Referring to Fig. 3, the sunk area includes the first recess
Region and the second sunk area, wherein the corresponding radian 301 of first sunk area, second sunk area are corresponding
Radian 302, the corresponding radian 303 of the third sunk area, and radian 301, radian 302 and radian 303 are at arithmetic progression.
In the embodiment of the present application, by the way that sunk area is arranged, realizes and incident light is changed into scattering light, to increase
Include the viewing angle range of the display panel of the array substrate, improve include the array substrate display panel sight
See visual angle.
Referring to fig. 4, the thickness value 401 of the sunk area 103 is in the first preset range, wherein described first is default
Range is greater than or equal to 1.9 microns, and is less than or equal to 3.0 microns.
Specifically, first preset range is greater than or equal to 2.4 microns, and is less than or equal to 2.6 microns.
In the embodiment of the present application, by the limitation of the thickness value to sunk area, the microcavity effect of sunk area ensure that,
Avoid influence of the sunk area to display panel display effect.
Referring to Fig. 5, array substrate provided by the embodiments of the present application further include: source-drain electrode 501 and anode 502, wherein described
Planarization layer 102 is between the source-drain electrode 501 and the anode 502；
The source-drain electrode 501 region corresponding on the planarization layer 102 is with the anode 502 in the planarization
The thickness value 503 of the overlapping region in corresponding region is greater than the thickness value of the sunk area 103 on layer 102.
Wherein, the thickness value 503 of the overlapping region is in the second preset range, wherein second preset range is
More than or equal to 1.5 microns, and it is less than or equal to 3.0 microns.
Specifically, the thickness value 503 of the overlapping region is 2.0 microns.
In the embodiment of the present application, by the limitation of the thickness to overlapping region, the string between source-drain electrode and anode is avoided
It disturbs.
A kind of display panel provided by the embodiments of the present application, the display panel include: the above-mentioned array substrate of any one.
Identical design is given, referring to Fig. 6, the embodiment of the present application provides a kind of for making the system of above-mentioned array substrate
Make method, which includes:
S601, planarization layer is formed on source-drain electrode, pixel unit, wherein the pixel unit is in the planarization layer
Upper corresponding region is sunk area；
S602, anode is formed on the planarization layer.
Specifically, referring to Fig. 7, step S601, comprising:
S701, the first planarization layer is formed on source-drain electrode, pixel unit, wherein the thickness of first planarization layer
In third preset range；
S702, the pixel unit is obtained on first planarization layer by exposure technology using gray level mask plate
Corresponding region is the second planarization layer of sunk area.
Wherein, the transmitance of the gray level mask plate is greater than or equal to 0.1%, and is less than or equal to 10%.
Preferably, the transmitance of the gray level mask plate is greater than or equal to 1%, and it is less than or equal to 5%.
In the embodiment of the present application, gradually it is thinned by above-mentioned gray level mask plate using exposure technology, to obtain smooth arc
The sunk area of degree realizes incident light being changed into scattering light, thus increase include the array substrate display panel
Viewing angle range, improve include the array substrate display panel viewing visual angle.
Wherein, the third preset range is greater than or equal to 2.4 microns, and is less than or equal to 3.6 microns.
Preferably, the third preset range is greater than or equal to 2.9 microns, and it is less than or equal to 3.1 microns.
In the embodiment of the present application, by the limitation of the thickness value to sunk area, the microcavity effect of sunk area ensure that,
Avoid influence of the sunk area to display panel display effect.
Wherein, first preset range is greater than or equal to 1.9 microns, and is less than or equal to 3.0 microns.
Preferably, first preset range is greater than or equal to 2.4 microns, and it is less than or equal to 2.6 microns.
After step S701, this method further include:
To source-drain electrode region corresponding on the planarization layer and anode institute on the planarization layer
The overlapping region in corresponding region carries out curing process, forms third planarization layer；
Step S702, comprising:
It is right to be obtained by exposure technology for pixel unit institute on the third planarization layer using gray level mask plate
The region answered is the second planarization layer of sunk area.
Specifically, the thickness value of the overlapping region is greater than the thickness value of the sunk area.
Specifically, the thickness value of the overlapping region is in the second preset range.Wherein, second preset range is big
In or be equal to 1.5 microns, and be less than or equal to 3.0 microns.
Specifically, the thickness value of the overlapping region is 2.0 microns.
In the embodiment of the present application, by the limitation of the thickness to the overlapping region, avoid between source-drain electrode and anode
Crosstalk.
In conclusion the embodiment of the present application provides the production side of a kind of array substrate, display panel and the array substrate
Method, to realize incident light being changed into scattering light, so that increasing includes the array substrate by setting sunk area
Display panel viewing angle range, improve include the array substrate display panel viewing visual angle.
Obviously, those skilled in the art can carry out various modification and variations without departing from the essence of the application to the application
Mind and range.In this way, if these modifications and variations of the application belong to the range of the claim of this application and its equivalent technologies
Within, then the application is also intended to include these modifications and variations.
Claims (21)
1. a kind of array substrate, which is characterized in that the array substrate includes: pixel unit and planarization layer；Wherein, the pixel
Unit region corresponding on the planarization layer is sunk area, and the sunk area is formed in the planarization layer back
Surface from the pixel unit.
2. array substrate according to claim 1, which is characterized in that the thickness value of the sunk area is in the first default model
In enclosing.
3. array substrate according to claim 2, which is characterized in that it is micro- that first preset range is greater than or equal to 1.9
Rice, and it is less than or equal to 3.0 microns.
4. array substrate according to claim 2, which is characterized in that it is micro- that first preset range is greater than or equal to 2.4
Rice, and it is less than or equal to 2.6 microns.
5. array substrate described in any claim according to claim 1~4, which is characterized in that the array substrate further include: source
Drain electrode and anode, wherein the planarization layer is between the source-drain electrode and the anode；
The source-drain electrode corresponding region and anode on the planarization layer is corresponding on the planarization layer
The thickness value of the overlapping region in region is greater than the thickness value of the sunk area.
6. array substrate according to claim 5, which is characterized in that the thickness value of the overlapping region is in the second default model
In enclosing.
7. array substrate according to claim 6, which is characterized in that it is micro- that second preset range is greater than or equal to 1.5
Rice, and it is less than or equal to 3.0 microns.
8. a kind of display panel, which is characterized in that the display panel includes: the described in any item array bases of claim 1~7
Plate.
9. a kind of production method of the described in any item array substrates of claim 1~7, which is characterized in that this method comprises:
Planarization layer is formed on source-drain electrode, pixel unit, wherein the pixel unit is corresponding on the planarization layer
Region is sunk area；
Anode is formed on the planarization layer.
10. according to the method described in claim 9, it is characterized in that, the thickness value of the sunk area is in the first preset range
It is interior.
11. according to the method described in claim 10, it is characterized in that, first preset range be greater than or equal to 1.9 microns,
And it is less than or equal to 3.0 microns.
12. according to the method described in claim 10, it is characterized in that, first preset range be greater than or equal to 2.4 microns,
And it is less than or equal to 2.6 microns.
13. according to the method described in claim 9, wrapping it is characterized in that, form planarization layer on source-drain electrode, pixel unit
It includes:
The first planarization layer is formed on source-drain electrode, pixel unit, wherein the thickness of first planarization layer is default in third
In range；
Using gray level mask plate, by exposure technology, it is corresponding on first planarization layer to obtain the pixel unit
Region is the second planarization layer of sunk area.
14. according to the method for claim 13, which is characterized in that the third preset range is greater than or equal to 2.4 microns,
And it is less than or equal to 3.6 microns.
15. according to the method for claim 13, which is characterized in that the third preset range is greater than or equal to 2.9 microns,
And it is less than or equal to 3.1 microns.
16. according to the method for claim 13, which is characterized in that the transmitance of the gray level mask plate is greater than or equal to
0.1%, and it is less than or equal to 10%.
17. according to the method for claim 13, which is characterized in that the transmitance of the gray level mask plate is greater than or equal to
1%, and it is less than or equal to 5%.
18. method described in 3~17 any claims according to claim 1, which is characterized in that formed the first planarization layer it
Afterwards, this method further include:
To the source-drain electrode, corresponding region and the anode are corresponding on the planarization layer on the planarization layer
Region overlapping region carry out curing process, formed third planarization layer；
Using gray level mask plate, by exposure technology, it is corresponding on first planarization layer to obtain the pixel unit
Region is the second planarization layer of sunk area, comprising:
Using gray level mask plate, by exposure technology, it is corresponding on the third planarization layer to obtain the pixel unit
Region is the second planarization layer of sunk area.
19. according to the method for claim 18, which is characterized in that the thickness value of the overlapping region is greater than the depressed area
The thickness value in domain.
20. according to the method for claim 19, which is characterized in that the thickness value of the overlapping region is in the second preset range
It is interior.
21. according to the method for claim 20, which is characterized in that second preset range is greater than or equal to 1.5 microns,
And it is less than or equal to 3.0 microns.
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| CN201610366307.2A CN106024831B (en) | 2016-05-27 | 2016-05-27 | A kind of production method of array substrate, display panel and the array substrate |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102034851A (en) * | 2009-10-02 | 2011-04-27 | 佳能株式会社 | Display device |
| CN104716164A (en) * | 2015-03-27 | 2015-06-17 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof and organic light-emitting display device |
| WO2015143838A1 (en) * | 2014-03-28 | 2015-10-01 | 京东方科技集团股份有限公司 | Oled pixel structure and manufacturing method therefor, oled display panel and oled display |
-
2016
- 2016-05-27 CN CN201610366307.2A patent/CN106024831B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102034851A (en) * | 2009-10-02 | 2011-04-27 | 佳能株式会社 | Display device |
| WO2015143838A1 (en) * | 2014-03-28 | 2015-10-01 | 京东方科技集团股份有限公司 | Oled pixel structure and manufacturing method therefor, oled display panel and oled display |
| CN104716164A (en) * | 2015-03-27 | 2015-06-17 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof and organic light-emitting display device |
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