CN106010053A - Self-cleaning photocuring antifogging paint and preparation method thereof - Google Patents
Self-cleaning photocuring antifogging paint and preparation method thereof Download PDFInfo
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- CN106010053A CN106010053A CN201610351179.4A CN201610351179A CN106010053A CN 106010053 A CN106010053 A CN 106010053A CN 201610351179 A CN201610351179 A CN 201610351179A CN 106010053 A CN106010053 A CN 106010053A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/24—Homopolymers or copolymers of amides or imides
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
- C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F220/58—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing oxygen in addition to the carbonamido oxygen, e.g. N-methylolacrylamide, N-(meth)acryloylmorpholine
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/04—Carbon
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/08—Ingredients agglomerated by treatment with a binding agent
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/14—Paints containing biocides, e.g. fungicides, insecticides or pesticides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
- C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F220/58—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing oxygen in addition to the carbonamido oxygen, e.g. N-methylolacrylamide, N-(meth)acryloylmorpholine
- C08F220/585—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing oxygen in addition to the carbonamido oxygen, e.g. N-methylolacrylamide, N-(meth)acryloylmorpholine and containing other heteroatoms, e.g. 2-acrylamido-2-methylpropane sulfonic acid [AMPS]
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Abstract
The invention provides a self-cleaning photocuring antifogging paint which is prepared from the following raw materials in parts by mass: 3-8 parts of modified graphene nano particle, 20-80 parts of hydrophilic photosensitive resin, 5-20 parts of photoinitiator, 15-40 parts of diluter and 1-3 parts of curing accelerator. The invention also provides a preparation method of the self-cleaning photocuring antifogging paint. Compared with correlation techniques, the method provided by the invention has the following advantages: the graphene surface is subjected to hydrophilc modification to endow the graphene with favorable hydrophilicity and dispersity, and the graphene has favorable compatibility with the photosensitive resin, thereby greatly enhancing the strength wear resistance of the coating; the cation organic monomer modified hydrophilic resin can effectively inhibit the bacteria on the coating surface from generation, and has favorable self-cleaning property; the cured paint forms a crosslinked network, so that the adhesion, hardness, frictional resistance, water resistance and other mechanical properties are enhanced, and the cured paint can resist fog for a long time; and the paint is baked at low temperature, and is applicable to various substrates.
Description
[technical field]
The present invention relates to technical field of coatings, particularly relate to a kind of automatically cleaning photocuring anti-fog coating and preparation method thereof.
[background technology]
Existing anti-fog coating makes coating have hydrophilic by introducing hydrophilic functional group, and droplet is in the contact of coating surface
Low, sprawl uniformly moisture film, prevent light scattering, to reach antifog purpose.Public affairs in the patent of Publication No. CN104725640A
A kind of hydrophilic modifying Ludox and the application in preparing hydrophilic antifogging wear-resistant paint thereof are opened, by modified for PEG silane coupled
Agent and teos hydrolysis prepare hydrophilic modifying Ludox, add in anti-fog coating by this Ludox, the antifog painting of preparation
Material tool has good wearability and adhesive force, but Ludox and Polyethylene Glycol poor compatibility, cause the problems such as coating light transmittance is low；
Publication No. CN105038430A patent in disclose a kind of super hydrophilic anti-fog coating, by modified acrylic acid emulsion, nanometer
Silicon dioxide, titanium dioxide and surfactant composition, add nano silicon and be obviously improved coating to base material adhesive force and painting
Layer intensity, improves lasting anti-fog effect, but surfactant long chain hydrophobic group is easily assembled, and produces with hydrophilic component and is separated, inhales
Tide rear surface forms color film, affects optical characteristics, and the introducing of titanium dioxide can affect the transparency of coating；Publication No.
CN102850924A discloses a kind of anti-fog properties lasting anti-fog coating, by modified hydrophilic resin, closure Carbimide.
Ester firming agent and modified surface active's agent allotment form, and closure isocyanate curing agent must unseal thermosetting more than 120 DEG C
Changing, the heatproof of transparent base is required height, application is restricted.The deficiencies in the prior art are, existing system is difficult to take into account attached
Put forth effort, case hardness, wearability, resistance to water and the combination property such as the most anti-fog properties, to sacrifice some performance to improve another portion
Divide performance.
Therefore, it is necessary in fact to provide a kind of new automatically cleaning photocuring anti-fog coating and preparation method thereof to solve above-mentioned technology
Problem.
[summary of the invention]
It is good that the technical issues that need to address of the present invention are to provide a kind of self-cleaning performance, and sustainable antifog automatically cleaning light is solid
Change anti-fog coating and preparation method thereof.
A kind of automatically cleaning photocuring anti-fog coating, is made up of the raw material of following mass parts:
3-8 mass parts modified graphene nanoparticle,
20-80 mass parts hydrophilic photosensitive resin,
5-20 mass parts light trigger,
15-40 mass parts diluent,
1-3 mass parts curing accelerator.
Preferably, described light trigger be benzophenone, benzoin ethyl ether, 2-hydroxy-2-methyl-1-phenyl-1-acetone,
One or more in 1-hydroxycyclohexyl phenyl ketone, 2,4,6-trimethylbenzoyl diphenyl phosphine oxide.
Preferably, described diluent is ethylene glycol monomethyl ether, ethylene glycol, propylene glycol monomethyl ether, propylene-glycol ethyl ether, a contracting two
One or more in ethylene glycol monomethyl ether, diglycol ether.
Preferably, described curing accelerator is sour or sour salt, such as sulphuric acid, hydrochloric acid, chlorosulfonic acid, p-phthalic acid, hydrogen bromine
One or more in the ammonium salt of the acids such as acid, perchloric acid or acid.
Present invention also offers the preparation method of above-mentioned automatically cleaning photocuring anti-fog coating, comprise the following steps:
Step one, prepare modified graphene nanoparticle
1) by 40-80 mass parts allyl glycidyl ether, 5-12 mass parts Graphene, 20-50 mass parts diluent, 1-
3 mass parts Pyrogentisinic Acid's polymerization inhibitors add in reaction vessel, and ultrasonic disperse 30min stirs 18 hours at 80-130 DEG C, obtains alkene
Propyl group graft modification Graphene；
2) by 15-30 mass parts pi-allyl graft modification Graphene, 50-90 part hydrophilic monomer, 35-60 mass parts diluent
Add in reaction vessel, at temperature is 50-80 DEG C, stirs 24h, obtains modified graphene nanoparticle；
Step 2, prepare hydrophilic photosensitive resin
1) by 20-60 mass parts acrylic ester monomer, 10-40 mass parts dimethylaminoethyl methacrylate and 10-
The vinyl monomer of 50 mass parts nitrogen atoms is slowly added dropwise 20-60 mass parts in diluent, under the conditions of 90 DEG C, by 0.5-
5 mass parts initiators add in aforementioned mixed solution, and time for adding is 6-8h, be incubated 2-3h and obtain hydrophilic photosensitive tree after completing
Fat；
It should be noted that step one and step 2 limit without sequencing, it is specially and first prepares modified graphene nanometer
Microgranule or hydrophilic photosensitive resin is all possible.
Step 3, the preparation of automatically cleaning photocuring anti-fog coating
Take the 3-8 mass parts modified graphene nanoparticle prepared in step one,
Take the 20-80 mass parts hydrophilic photosensitive resin prepared in step 2, and 5-20 mass parts light trigger, 15-
40 mass parts diluent, 1-3 mass parts curing accelerator mix homogeneously forms automatically cleaning photocuring anti-fog coating.
Preferably, the hydrophilic monomer in step one includes acrylic acid, acrylate, hydroxyethyl methylacrylate, methyl-prop
One or more in e pioic acid methyl ester, 2-(Acryloyloxy)ethanol.
Preferably, the diluent in step one be ethylene glycol monomethyl ether, ethylene glycol, propylene glycol monomethyl ether, propylene-glycol ethyl ether,
One or more in diglycol methyl ether, diglycol ether.
Preferably, the acrylic ester monomer in step 2 includes 2-acrylamide-2-methyl-propanesulfonic acid, metering system
Acid hydroxyl ethyl ester, 2-(Acryloyloxy)ethanol, hy-droxybutyl, methacrylate one or more.
Preferably, the vinyl monomer of the nitrogen atom in step 2 includes (methyl) acrylamide, N-methacryl
Amine, N,N-DMAA, N-ethyl acrylamide, N, N-acrylamide, N-propylacrylamide, N, N-bis-
One or more in dimethylaminoethyl (methyl) acrylamide, N, N-dimethyl aminopropyl (methyl) acrylamide.
Preferably, the diluent in step 2 be ethylene glycol monomethyl ether, ethylene glycol, propylene glycol monomethyl ether, propylene-glycol ethyl ether,
One or more in diglycol methyl ether, diglycol ether；Described initiator is benzoyl peroxide, peroxide
Change lauroyl, isopropyl benzene hydroperoxide, tert-butyl hydroperoxide, di-t-butyl peroxide, cumyl peroxide, benzoyl peroxide
T-butyl formate, peroxidating trimethylacetic acid tertiary butyl ester, methyl ethyl ketone peroxide, cyclohexanone peroxide, azo-bis-isobutyl cyanide, azo two
Different heptan cyanogen, di-isopropyl peroxydicarbonate, one in di-cyclohexylperoxy di-carbonate.
Compared with correlation technique, the present invention has the beneficial effects that, carries out hydrophilic modifying at graphenic surface, gives Graphene
Good hydrophilic and dispersibility, good with the hydrophilic photosensitive resin compatibility, it is greatly improved intensity and the anti-wear performance of coating；Sun from
Sub-organic monomer modified hydrophilic resin, can effectively suppress growing of coating surface antibacterial, have good self-cleaning property；After solidification
Forming cross-linked network, the mechanical performance such as adhesive force, hardness, rub resistance, resistance to water promotes, can be the most antifog；Low-temperature bake, can
It is applicable to various base material.
[detailed description of the invention]
Below in conjunction with detailed description of the invention, the invention will be further described.
Embodiment 1
I, the preparation of modified graphene nanoparticle:
(1) by 50 mass parts allyl glycidyl ethers, 6 mass parts Graphenes, 43 mass parts ethylene glycol, 1 mass
Part Pyrogentisinic Acid's polymerization inhibitor adds in reaction vessel, and ultrasonic disperse 30min stirs 18 hours at 100 DEG C, obtains pi-allyl grafting
Modified graphene；
(2) by 18 mass parts pi-allyl graft modification Graphenes, 42 mass parts acrylate, 40 mass parts ethylene glycol
Add in reaction vessel, at temperature is 55 DEG C, stirs 24h, obtains modified graphene nanoparticle.
II, the preparation of hydrophilic photosensitive resin:
By 25 mass parts 2-acrylamide-2-methyl-propanesulfonic acid, 25 mass parts dimethylaminoethyl methacrylates and 15
Mass parts N, N-dimethylaminoethyl (methyl) acrylamide is slowly added dropwise 32 mass parts in ethylene glycol, 90 DEG C of conditions
Under, 3 mass parts azo-bis-isobutyl cyanides are added in aforementioned mixed solution, time for adding is 6h, is incubated 2.5h and obtains parent after completing
Water photosensitive resin；
III, the hydrophilic photosensitive resin 50 mass parts step II prepared and 25 mass parts ethylene glycol monomethyl ether add container
In, under agitation it is sequentially added into modified graphene nanoparticle prepared by 5 mass parts step I, 18 mass parts benzophenone, 2 matter
Amount part p-phthalic acid, often a kind of raw material of addition is all after stirring, and adds another kind of raw material.Mixing time is no less than
30min, obtains automatically cleaning photocuring anti-fog coating.Automatically cleaning photocuring anti-fog coating preparation completed is coated in transparent base
Surface, film-forming under ultraviolet light irradiates.Film performance test result is shown in Table 1
Embodiment 2
I, the preparation of modified graphene nanoparticle:
(1) by 45 mass parts allyl glycidyl ethers, 8 mass parts Graphenes, 45 mass parts diglycol methyl ethers,
2 mass parts Pyrogentisinic Acid's polymerization inhibitors add in reaction vessel, and ultrasonic disperse 30min stirs 18 hours at 90 DEG C, obtains pi-allyl
Graft modification Graphene；
(2) by 20 mass parts pi-allyl graft modification Graphenes, 60 mass parts hydroxyethyl methylacrylates, 20 mass parts one
Diglycol ethylene methyl ether adds in reaction vessel, stirs 24h, obtain modified graphene nanoparticle at temperature is 60 DEG C.
II, the preparation of hydrophilic photosensitive resin:
By 30 mass parts methacrylate, 15 mass parts dimethylaminoethyl methacrylates and 21 mass parts N,
N-DMAA is slowly added dropwise in 30 mass parts diglycol ether, under the conditions of 90 DEG C, by 4 mass parts peroxides
Changing two dicyclohexyl carbonate to add in aforementioned mixed solution, time for adding is 7h, is incubated 2h and obtains hydrophilic photosensitive tree after completing
Fat；
III, the hydrophilic photosensitive resin 60 mass parts step II prepared and 20 mass parts propylene-glycol ethyl ethers add container
In, under agitation it is sequentially added into modified graphene nanoparticle, 13 mass parts 1-hydroxy-cyclohexyls prepared by 4 mass parts step I
Phenyl ketone, 3 mass parts chlorosulfonic acids, often a kind of raw material of addition is all after stirring, and adds another kind of raw material.Mixing time
No less than 30min, obtain automatically cleaning photocuring anti-fog coating.Automatically cleaning photocuring anti-fog coating preparation completed is coated in
Bright substrate surface, film-forming under ultraviolet light irradiates.Film performance test result is shown in Table 1
Embodiment 3
I, the preparation of modified graphene nanoparticle:
(1) by 55 mass parts allyl glycidyl ethers, 10 mass parts Graphenes, 33 mass parts diglycol second
Ether, 2 mass parts Pyrogentisinic Acid's polymerization inhibitors add in reaction vessel, and ultrasonic disperse 30min stirs 18 hours at 110 DEG C, obtains alkene
Propyl group graft modification Graphene；
(2) 16 mass parts pi-allyl graft modification Graphenes, 50 mass parts 2-(Acryloyloxy)ethanols, 34 mass parts one are contracted two
Ethylene glycol adds in reaction vessel, stirs 24h, obtain modified graphene nanoparticle at temperature is 70 DEG C.
II, the preparation of hydrophilic photosensitive resin:
By 31 mass parts 2-(Acryloyloxy)ethanols, 15 mass parts dimethylaminoethyl methacrylates and 15 mass parts N, N-bis-
Ethyl acrylamide is slowly added dropwise in 35 mass parts propylene glycol monomethyl ethers, under the conditions of 90 DEG C, by 4 mass parts dibenzoyl peroxides
Adding in aforementioned mixed solution, time for adding is 7.5h, is incubated 2.5h and obtains hydrophilic photosensitive resin after completing；
III, the hydrophilic photosensitive resin 52 mass parts step II prepared and 25 mass parts propylene glycol monomethyl ethers add container
In, under agitation it is sequentially added into modified graphene nanoparticle, 15 mass parts 2-hydroxyl-2-first prepared by 6 mass parts step I
Base-1-phenyl-1-acetone, 2 mass parts sulphuric acid, often a kind of raw material of addition is all after stirring, and adds another kind of raw material.Stir
Time of mixing, no less than 30min, obtains automatically cleaning photocuring anti-fog coating.Automatically cleaning photocuring anti-fog coating preparation completed is coated with
Overlay on transparent substrate surface, film-forming under ultraviolet light irradiates.Film performance test result is shown in Table 1
Embodiment 4
I, the preparation of modified graphene nanoparticle:
(1) by 52 mass parts allyl glycidyl ethers, 9 mass parts Graphenes, 37 mass parts propylene-glycol ethyl ethers, 2 mass
Part Pyrogentisinic Acid's polymerization inhibitor adds in reaction vessel, and ultrasonic disperse 30min stirs 18 hours at 115 DEG C, obtains pi-allyl grafting
Modified graphene；
(2) 20 mass parts pi-allyl graft modification Graphenes, 44 mass parts acrylic acid, 36 mass parts propylene-glycol ethyl ethers are added
Enter in reaction vessel, at temperature is 75 DEG C, stirs 24h, obtains modified graphene nanoparticle.
II, the preparation of hydrophilic photosensitive resin:
By 29 mass parts methacrylate, 20 mass parts dimethylaminoethyl methacrylates and 16 mass parts N-
Ethyl acrylamide is slowly added dropwise in 30 mass parts propylene glycol monomethyl ethers, under the conditions of 90 DEG C, by 5 mass parts peroxy dicarbonates two
Isopropyl ester adds in aforementioned mixed solution, and time for adding is 8h, is incubated 3h and obtains hydrophilic photosensitive resin after completing；
III, the hydrophilic photosensitive resin 48 mass parts step II prepared and 28 mass parts ethylene glycol add container
In, under agitation it is sequentially added into modified graphene nanoparticle, 16 mass parts 2,4,6-trimethyls prepared by 7 mass parts step I
Benzoyl diphenyl phosphine oxide, 1 mass parts hydrochloric acid, often a kind of raw material of addition is all after stirring, and adds another kind of raw material.
Mixing time is no less than 30min, obtains automatically cleaning photocuring anti-fog coating.The automatically cleaning photocuring anti-fog coating that preparation is completed
It is coated in transparent substrate surface, film-forming under ultraviolet light irradiates.Film performance test result is shown in Table 1.
Table 1 automatically cleaning photocuring anti-fog coating film performance test result
Compared with correlation technique, the present invention has the beneficial effects that, carries out hydrophilic modifying at graphenic surface, gives Graphene
Good hydrophilic and dispersibility, good with the hydrophilic photosensitive resin compatibility, it is greatly improved intensity and the anti-wear performance of coating；Sun from
Sub-organic monomer modified hydrophilic resin, can effectively suppress growing of coating surface antibacterial, have good self-cleaning property；After solidification
Forming cross-linked network, the mechanical performance such as adhesive force, hardness, rub resistance, resistance to water promotes, can be the most antifog；Low-temperature bake, can
It is applicable to various base material.
Above-described is only embodiments of the present invention, it should be noted here that for those of ordinary skill in the art
For, without departing from the concept of the premise of the invention, it is also possible to make improvement, but these belong to the protection model of the present invention
Enclose.
Claims (10)
1. an automatically cleaning photocuring anti-fog coating, it is characterised in that be made up of the raw material of following mass parts:
3-8 mass parts modified graphene nanoparticle,
20-80 mass parts hydrophilic photosensitive resin,
5-20 mass parts light trigger,
15-40 mass parts diluent,
1-3 mass parts curing accelerator.
Automatically cleaning photocuring anti-fog coating the most according to claim 1, it is characterised in that described light trigger is hexichol first
Ketone, benzoin ethyl ether, 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxycyclohexyl phenyl ketone, 2,4,6-trimethylbenzene
One or more in formyl diphenyl phosphine oxide.
Automatically cleaning photocuring anti-fog coating the most according to claim 1, it is characterised in that described diluent is ethylene glycol first
One in ether, ethylene glycol, propylene glycol monomethyl ether, propylene-glycol ethyl ether, diglycol methyl ether, diglycol ether
Or it is several.
Automatically cleaning photocuring anti-fog coating the most according to claim 1, it is characterised in that described curing accelerator be acid or
The salt of acid, such as the one in the ammonium salt of the acids such as sulphuric acid, hydrochloric acid, chlorosulfonic acid, p-phthalic acid, hydrobromic acid, perchloric acid or acid or
Several.
5. the preparation method of the automatically cleaning photocuring anti-fog coating as described in any one of claim 1-4, it is characterised in that
Comprise the following steps:
Step one, prepare modified graphene nanoparticle
1) by 40-80 mass parts allyl glycidyl ether, 5-12 mass parts Graphene, 20-50 mass parts diluent, 1-3 matter
Amount part Pyrogentisinic Acid's polymerization inhibitor adds in reaction vessel, and ultrasonic disperse 30min stirs 18 hours at 80-130 DEG C, obtains allyl
Base graft modification Graphene；
2) 15-30 mass parts pi-allyl graft modification Graphene, 50-90 part hydrophilic monomer, 35-60 mass parts diluent are added
In reaction vessel, at temperature is 50-80 DEG C, stirs 24h, obtains modified graphene nanoparticle；
Step 2, prepare hydrophilic photosensitive resin
1) by 20-60 mass parts acrylic ester monomer, 10-40 mass parts dimethylaminoethyl methacrylate and 10-50 matter
The vinyl monomer of amount part nitrogen atom is slowly added dropwise 20-60 mass parts in diluent, under the conditions of 90 DEG C, by 0.5-5 matter
Amount part initiator adds in aforementioned mixed solution, and time for adding is 6-8h, is incubated 2-3h and obtains hydrophilic photosensitive resin after completing；
Step 3, the preparation of automatically cleaning photocuring anti-fog coating
Take the 3-8 mass parts modified graphene nanoparticle prepared in step one,
Take the 20-80 mass parts hydrophilic photosensitive resin prepared in step 2, and 5-20 mass parts light trigger, 15-40 matter
Amount part diluent, 1-3 mass parts curing accelerator mix homogeneously forms automatically cleaning photocuring anti-fog coating.
The preparation method of automatically cleaning photocuring anti-fog coating the most according to claim 5, it is characterised in that in step one
Hydrophilic monomer includes in acrylic acid, acrylate, hydroxyethyl methylacrylate, methyl methacrylate, 2-(Acryloyloxy)ethanol
One or more.
The preparation method of automatically cleaning photocuring anti-fog coating the most according to claim 5, it is characterised in that in step one
Diluent is ethylene glycol monomethyl ether, ethylene glycol, propylene glycol monomethyl ether, propylene-glycol ethyl ether, diglycol methyl ether, a contracting diethyl
One or more in glycol ether.
The preparation method of automatically cleaning photocuring anti-fog coating the most according to claim 5, it is characterised in that in step 2
Acrylic ester monomer includes 2-acrylamide-2-methyl-propanesulfonic acid, hydroxyethyl methylacrylate, 2-(Acryloyloxy)ethanol, propylene
Acid hydroxy butyl ester, methacrylate one or more.
The preparation method of automatically cleaning photocuring anti-fog coating the most according to claim 5, it is characterised in that in step 2
The vinyl monomer of nitrogen atom includes (methyl) acrylamide, N methacrylamide, N,N-DMAA, N-second
Base acrylamide, N, N-acrylamide, N-propylacrylamide, N, N-dimethylaminoethyl (methyl) acrylamide,
One or more in N, N-dimethyl aminopropyl (methyl) acrylamide.
The preparation method of automatically cleaning photocuring anti-fog coating the most according to claim 5, the diluent in step 2 is second
In glycol methyl ether, ethylene glycol, propylene glycol monomethyl ether, propylene-glycol ethyl ether, diglycol methyl ether, diglycol ether
One or more；Described initiator is benzoyl peroxide, lauroyl peroxide, isopropyl benzene hydroperoxide, t-butyl peroxy
Change hydrogen, di-t-butyl peroxide, cumyl peroxide, peroxidized t-butyl perbenzoate, peroxidating trimethylacetic acid tertiary butyl ester, mistake
MEKP, cyclohexanone peroxide, azo-bis-isobutyl cyanide, azo two cyanogen in different heptan, di-isopropyl peroxydicarbonate, peroxidating
One in two dicyclohexyl carbonate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610351179.4A CN106010053B (en) | 2016-05-25 | 2016-05-25 | Automatically cleaning photocuring anti-fog coating and preparation method thereof |
Applications Claiming Priority (1)
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106827726A (en) * | 2017-01-24 | 2017-06-13 | 杭州科翼科技有限公司 | A kind of glass of protection eyesight |
| CN107059415A (en) * | 2017-04-12 | 2017-08-18 | 三元控股集团有限公司 | A kind of preparation method of the multifunctional conductive fabric based on photocuring technology |
| CN108504146A (en) * | 2018-04-04 | 2018-09-07 | 江南大学 | A kind of UV photocurings antifoggant and preparation method thereof |
| CN109338735A (en) * | 2018-11-29 | 2019-02-15 | 牛墨石墨烯应用科技有限公司 | A kind of heat-insulated grid cloth of graphene fiber and preparation method thereof |
| CN114045059A (en) * | 2021-12-10 | 2022-02-15 | 广州大学 | Electrophoretic paint capable of preventing liquid and bacteria from adhering and application method thereof |
| CN115558408A (en) * | 2022-10-16 | 2023-01-03 | 杭州梵因科技有限公司 | Preparation method of high-performance anti-fog cream |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5523164A (en) * | 1992-11-04 | 1996-06-04 | Basf Lacke + Farben, Ag | Method for forming a paint film and coating obtained by the method |
| CN105176371A (en) * | 2015-08-31 | 2015-12-23 | 福州富兰机电技术开发有限公司 | Ultraviolet curing coating and preparation method thereof, and super-hydrophilic transparent antifogging coating layer and preparation method thereof |
| CN105315735A (en) * | 2015-11-04 | 2016-02-10 | 上海乘鹰新材料有限公司 | Photo-thermally cured hydrophilic anti-fog paint composition |
| CN105440931A (en) * | 2014-09-28 | 2016-03-30 | 上海乘鹰新材料有限公司 | Ultraviolet curable hydrophilic aluminum foil coating composition |
-
2016
- 2016-05-25 CN CN201610351179.4A patent/CN106010053B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5523164A (en) * | 1992-11-04 | 1996-06-04 | Basf Lacke + Farben, Ag | Method for forming a paint film and coating obtained by the method |
| DE69307723D1 (en) * | 1992-11-04 | 1997-03-06 | Basf Lacke & Farben | Method of making a paint film and coating obtained by this method |
| CN105440931A (en) * | 2014-09-28 | 2016-03-30 | 上海乘鹰新材料有限公司 | Ultraviolet curable hydrophilic aluminum foil coating composition |
| CN105176371A (en) * | 2015-08-31 | 2015-12-23 | 福州富兰机电技术开发有限公司 | Ultraviolet curing coating and preparation method thereof, and super-hydrophilic transparent antifogging coating layer and preparation method thereof |
| CN105315735A (en) * | 2015-11-04 | 2016-02-10 | 上海乘鹰新材料有限公司 | Photo-thermally cured hydrophilic anti-fog paint composition |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106827726A (en) * | 2017-01-24 | 2017-06-13 | 杭州科翼科技有限公司 | A kind of glass of protection eyesight |
| CN106827726B (en) * | 2017-01-24 | 2019-04-16 | 杭州科翼科技有限公司 | A kind of glass for protecting eyesight |
| CN107059415A (en) * | 2017-04-12 | 2017-08-18 | 三元控股集团有限公司 | A kind of preparation method of the multifunctional conductive fabric based on photocuring technology |
| CN108504146A (en) * | 2018-04-04 | 2018-09-07 | 江南大学 | A kind of UV photocurings antifoggant and preparation method thereof |
| CN108504146B (en) * | 2018-04-04 | 2019-08-20 | 江南大学 | A kind of UV photocuring antifoggant and preparation method thereof |
| CN109338735A (en) * | 2018-11-29 | 2019-02-15 | 牛墨石墨烯应用科技有限公司 | A kind of heat-insulated grid cloth of graphene fiber and preparation method thereof |
| CN109338735B (en) * | 2018-11-29 | 2020-12-08 | 牛墨石墨烯应用科技有限公司 | Graphene fiber heat-insulation mesh cloth and preparation method thereof |
| CN114045059A (en) * | 2021-12-10 | 2022-02-15 | 广州大学 | Electrophoretic paint capable of preventing liquid and bacteria from adhering and application method thereof |
| CN115558408A (en) * | 2022-10-16 | 2023-01-03 | 杭州梵因科技有限公司 | Preparation method of high-performance anti-fog cream |
| CN115558408B (en) * | 2022-10-16 | 2023-10-24 | 杭州梵因科技有限公司 | Preparation method of high-performance anti-fog cream |
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