CN106009712A - Photosensitive resin used in supporting materials, and preparation method thereof - Google Patents

Photosensitive resin used in supporting materials, and preparation method thereof Download PDF

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Publication number
CN106009712A
CN106009712A CN201610366906.4A CN201610366906A CN106009712A CN 106009712 A CN106009712 A CN 106009712A CN 201610366906 A CN201610366906 A CN 201610366906A CN 106009712 A CN106009712 A CN 106009712A
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China
Prior art keywords
photosensitive resin
backing material
phase change
low temperature
acrylate
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Granted
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CN201610366906.4A
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Chinese (zh)
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CN106009712B (en
Inventor
曾皖生
乔羽
谭诚
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JIANGSU DUNCHAO ELECTRONIC TECHNOLOGY CO LTD
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JIANGSU DUNCHAO ELECTRONIC TECHNOLOGY CO LTD
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L91/00—Compositions of oils, fats or waxes; Compositions of derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/14—Esters having no free carboxylic acid groups, e.g. dialkyl maleates or fumarates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/20—Esters containing oxygen in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L35/02—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L91/00—Compositions of oils, fats or waxes; Compositions of derivatives thereof
    • C08L91/06—Waxes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
    • C08F220/286—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety and containing polyethylene oxide in the alcohol moiety, e.g. methoxy polyethylene glycol (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/343—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate in the form of urethane links
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/14—Esters having no free carboxylic acid groups, e.g. dialkyl maleates or fumarates
    • C08F222/145—Esters having no free carboxylic acid groups, e.g. dialkyl maleates or fumarates the ester chains containing seven or more carbon atoms

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

The invention discloses a photosensitive resin used in supporting materials, and a preparation method thereof. The photosensitive resin comprises 20-50wt% of oligomer, 20-45wt% of a low temperature phase change substance, 1-5wt% of a photoinitiator, 10-15wt% of an active diluent, 0.1-2wt% of an antifoaming agent and 0.1-2wt% of a leveling agent. The preparation method of the photosensitive resin comprises the following steps: 1, preparing raw materials according to above proportions; and 2, uniformly mixing all components to prepare the photosensitive resin material used in supporting material printing and having a viscosity of 10-15 centipoises. An inkjet UV cure molding technology can remove a UV cured material, and jelly-shaped resin with certain supporting ability and being different models is formed after same-intensity ultraviolet irradiation. The photosensitive resin can be used as a model supporting and model filling material of the UV cure molding technology, and can be removed through using water or other methods in the model post-treatment process.

Description

A kind of photosensitive resin for backing material and preparation method thereof
Technical field
The present invention relates to a kind of photosensitive resin that may be used for backing material, be specifically related to a kind of photocuring 3D printer For the photosensitive resin of backing material, belong to photo-curing material technical field.
Background technology
It is the photosensitive resin ink-jet that will be able to solidify with UV that the 3D of Vehicles Collected from Market circulation prints ink-jet UV cure process Method sprays, and is solidified by the irradiation of UV light, the most in layer superposition and form required model, owing to model has unsettled Part and hollow space, the therefore UV curing photosensitive resin material of inkjet printing, be divided into solid material with backing material, entity material Material prints model entity, the overhanging portion of backing material printer model and the hollow space of model, after model has printed, After rinsing with hot water or other materials, backing material is removed, and exposes the cavity in model or overhanging portion, completes model Make.
The most domestic do not have this satisfactory photosensitive resin for backing material, by external monopolization so that I State's photocuring 3D printing technique is very limited.
Summary of the invention
It is an object of the invention to, it is provided that a kind of for backing material photosensitive resin.
The technical scheme that the present invention provides is as follows: a kind of photosensitive resin for backing material, in percentage by weight, Consist of the following components:
Oligomer 20-50%；
Low temperature phase change material 20-45%；
Light trigger 1-5%；
Reactive diluent 10-15%；
Defoamer 0.1-2%；
Levelling agent 0.1-2%.
Described oligomer be described oligomer be Polyethylene Glycol acrylic monoester, carboxy ethyl acrylate, carbamate Acrylate, acrylic acid norbornene ester, 1-Octyl acrylate certain herbaceous plants with big flowers ester, propylene glycol diacrylate, glycol diacrylate, 3 third Omega-diol diacrylate, propoxylation season Diacrylate, ethoxylated trimethylolpropane triacrylate, glycerol Change triacrylate, trimethylolpropane trimethacrylate, contracting two trihydroxy methyl tetraacrylate, the acid of polyether-modified tetrapropylene Ester, pentaerythritol acrylate and pentaerythritol triacrylate Epoxy acrylate mixture.
Described light trigger is double 2,6-bis-fluoro-3-pyrroles phenyl titanocenes, double-2,4,6-trimethylbenzoyl-oxygen Change phosphine, 2,4,6-trimethylbenzoy-dipheny phosphine oxide, 2 isopropyl thioxanthones, 2-hydroxy-2-methyl-1-phenyl- The one of 1-acetone or mixture.
Described low temperature phase change material transition temperature range from solid-state to liquid is at 40 ~ 90 DEG C.
Described low temperature phase change material is lanoline, oils and fats, wax, vaseline one or mixture.
Described light trigger, adds the light trigger less than photocuring monomer resin quality 1-5% in photosensitive resin.
Wherein, low temperature phase change material is the core place of the present invention, and low temperature phase change material state under room temperature state is Solidification jelly state, does not has mobility, and after being heated to more than 40 DEG C, low temperature phase change material is changed into liquid by solidifying jelly state State, viscosity is substantially reduced, then after being mixed with photosensitive resin by low temperature phase change material at a temperature of this, the mixture prepared is applicable In the photosensitive resin backing material that 3D prints.
A kind of photosensitive resin for backing material, its preparation method includes following step:
(1) raw material is prepared:
(2) use heating in water bath mixing container, under conditions of lucifuge, by oligomer, low temperature phase change material, add the most successively Enter, use magnetic agitation at the uniform velocity to stir, add light trigger, reactive diluent, defoamer and levelling agent, stir with magnetic force Mix speed thoroughly to stir, the photosensitive resin that can be applied to backing material can be prepared.
Beneficial effect
The advantage of the photosensitive resin of the present invention, is can to spray planar graph on request by piezo jets, after irradiating with ultraviolet, Form one layer and have certain structural strength and certain thickness resin pattern thin film, by this superposition from level to level, use this light Quick resin, just can print model miscellaneous, supports the model detail of strengthening printing shaping, improves the general performance of model Power, thus improve the model quality of ink-jet UV cure process printing shaping the most comprehensively.
Photosensitive resin for backing material prepared by the present invention, belongs to domestic precedent, compared with same kind of products at abroad, On the premise of various performances are guaranteed, cost is greatly lowered, it is possible to meet the use demand of more users at home and abroad.
Detailed description of the invention
Below in conjunction with test examples and detailed description of the invention, the present invention is described in further detail.But should be by this Being interpreted as that the scope of the above-mentioned theme of the present invention is only limitted to below example, every technology realized based on present invention is equal Belong to the scope of the present invention.
Embodiment one, a kind of photosensitive resin for backing material, its raw material in percentage by weight, by following groups It is grouped into:
Oligomer 41.5%
Lanoline 45%
Light trigger 2.5%
Reactive diluent 10%
Defoamer 0.5%
Levelling agent 0.5%
Prepare this example photosensitive resin for backing material, use the few beaker of thermostat water bath heating, by oligomer, activity dilution Agent addition stirs, and is controlled by bath temperature to 45-55 degree Celsius, preferably 50 degrees Celsius, adds lanoline, stirs, Afterwards by light trigger, defoamer with levelling agent addition, mix homogeneously, the light trigger used is 2.5%, prepared light Quick resin is test result in photocuring 3D printer, has reached the performance indications of external product.
Embodiment two, a kind of photosensitive resin for solid material, its raw material in percentage by weight, is grouped by following groups Become:
Oligomer 47%
Lanoline 35%；
Light trigger 2%；
Reactive diluent 15%；
Defoamer 0.5%
Levelling agent 0.5%
Prepare this example photosensitive resin for backing material, use the few beaker of thermostat water bath heating, by oligomer, activity dilution Agent addition stirs, and is controlled by bath temperature to 45-55 degree Celsius, preferably 50 degrees Celsius, adds lanoline, stirs, Afterwards by light trigger, defoamer with levelling agent addition, mix homogeneously, the light trigger used is 2%, and prepared is photosensitive Resin is test result in photocuring 3D printer, has reached the performance indications of external product.
The above, the only detailed description of the invention of the present invention, but protection scope of the present invention is not limited thereto, and any Those of ordinary skill in the art in the technical scope that disclosed herein, the change can expected without creative work Or replace, within all should being covered by protection scope of the present invention, should be with claims institute in this protection scope of the present invention The protection domain of limit is as the criterion.

Claims (6)

1. the photosensitive resin for backing material, it is characterised in that in percentage by weight, consist of the following components : oligomer 20-50%, low temperature phase change material 20-45%, light trigger 1-5%, reactive diluent 10-15%, defoamer 0.1- 2%, levelling agent 0.1-2%, the viscosity of photosensitive resin is 10-15 centipoise, surface tension 30-36 mN/m.
A kind of photosensitive resin for backing material the most according to claim 1, it is characterised in that described oligomer is poly- Glycol propylene acid monoester, carboxy ethyl acrylate, urethane acrylate, acrylic acid norbornene ester, 1-Octyl acrylate certain herbaceous plants with big flowers Ester, propylene glycol diacrylate, glycol diacrylate, tripropylene glycol diacrylate, propoxylation season pentanediol two Acrylate, ethoxylated trimethylolpropane triacrylate, glycerinated triacrylate, trimethylolpropane tris acrylic acid Ester, contracting two trihydroxy methyl tetraacrylate, polyether-modified tetraacrylate, pentaerythritol acrylate and tetramethylolmethane 3 third Olefin(e) acid ester, epoxy acrylate etc..
A kind of photosensitive resin for backing material the most according to claim 1, it is characterised in that described light trigger is Double 2,6-bis-fluoro-3-pyrroles phenyl titanocenes, double-2,4,6-trimethylbenzoyl-phosphine oxide, 2,4,6-trimethylbenzene first Acyl group-diphenyl phosphine oxide, 2 isopropyl thioxanthones, the one of 2-hydroxy-2-methyl-1-phenyl-1-acetone or mixing Thing.
A kind of photosensitive resin for backing material the most according to claim 1, it is characterised in that low temperature phase change material from Solid-state to the transition temperature range of liquid at 40 ~ 90 DEG C.
A kind of photosensitive resin for backing material the most according to claim 1, it is characterised in that
Described low temperature phase change material is lanoline, oils and fats, wax, vaseline one or mixture.
6. according to the preparation method of a kind of photosensitive resin for backing material described in claim 1 to 5, it is characterised in that Including following step:
Prepare raw material；
Use heating in water bath mixing container, under conditions of lucifuge, by oligomer, low temperature phase change material, be sequentially added in batches, make At the uniform velocity stir by magnetic agitation, add light trigger, reactive diluent, defoamer and levelling agent, even by magnetic agitation Speed stirs.
CN201610366906.4A 2016-05-30 2016-05-30 A kind of photosensitive resin and preparation method thereof being used to support material Active CN106009712B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114379076A (en) * 2022-01-15 2022-04-22 深圳市元景工艺品有限公司 Preparation process of novel handheld doll based on environment-friendly processing

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7329379B2 (en) * 2003-11-04 2008-02-12 Hewlett-Packard Development Company, Lp. Method for solid freeform fabrication of a three-dimensional object
US20150344694A1 (en) * 2014-05-30 2015-12-03 3D Systems, Incorporated Water dispersible support materials for 3d printing

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7329379B2 (en) * 2003-11-04 2008-02-12 Hewlett-Packard Development Company, Lp. Method for solid freeform fabrication of a three-dimensional object
US20150344694A1 (en) * 2014-05-30 2015-12-03 3D Systems, Incorporated Water dispersible support materials for 3d printing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114379076A (en) * 2022-01-15 2022-04-22 深圳市元景工艺品有限公司 Preparation process of novel handheld doll based on environment-friendly processing

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