CN105992404B - Far infrared transmission film layer and its manufacturing method, electric heating plate and cooking apparatus - Google Patents
Far infrared transmission film layer and its manufacturing method, electric heating plate and cooking apparatus Download PDFInfo
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- CN105992404B CN105992404B CN201510077182.7A CN201510077182A CN105992404B CN 105992404 B CN105992404 B CN 105992404B CN 201510077182 A CN201510077182 A CN 201510077182A CN 105992404 B CN105992404 B CN 105992404B
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Abstract
The present invention provides a kind of far infrared transmission film layer and its manufacturing methods, electric heating plate and cooking apparatus, wherein, far infrared transmission film layer is made through treatment process on the surface of 500~600 degree of insulating bodies of high temperature using the mixture comprising manganese dioxide, nickel sesquioxide and chrome green, then making the far infrared transmission film layer and insulating body, annealed film-forming process is handled be attached to the far infrared transmission film layer on insulating body again.The manufacturing method of far infrared transmission film layer provided by the invention is simple and convenient to operate, manufactured far infrared transmission film layer and electric membranous layer are used cooperatively and radiant heat energy can be converted into far infrared heat energy, realize the rapid raising of temperature, the temperature of humidity discharging loss can be reduced, enhancing is heated absorbent speed, reduces heat-energy losses, to effectively improve radiation thermal conduction efficiency, reach energy-efficient purpose, and it is made preferably to be satisfied with country's requirement energy-efficient for product.
Description
Technical field
The present invention relates to field of household appliances, more specifically, are related to manufacturing method, the Yi Zhongyuan of a kind of far infrared transmission film layer
Infrared emission film layer, a kind of electric heating plate and a kind of cooking apparatus.
Background technique
Currently, electric heating appliance product (such as electromagnetic oven, electric cooker cooking apparatus) is essentially all using tradition both at home and abroad
Electricity iron a heating technique and electromagnetic heating technique, however, the technology electric-thermal conversion efficiency it is relatively low, cannot fully meet
National energy-saving environmental requirement causes a large amount of energy waste.
Therefore, the electric-thermal conversion Energy Efficiency Ratio of electric heating appliance product how is improved to improve the utilization rate of the energy, keeps it more preferable
It is satisfied with the technical issues of requirement of national energy-saving environmental protection is those skilled in the art's current urgent need to resolve in ground.
Summary of the invention
The present invention is directed at least solve one of the technical problems existing in the prior art.
For this purpose, the present invention provides a kind of manufacturing methods of far infrared transmission film layer, using far infrared made of this method
Transmitting film layer and electric membranous layer realize energy-efficient purpose, conform better to state with the use of electric-thermal conversion Energy Efficiency Ratio can be improved
Family's requirement energy-efficient for product, the practicality are significant.
To achieve the above object, the embodiment of one aspect of the invention provides a kind of manufacturer of far infrared transmission film layer
Method, using the mixture comprising manganese dioxide, nickel sesquioxide and chrome green on the surface of insulating body through treatment process
Far infrared transmission film layer is made, then making the far infrared transmission film layer and insulating body, annealed film-forming process is handled to make again
The far infrared transmission film layer is attached on the insulating body.
The manufacturing method of far infrared transmission film layer provided by the invention is simple and convenient to operate, manufactured far infrared transmission film
Layer, with the use of that radiant heat energy can be converted into far infrared heat energy, realizes the rapid raising of temperature with electric membranous layer, can the row of reduction
The temperature of tide loss, enhancing are heated absorbent speed, reduce heat-energy losses, so that radiation thermal conduction efficiency is effectively improved,
Reach energy-efficient purpose, and it is made preferably to be satisfied with country's requirement energy-efficient for product.
In addition, the manufacturing method for the far infrared transmission film layer that the above embodiment of the present invention provides also has following additional skill
Art feature:
According to one embodiment of present invention, the manganese dioxide, the nickel sesquioxide and the chrome green
Mass ratio is 54~62:15~23:19~27, and the spectral emissivity and radiation efficiency of far infrared transmission film layer can be improved,
The practicality is more preferable.
According to one embodiment of present invention, the manganese dioxide, the nickel sesquioxide and the chrome green
Mass percent is 58:19:23, is used cooperatively using far infrared transmission film layer prepared by the parameter with electric membranous layer, spectrum
Emissivity and radiation efficiency are good, and heat utilization efficiency is high, and heat utilization efficiency can reach 96% or more.
According to one embodiment of present invention, the treatment process includes evaporation process, depositing operation, in spraying process
It is at least one.
According to one embodiment of present invention, the treatment process includes abrasive material technique, calcine technology, spraying process and does
Drying process.
According to one embodiment of present invention, the treatment temperature of the annealing film-forming process is 500~600 degree, described to move back
The processing time of igneous membrane process is 15~25min；Using the stability and electricity of far infrared transmission film layer made of above-mentioned parameter
Performance is good, heat utilization efficiency is high.
The embodiment of second aspect of the present invention provides a kind of far infrared transmission film layer, and the far infrared transmission film layer uses
The manufacturing method of far infrared transmission film layer described in any of the above-described embodiment is made.
Far infrared transmission film layer provided by the invention is used cooperatively with electric membranous layer, radiant heat energy can be converted into far infrared
Thermal energy, realizes the rapid raising of temperature, and reduce humidity discharging loss temperature, enhancing be heated absorbent speed, reduce thermal energy
Loss, to effectively improve radiation thermal conduction efficiency, reaches energy-efficient purpose, and it is made preferably to be satisfied with country for product
Energy-efficient requirement, manufactured cooking apparatus practicability are more significant.
The embodiment of third aspect present invention provides a kind of electric heating plate, comprising: disk body；With hotting mask layer, it is attached to institute
It states on disk body；Wherein, the hotting mask layer includes far infrared transmission film layer described in electric membranous layer and above-described embodiment.
Radiant heat energy is converted into far infrared heat energy in use by electric heating plate provided by the invention, hotting mask layer, real
The rapid raising of existing cookware temperature, and reduce the temperature of humidity discharging loss, enhancing is heated absorbent speed, reduces thermal energy damage
It loses, to effectively improve radiation thermal conduction efficiency, the thermal efficiency can achieve 96% or more, reach energy-efficient purpose, simultaneously
Meet country's requirement energy-efficient for product, manufactured cooking apparatus practicability is more significant.
In addition, the electric heating plate that the above embodiment of the present invention provides also has following additional technical characteristic:
According to one embodiment of present invention, the disk body includes: upper plate, and the electric membranous layer is attached to the upper disk
In the lower disk of body, the far infrared transmission film layer is attached on the lower film surface of the electric membranous layer；And lower plate, it is located at described
The lower section of upper plate is simultaneously mutually assembled with the upper plate；Preferably to utilize thermal energy, quickly heating is placed in lower plate upper disk surface
On pot body.
Certainly, hotting mask layer can also be attached on the upper disk surface of upper plate, or be attached to lower plate upper disk surface or under
In disk etc.；The purpose of the application can be achieved, objective is without departing from design philosophy of the invention, and details are not described herein, but answers
Belong in the protection scope of the application.
Far infrared transmission film layer can also be attached in the lower disk of upper plate, and electric membranous layer is attached to far infrared transmission film layer
Subsurface on；It can also realize the purpose of the application, objective is without departing from design philosophy of the invention, and details are not described herein, but
It should belong in the protection scope of the application.
According to one embodiment of present invention, the electric heating plate further include: electrode film, the electrode film are attached to described
Between far infrared transmission film layer and the electric membranous layer；And electrode, it is mounted on the upper disk surface of the lower plate, and the electrode
Upper end is electrically connected with the electrode film, lower end passes through the lower plate and extends downwardly and be connected with power supply source, passes through institute
Power supply source is stated to power to the electric membranous layer；It is also possible to through the power supply source come to the electric membranous layer and described remote red
Outer transmitting film layer power supply.
Certainly, electrode film can also be substituted for the electric conductors such as power supply line, can also realize the purpose of the application, it is no longer superfluous herein
It states, but should belong in protection scope of the present invention.
According to one embodiment of present invention, there is stepped hole, the lower end of the electrode on the upper disk surface of the lower plate
It is extended downwardly across the stepped hole, the upper end of the electrode is supported on the cascaded surface of the stepped hole；Wherein, the electricity
Be provided with spring between the upper end of pole and the cascaded surface of the stepped hole, the upper end of electrode described in the spring supporting, so that its
It is pressed on the electrode film, avoids the problem that occurring virtual connection touching between electrode and electrode film, electrical connection properties are more preferable in fact.
According to one embodiment of present invention, hotting mask layer shape in a ring, the electrode film, the electrode and the rank
Terraced Kong Jun includes symmetrically arranged two, and the inner end of two electrode films is located at the inner edge of the hotting mask layer, outer end position
At the outside of the hotting mask layer, the upper surface correspondence of two electrodes is pressed at the outside of two electrode films, to utilize
Entire electric membranous layer is powered on, and realizes that it is maximally utilized.
According to one embodiment of present invention, the upper plate is glass carrier, and the lower plate is ceramic monolith.
Be also possible to: the lower plate is glass carrier, and the upper plate is ceramic monolith；It can also realize the mesh of the application
's.
According to one embodiment of present invention, two electrode films are made up of exposure mask sputtering technology, and its thickness is 3
~10 μm；By 0.5um thickness at inner edge, the linear function changing rule of 1.5um thickness at outside is sprayed the hotting mask layer
It applies, and spray power every square centimeter is 3~5 watts, in order to avoid influence the unbalanced problem of face temperatures.
And the junction of the upper surface of the electrode film and electrode of alloy firm, total current and the operating current that can bear are close
Degree should be greater than or equal to 3.0 times or more of electric membranous layer general power；More than cascaded surface electrode upper with a thickness of 1.0 millimeters,
In the case where acting on by spring force, spring is made to jack up the close contact of electrode and electrode film, realizes contact of the electrode with electrode film
Connection, the lower end of electrode are closely joined together with power supply source again, and (nano-far-infrared) electric heating plate power supply thus can be improved
Safety, stability and the integrity problem of connection.
The resistivity of the electric membranous layer prepared under this condition is up to 4 × 10-4Ω cm, it is seen that light transmission rate is higher than 90%, function
Rate density is average up to 32W/cm2, ensure that infrared electrothermal disk power stability and reliability.
Wherein, the electric heating plate of the application is the electric heating plate of nano-far-infrared formula, it may be assumed that electric membranous layer is nano-far-infrared
The electric membranous layer of formula.
The embodiment of fourth aspect present invention provides a kind of cooking apparatus, includes electricity described in any of the above-described embodiment
Heating dish.
Wherein, the cooking apparatus includes electromagnetic oven, electric cooker and electric pressure cooking saucepan etc., and the cooking apparatus have it is above-mentioned
The all advantages of any embodiment, details are not described herein.
Additional aspect and advantage of the invention will become obviously in following description section, or practice through the invention
Recognize.
Detailed description of the invention
Above-mentioned and/or additional aspect of the invention and advantage will become from the description of the embodiment in conjunction with the following figures
Obviously and it is readily appreciated that, in which:
Fig. 1 is the schematic cross-sectional view of electric heating plate described in one embodiment of the invention；
Fig. 2 is the decomposed structural schematic diagram of electric heating plate shown in FIG. 1, wherein electric membranous layer is attached to upper plate
Lower disk on.
Wherein, the corresponding relationship in Fig. 1 and Fig. 2 between appended drawing reference and component names are as follows:
1 far infrared transmission film layer, 2 upper plates, 3 lower plates, 4 electrode films, 5 electrodes, 6 stepped holes, 7 springs.
Specific embodiment
To better understand the objects, features and advantages of the present invention, with reference to the accompanying drawing and specific real
Applying mode, the present invention is further described in detail.It should be noted that in the absence of conflict, the implementation of the application
Feature in example and embodiment can be combined with each other.
In the following description, numerous specific details are set forth in order to facilitate a full understanding of the present invention, still, the present invention may be used also
Implement in a manner of using other than the one described here, therefore, protection scope of the present invention is not by following public tool
The limitation of body embodiment.
The manufacturing method of far infrared transmission film layer described in some embodiments of the invention is described with reference to the accompanying drawing.
The embodiment of first aspect of the present invention provides a kind of manufacturing method of far infrared transmission film layer, using including two
Far infrared transmission is made through treatment process on the surface of insulating body in the mixture of manganese oxide, nickel sesquioxide and chrome green
Film layer, then making the far infrared transmission film layer and insulating body, annealed film-forming process is handled to make the far infrared transmission again
Film layer is attached on the insulating body.
The manufacturing method of far infrared transmission film layer provided by the invention is simple and convenient to operate, manufactured far infrared transmission film
Layer, with the use of that radiant heat energy can be converted into far infrared heat energy, realizes the rapid raising of temperature with electric membranous layer, can the row of reduction
The temperature of tide loss, enhancing are heated absorbent speed, reduce heat-energy losses, so that radiation thermal conduction efficiency is effectively improved,
Reach energy-efficient purpose, and it is made preferably to be satisfied with country's requirement energy-efficient for product.
Using far infrared transmission film layer made of the method, when being used cooperatively with electric membranous layer, overall impedance is with temperature
The raising of degree and film resistance reduces, the stability of far infrared transmission film layer and the resistance of Electric radiant Heating Film tunic can be effectively improved, to solve
The far-infrared electric film layer and electric membranous layer power stability problem.
In addition, the manufacturing method for the far infrared transmission film layer that the above embodiment of the present invention provides also has following additional skill
Art feature:
In one embodiment of the present of invention, the matter of the manganese dioxide, the nickel sesquioxide and the chrome green
Amount ratio is 54~62:15~23:19~27, and the spectral emissivity and radiation efficiency of far infrared transmission film layer can be improved,
Practicability is more preferable.
Preferably, the mass percent of the manganese dioxide, the nickel sesquioxide and the chrome green is 58:
19:23 is used cooperatively using far infrared transmission film layer prepared by the parameter with electric membranous layer, spectral emissivity and heat radiation effect
Rate is good, and heat utilization efficiency is high, and heat utilization efficiency can reach 96% or more.
In one embodiment of the present of invention, the treatment process include evaporation process, depositing operation, in spraying process extremely
Few one kind.
Specifically, the treatment process includes abrasive material technique, calcine technology, spraying process and drying process, manufactured remote
Infrared emission membranous layer stability and electrical property are preferable.
In addition, it is described annealing film-forming process treatment temperature be 500~600 degree, it is described anneal film-forming process processing when
Between be 15~25min；It is high using the stability of far infrared transmission film layer made of above-mentioned parameter and good electrical property, heat utilization efficiency.
In first specific embodiment of the invention, the manganese dioxide, the nickel sesquioxide and three oxidation two
The mass ratio of chromium is 54:15:19, and the treatment temperature of the annealing film-forming process is 500 degree, the processing time is 15min, is adopted respectively
Electric membranous layer is prepared with spray coating method, sedimentation and vapour deposition method.
In second specific embodiment of the invention, the manganese dioxide, the nickel sesquioxide and three oxidation two
The mass ratio of chromium is 62:23:27, and the treatment temperature of the annealing film-forming process is 600 degree, the processing time is 25min, is adopted respectively
Electric membranous layer is prepared with spray coating method, sedimentation and vapour deposition method.
In third specific embodiment of the invention, the manganese dioxide, the nickel sesquioxide and three oxidation two
The mass ratio of chromium is 58:19:23, and the treatment temperature of the annealing film-forming process is 550 degree, the processing time is 20min, is adopted respectively
Electric membranous layer is prepared with spray coating method, sedimentation and vapour deposition method.
Radiant heat energy can be converted into far infrared heat energy by the electric membranous layer prepared using above-mentioned three kinds of methods, realize temperature
Degree rapid raising, and reduce humidity discharging loss temperature, enhancing be heated absorbent speed, reduce heat-energy losses, efficiency
Utilization rate is up to 90% or more.
The embodiment of second aspect of the present invention provides a kind of far infrared transmission film layer, and the far infrared transmission film layer uses
The manufacturing method of far infrared transmission film layer described in any of the above-described embodiment is made.
Far infrared transmission film layer provided by the invention is used cooperatively with electric membranous layer, radiant heat energy can be converted into far infrared
Thermal energy, realizes the rapid raising of temperature, and reduce humidity discharging loss temperature, enhancing be heated absorbent speed, reduce thermal energy
Loss, to effectively improve radiation thermal conduction efficiency, reaches energy-efficient purpose, and it is made preferably to be satisfied with country for product
Energy-efficient requirement, manufactured cooking apparatus practicability are more significant.
The embodiment of third aspect present invention provides a kind of electric heating plate, as depicted in figs. 1 and 2, comprising: disk body；With
Hotting mask layer is attached on the disk body；Wherein, the hotting mask layer includes the hair of far infrared described in electric membranous layer and above-described embodiment
Penetrate film layer.
Radiant heat energy is converted into far infrared heat energy in use by electric heating plate provided by the invention, hotting mask layer, real
The rapid raising of existing cookware temperature, and reduce the temperature of humidity discharging loss, enhancing is heated absorbent speed, reduces thermal energy damage
It loses, to effectively improve radiation thermal conduction efficiency, the thermal efficiency can achieve 96% or more, reach energy-efficient purpose, simultaneously
Meet country's requirement energy-efficient for product, manufactured cooking apparatus practicability is more significant.
Using electric heating plate made of the method, hotting mask layer impedance film resistance reduction with the raising of temperature can be effective
The stability for improving the resistance of hotting mask tunic, to solve the problems, such as the hotting mask layer power stability.
In addition, the electric heating plate that the above embodiment of the present invention provides also has following additional technical characteristic:
In one embodiment of the present of invention, as depicted in figs. 1 and 2, the disk body includes: upper plate 2, the electric membranous layer
It is attached in the lower disk of the upper plate 2, the far infrared transmission film layer is attached on the lower film surface of the electric membranous layer；With
First disk body 3, positioned at the upper plate 2 lower section and with 2 phase of upper plate assemble；Preferably to utilize thermal energy, quickly heat
The pot body being placed on first 3 upper disk surface of disk body.
Certainly, hotting mask layer can also be attached on the upper disk surface of upper plate 2, or set up first disk body 3 upper disk surface or
In lower disk etc.；The purpose of the application can be achieved, objective is without departing from design philosophy of the invention, and details are not described herein, but
It should belong in the protection scope of the application.
Far infrared transmission film layer 1 can also be attached in the lower disk of upper plate 2, and electric membranous layer is attached to far infrared transmission film
On the subsurface of layer 1；It can also realize the purpose of the application, objective is without departing from design philosophy of the invention, and details are not described herein,
But it should belong in the protection scope of the application.
Further, as depicted in figs. 1 and 2, the electric heating plate further include: electrode film 4, the electrode film 4 are attached to
Between the far infrared transmission film layer and the electric membranous layer；With electrode 5, it is mounted on the upper disk surface of the first disk body 3, and described
The upper end of electrode 5 is electrically connected with the electrode film 4, lower end passes through the first disk body 3 and extends downwardly and be connected with power supply source
It connects, is powered by the power supply source to the electric membranous layer；It is also possible to through the power supply source come to the electric membranous layer
It powers with the far infrared transmission film layer 1.
Certainly, electrode film 4 electric conductors such as power supply line can also be substituted for, the purpose of the application can also be realized, herein no longer
It repeats, but should belong in protection scope of the present invention.
Still further, as depicted in figs. 1 and 2, there is stepped hole 6, the electrode 5 on the upper disk surface of elder generation's disk body 3
Lower end pass through the stepped hole 6 and extend downwardly, the upper end of the electrode 5 is supported on the cascaded surface of the stepped hole 6；Its
In, spring 7 is provided between the upper end of the electrode 5 and the cascaded surface of the stepped hole 6, the spring 7 supports the electrode 5
Upper end, so that it is pressed on the electrode film 4, avoid the problem that occurring virtual connection touching between electrode 5 and electrode film 4, in fact
Electrical connection properties are more preferable.
Wherein, shape, the electrode film 4, the electrode 5 and the stepped hole 6 include symmetrical to the hotting mask layer in a ring
Two be arranged, and the inner end of two electrode films 4 is located at the inner edge of the hotting mask layer, outer end is located at the hotting mask layer
At outside, the upper surface correspondence of two electrodes 5 is pressed at the outside of two electrode films 4, to utilize entire electric membranous layer
It is powered on, realizes that it is maximally utilized.
Furthermore it is preferred that the upper plate 2 is glass carrier, elder generation's disk body 3 is ceramic monolith.
Be also possible to: elder generation's disk body 3 is glass carrier, and the upper plate 2 is ceramic monolith；It can also realize the application's
Purpose.
Specifically, the cross section of the upper end of two electrodes 5 is in the elliptical shape of 8.0mm*10.0mm；Two electrodes
Film 4 is made up of exposure mask sputtering technology, and its thickness is 6.0 μm, width 10.0mm, length are 46.0~56.0mm；Institute
Stating hotting mask layer, the linear function changing rule of 1.5um thickness at outside is sprayed by 0.5um thickness at inner edge, and every square
Centimetre spray power be 3~5 watts, in order to avoid influence the unbalanced problem of face temperatures.
And the junction of the upper surface of the electrode film 4 of alloy firm and electrode 5, total current and the operating current that can bear
Density should be greater than or equal to 3.0 times or more of electric membranous layer general power；More than cascaded surface 5 top of electrode with a thickness of 1.0 millis
Rice makes spring 7 jack up the close contact of electrode 5 and electrode film 4 in the case where acting on by 7 elastic force of spring, realizes electrode 5 and electrode
The lower end of the contact connectio of film 4, electrode 5 is closely joined together with power supply source again, and (nano-far-infrared) electricity thus can be improved
Safety, stability and the integrity problem of heating dish power supply connection.
The resistivity of the electric membranous layer prepared under this condition is up to 4 × 10-4Ω cm, it is seen that light transmission rate is higher than 90%, function
Rate density is average up to 32W/cm2, ensure that infrared electrothermal disk power stability and reliability.
Wherein, the electric heating plate of the application is the electric heating plate of nano-far-infrared formula, it may be assumed that electric membranous layer is nano-far-infrared
The electric membranous layer of formula.
The embodiment of fourth aspect present invention provides a kind of cooking apparatus, includes electricity described in any of the above-described embodiment
Heating dish.
Wherein, the cooking apparatus includes electromagnetic oven, electric cooker and electric pressure cooking saucepan etc., and the cooking apparatus have it is above-mentioned
The all advantages of any embodiment, details are not described herein.
In conclusion the manufacturing method of far infrared transmission film layer provided by the invention is simple and convenient to operate, it is manufactured remote red
Outer transmitting film layer and electric membranous layer realize the rapid raising of temperature with the use of that radiant heat energy can be converted into far infrared heat energy,
Can reduce humidity discharging loss temperature, enhancing be heated absorbent speed, reduce heat-energy losses, thus effectively improve radiant heat biography
Efficiency is led, energy-efficient purpose is reached, and it is made preferably to be satisfied with country's requirement energy-efficient for product.
In the description of the present invention, term " installation ", " connected ", " connection ", " fixation " etc. shall be understood in a broad sense, example
Such as, " connection " may be fixed connection or may be dismantle connection, or integral connection；It can be directly connected, it can also be with
Indirectly connected through an intermediary.For the ordinary skill in the art, above-mentioned art can be understood as the case may be
The concrete meaning of language in the present invention.
In the description of this specification, the description of term " one embodiment ", " some embodiments ", " specific embodiment " etc.
Mean that particular features, structures, materials, or characteristics described in conjunction with this embodiment or example are contained at least one reality of the invention
It applies in example or example.In the present specification, schematic expression of the above terms are not necessarily referring to identical embodiment or reality
Example.Moreover, description particular features, structures, materials, or characteristics can in any one or more of the embodiments or examples with
Suitable mode combines.
The foregoing is only a preferred embodiment of the present invention, is not intended to restrict the invention, for the skill of this field
For art personnel, the invention may be variously modified and varied.All within the spirits and principles of the present invention, made any to repair
Change, equivalent replacement, improvement etc., should all be included in the protection scope of the present invention.
Claims (14)
1. a kind of manufacturing method of far infrared transmission film layer, which is characterized in that use and include manganese dioxide, nickel sesquioxide and three
Far infrared transmission film layer is made through treatment process on the surface of insulating body in the mixture for aoxidizing two chromium, then makes the far infrared
Emit the annealed film-forming process processing again of film layer and insulating body；The manganese dioxide, the nickel sesquioxide and three oxygen
The mass ratio for changing two chromium is 54~62:15~23:19~27.
2. the manufacturing method of far infrared transmission film layer according to claim 1, which is characterized in that
The mass percent of the manganese dioxide, the nickel sesquioxide and the chrome green is 58:19:23.
3. the manufacturing method of far infrared transmission film layer according to claim 1, which is characterized in that
The treatment process includes at least one of evaporation process, depositing operation, spraying process.
4. the manufacturing method of far infrared transmission film layer according to claim 1, which is characterized in that
The treatment process includes abrasive material technique, calcine technology, spraying process and drying process.
5. the manufacturing method of far infrared transmission film layer according to any one of claim 1 to 4, which is characterized in that
The treatment temperature of the annealing film-forming process is 500~600 degree, the processing time of the annealing film-forming process for 15~
25min。
6. a kind of far infrared transmission film layer, which is characterized in that the far infrared transmission film layer is used as appointed in claim 1 to 5
The manufacturing method of far infrared transmission film layer described in one is made.
7. a kind of electric heating plate characterized by comprising
Disk body；With
Hotting mask layer is attached on the disk body；
Wherein, the hotting mask layer includes electric membranous layer and far infrared transmission film layer as claimed in claim 6.
8. electric heating plate according to claim 7, which is characterized in that the disk body includes:
Upper plate, the far infrared transmission film layer are attached in the lower disk of the upper plate, and the electric membranous layer is attached to institute
On the subsurface for stating far infrared transmission film layer；With
Lower plate, positioned at the upper plate lower section and mutually assembled with the upper plate.
9. electric heating plate according to claim 8, which is characterized in that further include:
Electrode film, the electrode film are attached between the far infrared transmission film layer and the electric membranous layer；With
Electrode is mounted on the upper disk surface of the lower plate, and the upper end of the electrode is electrically connected with the electrode film, lower end is worn
It crosses the lower plate and extends downwardly.
10. electric heating plate according to claim 9, which is characterized in that
There is stepped hole, the lower end of the electrode passes through the stepped hole and extends downwardly, institute on the upper disk surface of the lower plate
The upper end for stating electrode is supported on the cascaded surface of the stepped hole；
Wherein, spring, electricity described in the spring supporting are provided between the upper end of the electrode and the cascaded surface of the stepped hole
The upper end of pole, so that it is pressed on the electrode film.
11. electric heating plate according to claim 10, which is characterized in that
Shape, the electrode film, the electrode and the stepped hole include symmetrically arranged two to the hotting mask layer in a ring, and
The inner end of two electrode films is located at the inner edge of the hotting mask layer, outer end is located at the outside of the hotting mask layer, described in two
The upper surface correspondence of electrode is pressed at the outside of two electrode films.
12. electric heating plate according to claim 11, which is characterized in that
The upper plate is glass carrier, and the lower plate is ceramic monolith.
13. electric heating plate according to claim 11, which is characterized in that
Two electrode films are made up of exposure mask sputtering technology, and its thickness is 3~10 μm；
By 0.5um thickness at inner edge, the linear function changing rule of 1.5um thickness at outside is sprayed the hotting mask layer, and
Spray power every square centimeter is 3~5 watts.
14. a kind of cooking apparatus, which is characterized in that including just like electric heating plate described in any one of claim 7 to 13.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510077182.7A CN105992404B (en) | 2015-02-11 | 2015-02-11 | Far infrared transmission film layer and its manufacturing method, electric heating plate and cooking apparatus |
| US15/550,363 US20180042424A1 (en) | 2015-02-11 | 2015-06-16 | Electrothermal film layer manufacturing method, electrothermal film layer, electrically-heating plate, and cooking utensil |
| JP2017542479A JP6564047B2 (en) | 2015-02-11 | 2015-06-16 | Method for producing electrothermal film layer, electrothermal film layer, electric heating plate and cooking utensil |
| PCT/CN2015/081566 WO2016127533A1 (en) | 2015-02-11 | 2015-06-16 | Electrothermal film layer manufacturing method, electrothermal film layer, electrically-heating plate, and cooking utensil |
| KR1020177024802A KR101949833B1 (en) | 2015-02-11 | 2015-06-16 | A method of manufacturing a heat transfer film layer, a heat transfer film layer, an electric heating plate and a cooking device |
| EP15881694.2A EP3245921B1 (en) | 2015-02-11 | 2015-06-16 | Electrothermal film layer manufacturing method, electrothermal film layer, electrically-heating plate, and cooking utensil |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510077182.7A CN105992404B (en) | 2015-02-11 | 2015-02-11 | Far infrared transmission film layer and its manufacturing method, electric heating plate and cooking apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105992404A CN105992404A (en) | 2016-10-05 |
| CN105992404B true CN105992404B (en) | 2019-11-15 |
Family
ID=57041366
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| Application Number | Title | Priority Date | Filing Date |
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| CN201510077182.7A Active CN105992404B (en) | 2015-02-11 | 2015-02-11 | Far infrared transmission film layer and its manufacturing method, electric heating plate and cooking apparatus |
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| Country | Link |
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| CN (1) | CN105992404B (en) |
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| CN109896847A (en) * | 2017-12-07 | 2019-06-18 | 李刚 | A kind of infrared ray heating film and preparation method thereof, electric heating plate and heating furnace |
| CN113080521A (en) * | 2019-12-23 | 2021-07-09 | 深圳市合元科技有限公司 | Heater and smoking set comprising same |
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| CN2042181U (en) * | 1988-04-24 | 1989-08-02 | 淄博市新材料研究所 | Energy-saving far-infrared resistance stove |
| CN2142252Y (en) * | 1992-12-25 | 1993-09-15 | 上海三洲实业有限公司 | Plasma spraying metal far-infrared radiator |
| CN102045900A (en) * | 2009-10-12 | 2011-05-04 | 潘洁英 | Novel electrical heating unit |
| CN104080208A (en) * | 2013-03-26 | 2014-10-01 | 颜彬 | Manufacturing method of electrothermal film |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2042181U (en) * | 1988-04-24 | 1989-08-02 | 淄博市新材料研究所 | Energy-saving far-infrared resistance stove |
| CN2142252Y (en) * | 1992-12-25 | 1993-09-15 | 上海三洲实业有限公司 | Plasma spraying metal far-infrared radiator |
| CN102045900A (en) * | 2009-10-12 | 2011-05-04 | 潘洁英 | Novel electrical heating unit |
| CN104080208A (en) * | 2013-03-26 | 2014-10-01 | 颜彬 | Manufacturing method of electrothermal film |
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