CN105935674B - A kind of cleaning device and the cleaning method using the device - Google Patents

A kind of cleaning device and the cleaning method using the device Download PDF

Info

Publication number
CN105935674B
CN105935674B CN201610427020.6A CN201610427020A CN105935674B CN 105935674 B CN105935674 B CN 105935674B CN 201610427020 A CN201610427020 A CN 201610427020A CN 105935674 B CN105935674 B CN 105935674B
Authority
CN
China
Prior art keywords
cleaning
cell body
spacing container
space
protection cavity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201610427020.6A
Other languages
Chinese (zh)
Other versions
CN105935674A (en
Inventor
侯洪涛
田小让
谷士斌
张�林
赵冠超
徐湛
杨荣
李立伟
郭铁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ENN Solar Energy Co Ltd
Original Assignee
ENN Solar Energy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ENN Solar Energy Co Ltd filed Critical ENN Solar Energy Co Ltd
Priority to CN201610427020.6A priority Critical patent/CN105935674B/en
Publication of CN105935674A publication Critical patent/CN105935674A/en
Application granted granted Critical
Publication of CN105935674B publication Critical patent/CN105935674B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning

Abstract

A kind of cleaning method the invention discloses cleaning device and using the device, cleaning device include：The first space that first cleaning cell body is in protection cavity, the second space that the second cleaning cell body is in protection cavity；First cleaning cell body is isolated with the second cleaning cell body by isolating device；Isolating device includes spacer and spacing container, wherein：Spacer one end is placed in spacing container, and the spacer other end is fixed at the top of protection cavity, and when having fluid partitioning in spacing container, spacer isolates in the first space with second space.During cleaning：Take out and be positioned in spacing container after the first cleaning cell body cleaning, and be intended to article-cleaning and be in the side in the first space from spacing container to be sent to the side in second space；Article-cleaning is intended to take out from spacing container and be positioned over the second cleaning cell body.The present invention solves intersect pollution problem and the safety problem between cleaning fluid in cleaning process；Can continuous wash, improve cleaning efficiency.

Description

A kind of cleaning device and the cleaning method using the device
Technical field
The present invention relates to electronic component cleaning technique field, more particularly to a kind of cleaning device and clear using the device Washing method.
Background technology
With the development of the development of manufacturing technology, particularly solar cell, semiconductor, optics, precision instrument etc., Requirement more and more higher to article surface cleannes, this requires the cleanliness factor that cleaning solution is ensured in cleaning process, and has A little cleaning solutions are readily volatilized, and the volatilization vapour of adjacent different type cleaning solution will react to each other, and cause to clean molten Liquid is contaminated.Generally existed at present in semicon industry using nineteen sixty-five by Kern and Puotinen et al. N.J.Princeton RCA laboratories are pioneering and the RCA that gains the name therefrom is cleaned, and ammoniacal liquor, double can be used in RCA cleaning processes The cleaning solutions such as oxygen water, nitric acid, hydrofluoric acid, sulfuric acid, nitric acid, which part solution is volatile, and the vapour that volatilizees is mutually mixed not only New impurity can be produced, also has very big potential safety hazard, therefore the isolation between each solution seems extremely important.
Conventional cleaning device has single groove cleaning device, open cleaning device.
Fig. 1 is single groove cleaning device schematic diagram, as illustrated, each cell body in single groove cleaning device has a protection Cavity, in figure, No.1 groove, No. two grooves, No. three grooves correspond to three individually protection cavitys respectively, are entered using single groove cleaning device Row cleaning method be：
Article-cleaning is taken out be put into outside protection cavity every time by mechanical arm after the cleaning of No.1 groove, is placed into another guarantor No. two grooves protected in cavity, No. two grooves take out after rinsing to be put into outside protection cavity again, is then put into another protection cavity again In No. three grooves, further taken out after the cleaning of No. three grooves, cleaning sequence can adjust but can only a groove out after be put into guarantor Protect outside cavity, other groove positions then entered back into another protection cavity are cleaned, and so cleaning can be very good to avoid The pollution of adjacent solutions.
Fig. 2 is open cleaning device schematic diagram, as illustrated, in open cleaning device multiple cell bodies share it is same Cavity is protected, in figure, No.1 groove, No. two grooves, No. three grooves share an individually protection cavity, and article-cleaning is from protection cavity One end enter cleaning line, and taken out from the other end of protection cavity, cleaning method is：Mechanical arm is every time by article-cleaning from clear Wash line one end and be put into No.1 groove, taken out and be sequentially placed into No. two grooves, No. three grooves from No.1 groove by mechanical arm after cleaning, so Cleaning can realize continuous wash operation.
The deficiencies in the prior art are：Single groove cleaning device can not enter Line Continuity cleaning, greatly reduce cleaning efficiency, And open cleaning device can not avoid the volatility gas and steam because of cleaning solution, solution from also being reacted after being mutually mixed New chemical substance is generated, some even can produce poisonous, inflammable, explosive material, hidden danger is brought to safety in production, while molten Liquid cross pollution can reduce cleaning performance, can only carry out changing liquid after solution is contaminated, add cleaning cost.
The content of the invention
A kind of cleaning method the invention provides cleaning device and using the device, to when carrying out continuous wash, Avoid between adjacent rinse bath caused by volatility gas, the solution splash cross pollution and caused by potential safety hazard.
A kind of cleaning device is provided in the embodiment of the present invention, including：Protect cavity, the first cleaning cell body, the second cleaning Cell body and isolating device, wherein：
First cleaning cell body, the second cleaning cell body and the isolating device are placed in protection cavity, described The first space that first cleaning cell body is in the protection cavity, the second cleaning cell body are in the protection cavity Second space；
The isolating device includes spacer and spacing container, wherein：
Described spacer one end is placed in the spacing container, and the spacer other end is fixed on the protection cavity top Portion, when having fluid partitioning in the spacing container, the spacer isolates in first space with the second space.
It is preferred that further comprise：Conveyer, the conveyer is in the bottom of the spacing container, for by institute State the article in spacing container the side in first space is in from the spacing container and be sent in the second space Side.
It is preferred that the conveyer is following a kind of or its combination device：Feed belt, transmission chain, transmission Plate.
It is preferred that the width of the spacing container with it is described protection cavity width it is identical, the width of the spacer with The width of the protection cavity is identical.
It is preferred that the width of the spacing container is less than the width of the protection cavity, the spacer includes first Point and Part II, wherein, Part I is fixed on protection cavity both sides side wall, the height of the part and the protection chamber The height of body is identical, and the width of the part is the distance for protecting cavity wall to the spacing container side wall；Part II The protection cavity top end is fixed on, the lower end of the part is immersed in fluid partitioning, and the both sides of the part are fastened on Part I Side.
It is preferred that the spacer is telescopic or folding platy structure.
It is preferred that the protection cavity is square.
A kind of cleaning method using above-mentioned cleaning device is additionally provided in the embodiment of the present invention, including：
It is intended to article-cleaning and is positioned over the first cleaning cell body；
Take out and be positioned in the spacing container after the described first cleaning cell body cleaning, and to be cleaned described The side that article is in first space from the spacing container is empty in described second by being sent to after the spacer Between side；
The desire article-cleaning is taken out from the spacing container and is positioned over the second cleaning cell body.
It is preferred that by the desire article-cleaning from the spacing container be in the side in first space by it is described every Transmitted from being sent to after thing in the side of the second space by the conveyer.
It is preferred that the desire article-cleaning is crystal silicon battery silicon chip, semiconductor crystal wafer or optics light transmissive material.
The present invention has the beneficial effect that：
In technical scheme provided in an embodiment of the present invention, first cleaning cell body with second clean cell body by isolating device every From；Isolating device includes spacer and spacing container, and spacer one end is placed in spacing container, there is isolation in spacing container During liquid, spacer is by the first cleaning cell body in the first space in protection cavity and the in protection cavity second space Two cleaning cell body isolation.
In cleaning, take out and be positioned in spacing container after the first cleaning cell body cleaning, and be intended to cleaning materials Product from spacing container be in the first space side be sent to the side in second space after, you can be intended to article-cleaning taking-up And it is positioned over the second cleaning cell body and is cleaned.
During due to there is fluid partitioning in spacing container, spacer is used cooperatively together with spacing container serves isolation work With, therefore spacer can be by the first cleaning cell body in the first space in protection cavity with being in protection cavity second space The second cleaning cell body isolation, and the first cleaning solution in the first cleaning cell body and the in the second cleaning cell body It is located at the first space and second space respectively after the volatilization of two cleaning solutions, cross pollution can't be produced and/or reacted to each other；And And be intended to article-cleaning second space can be entered from the first space by spacing container, namely realize under isolation by First cleaning cell body enters the second cleaning cell body.
So in technical scheme provided in an embodiment of the present invention, can be avoided not by the buffer action of isolating device The hybrid reaction between volatilization gas, steam with volatile cleaning fluid, solves the phase between cleaning fluid in cleaning process Mutual cross-contamination issue and safety problem；Continuous wash operation can be realized simultaneously, improve cleaning efficiency.
Brief description of the drawings
Accompanying drawing described herein is used for providing a further understanding of the present invention, forms the part of the present invention, this hair Bright schematic description and description is used to explain the present invention, does not form inappropriate limitation of the present invention.In the accompanying drawings：
Fig. 1 is single groove cleaning device schematic diagram in background technology；
Fig. 2 is the open cleaning device schematic diagram in background technology；
Fig. 3 is cleaning device structural representation in the embodiment of the present invention；
Fig. 4 is the cleaning method implementation process diagram that cleaning device is used in the embodiment of the present invention；
Fig. 5 is the relation schematic diagram when width of spacing container is identical with protecting the width of cavity in the embodiment of the present invention；
Fig. 6 is the relation signal when width of spacing container in the embodiment of the present invention is identical less than the width of protection cavity Figure.
Embodiment
A kind of method that in the embodiment of the present invention cleaning device will be provided and cleaned using the device, cleaning dress Intersect pollution problem and the safety problem that can solve the problem that in cleaning process between cleaning fluid are put, avoids volatile cleaning fluid Volatilization gas, the hybrid reaction between steam；Continuous wash operation can be realized simultaneously, improve cleaning efficiency.With reference to Accompanying drawing illustrates to the embodiment of the present invention.
In declarative procedure, the scheme of cleaning device will be illustrated first, then explanation is cleaned using cleaning device Scheme, finally illustrated to the implementation between the structure of the two and use.
Fig. 3 is cleaning device structural representation, as illustrated, including：Cavity 301, first is protected to clean cell body 302, the Two cleaning cell bodies 303 and isolating device 304, isolating device is to go out signal with dotted line frame in figure, in cleaning device：
First cleaning cell body, the second cleaning cell body and isolating device are placed in protection cavity, and the first cleaning cell body is in Protect the first space in cavity, the second space that the second cleaning cell body is in protection cavity；First cleaning cell body and second Cleaning cell body is isolated by isolating device；
Isolating device includes spacer 3041 and spacing container 3042, wherein：
Spacer one end is placed in spacing container, the spacer other end be fixed on it is described protection cavity at the top of, every During from having fluid partitioning in container, spacer isolates in the first space with second space.
Fig. 4 is the cleaning method implementation process diagram using cleaning device, as illustrated, can include：
Step 401, it is intended to article-cleaning and is positioned over the first cleaning cell body；
Step 402, take out and be positioned in spacing container after the first cleaning cell body cleaning, and be intended to article-cleaning The side in the first space is in by being sent to the side in second space after spacer from spacing container；
Step 403, it is intended to article-cleaning and is taken out from spacing container and be positioned over the second cleaning cell body.
In implementation, when specifically illustrating in figure 3, the spacer in isolating device is illustrated with isolation baffle plate, Ci Zhongshi Apply in Fig. 3 under mode, contain the space of the first cleaning cell body on the right side of the first space namely isolation baffle plate, second space namely The space of the second cleaning cell body is contained on the left of isolation baffle plate.Certainly, in force spacer by taking isolation baffle plate as an example because this It is a kind of relatively simple, mode for easily realizing, so here by taking isolation baffle plate as an example；But with other spacers or Person's mode is also possible,, can be by when having fluid partitioning in spacing container as long as one part is placed in spacing container One space keeps apart with second space, that is, spacer can be telescopic or folding structure in implementing, it is such as soft The object etc. of curtain, non-platy structure, isolation baffle plate are only used for instructing how those skilled in the art specifically implement the present invention, but not Meaning is only capable of using a kind of this mode, and can combine practice in implementation process needs to determine corresponding article.Meanwhile below By by spacer for the object of platy structure exemplified by carry out specific implementation explanation.
From above-mentioned implementation, isolating device includes：Spacer and spacing container, when the isolation that spacer is platy structure Its one end can be fixed on to the top of protection cavity, the other end immerses the insulating liquid of spacing container during baffle plate, in specific implementation In body below (the 3rd cleaning solution in i.e. following embodiments), isolation baffle plate is just realized after being used cooperatively together with spacing container Buffer action.
In implementation, spacing container, which is mainly used in being arranged at cross pollution or cleaning solution volatilization gas, to be reacted to each other Between cell body, desire article-cleaning is put into from the side of spacing container, being intended to article-cleaning can be sent to by isolation baffle plate bottom The opposite side of spacing container.That is, the first cleaning solution being put into the first cleaning cell body in the second cleaning cell body with putting The second cleaning solution entered is the cleaning solution that can be produced cross pollution and/or can react to each other after volatilizing.
Specifically, by taking cleaning solar energy cell silicon chip as an example, apply between alkali groove and acid tank, by spacing container with every Cooperation from baffle plate prevents mutually pollution caused by splash and soda acid steam between soda acid.In crystal silicon battery particularly single crystal battery Industry alkali part is poor with respect to cleanliness factor, and pickling part cleanliness factor is very high, if the pollution problem not solved to acid moieties will The effect of pickling is substantially reduced, the frequency for changing liquid can be increased, lifts cost.
From the above it can be seen that prevent cleaning solution from waving by setting isolating device to can reach isolation effect in cleaning device Cross pollution caused by hair.
In implementation, protection cavity forms effective cleaning space, and effect is isolation cleaning cell body and the external world, is not only prevented clear Dilution, volatilization gas leak, additionally it is possible to prevent the pollutants such as external particle, dust from entering in cleaning cell body.In view of to ring Border safety and personal security, when cleaning fluid is non-hazardous type, protection cavity can be semiclosed or open, otherwise be envelope Enclosed.The volume of protection cavity can carry out adaptable extension according to process requirements, to meet the cleaning of different cleaning objects Demand.
In implementation, cleaning cell body can include multiple cell bodies with different cleaning functions, and cell body is cleaned in implementation will be main To be illustrated so that first cleans cell body, the second cleaning cell body as an example, but easily know can be according to need by those skilled in the art Multiple cleaning cell bodies are arranged by same structure.Each cleaning cell body can be the unclosed liquid container of one side, including clear Washing trough, flushing tank etc..Wherein, rinse bath is used for holding various cleaning solutions and article-cleaning, such as acid rinse bath, alkalescence cleaning Groove, the quantity of rinse bath are set according to technique needs, and at least two.Flushing tank is used to rinse acid solution or alkalescence is molten Liquid, make cleaned article surface free from admixture solution.Cleaning fluid is the SC1 in the liquid for article-cleaning, such as RCA cleanings (mixed liquor of hydrogen peroxide and ammoniacal liquor), SC2 (mixed liquor of hydrochloric acid and hydrogen peroxide) etc..Cleaned article can include：Wafer, Silicon chip, glass, lens etc..
In implementation, spacing container is arranged at (first i.e. in embodiment between the two neighboring cleaning cell body for needing to isolate Clean cell body, the second cleaning cell body), for the transmission of article-cleaning between two cell bodies, the quantity of spacing container and position can To be configured according to process conditions.In specific implementation, width requirement can be less than or equal to clear in the size of spacing container Wash the width of chamber.Isolating device primarily serves the effect of conveying and isolation, therefore, the 3rd cleaning being put into spacing container Solution can use pollution-free and/or not volatile fluid partitioning, namely the liquid pollution-free and not volatile to cleaning fluid, Such as pure water.
In implementation, isolation baffle plate for platy structure when, its size can match with the size of spacing container, at least may be used To be implemented with following two ways, implement in explanation, for ease of understanding, to protect cavity to be illustrated to be square.
A kind of mode is：The width W1 of spacing container is identical with protecting the width W2 of cavity, the width W3 of the spacer It is identical with the width of the protection cavity.Specifically, Fig. 5 be spacing container width with width it is identical when relation illustrate Scheme, the width W1 of spacing container, width W2, the width W3 of isolation baffle plate of protection cavity are identical in figure, as illustrated, when isolation When the width W1 of container is identical with protecting chamber W2 width, the width W3 of isolation baffle plate is set can be with protection cavity W2 width Spend identical, and the upper end of isolation baffle plate is fixed on the top of wash chamber, and fixed form can be the form of activity, or Fixed form, the lower end of isolation baffle plate are immersed in the fluid partitioning of spacing container, prevent left and right sides steam, volatility vapour The liquid that body, splash go out mutually pollutes.
Another way is：The width W1 of the spacing container is less than the width W2 of the protection cavity, the spacer Including Part I and Part II, wherein, Part I is fixed on protection cavity both sides side wall, Partial Height H1 with The height H2 of the protection cavity is identical, and width is the distance for protecting cavity wall to the spacing container side wall；Second Part is fixed on the protection cavity top end, and the lower end of the part is immersed in fluid partitioning, and both sides are fastened on the side of Part I Face.Specifically, the width that Fig. 6 is spacing container be less than protection cavity width it is identical when relation schematic diagram, grid regions in figure Domain is the Part I of spacer, and dotted region is the Part II of spacer, as illustrated, when the width of spacing container is less than During the width of wash chamber, isolation baffle plate can be divided into two parts, and a part is integrally fixed at the baffle plate of protection cavity both sides side wall, The height of the part baffle plate is identical with protecting the height of cavity, and width is distance of the protection cavity wall to spacing container side wall, And the top of the part baffle plate is fixed on the top of protection cavity, side is fixed in the side wall of protection cavity, another part gear Plate is integrally fixed at the baffle plate of protection cavity top end, and the lower end of the part baffle plate is immersed in fluid partitioning, and both sides can be fastened on above-mentioned The side of baffle plate, the i.e. width of the part baffle plate are the width of spacing container.The material of isolation baffle plate can be erosion-resisting material Matter.
In implementation, it can further include in cleaning device：
Conveyer, the side for the article in spacing container to be in the first space from spacing container are sent to and are in The side of second space.
Specifically, conveyer can be arranged at the inner bottom part of spacing container, for being intended to article-cleaning from spacing container Side be sent to opposite side.
In implementation, conveyer can be following a kind of or its combination device：Feed belt, transmission chain, transmission Plate.Such as：In specific implementation, conveyer can be conveyer belt, and conveyer belt can be laid on to the inner bottom part of spacing container, or One objective table is set on a moving belt, article-cleaning is intended to or carrier is put on conveyer belt or objective table, conveyer belt rotational band Dynamic desire article-cleaning or carrier are transmitted in fluid partitioning, are avoided pollution of the volatilization vapour to article-cleaning, are also avoided Article-cleaning is exposed in empty vapour and is oxidized.
Obviously, those skilled in the art can carry out the essence of various changes and modification without departing from the present invention to the present invention God and scope.So, if these modifications and variations of the present invention belong to the scope of the claims in the present invention and its equivalent technologies Within, then the present invention is also intended to comprising including these changes and modification.

Claims (10)

  1. A kind of 1. cleaning device, it is characterised in that including：Protect cavity, the first cleaning cell body, the second cleaning cell body and isolation Device, wherein：
    First cleaning cell body, the second cleaning cell body and the isolating device are placed in protection cavity, and described first The first space that cell body is in the protection cavity is cleaned, described second cleans second that cell body is in the protection cavity Space；
    The isolating device includes spacer and spacing container, wherein：
    Described spacer one end is placed in the spacing container, and the spacer other end is fixed at the top of the protection cavity, When having fluid partitioning in the spacing container, the spacer isolates in first space with the second space.
  2. 2. cleaning device as claimed in claim 1, it is characterised in that further comprise：
    Conveyer, the conveyer in the bottom of the spacing container, for by the article in the spacing container from institute State spacing container and be in the side in first space and be sent in the side of the second space.
  3. 3. cleaning device as claimed in claim 2, it is characterised in that the conveyer is following a kind of or its combination Device：Feed belt, transmission chain, transfer plate.
  4. 4. cleaning device as claimed in claim 1, it is characterised in that the width of the spacing container and the protection cavity Width is identical, and the width of the spacer is identical with the width of the protection cavity.
  5. 5. cleaning device as claimed in claim 1, it is characterised in that the width of the spacing container is less than the protection cavity Width, the spacer includes Part I and Part II, wherein, the Part I is fixed on the protection cavity two Side side wall, the height of the part is identical with the height of the protection cavity, and the width of the part arrives for the protection cavity wall The distance of the spacing container side wall；The Part II is fixed on the protection cavity top end, and institute is immersed in the lower end of the part State in fluid partitioning, the both sides of the part are fastened on the side of the Part I.
  6. 6. cleaning device as claimed in claim 1, it is characterised in that the spacer is telescopic or folding tabular knot Structure.
  7. 7. cleaning device as claimed in claim 1, it is characterised in that the protection cavity is square.
  8. A kind of 8. cleaning method of cleaning device using as described in claim 1-7, it is characterised in that including：
    It is intended to article-cleaning and is positioned over the first cleaning cell body；
    Take out and be positioned in the spacing container after the described first cleaning cell body cleaning, and by the desire article-cleaning The side in first space is in by being sent to after the spacer in the second space from the spacing container Side；
    The desire article-cleaning is taken out from the spacing container and is positioned over the second cleaning cell body.
  9. 9. method as claimed in claim 8, it is characterised in that the desire article-cleaning is in described from the spacing container The side in the first space by being sent to after the spacer in the side of the second space is transmitted by conveyer 's.
  10. 10. method as claimed in claim 8, it is characterised in that the desire article-cleaning is crystal silicon battery silicon chip, semiconductor Wafer or optics light transmissive material.
CN201610427020.6A 2016-06-16 2016-06-16 A kind of cleaning device and the cleaning method using the device Active CN105935674B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610427020.6A CN105935674B (en) 2016-06-16 2016-06-16 A kind of cleaning device and the cleaning method using the device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610427020.6A CN105935674B (en) 2016-06-16 2016-06-16 A kind of cleaning device and the cleaning method using the device

Publications (2)

Publication Number Publication Date
CN105935674A CN105935674A (en) 2016-09-14
CN105935674B true CN105935674B (en) 2018-02-16

Family

ID=56872023

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610427020.6A Active CN105935674B (en) 2016-06-16 2016-06-16 A kind of cleaning device and the cleaning method using the device

Country Status (1)

Country Link
CN (1) CN105935674B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202180065U (en) * 2011-07-26 2012-04-04 韩华新能源（启东）有限公司 Automatic cleaning equipment for solar silicon wafer before diffusion
CN202461030U (en) * 2012-02-29 2012-10-03 无锡市飞云球业有限公司 Automatic cleaning production line for bearing steel balls
CA2843952A1 (en) * 2011-08-01 2013-02-07 Illinois Tool Works Inc. Process for preparing sorptive substrates, and integrated processing system for substrates
CN104001690A (en) * 2014-05-08 2014-08-27 北京石油化工学院 Isolation anti-explosive material cleaning device and method
CN104998880A (en) * 2015-06-25 2015-10-28 河南新野纺织股份有限公司 Collecting and processing system for waste produced on spinning field

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202180065U (en) * 2011-07-26 2012-04-04 韩华新能源（启东）有限公司 Automatic cleaning equipment for solar silicon wafer before diffusion
CA2843952A1 (en) * 2011-08-01 2013-02-07 Illinois Tool Works Inc. Process for preparing sorptive substrates, and integrated processing system for substrates
CN202461030U (en) * 2012-02-29 2012-10-03 无锡市飞云球业有限公司 Automatic cleaning production line for bearing steel balls
CN104001690A (en) * 2014-05-08 2014-08-27 北京石油化工学院 Isolation anti-explosive material cleaning device and method
CN104998880A (en) * 2015-06-25 2015-10-28 河南新野纺织股份有限公司 Collecting and processing system for waste produced on spinning field

Also Published As

Publication number Publication date
CN105935674A (en) 2016-09-14

Similar Documents

Publication Publication Date Title
CN103828024A (en) Equipment for manufacturing semiconductor for epitaxial process
CN102412172A (en) Cut/ground silicon wafer surface cleaning method
CN102842652A (en) Silicon slice fluff-making and pickling method
CN101479831A (en) Post etch wafer surface cleaning with liquid meniscus
US20110079250A1 (en) Post-texturing cleaning method for photovoltaic silicon substrates
CN105609408A (en) Forming method of semiconductor device
CN105935674B (en) A kind of cleaning device and the cleaning method using the device
KR102238879B1 (en) Substrate processing apparatus and substrate transporting method
TWI654773B (en) Solar cell manufacturing method and solar cell
CN216064555U (en) Quartz boat belt cleaning device
CN110137302A (en) The cleaning of silicon heterojunction solar battery crystalline silicon substrate and etching method and silicon heterojunction solar battery
US11114317B2 (en) Method for cleaning semiconductor wafer and manufacturing method of semiconductor wafer using the method for cleaning
CN1071153C (en) Process and apparatus for treatment of semiconductor wafers in fluid
TWI629804B (en) Manufacturing method of solar cell
CN107123582A (en) A kind of chemical cleaning method of GaAs photocathodes
CN103779256B (en) A kind of cleaning method of silicon-based substrate diffusion sheet
CN216488099U (en) Etching groove, silicon wafer processing system and solar cell manufacturing system
CN104103548B (en) Chip pre-cleaning method before active area liner oxidation
KR102476635B1 (en) Manufacturing method of high-efficiency solar cell
CN106449393A (en) Solar cell etching equipment and manufacturing method
CN111009457A (en) Diffusion pretreatment method
CN219226313U (en) Cleaning equipment for reworked battery piece
JPH10284457A (en) Washing system
CN115803848A (en) Method and device for removing particles or photoresist on substrate
CN203320123U (en) Polycrystalline silicon preparation device

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant