CN105911702A - Terahertz light beam expansion uniformizing device - Google Patents
Terahertz light beam expansion uniformizing device Download PDFInfo
- Publication number
- CN105911702A CN105911702A CN201610407943.5A CN201610407943A CN105911702A CN 105911702 A CN105911702 A CN 105911702A CN 201610407943 A CN201610407943 A CN 201610407943A CN 105911702 A CN105911702 A CN 105911702A
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- Prior art keywords
- lens
- terahertz light
- convex lens
- integrator
- terahertz
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0961—Lens arrays
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The invention relates to a terahertz light beam expansion uniformizing device. The front end of the uniformizing device is provided with a terahertz light source, and the uniformizing device further comprises a light expander, an integrator and an imaging focal plane, the beam expander is arranged between the terahertz light source and the integrator, the focal plane is arranged behind the integrator, the light expander comprises a second convex lens and a first convex lens between the second convex lens and the terahertz light source, the integrator comprises two lens arrays, a lens and a condensing lens, the two lens arrays are fixedly arranged in the front and back sides of the lens respectively, the lens is arranged in front of the condensing lens, the imaging focal plane is arranged at the real focal point of the condensing lens, and the photocenters of the first and second convex lenses and the condensing lens and the center of the terahertz light source are in the same straight line. The terahertz light beam expansion uniformizing device is simple in structure, and can be used to obtain large-area flat terahertz light spots with uniform energy distribution.
Description
Technical field
The invention belongs to THz imaging technology field, be specifically related to a kind of terahertz light and expand uniformly makeup
Put.
Background technology
THz imaging technology is to utilize Terahertz light to irradiate testee, by collecting in focal plane
The transmission or reflection information of object, and then the technology of imaging.Terahertz imaging is now widely used for lossless
Detection, safety check, biomedical sector.
Selecting suitable Terahertz light source is the key technology of imaging system.Scan compared to utilizing point source
The advantages such as imaging, utilizes the battle array imaging of Terahertz face to have pixel many, and image taking speed is fast, realtime imaging.
Area source and the responsiveness of planar array detector needed for the battle array imaging system of face are demarcated and are desirable that the big face of use
The long-pending uniform thz beam of Energy distribution.Existing THz source mainly utilizes gas laser pumping first
Alcohol, difluoromethane or monochloro methane produce the terahertz light of different-waveband or utilize quanta cascade laser
Device (QCL) realizes all solid state thz laser.The terahertz light output that both approaches produces has power
Fluctuation, spot diameter the least (at grade), energy is Gauss distribution, it is impossible to meets face battle array and becomes in real time
Demand as system.In order to obtain the uniform thz beam of large area, it is necessary to a kind of sharp to Terahertz
Light carries out expanding and uniforming device.
Although and prior art can substantially meet acquisition the uniform thz beam of large area, but still without
Method reaches more uniform flat-top Energy distribution, is unfavorable for that focus planardetector is demarcated.
Summary of the invention
The technical problem to be solved is to provide a kind of terahertz light and expands uniforming device, it is achieved
Obtain the flat-top Terahertz hot spot that the equally distributed area of energy is bigger.
The technical scheme is that
The invention provides a kind of terahertz light and expand uniforming device, described in expand uniforming device before
End is provided with Terahertz light source, described in expand uniforming device and include that beam expander, integrator and imaging Jiao are flat
Face, described beam expander is arranged between Terahertz light source and integrator, and described focal plane is arranged on integrator
Rear end, described beam expander includes that convex lens I and convex lens II, described convex lens I are arranged on convex lens II
And between Terahertz light source, the back focus of described convex lens I overlaps with the front focus of convex lens II, described
Integrator includes two microlens arrays, lens and collecting lens, and described microlens array is by some height
Homology of Sphere mirror is arranged to make up, and said two microlens array is respectively fixedly disposed at before and after lens two
Face, described lens are arranged on collecting lens front end, and described imaging focal plane is arranged on collecting lens back focus
Place, the photocentre of described convex lens I, convex lens II and collecting lens and the center of Terahertz light source are same
On straight line.
Use such scheme to provide the benefit that and can obtain large area energy equally distributed flat-top Terahertz
Hot spot.
Further, described beam expander also includes clouded glass scatterer, and described clouded glass scatterer is arranged on convex
Rear Jiao of lens I. point and the front focus overlapping position of convex lens II.
Use above-mentioned further scheme to provide the benefit that by clouded glass scatterer and can reduce coherent beam
In interference fringe produced by focal plane.
Further, the focal distance ratio of described convex lens II and convex lens I is between 1.5 to 20；Described setting
The focus of the bulbec face diaphotoscope before lens is positioned at the bulbec face diaphotoscope table being arranged on after lens
On the circular arc of face.
The beneficial effect using above-mentioned further scheme is advantageous for dissipating of terahertz light.
Further, described beam expander and integrator are melted High Resistivity Si by poly-4-methylpentene or district and are made.
Above-mentioned further scheme is used to provide the benefit that the transmitance improving terahertz light.
Accompanying drawing explanation
Fig. 1 is the structural representation that a kind of terahertz light expands uniforming device.
Fig. 2 is the Terahertz hot spot energy profile obtained on imaging focal plane.
In accompanying drawing, the list of parts representated by each label is as follows:
1. Terahertz light source, 2. beam expander, 3. integrator, 4. imaging focal plane, 5. convex lens I, 6. convex lens
Mirror II, 7. microlens array, 8. lens, 9. collecting lens, 10. bulbec face diaphotoscope, 11. clouded glass dissipate
Emitter.
Detailed description of the invention
Being described principle and the feature of the present invention below in conjunction with accompanying drawing, example is served only for explaining this
Invention, is not intended to limit the scope of the present invention.
Embodiment, seeing shown in Fig. 1 and Fig. 2, the present invention provides a kind of terahertz light to expand homogenization
Device, described in expand the front end of uniforming device and be provided with Terahertz light source 1, described in expand uniformly makeup
Put and include that beam expander 2, integrator 3 and imaging focal plane 4, described beam expander 2 are arranged on terahertz light
Between source 1 and integrator 3, described focal plane is arranged on integrator 3 rear end, and described beam expander 2 includes
Convex lens I5 and convex lens II6, described convex lens I5 be arranged on convex lens II6 and Terahertz light source 1 it
Between, the back focus of described convex lens I5 overlaps with the front focus of convex lens II6, and described integrator 3 includes
Two microlens arrays 7, lens 8 and collecting lens 9, described microlens array 7 is by several bulbecs
Face diaphotoscope 10 is arranged to make up, before said two microlens array 7 is respectively fixedly disposed at lens 8
Rear two sides, described lens 8 are arranged on collecting lens 9 front end, and described imaging focal plane 4 is arranged on optically focused
At lens 9 back focus, described convex lens I5, convex lens II6 and the photocentre of collecting lens 9 and Terahertz
On the same line, Terahertz light source 1 penetrates terahertz light at the center of light source 1, by beam expander 2
Dissipating, the terahertz light after dissipating injects integrator 3, and in integrator 3, microlens array 7 leads to lens 8
Cross inject dissipate after terahertz light formed two grades of Terahertz array of source, collecting lens 9 is by two grades too
The terahertz light of hertz array of source converges and guides imaging focal plane 4 and obtains the distribution of area large energy all
Even flat-top Terahertz hot spot.
Described beam expander 2 also includes clouded glass scatterer 11, and described clouded glass scatterer 11 is arranged on convex
Rear Jiao of lens I5. point and the front focus overlapping position of convex lens II6, can reduce phase by clouded glass scatterer
Dry light beam is in interference fringe produced by imaging focal plane 4；Jiao of described convex lens II6 and convex lens I5
Away from than between for 1.5 to 20, described in be arranged on the focus position of bulbec face diaphotoscope 10 before lens 8
On diaphotoscope 10 surface, the bulbec face circular arc being arranged on after lens 8；Described beam expander 2 and integration
Device 3 is melted High Resistivity Si (HRFZ-Si) by poly-4-methylpentene (TPX) or district and is made, described expansion
The surface deposition 10-80 μm anti-reflection film of bundle device 2 and integrator 3, described anti-reflection film is high density polyethylene (HDPE)
(HDPE), in politef (PTFE) or handkerchief, synthetic fibre (Parylene), can improve terahertz light
Transmitance.
A kind of terahertz light that the present invention provides expands uniforming device simple in construction, can obtain large area energy
Measure equally distributed flat-top Terahertz hot spot.
The foregoing is only presently preferred embodiments of the present invention, not in order to limit the present invention, all in the present invention
Spirit and principle within, any modification, equivalent substitution and improvement etc. made, should be included in this
Within bright protection domain.
Claims (5)
1. terahertz light expands a uniforming device, described in expand the front end of uniforming device and be provided with
Terahertz light source (1), it is characterised in that described in expand uniforming device and include beam expander (2), integration
Device (3) and imaging focal plane (4), described beam expander (2) is arranged on Terahertz light source (1) with long-pending
Dividing between device (3), described focal plane is arranged on integrator (3) rear end, and described beam expander (2) wraps
Including convex lens I (5) and convex lens II (6), described convex lens I (5) is arranged on convex lens II (6)
And between Terahertz light source (1), before the back focus of described convex lens I (5) and convex lens II (6)
Focus overlaps, and described integrator (3) includes that two microlens arrays (7), lens (8) and optically focused are saturating
Mirror (9), described microlens array (7) is arranged to make up by several bulbec faces diaphotoscope (10), institute
State two microlens arrays (7) and be respectively fixedly disposed at two sides before and after lens (8), described lens (8)
It is arranged on collecting lens (9) front end, after described imaging focal plane (4) is arranged on collecting lens (9)
Focal point, described convex lens I (5), convex lens II (6) and the photocentre of collecting lens (9) and terahertz
Hereby the center of light source (1) is on the same line.
A kind of terahertz light the most according to claim 1 expands uniforming device, it is characterised in that
Described beam expander (2) also includes clouded glass scatterer (11), and described clouded glass scatterer (11) is arranged
Rear Jiao at convex lens I (5). point and the front focus overlapping position of convex lens II (6).
A kind of terahertz light the most according to claim 1 expands uniforming device, it is characterised in that
The focal distance ratio of described convex lens II (6) and convex lens I (5) is between 1.5 to 20.
A kind of terahertz light the most according to claim 1 expands uniforming device, it is characterised in that
The focus in described bulbec face diaphotoscope (10) being arranged on before lens (8) is located in being arranged on
On mirror (8) diaphotoscope (10) surface, bulbec face circular arc below.
A kind of terahertz light the most according to claim 1 expands uniforming device, it is characterised in that
Described beam expander (2) and integrator (3) are melted High Resistivity Si by poly-4-methylpentene or district and are made.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610407943.5A CN105911702A (en) | 2016-06-12 | 2016-06-12 | Terahertz light beam expansion uniformizing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610407943.5A CN105911702A (en) | 2016-06-12 | 2016-06-12 | Terahertz light beam expansion uniformizing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105911702A true CN105911702A (en) | 2016-08-31 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610407943.5A Pending CN105911702A (en) | 2016-06-12 | 2016-06-12 | Terahertz light beam expansion uniformizing device |
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| CN (1) | CN105911702A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113381289A (en) * | 2021-06-10 | 2021-09-10 | 中国科学院半导体研究所 | Optical feedback structure and packaging method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020024740A1 (en) * | 2000-08-30 | 2002-02-28 | Dainippon Screen Mfg Co., Ltd. | Illuminating apparatus |
| US20030039036A1 (en) * | 2001-08-27 | 2003-02-27 | Eastman Kodak Company | Laser projection display system |
| CN203773167U (en) * | 2014-03-31 | 2014-08-13 | 山东华光光电子有限公司 | Light spot homogenizing device of semiconductor laser illumination module |
| CN105223697A (en) * | 2015-08-13 | 2016-01-06 | 电子科技大学 | A kind of terahertz light expands uniforming device |
-
2016
- 2016-06-12 CN CN201610407943.5A patent/CN105911702A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020024740A1 (en) * | 2000-08-30 | 2002-02-28 | Dainippon Screen Mfg Co., Ltd. | Illuminating apparatus |
| US20030039036A1 (en) * | 2001-08-27 | 2003-02-27 | Eastman Kodak Company | Laser projection display system |
| CN203773167U (en) * | 2014-03-31 | 2014-08-13 | 山东华光光电子有限公司 | Light spot homogenizing device of semiconductor laser illumination module |
| CN105223697A (en) * | 2015-08-13 | 2016-01-06 | 电子科技大学 | A kind of terahertz light expands uniforming device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113381289A (en) * | 2021-06-10 | 2021-09-10 | 中国科学院半导体研究所 | Optical feedback structure and packaging method thereof |
| CN113381289B (en) * | 2021-06-10 | 2022-05-17 | 中国科学院半导体研究所 | Optical feedback structure and packaging method thereof |
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Legal Events
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|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| CB02 | Change of applicant information |
Address after: 264006 Yantai economic and Technological Development Zone, Guiyang, No. 11 main street, Shandong Applicant after: Yantai Rui micro nano technology Limited by Share Ltd Address before: 264006 Yantai economic and Technological Development Zone, Guiyang, No. 11 main street, Shandong Applicant before: Yantai Raytron Technology Co., Ltd. |
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| COR | Change of bibliographic data | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160831 |
|
| RJ01 | Rejection of invention patent application after publication |