CN105892240B - Extreme ultraviolet photolithography light source collects the integrated pedestal of eyeglass - Google Patents
Extreme ultraviolet photolithography light source collects the integrated pedestal of eyeglass Download PDFInfo
- Publication number
- CN105892240B CN105892240B CN201610437955.2A CN201610437955A CN105892240B CN 105892240 B CN105892240 B CN 105892240B CN 201610437955 A CN201610437955 A CN 201610437955A CN 105892240 B CN105892240 B CN 105892240B
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- China
- Prior art keywords
- eyeglass
- groove
- annulus
- integrated
- extreme ultraviolet
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
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- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Extreme ultraviolet photolithography light source collects the integrated pedestal of eyeglass, is related to the integrated technology field for collecting eyeglass.Multilayer is collected into the demand that eyeglass is integrated into collection mirror system in order to meet.Wheel rim is provided with 6 spokes in stainless steel annulus, the annular of annulus；N number of groove is provided with every spoke, the groove of 6 spokes constitutes the N groups circle concentric with the annulus, and N is positive integer, and one group of groove is used to install one layer of collection eyeglass, is fixed collection eyeglass in a groove using vacuum glue；The external diameter Φ of stainless steel annulus is 600mm, and width is that 40mm, thickness are 40mm.The apparatus structure of the present invention is simple, can be fixedly secured collection eyeglass.The present invention is applied to integrated collection eyeglass.
Description
Technical field
The present invention relates to the integrated technology field for collecting eyeglass.
Background technology
Using capillary high current, Fast pulsed discharge Z constrictions, working media xenon (Xe), plasma are filled in capillary
High temperature is produced, Xe high price ionization Xe is produced10+, Xe10+The compound excitation process that disappears, radiant output extreme ultraviolet obtains 13.5nm light
Output, extreme ultraviolet is the distribution of 4 π solid angles.
Based on the limitation of capillary bore, emergent light is in+5 °~+30 °, -5 °~-30 ° of sky at capillary outlet
Between be distributed, design the collection eyeglass of multilayer book shell structure, and integrated optical collection mirror system, it is effective by spoke to greatest extent
Penetrate light to collect, and focus on, stronger power is obtained in focal point, to be connected with post-exposure system, carry out photoetching.
In this course, the collection system of multilayer shell structure is one of critical component, so as to need to collect multilayer
Eyeglass is integrated into the device for collecting mirror system.
The content of the invention
The present invention is that multilayer is collected into the demand that eyeglass is integrated into collection mirror system in order to meet, so as to provide extreme ultraviolet
Photolithography light source collects the integrated pedestal of eyeglass.
Extreme ultraviolet photolithography light source of the present invention collects the integrated pedestal of eyeglass, including wheel rim and 6 spokes；
Wheel rim is provided with 6 spokes in stainless steel annulus, the annular of annulus；N number of groove, 6 are provided with every spoke
The groove of spoke constitutes the N groups circle concentric with the annulus, and N is positive integer, and one group of groove is used to install one layer of collection eyeglass,
Eyeglass will be collected using vacuum glue to fix in a groove；
The external diameter Φ of stainless steel annulus is 600mm, and width is that 40mm, thickness are 40mm.
Same spoke upper groove processing dimension requirement is that each recess width should be different, should be by that corresponding need to assemble
Collect machining eyeglass after the completion of wall thickness actual size determine, and using every layer collection eyeglass inner surface actual bore as base
Line, determines the internal diameter size of recess width, and internal diameter size stays error -0.25mm when processing, and outside dimension is according to each collection eyeglass
Wall thickness actual size determines its bore, and increases allowance+0.25mm, and when this allowance is used for the system integration, fine setting is every
Layer collects eyeglass and detects the axial location determined by face type, it is determined that after use vacuum adhesive curing, groove surfaces externally and internally composition with it is round
The concentric circle of ring.After machining eyeglass, eyeglass face type need to be detected, need to be by multilayer lens systems after every eyeglass detection
A collection mirror system is integrated into, finally this collection mirror system is installed in the vacuum chamber of light supply apparatus, these steps, all
Pedestal need to be used.The present invention be directed to this demand, it is integrated that extreme ultraviolet photolithography light source collection eyeglass is built in design, processing
Pedestal.The pedestal is star wheel construction, and designing and building this pedestal is machined completely in all collection eyeglasses, and is passed through
Opposite type detection, has been entirely reached after design objective requirement, then determines each corresponding size on pocket-wheel, and pedestal is then carried out again
Processing build.The apparatus structure of the present invention is simple, can be fixedly secured collection eyeglass.The present invention is applied to integrated collection eyeglass.
Brief description of the drawings
Fig. 1 is the three-dimensional knot that extreme ultraviolet photolithography light source described in embodiment one collects the integrated pedestal of eyeglass
Structure schematic diagram；
Fig. 2 is the vertical view that extreme ultraviolet photolithography light source described in embodiment one collects the integrated pedestal of eyeglass
Figure；
Fig. 3 is Fig. 2 A-A to sectional view；
Fig. 4 be it is integrated in embodiment three after collection mirror system structural representation.
Embodiment
Embodiment one：Present embodiment, the extreme ultraviolet described in present embodiment are illustrated referring to figs. 1 to Fig. 3
Light photolithography light source collects the integrated pedestal of eyeglass, including wheel rim 1 and 6 spokes 2；
Wheel rim 1 is provided with 6 spokes 2 in stainless steel annulus, the annular of annulus；N number of groove 2- is provided with every spoke 2
The groove of 1,6 spoke 2 constitutes the N groups circle concentric with the annulus, and N is positive integer, and one group of groove is used to install one layer of receipts
Collect eyeglass, will collect eyeglass using vacuum glue fixes in a groove；
The external diameter Φ of stainless steel annulus is 600mm, and width is that 40mm, thickness are 40mm.Using the axial direction of annulus as thickness
Direction is spent, radial direction is width.The distribution of the same upper groove of spoke 2 be not at equal intervals, the spacing of groove be by
When 8 layers of -10 layers of collection eyeglass of processing are integrated into collection mirror system, each layer is collected the locus decision that eyeglass should be located
The every layer and every layer spacing collected between eyeglass is determined.
Embodiment two：Present embodiment is that the extreme ultraviolet photolithography light source described in embodiment one is collected
The integrated pedestal of eyeglass is described further, in present embodiment, and the width of spoke 2 is 10mm, and thickness is 40mm.With annulus
Axial direction be thickness direction.
Embodiment three：Reference picture 4 illustrates present embodiment, and present embodiment is to embodiment one
Or extreme ultraviolet photolithography light source described in two is collected the integrated pedestal of eyeglass and is described further, in present embodiment, N is 8,
9 or 10.Generally by 8 to 10 layers of bore it is descending, by double aspherical face type (ellipsoid type adds hyperboloid face type) combination groups
Into, every layer of wall thickness 3mm or so collection eyeglass, be integrated into a collection mirror system.
Embodiment four：Present embodiment is to the extreme ultraviolet photolithography light source described in embodiment one or two
The integrated pedestal of eyeglass is collected to be described further, in present embodiment, groove groove depth 10mm.The determination of groove depth is considered as two
Individual factor, first, collect eyeglass to inlay firmly, second, groove can not too deeply, it can influence the collection to extreme ultraviolet to imitate
Rate, because cell wall can shelter from some glancing incidences to the extreme ultraviolet light for collecting mirror edge.
Claims (4)
1. extreme ultraviolet photolithography light source collects the integrated pedestal of eyeglass, it is characterised in that including wheel rim (1) and 6 spokes
(2)；
Wheel rim (1) is provided with 6 spokes (2) in stainless steel annulus, the annular of annulus；N number of groove is provided with every spoke (2)
(2-1), the groove of 6 spokes (2) constitutes the N groups circle concentric with the annulus, and N is positive integer, and one group of groove is used to install
One layer of collection eyeglass, will collect eyeglass using vacuum glue and fix in a groove；
The external diameter Φ of stainless steel annulus is 600mm, and width is that 40mm, thickness are 40mm, and the axial direction using annulus is thickness side
To radial direction is width.
2. extreme ultraviolet photolithography light source according to claim 1 collects the integrated pedestal of eyeglass, it is characterised in that spoke
(2) width is 10mm, and thickness is 40mm, using the axial direction of annulus as thickness direction.
3. extreme ultraviolet photolithography light source according to claim 1 or 2 collects the integrated pedestal of eyeglass, it is characterised in that N
For 8,9 or 10.
4. extreme ultraviolet photolithography light source according to claim 1 or 2 collects the integrated pedestal of eyeglass, it is characterised in that
Groove groove depth 10mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610437955.2A CN105892240B (en) | 2016-06-17 | 2016-06-17 | Extreme ultraviolet photolithography light source collects the integrated pedestal of eyeglass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610437955.2A CN105892240B (en) | 2016-06-17 | 2016-06-17 | Extreme ultraviolet photolithography light source collects the integrated pedestal of eyeglass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105892240A CN105892240A (en) | 2016-08-24 |
| CN105892240B true CN105892240B (en) | 2017-09-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610437955.2A Active CN105892240B (en) | 2016-06-17 | 2016-06-17 | Extreme ultraviolet photolithography light source collects the integrated pedestal of eyeglass |
Country Status (1)
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| CN (1) | CN105892240B (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5089704A (en) * | 1990-10-18 | 1992-02-18 | C & K Systems, Inc. | Wide angle ceiling mounted passive infrared intrusion detection system |
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| Publication number | Publication date |
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| CN105892240A (en) | 2016-08-24 |
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Effective date of registration: 20210119 Address after: Building 9, accelerator, 14955 Zhongyuan Avenue, Songbei District, Harbin City, Heilongjiang Province Patentee after: INDUSTRIAL TECHNOLOGY Research Institute OF HEILONGJIANG PROVINCE Address before: 150001 No. 92 West straight street, Nangang District, Heilongjiang, Harbin Patentee before: HARBIN INSTITUTE OF TECHNOLOGY |
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Effective date of registration: 20230330 Address after: 150027 Room 412, Unit 1, No. 14955, Zhongyuan Avenue, Building 9, Innovation and Entrepreneurship Plaza, Science and Technology Innovation City, Harbin Hi tech Industrial Development Zone, Heilongjiang Province Patentee after: Heilongjiang Industrial Technology Research Institute Asset Management Co.,Ltd. Address before: Building 9, accelerator, 14955 Zhongyuan Avenue, Songbei District, Harbin City, Heilongjiang Province Patentee before: INDUSTRIAL TECHNOLOGY Research Institute OF HEILONGJIANG PROVINCE |